TW200403216A - A sulfonated amine acid derivative and the metalloproteinase inhibitor containing it (II) - Google Patents

A sulfonated amine acid derivative and the metalloproteinase inhibitor containing it (II) Download PDF

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TW200403216A
TW200403216A TW092128956A TW92128956A TW200403216A TW 200403216 A TW200403216 A TW 200403216A TW 092128956 A TW092128956 A TW 092128956A TW 92128956 A TW92128956 A TW 92128956A TW 200403216 A TW200403216 A TW 200403216A
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compound
group
phenyl
alkyl
methyl
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TW092128956A
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Chinese (zh)
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TWI244475B (en
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Hiroshige Tsuzuki
Fumihiko Watanabe
Mitsuaki Ohtani
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Shionogi & Co
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    • C07D213/00Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
    • C07D213/02Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
    • C07D213/04Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D213/24Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom with substituted hydrocarbon radicals attached to ring carbon atoms
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    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61PSPECIFIC THERAPEUTIC ACTIVITY OF CHEMICAL COMPOUNDS OR MEDICINAL PREPARATIONS
    • A61P19/00Drugs for skeletal disorders
    • A61P19/02Drugs for skeletal disorders for joint disorders, e.g. arthritis, arthrosis
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    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61PSPECIFIC THERAPEUTIC ACTIVITY OF CHEMICAL COMPOUNDS OR MEDICINAL PREPARATIONS
    • A61P19/00Drugs for skeletal disorders
    • A61P19/08Drugs for skeletal disorders for bone diseases, e.g. rachitism, Paget's disease
    • A61P19/10Drugs for skeletal disorders for bone diseases, e.g. rachitism, Paget's disease for osteoporosis
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    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61PSPECIFIC THERAPEUTIC ACTIVITY OF CHEMICAL COMPOUNDS OR MEDICINAL PREPARATIONS
    • A61P29/00Non-central analgesic, antipyretic or antiinflammatory agents, e.g. antirheumatic agents; Non-steroidal antiinflammatory drugs [NSAID]
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    • C07C311/00Amides of sulfonic acids, i.e. compounds having singly-bound oxygen atoms of sulfo groups replaced by nitrogen atoms, not being part of nitro or nitroso groups
    • C07C311/01Sulfonamides having sulfur atoms of sulfonamide groups bound to acyclic carbon atoms
    • C07C311/02Sulfonamides having sulfur atoms of sulfonamide groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton
    • C07C311/03Sulfonamides having sulfur atoms of sulfonamide groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton having the nitrogen atoms of the sulfonamide groups bound to hydrogen atoms or to acyclic carbon atoms
    • C07C311/06Sulfonamides having sulfur atoms of sulfonamide groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton having the nitrogen atoms of the sulfonamide groups bound to hydrogen atoms or to acyclic carbon atoms to acyclic carbon atoms of hydrocarbon radicals substituted by carboxyl groups
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    • C07C311/12Sulfonamides having sulfur atoms of sulfonamide groups bound to acyclic carbon atoms of an unsaturated carbon skeleton containing rings
    • C07C311/13Sulfonamides having sulfur atoms of sulfonamide groups bound to acyclic carbon atoms of an unsaturated carbon skeleton containing rings the carbon skeleton containing six-membered aromatic rings
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    • C07C311/16Sulfonamides having sulfur atoms of sulfonamide groups bound to carbon atoms of six-membered aromatic rings having the nitrogen atom of at least one of the sulfonamide groups bound to hydrogen atoms or to an acyclic carbon atom
    • C07C311/19Sulfonamides having sulfur atoms of sulfonamide groups bound to carbon atoms of six-membered aromatic rings having the nitrogen atom of at least one of the sulfonamide groups bound to hydrogen atoms or to an acyclic carbon atom to an acyclic carbon atom of a hydrocarbon radical substituted by carboxyl groups
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    • C07C311/22Sulfonamides, the carbon skeleton of the acid part being further substituted by singly-bound oxygen atoms
    • C07C311/29Sulfonamides, the carbon skeleton of the acid part being further substituted by singly-bound oxygen atoms having the sulfur atom of at least one of the sulfonamide groups bound to a carbon atom of a six-membered aromatic ring
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    • C07C311/30Sulfonamides, the carbon skeleton of the acid part being further substituted by singly-bound nitrogen atoms, not being part of nitro or nitroso groups
    • C07C311/31Sulfonamides, the carbon skeleton of the acid part being further substituted by singly-bound nitrogen atoms, not being part of nitro or nitroso groups having the sulfur atoms of the sulfonamide groups bound to acyclic carbon atoms
    • C07C311/32Sulfonamides, the carbon skeleton of the acid part being further substituted by singly-bound nitrogen atoms, not being part of nitro or nitroso groups having the sulfur atoms of the sulfonamide groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton
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    • C07C311/37Sulfonamides, the carbon skeleton of the acid part being further substituted by singly-bound nitrogen atoms, not being part of nitro or nitroso groups having the sulfur atom of at least one of the sulfonamide groups bound to a carbon atom of a six-membered aromatic ring
    • C07C311/38Sulfonamides, the carbon skeleton of the acid part being further substituted by singly-bound nitrogen atoms, not being part of nitro or nitroso groups having the sulfur atom of at least one of the sulfonamide groups bound to a carbon atom of a six-membered aromatic ring having sulfur atoms of sulfonamide groups and amino groups bound to carbon atoms of six-membered rings of the same carbon skeleton
    • C07C311/39Sulfonamides, the carbon skeleton of the acid part being further substituted by singly-bound nitrogen atoms, not being part of nitro or nitroso groups having the sulfur atom of at least one of the sulfonamide groups bound to a carbon atom of a six-membered aromatic ring having sulfur atoms of sulfonamide groups and amino groups bound to carbon atoms of six-membered rings of the same carbon skeleton having the nitrogen atom of at least one of the sulfonamide groups bound to hydrogen atoms or to an acyclic carbon atom
    • C07C311/42Sulfonamides, the carbon skeleton of the acid part being further substituted by singly-bound nitrogen atoms, not being part of nitro or nitroso groups having the sulfur atom of at least one of the sulfonamide groups bound to a carbon atom of a six-membered aromatic ring having sulfur atoms of sulfonamide groups and amino groups bound to carbon atoms of six-membered rings of the same carbon skeleton having the nitrogen atom of at least one of the sulfonamide groups bound to hydrogen atoms or to an acyclic carbon atom to an acyclic carbon atom of a hydrocarbon radical substituted by carboxyl groups
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    • C07C311/45Sulfonamides, the carbon skeleton of the acid part being further substituted by singly-bound nitrogen atoms, not being part of nitro or nitroso groups at least one of the singly-bound nitrogen atoms being part of any of the groups, X being a hetero atom, Y being any atom, e.g. N-acylaminosulfonamides
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    • C07C311/45Sulfonamides, the carbon skeleton of the acid part being further substituted by singly-bound nitrogen atoms, not being part of nitro or nitroso groups at least one of the singly-bound nitrogen atoms being part of any of the groups, X being a hetero atom, Y being any atom, e.g. N-acylaminosulfonamides
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    • C07C311/49Amides of sulfonic acids, i.e. compounds having singly-bound oxygen atoms of sulfo groups replaced by nitrogen atoms, not being part of nitro or nitroso groups having nitrogen atoms of sulfonamide groups further bound to another hetero atom to nitrogen atoms
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Abstract

A compound of the formula (I), and the optically active substance, pharmaceutically acceptable salt or hydrate thereof having metalloproteinase inhiting activity.

Description

200403216 玖、發明說明: 【發明所屬之技術領域】 本發明爲有關磺化之胺基酸衍生物及含它之金屬蛋白 酶阻礙劑。 【先前技術】 細胞外基質係由膠原及蛋白聚糖等所構成,具有組織 支持機能及細胞之增殖、分化、黏著等細胞機能保持功 能。對細胞外基質之分解,屬於基質金屬蛋白酶(MMP) 之明膠酶、絲多樂美力新及膠原酶等扮演重要角色,這 些酵素在生理學狀況下以成長及組織改革等激動。故這 些酵素被認爲參與隨伴組織破壞及纖維化之各種病態, 即變形性關節症、關節風濕、角膜潰瘍、牙周病、腫瘤 之轉移或浸濶,或病毒感染症(如HIV感染症)之進行。 究竟何種酵素與前述病態深深相關雖至今仍未明,但這 些酵素關係組織破壞則一致。至於胺基酸衍生物之金屬 蛋白酶阻礙劑有如胺基酸之羥肟酸衍生物(特開平6 -2 5 6 2 9 3 ),胺基酸之羧酸衍生物或其羥肟酸衍生物(WO 95/35276)等之揭示。 【發明内容】 故若能阻礙如上述MMP之活性,則大大有助於對起 因或關連該活性之前述病態之改善,或防止進行,而殷 望開發MMP阻礙劑。 鑑此,本發明者們致力反複檢討之結果,發現某種新 穎磺醯胺衍生物具有強力MMP阻礙活性,即本發明爲 有關含有如下式(I)化合物、其光學活性體、彼等之製 200403216 有關含有如下式(i)化合物、其光學活性體、彼等之製 藥容許鹽’或水合物之金屬蛋白酶阻礙劑。 R1200403216 (1) Description of the invention: [Technical field to which the invention belongs] The present invention relates to a sulfonated amino acid derivative and a metal proteinase inhibitor containing it. [Previous technology] The extracellular matrix is composed of collagen and proteoglycan, etc., and has tissue support functions and cell function maintenance functions such as cell proliferation, differentiation, and adhesion. For the breakdown of extracellular matrix, gelatinase, stomarolex, and collagenase, which are matrix metalloproteinases (MMPs), play important roles. These enzymes are excited by physiological conditions such as growth and tissue reform. Therefore, these enzymes are considered to be involved in various pathological conditions accompanied by tissue destruction and fibrosis, namely deformable joint disease, joint rheumatism, corneal ulcer, periodontal disease, tumor metastasis or infiltration, or viral infections (such as HIV infection ). Although it is still unknown what kind of enzymes are deeply related to the aforementioned morbidity, the destruction of these enzyme-related tissues is the same. As for the metalloprotease inhibitor of amino acid derivatives, there are hydroxamic acid derivatives of amino acids (Japanese Patent Laid-Open No. Hei 6-2 5 6 2 9 3), carboxylic acid derivatives of amino acids or their hydroxamic acid derivatives ( WO 95/35276) and the like. [Summary of the Invention] Therefore, if the activity of the MMP as described above can be hindered, it can greatly contribute to the improvement of the above-mentioned pathological conditions or related to the activity, or prevent the progress, and it is desirable to develop an MMP inhibitor. In view of this, the inventors endeavored to repeatedly review the results and found that a novel sulfonamide derivative has a strong MMP inhibitory activity, that is, the present invention relates to a compound containing the following formula (I), an optically active substance, and other systems 200403216 The invention relates to a metalloproteinase inhibitor containing a compound of the following formula (i), its optically active substance, and their pharmaceutically acceptable salts' or hydrates. R1

R5 - R4 - R3 - S02—N 人 COY I R2 [式中R1爲可有取代之低烷基、可有取代之芳基、可有 取代之芳烷基、可有取代之雜芳基或可有取代之雜芳烷 基; R2爲Η、可有取代之低烷基、可有取代之芳基、可 有取代之芳烷基、可有取代之雜芳基或可有取代之雜芳 院基; R3爲單鍵、可有取代之伸芳基或可有取代之雜伸芳 基;. R4 爲單鍵、-(〇:112)111-、-<:11 = (:11-、-(:三(:-、-<:0-、-0:0->^-、-N = N-、-N(RA)-、-NH-CO-NH-、-NH-CO-、-0-、-S-、-so2-nh-、-so2-nh-n = ch-或四唑二基; R5爲可有取代之低烷基、可有取代之C3_8環烷基、 可有取代之芳基、可有取代之雜芳基或可有取代之非芳 族雜環基; R爲Η或低烷基; Υ 爲 ΝΗΟΗ 或 ΟΗ ; m爲1或2, 但Y爲NHOH時,R2爲H]。詳言之,有關下列發明a) 〜b),1)〜16),及 A)〜C)0 200403216 a)含有如下式(I)化合物、其光學活性體、或彼等之製藥 容許鹽或水合物之金屬蛋白酶阻礙劑 R1 R5 - R4-R3 - S02-N 人 COY I R2 , _ [式中R1爲可有取代之低院基、可有取代之芳基、可有 取代之芳烷基、可有取代之雜芳基或可有取代之雜芳烷 基; R2爲Η、可有取代之低烷基、可有取代之芳基、可 有取代之芳烷基、可有取代之雜芳基或可有取代之雜芳 垸基, R3爲單鍵、可有取代之伸芳基或可有取代之雜伸芳 基; R4爲單鍵、-(CH2)m-、-CH = CH-、-C三C-、-CO-、-CO-NH-、-Ν=Ν-、-N(RA)-、-NH-CO-NH-、-NH-CO-、-Ο-、-S-、-so2-nh-、-S02-NH-N = CH-或四唑二基; R5爲可有取代之低烷基、可有取代之c3.8環烷基、 可有取代之芳基、可有取代之雜芳基或可有取代之非芳 族雜環基; R爲Η或低烷基; Υ 爲 ΝΗΟΗ 或 ΟΗ ; m爲1或2, 但Y爲NHOH時,R2爲Η ; R3爲可有取代之伸芳基或 可有取代之雜伸芳基;R4爲-CO-NH-或-NH-CO-時’ R5 爲可有取代之芳基或可有取代之雜芳基;R3爲可有取 200403216 代之伸芳基或可有取代之雜伸芳基,R4爲四唑二基時 ,R5爲可有取代之芳基或司有取代之雜芳基;R3爲可 有取代之伸芳基,R4爲單鍵時’ R5爲低烷基,由低烷 基或可有取代之芳基所取代之芳基,或由低烷基或可有 取代之芳基所取代之雜芳基;R3及R4皆不爲單鍵,R3 爲可有取代之伸芳基或可有取代之雜伸芳基時,R4不 爲-〇-]。 b)係屬IV型膠原酶阻礙劑之上述金屬蛋白酶阻礙劑。 若將本發明化合物詳細說明,則可用下式(I)表示: R1R5-R4-R3-S02—N Human COY I R2 [wherein R1 is optionally substituted low alkyl, optionally substituted aryl, optionally substituted aralkyl, optionally substituted heteroaryl or may Substituted heteroaralkyl; R2 is fluorene, optionally substituted lower alkyl, optionally substituted aryl, optionally substituted aralkyl, optionally substituted heteroaryl, or optionally substituted heteroaryl compound R3 is a single bond, an optionally substituted arylene group, or a substituted heteroarylene group. R4 is a single bond,-(〇: 112) 111-,-<: 11 = (: 11-, -(: Three (:-,-<: 0-,-0: 0- > ^-, -N = N-, -N (RA)-, -NH-CO-NH-, -NH-CO -, -0-, -S-, -so2-nh-, -so2-nh-n = ch- or tetrazodiyl; R5 is optionally substituted lower alkyl, optionally substituted C3_8 cycloalkyl, May be substituted aryl, may be substituted heteroaryl or may be substituted non-aromatic heterocyclic group; R is Η or lower alkyl; Υ is ΝΗΟΗ or ΟΗ; m is 1 or 2, but Y is NHOH R2 is H]. Specifically, the following inventions a) to b), 1) to 16), and A) to C) 0 200403216 a) contain the compound of the following formula (I), an optically active substance thereof, or Their system Metal protease inhibitors that allow salts or hydrates R1 R5-R4-R3-S02-N Human COY I R2, _ [where R1 is optionally substituted low-grade, optionally substituted aryl, optionally substituted Aralkyl, optionally substituted heteroaryl or optionally substituted heteroaralkyl; R2 is fluorene, optionally substituted lower alkyl, optionally substituted aryl, optionally substituted aralkyl, may have A substituted heteroaryl or an optionally substituted heteroarylfluorenyl, R3 is a single bond, an optionally substituted aryl or an optionally substituted heteroarylene; R4 is a single bond,-(CH2) m-,- CH = CH-, -C, tri-C-, -CO-, -CO-NH-, -N = N-, -N (RA)-, -NH-CO-NH-, -NH-CO-, -Ο -, -S-, -so2-nh-, -S02-NH-N = CH- or tetrazolyl; R5 is optionally substituted lower alkyl, optionally substituted c3.8 cycloalkyl, may have A substituted aryl, a substituted heteroaryl, or a substituted non-aromatic heterocyclic group; R is Η or lower alkyl; Υ is ΝΗΟΗ or ΟΗ; when m is 1 or 2, but Y is NHOH, R2 is Η; R3 is optionally substituted arylene or optionally substituted heteroarylene; when R4 is -CO-NH- or -NH-CO-, R5 is optionally substituted aryl or may have R3 is a heteroaryl group; R3 is an optionally substituted aryl group or a substituted heteroaryl group. When R4 is a tetrazolyl group, R5 is a substituted aryl group or a substituted heteroaryl group. R3 is an optionally substituted aryl group, and R4 is a single bond. R5 is a low alkyl group, an aryl group substituted by a low alkyl group or a substituted aryl group, or a low alkyl group or a substituted aryl group. Heteroaryl substituted by aryl; both R3 and R4 are not single bonds, and R3 is not -0-] when R3 is a substituted aromatic or a substituted heteroaryl. b) The above metalloproteinase inhibitors are type IV collagenase inhibitors. If the compound of the present invention is described in detail, it can be represented by the following formula (I): R1

r5-r4 - r3-so2,^i 人 COY I R2 [式中R 1爲可有取代之低院基、可有取代之芳基、可有 取代之芳烷基、可有取代之雜芳基或可有取代之雜芳烷 基, R2爲Η、可有取代之低烷基、可有取代之芳基、可 有取代之芳烷基、可有取代之雜芳基或可有取代之雜芳 烷基; R3爲單鍵、可有取代之伸芳基或可有取代之雜伸芳 基; 114爲單鍵、_(〇:112)111-、-〇^1=^^1-、-€三0:-、-(:0-、-〇:0-]^11-…N = 、-N(RA)-、-NH-CO-NH-、-NH-CO·、-〇-、-S- 、-so2-nh-、-so2-nh-n = ch-或四唑二基; R5爲可有取代之低烷基、可有取代之C3_8環烷基、 200403216 可有取代之芳基、可有取代之雜芳基或可有取代之非芳 族雜環基; RA爲Η或低烷基; Υ 爲 ΝΗΟΗ 或 ΟΗ ; m爲1或2 ’ 但Y爲NHOH時,R2爲Η ; R3爲可有取代之伸芳基或 可有取代之雜伸芳基;R4爲-CO-NH-或-NH-CO-時,R5 爲可有取代之芳基或可有取代之雜芳基(R3爲伸苯基, R4爲-CO-NH-時,R1不爲甲基或苯基;R5不爲2-氯苯 基,4-氯苯基及2,4-二氯苯基);R3爲可有取代之伸芳 基或可有取代之雜伸芳基,R4爲四唑二基時,R5爲低 烷基,可有取代之芳基或可有取代之雜芳基;R3爲可 有取代之伸芳基,R4爲單鍵時,R5爲低烷基,由低烷 基或可有取代之芳基所取代之芳基,或由低烷基或可有 取代之芳基所取代之雜芳基;R3及R4皆不爲單鍵,R3 爲可有取代之伸芳基或可有取代之雜伸芳基時,R4不 爲。 2).如下式II化合物、其光學活性體、彼等之製藥容許 鹽或水合物r5-r4-r3-so2, ^ i human COY I R2 [wherein R 1 is optionally substituted low alkyl, optionally substituted aryl, optionally substituted aralkyl, optionally substituted heteroaryl Or optionally substituted heteroaralkyl, R2 is fluorene, optionally substituted lower alkyl, optionally substituted aryl, optionally substituted aralkyl, optionally substituted heteroaryl, or optionally substituted hetero Aralkyl; R3 is a single bond, an optionally substituted aryl group, or a substituted heteroarylene group; 114 is a single bond, _ (〇: 112) 111-, -〇 ^ 1 = ^^ 1-, -€ 3 0:-,-(: 0-, -0: 0-] ^ 11 -... N =, -N (RA)-, -NH-CO-NH-, -NH-CO ·, -〇- , -S-, -so2-nh-, -so2-nh-n = ch- or tetrazodiyl; R5 is optionally substituted lower alkyl, optionally substituted C3_8 cycloalkyl, 200403216 may be substituted Aryl, optionally substituted heteroaryl or optionally substituted non-aromatic heterocyclic group; RA is Η or lower alkyl; Υ is ΝΗΟΗ or ΟΗ; when m is 1 or 2 'but Y is NHOH, R2 is Η; R3 is a substituted arylene or a substituted heteroarylene; when R4 is -CO-NH- or -NH-CO-, R5 is a substituted aryl or a substituted hetero Aryl (R3 Is phenyl, when R4 is -CO-NH-, R1 is not methyl or phenyl; R5 is not 2-chlorophenyl, 4-chlorophenyl and 2,4-dichlorophenyl); R3 is It may have a substituted aryl group or a substituted heteroarylidene group. When R4 is a tetrazoleyl group, R5 is a lower alkyl group, and there may be a substituted aryl group or a substituted heteroaryl group. R3 is optional. Substituted aryl, when R4 is a single bond, R5 is a low alkyl group, an aryl group substituted with a low alkyl group or a substituted aryl group, or a substituted aryl group substituted with a low alkyl group or a substituted aryl group Heteroaryl; R3 and R4 are not single bonds, and R3 is not when R3 is an optionally substituted arylene or a substituted heteroarylene. 2). The compound of the formula II below, its optically active substance, Their pharmaceuticals allow salt or hydrate

[式中 R6 爲-CH = CH-、-CeC-、-N = N·、-NH-C-0-NH-、 -S-、-S02NH-或-S02-NH-N = CH·; R7爲可有取代之芳基 -10- 200403216 或可有取代之雜芳基;R8及R9各爲Η,低烷氧基或硝 基;R1、R2及Υ同前]。 3)如下式III化合物、其光學活性體、彼等之製藥容許 鹽或水合物 rb R7- R10〇>—S02-f^[Where R6 is -CH = CH-, -CeC-, -N = N ·, -NH-C-0-NH-, -S-, -S02NH- or -S02-NH-N = CH ·; R7 Is optionally substituted aryl-10-200403216 or optionally substituted heteroaryl; R8 and R9 are each fluorene, lower alkoxy or nitro; R1, R2 and fluorene are the same as before]. 3) Compounds of the following formula III, their optically active substances, their pharmaceutically acceptable salts or hydrates rb R7- R10〇 > -S02-f ^

、COY ΙΠ [式中 Ri。爲 _(CH2)m-、-CO-、-CO-NH_、-N(RA)- 、-NH-CO-, COY ΙΠ [where Ri. _ (CH2) m-, -CO-, -CO-NH_, -N (RA)-, -NH-CO-

或四唑二基;m 爲 1 或 2 ; R1、R2、R7、R8、R9、RA 及 Y同前,但R1Q爲-NH-CO-時,R1不爲甲基或苯基,R7 不爲2-氯苯基、4-氯苯基及2,4-二氯苯基]。 4)如下式IV化合物、其光學活性體、彼等之製藥容許 鹽或水合物Or tetrazolyl; m is 1 or 2; R1, R2, R7, R8, R9, RA, and Y are the same as before, but when R1Q is -NH-CO-, R1 is not methyl or phenyl, and R7 is not 2-chlorophenyl, 4-chlorophenyl and 2,4-dichlorophenyl]. 4) Compounds of the following formula IV, their optically active substances, and their pharmaceutically acceptable salts or hydrates

iX3Ls〇2-n R2iX3Ls〇2-n R2

X 义X Y

COYCOY

IVIV

[式中R11爲單鍵、-CH = CH-、或-C三C-; X爲Ο或S; R1、R2、R7 及 Y 同前]。 5)如下式Γ化合物、其光學活性體、彼等之製藥容許鹽 或水合物 r5W- so2-n[Wherein R11 is a single bond, -CH = CH-, or -C three C-; X is 0 or S; R1, R2, R7 and Y are the same as above]. 5) Compounds of the formula Γ, their optically active substances, and their pharmaceutically acceptable salts or hydrates r5W-so2-n

、COYCOY

[式中R1’爲苄基、(吲哚-3-基)甲基、(1-甲基吲哚-3-基) 甲基、(5-甲基吲哚-3-基)甲基、(5-氟吲哚-3-基)甲基、 -11 - 200403216 (1-乙醯基吲哚-3-基)甲基、(1-甲磺醯基吲哚-3-基)甲基 、(1-院氧鎖基-3-基)甲基(如乙氧鐵甲基)、或異丙基, R2’爲H、甲基、4-胺乙基或苄基;R3’爲1,4-伸苯基;R4 爲- R5爲苯基或心羥苯基;Y同前]。 6)如下式I”化合物、其光學活性體、彼等之製藥容許鹽 或水合物[Wherein R1 ′ is benzyl, (indol-3-yl) methyl, (1-methylindol-3-yl) methyl, (5-methylindol-3-yl) methyl, (5-fluoroindol-3-yl) methyl, -11-200403216 (1-ethylsulfanylindol-3-yl) methyl, (1-methylsulfonylindol-3-yl) methyl , (1-ethoxyl-3-yl) methyl (such as iron ethoxymethyl), or isopropyl, R2 'is H, methyl, 4-aminoethyl or benzyl; R3' is 1 , 4-phenylene; R4 is-R5 is phenyl or hydroxyphenyl; Y is the same as above]. 6) Compounds of the formula I ", their optically active substances, and their pharmaceutically acceptable salts or hydrates

[式中R1"爲4-噻唑甲基、(吲哚-3-基)甲基、(5-甲氧基 吲哚-3-基)甲基、1-萘甲基、2-萘甲基、4-聯苯甲基、2,2,2-三氟乙基、2-苯乙基、苄基、異丙基、4-硝苄基、4-氟 苄基、環己基甲基、(1-甲基吲.晚-3-基)甲基、(5-甲基 吲哚-3-基)甲基、(5-氟吲哚-3-基)甲基、(吡啶·4-基)甲 基、(苯駢噻唑-2-基)甲基、(苯基)(羥基)甲基、苯基、 羧甲基、2-羧乙基、羥甲基、苯甲氧甲基、4-羧苄基、 (苯駢咪唑-2-基)甲基、(1-甲磺醯基吲哚-3-基)甲基、或 (1-乙氧羰基吲哚-3-基)甲基;R2"爲H; R3"爲1,4-伸 苯基;R4”爲單鍵;R5"爲苯基、3-甲氧苯基、4-甲氧苯 基、4-甲苯基、4-第三丁苯基、4-三氟甲苯基、4-氟苯 基、4-甲硫苯基、4-聯苯基、4-噻吩基、苯駢噚唑-2-基 、苯駢噻唑-2-基或四唑-2-基;Υ同前]。 7)如下式V化合物、其光學活性體、彼等之製藥容許 鹽或水合物 200403216[Wherein R1 " is 4-thiazolylmethyl, (indol-3-yl) methyl, (5-methoxyindol-3-yl) methyl, 1-naphthylmethyl, 2-naphthylmethyl , 4-biphenylmethyl, 2,2,2-trifluoroethyl, 2-phenethyl, benzyl, isopropyl, 4-nitrobenzyl, 4-fluorobenzyl, cyclohexylmethyl, ( 1-methylind.late-3-yl) methyl, (5-methylindole-3-yl) methyl, (5-fluoroindole-3-yl) methyl, (pyridine · 4-yl ) Methyl, (benzimidazol-2-yl) methyl, (phenyl) (hydroxy) methyl, phenyl, carboxymethyl, 2-carboxyethyl, hydroxymethyl, phenoxymethyl, 4 -Carboxybenzyl, (benzimidazol-2-yl) methyl, (1-methylsulfonylindol-3-yl) methyl, or (1-ethoxycarbonylindol-3-yl) methyl R2 " is H; R3 " is 1,4-phenylene; R4 "is a single bond; R5 " is phenyl, 3-methoxyphenyl, 4-methoxyphenyl, 4-tolyl, 4- Tertiary butylphenyl, 4-trifluorotolyl, 4-fluorophenyl, 4-methylthiophenyl, 4-biphenyl, 4-thienyl, benzoxazol-2-yl, benzoxazole- 2-yl or tetrazol-2-yl; ibid.] 7) The compound of the following formula V, its optically active substance, Drug tolerance salt or hydrate 200403216

[式中 R12 爲 _CH = CH_或_Ce C_ ; Ri、R2、R7、R8 及 R9 同前]。 8)如下式VI化合物、其光學活性體、彼等之製藥容許 鹽或水合物[Where R12 is _CH = CH_ or _Ce C_; Ri, R2, R7, R8 and R9 are the same as above]. 8) Compounds of the following formula VI, their optically active substances, and their pharmaceutically acceptable salts or hydrates

[式中R2、R8及R9同前,R13爲可有取代之低烷基、可 有取代之芳基、可有取代之芳烷基、可有取代之雜芳基 或可有取代之雜芳烷基,R14爲可有取代之芳基或可有 取代之雜芳基,但R13不爲甲基或苯基;R14不爲2-氯 苯基、4-氯苯基及2,4-二氯苯基]。 9)如下式VII化合物、其光學活性體、彼等之製藥容許 鹽或水合物[Wherein R2, R8 and R9 are the same as above, and R13 is a substituted low alkyl group, a substituted aryl group, a substituted aralkyl group, a substituted heteroaryl group, or a substituted heteroaryl group Alkyl, R14 is optionally substituted aryl or optionally substituted heteroaryl, but R13 is not methyl or phenyl; R14 is not 2-chlorophenyl, 4-chlorophenyl and 2,4-di Chlorophenyl]. 9) Compounds of the following formula VII, their optically active substances, and their pharmaceutically acceptable salts or hydrates

[式中 R1、R2、R7、R8 及 R9 同前]。 10)如下式VIII化合物、其光學活性體、彼等之製藥容 許鹽或水合物 200403216[Wherein R1, R2, R7, R8 and R9 are the same as above]. 10) Compounds of the following formula VIII, their optically active substances, their pharmaceutical allowable salts or hydrates 200403216

SCVhT R2SCVhT R2

COQHCOQH

VIIIVIII

[式中R1、R2、R7及R11同前]。 11)如下式IX化合物、其光學活性體、彼等之製藥容 許鹽或水合物[Wherein R1, R2, R7 and R11 are the same as above]. 11) Compounds of the following formula IX, their optically active substances, their pharmaceutically acceptable salts or hydrates

[式中 R1、R2、R7、R8 及 R9 同前]。 1 2)如下式X化合物、其光學活性體、彼等之製藥容許 鹽或水合物[Wherein R1, R2, R7, R8 and R9 are the same as above]. 1 2) Compounds of the following formula X, their optically active substances, and their pharmaceutically acceptable salts or hydrates

[式中 R12 爲 _CH = CH_或 _Ce C-、Ri、R7、R8 及 R9 同前;]〇 [式中R8、R9、R13及R14同前,但R13不爲甲基或苯基 ,R14不爲2-氯苯基、4-氯苯基及2,4-二氯苯基]。[Where R12 is _CH = CH_ or _Ce C-, Ri, R7, R8, and R9 are the same as before;] 〇 [wherein R8, R9, R13, and R14 are the same as above, but R13 is not methyl or phenyl , R14 is not 2-chlorophenyl, 4-chlorophenyl and 2,4-dichlorophenyl].

-14- 1 3 )如下式XI化合物、其光學活性體、彼等之製藥容 2 許鹽或水合物 200403216 i4)如下式χιι化合物、其光學活性體、彼等之製藥容 許鹽或水合物-14- 1 3) Compounds of the following formula XI, their optically active substances, their pharmaceutical capacities 2 Permissible salts or hydrates 200403216 i4) Compounds of the following formula, their optically active substances, their permissible pharmaceutical salts or hydrates

[式中R1、R7、R8及R9同前;I。 1 5 )如下式X111化合物、其光學活性體、彼等之製藥容 許鹽或水合物[Wherein R1, R7, R8 and R9 are the same as above; I. 1 5) Compounds of formula X111, their optically active substances, their pharmaceutical allowable salts or hydrates

[式中R1、R7及R11同前]。 16)如下式χιν化合物、其光學活性體、彼等之製藥容 許鹽或水合物[Wherein R1, R7 and R11 are the same as above]. 16) Compounds of the formula χιν, their optically active substances, and their pharmaceutically acceptable salts or hydrates

[式中R1 ' R7、R8及R9同前]。[Wherein R1 'R7, R8 and R9 are the same as above].

