TW200416291A - Tantalum modified amorphous alloy - Google Patents

Tantalum modified amorphous alloy Download PDF

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TW200416291A
TW200416291A TW092130330A TW92130330A TW200416291A TW 200416291 A TW200416291 A TW 200416291A TW 092130330 A TW092130330 A TW 092130330A TW 92130330 A TW92130330 A TW 92130330A TW 200416291 A TW200416291 A TW 200416291A
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TWI284678B (en
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George W Wolter
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Howmet Res Corp
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    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C45/00Amorphous alloys
    • C22C45/10Amorphous alloys with molybdenum, tungsten, niobium, tantalum, titanium, or zirconium or Hf as the major constituent
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C1/00Making non-ferrous alloys
    • C22C1/11Making amorphous alloys
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C16/00Alloys based on zirconium

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  • Engineering & Computer Science (AREA)
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Abstract

An amorphous alloy having a composition represented by the formula (Zr, Hf)a (Al, Zn)bTie, Nbf, TagYh (CuxFey(Ni, Co)z)d wherein a ranges from 45 to 65 atomic %, b ranges from 5 to 15 atomic %, e and f each ranges from 0 to 4.5 atomic %, g ranges from greater than 0 to 2 atomic %, h ranges from 0 to 0.5 atomic %, and the balance is d and incidental impurities and wherein e+f+g ranges from 3.5 to 7.5 atomic %, d times y is less than 10 atomic %, and x/z ranges from 0.5 to 2.

Description

200416291 玖、發明說明: 【發明所屬之技術領域】 本發明係關於非晶形金屬合金及其製造。 【先前技術】 於晶粒顯著成核及生長前迅速冷卻至一低於合金玻璃態 轉變溫度之溫度時基本無晶形微觀結構之非晶形金屬合金 已為吾人所熟知。舉例而言,美國專利第5 735 975號揭示了 若干其合金組成以(Zr,Hf)a (A卜 Zn)b (Ti,Nb)c (Cux,Fey (Ni, Co)z)d表示且可迅速固化以形成一非晶形體之非晶形金屬合 金。該專利案指出,相當量之氧可溶解於金屬玻璃中而不 會顯著改變結晶曲線。然而,闡述於上述美國專利第5 735 975 號中之非晶形合金通常由實驗室級純淨成份製成且具有以 重量計小於約200 ppm之低總體氧雜質含量(或以原子計800 ppm之氧)。 【發明内容】 本發明之一實施例涉及某些以Zr為主之非晶形合金,其 可由市售原料製成且通常可鑄造成具有一實質較厚之厚度 同時亦可保留一總體非晶形微觀結構。本發明涉及有意將 姮(Ta)加至以Zr為主之非晶形合金中,其中Ta之添加量以合 金組成計超過0但不超過約2.0原子%,且較佳以合金組成計 介於約1至約2原子%Ta之間。亦可視情況將Y加至合金中, 其量大於0至約〇.4原子%。將Ta及Y加至某些經熔煉及鑄造 後其總體氧雜質濃度相對較高之以Zr為主之非晶形合金中 可增強合金之抗結晶能力,以便可使用市售原料及傳統鑄 造方法製造尺寸較大之總體非晶形鑄造產品。 88735 200416291 在本發明之一實施例中,一以Zr為主之非晶形合金由原 子式: (Zr,Hf)a (A卜 Zn)b TieNbfTagYh (CuxFey (Ni,Co)z)d 表示,其中a(Zr及/或Hf)介於45至65原子%之間,b(Al及/或 Zn)介於5至15原子%之間,e及f各介於0至4.5原子%之間,g 介於大於0至2原子%之間,h介於0至0.5原子%之間,其餘為 (1及附帶雜質,且其中0+€+§介於3.5至7.5原子)%之間,(1 乘y小於10原子%,且x/z介於0.5至2之間。在由上述原子式 表示之合金中可僅含有Ti或Nb之一或兩者皆含。當Ti及Nb 皆存在於合金中時,e+ f之和較佳小於約4原子%。 本發明之另一實施例提供了一基本由下列組成(合金組 成以原子%計)之以Zr為主之非晶形合金:約54至約57%之 Zr,0至約4%之Ti,0至約4%之Nb,大於0至約2%之Ta,約8 至約12%之A1,約14至約18%之Cu,及約12至約15%之Ni,及 高達約0_5%之Y。合金總體氧雜質濃度以原子計至少約為 1000 ppm之合金中較佳含有約0_1至約0.4原子%之丫。此一非 晶形合金通常可真空熔煉並模鑄成一剖面厚度兩倍於當合 金中不含Y時可達成厚度之總體非晶形鑄板,儘管該合金於 熔煉及鑄造後具有相對較高之總體氧濃度。 參閱下列附圖並結合下列詳細闡釋内容可更易於明瞭本 發明之上述及其他優點。 【實施方式】 本發明涉及改質一美國專利第5 735 975號中所闡釋類型 之以Zr為主之非晶形合金之組成,該專利案之教示以引用 88735 200416291 方式併入本文中。該已取得專利之以Zr為主之合金基本由 下列組成:約45至約65原子%之Zr及Hf之至少一種,約4至 約7.5原子%之丁丨及Nb之至少一種,及約5至約15原子%之八1 及Zn之至少一種。其餘合金組成包含Cu、Co、Ni及高達約 10原子%之Fe。Hf實質可與Zr互換,而A1可與Zn互換。 根據本發明之一實施例,該非晶形合金之組成經改質後 可於該合金組成中有意添加有妲(Ta)。根據本發明之另一實 施例,使用若干市售原料並隨後實施傳統真空熔煉及鑄造 可製造一鈕改質之合金,其中該等市售原料可使該合金於 熔煉及鑄成後中之總體氧雜質濃度相對較高:以重量計介 於約300至約600 ppm之間(以原子計約1000至約2000 ppm 氧)。為了闡釋而非限制之目的,該等原料通常包括下列經 熔煉可形成合金之市售合金饋料組份:含100至300 ppm氧雜 質之Zr海綿,含600 ppm氧雜質之Ti海綿,含50 ppm氧雜質之 Ni粒,含300至500 ppm氧雜質之Ni-Nb母合金(ppm係以重量 計)。可使用其氧含量未經測定之市售Ta而加入Ta。總體氧 雜質濃度為經熔煉及鑄造合金之氧濃度,該合金係藉由將 各原料經熔煉製程熔煉在一起並經用於形成鑄造體或產品 之鑄造製程而製成。