TW586027B - Color filter and its manufacturing method - Google Patents

Abstract

The present invention discloses a color filter and its manufacturing method. The color filter includes: a transparent substrate; a light-shielding matrix area arranged on the transparent substrate, wherein the light-shielding matrix area is composed of plural first light-shielding lines mutually parallelling and extending toward a first direction, and plural second light-shielding lines mutually paralleling and extending toward a second direction, and a sub pixel area is formed between two adjacent first light-shielding lines and adjacent two adjacent second light-shielding lines; a color filtering area formed in the sub pixel area; an electrode layer formed on the transparent substrate; at least one insulating line formed on the electrode layer, wherein its bottom corresponds to the light-shielding matrix area; and a conductive wire formed above the insulating line, wherein conductive wire is longer than the insulating line and the conductive wire is extended to two ends of the insulating line for connecting to the electrode layer.

Description

586027

The technical field to which the invention belongs is particularly related to the present invention. The present invention relates to a color filter and a method for manufacturing the same, and a method for manufacturing a color filter capable of improving the crosstalk phenomenon and a method for manufacturing the same. The prior art liquid crystal display (1! (1111 (1 crystal display (The following LCD) is the mainstream of the current development of the main display of the plane crying road show. The display principle is to use the dielectric anisotropy and conductive anisotropy of the electric circuit to sleep in an external electric field. Change the arrangement of liquid crystal molecules and cause various photoelectric effects of the liquid crystal film. The panel structure of a liquid crystal display is generally composed of two substrates stacked with a certain gap in the middle to fill the liquid crystal. Corresponding electrodes are respectively formed to control the orientation and alignment of liquid crystal molecules. 0. A thin film transistor (TFT) liquid crystal display panel consists of a TFT array substrate with a thin film transistor array and a color filter. The light filter layer is composed of color filters. The detailed structure of the color filters will be described below.

The structure of a general color filter will be described with reference to FIG. 1. The basic structure of a color filter is a glass substrate 201. First, an anti-reflection black matrix 202 (black matrix, BM) is produced, and then transparent red 203, green 204, and blue 205 (RGB) are sequentially produced. ) Three primary colors of the color filter film layer (the shape, size, color, and arrangement of the color filter film depends on the liquid crystal display of different purposes), and finally sputtered with an electrode layer 206.

586027 V. Description of the invention (2) Generally, the transparent conductive film (such as indium tin oxide, IT0) is used as the corresponding electrode of the pixel electrode on the thin film transistor array substrate.彳 As the panel is moving towards large size, the electrode layer 206 is comprehensively formed on the color filter substrate 2 (η, and the large-sized θ panel also represents a picture formed above the color filter film layer. The larger the area of the element electrode layer 206, the larger the resistance value will be. At this time, the signal will be easily attenuated by interference, noise, etc., which will cause the attenuation of crosstalk, which will cause poor screen quality during display and affect the yield. Once the content of the liquid crystal display is improved, the quality of the daytime surface due to interference and noise caused by noise and noise on the substrate of the liquid crystal display, and the resistance value of the layer is improved. The light shielding matrix area is provided with a plurality of parallel and The first light-shielding line and the sub-pixel are adjacent to each other parallel to the second side; an electrode layer is formed on the transparent base, and the lower part corresponds to the light-shielding. In view of this, the object of the present invention is to change the phenomenon and improve the display screen. In order to achieve the above-mentioned object, the present invention reduces the resistance value of the electrode layer so that the signal is not easily attenuated during transmission, thereby avoiding crosstalk and improving the yield of the display panel. The color filter provided by the electrode above the color filter substrate includes: a transparent base is disposed on the transparent substrate, and the light-shielding matrix area is a first light-shielding line extending from the first direction and a plurality of second light-shielding lines extending toward And a primary pixel area is formed in the middle of two adjacent second and second light-shielding lines, and a color filter area is formed on the above-mentioned secondary day area; one plate; at least one insulation line is formed on the electrode layer