S〇2-N COOH XTV 更將本發明化合物特定如下: A) !^、R1’、R1"及R13爲異丙基、苄基或(U弓丨噪小基)甲 基之上述1)〜I6)之任一化合物。 B) R5、R7及R14爲烷氧基、烷硫基或可有1或2以上取 代之苯基之上述及7)〜16)之任一化合物。 OR1、R1'、R1"及R"所鍵結之不對稱碳之組態爲R之 200403216 上述1)〜16)之任一化合物。 本發明又有關含有前述i)〜16)及A)〜c)之化合物之 醫藥組成物、金屬蛋白酶及1v型膠原酶。 前述1)〜16)及A)〜C)化合物均有強力金屬蛋白酶阻 礙活性,尤宜如下式I化合物。 R1S〇2-N COOH XTV further specifies the compounds of the present invention as follows: A)! ^, R1 ', R1 " and R13 are the above 1) ~ I6). B) R5, R7 and R14 are any one of the above and 7) to 16) which are an alkoxy group, an alkylthio group or a phenyl group which may be substituted by 1 or 2 or more. OR1, R1 ', R1 ", and R " are bonded to the asymmetric carbon configuration of R 200403216 any one of the above 1) to 16). The present invention also relates to a medicinal composition, a metalloproteinase, and a type 1v collagenase containing the aforementioned compounds i) to 16) and A) to c). The aforementioned 1) to 16) and A) to C) compounds have potent metalloproteinase inhibitory activity, and the compounds of the following formula I are particularly preferred. R1

R5-R4-R3-S〇2_N 人 COY I R2 1) 111爲異丙基、;基或(〇弓丨卩朵-3 -基)甲基’ R2爲H’ R3 爲1,4-伸苯基,R4爲- CeC-,R5爲可有取代之苯基。 2) 111爲異丙基、苄基或(吲哚-3-基)甲基,R2爲H’ R3 爲可有取代之2,5-硫苯二基,R4爲-C三C-,R5爲可有 取代之苯基。 3)111爲異丙基、苄基或(吲哚-3 _基)甲基,R2爲Η ’ R3 爲1,4-伸苯基,R4爲四唑二基,R5爲可有取代之苯基 本文中「烷基」乃指直或分枝烷基’如甲基、 乙基、正丙基、異丙基、正丁基、異丁基、第二丁基、 第三丁基、正戊基、異戊基、新戊基、第三戊基等。 「低烷基」乃指直或分枝烷基,如甲基、乙基、 正丙基、異丙基、正丁基、異丁基、第二丁基’第三丁 基等。 「C3.8環烷基」可爲環丙基、環丁基、環戊基、環己 基、環庚基等。 「芳基」乃指單環或稠合環芳族烴,如苯基、萘基等 -16- 200403216 「芳烷基」乃指前述烷基上取代前述芳基,可鍵結在 任何可取代之位置。例如苯基、苯乙基、苯丙基(如3_苯 丙基)、萘甲基(如α -萘甲基)、蒽甲基(如^蒽甲基)等 ’其中宜;基。這些芳基部分可有任意取代基。 「雜芳基」爲環內有1個以上任意選自〇、之 原子且可稠合碳環或其他雜環之5〜6員芳環,這&可 鍵結在任何可取代之位置。例如吡咯基(如—i _啦略基) 、吲哚基 (如2-吲哚基)、咔唑基(如3_咔唑基)、咪唑基(如‘咪唑 基)、吡唑基(如1-吡唑基)、苯駢咪唑基(如苯駢咪唑 基)、吲唑基(如3-吲唑基)、吲畊基(如6_吲畊基)、吡 啶基(如4 -吡啶基)、喹啉基(如5 -喹啉基 >、異喹啉基( 如3-異喹啉基)、吖啶基(如1-吖啶基)、啡啶基(如2_啡 啶基)、嗒畊基(如3-嗒畊基)、嘧啶基(如4_嘧啶基)、 吡畊基(如2-吡畊基)、哮啉基(如3-B幸啉基)、吠畊基( 如2·呔哄基)、喹啉基(如2-喹啉基)、異噚唑基(如3-異 噚唑基)、苯駢異噚唑基(如3-苯駢異噂唑基)、噚唑基( 如2-噚唑基)、苯駢噚唑基(如2-苯駢噚唑基)、苯駢噚 二唑基(如4-苯駢噚二唑基)、異噻唑基(如3-異噻唑基) 、苯駢異噻唑基(如2-苯駢異噻唑基)、噻唑基(如2-噻 唑基)、苯駢噻哇基(如2-苯駢噻唑基)、呋喃基(如3-呋 喃基)、苯駢呋喃基(如3-苯駢呋喃基)、噻吩基(如2_噻 吩基)、苯駢噻吩基(如2-苯駢噻吩基)、四11坐基等。這 •17- 200403216 些之芳基部分可有任意取代基。 「雜芳院基」乃指前述烷基之任意位置上取代前述雜 芳基,這些可在任何取代之位置鍵結。例如噻唑甲基( 如4 -噻唑甲基)、噻唑乙基(如5 _噻唑-2 _乙基)、呵晚甲 基(如2-吲哚甲基)、咪唑甲基(如咪唑甲基)、苯駢噻 11坐甲基(如2-苯駢噻唑甲基)、苯駢吡唑甲基(如卜苯駢 口比哩甲基)、苯駢三唑甲基(如4 _苯駢三唑甲基)、苯駢 喹啉甲基(如2 -苯駢喹啉甲基)、苯駢咪唑甲基(如2 _苯 駢咪唑甲基)、嘧啶甲基(如2-嘧啶甲基)等。這些之芳 基部分可有任意取代基。 「伸芳基」可爲如伸苯基、伸萘基,詳言之,如i,2_ 伸苯基、1,3-伸苯基、1,4-伸苯基等。 「雜伸芳基」可爲如噻吩二基、呋喃二基、吡啶二基 等’詳言之,2,5-噻吩二基、2,5-呋喃二基等。 「非芳族雜環基」乃指環內含1個以上任意選自〇、 S或N之原子之非芳族5〜6員環,這些可鍵結於任何 可取代之位置,如嗎啉基、哌啶基、吡略啶基等。 『烷氧基」乃指烷基部分爲前述烷基者,如甲氧基、 乙氧基、丙氧基、丁氧基、戊氧基等。 「低烷氧基」乃指烷基部分爲前述低烷基者,例如甲 氧基、乙氧基、正丙氧基、異丙氧基、正丁氧基、異丁 氧基、第二丁氧基、第三丁氧基等。 「鹵素」乃指氯、碘:、溴及碘。 「烷硫基」乃指烷基部分爲前述低烷基者,例如甲硫 -18- 200403216 基、乙硫基等。 「可有取代之烷基」、「可有取代之c 3 _ 8環烷基」 或「可有取代之非芳族雜環基」中取代基可爲羥基、院 氧基(如甲氧基、乙氧基)、氫硫基、烷硫基(如甲硫基) 、環烷基(如環丙基、環丁基、環戊基、環己基)、齒素 (如氟、氯、溴、碘)、羧基、烷氧羰基(如甲氧羰基、 乙氧羰基)、硝基、氰基、鹵烷基(如三氟甲基)、取代 或未取代胺基(如甲胺基、二甲胺基、胺甲醯胺基)、胍 基、苯基、苄氧基等。這些均在可取代之位置有1個以 上。 「可有取代之芳基」、「可有取代之芳烷基」、「可 有取代之雜芳基」、「可有取代之雜芳烷基」、「可有 取代之伸芳基」及「可有取代之雜伸芳基」中芳環上之 取代基可爲例如羥基、烷氧基(如甲氧基、乙氧基)、氫 硫基、烷硫基(如甲硫基)、環烷基(如環丙基、環丁基 、環戊基)、鹵素(如氟、氯、溴、碘)、羧基、烷氧羰 基(如甲氧羰基、乙氧羰基)、硝基、氰基、鹵烷基(如 Ξ氟甲基)、芳氧基(如苯氧基)、取代或未取代胺基(如 甲胺基、二甲胺基、二乙胺基、亞苄胺基)、胍基、烷 基(如甲基、乙基、·正丙基、異丙基、正丁基、異丁基 、第二丁基、第三丁基、正戊基、異戊基、新戊基、第 Η戊基)、烯基(如乙烯基、丙烯基)、炔基(如乙炔基、 苯乙炔基)、烷醯基(如甲醯基、乙醯基、丙醯基)、醯 氧基(乙醯氧基)、醯胺基、烷磺醯基(如甲磺醯基)、苯 -19- 200403216 基、苄基、偶氮基(如苯偶氮基)、可有取代之雜芳基( 如3 -吡啶基)、可有取代之脲基(如脲基、苯脲基)等。 這些可在任何可能位置取代1個以上。 【實施方式】 本發明化合物(la)及(lb)可以呈式(χν)之對應α -胺基 酸爲原料’依如下6種合成法製造。一般依Α法可含 本發明,但也可依類型而用B〜F來合成。但這些僅爲 化合物(I)之製法之一例,依其他方法製造之化合物(ί) 也包括在本發明範圍內。 Α法:全化合物(I)之合成法 B法:R3爲可有取代之伸芳基或可有取代之雜伸芳基 ’ R4爲- CDC·,R5爲可有取代之芳基或可有取代之雜芳 基之化合物之合成法。 C法:R3爲可有取代之伸芳基或可有取代之雜伸芳基 ,R4爲單鍵,R5爲可有取代之芳基或可有取代之雜芳 基之化合物之合成法。 D法:R3爲可有取代之伸芳基或可有取代之雜伸芳 基,R4爲-CO-NH-,R5爲可有取代之芳基或可有取代之 雜芳基之化合物之合成法。 E法:R3爲可有取代之伸芳基或可有取代之雜伸芳基 ,R4爲四D坐二基,R5爲可有取代之芳基或可有取代之 雜芳基之化合物之合成法。 F法:R3爲可有取代之伸芳基或可有取代之雜伸芳s ,R4爲-CO-NH-,R5爲可有取代之芳基或可有取代之雜 200403216 芳基之化合物之合成法 么么i羊述迨些方法。 (A法) X R1 H2N __^r5_r4_r3.s〇2.nAc〇 R5-R4~R3-S02-Hal R2 —— lad T <第2製程 e ? N C〇NH〇H + R2 lb-1 + R5- R4- R3 - s〇2 "人R5-R4-R3-S〇2_N Human COY I R2 1) 111 is isopropyl, phenyl, or (〇 archer 3-methyl) methyl 'R2 is H' R3 is 1,4-phenylene R4 is -CeC-, and R5 is optionally substituted phenyl. 2) 111 is isopropyl, benzyl or (indol-3-yl) methyl, R2 is H 'R3 is optionally substituted 2,5-thiophenyldiyl, R4 is -CtriC-, R5 Is optionally substituted phenyl. 3) 111 is isopropyl, benzyl or (indol-3-yl) methyl, R2 is Η 'R3 is 1,4-phenylene, R4 is tetrazolyl, R5 is optionally substituted benzene "Alkyl" in the basic text refers to straight or branched alkyl 'such as methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, second butyl, third butyl, n-pentyl Base, isopentyl, neopentyl, third pentyl and the like. "Low alkyl" means a straight or branched alkyl group such as methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, second butyl ', third butyl, and the like. "C3.8 cycloalkyl" may be cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, and the like. "Aryl" refers to monocyclic or fused ring aromatic hydrocarbons, such as phenyl, naphthyl, etc. 16-200403216 "Aralkyl" refers to the aforementioned alkyl substituted for the aforementioned aryl, which can be bonded to any substitutable Its location. For example, phenyl, phenethyl, phenylpropyl (such as 3-phenylpropyl), naphthylmethyl (such as α-naphthylmethyl), anthracene methyl (such as ^ anthrylmethyl) and the like are preferred. These aryl moieties may have any substituents. A "heteroaryl" is a 5- to 6-membered aromatic ring having one or more atoms selected from 0, and which can be fused to a carbocyclic or other heterocyclic ring, which can be bonded at any substitutable position. For example, pyrrolyl (such as -i-laloryl), indolyl (such as 2-indolyl), carbazolyl (such as 3-carbazolyl), imidazolyl (such as' imidazolyl), and pyrazolyl ( Such as 1-pyrazolyl), benzimidazolyl (such as benzimidazolyl), indazolyl (such as 3-indazolyl), indyl (eg 6-indazo), pyridyl (eg 4- Pyridyl), quinolinyl (such as 5-quinolinyl), isoquinolinyl (such as 3-isoquinolinyl), acridinyl (such as 1-acridyl), morphinyl (such as 2_ Morphinyl), daphthyl (such as 3-daphyl), pyrimidinyl (such as 4-pyrimidyl), pyrimidinyl (such as 2-pyrimidyl), oxolinyl (such as 3-B oxolinyl) ), Crotyl (such as 2 · hydrazine), quinolinyl (such as 2-quinolinyl), isoxazolyl (such as 3-isoxazolyl), phenylhydrazine (such as 3- Benzazolyl), oxazolyl (such as 2-oxazolyl), benzoxazolyl (such as 2-benzoxazolyl), benzoxazolyl (such as 4-benzoxazolyl) Oxazolyl), isothiazolyl (such as 3-isothiazolyl), benzoxazoisothiazolyl (such as 2-phenyloxaisothiazolyl), thiazolyl (such as 2-thiazolyl), benzothiazolyl (Such as 2-phenylthiothiazolyl), furanyl (such as 3-furanyl), benzofluorenyl (such as 3-phenylfluorenylfuranyl), thienyl (such as 2-thienyl), and phenylfluorenyl (such as 2-thienyl) 2-phenylfluorenyl thienyl), tetra- 11-phenyl group, etc. This • 17- 200403216 Some of these aryl moieties may have any substituents. "Heteroaryl group" refers to the substitution of the aforementioned heteroaryl group at any position of the aforementioned alkyl group These can be bonded at any substituted position. For example, thiazolylmethyl (such as 4-thiazolylmethyl), thiazolylethyl (such as 5-thiazole-2_ethyl), late methyl (such as 2-indolemethyl) Group), imidazolium methyl (such as imidazolyl methyl), benzoxazine 11 methyl (such as 2-benzoxazolium methyl), benzimidazole methyl (such as benzophenone methyl), benzene Tristriazolium methyl (such as 4- benzoxazolium methyl), phenacinoquinoline methyl (such as 2-benzoxaquinolinemethyl), benzimidazolyl methyl (eg 2_benzimidazolyl methyl) , Pyrimidinylmethyl (such as 2-pyrimidinylmethyl), etc. The aryl part of these may have any substituent. "Aryl" may be, for example, phenyl, or naphthyl, in particular, such as i, 2_ Phenyl, 1,3-phenylene 1,4-phenylene, etc. The "heterophenylene" may be, for example, thiophene diyl, furan diyl, pyridine diyl, etc. In detail, 2,5-thiophene diyl, 2,5-furandiyl "Non-aromatic heterocyclic group" refers to a non-aromatic 5 to 6-membered ring with one or more atoms selected from 0, S or N in the ring. These can be bonded at any substitutable position. Phenyl, piperidinyl, pyrrolidinyl, etc. "Alkoxy" refers to those in which the alkyl moiety is the aforementioned alkyl, such as methoxy, ethoxy, propoxy, butoxy, pentyloxy, etc. "Low alkoxy" means those whose alkyl moiety is the aforementioned low alkyl, such as methoxy, ethoxy, n-propoxy, isopropoxy, n-butoxy, isobutoxy, second Butoxy, tertiary butoxy and the like. "Halogen" means chlorine, iodine :, bromine and iodine. "Alkylthio" refers to those in which the alkyl moiety is the aforementioned low alkyl, such as methylthio-18-200403216, ethylthio, and the like. The substituents in the "optionally substituted alkyl group", "optionally substituted c 3 -8 cycloalkyl group" or "optionally substituted non-aromatic heterocyclic group" may be a hydroxyl group or an oxy group (such as a methoxy group) , Ethoxy), hydrogenthio, alkylthio (such as methylthio), cycloalkyl (such as cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl), halide (such as fluorine, chlorine, bromine) , Iodine), carboxyl, alkoxycarbonyl (such as methoxycarbonyl, ethoxycarbonyl), nitro, cyano, haloalkyl (such as trifluoromethyl), substituted or unsubstituted amino (such as methylamino, Methylamino, carbamoyl), guanidino, phenyl, benzyloxy and the like. There are more than one of these in the replaceable position. "Optionally substituted aryl", "optionally substituted aralkyl", "optionally substituted heteroaryl", "optionally substituted heteroaralkyl", "optionally substituted aryl", and The substituent on the aromatic ring in the "optionally substituted heteroarylene" may be, for example, a hydroxyl group, an alkoxy group (such as a methoxy group, an ethoxy group), a hydrogenthio group, an alkylthio group (such as a methylthio group), Cycloalkyl (such as cyclopropyl, cyclobutyl, cyclopentyl), halogen (such as fluorine, chlorine, bromine, iodine), carboxyl, alkoxycarbonyl (such as methoxycarbonyl, ethoxycarbonyl), nitro, cyanide Group, haloalkyl (such as fluorenylmethyl), aryloxy (such as phenoxy), substituted or unsubstituted amino (such as methylamino, dimethylamino, diethylamino, benzylidene) , Guanidino, alkyl (such as methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, second butyl, third butyl, n-pentyl, isopentyl, neo Pentyl, pentamyl), alkenyl (such as vinyl, propenyl), alkynyl (such as ethynyl, phenylethynyl), alkyl fluorenyl (such as formamyl, ethenyl, propionyl), Ethoxy (ethoxy), Fluorenylamino, alkylsulfonyl (such as methylsulfonyl), benzene-19-200403216, benzyl, azo (such as phenylazo), optionally substituted heteroaryl (such as 3-pyridyl) ), There may be substituted ureido (such as ureido, phenylureido) and so on. These can replace more than one at any possible position. [Embodiment] The compounds (la) and (lb) of the present invention can be produced by the corresponding α-amino acid of formula (χν) as a raw material 'according to the following six synthesis methods. Generally, the present invention can be incorporated according to the A method, but it can also be synthesized from B to F depending on the type. However, these are only examples of the production method of the compound (I), and the compounds (ί) produced by other methods are also included in the scope of the present invention. Method A: Synthetic method of the whole compound (I) Method B: R3 is an optionally substituted arylene group or an optionally substituted heteroarylene group. R4 is-CDC ·, and R5 is an optionally substituted aryl group or an optionally substituted aryl group. Synthesis of substituted heteroaryl compounds. Method C: A synthetic method in which R3 is a substituted arylene group or a substituted heteroarylene group, R4 is a single bond, and R5 is a substituted aryl group or a substituted heteroaryl group. Method D: Synthesis of compounds where R3 is optionally substituted aryl or optionally substituted heteroarylene, R4 is -CO-NH-, and R5 is optionally substituted aryl or substituted heteroaryl law. Method E: R3 is a substituted aryl or a substituted heteroarylated aryl, R4 is a tetra-D-diphenyl group, and R5 is a substituted aryl or a substituted heteroaryl compound law. Method F: R3 is a substituted arylene or a substituted heteroarylene s, R4 is -CO-NH-, R5 is a substituted aryl or a substituted 200403216 aryl compound Synthetic method Mody i sheep described some methods. (Method A) X R1 H2N __ ^ r5_r4_r3.s〇2.nAc〇R5-R4 ~ R3-S02-Hal R2 —— lad T < 2nd process e? NC〇NH〇H + R2 lb-1 + R5 -R4- R3-s〇2 " person

製程,R5-R4-R3-S〇4人CONH〇Ffc?上製程丨 R2 XVi (式中R1〜R5同前,R!5爲H或羧基保護基,Rl0爲羥基 保護基,H a 1爲鹵素)。Process, R5-R4-R3-S〇4 human CONH〇Ffc? On the process 丨 R2 XVi (where R1 ~ R5 are the same as before, R! 5 is H or carboxy protecting group, R10 is hydroxyl protecting group, H a 1 is halogen).

從化合物(XV)至化合物)之反應爲將化合物(χν) 之胺基予以磺醯化之反應(第1製程),必要時反應後, 去除羧基保護基,進行Ν-烷基化等。從化合物(^―:^至 化合物(Ib-1)之反應爲將羧基予以羥肟酸化之反應(第2 製程)。從化合物(Ia-Ι)至化合物(Ib-Ι)可令化合物(Ia-l) 與具有羥基保護基之羥胺或其酸加成鹽反應而得化合物 (XVI)(第3製程),然後予以脫保護反應(第4製程)。磺 醯化及羥肟酸反應可依常法進行。例如令胺基酸(XV) 在鹼之存在下與磺醯化試劑,如R5-R4-R3-S02Hal(R3、R4 及R5同前,Hal =鹵素)之磺醯鹵等反應後,與羥胺反應 -21 - 200403216 。各製程詳述如下。 (第1製程) 原料呈式(XV)胺基酸或其酸加成鹽(如鹽酸鹽,對甲 苯磺酸鹽,三氟乙酸鹽)之部分可以市售品購得。其他 可依實驗化學講座22卷,第4版(日本化學會編)之胺 基酸合成法,J. Med. Chem. 38,1689-1700(1995) GaryM. Ksander et· al·等來合成。又磺醯化試劑(如磺醯鹵)之 一部分可市購,其他可依新實驗化學講座1 4卷1 7 8 7頁 (1 978) » Synthesis 852-854(1 986) » Tatsuo Hamada et. al. 等合成。被保護羧基可例如酯(如甲酯、第三丁酯、苄 酯)化之羧基。這些保護基之脫離可依保護基而在酸(如 鹽酸 '三氟乙酸)或鹼(如NaOH等)之存在下水解,或 觸媒還原(如10 %Pd/C觸媒之存在下)實施,但欲得化合 物(Ib-Ι),亦可就酯進行第2製程之羥肟酸化。磺醯化 反應之溶劑在化合物(XV)中R15爲Η之胺基酸時,宜二 甲基甲醯胺、四氫呋喃、二噚烷、二甲亞碾、乙腈、水 或其混液,但R15爲保護基之酯體時,可用其他水不溶 性溶劑(如苯,二氯甲烷)與上述溶劑之混合溶劑。用於 磺醯化反應之鹼可爲三乙胺、Ν ·甲基嗎啉等有機鹼,或 如NaOH、ΚΟΗ,碳酸鉀等無機鹼等。反應溫度一般爲 冰冷〜室溫。若化合物(la - 1 )中R1、R2、R3、R4、R5或 R 15具有阻礙磺醯化之取代基(如羥基、氫硫基、胺基、 狐基)之基時’依 Protective Gronps in Organic Synthesis, Theodora W Green(John Wiley & Sons)等之方法預先保 -22- 200403216 護’而在所望階段去除此保護基即可。又若R2不爲Η 時’更在二甲基甲醯胺,四氫呋喃,二噚烷等溶劑中, 於冰冷〜8 0 °c ’宜冰冷〜室溫加烷基鹵(如甲基碘、乙 基碘等),芳烷基鹵(如苄基氯,苄基溴等)而攪拌3〜30 小時,宜10〜20小時,得所求之N-R2體。 (第2製程) 羥肟酸(Ib-Ι)可由羥胺與化合物Ua-i)或其反應性衍 生物反應來製造,羥胺一般將其酸加成鹽(如鹽酸鹽, 磷酸鹽’硫酸鹽,可市購)在鹼之存在下供反應。鹼可 爲三乙胺、Ν,Ν·二甲苯胺、N-甲基嗎啉等有機鹼,或 如NaOH、ΚΟΗ、碳酸鉀等無機鹼。化合物(Ia-Ι)就此 供爲羥肟酸化之原料時,在胜肽縮合試劑(如二環己基 碳化二亞胺、1-乙基- 3-(3-二甲胺丙基)碳化二亞胺、 N,N’-羰基二咪唑或其任一與1-羥基苯駢三唑、N-羥基 丁二醯亞胺等之混合物)等之存在下反應。溶劑可用二 甲基甲醯胺、四氫呋喃、二噚烷、二甲亞楓、乙腈、水 或其混液,反應溫度爲-2 0〜4 0 °C,宜冰冷〜室溫,反 應時間爲1〜1 6小時。 化合物(la-1)之反應性衍生物可用酐(尤其混合酐), 酸鹵化物,醯基疊氮或酯。這些之反應性衍生物可依一 般方法製造,而酐可例如化合物(la-1)在鹼(如三乙胺) 之存在下與酸鹵化物(如氯碳酸乙酯)反應,酸鹵化物可 例如令化合物(la-1)與鹵化試劑(如草醯氯,亞磺醯氯) 反應來製造。 -23- 200403216 酯可從惰性酯或活性酯選擇。惰性酯可在第1製程化 合物(XV)中R5爲羧基保護基(如甲基、第三丁基、苄基) 者’就磺醯化生成物不予脫保護而使用即可,活性酯可 令化合物(la-1)與碳化二亞胺(如二環己基碳化二亞胺、 1 -乙基-3 - ( 3 -二甲胺丙基)碳化二亞胺及1 -羥基苯駢三唑 或N-羥基丁二醯亞胺等活性酯殘基所對應之羥基體反 應來製造。化合物(la-1)之反應性衍生物之羥肟酸化之 反應條件可如同就此用化合物(la- 1)時之羥肟酸化。又 第1及2製程之反應亦可以單一反應槽進行。 (第3製程) 所用被保護羥胺可爲如0-苄基羥胺、0-(對甲氧苄基) 羥胺、〇-(第三丁基)羥胺等。反應條件可如同第2製程 者。 (第4製程) 藉氫大氣下觸媒還原,或以濃鹽酸或三氟乙酸之處理 而去除保護基’得所求之式(Ib-Ι)化合物。所得本發明 化合物(la-1)及(Ib-Ι)可由習知之分離及精製手段(如層 析,結晶化法等)來單離精製。 24- 200403216 (B法) 第2製程 H2n^coor15JI1技,)Rl7-S(Vij 义 C00R15The reaction from the compound (XV) to the compound) is a reaction in which the amine group of the compound (χν) is sulfonated (first process). After the reaction, if necessary, the carboxy protecting group is removed, and N-alkylation is performed. The reaction from the compound (^ ―: ^ to the compound (Ib-1) is a reaction in which the carboxyl group is hydroxamicated (the second process). From the compound (Ia-1) to the compound (Ib-1), the compound (Ia -l) The compound (XVI) is obtained by reacting with hydroxylamine or an acid addition salt thereof having a hydroxyl protecting group (the third process), and then subjected to a deprotection reaction (the fourth process). The sulfonation and the hydroxamic acid reaction can be performed according to It can be carried out by conventional methods. For example, an amino acid (XV) can be reacted with a sulfonating reagent such as R5-R4-R3-S02Hal (R3, R4 and R5 are the same as before, and Hal = halogen) in the presence of a base. After that, it reacts with hydroxylamine-21-200403216. Each process is described in detail below. (First process) The raw material is an amino acid of formula (XV) or an acid addition salt thereof (such as hydrochloride, p-toluenesulfonate, trifluoro Acetate) is commercially available. Others can be found in the Amino Acid Synthesis Method of Experimental Chemistry Lecture 22, 4th Edition (edited by the Chemical Society of Japan), J. Med. Chem. 38, 1689-1700 (1995 ) GaryM. Ksander et · al · etc. to synthesize. And some of the sulfonation reagents (such as sulfonium halide) are commercially available, others can be based on the new experimental chemistry lectures 1 4 volume 1 7 8 7 (1 978) »Synthesis 852-854 (1 986)» Synthesis by Tatsuo Hamada et. Al. Etc. The protected carboxyl group can be, for example, an carboxyl group of an ester (such as methyl ester, third butyl ester, benzyl ester). These protective groups The detachment can be carried out by hydrolysis in the presence of an acid (such as hydrochloric acid 'trifluoroacetic acid) or a base (such as NaOH, etc.), or by catalytic reduction (such as the presence of a 10% Pd / C catalyst). For compound (Ib-1), hydroxamation of the ester in the second process is also possible. When the solvent of the sulfonation reaction is R15 in the compound (XV), dimethylformamide and tetrahydrofuran are preferred. , Dioxane, dimethyl arylene, acetonitrile, water or a mixture thereof, but when R15 is an ester of a protecting group, a mixed solvent of other water-insoluble solvents (such as benzene, methylene chloride) and the above solvents can be used. The base of the tritiation reaction may be an organic base such as triethylamine, N-methylmorpholine, or an inorganic base such as NaOH, KOH, potassium carbonate, etc. The reaction temperature is generally from ice cold to room temperature. If the compound (la-1) R1, R2, R3, R4, R5 or R 15 has a substituent (such as a hydroxyl group, a hydrogen thio group, an amine group, Fox base) base time 'Protective Gronps in Organic Synthesis, Theodora W Green (John Wiley & Sons) and other methods to protect in advance-22-200403216' and remove this protective group at the desired stage. If R2 does not For Η ', more in dimethylformamide, tetrahydrofuran, dioxane and other solvents, add ice halides ~ 80 ° C, and add alkyl halides (such as methyl iodide, ethyl iodide, etc.) at room temperature. Aralkyl halide (such as benzyl chloride, benzyl bromide, etc.) and stirred for 3 to 30 hours, preferably 10 to 20 hours, to obtain the desired N-R2 body. (Second process) Hydroxamic acid (Ib-1) can be produced by reacting hydroxylamine with compound Ua-i) or a reactive derivative thereof. Hydroxylamine is generally an acid addition salt (such as hydrochloride, phosphate 'sulfate). , Commercially available) for reaction in the presence of a base. The base may be an organic base such as triethylamine, Ν, Ν · xylylamine, or N-methylmorpholine, or an inorganic base such as NaOH, KOH, or potassium carbonate. When the compound (Ia-1) is provided as a hydroxamation raw material, the peptide condensing reagent (such as dicyclohexylcarbodiimide, 1-ethyl-3- (3-dimethylaminepropyl) carbodiimide Amine, N, N'-carbonyldiimidazole or a mixture of any of them with 1-hydroxybenzotriazole, N-hydroxysuccinimide, etc.) and the like. As the solvent, dimethylformamide, tetrahydrofuran, dioxane, dimethylarsine, acetonitrile, water, or a mixture thereof can be used. The reaction temperature is -2 0 to 4 ° C, preferably ice-cooled to room temperature, and the reaction time is 1 to 16 hours. The reactive derivative of the compound (la-1) may be an anhydride (especially a mixed anhydride), an acid halide, a fluorenyl azide, or an ester. These reactive derivatives can be produced according to a general method, and the anhydride can be reacted, for example, with compound (la-1) in the presence of a base (such as triethylamine) with an acid halide (such as ethyl chlorocarbonate). For example, the compound (la-1) is produced by reacting with a halogenating agent (such as chloramphonium chloride, sulfenylchloride). -23- 200403216 Ester can be selected from inert or active ester. The inert ester can be used in the first process compound (XV) where R5 is a carboxyl protecting group (such as methyl, third butyl, or benzyl), and the sulfonated product may be used without deprotection. The active ester may be Let compound (la-1) and carbodiimide (such as dicyclohexylcarbodiimide, 1-ethyl-3-(3-dimethylaminepropyl) carbodiimide and 1-hydroxybenzotriazole Or N-hydroxysuccinimide and other active ester residues corresponding to the hydroxyl group reaction to produce. The reaction conditions for the hydroxamation of the reactive derivative of the compound (la-1) can be the same as the compound (la-1) Hydroxamic acidification at the same time. The reactions in the first and second processes can also be carried out in a single reaction tank. (The third process) The protected hydroxylamine used can be, for example, 0-benzylhydroxylamine, 0- (p-methoxybenzyl) hydroxylamine. 〇- (third butyl) hydroxylamine, etc. The reaction conditions can be the same as those in the second process. (The fourth process) The reduction of the protective group by catalytic reduction under hydrogen atmosphere or treatment with concentrated hydrochloric acid or trifluoroacetic acid. The desired compound of formula (Ib-1). The obtained compounds (la-1) and (Ib-1) of the present invention can be isolated and purified by conventional means (such as chromatography , Crystallization method, etc.) to separate purification. 24- 200403216 (Method B) 2nd process H2n ^ coor15JI1 technology,) Rl7-S (Vij meaning C00R15

XYXY

XVII R1 , . R1 R7-CHG-R17-S02-N人COOR15 胃 3 ^程一 R7-CsC-R17-S02-N CO〇H H , ·ή2 XVIII 1^2 第4製程^ r7-csc-r17- S02-N Ibr2 人XVII R1,. R1 R7-CHG-R17-S02-N Human COOR15 Stomach 3 ^ Process 1 R7-CsC-R17-S02-N CO〇HH, · Price 2 XVIII 1 ^ 2 4th Process ^ r7-csc-r17- S02-N Ibr2 people

CONHOK (式中R1、R2、R7、R5及Hal同前,R17爲可有取代之 芳基或可有取代之雜芳基)。 從化合物(XV)至化合物(XVII)之反應爲將化合物(XV) 之胺基予以磺醯化之反應(第1製程),可仿A法之第1 製程。從化合物(XVII)至化合物(XVIII)之反應乃以R17 之鹵取代基爲踏腳板而用Heck反應(K. Sonogashira,Y. Tohda,and N. Hagihara,Tetrahedron Lett·,4467(1975) 等)導入三鍵之反應(第2製程)。從化合物(XV III)至化 合物(la-2)之反應爲化合物(XVIII)之N-烷基化等或去除 羧基保護基之反應(第3製程),可仿A法第1製程。從 化合物(la-2)至(lb-2)之反應爲將羧酸衍生物轉換爲羥 肟酸衍生物之反應(第4製程),可仿A法第2〜4製程 進行,各製程詳述如下。 (第1製程) 可仿A法第1製程進行。 -25- 200403216 (第2製程) 將化合物(XVIII)在二甲基甲醯胺、甲苯、二甲苯、 苯、四氫呋喃等溶劑中,有Pd觸媒(如卩(1(?113?)20:12等) 、2價銅試劑(如Cul等)、有機鹼(如三乙胺、二異丙基 乙胺等)之存在下、與有乙炔苯等乙炔基之可有取代之 芳基或可有取代之雜芳基衍生物反應(Heck反應)而轉 變成目的物(XVIII)。反應溫度爲室溫〜1〇〇 °C,宜室溫 〜8 0 °C,反應時間爲3〜3 0小時,宜1 0〜2 0小時。可 有取代之芳基或可有取代之雜芳基衍生物若有阻礙本反 應之取代基時,可依 Protective GrouPs in 0rganic Synthesis,Theodora W Green (John Wiley & Sons)等之方法預先保護,而在所望階段 去除保護基。 (第3製程) 可仿A法第1製程進行。 (第4製程) 可仿A法第2〜4製程進行。 (C法) R1 · , R1 (Hal-)R17-S02-[j人COOR15 兔1 翌_ R7-R17-S02^人COOR15CONHOK (wherein R1, R2, R7, R5 and Hal are the same as before, and R17 is an optionally substituted aryl group or an optionally substituted heteroaryl group). The reaction from the compound (XV) to the compound (XVII) is a reaction in which the amine group of the compound (XV) is sulfonated (first process), and can be modeled after the first process of the A method. The reaction from compound (XVII) to compound (XVIII) is a Heck reaction using the halogen substituent of R17 as a stepping board (K. Sonogashira, Y. Tohda, and N. Hagihara, Tetrahedron Lett., 4467 (1975), etc.) Introduction of triple bond reaction (2nd process). The reaction from compound (XV III) to compound (la-2) is the N-alkylation of compound (XVIII), etc., or the reaction of removing the carboxy protecting group (the third process), which can imitate the first process of method A. The reaction from compounds (la-2) to (lb-2) is a reaction to convert a carboxylic acid derivative to a hydroxamic acid derivative (the fourth process), which can be performed in the same manner as the second to fourth processes of the A method, and each process is detailed As described below. (First process) It can be performed in the same manner as the first process of Method A. -25- 200403216 (2nd process) Compound (XVIII) in a solvent such as dimethylformamide, toluene, xylene, benzene, tetrahydrofuran, etc., with a Pd catalyst (such as 卩 (1 (? 113?) 20: 12 etc.), divalent copper reagents (such as Cul, etc.), organic bases (such as triethylamine, diisopropylethylamine, etc.), and optionally substituted aryl or The substituted heteroaryl derivative is reacted (Heck reaction) to be converted into the target compound (XVIII). The reaction temperature is from room temperature to 100 ° C, preferably from room temperature to 80 ° C, and the reaction time is 3 to 30. Hours, preferably 10 to 20 hours. If there is a substituted aryl or a substituted heteroaryl derivative that has a substituent that hinders the reaction, follow the steps of Protective GrouPs in 0rganic Synthesis, Theodora W Green (John Wiley & Sons) and other methods to protect in advance and remove the protecting group at the desired stage. (3rd process) It can be performed in the same way as the first process of the A method. (4th process) It can be performed in the same way as the 2nd to 4th methods of the A method. (C Method) R1 ·, R1 (Hal-) R17-S02- [j 人 COOR15 Rabbit 1 翌 _ R7-R17-S02 ^ Human COOR15

m XIX R1 R1m XIX R1 R1

第 2 製R7_Ri7_sc^ COOH_隻·3 给程-R7—r17一s〇2-N人CONHOH R2 R22nd system R7_Ri7_sc ^ COOH_only · 3 give process-R7-r17-s〇2-N people CONHOH R2 R2