舉例而言,除由原料引入之氧雜質外, 亦可藉由下列將其他氧雜質引入合金中:於其中將熔融合 金鑄造成一鑄造體或產品之熔煉室及/或模具或鑄模腔中 所含之殘餘氧,及/或藉由熔融合金與一可形成一坩堝(可 於其中溶煉合金)及/或鑄模(可於其中鑄造溶融合金)之陶 瓷材料(金屬氧化物)(例如氧化锆)之反應。 88735 200416291 為了闡釋而非限制之目的,上述饋料組份可於一感應熔 煉坩堝(其包含石墨、氧化錘及/或其他耐火材料)中熔煉或 藉由一冷坩堝熔煉法(例如感應凝殼熔煉)熔煉,且該等組 份應具有適當比例以獲得預期合金組成。 為了闡釋而非限制之目的,可首先於一可降低鋁揮發之 氣體(例如惰性氣體)分壓下在介於2700至3000°F之溫度下 於一石墨或氧化锆坩堝中熔煉該等爐料組份,將其冷卻至 一可建立約2至約20微米(例如2至5微米)真空度之低溫,然 後於真空下在1800至2100°F下重新熔煉,隨後予以鑄造。本 發明並不限於任何特定熔煉技術且可使用其他熔煉技術例 如冷壁感應熔煉(於一水冷銅坩堝中)、真空電弧重熔、電 阻熔煉及其他技術以一或多個熔煉步驟實施。 當合金經熔煉及鑄造後其總體氧含量以重量計介於約 300至約600 ppm (以原子計約1000至約2000 ppm氧)時可視情 況於合金組成中加入釔(Y)。Y之加入量以合金組成計大於0 且不超過約0.5原子%,且較佳介於以合金組成計約0.2至約 0.4原子%之Y。儘管本發明並不限制納入Y之方式,但Y通 常藉由於上述市售原料饋料組份中引入一含Y之饋料組份 (包含一含Y之母合金,例如市售.A1-Y母合金、Ni-Y母合金或 其他)及/或Y元素來添加。 於上述具有相對較高總體氧雜質濃度(以重量計約300至 約600 ppm)之非晶形合金中加入Ta及視情況加入Y可增強合 金之抗結晶能力,因而可藉由傳統真空鑄造方法製造具有 較大尺寸之總體非晶形鑄造產品。該等傳統鑄造方法通常 88735 200416291 可使熔融合金之冷卻速度介於ίο2至l〇3 °c /秒及更低。真空 模鑄係一示例性傳統錄造方法,其可用於按下述實施本發 明,但本發明亦可使用其他傳統鑄造方法(包括(但不限於) 真空重力繞鑄)實施,且在此方面不受限制。 根據本發明製造之非晶形鑄造產品通常具有以體積計至 少50%之非晶形或玻璃態相。此一非晶形相與晶形相之微觀 及/或宏觀混合物在鑄造產品或鑄造體中是實際可行的。較 佳地,根據本發明製造之總體非晶形鑄造產品或鑄造體通 常具有以體積計介於約80%至約90%間之非晶形或玻璃態 相,且甚至更佳具有以體積計約95%或更高之非晶形或玻璃 態相。 本發明之一實施例提供一種以原子式: (Zr,Hf)a (Al,Zn)b TieNbfTagYh (CuxFey (Ni,Co)z)d 表示之以Zr為主之非晶形合金,其中a(Zr及/或Hf)介於45至 65原子%之間,b (A1及/或Zn)介於5至15原子%之間,e及f各 介於0至4.5原子%之間,g介於大於0至2原子%之間,h介於0 至0.5原子%之間,其餘為d及附帶雜質,且其中e+ f+ g介於 3.5至7.5原子%之間,(1乘乂小於10原子%,且\/2介於0.5至2之 間。在以上述原子式表示之合金中可僅含有Ti或Nb之一或 兩者皆含。當Ti及Nb二者皆存在於合金中時,e+ f之和較佳 小於約4原子%。 本發明之另一實施例提供了一基本由下列組成(合金組 成以原子%計)之以Zr為主之非晶形合金:約54至約57%之 Zr,0至約4%之Ti,0至約4%之Nb,大於0至約2%之Ta,約8 88735 -9- 200416291 土、为12/。之A1約14至約18%之Cu,及約ι2至約Μ%之见,及 高達約0.5%之Y。合金總體氧雜質濃度以原子計至少約為 誦PPm之合金中較佳含有約〇」至約〇 4原子%之γ。當^及 灿兩者皆存在時,其總體濃度較佳低於合金之約4原子%。 Ta敵度較佳於合金組成之约i至約2原子。。此—以&為主 之非晶形合金通常可真空模鑄成一剖面厚度通常至少兩倍 於當合金中不含Ta及Yh每可、去& r · • 丫時T達成厚度之總體非晶形鑄板。 下列貫例用以進_步闊釋而非限制m 所製造之若干以Zr為主之非曰 <非日日形试驗合金具有下表所示 以原子%表示之組成。該等試驗合金皆使用上述市隹原料 製造。所有該等試驗合金於模鑄後皆具有-以重量計介於 300至600 ppm (以原子斗〗nn 卞冲1000至2000 ppm)之相對較高之總體 氧雜質濃度。 ’200416291 (1) Description of the invention: [Technical field to which the invention belongs] The present invention relates to an amorphous metal alloy and its manufacture. [Previous technology] Amorphous metal alloys with substantially no crystalline microstructure when the crystals are rapidly cooled to a temperature below the glass transition temperature of the alloy before the crystals are significantly nucleated and grown are well known to us. For example, U.S. Patent No. 5,735,975 discloses that several alloy compositions are represented by (Zr, Hf) a (Ab Zn) b (Ti, Nb) c (Cux, Fey (Ni, Co) z) d and An amorphous metal alloy that can be rapidly solidified to form an amorphous body. The patent states that a considerable amount of oxygen can be dissolved in metallic glass without significantly altering the crystallization curve. However, the amorphous alloys described in the aforementioned U.S. Patent No. 5,735,975 are usually made of laboratory-grade pure ingredients and have a low overall oxygen impurity content of less than about 200 ppm by weight (or 800 ppm oxygen by atom ). [Summary of the Invention] One embodiment of the present invention relates to certain Zr-based amorphous alloys, which can be made from commercially available raw materials and can usually be cast to have a substantially thicker thickness while retaining an overall amorphous microstructure. structure. The present invention relates to the intentional addition of rhenium (Ta) to an amorphous alloy mainly composed of Zr, wherein the amount of Ta added exceeds 0 but does not exceed about 2.0 atomic% based on the alloy composition, and preferably ranges from about Between 1 and about 2 atomic% Ta. Optionally, Y may be added to the alloy in an amount greater than 0 to about 0.4 atomic%. Adding Ta and Y to certain Zr-based amorphous alloys whose overall oxygen impurity concentration is relatively high after smelting and casting can enhance the anti-crystallization ability of the alloy so that it can be manufactured using commercially available raw materials and traditional casting methods Larger overall amorphous cast products. 