0773-9235TWF (Nl); P91170; renee.ptd Page 6 JOOUZ / V. Description of the invention (3) Matrix area; and a conductive line is long and extends to the insulation line above the insulation line, the length is longer than the insulation color渡 m; ::; Electrical r connection. Plate; forming a light-shielding matrix area method, providing a transparent base system on a transparent substrate composed of a plurality of parallel parallel substrates, the first light-shielding line parallel to each other and extending in the _ direction Duplicate the two first light-shielding lines adjacent to each other: the phase line is composed of sub-pixels; a first picture area is formed in the middle of the first light-shielding line; an electrode layer is formed in the transparent region and the sub-pixel element layer is formed And at least one substrate is formed obliquely below the substrate; at least one insulated wire is formed above the electrically insulated wire, and the length thereof is lightly connected to the electrode layer. … Line length ”and extending to both ends of the insulated wire according to the present invention“ the first shift of the above insulation. Bu, i corresponding to the material of the pixel electrode of the light-shielding matrix area is not limited, preferably an oxygen layer and Indium zinc (IZ0). Kiss, ~ 4 rolling = ... month, the above-mentioned color light-transmitting sheet or liquid crystal display panel can further be a plurality of three insulated wires, respectively corresponding to the first light-shielding wires; and can further include a plurality of conductive wires, respectively Corresponds to above the shading line. & According to the color filter of the present invention and the manufacturing method thereof, the structural design of the color light sheet is `` that is, formed by forming on the corresponding top of the light-shielding wire; The short insulated wire of the conductive wire is isolated from the electrode layer to form a parallel circuit with the electrode layer, which can reduce the

0773-9235TW (Nl); P91170; renee.ptd Page 7 586027

V. Description of the invention (4) Lowering the resistance of the corresponding electrode below the above-mentioned conductive line can reduce signal transmission, thereby avoiding crosstalk, and improving the yield of the panel. The resistance of the layer is not easy to cause poor display quality due to interference and noise when the entire electrode layer is used, and to improve the above-mentioned objects, features, and advantages of the present invention. The preferred embodiment is described in detail with the accompanying drawings as follows. Implementation of the example ULI-lcd active i-row substrate. The second figure is a top view of the TFT-LCD active array substrate of this embodiment. As shown in FIG. 2, first, a gate line 300, 3G1, and a gate electrode 312 are formed on a substrate 0 such as glass. Next, a gate insulation layer (not shown) is formed on the substrate 0. The gate lines 300 and 301 and the gate electrode 312 are, for example, metal layers, and the gate insulation layer is, for example, a silicon dioxide layer, a silicon nitride (siNx) layer, or a silicon oxynitride layer. + Next, an a ~ Si layer (under the η + α-Si layer 313, not shown) and an n + a-Si layer 313 are formed on a part of the gate insulating layer to form a #semiconductor island (α -Si semiconductor island). Next, y is formed into data lines 4 0 0, 4 0 1, source 3 16 and an electrode 3 1 4 so as to form a thin film transistor (TFT) structure, in which the source 316 and the data line 40 0 Electrical connection.

586027 V. Description of the invention (5) f. A transparent photoresist layer (not shown) is formed on the surface ′ and formed over the corresponding electrode 314 — Table 3 1 4 surface. The drain electrode exits from the path. Finally, a pixel electrode 801 is formed on the pixel area 306. The material of 8 (Π is, for example, indium tin oxide. The pixel electrode 8. The contact = forms an electrical connection with the electrode 314. The field contact hole 307 There are many production methods for f # and $$ filters of color filters ☆, Such as the pigment dispersion method: electric method, printing method, etc. The pigment dispersion method is hereinafter referred to as the manufacturing process of the color filter in the embodiment. Refer to Section 3A to describe the manufacturing process of the filter. First, a glass substrate 0 is provided, and a light-shielding layer 701 is formed thereon. Its material is, for example, metallic chromium or black photosensitive resin, and then as shown in FIG. 3B, a matrix pattern 701 is formed by lithography. It is a black matrix: it is used for shading and is used to separate successively made color filter layers to improve the contrast of colors. Figure 3C shows the top view of the matrix pattern 701, and the matrix pattern 701 contains a plurality of mutually The first light-shielding line 70 1 a extending parallel and longitudinally is composed of a plurality of second light-shielding lines 701 b parallel to each other and extending transversely, and is adjacent to two first light-shielding lines 70a and two adjacent second light-shielding lines. The middle of line 701b forms a daytime prime zone π ... Sequentially make the red, M, and green primary color filter pixels. First, as shown in Figure 3D, a red pigment photoresist 702 is formed on the surface of the substrate 0 by spin coating, and then exposed and developed as shown in Figure 3E. Red 0773-9235TW (Nl) is planned to be formed; P91170; renee.ptd Page 9 586027 V. Description of the invention (6) The sub-pixel area of the color pixel leaves the red pigment photoresist 702, and removes the remaining positions. Red pigment photoresist. As shown in FIG. 3F, in the same manner, on the surface of the substrate 0 ′ in sequence, blue 703 and green 704 filtered daylight are formed in the sub-pixel regions 70lc separated by the black matrix 701, respectively. The arrangement position of the pixels in the color filter is not limited, and the three colors of red, green, and blue can be arranged in a mosaic, straight, or triangular form. For example, as shown in FIG. 3G, a transparent flat surface is covered on the surface of the substrate. Layer 705 'Finally, as shown in FIG. 3H, an electrode layer 706 is formed on the surface of the flat layer 705. The material is generally a transparent conductive film, such as IT0 or 12O, for driving the alignment of liquid crystal molecules. A key step: on the electrode layer 706 An insulating layer is formed, and the material is, for example, silicon dioxide, silicon nitride, and then a photoresist (not shown) is formed on the insulating layer, and after a photolithographic etching process, the photoresist is removed on the electrode layer. An insulating layer pattern 707 'is formed on the capacitor 706, as shown in Fig. 31. The insulating layer pattern 707 is composed of at least one insulated wire 7 0 7', which is below the position of the insulated wire 707 '' in this embodiment. Corresponds to the first light-shielding line 701a in the matrix pattern 701, but may also correspond to the second light-shielding line 701b, or to both the first light-shielding line 701a and the second light-shielding line 70b. Conductive wire above insulated wire 707. First, a conductive layer 708 is formed on the electrode layer 706, and the material is chrome, aluminum, or aluminum. Thereafter, a photoresist (not shown) is formed on the conductive layer 708, and a photolithographic etching process is performed to remove the photoresist to form a conductive layer pattern 70 8 ′ ′ as shown in FIG. 3J. The conductive layer pattern 70 is composed of at least one conductive line 708 overlying the insulated wire 70 7 ', and according to the present invention, the insulation