Ib^ (式中 R1、R2、R7、R15、R17 及 Hal 同前)。 -26- 200403216 從化合物(XVII)至(XIX)之反應乃以R17之鹵取代羰 爲踏腳板而用鈴木反應(M. J. Sharp and V· Snieckws, Tetrahedron Lett· 26,5 9 9 7 ( 1 9 8 5 )等)來導入芳基或雜芳 基之反應(第1製程)。從化合物(XIX)至(la-3)之反應乃 進行化合物(XIX)之N-烷基化等或去除羧基保護基之反 應(第2製程),可仿A法第1製程進行。從化合物(Ia-3)至(lb-3)之反應乃將羧酸衍生物轉變成羥肟酸衍生物 之反應(第3製程),可仿A法第2〜4製程進行。各製 程詳述如下。 (第1製程) 將化合物(XVII)在二甲基甲醯胺、甲苯、二甲苯、苯 、四氫呋喃等溶劑中有鈀觸媒(如Pd(Ph3P)4等)、鹼(如 碳酸鉀、碳酸鈣、三乙胺、甲醇鈉等)之存在下,舆苯 硼酸等有B(0H)2(此外B(Et)2等)基之可有取代之芳基 或可有取代之雜芳基衍生物反應(鈴木反應),則可轉換 爲目的物(XIX)。反應溫度爲室溫〜l〇〇°C,宜室溫〜80 °C,反應時間爲5〜5 0小時,宜1 5〜3 0小時。若可有 取代之芳基或可有取代之雜芳基衍生物具有阻礙本反應 之取代基時,可依 Protective Groups in Organic Synthesis, Theodora W Green (John Wiley & Sons)等之方法預先保護而在所望階段去 除保護基。 (第2製程) 可仿A法第1製程進行。 200403216 (第3製程) 可仿A法第2〜4製程進行 (D法) R1Ib ^ (where R1, R2, R7, R15, R17 and Hal are the same as above). -26- 200403216 The reaction from compounds (XVII) to (XIX) is by replacing the carbonyl of R17 with a halogen as a stepping board and using Suzuki (MJ Sharp and V. Snieckws, Tetrahedron Lett. 26, 5 9 9 7 (1 9 8 5) etc.) to introduce an aryl or heteroaryl reaction (first process). The reaction from compound (XIX) to (la-3) is the reaction of performing N-alkylation of compound (XIX), etc., or the removal of a carboxy protecting group (second process), which can be performed in the same manner as the first process of method A. The reaction from compounds (Ia-3) to (lb-3) is a reaction in which a carboxylic acid derivative is converted into a hydroxamic acid derivative (the third process), which can be performed in the same manner as the second to fourth processes of the A method. Each process is detailed below. (First process) Compound (XVII) is palladium catalyst (such as Pd (Ph3P) 4, etc.) in a solvent such as dimethylformamide, toluene, xylene, benzene, tetrahydrofuran, and a base (such as potassium carbonate, carbonic acid). In the presence of calcium, triethylamine, sodium methoxide, etc., phenylboronic acid and the like may be derived from optionally substituted aryl groups or substituted heteroaryl groups having B (0H) 2 (other than B (Et) 2 etc.) groups. Physical reaction (Suzuki reaction), it can be converted into the target (XIX). The reaction temperature is from room temperature to 100 ° C, preferably from room temperature to 80 ° C, and the reaction time is from 5 to 50 hours, preferably from 15 to 30 hours. If a substituted aryl or a substituted heteroaryl derivative has a substituent that hinders the reaction, it can be protected in advance by methods such as Protective Groups in Organic Synthesis, Theodora W Green (John Wiley & Sons), etc. Remove the protecting group at the desired stage. (Second process) It can be performed similar to the first process of method A. 200403216 (3rd process) Can be performed in the same way as the 2nd to 4th process of A method (D method) R1

h2n coor1 2CV 第义扉_ (〇并)Ft17-S02A人C00R15第2租 Η ΣΣ (H2N-)R17-S〇2-[j人COOR15 巢 3 —癀 > R7一客一Ν—#一s〇2-N人COOR15 Η Η Η,h2n coor1 2CV The first meaning 扉 (〇 和) Ft17-S02A person C00R15 second lease ΣΣ (H2N-) R17-S〇2- [j 人 COOR15 Nest 3 — 癀 > R7 一 客 一 Ν— # 一 s 〇2-N 人 COOR15 Η Η Η,

XXI XXII 箩-1§择+ r7-C-N-R17-S02-N^C00H — H q2XXI XXII 箩 -1§Select + r7-C-N-R17-S02-N ^ C00H — H q2

la-4 R R1 Ο Ϊ -C-N-R17-S02"N CONHOH H ^la-4 R R1 Ο Ϊ -C-N-R17-S02 " N CONHOH H ^

Ibz4 (式中R1〜R5同前,R15爲H或羧基保護基,爲羥基 保護基,HaL爲鹵素)。 從化合物(XV)至(XX)之反應乃將化合物(χν)之胺基 予以磺醯化反應(第1製程),可依A法第1製程進行。 從化合物(XX)至(XXI)之反應乃將R17之硝基取代基還 原成胺基之反應(第2製程)’可依觸媒還原法或鹽酸鐵 ,鹽酸錫之反應條件下進行。從化合物(XXI)至(XXII) 之反應乃以R 17之胺基爲踏腳板而形成醯胺鍵之反應( 第3製程),可仿通常所用之醯胺鍵形成反應來進行。 從化合物(XXII)至(la-4)之反應乃進行化合物(XXII)至 -28- 200403216 N-烷基化等及去除羧基保護基之反應(第4製程),可仿 A法第1製程進行。從化合物(Ia-4)至(ib_4)之反應乃將 殘酸衍生物轉變成羥肟酸衍生物之反應(第5製程),可 仿A法第2〜4製程進行。茲詳述各製程如下。 (第1製程) 可仿A法第1製程進行。 (第2製程) 將化合物(XX)在甲醇、乙醇、乙酸乙酯、乙酸等溶 劑中有觸媒(Pd-C、Pt02、阮來鎳等)之存在下,在氫大 氣、常壓或加壓條件下反應,得目的物(XXI)。反應溫 度爲冰冷〜8 0 °C,宜室溫〜5 0 °C。反應時間爲1〜1 〇小 時,宜2〜5小時。 (第3製程) 將化合物(XXI)在二甲基甲醯胺、四氫呋喃、二噚烷 、二甲亞®、乙腈、二甲苯、甲苯、苯、二氯甲烷等溶 劑中有驗(如二乙胺、N -甲基嗎琳、碳酸狎等)之存在下 ,與具有苄醯氯等酸鹵化物官能基(此外活性酯等)之可 有取代之芳基或可有取代之雜芳基衍生物反應而轉換成 目的物(XXII)。反應溫度爲冰冷〜1 00 °C,宜室溫〜60 。(:,反應時間爲3〜3 0小時,宜1 0〜2 5小時。 (第4製程) 可仿A法第1製程進行。 (第5製程) 可仿A法第2〜4製程進行。 -29- 200403216 (E法) ΗIbz4 (wherein R1 to R5 are the same as before, R15 is a H or carboxy protecting group, a hydroxyl protecting group, and HaL is a halogen). The reaction from compound (XV) to (XX) is a sulfonation reaction (first process) of the amine group of compound (χν), which can be performed according to the first process of method A. The reaction from compounds (XX) to (XXI) is a reaction in which the nitro substituent of R17 is reduced to an amine group (second process) 'can be carried out under the reaction conditions of a catalyst reduction method or iron hydrochloride or tin hydrochloride. The reaction from compounds (XXI) to (XXII) is a reaction in which an amine group of R 17 is used as a stepping board to form an amidine bond (3rd process), which can be carried out in a manner similar to the commonly used amidine bond formation reaction. The reaction from compound (XXII) to (la-4) is the reaction of compound (XXII) to -28- 200403216 N-alkylation, etc., and the removal of the carboxy protecting group (the fourth process), which can imitate the first process of method A get on. The reaction from compounds (Ia-4) to (ib_4) is a reaction in which a residual acid derivative is converted into a hydroxamic acid derivative (the fifth process), which can be performed in the same manner as in the second to fourth processes of the A method. Each process is detailed below. (First process) It can be performed in the same manner as the first process of Method A. (Second process) Compound (XX) is present in a solvent such as methanol, ethanol, ethyl acetate, acetic acid or the like (Pd-C, Pt02, Ruanlai Nickel, etc.) under a hydrogen atmosphere, normal pressure or pressurized conditions. The reaction was performed to obtain the target compound (XXI). The reaction temperature is from ice cold to 80 ° C, preferably from room temperature to 50 ° C. The reaction time is 1 to 10 hours, preferably 2 to 5 hours. (Step 3) The compound (XXI) is tested in solvents such as dimethylformamide, tetrahydrofuran, dioxane, dimethylene®, acetonitrile, xylene, toluene, benzene, and dichloromethane (such as diethyl ether). In the presence of amine, N-methylmorphine, osmium carbonate, etc.), it may be derived from an optionally substituted aryl group or an optionally substituted heteroaryl group having an acid halide functional group (other than an active ester) such as benzyl chloride. Reacts to convert to the target (XXII). The reaction temperature is ice cold ~ 100 ° C, preferably room temperature ~ 60 ° C. (: The reaction time is 3 to 30 hours, preferably 10 to 25 hours. (Fourth process) It can be performed imitating the first process of the A method. (Fifth process) It can be performed imitating the second to the fourth method of the A method. -29- 200403216 (Method E) Η

XY R1 R1 (OHO)R17-S02$人COOR15笔^每一 R7H_N=^-R17-SOq人COOR1XY R1 R1 (OHO) R17-S02 $ person COOR15 pens each R7H_N = ^-R17-SOq person COOR1

XXIVXXIV

XXV R1 筮 4 靱β ^ 一11:;第5 製程 -—R7-N、^-Rt7-S02, COOR1 气·--XXV R1 筮 4 靱 β ^ a 11 :; 5th process-R7-N, ^ -Rt7-S02, COOR1 gas ---

N HN H

XXVI N=N 丄 敏β制Ν=Ν 丄 -κ /r17 — S02,N人COOH —~R7 — N’、>R17-SCVN人CONHOH N R2 N R2XXVI N = N 丄 sensitive β system N = N 丄 -κ / r17 — S02, N human COOH — ~ R7 — N ’, > R17-SCVN human CONHOH N R2 N R2

UA IbiS (式中 R1、R2、R7、R15、R17 及 Hal 同前)。 從化合物(XV)至(XXIII)之反應乃將化合物(XV)之胺 基予以磺醯化之反應(第1製程),可依A法第1製程進 行。從化合物(XXIII)至(XXIV)之反應乃將R17之乙烯 基取代基轉換成醛之反應(第2製程)。從化合物(XXIV) 至(XXVI)之反應乃構築四唑環之反應(第3、4製程)。 從化合物(XXVI)至(la-5)之反應乃進行化合物(XX VI)至 N-烷基化等及去除羧基保護基之反應(第5製程),可仿 A法第1製程進行。從化合物(la-5)至(Ib-5)之反應乃將 羧酸衍生物轉換成羥肟酸衍生物之反應(第6製程),可 仿A法第2〜4製程進行。茲詳述各製程如下。 (第1製程) -30- 200403216 可仿A法第1製程進行。 (第2製程) 將化合物(ΧΧΠΙ)在二氯甲烷、乙酸乙酯、甲醇等溶 劑中加臭氧而形成臭氧化物,繼於同系中加鋅-乙酸、 磷酸三乙酯或二甲亞楓等來還原處理,而轉換成所述之 醛衍生物(化合物(XXIV))(還原處理也可加觸媒氫)。反 應溫度爲-1 0 〇 °C〜室溫,宜-7 8 °c〜冰冷,反應時間爲〇 · 5 〜1 0小時,宜1〜3小時。 (第1製程) 將化合物(XXIV)在四氫呋喃及乙醚等溶劑與甲醇及 乙醇等溶劑之混液中,與苯磺醯肼反應而轉變成目的物 (XXV)。反應溫度爲冰冷〜80°c,宜室溫〜50°C ’反應 時間爲3〜3 0小時,宜1 0〜2 0小時。 (第4製程) 將苯胺等具有胺基之可有取代之芳基或可有取代之雜 芳基衍生物溶在醇(如乙醇等)-水之混液,在系中溫度 爲-2 0〜1 0 °C,宜0〜5 °C在濃鹽酸及亞硝酸鈉水溶液等 重氮化劑而轉變成重氮鏺鹽。反應時間5分〜1小時, 宜10〜30分。然後注入化合物(XXV)之吡啶溶液中, 在-3 0〜5 0 t:,宜-1 5 °C〜室溫反應1〜1 〇小時,宜2〜5 小時而轉變成目的物(XXVI)。若可有取代之芳基或可 有取代之雜芳基衍生物具有阻礙本反應之取代基時,可 依 Protective Groups in Organic Synthesis,Theodora W Green(John Wiley & Sons)等之方法預先保護而在所望 -31- 200403216 階段去除保護基。 (第5製程) 可仿A法第1製程進行。 (第6製程) 可仿A法第2〜4製程進行。 (F法)UA IbiS (where R1, R2, R7, R15, R17 and Hal are the same as above). The reaction from compound (XV) to (XXIII) is a reaction in which the amine group of compound (XV) is sulfonated (first process), which can be performed according to the first process of method A. The reaction from compounds (XXIII) to (XXIV) is a reaction in which the vinyl substituent of R17 is converted into an aldehyde (the second process). The reaction from compounds (XXIV) to (XXVI) is a reaction for constructing a tetrazole ring (processes 3 and 4). The reaction from compound (XXVI) to (la-5) is the reaction of compound (XX VI) to N-alkylation, etc., and the removal of the carboxy protecting group (5th process), which can be performed in the same manner as the first process of method A. The reaction from compounds (la-5) to (Ib-5) is a reaction in which a carboxylic acid derivative is converted into a hydroxamic acid derivative (the sixth process), which can be performed in the same manner as the second to fourth processes of the A method. Each process is detailed below. (First process) -30- 200403216 It can be performed in the first process of A method. (Second process) Compound (XXII) is added with ozone in solvents such as dichloromethane, ethyl acetate, and methanol to form odor oxides, followed by the addition of zinc-acetic acid, triethyl phosphate, or dimethylphosphine in the same system. Reduction treatment, and conversion to the aldehyde derivative (compound (XXIV)) (reduction treatment can also add catalyst hydrogen). The reaction temperature is -1 0 ° C to room temperature, preferably -78 ° C to ice-cold, and the reaction time is 0.5 to 10 hours, preferably 1 to 3 hours. (First process) Compound (XXIV) is reacted with benzenesulfonylhydrazine in a mixed solution of a solvent such as tetrahydrofuran and diethyl ether and a solvent such as methanol and ethanol to be converted into the target compound (XXV). The reaction temperature is ice-cold to 80 ° C, preferably room temperature to 50 ° C, and the reaction time is 3 to 30 hours, preferably 10 to 20 hours. (Fourth process) An aryl group, such as aniline, which may have a substituted aryl group or a substituted heteroaryl derivative, is dissolved in an alcohol (such as ethanol) -water mixture, and the temperature in the system is -20 to 0 ~ 10 ° C, preferably 0 ~ 5 ° C, into diazonium salt in diazotizing agents such as concentrated hydrochloric acid and aqueous sodium nitrite solution. The reaction time is 5 minutes to 1 hour, preferably 10 to 30 minutes. Then inject it into a pyridine solution of the compound (XXV), and react at -3 0 ~ 50 0 t :, preferably-1 5 ° C ~ room temperature for 1 ~ 10 hours, preferably 2 ~ 5 hours to transform into the target substance (XXVI). . If the substituted aryl or the substituted heteroaryl derivative has a substituent that hinders the reaction, it can be protected in advance by methods such as Protective Groups in Organic Synthesis, Theodora W Green (John Wiley & Sons), etc. Removal of protecting groups at the desired-31-200403216 stage. (Fifth process) It can be performed similar to the first process of method A. (Sixth process) It can be performed similar to the second to fourth processes of A method. (F law)

R1 R7-〇C-R17—S〇2-N 人 COOR15 Η Η 2 Η XXVII R1R1 R7-〇C-R17-S〇2-N Human COOR15 Η Η 2 Η XXVII R1

(OHO)R17-S02-^j 人 COOR15 萝1 製亘 XXIV R1 第3製程 ------p.(OHO) R17-S02- ^ j Person COOR15 Roe 1 Manufacturing XXIV R1 3rd Process ------ p.

第2裂程, β X2nd split, β X

-—r7-c=c—r17—so2-n C〇OI Η H ^--R7-c = c-r17-so2-n C〇OI Η H ^

Ia,6 R1Ia, 6 R1

R7-〇OR17—S02-N 八 CONHOH Η H lb-6 (式中R1〜R5同前,R15爲H或羧基保護基,R16爲羥基 保護基,Hal爲鹵素)。 從化合物(XXIV)至(XXVII)之反應乃以R17之醛爲踏腳 板,以習用之 Wittig 反應(G.Wittiget.al.,Chem.Berr. 8 7,1 3 1 8 ( 1 9 5 4))之條件等,仲介雙鍵等導入芳基或雜芳 基之反應(第1製程)。從化合物(XX VII)至(U-6)之反應 乃進行化合物(XXVII)之N-烷基化等及去除羧基保護基 之反應(第2製程),可仿A法第1製程進行。從化合物 (la-6)至(lb-6)之反應乃將羧酸衍生物轉變成羥肟酸衍 生物之反應(第3製程),可仿A法第2〜4製程進行。 -32- 200403216 茲詳述各製程如下。 (第1製程) 將化合物(XXIV)溶在甲苯、二甲苯、四氫呋喃、乙 醚、二甲基甲醯胺等溶劑中,至- loot:〜室溫,宜-78 t〜冰冷下加另依常法調製之Ph3P = CHPh等可有取代 之芳基或可有取代之雜芳基衍生物之炔化物而攪拌1〜 20小時,宜1〜5小時,則可轉變成目的物(XXVII)。 若可有取代之芳基或可有取代之雜芳基衍生物具有阻礙 本反應之取代基時,可依Protective Groups in Organic Synthesis,Theodora W Green(John Wiley & Sons)等之 方法預先保護而在所望階段去除保護基。 (第2製程) 可仿A法第1製程進行。 (第3製程) 可仿A法第2〜4製程進行。 「本發明化合物」一詞亦包括製藥容許鹽或其水合物 。諸如鹼金屬(鋰、鈉、鉀等)、鹼土金屬(鎂、鈣等)、 銨、與有機鹼及胺基酸之鹽、或與無機酸(鹽酸、氳溴 酸、磷酸、硫酸等)、及有機酸(乙酸、檸檬酸、馬來酸 、富馬酸、苯磺酸、對甲苯磺酸等之鹽。這些鹽可依常 法形成。 又本發明化合物不限於特定之異構物,實包括所有可 能之異構物及消旋體。 本發明化合物乃如後述實驗例所示,具有優異之金屬 -33- 200403216 蛋白酶阻礙性,尤其MMP阻礙活性、阻礙基質分解。 故本發明化合物對起因於MMP及其同類酵素TNF- α -轉換酶等之疾病有效。 具體而言,可用以防治變形性關節症、關節風濕、角 膜潰瘍、牙周病、腫瘤之轉移或浸潤、病毒感染症(如 HIV感染症)之進行,閉塞性動脈硬化症、動脈硬化性 動脈瘤、粥狀動脈硬化症、再狹窄、敗血症、敗血症休 克、冠狀血栓症、異常血管新生、鞏膜炎、多發性硬化 症、開放角綠內障、視網膜症、增殖性視網膜症、血管 新生綠內障、翼狀皮膚、角膜炎、水泡性表皮剝離、乾 癖、糖尿病、腎炎、神經性疾病、牙齦炎、腫瘤增殖、 腫瘤血管新生、眼腫瘤、血管纖維腫、血管腫、熱病、 出血、凝固、惡液質、食慾不振、急性感染症、休克、 自身免疫症、瘧疾、克隆病、髓膜炎及胃腸潰瘍。 將本發明化合物用以防治上述疾病而投予人時,可以 散劑、顆粒、錠、膠囊、九、液劑等來口服,或以注射 劑、坐劑、經皮吸收劑、吸入劑等來非口服。又將有效 量本化合物應所需而配合適合劑型之賦形劑、黏合劑、 濕潤劑、崩散劑、滑澤劑等醫藥添加劑而作成醫藥製劑 。若爲注射劑時,可與適當載體一起滅菌處理而作成製 劑。 投予量乃依疾病之狀態、投予途徑、病人之年齢或體 重而異,最後取決於醫師,一般成人口服時爲〇 · 1〜 100mg/kg/日,宜0.1〜lmg/kg/日,將此作一次或分數 -34- 200403216 次投予。 茲舉實施例及實驗例詳述本發明,但不限於此。 實施例中所用縮寫如下: p-TsOH :對甲苯磺酸 DMOS:二甲亞楓 Me :甲基 tBu :第三丁基 實施例1 (A法)R7-〇OR17—S02-N Eight CONHOH Η H lb-6 (wherein R1 to R5 are the same as before, R15 is H or carboxy protecting group, R16 is hydroxy protecting group, Hal is halogen). The reaction from compounds (XXIV) to (XXVII) is based on the aldehyde of R17 as a stepping board, and the conventional Wittig reaction (G. Wittiget.al., Chem. Berr. 8 7, 1 3 1 8 (1 9 5 4) ) Conditions, etc., the reaction of introducing an aryl or heteroaryl group via an intermediate double bond (first process). The reaction from compound (XX VII) to (U-6) is the reaction of performing N-alkylation of compound (XXVII), etc., and removing the carboxy protecting group (second process), and it can be performed in the same manner as the first process of method A. The reaction from compounds (la-6) to (lb-6) is a reaction in which a carboxylic acid derivative is converted into a hydroxamic acid derivative (the third process), which can be performed in the same manner as the second to fourth processes of the A method. -32- 200403216 Each process is detailed below. (First process) Compound (XXIV) is dissolved in solvents such as toluene, xylene, tetrahydrofuran, diethyl ether, dimethylformamide, etc. to-loot: ~ room temperature, preferably -78 t ~ under ice-cooling Ph3P = CHPh and other substituted aryl groups or alkynides of substituted heteroaryl derivatives can be prepared by the method and stirred for 1 to 20 hours, preferably 1 to 5 hours, can be converted into the target (XXVII). If the substituted aryl or the substituted heteroaryl derivative has a substituent that hinders the reaction, it can be protected in advance by methods such as Protective Groups in Organic Synthesis, Theodora W Green (John Wiley & Sons), etc. Remove the protecting group at the desired stage. (Second process) It can be performed similar to the first process of method A. (Third process) It can be performed in the same way as the second to fourth processes of A method. The term "compounds of the invention" also includes pharmaceutically acceptable salts or hydrates thereof. Such as alkali metals (lithium, sodium, potassium, etc.), alkaline earth metals (magnesium, calcium, etc.), ammonium, salts with organic bases and amino acids, or with inorganic acids (hydrochloric acid, osmium bromide, phosphoric acid, sulfuric acid, etc.), And organic acids (acetic acid, citric acid, maleic acid, fumaric acid, benzenesulfonic acid, p-toluenesulfonic acid, etc. salts. These salts can be formed by conventional methods. The compounds of the present invention are not limited to specific isomers. Including all possible isomers and racemates. The compounds of the present invention have excellent metal-33-200403216 protease inhibitory properties, as shown in the experimental examples described below, especially MMP inhibitory activity and matrix decomposition. Therefore, the compounds of the present invention are responsible for It is effective for diseases such as MMP and its similar enzyme TNF-α-converting enzyme, etc. Specifically, it can be used to prevent deformity arthrosis, joint rheumatism, corneal ulcer, periodontal disease, tumor metastasis or invasion, viral infection (such as HIV infection), occlusive arteriosclerosis, atherosclerotic aneurysm, atherosclerosis, restenosis, sepsis, septic shock, coronary thrombosis, abnormal angiogenesis, scleritis Multiple sclerosis, open-angle cataract, retinopathy, proliferative retinopathy, angiogenic green cataract, pterygium, keratitis, vesicular epidermal detachment, xerobia, diabetes, nephritis, neurological disease, gingivitis , Tumor proliferation, tumor angiogenesis, eye tumors, angiofibromas, hemangiomas, fever, bleeding, coagulation, cachexia, loss of appetite, acute infection, shock, autoimmune disease, malaria, clonal disease, meningitis, and Gastrointestinal ulcers. When the compounds of the present invention are administered to humans for the prevention and treatment of the above-mentioned diseases, they can be administered orally as powders, granules, tablets, capsules, nine, liquids, etc., or as injections, troches, transdermal absorbents, inhalants, etc. Non-oral. In addition, an effective amount of the compound is formulated as needed with excipients, adhesives, wetting agents, dispersing agents, smoothing agents and other pharmaceutical additives to form a pharmaceutical preparation. If it is an injection, it can be used with appropriate The carrier is sterilized together to make a preparation. The dosage varies depending on the state of the disease, the route of administration, the age of the patient or the weight of the patient, and ultimately depends on the physician. Generally, it is 0.1 to 100 mg / kg / day when taken orally by an adult, preferably 0.1 to 1 mg / kg / day, and this is administered once or in a fraction of -34-200403216. The following examples and experimental examples describe the present invention in detail. The abbreviations used in the examples are as follows: p-TsOH: p-toluenesulfonic acid DMOS: dimethylsulfene Me: methyl tBu: third butyl Example 1 (Method A)

ξΧ) ·ξχ) ·

SCVN 八CO〇H Η la小1SCVN Eight CO〇H Η la small 1

p S02,八 CONHOH Η , 將(R)-( + )-苯基丙胺酸(化合物(XV-1)1.65克(lOmmol) 懸浮於二甲基甲醯胺及水3 5 m 1,而在冰冷攪拌下加三 乙胺2.78ml(20mmol)。次以5分加4-聯苯基磺醯氯2.52 克(lOmmol)之二甲基甲醯胺10ml。在同溫攪拌2小時 後,力□ 1-羥基苯駢三唑水合物1.35克(l〇mm 〇1)、1-乙 基-3-(3-二甲胺丙基)碳化二亞胺鹽酸鹽2.1克(llmmol) 、羥胺鹽酸鹽3.47克(50mmol)及三乙胺7ml(50mmol) ,在室溫攪拌1 6小時後,注入水中。次以乙酸乙酯萃 ’ 取而依序以2N鹽酸、5%碳酸氫鈉水及水洗淨,減壓濃 •35- 200403216 縮,在矽膠柱層析(氯仿/甲醇=40/1〜20/1),得泡狀殘 渣(化合物lb-1-1)1.70克。 產率 4 3 %。融點 1 6 9 - 1 7 0 °C。p S02, eight CONHOH Η, (R)-(+) -phenylalanine (compound (XV-1) 1.65 g (10 mmol) was suspended in dimethylformamide and water 3 5 m 1, and Add 2.78 ml (20 mmol) of triethylamine while stirring. Then add 10 ml of 2.52 g (10 mmol) of dimethylformamide in 5-minute portions. After stirring at the same temperature for 2 hours, force 1 -Hydroxybenzotriazole hydrate 1.35 g (10 mm 〇1), 1-ethyl-3- (3-dimethylaminopropyl) carbodiimide hydrochloride 2.1 g (11 mmol), hydroxylamine hydrochloride Salt 3.47 g (50 mmol) and triethylamine 7 ml (50 mmol), stirred at room temperature for 16 hours, and poured into water. Extracted with ethyl acetate, followed by 2N hydrochloric acid, 5% sodium bicarbonate water and water Washed, concentrated under reduced pressure • 35- 200403216, and then subjected to silica gel column chromatography (chloroform / methanol = 40/1 ~ 20/1) to obtain 1.70 g of a foamy residue (compound lb-1-1). Yield 4 3 % Melting point 1 6 9-17 0 ° C.

元素分析値(%)C21H2()N2 04 S 計算値·· C;63.62 Η;5·08 Ν;7·07 S;8.09 實驗値:C;63.61 Η;5·12 Ν;6·98 S;8.06 IK v max(cm~ 1 )(Nujol):3365, 3295, 3266, 1674, 1320, 1159 NMR(5 ppm)d 6 -DMSO:2.61 (dd, J=8.6, 13.4Hz, 1H), 2.80 (dd, J=6.0, 13.6Hz, 1H), 3.80 (m, 1H) ► 【a 】£> ··十 18.5± 1.2(c=0.603%,25t:, DMSO) 實施例1f 化合物Ib-1-1 ^另途合成法 p-TsOH z H2N^COOCH2Ph 第1製程Elemental analysis 値 (%) C21H2 () N2 04 S Calculation 値 · C; 63.62 Η; 5.08 Ν; 7.07 S; 8.09 Experiment 値: C; 63.61 Η; 5.12 Ν; 6.98 S; 8.06 IK v max (cm ~ 1) (Nujol): 3365, 3295, 3266, 1674, 1320, 1159 NMR (5 ppm) d 6 -DMSO: 2.61 (dd, J = 8.6, 13.4Hz, 1H), 2.80 ( dd, J = 6.0, 13.6Hz, 1H), 3.80 (m, 1H) ► [a] £ > ··· 18.5 ± 1.2 (c = 0.603%, 25t :, DMSO) Example 1f Compound Ib-1- 1 ^ Synthesis p-TsOH z H2N ^ COOCH2Ph 1st process

XV-ΓXV-Γ

第1製程 * 36 - 200403216 於(R)-苯基丙胺基苄酯對甲苯磺酸鹽(化合物XV-Γ)2.5克(5.85mmol)之二氯甲烷60ml溶液冰冷下先後 加三乙胺1.8ml(12.87mmol)及4-聯苯磺醯氯1.63克 (6.44mmol)。在室溫攪拌2小時後,依序以2N-鹽酸,Process 1 * 36-200403216 To a solution of (R) -phenylpropylaminobenzyl p-toluenesulfonate (compound XV-Γ) in 2.5 ml (5.85 mmol) in 60 ml of dichloromethane is added 1.8 ml of triethylamine under ice cooling. (12.87 mmol) and 1.6-diphenylsulfenyl chloride (1.64 g). After stirring at room temperature for 2 hours, sequentially with 2N-hydrochloric acid,

5 %碳酸氫鈉水及水洗淨,減壓濃縮後,在矽膠柱層析( 氯仿/甲醇=4 0/1〜20/1),從二氯甲烷-己烷再結晶,得 化合物 Ia-1-l’ 2.32 克,產率 84.1%,融點 130-13 1°C。 元素分析値(%)C28H25N04S 計算値:C;71.32 Η;5·34 Ν;2·97 S;6.80 實驗値:C;71.05 Η;5·41 N;3.00 S;6.81 IR v rnaxicm^7 1 )(Nujol):3352, 1732, 1341, 1190, 1163 NMR(<5 ppm)(CDCl 3):3.06 (d, J=5.8Hzl 2H)t 4.30 (dt, J=6.0f 9.0Hz, !H)r 4.89 (s, 2H), 5.12 (dp J=9.0Hzt 1H), 6,98-7.81 (m, 14H) [a 】D : -16·4土 Ll(c=0.506%,25*0, MeOH) 第2製程5% sodium bicarbonate water and water were washed, concentrated under reduced pressure, and then subjected to silica gel column chromatography (chloroform / methanol = 4 0/1 to 20/1), and recrystallized from dichloromethane-hexane to obtain a compound Ia- 1-l '2.32 g, yield 84.1%, melting point 130-13 1 ° C. Elemental analysis 値 (%) C28H25N04S Calculated 値: C; 71.32 Η; 5.34 Ν; 2.97 S; 6.80 Experimental 値: C; 71.05 Η; 5.41 N; 3.00 S; 6.81 IR v rnaxicm ^ 7 1) (Nujol): 3352, 1732, 1341, 1190, 1163 NMR (< 5 ppm) (CDCl 3): 3.06 (d, J = 5.8Hzl 2H) t 4.30 (dt, J = 6.0f 9.0Hz,! H) r 4.89 (s, 2H), 5.12 (dp J = 9.0Hzt 1H), 6,98-7.81 (m, 14H) [a] D: -16 · 4 soil Ll (c = 0.506%, 25 * 0, MeOH ) 2nd process

將第1製程所得化合物Ia-1-1’ 2.28克溶在甲醇/乙酸 乙酯=1/1之混液,與l〇%Pd-C 2 00mg —起加氫25分後 ,濾除觸媒,減壓濃縮,從二氯甲烷/己烷再結晶,得化 合物 Ia-1-l” 1 .83 克,產率 99.1%,融點 1 46- 1 47 °C。 元素分析値(%)C21H19N04S 計算値:C;66.12 Η;5·02 Ν;3·67 S;8.41 實驗値:C;65.97 Η;5·06 Ν;3·61 S;8.48 200403216 IR v max(cm~ 1 )(NujoI):3408, 3305, 1751, 1325, 1161, 1134 •NMR( δ ppm)(CDCl 3):2.97 (dd· Jf7.0, 13.8Hz, 1H), 3.14 (dd, J = 5.2, 14,0Hz, 1H), 4.13 (m, 1H), 7-03-7.78 (m, 14H) [a]D: -4,0 土 0.4(c=1.000o/o, 25t:, MeOH) 第3製程 將第2製程所得化合物I a - 1 - 1 ’’ 1 · 0克(2 · 6 2 m m ο 1)溶 在二氯甲院20ml,加草醯氯0.33ml(3.93mmol)及二甲 基甲醯胺1滴,在室溫攪拌1小時。減壓濃縮後,溶在 四氫呋喃10ml。另將羥胺鹽酸鹽911mg(13.1mmol)在 含碳酸氫鈉1.54克(18.34mmol)之四氫呋喃10ml及水 1 0 m 1之混液中冰冷下攪拌5分後,加上述酸氯化物之 四氫呋喃溶液。攪拌3 0分後,注入水中。次以乙酸乙 酯萃取而依序以5%碳酸氫鈉水及水洗淨,減壓濃縮,得 殘渣969mg(化合物Ia-Ι),產率93.3%。 第4製程 將第2製程所得之化合物Ia-1-l ” 2·0克(5.24mmol) 溶在二甲基甲醯胺2 0 m 1,而加1 -羥基苯駢三唑水合物 0.7 克(5.24mmol)、N-甲基嗎琳 2.91ml(26.2mmol)、1_ 乙基- 3-(3-二異丙胺基)碳化二亞胺鹽酸鹽(Smmol)、次 加〇-苄基羥胺鹽酸鹽1.67克(10.48mm〇l),在室溫攪拌 6小時後,注入水中。次以乙酸乙酯萃取而依序以2N 鹽酸、5 %碳酸氫鈉水及水洗淨,減壓濃縮,在矽膠柱 層析(乙酸乙酯/己烷=1 / 1 ),從二氯甲烷/己烷再結晶,The compound Ia-1-1 ′ obtained in the first process was dissolved in 2.28 g of methanol / ethyl acetate = 1/1, and hydrogenated with 10% Pd-C 2 00 mg for 25 minutes, and then the catalyst was filtered off. Concentrated under reduced pressure and recrystallized from dichloromethane / hexane to obtain Compound Ia-1-l "1.83 g, yield 99.1%, melting point 1 46-1 47 ° C. Elemental analysis 値 (%) C21H19N04S calculation値: C; 66.12 Η; 5.02 Ν; 3.67 S; 8.41 Experiment 値: C; 65.97 Η; 5.06 Ν; 3.61 S; 8.48 200403216 IR v max (cm ~ 1) (NujoI): 3408, 3305, 1751, 1325, 1161, 1134NMR (δ ppm) (CDCl 3): 2.97 (ddJf7.0, 13.8Hz, 1H), 3.14 (dd, J = 5.2, 14,0Hz, 1H) , 4.13 (m, 1H), 7-03-7.78 (m, 14H) [a] D: -4,0 to 0.4 (c = 1.000o / o, 25t :, MeOH) The third process will be obtained from the second process Compound I a-1-1 '' 1.0 g (2. 6 2 mm ο 1) was dissolved in 20 ml of dichloromethane, 0.33 ml (3.93 mmol) of chlorchloramine and 1 drop of dimethylformamide. Stir at room temperature for 1 hour. After concentrating under reduced pressure, dissolve in 10 ml of tetrahydrofuran. In addition, 911 mg (13.1 mmol) of hydroxylamine hydrochloride is mixed with 10 ml of tetrahydrofuran containing 1.54 g (18.34 mmol) of sodium bicarbonate and 10 m 1 of water. In the cold After stirring for 5 minutes, add the tetrahydrofuran solution of the above acid chloride. After stirring for 30 minutes, pour it into water. Extract with ethyl acetate and wash with 5% sodium bicarbonate water and water in order, and concentrate under reduced pressure to obtain a residue. 969 mg (Compound Ia-1), yield 93.3%. In the fourth process, 2.0 g (5.24 mmol) of the compound Ia-1-l obtained in the second process was dissolved in dimethylformamide 20 m 1, Then add 0.7 g (5.24 mmol) of 1-hydroxybenzitriazole hydrate, 2.91 ml (26.2 mmol) of N-methylmorphine, 1-ethyl-3- (3-diisopropylamino) carbodiimide salt Acid salt (Smmol), then 1.67 g (10.48 mm) of 0-benzylhydroxylamine hydrochloride was added, stirred at room temperature for 6 hours, and then poured into water. It was extracted with ethyl acetate and washed with 2N hydrochloric acid, 5% sodium bicarbonate water and water sequentially, concentrated under reduced pressure, and subjected to silica gel column chromatography (ethyl acetate / hexane = 1/1), followed by dichloromethane. / Hexane recrystallized,