88735 200416291 In one embodiment of the present invention, an amorphous alloy mainly composed of Zr is represented by an atomic formula: (Zr, Hf) a (Ab Zn) b TieNbfTagYh (CuxFey (Ni, Co) z) d, where a (Zr and / or Hf) is between 45 and 65 atomic%, b (Al and / or Zn) is between 5 and 15 atomic%, and e and f are each between 0 and 4.5 atomic%, g is between 0 and 2 atomic%, h is between 0 and 0.5 atomic%, and the rest is (1 and incidental impurities, and 0 + € + § is between 3.5 and 7.5 atomic)%, ( 1 times y is less than 10 atomic%, and x / z is between 0.5 and 2. The alloy represented by the above atomic formula may contain only one or both of Ti or Nb. When both Ti and Nb are present in In the alloy, the sum of e + f is preferably less than about 4 atomic%. Another embodiment of the present invention provides an amorphous alloy mainly composed of Zr consisting of the following composition (alloy composition in atomic%): about 54 To about 57% Zr, 0 to about 4% Ti, 0 to about 4% Nb, greater than 0 to about 2% Ta, about 8 to about 12% A1, about 14 to about 18% Cu, And about 12 to about 15% of Ni, and up to about 0_5% of Y. The overall oxygen impurity concentration of the alloy is The alloy with a sub-meter of at least about 1000 ppm preferably contains about 0_1 to about 0.4 atomic%. This amorphous alloy can usually be vacuum smelted and molded into a section with a thickness twice as high as that when the alloy does not contain Y. The thickness of the overall amorphous cast plate, although the alloy has a relatively high overall oxygen concentration after smelting and casting. The above and other advantages of the present invention can be more easily understood with reference to the following drawings and the following detailed explanation. The present invention relates to the modification of a Zr-based amorphous alloy of the type illustrated in US Patent No. 5 735 975. The teachings of this patent case are incorporated herein by reference 88735 200416291. The patented Zr-based alloys basically consist of the following: at least one of Zr and Hf of about 45 to about 65 atomic%, at least one of Ding and Nb of about 4 to about 7.5 atomic%, and about 5 to about 15 atomic% No. 8 and at least one of Zn. The remaining alloy composition includes Cu, Co, Ni and Fe up to about 10 atomic%. Hf is substantially interchangeable with Zr, and A1 is interchangeable with Zn. According to an embodiment of the present invention, the non- After the composition of the shaped alloy is modified, tantalum (Ta) can be intentionally added to the alloy composition. According to another embodiment of the present invention, one-button modification can be made by using several commercially available raw materials and then performing traditional vacuum melting and casting. Alloys in which these commercially available raw materials enable the alloy to have a relatively high overall oxygen impurity concentration after smelting and casting: between about 300 to about 600 ppm by weight (about 1000 to about 1,000 atomic) 2000 ppm oxygen). For purposes of illustration and not limitation, these materials typically include the following commercially available alloy feed components that are smelted to form alloys: Zr sponges with 100 to 300 ppm