0773-9235TWF (Nl); P91170; renee.ptd Page 10 586027 V. Description of the invention (7) The length and number of wires 707 / conductive wires 708 are not limited, because at least one insulation is formed above the electrode layer 706. The wire 708, / conductive wire /, and 708 ', can achieve the effect of reducing the resistance of the electrode layer 706, and finally the length and number of 707' '/ conductive wire 708', is longer and more It is more effective to reduce the resistance of the electrode layer 706. The design of this embodiment is to form an insulated wire 707, / conductive wire 708 ,, 苴 above the second light-shielding line 701a. The top view is shown in FIG. 3K. '' Eight = In the example, the insulated wire and the conductive wire are made by using separate lithography steps, but they can also be made in the same lithography etching step. Fig. 3L shows a cross-sectional view of the insulated wire 707 '' / conductive wire 708 'cut along the parallel-shading line 7 {) la ^ direction in Fig. 3K. As shown in the figure, the length of the conductive wire is longer than the insulated wire 7G7. Is long, and its two ends respectively extend to the insulated wire '07' at both ends to be connected to the electrode layer 706, and a parallel circuit is formed by connecting the ends of the insulated wire 707 as points, which can reduce the original resistance of the electrode layer 706. Value 0 ce 1 1 Next, as in the general LCD panel manufacturing process, the alignment and bonding steps of the color filter substrate 0 and the TFT LCD active array substrate 0 are performed, so that each pixel area above 3G6 corresponds to- Color 2, 703, 704 〇 Finally-the liquid crystal display panel is filled with liquid crystal 3 after being pasted. After sealing, the liquid crystal display surface of the embodiment is partially shown in FIG. 4.

586027 V. Description of the invention (8) As mentioned above, the corresponding light-shielding line forms a parallel resistor through a length and a layer, and the screen during display is not easy to be interfered with. Although the present invention limits the present invention, and the range is Depending on the quality of the circuit attached to the square conductive wire after the electrode noise, it is clear that the color of the application can be reduced to at least a short insulation, which can reduce the overall layer to cause attenuation and improve the better practice. The patent Fan Yeguang sheet has an extra edge line and low resistance reduction. The entertainer of the example of the panel moves and runs the conductive line bounded by the boundary. This conductive line is isolated from the electrode layer to be below the conductive line of the electrode. Corresponding electrode layer is lowered, which can avoid crosstalk and improve the yield rate. ^ f as above, but it is not intended to be used without departing from the spirit of the present invention, so the subject of the present invention shall prevail. Bao

586027

Above the Array Substrate Brief Description of Drawings Figure 1 shows the structure of a conventional color filter. Fig. 2 is an active view of a TFT-LCD according to an embodiment of the present invention. Figures 3A to 3L show the manufacturing process of the color filter of the embodiment of the present invention. Figure 4 shows a part of the liquid crystal display panel of the embodiment of the present invention. ^ Symbol description 3 0 0, 3 0 1 ~ gate line 306 ~ pixels Area; 8 0 1 ~ pixel electrode; 312 ~ gate electrode; 3 14 ~ drain electrode; 202, 701 ~ light shielding layer film layer film layer 3 ~ liquid crystal; 701a ~ first light shielding line 7 0 1 c ~ next day Element area; 7 06 ~ electrode layer; 707 '' ~ insulated wire; 708 '~ conductive layer pattern

〇, 〇 ', 2 (Π ~ substrate; 400, 4 (Π ~ data line; 3 07 ~ contact hole; 3 1〇 ~ transistor region; 313 ~ η + α-Si layer; 3 1 6 ~ source Electrode; 2 0 3, 7 0 2 ~ red filter 2 0 4, 7 0 4 ~ green filter 205, 703 ~ blue filter 206 ~ transparent conductive film; 7 0 1 '~ matrix pattern; 701b ~ second Light-shielding line; 705 to flat layer; 707 'to insulating layer pattern; 708 to conductive layer; 708' to conductive line.