得化合物XVI- 1 2 2.04克,產率80%,融點171-1 73 °C -38- 200403216 元素分析値(%)c28h26n2o4s 計算値:C;69.12 Η;5·39 Ν;5·76 S;6.59 實驗値:C;68.85 Η;5·46 Ν;5·76 S;6.78 IR v max(cm— 1 )(Nu:jol):3248f 1661, 1594, 1333, 1163 NMR(<5 ppm)(CDCl 3 ):2.85-3.60 (m, 2H), 3.86 (m, 1H), 4.77 (ABq-2.04 g of compound XVI-1 was obtained, yield 80%, melting point 171-1 73 ° C -38- 200403216 elemental analysis 値 (%) c28h26n2o4s Calculated 値: C; 69.12 Η; 5.39 Ν; 5.76 S ; 6.59 Experiment 値: C; 68.85 Η; 5.46 Ν; 5.76 S; 6.78 IR v max (cm-1) (Nu: jol): 3248f 1661, 1594, 1333, 1163 NMR (< 5 ppm) (CDCl 3): 2.85-3.60 (m, 2H), 3.86 (m, 1H), 4.77 (ABq-

Apart, 1H), 4.82 (ABq-Bpart, J=11.4Hz, 1H), 5.00 (m, 1H), 6.95-7.70 (m, 19H) — [cr】D: ·40·2士 l‘6(c=0.505%, 25t:, DMSO) 第5製程 將第4製程所得之化合物XVI-1 1.97克溶在甲醇/乙 酸乙酯=1/1之混液60ml,與10%Pd-C 200mg —起氫化 3.5小時後,濾除觸媒,減壓濃縮而從二氯甲烷/己烷再 結晶,.得化合物Ib-1-l 1 .35克,產率84.4%。 實施例2〜9 1 仿實施例1合成表1〜22之化合物。 -39- 200403216 HOHNOO^HisiQ: Ή*ΝΜΕ(δ ppm) dc-DMSO 2.87(dd,J=5.6.14·2Ηζ·1 H>· 2.98(dd, J=8.4(H.2Hz,1H),4.〇2(ddlJ=2.2. 8.6Hz,1H), 7.24{d,J=2.0Hzi1H), 8.83(d,J=2.2H2jH) 2.72(ddfJ=7.2t13.8Hz,1H),2.97(ddl 7.0,14.8Hz,1Η),3.81(Γη,1Η), I 3.12(dd,J=10.3,14.3Hz,1H),3.89(dd, J=3.3,13.5Hz,lH).4.20(m,1H),5.90 ^ (brs,1H) 2.67(dd,J;9.2,13.1Hz,1H),2.84{dd· J=5.3,13.5Hz, 1 H),3.82(m, 1H) _ - .__— ’ . i- 2.2-2.7(mt2H),3.99(U=7.0Hz,1H) 1.68(mf2H), 2.37(m,2H)f 3.64(t, J=6.9Hzt1H) I--------— 2.61 (dd,J=9.4l13.8Hzl1 H),2.78(dd, J=6.0· 13.8HZ· 1 H}.3.78(m, 1 H),7.43 (d,J=8.2Hzf2H)17.60(d1J=8.2Hz,2H)l IR(v cm-1) 陶 3258,1650,1377, 1348,1163 (Nu)ol) 3403,3386,3265,1673 ,1320,1162 (Nujol) I rC σ> CO σ> 〇) CD to C〇 T- N OJ 卜CM CVJ C: CO T- 3262,1663,1322, 1157, ^ 4 3265,1676,1642, 1337,1161 (Nujol) 3403,3261,1669, 1321,1160 3700-2200brt3264, 1635,1342,1164, b (分解點) m.pt.{*C) i 173 > | ! I 203-206 I 124-126 ! 139-141 I 167-169 172-173 r144*146 1〇fiE * pc: s ;S 1¾ 20 a: Φ CD S々N v=z-ch2· Ο ^£4 〇 x/H Q 8 £ CO ch2- cf3ch2- <Q>-CH2CHr <〇KHr 實施例 No. CO ιΛ 卜 CO σ>Apart, 1H), 4.82 (ABq-Bpart, J = 11.4Hz, 1H), 5.00 (m, 1H), 6.95-7.70 (m, 19H) — [cr] D: · 40 · 2 ± l'6 (c = 0.505%, 25t :, DMSO) In the fifth process, 1.97 g of the compound XVI-1 obtained in the fourth process was dissolved in 60 ml of a methanol / ethyl acetate = 1/1 mixed solution, and 200% of 10% Pd-C was hydrogenated to 3.5. After hours, the catalyst was filtered off, concentrated under reduced pressure and recrystallized from dichloromethane / hexane to obtain 1.35 g of compound Ib-1-l in a yield of 84.4%. Examples 2 to 9 1 The compounds of Tables 1 to 22 were synthesized in the same manner as in Example 1. -39- 200403216 HOHNOO ^ HisiQ: Ή * ΝΜΕ (δ ppm) dc-DMSO 2.87 (dd, J = 5.6.14 · 2Ηζ · 1 H > · 2.98 (dd, J = 8.4 (H.2Hz, 1H), 4 .〇2 (ddlJ = 2.2. 8.6Hz, 1H), 7.24 (d, J = 2.0Hzi1H), 8.83 (d, J = 2.2H2jH) 2.72 (ddfJ = 7.2t13.8Hz, 1H), 2.97 (ddl 7.0, 14.8Hz, 1Η), 3.81 (Γη, 1Η), I 3.12 (dd, J = 10.3, 14.3Hz, 1H), 3.89 (dd, J = 3.3, 13.5Hz, lH). 4.20 (m, 1H), 5.90 ^ (brs, 1H) 2.67 (dd, J; 9.2,13.1Hz, 1H), 2.84 (dd · J = 5.3,13.5Hz, 1 H), 3.82 (m, 1H) _-.__ — '. i- 2.2-2.7 (mt2H), 3.99 (U = 7.0Hz, 1H) 1.68 (mf2H), 2.37 (m, 2H) f 3.64 (t, J = 6.9Hzt1H) I ---------- 2.61 (dd , J = 9.4l13.8Hzl1 H), 2.78 (dd, J = 6.0 · 13.8HZ · 1 H) 3.78 (m, 1 H), 7.43 (d, J = 8.2Hzf2H) 17.60 (d1J = 8.2Hz, 2H ) l IR (v cm-1) Tao 3258, 1650, 1377, 1348,1163 (Nu) ol) 3403,3386,3265,1673,1320,1162 (Nujol) I rC σ > CO σ > 〇) CD to C 〇T- N OJ CM CVJ C: CO T- 3262,1663,1322, 1157, ^ 4 3265,1676,1642, 1337,1161 (Nujol) 3403,3261,1669, 1321,1160 3700-2200brt3264, 1635, 1342,1164, b (decomposition point) m.pt. (* C) i 173 > |! I 203-206 I 124-126! 139-141 I 167-169 172-173 r144 * 146 1〇fiE * pc: s; S 1¾ 20 a: Φ CD S々N v = z-ch2 · 〇 ^ £ 4 〇x / HQ 8 £ CO ch2- cf3ch2- < Q > -CH2CHr < 〇KHr Example No. CO ιΛ COCO σ >

-40- 200403216 HOHNQo^HNCVJosobla: Ή-ΝΜΕ(ΰ ppm) db-DMSO 2.60-2.82(m,2H),3.84(m, 1H) ,7,00-7.18(m,5H),7.62-7.80(m,4H), 2.70-2.93(m,2H),Z82(s,6H)t 3.75(m,1H), 0.71(d.J=6.8Hz,3H),0.74(dfJ=5.4Hz,3H),1. 73<m,1H},1.73(m,1H).3.22(m,1H};82(s,3 H)f7.05(d.J=9.0Hz,2H),7.69(d.J=9.0H2.2H} 2.80(dd,J=10.0,13.8Hz, 1 H),2.92(dd, | J=5.0,12.8Hz, 1 H),3.90(ddt J=5.4t 9.6H2.1H), ί 2.62(dd,J=9.9,13.5Hz J H).2.78(dd· J=5.8f 13.0Hz, 1H) ,3.77 (t, J=6.2Hzf 1H), 0.50-1.62(mf13H),3.56(t,J= 7.4Hz, 1H) 2.71 (dd,J=7.9,14.2Hz, 1 H),2.94(dd, 丨 J=6.9,14.2Hz, 1H).3.57(s, 3H}.3.83 (dcU=7.0,7.4Hz,1H) 2.25(5,3^,2.67((1(^^=7.5,14^2, 1H),2.95(dd, J=7.7· 14.6Hz· 1H}· 3.81 (C3(1,J=6.2J 4.2Hz, 1H) IR(v cm-1) (KBr) 3600-24005^3257, 1743,1721,1323,1132. _I CD s? §8 8S 3268,1632,1598, 1336,1162 <DG r- CD in -t- r— cvTcvf iD CM o 卜r to廿 CM eg CO产 ! 3258,1669,1509, 1322,1157 , 3278.2920,1632, 1337,/1161 3272,1631,1332, 1161 S CO Τ Ο CD 5*〇> O l〇 々r-CO 虫點(分解點: rn.pt.CC〉 116-118 _I 91-92 178-179 i 184-185 128-130 I ί 165-166 j 172-173 I 144-146 * P3 to a: ο χΠ Q- (CH3)2NH^ H3co^Q^ Q>-CH2- _ I £ o ό (CH3)2CH- — 〇2N^^CH2- R〇KH2- C^CHr I ί o ! H3cO—iLcH2· 實施例' No. 1 ο r-H •-H r—4 CO r—H •-H \n r—1 CD 卜 r—< -41- 200403216 3 表 HOHNOOOHNCNIocnQ&la:-40- 200403216 HOHNQo ^ HNCVJosobla: Ή-ΝΜΕ (ΰ ppm) db-DMSO 2.60-2.82 (m, 2H), 3.84 (m, 1H), 7,00-7.18 (m, 5H), 7.62-7.80 (m , 4H), 2.70-2.93 (m, 2H), Z82 (s, 6H) t 3.75 (m, 1H), 0.71 (dJ = 6.8Hz, 3H), 0.74 (dfJ = 5.4Hz, 3H), 1. 73 < m, 1H}, 1.73 (m, 1H) .3.22 (m, 1H); 82 (s, 3 H) f7.05 (dJ = 9.0Hz, 2H), 7.69 (dJ = 9.0H2.2H) 2.80 ( dd, J = 10.0,13.8Hz, 1 H), 2.92 (dd, | J = 5.0,12.8Hz, 1 H), 3.90 (ddt J = 5.4t 9.6H2.1H), ί 2.62 (dd, J = 9.9 , 13.5Hz JH) 2.78 (ddJ = 5.8f 13.0Hz, 1H), 3.77 (t, J = 6.2Hzf 1H), 0.50-1.62 (mf13H), 3.56 (t, J = 7.4Hz, 1H) 2.71 (dd, J = 7.9,14.2Hz, 1 H), 2.94 (dd, 丨 J = 6.9,14.2Hz, 1H) 3.57 (s, 3H) .3.83 (dcU = 7.0,7.4Hz, 1H) 2.25 (5 , 3 ^, 2.67 ((1 (^^ = 7.5,14 ^ 2, 1H), 2.95 (dd, J = 7.7 · 14.6Hz · 1H) · 3.81 (C3 (1, J = 6.2J 4.2Hz, 1H) IR (v cm-1) (KBr) 3600-24005 ^ 3257, 1743,1721,1323,1132. _I CD s? §8 8S 3268,1632,1598, 1336,1162 < DG r- CD in -t- r— cvTcvf iD CM o rr to 廿 CM eg CO! 3258,1669,1509, 1322,1157, 3278.2920,1632, 1337, / 1161 3272,1631,1332, 1161 S CO Τ CD 5 * 〇 > O l〇々r-CO insect point (decomposition point: rn.pt.CC> 116- 118 _I 91-92 178-179 i 184-185 128-130 I ί 165-166 j 172-173 I 144-146 * P3 to a: ο χΠ Q- (CH3) 2NH ^ H3co ^ Q ^ Q > -CH2 -_ I £ o ό (CH3) 2CH- — 〇2N ^^ CH2- R〇KH2- C ^ CHr I ί o! H3cO—iLcH2 · Example 'No. 1 ο rH • -H r—4 CO r— H • -H \ nr—1 CD rr— < -41- 200403216 3 Table HOHNOOOHNCNIocnQ & la:

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HOHNO0、、HNcvlocoo&ly !H-NMR(5 ppm) dfi-DMSO 2.60(ddlJ=9.0,13.8Hzl1H)l2.79(ddt J=9A13.8Hz,lH).3.76(m,1H) III! Mi σί X 〇〇 Λ n"X 〇 *σ X CM 05 <〇 T- <n Ό C4 ^fod CM 1 1 3.29(dd,J=5.7,10.7Hz, 1H) t3.43 (dd, 8.4,10.7Hz, 1 Η).3.62(γπ, 1H) ,7.85(A 2B 2q.J=8.7Hz,2H),7.88(A2B2q.J=8.7Hz. 2H),7.98{d,J=7.8H2,1H).10.61(s.lH) 2.69(dd,J=7.6f13.5H2t1H),2.93{dd( J=7.6>13.5Hz,1H)l3.77(tiJ=7.6H2l 1H),(CD3OD) 1 1 2.66(ddtJ=7.5l13.4Hz,1H),2.96(ddl J=7.6_M‘2Hz,1Hh3.81(n〇H} 1 ! W IR(vcm-l) (KBr) 3700-2200(br),3362,167〇, 1590,1336,1152 ! 3700-2200br,3372,1674, 1531,1348,1310,1161 _i 1 i I 3700-2400(br),3392, 1667,1320,1161 ! ^ 3700.2200(br)t1671, 1329,1163 i 3401,3260,1673, 1316,1165 融點汾解i m.pt.CC) 63-65 I 70-71 t r 192-193 69-70 1 160-162 > * Pi Ct5 Φ UL Φ 1 g Qch2- ! HOOC-CHr 1 hooc-ch2-ch2- HOCHr ,^~y-CH2〇CH2> HOOCH^^CHr Ο /= xz ο 實施例 No. I CO Cvj 卜 Ol 2 8二 (Ji CM o CO 9-^ CS3 CO CO -43- 200403216 5 表 (§.HOHNO0, HNcvlocoo & ly! H-NMR (5 ppm) dfi-DMSO 2.60 (ddlJ = 9.0, 13.8Hzl1H) l2.79 (ddt J = 9A13.8Hz, lH) 3.76 (m, 1H) III! Mi σί X 〇〇Λ n " X 〇 * σ X CM 05 < 〇T- < n Ό C4 ^ fod CM 1 1 3.29 (dd, J = 5.7, 10.7Hz, 1H) t3.43 (dd, 8.4, 10.7 Hz, 1 Η) 3.62 (γπ, 1H), 7.85 (A 2B 2q.J = 8.7Hz, 2H), 7.88 (A2B2q.J = 8.7Hz. 2H), 7.98 (d, J = 7.8H2,1H) .10.61 (s.lH) 2.69 (dd, J = 7.6f13.5H2t1H), 2.93 (dd (J = 7.6 > 13.5Hz, 1H) l3.77 (tiJ = 7.6H2l 1H), (CD3OD) 1 1 2.66 (ddtJ = 7.5l13.4Hz, 1H), 2.96 (ddl J = 7.6_M'2Hz, 1Hh3.81 (n〇H) 1! W IR (vcm-l) (KBr) 3700-2200 (br), 3362, 167〇, 1590,1336,1152! 3700-2200br, 3372,1674, 1531,1348,1310,1161 _i 1 i I 3700-2400 (br), 3392, 1667,1320,1161! ^ 3700.2200 (br) t1671, 1329,1163 i 3401,3260,1673, 1316,1165 melting point fen solution i m.pt.CC) 63-65 I 70-71 tr 192-193 69-70 1 160-162 > * Pi Ct5 Φ UL Φ 1 g Qch2-! HOOC-CHr 1 hooc-ch2-ch2- HOCHr, ^ ~ y-CH2〇CH2 > HOOCH ^^ CHr 〇 / = xz ο Example No. I CO Cvj 142 Ol 2 8 2 (Ji CM o CO 9- ^ CS3 CO CO -43- 200403216 5 Table (§ .

HoHMOOOHNcviococ&lcrHoHMOOOHNcviococ & lcr

lH-NMR(5 ppm) (k-DMSO 1 2.84-3.21(m、2Hh4.29(m, 1H) 丨, &) IR(v cm-1) (KBr) 1 3700-2400(50*1672, ! 1443,1327,1094 融點(分解^ m.pt.〇3) 1 141-145 * S 30 Qi |μ γ CD f1 〇 xz 5 x" 實施例 No, CO to CO -44- 200403216lH-NMR (5 ppm) (k-DMSO 1 2.84-3.21 (m, 2Hh4.29 (m, 1H) 丨, &) IR (v cm-1) (KBr) 1 3700-2400 (50 * 1672, 1443,1327,1094 Melting point (decomposition ^ m.pt.〇3) 1 141-145 * S 30 Qi | μ γ CD f1 〇xz 5 x " Example No, CO to CO -44- 200403216

6rtl) HoooeH^OS.Bo:表 T Ή-ΝΜΙΙ((5 ppm) (U-DMSO 2.95(dd, J=9.0,14.0H2,1 H),3.12(dd, ϋ=5.4·14·0Ηζ·1Η),4·13(ηι·ΐΗ)·7,29 (d,J=2.0Hzti H),8.34(d.J=8.6Hzt t H ).8.88(d.J=2.0Hz,1 H}.12.79(br.1 H} 2.88(dd,J=8.0,14.0Hz.1H},3.〇9(dd, J=6.0#14.0Hztl H),3.91 (m,1 ^,8.23 (m,1 H)(10.79(s, 1 H)tl 2 J0(br*,1 H) 2.75-3,06(m,2H),3.69(s,3H).3-90 3.17(dd,J=7.4,13.8Hz,1H),3.57(dd, J=5A13.9Hz,1H),3.80(t,J=5.6Hz, -1Η).8.11(^^7.4Η2%1Η) 2.77(dd,J=9.7,13-7Hz.1H),3.03(dd, 丨 J=4.9,13·3Ηζ· 1H) ,3.93(m· 1 Η)·8·38 (d,J=8.8H2,1H) I ~ I 2.40-2.90(01,2^,4.05(01,1H) ,8.51 (d,J=9.〇H;1H>J3.2(br,1H) 1 ·83(巾,2H),2.52(m,2H).3.70(m, 1H),8.32(d,J=9.0Hz,1H) 2.86(m1lH)r2.87(sl6H)I2.98(dd,J= 5.1,13.8Hz, 1 H),4.15{m, 1 ^,5.54 i) IR(v cm-1) .a<Br) 3276l2503br,1897br, 1724,1344,1170(Nuj〇l) 3386,3305,1747,1363, 1323,1161,1135(^)01} 2400-3700(br),1734, 1484,1327,1160 3446,3065,1594,1397, 1303,1154,1094 3184,1723,1337, 1317,1156 ^ 3276,1706,1344, 1260,1165/ <D CM CO crT 〇> CO 00 h- o σ> of co in CM CO CO CO ca co of CO O O) ρ CM 卜CQ CO ΤΟ ui O CNJ CVJ卜 CM -r- 融點(分解黑 159-161 227-229 181-189 198-200 213-215 176-177 153-156 I 103-105 * Dd 33 Cd. 含 g (CH3)2NH^j) S^N ^-ch2. i f1 〇 xH o x/H \ ·. % CO 丨 ch2· Q〇ch2- CF3CHr <^-ch2ch2- o ό 實施例 No. CJ cn 00 1—t r—» -45- 200403216 表76rtl) HoooeH ^ OS.Bo: Table T Ν-NMIL ((5 ppm) (U-DMSO 2.95 (dd, J = 9.0, 14.0H2, 1 H), 3.12 (dd, ϋ = 5.4 · 14 · 0Ηζ · 1Η ), 4.13 (ηιΐΗ), 7,29 (d, J = 2.0Hzti H), 8.34 (dJ = 8.6Hzt t H). 8.88 (dJ = 2.0Hz, 1 H). 12.79 (br.1 H} 2.88 (dd, J = 8.0, 14.0Hz.1H), 3.09 (dd, J = 6.0 # 14.0Hztl H), 3.91 (m, 1 ^, 8.23 (m, 1 H) (10.79 (s , 1 H) tl 2 J0 (br *, 1 H) 2.75-3,06 (m, 2H), 3.69 (s, 3H). 3-90 3.17 (dd, J = 7.4,13.8Hz, 1H), 3.57 (dd, J = 5A13.9Hz, 1H), 3.80 (t, J = 5.6Hz, -1Η). 8.11 (^^ 7.4Η2% 1Η) 2.77 (dd, J = 9.7,13-7Hz.1H), 3.03 (dd, 丨 J = 4.9,13 · 3Ηζ · 1H), 3.93 (m · 1 Η) · 38 · (d, J = 8.8H2,1H) I ~ I 2.40-2.90 (01,2 ^, 4.05 ( 01,1H), 8.51 (d, J = 9.〇H; 1H > J3.2 (br, 1H) 1.83 (towel, 2H), 2.52 (m, 2H) 3.70 (m, 1H), 8.32 (d, J = 9.0Hz, 1H) 2.86 (m1lH) r2.87 (sl6H) I2.98 (dd, J = 5.1,13.8Hz, 1 H), 4.15 (m, 1 ^, 5.54 i) IR (v cm-1) .a < Br) 3276l2503br, 1897br, 1724,1344,1170 (Nuj〇l) 3386,3305,1747,1363, 1323,1161,1135 (^) 01} 2400-3700 (br), 1734, 1484,1327,1160 3446,3065,1594,1397, 1303,1154,1094 3184,1723,1337, 1317,1156 ^ 3276,1706,1344, 1260,1165 / < D CM CO crT 〇 > C O 00 h- o σ > of co in CM CO CO CO ca co of CO OO) ρ CM bu CQ CO ΤΟ ui O CNJ CVJ bu CM -r- melting point (decomposed black 159-161 227-229 181-189 198 -200 213-215 176-177 153-156 I 103-105 * Dd 33 Cd. Contains g (CH3) 2NH ^ j) S ^ N ^ -ch2. I f1 〇xH ox / H \ ·.% CO 丨 ch2 Q〇ch2- CF3CHr < ^-ch2ch2- o Example No. CJ cn 00 1-tr- »-45- 200403216 Table 7

-46- 200403216 8 表 (Bo HOoa^HNOJosooa: T cc OSNaip sCIdsoi.Hl xtNxCVJco =Γ·σ)ε lln· (H 1NH3C04. p)0「寸 (H「s.」qqe'xlNHK6 =Γ·ρ)§€0·χι·ΝΗΚ6ΗΓ*ρ)ττ6.寸 •(huNH 寸·9'9,9=「 ·ορ)ε9·ε(Η ι·25·9 LCNJ*9=rpp)s 寸cvi •{5·Ε)§<ό·{δ NHc\J.N=3crCVJcvj*(mNH 寸·CQLo<our •ppuco-:xM-HrHo;7.=r-pp)89··»-- (ΗΙ.ΝΗΖ.8=Γ·ρ)9οα5 • (Η l-UJoconxT-'NHeCNil.-寸·9"Γ •pp)ssriItNH6CNilo:9=rTrPHtnco (huNH 5=rp^cocd*{HCVJ<n)6co.寸 ,{H 'E}s V (Η ΓΖΗ6·6Κ·54 •ppo9co-(HLNH6.6-oo.t^r*pp)t79co (Hlw./qmcocvi'xιΝΗΟ·6=Γ·ροτί··8 *Xι*Ε)96·ε_χτ~ΝΗκε 1«:寸4 -pp)sco-xlN工卜ο「卜CJ>=r-pp)5cvi πθϋ I sf (I!) HI sii Ο45κιο·οι- <ΝεΛι_9^ειηεεε (oinN)su InCNJcoKcof 9ιεΓΟ 960llnlou coOJsCVJszrscoco solcnsu ·9εει.·6οζτ-·ΌΖς\ίε cvf9u>3c3r8CMacvr6CVJc οε 寸 εΒοοζεοο33 suococtcocz 10)00¾ ·2εκ:£οοζεο033 291T-••SSL fcsfsztcsilnoccnsco nCJ-u2-46- 200403216 8 Table (Bo HOoa ^ HNOJosooa: T cc OSNaip sCIdsoi.Hl xtNxCVJco = Γ · σ) ε lln · (H 1NH3C04. P) 0 "Inch (H「 s. 」Qqe'xlNHK6 = Γ · ρ) § € 0 · χι · ΝΗΚ6ΗΓ * ρ) ττ6. Inch • (huNH inch · 9'9,9 = 「· ορ) ε9 · ε (Η ι · 25 · 9 LCNJ * 9 = rpp) s inch cvi • {5 · Ε) § &ό; {δ NHc \ JN = 3crCVJcvj * (mNH inch · CQLo < our • ppuco-: xM-HrHo; 7. = r-pp) 89 ·· »-(ΗΙ.ΝΗZ.8 = Γ · ρ) 9οα5 • (Η l-UJoconxT-'NHeCNil.-inch · 9 " Γ • pp) ssriItNH6CNilo: 9 = rTrPHtnco (huNH 5 = rp ^ cocd * (HCVJ < n) 6co.inch, {H ' E) s V (Η ΓZOΗ6 · 6Κ · 54 • ppo9co- (HLNH6.6-oo.t ^ r * pp) t79co (Hlw./qmcocvi'xιΝΗΟ·6=Γ·ροτί··8 * Xι * Ε) 96 Ε_χτ ~ ΝΗκε 1 «: inch 4 -pp) sco-xlN engineering ο『 B CJ > = r-pp) 5cvi πθϋ I sf (I!) HI sii Ο45κιο · οι- < ΝεΛι_9 ^ ειηεεε (oinN) su InCNJcoKcof 9ιεΓΟ 960llnlou coOJsCVJszrscoco solcnsu · 9εει. · 6οζτ- · ΌZOς \ ίε cvf9u > 3c3r8CMacvr6CVJccoJns nsec εΒοοζοοο33 suococtcoTccccczc} 003⁄2

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.^XOX^WTOOOX cocsl rcos cns ο ε i ε ε -47· 200403216 表 (Bo HOOO^HNcviocooocc iH-NMR(<5 ppm) dc^DMSO 3.06(dd, J=5.4,14.4Hz, 1 H),3.14{dd, J=5.1,14.4Hz,1H),3.65(t,J:=5,4Hz· 1H),6.92(m,1H),10.72(5,1H) 3.17-3.50 (m,2H),4.51 (m, 1H) s ^ g 23 3420,1588,1402, 1324,1151 2200-3700brf1734, 1334,1161 融點(分解·“ m.ptCC) 243-246 15M56 ! * P5 » μ GO S 〇icH2- £ 實施例 No. •r CO in 200403216 M hoqoohnwosocid:. ^ XOX ^ WTOOOX cocsl rcos cns ο ε i ε ε -47 · 200403216 Table (Bo HOOO ^ HNcviocooocc iH-NMR (< 5 ppm) dc ^ DMSO 3.06 (dd, J = 5.4, 14.4 Hz, 1 H), 3.14 {dd, J = 5.1,14.4Hz, 1H), 3.65 (t, J: = 5,4Hz · 1H), 6.92 (m, 1H), 10.72 (5,1H) 3.17-3.50 (m, 2H), 4.51 (m, 1H) s ^ g 23 3420,1588,1402, 1324,1151 2200-3700brf1734, 1334,1161 Melting point (decomposition · “m.ptCC) 243-246 15M56! * P5» μ GO S 〇icH2- Example No. • r CO in 200403216 M hoqoohnwosocid:

元索分析 1 I C24H22N205S.a5H20 Ca(c. C:62.73 H:5.04 N:6.10 S:6.98 Foun.C:62.75 H:5.08 N:6.31 S:7.05 C24H22N2O5S*0.8H2O Calc. C:62.00 H:5.12 N:6.03 S:6.90 F〇un.C:62*03 H:5.06 N:6.08S:6.82 I 1 I C17Hi9NO4S*0.1CF3COOH Calc. 0:59.99 H:5.58 N:4.06 5:9.30 Foun.C:60.37 H:5.74 N:4.13 3:9.76 1 与)IR〈v cm-1) * (KBy) 1726,1354 1326,1161 1732,1594 1404,1155 1607,1594 1294,1153 .1724,1594 1326,1159 1685,1349 1166 1 1725,1599 1372,1173 / 1745,1653 1391,1147 1714,1594 1334.1166 融點(分解^ m.pt.CC) j &gt;145 I 188-190 90-93 149-152 1 104-107 I i 167-169 i ;155-157* I [ * ή 30 oc 丨· H3CO X IL | H3CS-〇~〇· I CM δ J Q COOC2H5 〇tn1.h £ 0 rzH Q ◦ F= xz Q 〇ίι〇Η2- ci〇H2- (CH3)2CH- 實施例 No. •^D CO 卜 cn CO 0 CO 0 1 .^ Γ0 n4 TO -49- 200403216 1 1 表 (B1) ΗΟΟΟ^,Η^ΟΓα: 元素分祈 C2tH27NO4S.0.3H2O Calc. 0:63.87 H:7.04 N:3.55 S:8.12 Foun.C:63.84 H:6,86 N:3.42 S:8.01 C23H23N04S.a3H20 Calc. 0:66.58 H:5.73 N:3.38 S:7.73 Foun.C:66.45 H:5.52 M:3.24 2:7.56 I 1 4 Ct7H18FN04S Calc. 0:58.11 H:5.16F:5.41 N:3.99 3:9.12 F〇un.C:58.11 H:5.17 F:5.86 N:3.92 S:9.69 I i C27H23NO4S*0.7H2〇 Calc. 0:68.98 H:5.23 N:2.98 S:6.82 F〇un.C:69.08 H:5.09 N:2.91 S;6.73 1 5) IR(v cm-1) | a®r) 1724,1340 1328,1167 σ&gt; o N v- r— »— CO CV .N CO Y— T— in co T— cTco 寸l〇 CD iD (D ▼—· v-· σί T- ^r 卜CO r- -v CO o ^00 &lt;〇tn -CO r- T— r— I 1681,1319 /1162 ;S1340 寸 CVJ CO o' O) in tn 卜T- 融點(分解ϋ m.ptCC) 196-197 241-243 _I 157-159 175-176 145-147 183-186 183-184 224-226 * P4 Pi X JCQ * o h3c〇^〇- i X § (CH3)2CH- (CH3)2CH- ; . -1 (CH3)2CH· (CH3)2CH- _ . . I (ch3)2ch· (ch3)2ch- Ο ό 實施例 No. in -r to t . 卜 CO 7 CD ;^ o in ΙΟ 50 200403216 表1 2 {«) HOOo+HNNOSacc α:Η 元尜分析 1 i I C18H21N〇4S2.0.2H2O Calc. C:56.43 H;5.63 N:3.66 8:16.74 F〇un.C:56.74 H:5,67 N:3.86 S:16.35 I I \ 〇2^Η|βΝ2〇482#〇.3Η2〇 ! Calc. C:58.40 H:4.34 N:6.45 S:14.85 Foun.C:58.40 H:4.44 N:6.58 S:14.57 ;C17Hi4CIN3〇6S-0.3H2〇 Calc. 0:47.48 H:3.44 Cl:8.39 N:9.65 S:7.52 Foun.C:47.57 H:3.43 Cl:8.26 N:9.79 S:7.47 1 IR(v cm-1) a®r) 1 1685,1349 1166 1691,1567 1390,1159 OJ寸 O) CD l〇 *- 寸CVJ 卜c〇 τ— y— | 1746,1337 ί 1164 . I 1649,1337 1165 ^ 1588,1308 1141 / 1744,1592 1323,1160 寸卜 co N CO *»— h^CM l〇 CO 卜 ^- r-τ- r— r- 融點(分解製 m.pt.〇C) _-J Ί i 157-160 j I I 111-112 -1 194-195 1197-199 108-110 187-190 239-243 222-224 * Pi Pi 90 Oi 〇 £ ί 學 &lt;y〇r hoochQk (H3C)2N-hT^ ,i&gt; ί ο 0^CH2· &lt;Qkch2_ C^cHr (CH3)2CH- o r= X'Z 〇 DicH2- 8 /==^ uz Q ^£ί Ο Γ= Χ2 Q 實施例 No. CO LO CO ΙΛ »Λ lO ΙΛ tO w 卜 in 1 00 1Λ ιηYuan cable analysis 1 I C24H22N205S.a5H20 Ca (c. C: 62.73 H: 5.04 N: 6.10 S: 6.98 Foun.C: 62.75 H: 5.08 N: 6.31 S: 7.05 C24H22N2O5S * 0.8H2O Calc. C: 62.00 H: 5.12 N: 6.03 S: 6.90 F〇un.C: 62 * 03 H: 5.06 N: 6.08S: 6.82 I 1 I C17Hi9NO4S * 0.1CF3COOH Calc. 0: 59.99 H: 5.58 N: 4.06 5: 9.30 Foun.C: 60.37 H: 5.74 N: 4.13 3: 9.76 1 and) IR <v cm-1) * (KBy) 1726,1354 1326,1161 1732,1594 1404,1155 1607,1594 1294,1153 .1724,1594 1326,1159 1685, 1349 1166 1 1725,1599 1372,1173 / 1745,1653 1391,1147 1714,1594 1334.1166 Melting point (decomposition ^ m.pt.CC) j &gt; 145 I 188-190 90-93 149-152 1 104-107 I i 167-169 i; 155-157 * I [* price 30 oc 丨 · H3CO X IL | H3CS-〇 ~ 〇 · I CM δ JQ COOC2H5 〇tn1.h £ 0 rzH Q ◦ F = xz Q 〇ίι〇Η2 -ci〇H2- (CH3) 2CH- Example No. • ^ D CO BU cn CO 0 CO 0 1. ^ Γ0 n4 TO -49- 200403216 1 1 Table (B1) ΗΟΟΟ ^, Η ^ ΟΓα: C2tH27NO4S.0.3H2O Calc. 0: 63.87 H: 7.04 N: 3.55 S: 8.12 Foun.C: 63.84 H: 6,86 N: 3.42 S: 8.01 C23H23N04S.a3H20 Calc. 0: 66.58 H: 5.73 N 3.38 S: 7.73 Foun.C: 66.45 H: 5.52 M: 3.24 2: 7.56 I 1 4 Ct7H18FN04S Calc. 0: 58.11 H: 5.16F: 5.41 N: 3.99 3: 9.12 F〇un.C: 58.11 H: 5.17 F : 5.86 N: 3.92 S: 9.69 I i C27H23NO4S * 0.7H2〇Calc. 0: 68.98 H: 5.23 N: 2.98 S: 6.82 Foun.C: 69.08 H: 5.09 N: 2.91 S; 6.73 1 5) IR ( v cm-1) | a®r) 1724,1340 1328,1167 σ &gt; o N v- r— »— CO CV .N CO Y— T— in co T— cTco inch 10CD iD (D ▼ — ·· v- · σί T- ^ r CO r- -v CO o ^ 00 &lt; 〇tn -CO r- T— r— I 1681,1319 / 1162; S1340 inch CVJ CO o 'O) in tn BU T- Melting point (decomposition ϋ m.ptCC) 196-197 241-243 _I 157-159 175-176 145-147 183-186 183-184 224-226 * P4 Pi X JCQ * o h3c〇 ^ 〇- i X § ( CH3) 2CH- (CH3) 2CH-;. -1 (CH3) 2CH · (CH3) 2CH- _.. I (ch3) 2ch · (ch3) 2ch- 〇 Example No. in -r to t. Bu CO 7 CD; ^ o in ΙΟ 50 200403216 Table 1 2 {«) HOOo + HNNOSacc α: Η elementary analysis 1 i I C18H21N〇4S2.0.2H2O Calc. C: 56.43 H; 5.63 N: 3.66 8: 16.74 F. un.C: 56.74 H: 5,67 N: 3.86 S: 16.35 II \ 〇2 ^ Η | βΝ2〇482 # 〇.3Η2〇! Calc. C: 58.40 H: 4.34 N: 6.45 S: 14.85 Foun. C: 58.40 H: 4.44 N: 6.58 S: 14.57; C17Hi4CIN3〇6S-0.3H2 Calc. 0: 47.48 H: 3.44 Cl: 8.39 N: 9.65 S: 7.52 Foun.C: 47.57 H: 3.43 Cl: 8.26 N: 9.79 S: 7.47 1 IR (v cm-1) a®r) 1 1685,1349 1166 1691,1567 1390,1159 OJ inch O) CD l〇 *-Inch CVJ bu c〇τ— y — | 1746,1337 ί 1164. I 1649,1337 1165 ^ 1588,1308 1141 / 1744,1592 1323,1160 inch bu co N CO * »— h ^ CM l〇CO bu ^-r-τ- r— r- melting point (decomposition system m.pt.〇C) _-J Ί i 157-160 j II 111-112 -1 194-195 1197-199 108-110 187-190 239 -243 222-224 * Pi Pi 90 Oi 〇 £ ί Learn &lt; y〇r hoochQk (H3C) 2N-hT ^, i &gt; ί 0 ^ CH2 · &lt; Qkch2_ C ^ cHr (CH3) 2CH- or = X 'Z 〇DicH2- 8 / == ^ uz Q ^ £ ί Ο Γ = χ2 Q Example No. CO LO CO ΙΛ »Λ lO ΙΛ tO w inin 1 00 1Λ ιη