oxygen impurities, Ti sponges with 600 ppm oxygen impurities, 50 Ni particles with ppm oxygen impurities, Ni-Nb master alloy containing 300 to 500 ppm oxygen impurities (ppm is based on weight). Ta can be added using commercially available Ta whose oxygen content is not determined. The overall oxygen impurity concentration is the oxygen concentration of the smelted and cast alloy, which is made by melting the raw materials together through a smelting process and using a casting process to form a cast body or product. For example, in addition to the oxygen impurities introduced from the raw materials, other oxygen impurities can also be introduced into the alloy by: the melting chamber and / or the mold or mold cavity in which the molten alloy is cast into a cast body or product Residual oxygen, and / or by melting the alloy with a ceramic material (metal oxide) (eg, zirconia) that can form a crucible (in which the alloy can be dissolved) and / or a mold (in which the molten gold can be cast) Response. 88735 200416291 For the purpose of illustration and not limitation, the above feed components can be smelted in an induction melting crucible (which includes graphite, oxidized hammer and / or other refractory materials) or by a cold crucible melting method (such as an induction coagulation shell) Smelting), and these components should have an appropriate ratio to obtain the desired alloy composition. For the purpose of illustration rather than limitation, the charge groups can be first smelted in a graphite or zirconia crucible at a temperature between 2700 and 3000 ° F under a partial pressure of a gas (such as an inert gas) that can reduce aluminum volatility. It is cooled to a low temperature that can establish a vacuum of about 2 to about 20 microns (for example, 2 to 5 microns), then remelted under vacuum at 1800 to 2100 ° F, and then cast. The invention is not limited to any particular melting technique and other melting techniques such as cold wall induction melting (in a water-cooled copper crucible), vacuum arc remelting, resistance melting and other techniques can be implemented in one or more melting steps. When the overall oxygen content of the alloy after smelting and casting is between about 300 to about 600 ppm by weight (about 1000 to about 2000 ppm oxygen in terms of atoms), yttrium (Y) may be added to the alloy composition as appropriate. The amount of Y added is greater than 0 and not more than about 0.5 atomic% based on the alloy composition, and is preferably between about 0.2 to about 0.4 atomic% Y based on the alloy composition. Although the present invention does not limit the way of incorporating Y, Y is usually introduced by introducing a Y-containing feed component (including a Y-containing master alloy, for example, commercially available) into the above-mentioned commercially available raw material feed components. Master alloy, Ni-Y master alloy or other) and / or Y element. Adding Ta and optionally Y to the above amorphous alloy with relatively high overall oxygen impurity concentration (about 300 to about 600 ppm by weight) can enhance the alloy's anti-crystallization ability, so it can be manufactured by traditional vacuum casting methods Overall amorphous cast product with larger dimensions. These traditional casting methods usually allow the cooling rate of molten alloys to be between 2 and 103 ° c / second and lower. Vacuum die casting is an exemplary traditional recording method, which can be used to implement the invention as described below, but the invention can also be implemented using other traditional casting methods (including (but not limited to) vacuum gravity wound casting), and in this respect Unlimited. The amorphous cast product manufactured according to the present invention usually has an amorphous or glassy phase of at least 50% by volume. Such a microscopic and / or macroscopic mixture of the amorphous phase and the crystalline phase is practically feasible in cast products or cast bodies. Preferably, the overall amorphous cast product or cast body made according to the present invention typically has an amorphous or glassy phase between about 80% and about 90% by volume, and even more preferably has about 95% by volume. % Or higher amorphous or glassy phase. An embodiment of the present invention provides an amorphous alloy mainly composed of Zr represented by an atomic formula: (Zr, Hf) a (Al, Zn) b TieNbfTagYh (CuxFey (Ni, Co) z) d, where a (Zr And / or Hf) between 45 and 65 atomic%, b (A1 and / or Zn) between 5 and 15 atomic%, e and f each between 0 and 4.5 atomic%, and g between Greater than 0 to 2 atomic%, h is between 0 to 0.5 atomic%, the rest are d and incidental impurities, and e + f + g is between 3.5 to 7.5 atomic%, (1 times 乂 is less than 10 atomic% , And \ / 2 is between 0.5 and 2. The alloy represented by the above atomic formula may contain only one or both of Ti or Nb. When both Ti and Nb are present in the alloy, e + The sum of f is preferably less than about 4 atomic%. Another embodiment of the present invention provides a Zr-based amorphous alloy consisting essentially of the following composition (alloy composition in atomic%): about 54 to about 57% Zr, 0 to about 4% Ti, 0 to about 4% Nb, more than 0 to about 2% Ta, about 8 88735 -9- 200416291 soil, 12 /. A1 about 14 to about 18% Cu , And about ι2 to about M%, and Y up to about 0.5%. Overall oxygen of the alloy The alloy having a mass concentration of at least about 0.25 ppm in atomic content preferably contains about 0 "to about 0 4 atomic% of γ. When both ^ and Can exist, its overall concentration is preferably lower than about 4 atoms of the alloy %. The hostility of Ta is better than about i to about 2 atoms of the alloy composition. This— & -based amorphous alloys can usually be vacuum-moulded to a section thickness that is usually at least twice that when the alloy does not contain Ta and Yh can, go & r · • The overall amorphous cast plate with a thickness reached by Y. T The following examples are used to further expand rather than limit the number of non-Zr-based < The Japanese-Japanese test alloy has a composition expressed in atomic% as shown in the table below. These test alloys are manufactured using the above-mentioned market raw materials. All these test alloys have after casting-between 300 and 600 by weight Relatively high overall oxygen impurity concentration in ppm (1000 to 2000 ppm in atomic buckets).

對於試驗合金而言,首先使用圖1所示以及Colvin美國4 88735 -10- 200416291 利第6 070 643號中所闡釋型號之真空模鑄機之一真空熔煉 室40中之感應線圈56將上述原料熔化於一石墨坩堝54中,上 述專利案之教示以引用方式併入本文中。於200托耳之氬分 壓及一介於2700至3000°F間之溫度下熔煉該等原料,然後冷 卻至約1500°F,此時室40中形成5微米之真空度,隨後於真 空下於1800至2100°F下重新熔化,並隨後予以模鑄。將每一 熔融試驗合金自坩堝54經開口 58倒入一壓鑄儲筒24中,然後 立即由柱塞27射入一模具腔30中。模具腔30被界定於第一及 第二模具32、34之間且藉由入口門或通道36連通至該壓鑄儲 筒。一密封裝置60位於模具32、34之間。模具32、34由鋼構 成且置於環境空氣中而無任何内部模具冷卻。模具腔30通 過壓鑄儲筒24抽真空至5微米且構造為可在不同鑄造試驗 中產生板材厚度不同之矩形板材(5英吋寬X 14英吋長)。柱 塞速度介於20-60英尺/秒。柱塞尖27a由一鈹銅合金構成。 合金鑄件在模具腔30中保持10秒,然後脫模於環境空氣中 並在容器Μ中於水中騾冷。 該等真空模鑄試驗揭示,由上述試驗合金製成之板材試 件85、88、92、94及96皆可真空模鑄為具有一總體非晶形微 觀結構且板材厚度不超過0.180英吋同時無板材斷裂(如表 中之標識「完好」所示)之鑄件。每一板材試件85、88、92、 94及96之鑄板厚度皆為0.180英吋。圖2Α及2Β顯示了板材試 件85及88之衍射圖案。 圖2C所示為板材試件95之衍射圖案,其在0.180英吋板材 厚度下為「完好」且幾乎為非晶形。 88735 -11 - 200416291 當Ta濃度增加至2·5原子%時,儘管γ之濃度被保持為〇·4 原子%,但相應板材96及97皆展示非晶形或幾乎非晶形微觀 結構及斷裂。