Claims (1)

586027 6. Scope of patent application 1 · A color filter suitable for a liquid crystal display panel, a transparent substrate; # = light matrix area is arranged on the transparent substrate, the light shielding is made of, several parallel to each other and extending in the first direction The first light-shielding line and the complex = are formed by two second light-shielding lines that are parallel to each other and extend in the second direction, and form a sub-pixel area between the adjacent second light-shielding line and the adjacent two second light-shielding lines. ); A color filter region is formed on the above-mentioned sub-pixel region; an electrode layer is formed on the transparent substrate; to; an insulating line is formed on the electrode layer, and a lower portion thereof corresponds to the light-shielding matrix region; and a surface conductive line It is formed above the insulated wire and has a length longer than the insulated wire and extends to both ends of the insulated wire to connect with the electrode layer. 2. The color filter according to item 1 of the scope of patent application, wherein the transparent substrate is a glass substrate. 3. The color filter according to item 1 of the patent application, wherein the light-shielding matrix region is chromium (Cr). 4. The color filter according to item 1 of the scope of patent application, wherein the electrode layer is indium tin oxide (ITO) or indium zinc oxide (IZ). 5 · The color filter as described in the first item of the patent application scope, wherein the first light-shielding line corresponding to the light-shielding matrix area is located below the | insulation line. 6. The color filter according to item 1 of the scope of the patent application, wherein the conductive line is a network, an inscription, or a description. 7 · The color filter as described in item 1 of the scope of patent application, including 586027 6. Scope of patent application A plurality of insulated wires respectively correspond to above the first light-shielding wires. 8 · The color filter 'described in item 7 of the scope of the patent application further includes a plurality of conductive lines, respectively corresponding to above the first light-shielding lines. 9 The color filter according to item 1 of the scope of patent application, wherein the first direction and the second direction are perpendicular. 1 · · A method for manufacturing a color filter, which is suitable for the manufacturing process of a liquid crystal display panel, including: providing a transparent substrate; A light-shielding matrix region is formed on the transparent substrate. The light-shielding matrix region is composed of a plurality of first light-shielding lines parallel to each other and extending in a first direction and a plurality of second light-shielding lines parallel to each other and extending in a second direction. And forming a primary pixel region (sub pi xe1) between the adjacent two first light-shielding lines and the adjacent two second light-shielding lines; forming a color filter area on the above-mentioned sub-pixel area; forming an electrode layer on the transparent On the substrate; forming at least one insulated wire on the electrode layer, which corresponds to the light-shielding matrix area; and forming a conductive wire above the insulated wire, which is longer than the insulated wire and extends to both ends of the insulated wire To connect with this electrode layer. 1 1 · The method for manufacturing a color filter as described in item No. 0 of the patent application, wherein the transparent substrate is a glass substrate. 1 2. The method for manufacturing a color filter as described in item No. 0 of the patent application, wherein the light-shielding matrix region is chromium (Cr). 1 3 · Production of the color filter as described in item No. 586027 6. Method for applying for a patent, wherein the electrode layer is indium tin oxide (ITO) or indium zinc oxide (IZ0) 0 1 4 · The method for manufacturing a color filter as described in item No. 丨 0 of the patent application scope, Wherein, the first shielding line corresponding to the light-shielding matrix area is below the insulating line. 15 · The method for manufacturing a color filter as described in item 1 Q of the scope of patent application, wherein the conductive wire is chromium, aluminum, or aluminum '. 16 · The method for making a color dome sheet as described in item 10 of the scope of the patent application, further comprising forming a plurality of insulated wires respectively corresponding to above the first shielding light. 17 · The method for manufacturing a color filter as described in item 16 of the scope of patent application, further comprising forming a plurality of conductive lines corresponding to above the first shielding light, respectively. 18 · The method for manufacturing a color filter as described in Item 10 of the scope of patent application, wherein the first direction and the second direction are perpendicular. 19 · The method for manufacturing a color filter as described in item 10 of the scope of patent application, wherein the insulated wire and the conductive wire are respectively manufactured by a lithography etching step. 20 · The method for manufacturing a color filter as described in Item 10 of the scope of patent application, wherein the insulated wire and the conductive wire are manufactured by using the same lithography etching step. 0773-9235TW (Nl); P91170; renee .ptd p.16