-51- 200403216 £) HOHNOOOH^osda: S〇 §9 x〇 2 ^ ώ ?〇 -:5¾ nSI? 2 ϊ S J· 1¾ Ιμ 茬δ -Λ* ϊ3 'ω 5ΐ Η CM ^Λχ οα —j τ- ΙοΓ Μ CV勹 古η 寸· χ ••产 5 £ 45χ Τ3 τ— t— S. cd jy X ν— Ε Ν τ— &lt;〇 Sx II ^- 5ε X &lt;η Γ; ϊΓ oi^.x ΪΪΜν °i ν5 &quot;un^ 3tn J* 〇j 4 Β 呈· 5£ X r^m 4 Urn· -T· fs· KJ* i _ S.4«' Ssl OJ r- 〇 爰in- tt ^ η S£ 5?ΐ s &lt;〇** 4 冰 c\j,① 卜 00 oi s E s c\i s cvi 蓄 寸产 £ νϋχ g - s Ik f O l〇 O CVJ 5J2 B2 艺· CO 二·百 爱1 SS s if) ^r- ss CD ^- f S ir- 寸**卜 Si &lt;9*1- Cvi4 go tn !〇▼-▼-· ss ^ CO CO S S in t·* f:Si &lt;0 COv ^ V— S£5 ss l〇 T- ^c3 CD 〇 ?s CO rr C〇 ir- *cvT S ①T- &gt;r— r^· ss N· C〇 V— T— 裟 |e 謹1 麓s i €0 5 T— I 5 &gt;ά 寸 τη- 1 1 I 1 * cm « CO Ρί m X βί ό ό ό ό Φ ό ό ό Φ ό Φ ό Φ ό Φ ό £ ο ό Ο χζΗ ο ο χΓ ο ± £ ο £ O £ /=j o-z 〇 έ ο ^〇i o x/H Q LL Ci £ o 〇 /=7) O-Z o m〇 铒Z ο &lt;〇 to ·、 &lt;〇 Γ〇 &lt;〇 T to - ΙΛ &lt;〇 &lt;〇 卜-51- 200403216 £) HOHNOOOH ^ osda: S〇§9 x〇2 ^? -〇-: 5¾ nSI? 2 ϊ SJ · 1¾ Ιμ stub δ -Λ * ϊ3 'ω 5ΐ Η CM ^ Λχ οα —j τ- ΙοΓ Μ CV 勹 古 η Inch · χ •• Producing 5 £ 45χ Τ3 τ— t— S. cd jy X ν— Ε Ν τ— &lt; 〇Sx II ^-5ε X &lt; η Γ; ϊΓ oi ^ .x ΪΪΜν ° i ν5 &quot; un ^ 3tn J * 〇j 4 Β was 5 £ X r ^ m 4 Urn · -T · fs · KJ * i _ S. 4 «'Ssl OJ r- 〇 爰 in- tt ^ η S £ 5? ΐ s &lt; 〇 ** 4 ice c \ j , ① bu 00 oi s E sc \ is cvi reserve production £ νϋχ g-s Ik f O l〇O CVJ 5J2 B2 Art · CO II · Baiai 1 SS s if) ^ r- ss CD ^-f S ir- inch ** 卜 Si &lt; 9 * 1- Cvi4 go tn! 〇 ▼-▼-· ss ^ CO CO SS in t · * f: Si &lt; 0 COv ^ V— S £ 5 ss l〇T- ^ c3 CD 〇? S CO rr C〇ir- * cvT S ①T- &gt; r- r ^ · ss N · C〇V- T- 裟| e 11 麓 si € 0 5 T— I 5 &gt; ά Inch τη- 1 1 I 1 * cm «CO Ρί m X βί ό ό ό ό ό Φ ό Φ ό Φ ό Φ ο ό ο ό ο ό Ο χζΗ ο ο χΓ ο ± £ ο £ O £ / = j oz 〇έ ο ^ 〇iox / HQ LL Ci £ o 〇 / = 7) O-Z o m〇 铒 Z ο &lt; 〇 to ·, &lt; 〇 Γ〇 &lt; 〇 T to-ΙΛ &lt; 〇 &lt; 〇 Bu

-52· 200403216 (B1) ΗΟΟΟΟΗίδέα: Ή·ΝΜβ(δ ppm) da-DMSO 2.72 (dd, J=8.7,13.6Hz. 1H) ,2.94(dd, J=5.6,13.6H:s,lH).3.84(ddd,J=5.6, 8.7.Θ.7Η2,1 Η),8.23(ϋ, J=:8.7H2,1H) 2.88(dd, J=7.4,15.2Hz, 1 H),3.07(dd, J=6.2,14.4Hz( 1H) ,3.83 (m, 1H) ,8.08 (m, 1H), 10.80(s, 1H), 12.70(br, 1H) (d,J=8.4Hz,1H) 0.89(d,J=7.0Hzt3H},0.98(dJ=6.8 H2&gt;3H)f2.12{m,2H),3.80(dd,J=:4.7 &quot;,9.7Η2,1Η),5.17(^^9.6Η2#1Η) 2.78-3.10(m,2H) .3.67(s,3H), 3.86(m,1H) 2.34{s.3H),2J5-3.08(m,2H),3.86(nUH&gt;· 8.19(dfJ=8.4H2,1H) -—- 1' 丨 2.78-3.08(m,2H).3.85(m, 1 H)t8.18 (d,J=8.6Hz,lH) 2.55(st3H),2.79-3.11 (m,2H),3.98 I έ ^ g 2400-3600br,3345,3213, 1735,1700,1346,1163 j 3410.3276,1724,1582, 1488,1331,1152(Nujol) _i 3412,1724,1582,1488. 1332,1152 co CO od CO (D 5t- oj in 卜CVI r— y—· ^Fco in 〇〇 CO ^ 3273,1724,1582,148¾ 1331,1198,1153 cvj CO in uf co CM UD «— 二、二 r-卜 00 Oi CVJ -r-CO ^ Ο) O CO 寸C〇 CO I 3415.1725,1582,1488, I 1329,1196,1174,1152 寸04 O UJ CO 1- 寸CO CO CO r- C\J 〇J 寸兮 卜CO * 5C· cn co CM l〇 CO T- 融點(分解黑 m.pt:CC) 108-109 _I 82-87 foam V • 137-138 I l I 236-237 * P4 CO P4 s s CO X 〇-0〇- o*°o~ QrOr : 6 〇· ό Qr&lt;y OQr 0-0- I o r= X2 O o /= X2 o (ch3)2ch· o X /=j O-Z O \ &quot;威.. o r= X2 Q u. n £ x 〇 8 /== o-z o 實施例丨 No. o «3 CM VO CO CD to to to •&gt;D 卜 -53- 200403216 •(sHOOo^HI^OScoa: 元紫分祈 I C24H22N2O7S2 Calc. 0:56.02 H:4.31 N:5.44 S:12.46 F〇un.C;55.75 H;4.40 N:5.41 S:12.21 \ 1 ί δ) IR( ν cm-1) (KBr) O CM σ&gt; χη ΙΟ CM v— r— coW O O l〇 CO UQ T-*t— T— 1735,1583 1362,1171 I 1733,1583 1150 融點(分解^ m.pt.〇C) &gt;240 I 1 * s 30 Oi Φ 〇 Φ § Ο: Οώ-cH. •Μ δ 5 Q j COOC2H5 O*Lch2- 獅例 No. 00 CJ) 〇 卜-52 · 200403216 (B1) ΗΟΟΟΟΗίδέα: ΝΝΜβ (δ ppm) da-DMSO 2.72 (dd, J = 8.7, 13.6Hz. 1H), 2.94 (dd, J = 5.6, 13.6H: s, lH) 3.84 (ddd, J = 5.6, 8.7.Θ.7Η2,1 Η), 8.23 (ϋ, J =: 8.7H2, 1H) 2.88 (dd, J = 7.4, 15.2Hz, 1 H), 3.07 (dd, J = 6.2, 14.4Hz (1H), 3.83 (m, 1H), 8.08 (m, 1H), 10.80 (s, 1H), 12.70 (br, 1H) (d, J = 8.4Hz, 1H) 0.89 (d, J = 7.0Hzt3H}, 0.98 (dJ = 6.8 H2 &gt; 3H) f2.12 (m, 2H), 3.80 (dd, J =: 4.7 &quot;, 9.7Η2,1Η), 5.17 (^^ 9.6Η2 # 1Η) 2.78 -3.10 (m, 2H) 3.67 (s, 3H), 3.86 (m, 1H) 2.34 (s.3H), 2J5-3.08 (m, 2H), 3.86 (nUH &gt; · 8.19 (dfJ = 8.4H2,1H ) -—- 1 '丨 2.78-3.08 (m, 2H) 3.85 (m, 1 H) t8.18 (d, J = 8.6Hz, lH) 2.55 (st3H), 2.79-3.11 (m, 2H), 3.98 I ^ ^ 2400-3600br, 3345, 3213, 1735, 1700, 1346, 1163 j 3410.3276, 1724, 1582, 1488, 1331, 1152 (Nujol) _i 3412, 1724, 1582, 1488. 1332, 1152 co CO od CO (D 5t- oj in BU CVI r— y— · ^ Fco in 〇〇CO ^ 3273,1724,1582,148¾ 1331,1198,1153 cvj CO in uf co CM UD «— two, two r-bu 00 Oi CVJ -r-CO ^ 〇) O CO Inch C〇CO I 3415.1725,1582,1488, I 1329,1196,1174,1152 Inch 04 O UJ CO 1- CO CO CO r- C \ J 〇J inch Xibu CO * 5C · cn co CM l〇CO T- melting point (decomposed black m.pt: CC) 108-109 _I 82-87 foam V • 137-138 I l I 236-237 * P4 CO P4 ss CO X 〇-0〇- o * ° o ~ QrOr : 6 〇 Qr &lt; y OQr 0-0- I or = X2 O o / = X2 o (ch3) 2ch O X / = j OZ O \ &quot; W .. or = X2 Q u. N £ x 〇8 / == oz o Example 丨 No. o «3 CM VO CO CD to to to &gt; D -53- 200403216 • (sHOOo ^ HI ^ OScoa: Yuan Zi Fen Qi I C24H22N2O7S2 Calc. 0: 56.02 H: 4.31 N: 5.44 S: 12.46 F〇un.C; 55.75 H; 4.40 N: 5.41 S: 12.21 \ 1 ί δ) IR (ν cm-1) (KBr) O CM σ &gt; χη ΙΟ CM v— r— coW OO l〇CO UQ T- * t— T— 1735,1583 1362,1171 I 1733,1583 1150 Melting point (Decomposition ^ m.pt.〇C) &gt; 240 I 1 * s 30 Oi Φ 〇Φ § Ο: 〇ώ-cH. • Μ δ 5 Q j COOC2H5 O * Lch2- Lion Case No. 00 CJ) 〇 Bu

-54- 200403216 6 表 (Qo HQHNOO^HNcv/osabla: S〇 CO W 画均 ώ &lt;q 27 T xfU mQ 二一 fix ε® n τδ2 ςτ·卜 ι $ « 111 &lt;d cvi^- 匕04二 m 寸·?Τ&lt;ς co σ) » cvico S:-,- X 9 ^r CO 2 CO· x ο σ&gt; X 令45· 3Sg d cvi co δ 1 s 04 &amp; CVJ τ- q CO 5f II ^- 3 E ss d cv? l I|f f§£ °? h: i〇 於 X 〇 —) 二二 σ l#| 〇&gt;»/&gt;&lt;. C\[卜’ C\i 工§ K Ip §p* cvi E in ! £ ^ &gt;§ W 〇 一 s §s O CO Si2 I · O &lt;D ss C3 r- ci &lt;D ^ ί2 ε Ο l〇 W το s 卜· co CO T- &lt;0 (D cJ3 〇 CM CVJ ΤΟ C\J t 1 2 μ S造 I:- 0 C5 SI2 8S N &lt;D CO r- 1 · * m 騸 Φ 〇 耀δ O r— f g} &gt;1 CO s 1 * P: Οί ot Φ 寸 £ o 妾 o ! 卜 X o £ 0 1 ¢9 ? Ο £ Ο £ . ο 6 CM X o ό 全 a 0 ^£J Ο ό 士 Ο x/i Ο ^£1 ϋ 0 〇 χ2Π 〇 ti »—4 卜 r】 •'CO ΙΟ 卜 t- tv 卜 -55- 200403216 7 1 表 (ql) HOHNOo/*\HNolos&lt;0l£E Ή-ΝΜϋ((5 ppm〉 dc-DMSO 2.79(ddiJ=8.5l13.4Hzl1H),2,89(ddt J=6.0,13.4Hz,1 H),3.81 (ddtJ=6.0* a.5H2_1H).6.55(d.J=15.5Hz,1H) 2.78(dd, J=8.6,13.4Hzt 1H),2.91(ddTJ=6 .0,13.4Hz, 1 H),3.92(ABq, J=13.5Hzf 1H) _3.90(Π1·1Η)·9·01{5·1Η)·10·78(5·ΊΗ) I s 25 3700-2400(br),3312, 1629,1329,1144 j 3700-2200(br),1670, 1318,1152 ! 融黠(分解黑 m.pt〇C) | • I 138-139 69-70 1 * cti zo Oi 〇^h2- i ό &lt;0hCHr Q^· 1 〇Δ-〇η2. 實施例1 No. ! * 1 卜 00 卜 σ&gt; 卜 •56- 200403216 8 1 表 ωι) Η000/*、ΗΝ2ο99α: &gt;H-NMR(6 ppm) dfi.DMSO N·' 111 N —3。 _ igs: 卜· &lt;〇 &lt;5*24 啟 d 〇·' 0.88 (t, J=6.9Hz,3H) ,2.55-2,73 (m,2H) ,2.9 7(dd,J=8.4,13.8Hzi1H)l3.24(ddlJ=4.8l13. 8Hz, t H).4.35(m· 1 H),4.98(m, 1H) (CDCb) ^ n*3 51S8 ΟΙ·$£ §4£ s· °ί 4 ch^-2. xxg 寸 ΙΟ ^co ^ 甚Α备 ο -α X ” ι〇工 NJiS 51^&lt;6 寸,fe二 i^£ ^ N S 1.55 2^e· 思·〇_&lt;〇· CM »- i- 3.03 (dd, J=6.5,15.1 Hz J H) ,3.15 | (dd,J=4.7t14.1Hzl1H)i3.64(t. J=5.1Hz,1H),10.68(s,1H) £xx Z?- CD 9x2 x££ ^:5λ σ&gt; »- S^&gt;1 S£5 oi n hi M ^-xx 5 h i&gt;co N o X q ii co to 飞 co· 趙 x 〇 S -.xx ca二产 -j卜产 σ&quot; co P H·'寸· co 2!-ci § g 供:· q 2 1£β :S CD Ci co 1 ^ ' y&gt; 111 二 X ' ο ο — l S) IR(v cm-1) (KBr) 1 CO n 各1〇 f· ss 9^. §2 &lt;〇&quot; id S5 *C〇 0 xf O CO S$2 * Κ §5 Is- CO CO 'f— 8¾ 於 1 CO is L〇 f— ΤΓ- ▼— y— C3 Si2 CO &lt;〇 s N r— CvT So 好 〇7 §S Sit ccT R! t— co· &lt;〇 §1 •Q b 8¾ N ” cp — §5 .S12 §5 s - g 2 r-Γ ^ S?s a · 2 S 荔2 态e Si V s s 〇 Λ m 1 1 1 CtS oi Pci .« oi 9» Φ s o 1 N* o ? o 1 η £ Ο ί* ο £ V w P δ 6 〇 ό z ό I CM 5 0 〇 0 全 υ ό ^CJ o /= xz o a r= TZ. o _P4 a :ό έ* ο ό £ O xz o m6 »&quot; m 卜 ri •、co 卜 c〇 N 卜 ¢0 Ν. cn 卜 57- 200403216 col) HOOo^H^osicc ί 元粢分折 1 I C24HigN3〇5S*1,3H2〇 Calc. 0:59.45 H:4.49 N:8.67 S:6.61 Foun.C:59.43 H:4.45 N:8.59 S:6.58 I t 1 fi)lR(i/ cm-1) 1 (KBr) | &lt;〇寸 O) w m r- ;·:· o寸 h- CO »— r— 1576.1356 1139 1732,1342 1167 1745,1590 1316,1157 μ CD 00 in co 寸o σ&gt; ο in cm 融點(分解累 m.pt.〇C) 153-155 —___i &gt;130 _ 128-130 I i 210*214 198-200 * P4 Pi VC a: 3 n-CgH^- i 2^0 5 tt ft 6 Q-CHa- ^£1 〇 xzH Q /==· xz Q 實施例 No. 〇 00 r—# 00 Cl CO co 00 呷 00 奢 · -58· 200403216 表2 Ο (£ χοχΝΟ0ς^ΗΝ&lt;\1οω€6ια: cc-54- 200403216 6 Table (Qo HQHNOO ^ HNcv / osabla: S〇CO W Paintings are free of charge &lt; q 27 T xfU mQ Twenty-one fix ε® n τδ2 ςτ · buy $ «111 &lt; d cvi ^-Dagger 04 2 m inches? Τ &lt; ς co σ) »cvico S:-,-X 9 ^ r CO 2 CO · x ο σ &gt; X Let 45 · 3Sg d cvi co δ 1 s 04 &amp; CVJ τ- q CO 5f II ^-3 E ss d cv? L I | ff§ £ °? H: i〇 在 X 〇—) 二 二 σ l # | 〇 &gt; »/ &gt; &lt;. C \ [卜 'C \ i § K Ip §p * cvi E in! £ ^ &gt; § W 〇 一 s §s O CO Si2 I · O &lt; D ss C3 r- ci &lt; D ^ ί 2 ε Ο l〇W το s co CO T- &lt; 0 (D cJ3 〇CM CVJ ΤΟ C \ J t 1 2 μS I:-0 C5 SI2 8S N &lt; D CO r- 1 · * m 骟 Φ 〇 耀 δ O r— fg } &gt; 1 CO s 1 * P: Οί ot Φ inch £ o 妾 o! bu X o £ 0 1 ¢ 9? 〇 £ Ο £. ο 6 CM X o ό all a 0 ^ £ J Ο ό 士 Ο x / i 〇 ^ £ 1 ϋ 0 〇χ2Π 〇ti »—4 rr] • 'CO ΙΟ t t- tv --55- 200403216 7 1 Table (ql) HOHNOo / * \ HNolos &lt; 0l £ E Ή-ΝΜϋ ( (5 ppm> dc-DMSO 2.79 (ddiJ = 8.5l13.4Hzl1H), 2,89 (ddt J = 6.0, 13.4Hz, 1 H), 3.81 (ddtJ = 6.0 * a.5H2_1H) .6.55 (dJ = 15.5Hz, 1H) 2.78 (dd, J = 8.6,13.4Hzt 1H), 2.91 (ddTJ = 6.0, 13.4Hz, 1 H), 3.92 (ABq, J = 13.5 Hzf 1H) _3.90 (Π1 · 1Η) · 9 · 01 (5 · 1Η) · 10 · 78 (5 · ΊΗ) I s 25 3700-2400 (br), 3312, 1629, 1329, 1144 j 3700-2200 (br), 1670, 1318,1152! Rong (decomposed black m.pt〇C) | • I 138-139 69-70 1 * cti zo Oi 〇 ^ h2- i & &lt; 0hCHr Q ^ · 1 〇Δ -〇η2. Example 1 No.! * 1 0000 σσ &gt; • 56- 200403216 8 1 Table ω)) Η000 / *, ΗΝ2ο99α: &gt; H-NMR (6 ppm) dfi.DMSO N · '111 N —3. _ igs: BU &lt; 〇 &lt; 5 * 24 Kai d. 0.88 (t, J = 6.9Hz, 3H), 2.55-2,73 (m, 2H), 2.9 7 (dd, J = 8.4, 13.8Hzi1H) l3.24 (ddlJ = 4.8l13. 8Hz, t H). 4.35 (m · 1 H), 4.98 (m, 1H) (CDCb) ^ n * 3 51S8 〇1 · $ £ §4 £ s · ° ί 4 ch ^ -2. xxg inch ΙΟ ^ co ^ even Α 备 ο -α X "ι〇 工 NJiS 51 ^ &lt; 6 inches, fe 2i ^ £ ^ NS 1.55 2 ^ e · 思 · 〇_ &lt; 〇 CM »-i- 3.03 (dd, J = 6.5, 15.1 Hz JH), 3.15 | (dd, J = 4.7t14.1Hzl1H) i3.64 (t. J = 5.1Hz, 1H), 10.68 (s, 1H) £ xx Z?-CD 9x2 x ££ ^: 5λ σ &gt; »-S ^ &gt; 1 S £ 5 oi n hi M ^ -xx 5 h i &gt; co N o X q ii co to Fei Zhao x 〇S -.xx ca secondary production -j 产 σ &quot; co PH · 'inch · co 2! -ci § g for: q 2 1 £ β: S CD Ci co 1 ^' y &gt; 111 two X ' ο ο — l S) IR (v cm-1) (KBr) 1 CO n each 10f · ss 9 ^. §2 &lt; 〇 &quot; id S5 * C〇0 xf O CO S $ 2 * Κ §5 Is- CO CO 'f— 8¾ to 1 CO is L〇f— ΤΓ- ▼ — y— C3 Si2 CO &lt; 〇s N r— CvT So Good 〇7 §S Sit ccT R! T— co · &lt; 〇 §1 • Q b 8¾ N ”cp — §5 .S12 §5 s-g 2 r-Γ ^ S? Sa · 2 S Li 2 state e Si V ss 〇Λ m 1 1 1 CtS oi Pci. «oi 9» Φ so 1 N * o? o 1 η £ Ο ί * ο £ V w P δ 6 〇ό z ό I CM 5 0 〇0 υ ό ^ CJ o / = xz oar = TZ. O _P4 a: όέ * ο £ £ O xz o m6 »&quot; m BU ri •, co bu c〇N ¢ 0 0 Ν. Cn 57 57- 200403216 col) HOOo ^ H ^ osicc ί Yuan Zhe points 1 I C24HigN3〇5S * 1,3H2〇Calc. 0: 59.45 H: 4.49 N: 8.67 S: 6.61 Foun.C: 59.43 H: 4.45 N: 8.59 S: 6.58 I t 1 fi ) lR (i / cm-1) 1 (KBr) | &lt; 〇 inch O) wm r-; ·: · o inch h- CO »— r— 1576.1356 1139 1732,1342 1167 1745,1590 1316,1157 μ CD 00 in co inch o σ &gt; ο in cm melting point (decomposed tired m.pt.〇C) 153-155 —___ i &gt; 130 _ 128-130 I i 210 * 214 198-200 * P4 Pi VC a: 3 n -CgH ^-i 2 ^ 0 5 tt ft 6 Q-CHa- ^ £ 1 〇xzH Q / == xz Q Example No. 〇00 r— # 00 Cl CO co 00 呷 00 Luxury · -58 · 200403216 Table 2 Ο (£ χοχΝΟ0ς ^ ΗΝ &lt; \ 1οω € 6ια: cc

-59- 200403216 2 (el) KOOO^HNWOWOCC表 -r ix β Q 函4 ώ t^:x S:^ T °4. tJ r- x§? 二 &lt;〇, g妓 tSi σ&gt; co τ- ϊ^-3 5SS '工X -3 (ΰ ^ grf〇&gt; _ (Ο 一V in α&gt; ^ §.μ·§ 52工d CSJ 05 X cf (〇 ^ ϊ ιο^ £ Μΐ r Ν* ^χϊ Ιί4 ^^.•Ό 卜C0二 CNj r- Ιι g CO II §s t _ §§ li g^· ρ ω ί〇2 8S Sit CO cjido §S2 O ^ ioti2 1 _ · o^S mi 1' m έ jj τ ι 泛 S g CVi Λ 8 * ¢5 CA w oa Cxi Φ 6 0 ζ ό ζ 1 Φ zx 〇=&lt; 2X ό u £ ο ό 士 Ο ό _ i*1 o ό @ 〇 ΙΟ 00 ,Ώ !&quot; 卜·、 00 •60- 200403216 2 E hooo^hnc^s.bcc 表 . Ύ 元索分析 1 - CO CO T- ci co ΊΤ-* r- co (o in N 卷 j cq cq 趙 to (〇 * t 2 2: O)产产 〇C0&lt;0 kxif O-SS S〇〇 (0 〇 〇〇£ cvi cvi T-* T— CO CO cvj in ^;;5 Ν3ωΙ CO 〇〇 co 〇 x ^〇q d(3 £ I CgiH^gBrNgOsSg^SCFgCOOH Calc. 0:44.30 H:3.30 Br:13.40 N:4.70 S:10.7&amp; I F〇un.C:44.62 H:3.52 Br:13.07 N:4.64 S: 10.85 i)IR(vcm.l) (KBr) 1719,1390 1229 T- CO cd in rr T- t— 寸’rC CO CVi N C3 ♦— t— 1724,1325 1168 1735,1598 1327,1185 融點(分解黑 nx.pt.CC) 103-106 I 96-99 I 110-112 ! 98-101 * cd 05 a #30 I Q-s;ii-〇- Φ zx &lt;n&lt;D Φ m C&amp;ch2· (ch3)2ch· '· (CH3)2CH- 實施例 No. 03 00 a 00 o w^4 a 0 0 -61 - 200403216 »施例9 2 (B法) 第1製程:.-59- 200403216 2 (el) KOOO ^ HNWOWOCC table -r ix β Q letter 4 t t ^: x S: ^ T ° 4. TJ r- x§? Two &lt; 〇, g ttSi σ &gt; co τ- ϊ ^ -3 5SS '工 X -3 (ΰ ^ grf〇 &gt; _ (〇 一 V in α &gt; ^ §.μ · § 52 d CSJ 05 X cf (〇 ^ ϊ ιο ^ £ Μΐ r Ν * ^ χϊ Ιί4 ^^. • Ό 卜 C0 二 CNj r- Ιιg CO II §st _ §§ li g ^ · ρ ω ί〇2 8S Sit CO cjido §S2 O ^ ioti2 1 _ · o ^ S mi 1 'm έ jj τ ι S S C CVi Λ 8 * ¢ 5 CA w oa Cxi Φ 6 0 ζ ό ζ 1 Φ zx 〇 = &lt; 2X ό u £ ο ό Ο〇 ό _ i * 1 o ό @ 〇ΙΟ 00, Ώ! &Quot; Bu, 00 • 60- 200403216 2 E hooo ^ hnc ^ s.bcc Table. Ύ Element analysis 1-CO CO T- ci co ΊΤ- * r- co (o in N Vol. J cq cq Zhao to (〇 * t 2 2: O) production 〇C0 &lt; 0 kxif O-SS S〇〇 (0 〇〇〇〇 cvi cvi T- * T- CO CO cvj in ^; 5 Ν3ωΙ CO 〇〇co 〇 x ^ 〇qd (3 £ I CgiH ^ gBrNgOsSg ^ SCFgCOOH Calc. 0: 44.30 H: 3.30 Br: 13.40 N: 4.70 S: 10.7 &amp; IF〇un.C: 44.62 H: 3.52 Br: 13.07 N: 4.64 S: 10.85 i) IR (vcm.l) (KBr) 1719,1390 1229 T- CO cd in rr T- t- inch ' rC CO CVi N C3 ♦ — t— 1724,1325 1168 1735,1598 1327,1185 Melting point (decomposed black nx.pt.CC) 103-106 I 96-99 I 110-112! 98-101 * cd 05 a # 30 I Qs; ii-〇- Φ zx &lt; n &lt; D Φ m C &amp; ch2 · (ch3) 2ch · '· (CH3) 2CH- Example No. 03 00 a 00 ow ^ 4 a 0 0 -61- 200403216 »Example 9 2 (Method B) 1st process:

第2製程 HCI Ξ Η2Ν 八 COOMe XV-22nd process HCI Ξ Η 2N 8 COOMe XV-2

XVI1MXVI1M

MeO—^~yMeO— ^ ~ y

'J-SCVN'J-SCVN

一 N COOH b H-N COOH b H

Ia-2-1 ⑩ 第l製程 將D-纈胺酸甲酯鹽酸鹽(又^ 2) 7 5 5 11^(4.5111111〇1)溶在 二氯甲烷12ml,而在冰冷下先後加入N-甲基嗎啉(3 X 4.5mmol)及 5-溴噻吩-2-磺氯 1·24 克(1.05X4.5mmol)。 在室溫攪拌1 5小時後,依序以2N鹽酸、5 %碳酸氫鈉 水及水洗淨,以硫酸鈉乾燥,減壓濃縮,在矽膠柱層析 (乙酸乙酯/正己烷=1/3),以正己烷結晶,得融點109-1 10 。(:之目的物(ΧνΐΙ-1)1·32克(產率82%)。 鲁 元素分析 C1QH14BrN04S2 計算値·· C;33.71 Η;3·96 Br;22.43 Ν;3·93 S;18.00 實驗値:C;33.75 Η;3·89 Br;22.43 Ν;3.96 S;17.86 [a jo-34.5 土 0.7(c=1.012 CHCb 25X:) IR(CHCl·,,v max 咖]〉1737.1356,1164,1138 NMH(CDC13,5 ppm): 0.89(d,J=6.8Hz,3H), 1.00(d,J=6.8Hz,3H),2.00 (πι,ΙΗ), 3.60(s,3H), 3,83(dd,J=5.2,10.0Hzf 1H), 5.20(d,J=10.0Hz, 1H), 7.04(d,J=4.lHz,lH),7.32(d,J=4.lHz,lH) . -62- 200403216 第2製程 將化合物(XVII- 1 )40 0mg( 1.1 2mmol)溶在二甲基甲醯 胺5ml’力D 4-甲氧基苯乙炔222mg(1.5Xl.l2mmol)及碘 化鈉(I)21mg(〇.lxl.l2mm〇l),在氬大氣下充分脫氣。 次加雙 (二苯膦)氣化 (II)39mg(〇.〇5X 1.12mmol)及三乙胺 0.47ml (3Χ1·12mmol),再於氬大氣下充分脫氣。在氬大氣下 攪拌加熱5 0 °C 1夜後,以乙酸乙酯稀釋,依序以1 N鹽 _ 酸、5 %碳酸氫鈉水及水洗淨,以硝酸鈉乾燥,減壓濃 縮,在矽膠柱層析(正己烷/乙酸乙酯=2/1),從乙酸乙酯/ 正己烷再結晶,得融點131〜132 °C之目的物(XVIII-1)392111邑,產率86%。Ia-2-1 ⑩ In the first process, D-valinic acid methyl ester hydrochloride (also 2) 7 5 5 11 ^ (4.5111111〇1) was dissolved in 12 ml of dichloromethane, and N- Methylmorpholine (3 X 4.5 mmol) and 5-bromothiophene-2-sulfonyl chloride 1.24 g (1.05 X 4.5 mmol). After stirring at room temperature for 15 hours, it was sequentially washed with 2N hydrochloric acid, 5% sodium bicarbonate water and water, dried over sodium sulfate, concentrated under reduced pressure, and then subjected to silica gel column chromatography (ethyl acetate / n-hexane = 1 / 3) Crystallize with n-hexane to obtain melting point 109-1 10. (: Target substance (χνΐΙ-1) 1.32 g (82% yield). Lu elemental analysis C1QH14BrN04S2 Calculate 値 · C; 33.71 Η; 3.96 Br; 22.43 Ν; 3.93 S; 18.00 Experiment 値: C; 33.75 Η; 3.89 Br; 22.43 Ν; 3.96 S; 17.86 [a jo-34.5 soil 0.7 (c = 1.012 CHCb 25X :) IR (CHCl · ,, v max coffee)> 1737.1356, 1164, 1138 NMH (CDC13,5 ppm): 0.89 (d, J = 6.8Hz, 3H), 1.00 (d, J = 6.8Hz, 3H), 2.00 (π, ΙΗ), 3.60 (s, 3H), 3,83 (dd , J = 5.2,10.0Hzf 1H), 5.20 (d, J = 10.0Hz, 1H), 7.04 (d, J = 4.lHz, lH), 7.32 (d, J = 4.lHz, lH). -62 -200403216 In the second process, 40 mg (1.1 2 mmol) of compound (XVII-1) was dissolved in 5 ml of dimethylformamide, 222 mg (1.5 × 1.22 mmol) of 4-methoxyphenylacetylene and sodium iodide (I ) 21mg (0.1xl.12mm0l), fully degassed under argon atmosphere. Add bis (diphenylphosphine) gasification (II) 39mg (0.055X 1.12mmol) and triethylamine 0.47ml (3 × 1) · 12mmol), and then fully degassed under argon atmosphere. After stirring and heating at 50 ° C under argon atmosphere for one night, it was diluted with ethyl acetate, followed by 1N salt acid, 5% sodium bicarbonate water and water. Washed, dried over sodium nitrate, concentrated under reduced pressure, and separated on a silica gel column layer (N-hexane / ethyl acetate = 2/1), ethyl acetate / n-hexane was recrystallized from to afford the desired product melting point of 131~132 ° C (XVIII-1) 392111 eup, yield 86%.