每一板材試件96及97之鑄板厚度皆為〇.18〇英 吋。當Ta濃度增加至4.5原子。/〇以替代所有丁丨及·時可觀察到 類似結果’其中儘管Y之;辰度被保持為〇·4原子%,但板材% 仍展示幾乎非晶形微觀結構及斷裂。板材試件98之鑄板厚 度為0.180英忖。圖2D為板材98的X射線衍射圖案。 當Y之濃度降低至〇原子%時,相應板材1〇2展示部分晶形 微觀結構及斷裂。板材試件102之鑄板厚度為〇_18〇英叶。圖 2E為板材102的X射線衍射圖案。 儘管板材100之組成表明其不應斷裂,但其卻仍然斷裂。 據推測,該板材斷裂係由一異常狀況(例如撞擊於模具上) 而非一内在原因所致。該表顯示,若本發明合金中之丁&及Y 濃度可如上所述予以控制則適於模鍛(可模鑄)且其模鑄件 基本上為非晶形。該表顯示,包含之 合金組成可於各種γ濃度下以一非晶形態模缚。 儘管已根據某些實施例闡釋本發明,但熟諳此項技藝者 將瞭解,可實施各種修改及諸如此類而不偏離隨附申請專 利範圍中所述之本發明之範圍。 【圖式簡單說明】 圖1係一用於鑄造板材試件之真空模鑄機之示意圖。 圖2A、2B、2C、犯及沈係經真空模鑄至具有相同板材厚 度之板材試件85、88、95、98及102之X射線衍射圖案。 【圖式代表符號說明】 88735 -12- 200416291 24 27 27a 30 32 34 36 40 54 56 58 60 壓鑄儲筒 柱塞 柱塞尖 模具腔 第一模具 第二模具 通遒 真空熔煉室 石墨坩堝 感應線圈 開口 密封裝置 88735For the test alloy, first use the induction coil 56 in the vacuum melting chamber 40 of one of the vacuum die casting machines of the model shown in Figure 1 and Colvin U.S. 4 88735 -10- 200416291 Lee No. 6 070 643. Melted in a graphite crucible 54, the teachings of the above patents are incorporated herein by reference. The raw materials were smelted at a partial pressure of argon of 200 Torr and a temperature between 2700 and 3000 ° F, and then cooled to about 1500 ° F. At this time, a vacuum of 5 microns was formed in the chamber 40, and then under vacuum at Remelt at 1800 to 2100 ° F and subsequently die cast. Each molten test alloy was poured from the crucible 54 through the opening 58 into a die-casting cylinder 24, and then immediately injected into a mold cavity 30 from the plunger 27. A mold cavity 30 is defined between the first and second molds 32, 34 and communicates with the die-casting reservoir via an entrance door or channel 36. A sealing device 60 is located between the molds 32 and 34. The molds 32, 34 are made of steel and placed in ambient air without any internal mold cooling. The mold cavity 30 is evacuated to 5 microns through the die-casting cylinder 24 and is configured to produce rectangular plates (5 inches wide by 14 inches long) with different plate thicknesses in different casting tests. Plug speeds range from 20 to 60 feet per second. The plunger tip 27a is made of a beryllium copper alloy. The alloy casting was held in the mold cavity 30 for 10 seconds, then demolded in ambient air and chilled in water in a container M. These vacuum die casting tests revealed that plate test pieces 85, 88, 92, 94, and 96 made of the above-mentioned test alloys can be vacuum die cast to have an overall amorphous microstructure and the plate thickness does not exceed 0.180 inches. Castings where the sheet is broken (as indicated in the table by the indication "good"). The thickness of each plate test piece 85, 88, 92, 94, and 96 was 0.180 inches. Figures 2A and 2B show the diffraction patterns of plate test pieces 85 and 88. Figure 2C shows the diffraction pattern of plate test piece 95, which is "good" and almost amorphous at a plate thickness of 0.180 inches. 88735 -11-200416291 When the Ta concentration was increased to 2.5 atomic%, although the concentration of γ was maintained at 0.4 atomic%, the respective plates 96 and 97 exhibited an amorphous or almost amorphous microstructure and fracture. The thickness of each of the plate test pieces 96 and 97 was 0.180 inches. When Ta concentration increased to 4.5 atoms. / 〇 to replace all the Ding and similar results can be observed when ’which, despite Y; Chen degree is maintained at 0.4 atomic%, but the plate% still exhibits almost amorphous microstructure and fracture. The plate thickness of the plate test piece 98 was 0.180 inches. FIG. 2D is an X-ray diffraction pattern of the plate 98. When the concentration of Y is reduced to 0 atomic%, the