分析値 C19H21N05S2· 0.2H2O 計算値:C;55.51 Η;5.25 Ν;3·41 S;15.60 實驗値:C;55.80 Η;5·19 Ν;3·38 S;15.36 IR(KBr,v max 011^)3268,2203,1736,1604,1524,1348,1164 NMR(CDC13, δ ppm): 0.90((1,J=6.6Hz,3H), 1.00(d,J=7.0Hzt3H), 2.00(m, lH)t 3.60(s,3H), 3.84(sf3H), 3.86(dd,J=5.0,10.2Hz, 1H), 5.2l(d,J=10.2 Hz,lH),6.90(d,J=9.0Hz,2H),7.44(dlJ=9.0Hz,2H)&gt;7.12(d1J=4.0Hz,lH),7. 44(dfJ=4.0Hz,lH) 第3製程 將化合物(XVII-l)407mg(lmmol)溶在四氫呋喃8ml及 甲醇8ml而加IN NaOH 5. lml,在60°C加熱攪拌6小 時後,減壓蒸除有機溶劑,殘渣以乙酸乙酯稀釋’以檸 -63- 200403216 檬酸水酸化後,以乙酸乙酯萃取而以食鹽水洗淨,以硫 酸鈉乾燥,減壓濃縮,得化合物(Ia-2-l) 3 7 3 mg(產率100%)Analysis 値 C19H21N05S2 · 0.2H2O Calculation 値: C; 55.51 C; 5.25 Ν; 3.41 S; 15.60 Experiment 値: C; 55.80 Η; 5.19 Ν; 3.38 S; 15.36 IR (KBr, v max 011 ^ ) 3268,2203,1736,1604,1524,1348,1164 NMR (CDC13, δ ppm): 0.90 ((1, J = 6.6Hz, 3H), 1.00 (d, J = 7.0Hzt3H), 2.00 (m, lH ) t 3.60 (s, 3H), 3.84 (sf3H), 3.86 (dd, J = 5.0,10.2Hz, 1H), 5.2l (d, J = 10.2 Hz, lH), 6.90 (d, J = 9.0Hz, 2H), 7.44 (dlJ = 9.0Hz, 2H) &gt; 7.12 (d1J = 4.0Hz, 1H), 7.44 (dfJ = 4.0Hz, 1H) In the third process, 407 mg (lmmol) of the compound (XVII-1) was dissolved IN NaOH 5.1 ml was added to 8 ml of tetrahydrofuran and 8 ml of methanol, and after heating and stirring at 60 ° C for 6 hours, the organic solvent was distilled off under reduced pressure. The residue was diluted with ethyl acetate, and acidified with citric-63-200403216 citric acid water. Extracted with ethyl acetate, washed with brine, dried over sodium sulfate, and concentrated under reduced pressure to give compound (Ia-2-l) 3 7 3 mg (yield 100%)

融點·· 1 4 7 〜1 4 8 °CMelting point · 1 4 7 ~ 1 4 8 ° C

IR(KBr,^ max cm·1) : 1710,1604,1351,12 16 元素分析 C18H19N05S2 · 0.2H2O 計算値:C;54.45 Η;4·92 Ν;3·53 S;16.15 實驗値:C;54.39H;4.93N;3.79S;15.96 φ 實施例9 3〜1 5 6 仿實施例9 2合成表2 3〜3 0之化合物。 -64- 200403216 200403216 (Bl) HOOO+HNCIOSC61DC icr 元素分析 I ^26^22^2^5^ Calc. 0:65.81 H:4.67 N:5.90 S:6.76 Foun.C:65.34 H:4.90 N:5.56 S:6.40 I I f I I 〇2βΗ2〇Ν2〇63*0,4Η2〇 Calc. C:63.00 H:4.23 N:5.65 S:6.47 Foun.C:62.99 H:4.32 N:5.82 S:6.76 C25H21 N3〇4Se0»8H2〇 Ca(c. 0:63.36 H:4.81 N:8.87 5:5.77 Foun.C:63.45 H:4.92 N:8.77 S.6.57 丨 1 &amp;) IR(v cm-1) ! (KBr) 1 1590,1316 1137 1747,1323 1134 1724,1325 1135 1739,1336 1163 )&gt; -r- CO \〇 t-1— T- οσί , 1- CvJ N CQ T-- CO c〇 t— c〇 ¢0 in co CVJ N- i-— 1706,1606 1350,1164 i CO CO CO卜 CO -r- n c\j 卜C5 融S&amp; (分解Si m.ptOC) 165-170 223-226 I _I 216-218 111-114 | 178-180 105-108 &gt;250 176-177 升 Pi Ρί P P4 Di 〇~c=c-〇- h3co-^Q-cechQ- HOH0^CEC^〇h h3coco-^)~cec-^)- ^Qn:-zJOr °2n*-〇kcech〇^ hooc^Q_cecHQ^ Φ 〇 Φ ί {Z CrV,, C0-ch2- I Όώ-c- CAch2- cicH, CiicH, o /= xz Q 士 ϋ ί= 工ζ Q 實施例: No. CO 05 叩 σι »n σ&gt; ID 卜 cn CO i cn a ο ο -66- 200403216 yd:. 2021) hoooohncds.bo: 表cc 元素分析 C26H22N2〇4S-0.2H2〇 Calc. 0:67.57 H:4.89 N:6.06 S:6.94 F〇un.C:67.66 H:4.77 N:6,09 S:6.71 1 l 1 I C^gH^0N2〇6SBO.lH2〇 Calc. C:56.46 H:4.54 N:6.93 3:7.93 Foun.C:56.30 H:4.37 N:7.14S:7.85 I I 1- 6) IR(v cm-1) (KBi·) 1736J618 1398,1168 1735,1654 1399,1164 T- CO CO寸 &lt;D Y-r— 〇i CvT CO N 卜CO Y— T-· 1600,1558 1 1336,1171 . I 1795,1718 1331,1166 1719,1595 •1344,1167 -r- CO CO寸 ¢0 &lt;»--r— r— ocT c\T C\J N CO y~ 1728,1332 1172 融點(分解黑 m.pt.〇C) 227-229 230-233 234-236 &gt;200 decomp. 146-149 .231-232 166-169 163-165 * CtJ &gt; « Pi Pi Pi Oi hc=c^^^c=chQ&gt;- 02N h3c〇hQ)^cec^^- h2n-hQ^cec^Q- Οώ-c ;CA〇h2- (CH3)2CH- (ch3)2ch· (CH3)2CH- (CH3)2CH. 寊施例 No. 〇 p—1 CM 〇 1—4 CO o f—t 寸 o m o o i —* 卜 o 00 o • ♦ 67-IR (KBr, ^ max cm · 1): 1710, 1604, 1351, 12 16 Elemental analysis C18H19N05S2 · 0.2H2O Calculated 値: C; 54.45 Η; 4.92 Ν; 3.53 S; 16.15 Experiment 値: C; 54.39 H; 4.93N; 3.79S; 15.96 φ Example 9 3 ~ 1 5 6 The compound of Table 2 3 ~ 30 was synthesized as in Example 9 2. -64- 200403216 200403216 (Bl) HOOO + HNCIOSC61DC icr Elemental Analysis I ^ 26 ^ 22 ^ 2 ^ 5 ^ Calc. 0: 65.81 H: 4.67 N: 5.90 S: 6.76 Foun.C: 65.34 H: 4.90 N: 5.56 S : 6.40 II f II 〇2βΗ2〇Ν2〇63 * 0, 4Η2〇Calc. C: 63.00 H: 4.23 N: 5.65 S: 6.47 Foun.C: 62.99 H: 4.32 N: 5.82 S: 6.76 C25H21 N3〇4Se0 »8H2 〇Ca (c. 0: 63.36 H: 4.81 N: 8.87 5: 5.77 Foun.C: 63.45 H: 4.92 N: 8.77 S.6.57 丨 1 &amp;) IR (v cm-1)! (KBr) 1 1590, 1316 1137 1747,1323 1134 1724,1325 1135 1739,1336 1163) &gt; -r- CO \ 〇t-1— T- οσί, 1- CvJ N CQ T-- CO c〇t— c〇 ¢ 0 in co CVJ N- i-— 1706,1606 1350,1164 i CO CO CO BU CO -r- nc \ j BU C5 Fusion S &amp; (decomposition Si m.ptOC) 165-170 223-226 I _I 216-218 111-114 | 178-180 105-108 &gt; 250 176-177 liters Pi Ρί P P4 Di 〇 ~ c = c-〇- h3co- ^ Q-cechQ- HOH0 ^ CEC ^ 〇h h3coco-^) ~ cec-^)- ^ Qn: -zJOr ° 2n * -〇kcech〇 ^ hooc ^ Q_cecHQ ^ Φ 〇Φ ί {Z CrV ,, C0-ch2- I Όώ-c- CAch2- cicH, CiicH, o / = xz Q 士 ϋ ί =工 ζ Q Example: No. CO 05 叩 σι »n σ &gt; ID BU cn CO i cn a ο ο- 66- 200403216 yd :. 2021) hoooohncds.bo: Table cc Elemental analysis C26H22N2〇4S-0.2H2〇Calc. 0: 67.57 H: 4.89 N: 6.06 S: 6.94 F〇un.C: 67.66 H: 4.77 N: 6 , 09 S: 6.71 1 l 1 IC ^ gH ^ 0N2〇6SBO.lH2〇Calc. C: 56.46 H: 4.54 N: 6.93 3: 7.93 Foun.C: 56.30 H: 4.37 N: 7.14S: 7.85 II 1- 6 ) IR (v cm-1) (KBi ·) 1736J618 1398,1168 1735,1654 1399,1164 T- CO CO inch &lt; D Yr— 〇i CvT CO N BU CO Y— T- · 1600,1558 1 1336, 1171. I 1795,1718 1331,1166 1719,1595 • 1344,1167 -r- CO COinch ¢ 0 &lt; »-r— r— ocT c \ TC \ JN CO y ~ 1728,1332 1172 Melting point (decomposition Black m.pt.〇C) 227-229 230-233 234-236 &gt; 200 decomp. 146-149 .231-232 166-169 163-165 * CtJ &gt; «Pi Pi Pi Oi hc = c ^^^ c = chQ &gt;-02N h3c〇hQ) ^ cec ^^-h2n-hQ ^ cec ^ Q- 〇ώ-c; CA〇h2- (CH3) 2CH- (ch3) 2ch · (CH3) 2CH- (CH3) 2CH寊 例 No. 〇p—1 CM 〇1—4 CO of—t inch omooi — * Bu o 00 o • ♦ 67-

200403216 5 2 表 {e〇 χοοο/νχϊ^ώΈ 元素分析 1 I C21H23N05S.1.3H20 Calc. 0:59.36 H:6.07 N:3.30 S:7.55 Foun.C:59.36 HI6.06 N:3.50 S:7.44 I f I ! C23HiqFN〇4S*0.3H2〇 ! Calc. 0:64.41 H:4.37 F:4.43 N:3:27 S:7.48 Foun.C:64.37 H:4.38 R4.96 N:3.31 S:7.24 I 5) IR(v cm-1) (KBr) 1720,1656 | 1319,1165 in oo co to &lt;0 y- T— Ύ— rftO CM CD co f— 1711,1683 1600,1328 1159 | o r- CO CO CD -r-r- cvT〇) O OJ K CO T-* 4 in r— inaS. ro ^r t $2 1,727,1604 ! 1335,1182 CO N-&lt;D 05 &lt;D T- : cm σ&gt; 卜co -1728,1332 1172 融點(分解^ ni.pt.CC) 187-189 ! 111-114 161-162 157-159 133-136 J 183-185 166-168 163-165 * &gt; pc; (¾ ci 90 cc I H3C〇H0KC=C-^- h3C〇-〇-c=chQ- h3c〇H0kc=c-^Q^ I 丨 H3C^O^cec〇- h〇-〇-c=c-〇&quot; (CH3)2CH- (CH3)2〇H- __________ j (ΟΗ3)3〇- I — o ό &lt;Q^ch2· [Jkch2· I (CH3)2CH- i 實施例 No. 0¾ o o — CO -r in ,_ __4 200403216 2l-HOOO^HN^OS.9cn 表;ί 元索分析 1 I I 1 1 1 I ^18^19N〇sS2*〇.2H2〇 Calc. 0:54.45 H:4.92 N:3.53 S:16.15 Foun.C:54.39 H:4.93 N:3.79 S: 15.96 1 &amp;) IR(v cm-1) (KBr) to in in co CO T- T-· ΊΟ 0&gt; CJ 卜&lt;〇 r— Ύ— in QD co m &lt;D T-▼— ^-· C\J &lt;0 h- CO r— 1585,1318 1153 r CO ··-CNJ l〇 \〇 1-r— r— 10*0 o臂 «3 CO 寸CO CM卜 m »- O CO . CO r? T— &quot;T~ ! 1721,1620 ί /1339,1163 1729,1675 1340,1168 1710,1604 1351,1216 融點(分解黑 rn.pt.CC) 187-189 111-114 167-169 I 1 103-106 180-182 147-148 * Pi Pi &gt; ¢5 X ^Qr^Qr 〇τ^&gt;~ ^:々 H3C〇-^)-c=c-^V- H3c-^-c=c-^- h3co-^^^cec-^V· a: (CH3)2CH- _£1 〇 F= X2: Q 〇ώ-〇Η2. CM δ /r=r· XZ .Q a /= 工2 〇 (ch3)2ch· 實施例 No. 卜 P-H CO 1 19 O CO «-4 r*-&lt; CM 〇】 Cl CO 03 ^-4 C) • · -69- 200403216 2 (el) HOOoOHN^OS.Sir 表 T 元素分祈 C^gH^gN〇4S2*0.2H2〇 Calc. 0:56.73 H:5.13 N:3.68 S:16.83 Foun.C:57.03 H:5.30 N:3.89 S:16.56 I C22H^gN〇5S2*〇.2H2〇 Calc. C:59.36 H;4.39 N:3.15 5:14.41 F〇un.C:59.43 H:4.61 N:3.25 S:H.02 I 4 C21H16FNO4S2 Calc. 0:58.73 H:3.75 R4.42 N:3.26 S:14.93 Foun.C:58.66 H:3.93 F:4.52 N:3.33 S:14.41 1 1 1 S)lR(i/ cm-l) (KBr) _1 1712,1350 ! 1163 I 1710,1499 1356,1165 1695,1334 1184 1710,1329 1180 1734,1699 1324,110¾ 1 1 1 融點(分解黑 m.pt.(C) ! 157-158 l 154-156 149-150 161-164 I I 155-158 i 1 1 1 Pi Pi Pi Oh Pi Di ¢5 CcJ ao Csi H3co^Q^c=cJ^- h3ch〇)-c 三 1 OCHa G^CiC-Q~ ’ och3 H3CO h3co-^-c=c-^~ HaCO’ \ N〇2 (CH3)2CH- .(ch3)2ch- ……J _£l 〇 0 ·、 丨 0^cH2- i &lt;〇HCHr &lt;Q^ch2- &lt;〇KCHr 實施例 No. Cl r—f 卜 οι 00 C^l — CO 03 〇 -70- 200403216 2 (Bl) Hooa^HNWOS、Bo: 表 T 元素分祈 1 1 1 I f 1 1 1 1 1 IR(v cm^l) (KBr&gt; 1 1 1 1 1 1 1 \ i 融點(分解S m.pt,CC) 1 1 1 1 1 1 1 1 * Pi Pi &gt; (¾ 90 Oi (^c=c^Q- N〇2 ch3(CH2)5-cec-^^— h3c〇hQ-c=chQ- H3co-^c.c4^- hoh^)-c=o^^- 0d 0~cHr o 6 ;〇-CHa- &lt;〇^CHr ^£J o ό &lt;Q^CH2· o ό 0^CH2- 實施例 No. o CO 1—4 -r ¢0 *—» in CO •—4 CO ••—4 卜 CO r—4 00 i c〇 CJi CO r—&lt; c • · -71 - 200403216200403216 5 2 Table {e〇χοοο / νχϊ ^ ώΈ Elemental analysis 1 I C21H23N05S.1.3H20 Calc. 0: 59.36 H: 6.07 N: 3.30 S: 7.55 Foun.C: 59.36 HI6.06 N: 3.50 S: 7.44 I f I! C23HiqFN〇4S * 0.3H2〇! Calc. 0: 64.41 H: 4.37 F: 4.43 N: 3: 27 S: 7.48 Foun.C: 64.37 H: 4.38 R4.96 N: 3.31 S: 7.24 I 5) IR (v cm-1) (KBr) 1720,1656 | 1319,1165 in oo co to &lt; 0 y- T— Ύ— rftO CM CD co f— 1711,1683 1600,1328 1159 | o r- CO CO CD- rr- cvT〇) O OJ K CO T- * 4 in r— inaS. ro ^ rt $ 2 1,727,1604! 1335,1182 CO N- &lt; D 05 &lt; D T-: cm σ &gt; bu co -1728, 1332 1172 Melting point (decomposition ^ ni.pt.CC) 187-189! 111-114 161-162 157-159 133-136 J 183-185 166-168 163-165 * &gt;pc; (¾ ci 90 cc I H3C〇H0KC = C-^-h3C〇-〇-c = chQ- h3c〇H0kc = c- ^ Q ^ I 丨 H3C ^ O ^ cec〇- h〇-〇-c = c-〇 &quot; (CH3) 2CH- (CH3) 2〇H- __________ j (ΟΗ3) 3〇- I — o & &lt; Q ^ ch2 · [Jkch2 · I (CH3) 2CH- i Example No. 0¾ oo — CO -r in, _ __4 200403216 2l-HOOO ^ HN ^ OS.9cn table; 索 yuan cable analysis 1 II 1 1 1 I ^ 18 ^ 19N〇sS2 * .2H2〇Calc. 0: 54.45 H: 4.92 N: 3.53 S: 16.15 Foun.C: 54.39 H: 4.93 N: 3.79 S: 15.96 1 &) IR (v cm-1) (KBr) to in in CO CO T- T- · ΊΟ 0 &gt; CJ bu &lt; 〇r— Ύ— in QD co m &lt; D T- ▼ — ^-· C \ J &lt; 0 h- CO r— 1585,1318 1153 r CO ·· -CNJ l〇 \ 〇1-r— r— 10 * 0 o arm «3 CO inch CO CM» »O CO. CO r? T— &quot; T ~! 1721,1620 ί / 1339,1163 1729, 1675 1340,1168 1710,1604 1351,1216 Melting point (decomposed black rn.pt.CC) 187-189 111-114 167-169 I 1 103-106 180-182 147-148 * Pi Pi &gt; ¢ 5 X ^ Qr ^ Qr 〇τ ^ &gt; ~ ^: 々H3C〇-^)-c = c- ^ V- H3c-^-c = c-^-h3co-^^^ cec- ^ V · a: (CH3) 2CH- _ £ 1 〇F = X2: Q 〇ώ-〇Η2. CM δ / r = r · XZ .Q a / = 工 2 〇 (ch3) 2ch · Example No. Bu PH CO 1 19 O CO « -4 r *-&lt; CM 〇] Cl CO 03 ^ -4 C) • · -69- 200403216 2 (el) HOOoOHN ^ OS.Sir Table T element analysis C ^ gH ^ gN〇4S2 * 0.2H2〇Calc 0: 56.73 H: 5.13 N: 3.68 S: 16.83 Foun.C: 57.03 H: 5.30 N: 3.89 S: 16.56 I C22H ^ gN〇5S2 * 〇.2H2〇Calc. C: 59.36 H; 4.39 N: 3.15 5 : 14.41 F〇un.C: 59.43 H: 4.61 N: 3.25 S: H.02 I 4 C21H16FNO4S2 Calc. 0: 58.73 H: 3.75 R4.42 N: 3.26 S: 14.93 Foun.C: 58.66 H: 3.93 F: 4.52 N: 3.33 S: 14.41 1 1 1 S ) lR (i / cm-l) (KBr) _1 1712, 1350! 1163 I 1710, 1499 1356, 1165 1695, 1334 1184 1710, 1329 1180 1734, 1699 1324, 110¾ 1 1 1 Melting point (decomposed black m.pt . (C)! 157-158 l 154-156 149-150 161-164 II 155-158 i 1 1 1 Pi Pi Pi Oh Pi Di ¢ 5 CcJ ao Csi H3co ^ Q ^ c = cJ ^-h3ch〇)- c San 1 OCHa G ^ CiC-Q ~ 'och3 H3CO h3co-^-c = c- ^ ~ HaCO' \ N〇2 (CH3) 2CH-. (ch3) 2ch- ...... J _ £ l 〇0 ·,丨 0 ^ cH2- i &lt; 〇HCHr &lt; Q ^ ch2- &lt; 〇KCHr Example No. Cl r-f Bu 00 C ^ l-CO 03 〇-70- 200403216 2 (Bl) Hooa ^ HNWOS, Bo: Table T element division 1 1 1 I f 1 1 1 1 1 IR (v cm ^ l) (KBr &gt; 1 1 1 1 1 1 1 \ i Melting point (decomposition S m.pt, CC) 1 1 1 1 1 1 1 1 * Pi Pi &gt; (¾ 90 Oi (^ c = c ^ Q- N〇2 ch3 (CH2) 5-cec-^^ — h3c〇hQ-c = chQ- H3co- ^ c.c4 ^-hoh ^)-c = o ^^-0d 0 ~ cHr o 6; 〇-CHa- &lt; 〇 ^ CHr ^ £ J o ό &lt; Q ^ CH2 · o ό 0 ^ CH2- Example No. o CO 1—4 -r ¢ 0 * — » in CO • —4 CO •• —4 CO r—4 00 i c〇 CJi CO r— &lt; c • -71-200403216

2(01) Ηοοα^Η^ο^α: 元粜分祈 I 1 1 1 f 1 1 1 1 1 S) IR(v cm-1) (KBr) 1 1 ! 1 tf 1 - 1 、 1 I 融點(分解ιί m.ptCC) 1 \ i i l 1 I I * Pi ¢5 Pi ¢5 oc cd _i F3CH^HCHC-^— O^Q-cic^- 丨· rQr沉 \ ί hooch^^~c=c-^^— MeOOC-^^-C 三 C^cHr CJ ό Qr% ^£1 o 6 .(J ό 1 &lt;Q^ch2- 實施例 No. | -r r*H CO w^4 — ID π KD 1 rr 9-4 卜 n* p^4 00 T -72- 200403216 3 (eo hooooh^os.bo:. 1 1 1 1 1 1 l 1 1 1 5) IR(v cm-1) 1 (KBr) ! 1 1 1 1 I 1 I 融點(分解黑 m.pt.〇C) ! ! 1 1 1 1 i 1 1 * Pi Pi Qi 05 act a H2NOC-^^-CiC-^^— Me2N~^^-C=C-^— 1 Me02SH^y-CEC·^^— nc^C3~cec&quot;w^s^— G^CHr (^-ch2- . _1 &lt;Q^ch2- C^-ch2· o ό ^CJ 〇 ό 0^CH2- 0~CHr 實施例 No. σ&gt; rr 9^4 o in r-t in to CO to ^-4 ΙΛ r-H i〇 ΙΛ •H &lt;D m •· -73- 200403216 實施例1 5 7、1 5 82 (01) Ηοοα ^ Η ^ ο ^ α: Yuan 粜 fenqi I 1 1 1 f 1 1 1 1 1 S) IR (v cm-1) (KBr) 1 1! 1 tf 1-1 and 1 I Point (decomposition ιί m.ptCC) 1 \ iil 1 II * Pi ¢ 5 Pi ¢ 5 oc cd _i F3CH ^ HCHC-^ — O ^ Q-cic ^-丨 · rQr 沈 \ ί hooch ^^ ~ c = c- ^^ — MeOOC-^^-C Three C ^ cHr CJ ό Qr% ^ £ 1 o 6. (J ό 1 &lt; Q ^ ch2- Example No. | -rr * H CO w ^ 4 — ID π KD 1 rr 9-4 bu n * p ^ 4 00 T -72- 200403216 3 (eo hooooh ^ os.bo :. 1 1 1 1 1 1 l 1 1 1 5) IR (v cm-1) 1 (KBr) ! 1 1 1 1 I 1 I Melting point (decomposed black m.pt.〇C)!! 1 1 1 1 i 1 1 * Pi Pi Qi 05 act a H2NOC-^^-CiC-^^ — Me2N ~ ^^ -C = C-^ — 1 Me02SH ^ y-CEC · ^^ — nc ^ C3 ~ cec &quot; w ^ s ^ — G ^ CHr (^ -ch2-. _1 &lt; Q ^ ch2- C ^ -ch2 · o ό ^ CJ 〇ό 0 ^ CH2- 0 ~ CHr Example No. σ &gt; rr 9 ^ 4 o in rt in to CO to ^ -4 ΙΛ rH i〇ΙΛ • H &lt; D m • · -73- 200403216 Implementation Example 1 5 7, 1 5 8

ρ 二Lso N八c00MeAl^l^ s Η XVIII-2 X)ρ II Lso N eight c00MeAl ^ l ^ s Η XVIII-2 X)

MeO—/~Λ~^JLsjLs〇2’八 COOH pj2MeO— / ~ Λ ~ ^ JLsjLs〇2 ’eight COOH pj2

Ia-2-66· Ia-2-67 〇 第1製程(r2 = ch3) 將仿實施例9 6合成之化合物(X V111 -2)150mg(0.33mmol)溶在二甲基甲醯胺2ml,加碳酸鉀 227mg(5X〇.33mmol)及甲基捵 〇.inil(5X〇.33mmol),在 室溫攪拌一夜後,倒入水中。次以乙酸乙酯萃取而水洗 ’以硫酸鈉乾燥,減壓濃縮,得油狀N-甲基化合物 373mg(產率 91%)。 分析値 C 2 4 Η 2 3 Ν Ο 5 S 2 計算値·· C;61.39 H;4.94 N;2.98 S;13.66 實驗値:C;6 1.22 H;5.18 N;2.93 S;13.27 將如上所得油狀物1 4 0 m g溶在甲醇2 m卜加1 N N a Ο H 0.6ml ’在室溫攪拌一夜後,以2N-HC1酸化。次以乙酸 乙酯萃取而水洗後,以硫酸鈉乾燥,減壓濃縮,得融點 185 〜186°C 之化合物(Ia-2-66)(R = Me)105mg(產率 77%)Ia-2-66 · Ia-2-67 〇 1st process (r2 = ch3) 150 mg (0.33 mmol) of the compound (X V111 -2) synthesized in Example 9 6 was dissolved in 2 ml of dimethylformamide, After adding 227 mg (5X 0.33 mmol) of potassium carbonate and methyl indium (5X 0.33 mmol), the mixture was stirred overnight at room temperature, and then poured into water. It was extracted with ethyl acetate, washed with water, dried over sodium sulfate, and concentrated under reduced pressure to obtain 373 mg of N-methyl compound as an oil (yield 91%). Analyze 値 C 2 4 Η 2 3 Ν Ο 5 S 2 Calculate C · C; 61.39 H; 4.94 N; 2.98 S; 13.66 Experiment 値: C; 6 1.22 H; 5.18 N; 2.93 S; 13.27 The product 140 mg was dissolved in methanol 2 m Bujia 1 NN a 0 H 0.6ml 'After stirring at room temperature overnight, it was acidified with 2N-HC1. Extracted with ethyl acetate, washed with water, dried over sodium sulfate, and concentrated under reduced pressure to obtain 105 mg of compound (Ia-2-66) (R = Me) with a melting point of 185 to 186 ° C (yield 77%)

分析値 C 2 3 H 2 i Ν Ο 5 S 200403216 計算値:C;60.64 Η;4·65 N;3.07 S;14.08 實驗値:C;60.56 H;4.84 N;3.01 S;13.94 IR(KBr, v max cm*1)3600-2300br,3426,2203t 1710,1604,1503,1344, 1151 NMR(de-DMSO, δ ppm):2.88(s,3H)f2.93(dd, J=12.0,10.2Hzt 1H),3.19 (dd,J=14.2,5,6Hz,lH), 3.81(s,3H), 4.74(dd, J = 5.4,10.2Hz, 1H), 6.99· 7.04(m,2H),7.20-7.35(m,7H)t7.52-7.56(m&gt;2H),6.90(d,J=9.0Hz, 2H)i7.44(d,J=9.0Hz,2H),7.12(d,J=4.0Hz,lH)&gt;7,44(d,J=4.0Hz,lH) 仿上,實施例157合成R2 = CH2Ph化合物(Ia-2-67)。 IR(KBr, v max 0111^):2200,1722,1340,1151 φ NMR(de-DMSO, δ ppm):2.94(dd,J=7.6,13·8Ηζ,1Η),3· 19 (dd,J=7.2, 14·4Ηζ,1Η&gt;, 3.83(s,3H), 4.29(d,J=16.2Hz,lH&gt;,4.62(d,J=16.2Hz,lH)(特 實施例1 5 9 (C法) 第2製程Analyze 値 C 2 3 H 2 i Ν Ο 5 S 200403216 Calculate 値: C; 60.64 Η; 4.65 N; 3.07 S; 14.08 Experiment 値: C; 60.56 H; 4.84 N; 3.01 S; 13.94 IR (KBr, v max cm * 1) 3600-2300br, 3426, 2203t 1710, 1604, 1503, 1344, 1151 NMR (de-DMSO, δ ppm): 2.88 (s, 3H) f2.93 (dd, J = 12.0, 10.2Hzt 1H ), 3.19 (dd, J = 14.2,5,6Hz, lH), 3.81 (s, 3H), 4.74 (dd, J = 5.4,10.2Hz, 1H), 6.997.04 (m, 2H), 7.20-7.35 (m, 7H) t7.52-7.56 (m &gt; 2H), 6.90 (d, J = 9.0Hz, 2H) i7.44 (d, J = 9.0Hz, 2H), 7.12 (d, J = 4.0Hz, 1H) &gt; 7,44 (d, J = 4.0 Hz, 1H) In the same manner as in Example 157, R2 = CH2Ph compound (Ia-2-67) was synthesized. IR (KBr, v max 0111 ^): 2200, 1722, 1340, 1151 φ NMR (de-DMSO, δ ppm): 2.94 (dd, J = 7.6, 13.8Ηζ, 1Η), 3.19 (dd, J = 7.2, 14 · 4Ηζ, 1Η &gt;, 3.83 (s, 3H), 4.29 (d, J = 16.2Hz, lH &gt;, 4.62 (d, J = 16.2Hz, lH) (Special Example 1 5 9 (C method ) 2nd process

Br —jLs〇2i/^c〇〇Me -tm Me〇-^^~JLsjLs〇2_㈡八COQMe XIX-lBr —jLs〇2i / ^ c〇〇Me -tm Me〇-^^ ~ JLsjLs〇2_㈡ 八 COQMe XIX-l

XVIM 第1製程XVIM 1st process

Me〇-H^^^sjLs〇2-N^COQHMe〇-H ^^^ sjLs〇2-N ^ COQH

Ia-3-1 第1製程 將實施例96所得化合物(XVII-2)500mg(l .4mmol)溶 在乾燥四氫呋喃12ml,加粉狀碳酸鉀387mg(2Xl.4mmol) 、4 -甲氧苯硼酸319g(1.5Xl.4mmol)、三苯膦IE 81mg(0.05X1.4mmol),在75°C氬大氣下攪拌48小時。 次以乙酸乙酯稀釋,依序以1N-鹽酸、5%碳酸氫鈉水及 水洗淨,以硫酸鈉乾燥,減壓濃縮,在矽膠柱層析(正 -75- 200403216 己烷/乙酸乙酯= 3/1),從正己烷結晶,得融點122-123 °C 之目的物(XIX-l)447mg (產率83%)。 元素分析c17H2]N〇5s2 計算値:C;5 3.2 5 Η;5·52 Ν;3·65 S;16.72 實驗値:C;53.26 Η;5·50 N;3.69 S;16.63 [α 】ι&gt;21·7 土 0.6(c=1.0〇〇 DMSO 25*C) IR(KBr, u max €03^)1735,1605,1505,1350,1167,1136 NMR(CDCh, &lt;5 ρριη):Ο·90((Μ=:7·0Η;·3Η&gt;·1·00(&lt;1·&lt;Ι=6·6Ηζ,3Η)· ^JL0(m, · lH),3.54(s,3H),3.85(s,3H)_3』7(dd,J=5Al〇-2H2,lH),5.20(d,J=10,2H2, lH),6.94(d,J=9.0H2,2H),7-52(d,J=9.0H:2,2H).7.11(d,J=4.0H2,m),7.49 (d,J=4.0Hz,lH) 第2製程 將化合物(XIX- 1 ) 3 9 0mg(l .01 mmol)溶在四氫呋喃8ml 及甲醇8ml混液,力[]IN NaOH 5.1ml,攪拌加熱60°C 6Ia-3-1 1st process: 500 mg (1.4 mmol) of the compound (XVII-2) obtained in Example 96 was dissolved in 12 ml of dry tetrahydrofuran, and 387 mg (2 × 1.4 mmol) of powdered potassium carbonate and 319 g of 4-methoxyphenylboronic acid were added. (1.5 × 1.4 mmol), 81 mg (0.05 × 1.4 mmol) of triphenylphosphine IE, and stirred at 75 ° C. under argon atmosphere for 48 hours. Diluted with ethyl acetate, washed sequentially with 1N-hydrochloric acid, 5% sodium bicarbonate water and water, dried over sodium sulfate, concentrated under reduced pressure, and subjected to silica gel column chromatography (n-75-200403216 hexane / ethyl acetate). Ester = 3/1), crystallized from n-hexane to obtain 447 mg (yield 83%) of the target compound (XIX-1) with a melting point of 122-123 ° C. Elemental analysis c17H2] N05s2 Calculated 値: C; 5 3.2 5 Η; 5.52 Ν; 3.65 S; 16.72 Experimental 値: C; 53.26 Η; 5.50 N; 3.69 S; 16.63 [α] &gt; 21.7 TU 0.6 (c = 1.000 DMSO 25 * C) IR (KBr, u max € 03 ^) 1735,1605,1505,1350,1167,1136 NMR (CDCh, &lt; 5 ρριη): 〇90 ((M =: 7.00Η; 3Η &gt; · 1 · 00 (&lt; 1 · &lt; I = 6 · 6Ηζ, 3Η)) ^ JL0 (m, · lH), 3.54 (s, 3H), 3.85 ( s, 3H) _3′7 (dd, J = 5Al〇-2H2, lH), 5.20 (d, J = 10, 2H2, lH), 6.94 (d, J = 9.0H2, 2H), 7-52 (d , J = 9.0H: 2,2H) .7.11 (d, J = 4.0H2, m), 7.49 (d, J = 4.0Hz, lH) In the second process, the compound (XIX-1) 3 9 0mg (l. 01 mmol) dissolved in a mixture of 8ml of tetrahydrofuran and 8ml of methanol, force [] IN NaOH 5.1ml, stir and heat at 60 ° C 6

小時後,減壓蒸除有機溶劑,以乙酸乙酯稀釋,以檸檬 酸水來酸化,以乙酸乙酯萃取而以食鹽水洗淨,以硫酸 鈉乾燥,減壓濃縮,得373mg(產率100%)化合物(la-3-After hours, the organic solvent was distilled off under reduced pressure, diluted with ethyl acetate, acidified with citric acid, extracted with ethyl acetate and washed with brine, dried over sodium sulfate, and concentrated under reduced pressure to obtain 373 mg (yield 100 %) Compound (la-3-

融點:1 7 4〜1 7 6 〇C IR(KBr,v max cm-1)·· 1735,1503,1343,116 3 實施例1 6 0〜1 7 5 仿實施例1 5 9合成表3 1〜3 2化合物。 •76- 200403216Melting point: 1 7 4 ~ 1 7 6 〇C IR (KBr, v max cm-1) · 1735, 1503, 1343, 116 3 Example 1 6 0 ~ 1 7 5 Example 1 5 9 Synthesis Table 3 1 ~ 3 2 compounds. • 76- 200403216

3 M X000/VX2W0W.®^ 表.cc 元桊分析 1 I 1 〇22^20^2^4^3*^·^^2^ Calc. 0:55.07 Η:4.37 N:5.S4 S:20.05 Foun.C:55.35 Η:4Α3 Ν:6.04 S: 19.65 I I C15H16FN〇4S2*〇.1H2〇 I Calc. 0:50.15 H:4.55 F:5.29 N:3.90 S: 17.85 F〇un.C:49.99 H:4.58 R5.22 N:4.05 S: 17.77 C16H19NO4S3 Calc. C:49.85 H:4.97 N:3.63 S:24.95 Foun.C:49.70 H:5.00 N:3.93 S:24.96 1 IR(v cm-1) (KBr) 1 1667,1337 1180 ί 1670,1339 1194 CO ιο Οϊ CO ΙΟ ▼- S:· CM卜 Ν CO τ— τ— 1735,1341 1159 ^ C〇 C0 Ο (Ο ιη _ »— τ— uieo* ο ττ 卜C3 1713,1353 / 1163 寸CO O &lt;D U7 T-r— τ- c\ic\T o in 卜CO 1747,1324 1159 . 融點汾解 m.pt.〇C) 93-96 ί 157-159 _ί 168-171 226-230 174-176 165*167 146-147 157-159 * •尨 Ρ4 Pi &gt; ai erf SO Οί η3〇ο'ηΟ_^^ $ IL· h3csh^&gt;~^V • h3co-H^4^ t f $ li. a £ Ο -/= Χ2 Ο CAch2- I Ο χ/&quot; ο ο ί= χζ Ο (CH3)2CH. (ch3)2ch· 1 (CH3)2CH- 1 (CH3)2CH- 實施例ϊ No. 1 j Ο iD ψ1 ·4 οι »—( C0 CO «—* to i〇 VC 卜 ID3 M X000 / VX2W0W.® ^ Table.cc Element analysis 1 I 1 〇22 ^ 20 ^ 2 ^ 4 ^ 3 * ^ · ^^ 2 ^ Calc. 0: 55.07 Η: 4.37 N: 5.S4 S: 20.05 Foun.C: 55.35 Η: 4Α3 Ν: 6.04 S: 19.65 II C15H16FN〇4S2 * .1H2〇I Calc. 0: 50.15 H: 4.55 F: 5.29 N: 3.90 S: 17.85 F〇un.C: 49.99 H: 4.58 R5.22 N: 4.05 S: 17.77 C16H19NO4S3 Calc. C: 49.85 H: 4.97 N: 3.63 S: 24.95 Foun.C: 49.70 H: 5.00 N: 3.93 S: 24.96 1 IR (v cm-1) (KBr) 1 1667,1337 1180 ί 1670,1339 1194 CO ιο Οϊ CO ΙΟ ▼-S: · CM NO τ— τ— 1735,1341 1159 ^ C〇C0 Ο (Ο ιη _ »— τ— uieo * ο ττ C3 1713,1353 / 1163 inch CO O &lt; D U7 Tr— τ- c \ ic \ T o in CO 1747,1324 1159. Melting point fenjie m.pt.〇C) 93-96 ί 157-159 _ί 168-171 226-230 174-176 165 * 167 146-147 157-159 * • 尨 Ρ4 Pi &gt; ai erf SO Οί η3〇ο'ηΟ _ ^^ $ IL · h3csh ^ &gt; ~ ^ V • h3co-H ^ 4 ^ tf $ li. A £ Ο-/ = Χ2 Ο CAch2- I Ο χ / &quot; ο ο = χζ Ο (CH3) 2CH. (Ch3) 2ch · 1 (CH3) 2CH- 1 (CH3) 2CH -Example ϊ No. 1 j Ο iD ψ1 · 4 οι »— (C0 CO« — * to i〇 VC ID

•77- 200403216 2 (3:表 (el) H〇oo+HN&lt;VJos06la: 元素分祈 C20H19NO5S2 Calc. C:57.54 H:4.59 N:3.35 S:15.36 F〇un.C:57.62 H:4.72 N:3.52 S; 15.27 ^20^19^^4^2 Cala 0:59.83 H:4.77 N:3.49 S: 15.97 F〇un.C:59.77 H:4.86 N:3.61 3:15.86 C19H16FNO4S2 Calc. C:56.28 Η:3.9Θ F:4.09 N:3.45 S: 15.82 Foun.C:56.33 H:4.09 F:4.65 N:3.65 S; 15.84 C2〇Ht9N〇4S3-0.2H2〇 Calc. C:54.95 H:4.47 N:3.20 S:22.00 Foun.C:55.05 H:4.52 N:3.34 S:22.04 I I i 1 \ fi) IR(v cnvl) | am 1735,1698 1374,1163 1713,1609 1378,1194 _i 1721,1654 1365,1148 1750,1730 1428,1325 1155 1 I 1 1 融點(分解l xn.pt, CC) 161-165 166-167 174-175 203-205 1 1 I • I * αί P5 Pi 9C oc h3c〇-〇-^ X IL H3〇S-〇-^- I 0 lT « ^£1 0 Q-CHa- &lt;Q^ch2- 0^CH2- ^^-ch2- 實施例 No. 〇〇 to CD to 0 卜 #—1 卜 — 卜 •—4 CO 卜 ·—&lt; 卜 ι—1 ΙΛ .¾ s.· 78 200403216 實施例176(D法) HC1Η〆 'COO«Bu 02N-^-S02-N^C00*Bu 第2製程 XX-1 第3製程 XV-3 H2N--^^S02-N/^C00tBu XXI-1 〇 八 έ〇0、ιι —·Μ·^ XXII-1• 77- 200403216 2 (3: Table (el) H〇oo + HN &lt; VJos06la: Elemental element C20H19NO5S2 Calc. C: 57.54 H: 4.59 N: 3.35 S: 15.36 Foun.C: 57.62 H: 4.72 N: 3.52 S; 15.27 ^ 20 ^ 19 ^^ 4 ^ 2 Cala 0: 59.83 H: 4.77 N: 3.49 S: 15.97 F〇un.C: 59.77 H: 4.86 N: 3.61 3: 15.86 C19H16FNO4S2 Calc. C: 56.28 Η: 3.9Θ F: 4.09 N: 3.45 S: 15.82 Foun.C: 56.33 H: 4.09 F: 4.65 N: 3.65 S; 15.84 C2〇Ht9N〇4S3-0.2H2 Calc. C: 54.95 H: 4.47 N: 3.20 S: 22.00 Foun.C: 55.05 H: 4.52 N: 3.34 S: 22.04 II i 1 \ fi) IR (v cnvl) | am 1735,1698 1374,1163 1713,1609 1378,1194 _i 1721,1654 1365,1148 1750,1730 1428,1325 1155 1 I 1 1 Melting point (decomposed l xn.pt, CC) 161-165 166-167 174-175 203-205 1 1 I • I * αί P5 Pi 9C oc h3c〇-〇- ^ X IL H3〇S-〇-^-I 0 lT «^ £ 1 0 Q-CHa- &lt; Q ^ ch2- 0 ^ CH2- ^^-ch2- Example No. 〇〇to CD to 0 卜 # -1 卜— BU • —4 CO BU—— &lt; BUIL-1 ΙΛ .¾ s. · 78 200403216 Example 176 (Method D) HC1Η〆'COO «Bu 02N-^-S02-N ^ C00 * Bu 2nd process XX-1 3rd process XV-3 H2N-^^ S02-N / ^ C00tBu XX I-1 〇 〇 〇〇〇, ιι — · Μ · ^ XXII-1

八 COOHCOOH

Ia-4-1 第1製程 將D -纈胺酸第三丁酯鹽酸鹽(χ V - 3 ) 1 0克(4 7.6 8 mmol) 溶在二氯·甲烷l〇〇ml,在冰冷下依序加N-甲基嗎啉 1 5.7ml (3X47.68mm〇l)及 4-硝苯磺醯氯 14.1 克(1.2X47.88mmol) ,在室溫攪拌5小時後,依序以2N鹽酸、5 %碳酸氫鈉 水及水洗淨’以硫酸鈉乾燥,減壓濃縮,從二氯甲烷/ 正己烷再結晶,得融點89-90 °C之目的(XX-1)1 3,3克( 產率 77.8%)。 元素分析c15h22n2 06 s 計算値·· C;50.27 H;6.19 N;7.82 S;8.95 實驗値:C;50.04 H;6.10 N;7.89 S;8.84 200403216 [a 】d-2.9± 0.8(c=0.512 DMSO 23X:) IR(KBr, v max cm·l)3430br,3301,1722,1698,1525,1362,1348,1181, 1174,1159 第2製程 將化合物(ΧΧ-1)13·29克(37.08mmol)溶在甲醇200ml 而加10% Pd-C 1克,在室溫與氫觸媒還原。2小時後, 濾除觸媒,減壓濃縮,從丙酮/正己烷再結晶,得融點1 64 〜166°C 之胺體(ΧΧΙ·1)11·5 克(產率 94.4%)。 元素分析c15h24n2o4s 計算値:C;54.86 Η;7.37 Ν;8·53 S;9.76 實驗値:C;54.84 Η;7·33 Ν;8·63 S;9.50 [α]0+1〇·3± 1.0(c=(K515 DMSO 23t:) IR(KBr, v max 0111-1)3461,3375,1716,1638,1598,1344,1313 NMR(d^DMSO, δ ppm):0.80(d,J=6.8Hz,3H),0.82(d,J=6,6Hz,3H), 1.23(s, 9H),1.83(m,m),3.30(m,lH),5.86(s,2H),6.56(d,J=8.8Hz,2H),7.36(d,J= 8.6Hz,2H),7.47(d,J=9.6Hz,lH) 第3製程 將化合物(XXI- 1 )3 2 8mg(l mmol)溶在二氯甲烷l〇ml, 在冰冷下依序加N-甲基嗎啉0.33ml(3Xlmmol)及4-甲 硫基爷釀氯280mg(1.5Xlmmol)。在室溫擾泮1夜後’ 加乙醚。收集結晶而以冰水及乙醚洗淨,從丙酮/乙醚 再結晶,得融點2 3 5〜2 3 8 °C之目的物(XXII_l)43 3mg( 產率 9 0 · 5 %)。 元素分析c23h3Qn2o5s2 計算値:C;57.72 H;6.32 N;5.85 s;13.40 • 80 - 200403216 實驗値:C;57.63 Η;6·28 Ν;5·86 S;13.20 [a】D+5.7 土 0.9(c=0.512 DMSO 25t:) IR(KBr, i/ max cm-1)3366,3284,1713,1667,1592,1514,1498t 1341,13 17 NMR(d6-DMSO, δ ppm):0.82(d, J=6.6Hzi3H),0.84(d, J=6.8Hz,3H), 1.22(s,9H),:L91(m,lH),2.55(s,3H),3,32(s,3H),3.44((id,J=6.2,8.6Hz.lH)· 7.40(d,J=8.6Hz,2H)t7.73(d,J=8.6Hz,2H)J7.90-8,01(m&gt;5H), 10.48 (stlH) Λ 第4製程 將化合物(XXII-l)405mg(0.85mmol)溶在二氯甲烷3ml ,加三氟乙酸3.3ml(5 0 X 0.8 5 mmol),在室溫攪拌2小 時。減壓濃縮後,以乙醚洗淨,得融點2 3 1 - 2 3 4 °C之目 的物(I a - 4 - 1 ) 340mg(產率 94.7%)°Ia-4-1 In the first process, 10 g (4 7.6 8 mmol) of D-valine tert-butyl hydrochloride (χ V-3) was dissolved in 100 ml of dichloromethane, and the solution was cooled under ice. Add 5.7ml (3X47.68mm) of N-methylmorpholine and 14.1g (1.2X47.88mmol) of 4-nitrobenzenesulfonyl chloride sequentially, and stir at room temperature for 5 hours, then sequentially with 2N hydrochloric acid, Washed with 5% sodium bicarbonate water and water ', dried over sodium sulfate, concentrated under reduced pressure, and recrystallized from dichloromethane / n-hexane to obtain a melting point of 89-90 ° C (XX-1) 1 3,3 g (77.8% yield). Elemental analysis c15h22n2 06 s Calculation 値 · C; 50.27 H; 6.19 N; 7.82 S; 8.95 Experiment 値: C; 50.04 H; 6.10 N; 7.89 S; 8.84 200403216 [a] d-2.9 ± 0.8 (c = 0.512 DMSO 23X :) IR (KBr, v max cm · l) 3430br, 3301,1722,1698,1525,1362,1348,1181, 1174,1159 The second process will be 13.29 g (37.08 mmol) of compound (X-1) Dissolve in 200ml of methanol, add 1g of 10% Pd-C, and reduce with hydrogen catalyst at room temperature. After 2 hours, the catalyst was filtered off, concentrated under reduced pressure, and recrystallized from acetone / n-hexane to obtain 11.5 g of an amine (XIX · 1) with a melting point of 1 64 to 166 ° C (yield 94.4%). Elemental analysis c15h24n2o4s Calculate 値: C; 54.86 Η; 7.37 Ν; 8.53 S; 9.76 Experimental 値: C; 54.84 Η; 7.33 Ν; 8.63 S; 9.50 [α] 0 + 10.3 · 1.0 (c = (K515 DMSO 23t :) IR (KBr, v max 0111-1) 3461,3375,1716,1638,1598,1344,1313 NMR (d ^ DMSO, δ ppm): 0.80 (d, J = 6.8Hz , 3H), 0.82 (d, J = 6, 6Hz, 3H), 1.23 (s, 9H), 1.83 (m, m), 3.30 (m, lH), 5.86 (s, 2H), 6.56 (d, J = 8.8Hz, 2H), 7.36 (d, J = 8.6Hz, 2H), 7.47 (d, J = 9.6Hz, 1H) In the third process, the compound (XXI-1) 3 2 8 mg (l mmol) was dissolved in two 10 ml of methyl chloride was added sequentially under ice-cooling 0.33 ml (3 × 1 mmol) of N-methylmorpholine and 280 mg (1.5 × 1 mmol) of 4-methylthiomethyl chloride. After stirring at room temperature for 1 night, diethyl ether was added. The crystals were collected, washed with ice water and ether, and recrystallized from acetone / ether to obtain 43 3 mg (yield 90.5%) of the target compound (XXII_1) at a melting point of 2 3 5 to 2 38 ° C. Elemental analysis c23h3Qn2o5s2 Calculate 値: C; 57.72 H; 6.32 N; 5.85 s; 13.40 • 80-200403216 Experiment 値: C; 57.63 Η; 6.28 Ν; 5.86 S; 13.20 [a] D + 5.7 soil 0.9 (c = 0.512 DMSO 25t :) IR (KBr, i / max cm-1) 3366,3284,1713,1667,1592,1514,1498t 1341,13 17 NMR (d6-DMSO, δ ppm): 0.82 (d, J = 6.6Hzi3H), 0.84 (d, J = 6.8Hz, 3H), 1.22 (s, 9H) ,: L91 (m, lH), 2.55 (s, 3H), 3, 32 (s, 3H), 3.44 ((id, J = 6.2, 8.6Hz.lH) 7.40 (d, J = 8.6Hz, 2H) t7.73 (d, J = 8.6Hz, 2H) J7.90-8 , 01 (m &gt; 5H), 10.48 (stlH) Λ In the fourth process, 405 mg (0.85 mmol) of compound (XXII-1) was dissolved in 3 ml of dichloromethane, and 3.3 ml of trifluoroacetic acid (5 0 X 0.8 5 mmol) was added. Stir at room temperature for 2 hours. After concentration under reduced pressure, it was washed with ether to obtain a melting point of 2 3 1-2 3 4 ° C (I a-4-1) 340 mg (yield 94.7%) °

融點:2 3 1〜2 3 4 °C IR(KBr,2; max cm·1) : 1748,1 65 5,1 5 9 2,1 3 2 3,1161。 元素分析 c19h22n2o5s2· o.icf3cooh 計算値:C;53.14 H;5.13 Ν;6·46 S;14.78 實驗値:C;53.48 H;5.31 N;6.57 S;15.06 實施例1 7 7〜2 0 8 仿實施例1 7 6合成表3 3〜3 6之化合物。 -81 · 200403216Melting point: 2 3 1 ~ 2 3 4 ° C IR (KBr, 2; max cm · 1): 1748, 1 65 5, 1 5 9 2, 1 3 2 3, 1161. Elemental analysis c19h22n2o5s2.o.icf3cooh Calculate 値: C; 53.14 H; 5.13 Ν; 6.46 S; 14.78 Experimental 値: C; 53.48 H; 5.31 N; 6.57 S; 15.06 Example 1 7 7 ~ 2 0 8 Example 1 6 The compounds of Table 3 3 to 36 were synthesized. -81200403216

M HO〇OOHNC\IOS.®0: 元尜分析 ( ^25^23^3〇65*〇.9^^2〇 Calc. 0:58.91 H:4.90 N:8.24 S:6.29 Foun.C:58.97 H:5.07 N;7.95 S:6.10 l 〇24H2〇N4〇7S*1.1 HgO Calc. 0:54.56 H:4.24 N: 10.60 S:6.07 F〇un»C:54.51 H:4.32 N; 10.83 S;6.15 C26H26N4O5S.0.9H2O Calc. 0:59.73 H:5.36 N:10J2 S:6.13 Foun.C:59.58 H:5.23 NH0.8S S:6.47 C25H23N3〇5S*0.9H2〇 Calc. 0:60.82 H:5.06 N:8.51 S:6.49 Foun.C:60.83 H:5.19 N:8.66 S:6.66 〇24 H2〇BrN3〇5S*0.6H2〇 Calc. 0:52.11 H:3.86 Br.14.44 N:7.60 S:5.80 Foun.C:52.13 H:4.04 Br:14.57 N:7.43 S:5.70 ^25^23N3〇sS2*〇.7H2〇 Calc. 0:57.50 H:4.71 N:8.05 S:12.28 Foun.C;57.63 H:4.79 N:8.00 S:12.08 1 i) IR(v cm-1) (KBr) 1732,1641 1341,1163 ΙΛ卜 in n &lt;D T-y— t— CO* CO cvj cvj 卜C5 t— T— CO 〇&gt; CO寸 &lt;D r- CNJ tD N· CO 1719,1629 1340,1156 1732,1653 :1399,1199 1731,1656 1591,1327 1160 CO CO CO T-(O CO &lt;〇·寸 cm 〇) m 卜in严 1728,1653 1593,1323 1159 融點(分解Si rn.pt. (t)) 215-217 I 233-234 : ] _ 216-218 211-213 ------- ! 236-238 240-244 215-218 244:249 * Pi P4 Pi Pi Pi a ¢5 90 a: Φ 予X oo ό h3c〇H〇^c^^- I Φ fX OO Φ | Φ T工· oo Φ s *(H3C)2n^^c-nhQ^ Φ fi oo Φ o CO X 奴 ^Qr% - ^Qr H3CS^^g-N-H〇^ Cxi ο /= X2 .〇 i Q £ o 12: Q CS-〇h2- Οά-CH, ΟΔ-ch, s施例 No. 卜 卜 ^^4 CO N •—4 Oi 卜 F—» o co X 00 Γ0 X T XM HO〇OOHNC \ IOS.®0: Yuan Yuan analysis (^ 25 ^ 23 ^ 3〇65 * 0.99 ^ 2〇Calc. 0: 58.91 H: 4.90 N: 8.24 S: 6.29 Foun.C: 58.97 H : 5.07 N; 7.95 S: 6.10 l 〇24H2〇N4〇7S * 1.1 HgO Calc. 0: 54.56 H: 4.24 N: 10.60 S: 6.07 F〇un »C: 54.51 H: 4.32 N; 10.83 S; 6.15 C26H26N4O5S. 0.9H2O Calc. 0: 59.73 H: 5.36 N: 10J2 S: 6.13 Foun.C: 59.58 H: 5.23 NH0.8S S: 6.47 C25H23N3〇5S * 0.9H2〇Calc. 0: 60.82 H: 5.06 N: 8.51 S: 6.49 Foun.C: 60.83 H: 5.19 N: 8.66 S: 6.66 〇24 H2〇BrN3〇5S * 0.6H2〇Calc. 0: 52.11 H: 3.86 Br.14.44 N: 7.60 S: 5.80 Foun.C: 52.13 H: 4.04 Br: 14.57 N: 7.43 S: 5.70 ^ 25 ^ 23N3〇sS2 * .7H2〇Calc. 0: 57.50 H: 4.71 N: 8.05 S: 12.28 Foun.C; 57.63 H: 4.79 N: 8.00 S: 12.08 1 i) IR (v cm-1) (KBr) 1732,1641 1341,1163 ΙΛ 卜 in n &lt; D Ty— t— CO * CO cvj cvj and C5 t— T— CO 〇 &gt; CO inch &lt; D r -CNJ tD N · CO 1719,1629 1340,1156 1732,1653: 1399,1199 1731,1656 1591,1327 1160 CO CO CO T- (O CO &lt; ○ inch cm 〇) m BU Yan 1728,1653 1593 , 1323 1159 melting point (decomposition Si rn.pt. (t)) 215-217 I 233-234:] _ 216-218 211-213 -------! 236-238 240-244 215-218 244: 249 * Pi P4 Pi Pi Pi a ¢ 5 90 a: Φ to X oo ό h3c〇H〇 ^ c ^^-I Φ fX OO Φ | Φ T worker · oo Φ s * (H3C) 2n ^^ c-nhQ ^ Φ fi oo Φ o CO X slave ^ Qr%-^ Qr H3CS ^^ gNH〇 ^ Cxi ο / = X2 .〇i Q £ o 12: Q CS-〇h2- Οά-CH, ΟΔ-ch, s Example No. 卜卜 ^^ 4 CO N • —4 Oi 卜 F— »o co X 00 Γ0 XTX

82- 200403216 4 3 表 (el) HOOo+HNCVJosQba: 元素分析 C24H20FN3OsS.0.6H2O Calc. C:58,55 H:4.34 R3.86 N:8.54 3:6.51 F〇un.C:58.67 H:4.51 F:3.77 N:8.42 S:6.47 ^23^22^2〇6^ Calc. C:60.78 H:4.88 N:6.16 S:7.05 F〇un.G:60.50 H:4.99 N:6.14 S:7.31 C22H19N3O7S Calc, C:56.29 H:4.08 N:8.95 S:6.83 Foun.C:56.01 H:4.09 N:8.93 S:6.75 C22H2〇N2〇5S*0.5CF3COOH Calc. 0:57,37 H:4.29 N:5.82 S:6.66 Foun.C:57.53 HAAS N:5.75 S:7.11 C22H19BrN2OsS-CF3COOH Calc. 0:46.69 H:3.27 ΒΠ2.94 N:4.54 S:5.19 Foun.C:46.79 H:3.41 Br:12.86 N:4.57 S;5.37 C23H22N2O5S ! Calc. 0:63.00 H:5.06 N:6.39 3:7.31 Foun.C:62.70 H:5.13 N:6.36 S:7.36 C23H22N2〇5S2.〇.8CF3COOH Cafe. 0:52.59 H:4.09 N:4.99 S:11.42 Foun.C:52.77 H:4.24 N:5.12 S:11.58 C22H19FN2O5S Calc. 0:59.72 H;4.33 F:4.29 N:6.33 S:7.25 I Foun.C:59.59 H:4.42 F:4.30 N:6.37 S:7.24 1 IR(v crn-l) (KBr) 1730,1651 1603,1333 1161 T- CJ l〇 &lt;\J &lt;D CO r— r— CO ▼- T— CM C7) (O 卜· ϊό T— 1— r— t— 1719,1672 1593,1327 1159 co in in c\j &lt;d &lt;n T— τ~~· aS oj σ) 寸 σ) in Nin产 r-* r— 1743,1670 1591,1335 1167 ( _£_ 1752,1726 1656,1591 /1324,1160 &lt;〇 CO 二 寸 O) CD •卜 in ·»- y— t— 寸 in cm CD CO t— r^co 0 〇〇〇&gt;&lt;〇 卜 l〇 T— T— V—* 融點(分解 m.pt.(*C) 170-175 237-239 235-239 114-115 242-243 242-244 I I 232-235 1 218-220 | * Pi P5 CSJ 70 a Φ fX oo h3c〇H〇-c-n-Qk 〒工 OO Φ Φ· OO Φ m h3cs-^c^h〇^ Φ zr 00 Φ li- _£l o r= xz Q &lt;Q^ch2- h &lt;〇&gt;-CHr O &lt;Q^ch2- I Q^ch2- 實施例 No. ΙΛ OO &lt;D •CO Γ ΟΟ CO . 00 1 8.9 t 1 —« ·—&lt; O'· Γ1 83- 200403216 3 {e〇 ΗΟ〇Ο^ΗΝ^·9α: 元粜分忻 c21h18cin3o5s Calc. C:54.84 H:3.94 Cl:7.71 N:9.14 S:6.97 F〇un.C:54.39 H:4.06 Cl:7.42 N:8.98 S:6.99 C22H20CIN3O5S*0· 1 cf3cooh Calc. 0:55.15 H:4.19 0:7.33 N:8.69 S:6.63 Foun.C:55.25 H:4.28 01:7.10 N:8.80 S:6.80 C24H24N2O5S-0.5hl2O Calc. 0:62*46 H:5.46 N:6.07 S:6.95 F〇un.C:62.42 H:5.54 N:6.26 S.6.97 C·) 9H22N2〇5S*0.2H2〇 Calc. 0:57.91 H:5.73 N:7.11 S:8.14 Foun.C:57.94 H:5.69 N:7.03 S:8.14 C19H22N2〇5S2*〇.1 CF3COOH Calc. C.-53.14 H;5.13 N;6.46 S:14.78 Foun.C:53.48 H:5.31 N:6.57 S:15.06 CieHi9FN2O5S*0.1CF3COOH Cafe. 0:53.86 H:4.74 R6.09 N:6.90 S:7.90 Foun.C:53.82 H:4.85 F;5.60 N;6.93 S;7.78 〇18闩2(^2〇58*0.1 HgO Calc. C:57.16 H:5.38 N:7.41 S:8.48 F〇un.C:57.01 H:5.46 N:7.57 S:8.57 ^19^22N2〇6Sb〇.2H2〇 Calc. 0:55.65 H:5.51 N:6.83S:7.82 F〇un.G:55.63 H:5.48 N:7.03 S:7.75 1 IR(v cm-1) (KBr) 1724,1673 1592,1326 1156 CNJ CVJ CO CO CO o in cvTo OJ O) &lt;D 卜 lO r-r— t— r— o寸 ID Oi CD CO t— t— CO O cn&lt;o 卜 L〇 r· t— r— CO CO in &lt;vi «3 CO C}〇Jy- 寸 σ&gt; (〇 卜 ΙΟ Τ- t〇 CQ in cvj ω co co*- cJ »-yT&lt;J)&lt;£&gt; in 1- t— r— &lt;0 0 CM 05 &lt;D r^. in T- Ύ-* T~ T— &lt;i&gt; 〇□ c\T 寸 CD CVJ KCDCO 1— t— T— 卜 &lt;D CD CO t-&gt; C〇 C7&gt; cm 〇&gt; in ;N IO -r- τ~· -r— r~- 吋卜· in v-co co co* r-* in cn σι in CO UOCM r— ir- 融點(分解s rn.pt.CC) 201-203 206-208 254-256 ί 227-229 I I 231-234 235-236 226-227 220-221· * Pi ίϋ 30 Φ fX oo &lt;&gt;· o Φ fX £ Φ fX OO Φ f工 OO φ £ H3cs*O~g 一 I Φ fX OO Φ P OO ό o 6 (ch3)2ch- 丨 (ch3)2ch- (CH3)2CH- (CH3)2CH- (CH3)2CH. (CH3)2CH. 實施例 No. CO T cn 0^i m 〇&gt; •X) αι »—1 N σ&gt; ! r-H 00 cr. » CTi 9 &quot;♦ 0 ·· -84- 20040321682- 200403216 4 3 Table (el) HOOo + HNCVJosQba: Elemental analysis C24H20FN3OsS.0.6H2O Calc. C: 58,55 H: 4.34 R3.86 N: 8.54 3: 6.51 F〇un.C: 58.67 H: 4.51 F: 3.77 N: 8.42 S: 6.47 ^ 23 ^ 22 ^ 2〇6 ^ Calc. C: 60.78 H: 4.88 N: 6.16 S: 7.05 Fun. G: 60.50 H: 4.99 N: 6.14 S: 7.31 C22H19N3O7S Calc, C : 56.29 H: 4.08 N: 8.95 S: 6.83 Foun.C: 56.01 H: 4.09 N: 8.93 S: 6.75 C22H2〇N2〇5S * 0.5CF3COOH Calc. 0: 57,37 H: 4.29 N: 5.82 S: 6.66 Foun .C: 57.53 HAAS N: 5.75 S: 7.11 C22H19BrN2OsS-CF3COOH Calc. 0: 46.69 H: 3.27 Beta 2.94 N: 4.54 S: 5.19 Foun.C: 46.79 H: 3.41 Br: 12.86 N: 4.57 S; 5.37 C23H22N2O5S! Calc. 0: 63.00 H: 5.06 N: 6.39 3: 7.31 Foun.C: 62.70 H: 5.13 N: 6.36 S: 7.36 C23H22N2〇5S2.〇.8CF3COOH Cafe. 0: 52.59 H: 4.09 N: 4.99 S: 11.42 Foun .C: 52.77 H: 4.24 N: 5.12 S: 11.58 C22H19FN2O5S Calc. 0: 59.72 H; 4.33 F: 4.29 N: 6.33 S: 7.25 I Foun.C: 59.59 H: 4.42 F: 4.30 N: 6.37 S: 7.24 1 IR (v crn-l) (KBr) 1730,1651 1603,1333 1161 T- CJ l0 &lt; \ J &lt; D CO r— r— CO ▼-T— CM C7) (O ·· T— 1 — R — T— 1719,1672 1593,1327 1159 co in in c \ j &lt; d &lt; n T— τ ~~ · aS oj σ) inch σ) in Nin r- * r— 1743,1670 1591,1335 1167 (_ £ _ 1752,1726 1656,1591 / 1324,1160 &lt; 〇CO 2 inch O) CD • Buin · »-y— t— inch in cm CD CO t— r ^ co 0 〇〇〇 &gt; & lt 〇 卜 l〇T— T— V— * Melting point (decomposition m.pt. (* C) 170-175 237-239 235-239 114-115 242-243 242-244 II 232-235 1 218-220 | * Pi P5 CSJ 70 a Φ fX oo h3c〇H〇-cn-Qk 〒 工 OO Φ Φ · OO Φ m h3cs- ^ c ^ h〇 ^ Φ zr 00 Φ li- _ £ lor = xz Q &lt; Q ^ ch2- h &lt; 〇 &gt; -CHr O &lt; Q ^ ch2- IQ ^ ch2- Example No. ΙΛ OO &lt; D • CO Γ ΟΟ CO. 00 1 8.9 t 1 — «· — &lt; O ' · Γ1 83- 200403216 3 {e〇Η〇〇〇〇 ^ ΗΝ ^ · 9α: Yuan Zhifenxin c21h18cin3o5s Calc. C: 54.84 H: 3.94 Cl: 7.71 N: 9.14 S: 6.97 Foun. C: 54.39 H: 4.06 Cl: 7.42 N: 8.98 S: 6.99 C22H20CIN3O5S * 0 · 1 cf3cooh Calc. 0: 55.15 H: 4.19 0: 7.33 N: 8.69 S: 6.63 Foun.C: 55.25 H: 4.28 01: 7.10 N: 8.80 S: 6.80 C24H24N2O5S -0.5hl2O Calc. 0: 62 * 46 H: 5.46 N: 6 .07 S: 6.95 F〇un.C: 62.42 H: 5.54 N: 6.26 S.6.97 C ·) 9H22N2〇5S * 0.2H2〇Calc. 0: 57.91 H: 5.73 N: 7.11 S: 8.14 Foun.C: 57.94 H: 5.69 N: 7.03 S: 8.14 C19H22N2〇5S2 * .1 CF3COOH Calc. C.-53.14 H; 5.13 N; 6.46 S: 14.78 Foun.C: 53.48 H: 5.31 N: 6.57 S: 15.06 CieHi9FN2O5S * 0.1CF3COOH Cafe. 0: 53.86 H: 4.74 R6.09 N: 6.90 S: 7.90 Foun.C: 53.82 H: 4.85 F; 5.60 N; 6.93 S; 7.78 〇18 latch 2 (^ 2〇58 * 0.1 HgO Calc. C: 57.16 H: 5.38 N: 7.41 S: 8.48 F〇un.C: 57.01 H: 5.46 N: 7.57 S: 8.57 ^ 19 ^ 22N2〇6Sb〇.2H2〇Calc. 0: 55.65 H: 5.51 N: 6.83S: 7.82 F〇un.G: 55.63 H: 5.48 N: 7.03 S: 7.75 1 IR (v cm-1) (KBr) 1724,1673 1592,1326 1156 CNJ CVJ CO CO CO o in cvTo OJ O) &lt; D bl 10 rr— t— r— o inch ID Oi CD CO t— t— CO O cn &lt; o L L〇r · t— r— CO CO in &lt; vi «3 CO C} 〇Jy- inch σ &gt; (〇 卜ΙΟ Τ- t〇CQ in cvj ω co co *-cJ »-yT &lt; J) &lt; £ &gt; in 1- t— r— &lt; 0 0 CM 05 &lt; D r ^. In T- Ύ- * T ~ T— &lt; i &gt; 〇 □ c \ T inch CD CVJ KCDCO 1— t— T— bu &lt; D CD CO t- &gt; C 〇C7 &gt; cm 〇 &gt;in; N IO -r- τ ~ · -r— r ~-Inch · in v-co co co * r- * in cn σι in CO UOCM r— ir- melting point (decomposition s rn.pt.CC) 201-203 206-208 254-256 ί 227-229 II 231-234 235-236 226-227 220-221 · * Pi ίϋ 30 Φ fX oo &lt; &gt; · o Φ fX £ Φ fX OO Φ fOOOO φ £ H3cs * O ~ g-I Φ fX OO Φ P OO o 6 (ch3) 2ch- 丨 (ch3) 2ch- (CH3) 2CH- (CH3) 2CH- (CH3) 2CH (CH3) 2CH. Example No. CO T cn 0 ^ im 〇 &gt; • X) αι »—1 N σ &gt;! RH 00 cr.» CTi 9 &quot; ♦ 0 ·· -84- 200403216