corresponding plate 102 exhibits a part of crystal form, microstructure and fracture. The thickness of the cast plate of the plate test piece 102 is 0-18 mm. FIG. 2E is an X-ray diffraction pattern of the plate 102. Although the composition of the sheet 100 indicates that it should not break, it still breaks. It is speculated that the sheet fracture was caused by an abnormal condition (such as impact on a mold) rather than an intrinsic cause. The table shows that if the concentrations of D & and Y in the alloy of the present invention can be controlled as described above, it is suitable for die forging (die casting) and its die casting is substantially amorphous. The table shows that the alloy composition contained can be molded in an amorphous form at various gamma concentrations. Although the invention has been explained in terms of certain embodiments, those skilled in the art will appreciate that various modifications and the like can be implemented without departing from the scope of the invention described in the scope of the accompanying patent application. [Schematic description] Figure 1 is a schematic diagram of a vacuum die casting machine for casting plate test pieces. 2A, 2B, 2C, Xuan and Shen are X-ray diffraction patterns of plate test pieces 85, 88, 95, 98, and 102 which have been vacuum die-cast to the same plate thickness. [Illustration of Symbols in the Drawings] 88735 -12- 200416291 24 27 27a 30 32 34 36 40 54 56 58 60 60 Die-casting cylinder plunger plunger tip mold cavity first mold second mold through vacuum melting chamber graphite crucible induction coil opening Sealing device 88735

Claims (1)

200416291 拾、申請專利範圍: 1· 一種由下述原子式表示之非晶形合金: (Zr,Hf)a (A卜 Zn)b Tie,Nbf,TagYh (CuxFey (Ni,Co)z)d 其中a介於45至65原子%之間,b介於5至15原子%之間,e 及f各介於0至4.5原子%之間,g介於大於〇至2原子%之 間’ h介於0至0.5原子%之間,其餘為d及附帶雜質,且其 中e+ f+ g介於3·5至7.5原子%之間,d乘y小於10原子%, 且x/z介於0.5至2之間。 2.根據申請專利範圍第1項之合金,其中g介於1至2原子0/。 之間。 3·根據申請專利範圍第1項之合金,其中h介於〇1至〇.4原子 %之間。 4·根據申請專利範圍第1項之合金,其中Ti及Nb二者皆存在 且e + f小於約4原子%。 5·根據申請專利範圍第1項之合金,其中e= 15原子。/。, 15原子%且g= 15原子%。 6· 一種非晶形合金,基本上由下列所組成··以原子%計, 約54至約57%之Zr,〇至約4%之Ti,0至約4%之Nb,大於〇 至約2%之Ta,約8至約12%之A卜約14至約18%之Cu,及 約12至約15%之见,及〇至約〇·5%之γ。 7·根據申請專利範圍第6項之合金,其中Ta之含量為約1至 約2原子%。 8·根據申請專利範圍第6項之合金,其中γ含量為〇1至〇.4 原子%。 9·根據申請專利範圍第6項之合金,其總體氧雜質濃度以原 88735 416291 子外為至少约1000 ppm且其γ含量a 1〇· — 口里為0·1至0.4原子%。 種包含如申請專利範圍第1項之八 造體。 闻示< 口金 < 總體非晶形鑄 =據中請專利範圍第1G項之鑄造體,其為模缚件。 包含如申請專利範圍第6項之合金之總體非晶形鎊 k體。 =據中請專利範圍第12項之鑄造體,其為模鱗件。 種製造非晶形合金鑄件之方法,其包含 提供一種其組成由下列原子式表示之熔融合金:(zr, 吼㈧,Zn)b Tie,Nbf,TagYh (CUxFey (Ni,c〇)z)d,其中 a介 於45至65原子%之間,b介於5至15原子%之間,各介 至4.5原子%之間,g介於大於〇至2原子%之間,h介於〇 至〇.5原子%之間,其餘為d及附帶雜質,且其中f+ g 介於3.5至7·5原子%之間,樣y小於1〇原子%,且*介於 〇·5至2之間;及 於一腔中鑄造該合金。 Κ根據申請專利範圍第14項之方法,其中§為1至2。 16·根據申請專利範圍第14項之方法,其中11為〇1至〇.4。 17·根據申請專利範圍第14項之方法,其中丁丨及_二者皆存 在且e + f小於約4原子%。 18. —種製造非晶形合金鑄件之方法,其包含 提供一種其組成基本由下列組成之熔融合金··約54至 約57%之Zr ’ 〇至約4°/。之丁i,〇至約4%之Nb,大於〇至約2% 之Ta ’約8至約12%之A卜約14至約18%之Cu,及約12至約 88735 -2 - 200416291 15%之Ni,及0至約0.5%之Y,及附帶雜質;及 於一腔中鑄造該合金。 19·根據申請專利範圍第18項之方法,其中該合金中之Υ含量 為約0.1至約0.4原子%。 20·根據申請專利範圍第18項之方法,其中該合金於該鑄造 後之總體氧雜質濃度為以原子計至少約1000 ppm且其Υ 含量為約0.1至約0.4原子%。 21·根據申請專利範圍第18項之方法,其中該合金於該腔中 模鑄。 22·根據申請專利範圍第18項之方法,其中Ta含量為約1至約 2原子%。 88735200416291 Patent application scope: 1. An amorphous alloy represented by the following atomic formula: (Zr, Hf) a (Ab Zn) b Tie, Nbf, TagYh (CuxFey (Ni, Co) z) d where a Between 45 and 65 atomic%, b between 5 and 15 atomic%, e and f each between 0 and 4.5 atomic%, g between 0 and 2 atomic% 'h between 0 to 0.5 atomic%, the rest are d and incidental impurities, and e + f + g is between 3.5 and 7.5 atomic%, d times y is less than 10 atomic%, and x / z is between 0.5 and 2 between. 2. The alloy according to item 1 of the patent application scope, wherein g is between 1 and 2 atoms 0 /. between. 3. The alloy according to item 1 of the scope of patent application, wherein h is between 0.001 and 0.4 atomic%. 4. The alloy according to item 1 of the patent application scope, wherein both Ti and Nb are present and e + f is less than about 4 atomic%. 5. The alloy according to item 1 of the scope of patent application, where e = 15 atoms. /. , 15 atomic% and g = 15 atomic%. 6. An amorphous alloy consisting essentially of the following: Zr about 54 to about 57%, Ti to 0 to about 4%, Nb to 0 to about 4%, greater than 0 to about 2 in atomic% % Ta, about 8 to about 12% A, about 14 to about 18% Cu, and about 12 to about 15%, and 0 to about 0.5% γ. 7. The alloy according to item 6 of the application, wherein the content of Ta is from about 1 to about 2 atomic%. 8. The alloy according to item 6 of the patent application, wherein the γ content is from 0.01 to 0.4 atomic%. 9. The alloy according to item 6 of the scope of the patent application has an overall oxygen impurity concentration of at least about 1000 ppm outside the original 88735 416291 and its γ content a 1 ··-which is 0.1 to 0.4 atomic% in mouth. This species includes the eighth body as described in the first patent application. Hear < gold < overall amorphous casting = according to the patent claim 1G of the casting body, which is a mold binding. Contains the overall amorphous pound k-body of the alloy as claimed in item 6 of the patent application. = According to the patent, the casting body in item 12 of the patent scope is a scale. A method for manufacturing an amorphous alloy casting, comprising providing a molten alloy whose composition is represented by the following atomic formula: (zr, ㈧, Zn) b Tie, Nbf, TagYh (CUxFey (Ni, c0) z) d, Where a is between 45 and 65 atomic%, b is between 5 and 15 atomic%, each is between 4.5 atomic%, g is between 0 and 2 atomic%, and h is between 0 and 0. .5 atomic%, the rest are d and incidental impurities, and f + g is between 3.5 and 7.5 atomic%, such that y is less than 10 atomic%, and * is between 0.5 and 2; And casting the alloy in a cavity. K is the method according to item 14 of the patent application, where § is 1 to 2. 16. The method according to item 14 of the scope of patent application, wherein 11 is 〇1 to 0.4. 17. The method according to item 14 of the scope of patent application, wherein both Ding and D are present and e + f is less than about 4 atomic%. 18. A method of manufacturing an amorphous alloy casting, comprising providing a molten alloy whose composition consists essentially of: about 54 to about 57% Zr'0 to about 4 ° /. Ding, 0 to about 4% Nb, greater than 0 to about 2% Ta 'about 8 to about 12% A about 14 to about 18% Cu, and about 12 to about 88735 -2-200416291 15 % Ni, and 0 to about 0.5% Y, with incidental impurities; and casting the alloy in a cavity. 19. The method according to item 18 of the scope of patent application, wherein the rhenium content in the alloy is from about 0.1 to about 0.4 atomic%. 20. The method according to item 18 of the scope of patent application, wherein the alloy has an overall oxygen impurity concentration after the casting of at least about 1000 ppm by atom and a rhenium content of about 0.1 to about 0.4 atomic%. 21. The method according to item 18 of the scope of patent application, wherein the alloy is die-cast in the cavity. 22. The method according to item 18 of the scope of patent application, wherein the Ta content is from about 1 to about 2 atomic%. 88735
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