3 《el) HOOO^HNCDs^a: 元粜分析 C^gHigN3〇7S*0.4H2〇 'Calc. C:50.44 H:4.66 N:9.80S:7.48 F〇un.C:50.40 H:4.55 N:9.90 S;7.44 Cl8H19BrN2O5S*0.2Ethylether Calc. 0:48.03 H:4.50 巳r: 17,00 N:5.96 S:6.82 F〇un.G:48.04 H:4.61 Br: 16.83 N:5.96 S:6.86 C2〇H24N2〇6Se0.4H2〇 Calc. 0:56.17 H:5.84 N:6.55 S:7.50 F〇un.C:56.21 H:6.〇2 N:6.50 S:7.33 〇2i H2〇N4〇5S*0.25CF3COOH Calc. C:55.06 H:4.35 N: 11.95 S:6.84 Four».C:54.80 H:4.90 N:12.16 S:7.10 C21H19N3O5S Calc. 0:59.28 H:4.50 N:9.88 S:7.54 F〇un.C:58.84 H:4.56 N:9.71 S:7.36 ^20^19^3〇6δ Calc. 0:55.94 H:4.46 N:9.78 S:7.47 F〇un.C:55.50 H:4.47 N:9.74 S:7.31 I 1 1 . ϊ)ΊΗ(ν cni-l) (KBr) OO卜 CO寸 &lt;0 C3 T— t— &lt;0^(0 OJ O) CD 卜 l〇 *— T— &gt;r— CO 00 C〇 T- tDCO CO CV〇5 oj C7&gt; m 卜 ΙΟ T- rr 产 T— 03 cn in lO T- σίω ιο ·»- &lt;D C〇 ^ t— r cn 卜〇 CD C〇 T— T— COO CJ CVJO) QD 卜· lO T- 'T— ir· 1719,1672 1594,1339 1165 x in σ&gt; 00产 &lt;D CO ▼— T— c5V寸 CQ O) to l〇 ^ ! 1732,1679 1592,1312 ί 1155 1 融點(分解 m.pt.CC) 240-242 229-230 214-216 236-237 I 272-275 214-215 217-220 1 * Di Pi X Oi fX oo Φ -^Qr HsCO-Q-c-nhQ- 〒工 OO o £ Φ fX OO ό Φ 〒工 OO io 1 ZX Φ CD Φ 〒:E OO Φ ζά (CH3)2CH- (CH3)2CH- : (CH3)3〇- [^~ch2· I G^CH2- I I 〇 ό 實施例1 No.; i r—4 0 01 c\ o Cl Γ0 o o CM ΙΛ 〇 Cl to 0 i 〇) 卜 o CJ OO 0 CM3 《el) HOOO ^ HNCDs ^ a: Yuan Yuan analysis C ^ gHigN3〇7S * 0.4H2〇'Calc. C: 50.44 H: 4.66 N: 9.80S: 7.48 Fun. C: 50.40 H: 4.55 N: 9.90 S; 7.44 Cl8H19BrN2O5S * 0.2Ethylether Calc. 0: 48.03 H: 4.50 巳 r: 17,00 N: 5.96 S: 6.82 F〇un.G: 48.04 H: 4.61 Br: 16.83 N: 5.96 S: 6.86 C2〇H24N2〇 6Se0.4H2〇Calc. 0: 56.17 H: 5.84 N: 6.55 S: 7.50 F〇un.C: 56.21 H: 6.02 N: 6.50 S: 7.33 〇2i H2〇N4〇5S * 0.25CF3COOH Calc. C : 55.06 H: 4.35 N: 11.95 S: 6.84 Four ».C: 54.80 H: 4.90 N: 12.16 S: 7.10 C21H19N3O5S Calc. 0: 59.28 H: 4.50 N: 9.88 S: 7.54 F〇un.C: 58.84 H: 4.56 N: 9.71 S: 7.36 ^ 20 ^ 19 ^ 3〇6δ Calc. 0: 55.94 H: 4.46 N: 9.78 S: 7.47 Foun.C: 55.50 H: 4.47 N: 9.74 S: 7.31 I 1 1. Ϊ ) ΊΗ (ν cni-l) (KBr) OO CO inch &lt; 0 C3 T— t— &lt; 0 ^ (0 OJ O) CD BU l ** T— &gt; r-- CO 00 C〇T- tDCO CO CV〇5 oj C7 &gt; m BU I T- rr produced T— 03 cn in lO T- σίω ιο · »-&lt; DC〇 ^ t— r cn 〇CD C〇T— T— COO CJ CVJO) QD Bu lO T- 'T— ir1719,1672 1594,1339 1165 x in σ &gt; 00 production &lt; D CO ▼ — T— c5V inch CQ O) to l〇 ^! 1732,1679 1592,1312 ί 1155 1 Melting point (decomposition m.pt.CC) 240-242 229-230 214-216 236-237 I 272-275 214-215 217-220 1 * Di Pi X Oi fX oo Φ-^ Qr HsCO-Qc-nhQ- 〒 工 OO o £ Φ fX OO ό Φ 〒 工 OO io 1 ZX Φ CD Φ 〒: E OO Φ ζά (CH3) 2CH- (CH3) 2CH-: (CH3) 3〇- [^ ~ ch2 · IG ^ CH2- II 〇 Example 1 No .; ir-4 0 01 c \ o Cl Γ0 oo CM ΙΛ 〇Cl to 0 i 〇) Bu CJ OO 0 CM

85- 200403216 實施例209(E法) HC185- 200403216 Example 209 (Method E) HC1

Η2Ν^ΟΟΟιΒυ i.1.製程&gt; 厂入C〇〇〖Bu 处 XV-3 — XX1IM 製程 OHC-八 COQtBu 第3製程 XXIV -1 -『N=C—入 000油11」Η2Ν ^ ΟΟΟιΒυ i.1. Process &gt; Factory-introduced C〇〇 〖Bu Bu XV-3 — XX1IM Process OHC-Eight COQtBu Third Process XXIV -1-"N = C-In 000 Oil 11"

η~^ Ν=Νη ~ ^ Ν = Ν

MeS—^ /MeS— ^ /

Ia-5-1Ia-5-1

SCVH C00H 第1製程 將D-纈胺酸第三丁酯鹽酸鹽(XV- 3 ) 2 0.94克(9 9.8mm。1) · 溶在二氯甲烷2 0 0m卜在冰冷下先後加Ν·甲基嗎啉22mi (2X99.8 mmol)及對苯乙烯磺醯氯 20.27 克(99·8 mmol), 在室溫攪拌15小時後,依序以2N-鹽酸、5%碳酸氫鈉 水及水洗淨,以硫酸鈉乾燥,減壓濃縮,在矽膠柱層析 (乙酸乙酯/正己烷/氯仿=1/3/1),以正己烷洗淨,得融 點 118-120°C 之目的物(ΧΧΙΙΙ-1)28·93 克(產率 85%)。 -86- 200403216 IR(KBr,v max 012^)3419,3283,1716,1348,1168 NMR(CDCl3, δ ppm):0.85(d,J=6.9Hz,3H),1.00(d,J=6.6Hz,3H),1.21(s· 9H),2.04(m,lH),3.62(dd,J=9.8,4.5Hz,lH),5.09(d,J=9.8HZ&gt;lH),5,41(dd· J=0.5,10.9Hz,lH),5.84(dd,J=0.5,17.6Hz,lH),6.72(dd,J=10.9,17.6Hz,l _ H),7.49(d,J=8.4Hzf2H),7.79(d,J=8.4Hz,2H) 第2製程 將化合物(ΧΧΠΙ-1)5·09克(15mmol)溶在二氯甲烷 3 0 0ml,在-7 8 °C通臭氧15分後,加甲基硫22ml (20 X 1 5mm ο 1),以80分作成室溫後,減壓濃縮,得6.03克 醛體(XXIV-1)。 鲁 IR(CHCh,v max ¢11^)3322,1710,1351,1170 NMR(CDC13, 6 ppm):0.85(d,J=6.9Hz,3H)F1.00(d,J=6.9Hz,3H),1.22(s, 9H),2.07(m,lH),3.69(dd,J=4.5,9.9Hz&gt;lH),8.01(s,4H)Il〇.〇8(s,lH) 第3製程 將化合物(XXIV-l)6.〇2克(15mmol)溶在乙醇60ml及 四氫呋喃1 5 ml之混液,加苯磺醯肼2 · 7 2克(1 · 〇 5 X 1 5 mmol)。在室溫攪拌2小時後,減壓濃縮,在矽膠柱 層析(氯仿/乙酸乙酯)’從乙酸乙酯再結晶,得融點 春 1 63 - 1 64°C之目的物(Χχν_1)4·44克,從第2製程之產 率 6 0 % 0 元素分析C22H29N3〇6S2 計算値:c;53.32 Η;5·90 N;8.48 S;12.94 實驗値·· C;53.15 Η;5·87 Ν;8·32 S;12.82 [α ]D-11.6±1.0(c = 〇.509 DMSO 23.5 °C) 200403216 IR(KBr, v max cmd)3430r3274,1711,1364,1343,1172 NMR(CDCl3, δ ppm):0.84(d,4=6.91^,311),0.99((1,J=6.6Hz,3H),1.19(s, 9H),2-00(m,lH),3.63(dd,J=4.5,9.9Hz,lH),5-16(d,J=9.9Hz,lH),7.50·SCVH C00H In the first process, D-valinic acid tert-butyl ester hydrochloride (XV-3) 2 0.94 g (9 9.8 mm. 1) · Dissolved in dichloromethane 2 0 0 m, and then added N under ice cooling. Methylmorpholine 22mi (2X99.8 mmol) and p-styrene sulfonyl chloride 20.27 g (99 · 8 mmol), stirred at room temperature for 15 hours, followed by 2N-hydrochloric acid, 5% sodium bicarbonate water and water Washed, dried over sodium sulfate, concentrated under reduced pressure, and purified by silica gel column chromatography (ethyl acetate / n-hexane / chloroform = 1/3/1), and washed with n-hexane to obtain a melting point of 118-120 ° C. (XXXII-1) 28.93 g (85% yield). -86- 200403216 IR (KBr, v max 012 ^) 3419,3283,1716,1348,1168 NMR (CDCl3, δ ppm): 0.85 (d, J = 6.9Hz, 3H), 1.00 (d, J = 6.6Hz , 3H), 1.21 (s · 9H), 2.04 (m, lH), 3.62 (dd, J = 9.8, 4.5Hz, lH), 5.09 (d, J = 9.8HZ &gt; lH), 5,41 (dd · J = 0.5, 10.9Hz, lH), 5.84 (dd, J = 0.5, 17.6Hz, lH), 6.72 (dd, J = 10.9, 17.6Hz, l_H), 7.49 (d, J = 8.4Hzf2H), 7.79 (d, J = 8.4Hz, 2H) In the second process, 5.09 g (15 mmol) of the compound (XXII-1) was dissolved in 300 ml of dichloromethane, and ozone was added at -78 ° C for 15 minutes, and then added. 22 ml of methyl sulfur (20 X 1 5 mm ο 1) was prepared at room temperature in 80 minutes, and then concentrated under reduced pressure to obtain 6.03 g of aldehyde (XXIV-1). Lu IR (CHCh, v max ¢ 11 ^) 3322,1710,1351,1170 NMR (CDC13, 6 ppm): 0.85 (d, J = 6.9Hz, 3H) F1.00 (d, J = 6.9Hz, 3H) , 1.22 (s, 9H), 2.07 (m, 1H), 3.69 (dd, J = 4.5, 9.9Hz &gt; 1H), 8.01 (s, 4H) 110.08 (s, 1H) The third process converts the compound (XXIV-1) 6.02 g (15 mmol) was dissolved in a mixture of 60 ml of ethanol and 15 ml of tetrahydrofuran, and 2.72 g (1.05 X 1 5 mmol) of sulfenylhydrazine was added. After stirring at room temperature for 2 hours, it was concentrated under reduced pressure, and recrystallized from ethyl acetate by silica gel column chromatography (chloroform / ethyl acetate) to obtain a melting point of the target compound (χχν_1) of 1 63-1 64 ° C. 4 · 44 g, yield 60% from the second process. Calculated by elemental analysis C22H29N3〇6S2 値: c; 53.32 Η; 5.90 N; 8.48 S; 12.94 experimental 値 ·· C; 53.15 Η; 5.87 Ν ; 8 · 32 S; 12.82 [α] D-11.6 ± 1.0 (c = 0.509 DMSO 23.5 ° C) 200403216 IR (KBr, v max cmd) 3430r3274,1711,1364,1343,1172 NMR (CDCl3, δ ppm ): 0.84 (d, 4 = 6.91 ^, 311), 0.99 ((1, J = 6.6Hz, 3H), 1.19 (s, 9H), 2-00 (m, lH), 3.63 (dd, J = 4.5 , 9.9Hz, lH), 5-16 (d, J = 9.9Hz, lH), 7.50 ·

7.68(m,5H)f7.73(s&lt;lH)(7.78-7.84(ml2H)l7.96-8.02(mi2H),8.16(hrs.lHY 第4製程 將4-甲氫硫基苯胺0.14ml(l.llXlmmol)溶在50%乙 醇水溶液,加濃鹽酸0 · 3 ml,在內溫0〜5 °C攪拌。於加 亞硝酸鈉7 8.4 m g (1 . 1 4 X 1 m m ο 1)之水1 m 1溶液,在同溫 攪拌15分。另將化合物(XXV-l)496mg(lmmol)溶在乾吡 啶5 ml,在攪拌,而用8分加前述反應液,在-15 °C〜室溫攪拌4小時後,注入水中。次以乙酸乙酯萃取 而依序2N鹽酸、5 %碳酸氫鈉水及水洗淨,以硫酸鈉乾 燥,減壓濃縮,在矽膠柱層析(氯仿/乙酸乙酯=1/9),得 3 7 4mg(產率 74%)目的物(XXVI-1)。 元素分析 C23H29N5 04 S2· 0·3Η2Ο 計算値:C;54.27 Η;5·86 Ν;13·76 S;12.60 實驗値·· C;54.25 H;5.77 Ν;13·87 S;12.52 IR(KBr, v max cnr”3422.3310,1705,1345,1171 , NME(d6.DMSO, δ ppm):0.83(d, J=6.9Hzt3H),0.86(d&gt;J=7.2Hz,3H). 1.19(s,9H),2.00(m,lH),2.59(s,3H),3.54(dd,J=6.3,9.6Hz,lH),7.56(d,J = 8.7Hz,2H),8.00(d,J=8.6Hz,2H),8.10(d,J=8.7Hzl2H)l8.33(d,J = 9.6Hz,2 H),8.34(dfJ=8-7Hz,2H) 第5製程 將化合物(XXVI- 1 )3 5 3mg溶在二氯甲烷2.5ml及三氟 乙酸2.5 ml之混液,在室溫攪拌3小時後,減壓濃縮, 以乙醚洗淨,得化合物(Ia-5-l) 3 0 8mg(產率98%)。 _ -88 - 2004032167.68 (m, 5H) f7.73 (s &lt; lH) (7.78-7.84 (ml2H) l7.96-8.02 (mi2H), 8.16 (hrs.lHY 4th process will be 4-methylhydrothioaniline 0.14ml (l .llXlmmol) dissolved in 50% ethanol aqueous solution, add 0.3 ml of concentrated hydrochloric acid, and stir at internal temperature 0 ~ 5 ° C. Add sodium nitrite 7 8.4 mg (1.14 X 1 mm ο 1) water 1 The m 1 solution was stirred at the same temperature for 15 minutes. In addition, 496 mg (1 mmol) of the compound (XXV-1) was dissolved in 5 ml of dry pyridine, and the aforementioned reaction solution was added with 8 minutes while stirring, at -15 ° C to room temperature. After stirring for 4 hours, it was poured into water. It was extracted with ethyl acetate and washed with 2N hydrochloric acid, 5% sodium bicarbonate water and water in that order, dried over sodium sulfate, concentrated under reduced pressure, and then subjected to silica gel column chromatography (chloroform / ethyl acetate). Ester = 1/9) to obtain 3 74 mg (74% yield) of the target compound (XXVI-1). Elemental analysis C23H29N5 04 S2 · 0 · 3Η20 Calculated 値: C; 54.27 Η; 5.86 Ν; 13.76 S; 12.60 Experiment C · C; 54.25 H; 5.77 Ν; 13.87 S; 12.52 IR (KBr, v max cnr ”3422.3310,1705,1345,1171, NME (d6.DMSO, δ ppm): 0.83 (d , J = 6.9Hzt3H), 0.86 (d &gt; J = 7.2Hz, 3H). 1.19 (s, 9H), 2.00 (m, lH), 2.59 (s, 3H), 3.54 (dd, J = 6.3,9.6Hz , lH), 7.56 (d, J = 8.7 Hz, 2H), 8.00 (d, J = 8.6 Hz, 2H), 8.10 (d, J = 8.7Hz, 2H), 18.33 (d, J = 9.6Hz, 2H), 8.34 (dfJ = 8-7Hz, 2H) In the fifth process, compound (XXVI-1) 3 5 3mg It was dissolved in a mixture of 2.5 ml of dichloromethane and 2.5 ml of trifluoroacetic acid, and after stirring at room temperature for 3 hours, it was concentrated under reduced pressure and washed with ether to obtain 30.8 mg of compound (Ia-5-l) (yield 98%). ). _ -88-200403216

融點:1 9 4〜1 9 5 °C IR(KBr?v max cm'1) · 1 7 2 0, 1 3 43, 1 1 6 6, 元素分析 c19h21n5 04 s2 · 1·1Η20 計算値:C;48.83 Η;5.00 Ν;14·99 S;13.72 實驗値:C;49.13 Η;5·25 Ν;14·55 S;13.34 實施例2 1 0〜2 5 1 仿實施例2 0 9合成表3 7〜4 3之化合物。Melting point: 1 9 4 ~ 1 9 5 ° C IR (KBr? V max cm'1) · 1 7 2 0, 1 3 43, 1 1 6 6, Elemental analysis c19h21n5 04 s2 · 1 · 1Η20 Calculate 値: C 48.83 Η; 5.00 Ν; 14.99 S; 13.72 Experiment 値: C; 49.13 Η; 5.25 Ν; 14.55 S; 13.34 Example 2 1 0 ~ 2 5 1 Example 2 0 9 Synthesis Table 3 7 ~ 4 3 compounds.

200403216 表 tcc HOHNOoOHNWOra: &amp;〇 &lt;〇 g 这Q S ά g ^ ώ 1 •σ ιι ^ ΙΙξϋ- mu Hilt 4^15 1 co n £0 工 s5*x i n* ㈤s㉔ CJ -3 X C〇 〇) I, g 1 «* w I? 〇 〇 Si 52 §s i〇$2 2¾ it 1 s V» i T— 90 &amp; £z·2 0 -.-2 ό a K, δ· 工广 ο ^£1 o ό m ^ 〇 W2 ο ·—·200403216 Table tcc HOHNOoOHNWOra: &amp; 〇 &lt; 〇g This QS ά ^ 1 1 σ ιι ^ ΙΙξϋ- mu Hilt 4 ^ 15 1 co n £ 0 工 5 * xin * ㈤s㉔ CJ -3 XC〇〇) I, g 1 «* w I? 〇〇Si 52 §si〇 $ 2 2¾ it 1 s V» i T— 90 &amp; £ z · 2 0 -.- 2 ό a K, δ · 工 广 ο ^ £ 1 o ό m ^ 〇W2 ο ···

-90- 200403216-90- 200403216

3 (el) ΗΟΟΟΟΗ^οπΒα: JH-NMR((5 ppm) da-DMSO ! 2.75(dd1 J=9.3,13.7Hz, 1H) ,2.99( dd, J=5.3,13.7Hz, 1H) 5.3,9.3Hz,1H),8.53(d,J=9.3Hz· 1H) l Ϊ) IR(v cm*l) 〇CBr) 1 2400-3700br,3422,3337l 1733,1698,1347,1170 mmmi rn.pt.CC) 1 215-216 * ct; ao d ό a f= xz 6 &lt;〇»CHr 實施例 No. O CVJ r-H 9 1 CM3 (el) ΗΟΟΟΟΗ ^ οπΒα: JH-NMR ((5 ppm) da-DMSO! 2.75 (dd1 J = 9.3,13.7Hz, 1H), 2.99 (dd, J = 5.3,13.7Hz, 1H) 5.3,9.3Hz , 1H), 8.53 (d, J = 9.3Hz · 1H) l Ϊ) IR (v cm * l) 〇CBr) 1 2400-3700br, 3422, 3337l 1733, 1698, 1347, 1170 mmmi rn.pt.CC) 1 215-216 * ct; ao d af = xz 6 &lt; 〇 »CHr Example No. O CVJ rH 9 1 CM

-91- 200403216 3CO0 ΗΟΟοΟΗΝο'ίΛέα: 表 Τ 元素分析 C25H22N6〇4S*〇.5Ethylether Cate. C:60.10 H:5.04 N: 15.57 S:5.94 Foun.C:S0.41 H:4.69 ΝΠ5.52 S:5.57 〇24闩,gFNgO^S.OMElhylether Calc .C:57.35 H:4.32 F:3.54 N: 15.67 S:5.98 Foun.C:56.74 H:4.37 R3.47 N.M5.17 S:568 ^19^21 N5O4S Calc. 0:54.93 H:5.〇9 N: 16.86 S:7.72 F〇un.C:54.75 H:5.14 N:16.81 3:7.55 C18H19N5O4S Calc. 0:53.38 H:4.83 N:17.29 S:7.92 Foun.C:53.38 H:4.80 N:17.05 S:7.67 I • 〇28^23^5〇45*0.6^{2〇 Calc. C;62.70 H:4.55 N:13.06 S:5.98 Foun.C:62.61 H:4.50 N: 13.29 S:5.87 C26H21N5O4S.0.2H2O Calc. 0:62.07 H:4.29 N: 13.92 5:6.37 Foun.C:61.93 H:4.30 N: 14.01 S:6.43 〇25Η2〇Ν6〇5$·Η2〇 Calc. 0:56.17 H:4.15 N: 15.72 S:6.00 Foun.C:56.20 H:4.18 N: 15.68 S:6.10 1 &amp;) IR(v cm-1) (KBr) 卜 CD CO CO CO 卜T- 1728,1338 1166 1720,1595 1338,1170 1696,1594 1349,1173 1727,1337 1163 10 〇 0) to 寸T- T— T— in co&quot; co co 卜CO 1721,1418 1344,1163 1727,1703 1459,1332 1165 融點(分解黑 m.pt.(*C) 199-202 224-225 202-204 221-222 I 145-148 203-205 225-227 111-114 * 30 tv: $ 6 π Z Z-2 ό I. 6 $ b 6 a f1 o £ H uz Q (CH3)2CHCH2- {CH3)2CH- CHO 〇-Lch2- 質施例 No. ·—&lt; Cl CO Cl T •—1 Cl i/3 w^4 CsJ 卜 00 4 O) cr. •· -92- 200403216 表4 Ο cc-91- 200403216 3CO0 ΗΟΟοΟΗΝο'ίΛέα: Table T Elemental Analysis C25H22N6〇4S * 〇.5 Ethylether Cate. C: 60.10 H: 5.04 N: 15.57 S: 5.94 Foun.C: S0.41 H: 4.69 ΝΠ5.52 S: 5.57 〇24 latch, gFNgO ^ S.OMElhylether Calc .C: 57.35 H: 4.32 F: 3.54 N: 15.67 S: 5.98 Foun.C: 56.74 H: 4.37 R3.47 N.M5.17 S: 568 ^ 19 ^ 21 N5O4S Calc. 0: 54.93 H: 5.0.9 N: 16.86 S: 7.72 F.un. C: 54.75 H: 5.14 N: 16.81 3: 7.55 C18H19N5O4S Calc. 0: 53.38 H: 4.83 N: 17.29 S: 7.92 Foun. C: 53.38 H: 4.80 N: 17.05 S: 7.67 I • 〇28 ^ 23 ^ 5〇45 * 0.6 ^ {2〇Calc. C; 62.70 H: 4.55 N: 13.06 S: 5.98 Foun. C: 62.61 H: 4.50 N: 13.29 S: 5.87 C26H21N5O4S.0.2H2O Calc. 0: 62.07 H: 4.29 N: 13.92 5: 6.37 Foun.C: 61.93 H: 4.30 N: 14.01 S: 6.43 〇25Η2〇Ν6〇5 $ · Η2〇Calc. 0: 56.17 H: 4.15 N: 15.72 S: 6.00 Foun.C: 56.20 H: 4.18 N: 15.68 S: 6.10 1 &amp;) IR (v cm-1) (KBr) CD CO CO CO BU T- 1728, 1338 1166 1720,1595 1338,1170 1696,1594 1349,1173 1727,1337 1163 10 〇0) to inch T- T— T— in co &quot; co co CO 1721,1418 1344,1163 1727,17 03 1459,1332 1165 Melting point (decomposed black m.pt. (* C) 199-202 224-225 202-204 221-222 I 145-148 203-205 225-227 111-114 * 30 tv: $ 6 π Z Z-2 ό I. 6 $ b 6 a f1 o £ H uz Q (CH3) 2CHCH2- {CH3) 2CH- CHO 〇-Lch2- Quality Example No. · — &lt; Cl CO Cl T • —1 Cl i / 3 w ^ 4 CsJ bu 00 4 O) cr. • -92- 200403216 Table 4 〇 cc

(njo HOODOHN20SCOCC 元粜分析 C25H22N6O5S Calc. 0:57.91 H:4.28 N:16.21 S:6.18 F〇un.C:57.77H:4.29 N:16.01 3:6.37 C19H21N504S Calc. 0:54.93 H:5.09 N: 16.86 8:7.72 Foun.C;54.71 H:5.09 N;16.70 3:7.56 〇2〇Η23Ν5〇§3·0·4Η2〇 Calc. C:53.06 Η:5·30 N: 15.47 S:7.08 F〇un.C:53J3 H:5.13 N:15.12 S:7.14 ! f C20H23N5O5S-0.4H2O Calc. C:53.06 H;5.30 N: 15.47 S:7.08 Foun.C:53.13 H:5.13 N:15.12 S:7.14 Cl8H18BrNs〇4S*0.8H2〇 Calc. 0:43.70 H:3.99 Br:16.15 N:14.16 S:6.48 Foun.C:43.93 H:3.85 Br:15.92 N:13.87 3:6.47 I 1 1 ^ IR(v cm-1) 〇CBr) I 1749,1719 •1331,11.65 _I 1730,1693 1349,1173 CO 0 CJ) t〇 T-r™ ▼— oV OJ 〇 h- C3 T— T™ 1718,1601 1385,1162 1719,130¾ 1162 9 1696,1348 1171 1698,1344 1168 CO CO CO CD 卜 τ— * Is·» T— 10 CJ N CO 融點(分解i! ltt.pt. (*C) 195-196 • 205-207 ; 1 _1 204-207 190 decomp. I ί 195-197 j 227-228 204-207 203-205 * P3 Pi P4 Pi w h3c〇-〇-^^- h3coh^-n.n&lt;^^ Ηο-Ο-ζ^Ο- h3c〇-〇-^&gt;〇- 0&amp;Lch2- ! CH3CH2(Chb)CH· CH3CH2(CK3)CH* (CH3)2CH- (CH3)2CH- (CH3)2〇H- (CH3)3c- OCicH, 實施例 NO. 〇 C) Cl «—4 CJ ίΊ OJ CO OJ ”4 tfi Cl CM UD C^J 卜 CM 93- 200403216 1± 4 表(njo HOODOHN20SCOCC element analysis C25H22N6O5S Calc. 0: 57.91 H: 4.28 N: 16.21 S: 6.18 Foun.C: 57.77H: 4.29 N: 16.01 3: 6.37 C19H21N504S Calc. 0: 54.93 H: 5.09 N: 16.86 8 : 7.72 Foun.C; 54.71 H: 5.09 N; 16.70 3: 7.56 〇2〇Η23Ν5〇§3.0.4 · 2ΗCalc. C: 53.06 Η: 5 · 30 N: 15.47 S: 7.08 F〇un.C: 53J3 H: 5.13 N: 15.12 S: 7.14! F C20H23N5O5S-0.4H2O Calc. C: 53.06 H; 5.30 N: 15.47 S: 7.08 Foun.C: 53.13 H: 5.13 N: 15.12 S: 7.14 Cl8H18BrNs〇4S * 0.8H2 〇Calc. 0: 43.70 H: 3.99 Br: 16.15 N: 14.16 S: 6.48 Foun.C: 43.93 H: 3.85 Br: 15.92 N: 13.87 3: 6.47 I 1 1 ^ IR (v cm-1) 〇CBr) I 1749,1719 • 1331,11.65 _I 1730,1693 1349,1173 CO 0 CJ) t〇Tr ™ ▼ — oV OJ 〇h- C3 T— T ™ 1718,1601 1385,1162 1719,130¾ 1162 9 1696,1348 1171 1698 , 1344 1168 CO CO CO CD BU— * Is · »T— 10 CJ N CO Melting point (decomposition i! Ltt.pt. (* C) 195-196 • 205-207; 1 _1 204-207 190 decomp. I ί 195-197 j 227-228 204-207 203-205 * P3 Pi P4 Pi w h3c〇-〇-^^-h3coh ^ -n.n &lt; ^^ Ηο-Ο-ζ ^ Ο- h3c〇-〇 - ^ &gt; 0-0 &amp; Lch2-! CH3CH2 (Chb) CHCH3CH2 (CK3) CH * (CH3) 2CH- (CH3) 2CH- (CH3) 2〇H- (CH3) 3c-OCicH, Example NO. 〇C) Cl «—4 CJ ίΊ OJ CO OJ" 4 tfi Cl CM UD C ^ J CM 93- 200403216 1 ± 4 Table

ml) hooo^hnnosoo: 一2 元索分析 I C23H18F3N5O4S Calc. C:53.38 H:3.51 R11.01 N:13.53 S:6.20 Foun.C:53,11 H:3.55 F:10.B9 N:13.66 S:6.31 Calc. C:52.67 H:3.78 N:16.73 S:6.39 Foun.C:52.73 H:3.92 N:16,53 S:6.55 C22H18FN5〇4S*0.2H2〇 Calc. C:56.09 H:3.94 R4.03 N:14.87 8:6.81 Foun.C:56.10 H:4.09 F:4.12 N:14.84 S:7.08 C22H18CiN5O4S*0.6H2O Calc. C:53.41 H:3.91 Cl:7.17 N:14.16 S:6.48 F〇un.C:53.33 H:3.90 Cl:7.22 N:14.19 S:6.68 ^23^21 N5〇4S*1.2H2〇 Calc. C:56.94 H:4.86 N: 14.44 3:6.61 Foun.C:56.88 H:4.49 N: 14.31 S:6.72 ^23^21 ·7Η2〇 Calc. C:54.15 H:4.82 N:13.73 S:6.29 F〇un.C:54.05 H:4.35 N: 13.60 S:6.77 18^6〇4^·〇.8Η2〇 Calc. C:56.50 H:4.04 N:17/.9 S:6.56 Foun.C:56.52 Η:4·16 N:17.C0 S:6.52 [ i) IR(v cm-l) (KBr) in CVJ n 寸to Nr-r- y— 1738,1707 1328,1169 1730,1597 1345,1161 1730,1509 1236,1165 CO寸 O) CO ΤΓ r- T- r— 0 co&quot; CO寸 卜· CO N CO 〇 O) h- f^· «Ο CQ v-y- &quot;v cJ σΓιη r&gt; o寸 h- in o r- r- N- CO &lt;Ji CD &lt;0 π 巧 CO寸 卜CO 1731,1605 1336,1160 融點(分解製 m.ptCC) 197-199 197-198 190-191 205-207 !_ 204-206 226-227 214-216 190-192 * Pi 04 Pi .L Φ 〇 ιΓ 02nhQ^n&quot;n3hQ- i F普^Ο&quot; H3C〇-〇-^/^ ct: Qkch2- 〇&gt;~CH2· I €^-ch2- ο ό 0~CH2- G^ch2- o 6 實施例 No. 〇〇 CM Cl 0 CI 0 ro CO CM cn 01 CO CO Cl 2 34 in Γ0 C^J -94- 200403216 表4 2 筲一) ΗΟΟο^ΗΝ&lt;\ιοω&lt;ησ: cc 元素分祈 C26H27N504S Calc. C:61.77 H:5.3B N:13.85 8:6.34 Foun.C:61.59 H:5.45 N:13.89 S:6.27 C28H29N5O4S ·0.3Η2〇 Calc. 0:62.62 H:5.56 N:13.04 S:5.97 F〇un.C:62.46 H:5.52 N:13,43 S;6.28 1 I C24H|9BrN5〇4S*1.7H2O Calc. C:48.20 H:3.78 Br:13.36 N:14.05 S:5.36 Foun.C:48.27 H:3.75 Br:13.16 N:14.11 S:5.38 Calc. C:58.49 Η:4.56 Ν: 16.37 S:6.25 F〇un.C:58.52 Η:4.69 Ν:16.71 S:5.90 Ci9H2iN5〇4S*0.8H2O Calc. C:53.09 H:5;30 N: 16.29 S:7.46 F〇un.C:53.20 H:5.14 N:16.06 S;7.70 CiaHt8FN5〇4S*0.2H2〇 Calc. C:51.11 H:4.38 F:4.49 N: 16.55 S:7.5S Foun.C:50.90 H:4.37 F:4.89 N: 16.28 S:7.46 含芝· :己昆 g 1738,1328 1314,1149 I Cvl CO Ί-卜 ΙΟ t- K- CO CVJ S CO T— r— cocn 0 10 l〇 r-▼— rCcvT CO寸 to 04 [ 1713,1514 ;1341,1159 ί CO T- CVJ , &lt;2 寸*'〇·〇&gt; 寸 &lt;35 ΙΟ n呀 T- . 1718,1685 1334,1170 1716,1346 1165 (D才 CM CO CO &lt;£3l〇 0¾ 寸 r- in 卜卜” r— ί— 融點(分解si m,pt.CC) 224-226 225-227 182-184 226-228 205-207 ! 199-201 206-207 208-209 · * P5 &gt; 30 oc ϊίζ ω g Φ § ί 1、·ζ 乙·2 Φ CD .ί $ Γ-二 2 Φ 2*2: Φ LL 0&quot;叫 I ....................................... _一| ί ό ^TJ Ο r= χζ ο 丨 tflCH2· I (CH3)2CH- ί (CH3)2CH- S . 〇 « Z &lt;Ώ CO 卜 CO 〇〇 n CVJ Ο) CO CVJ ο -τ -τ / c^j *T 0】 n -r 7&gt;1ml) hooo ^ hnnosoo: a 2-element cable analysis I C23H18F3N5O4S Calc. C: 53.38 H: 3.51 R11.01 N: 13.53 S: 6.20 Foun.C: 53,11 H: 3.55 F: 10.B9 N: 13.66 S: 6.31 Calc. C: 52.67 H: 3.78 N: 16.73 S: 6.39 Foun.C: 52.73 H: 3.92 N: 16,53 S: 6.55 C22H18FN5〇4S * 0.2H2 Calc. C: 56.09 H: 3.94 R4.03 N : 14.87 8: 6.81 Foun.C: 56.10 H: 4.09 F: 4.12 N: 14.84 S: 7.08 C22H18CiN5O4S * 0.6H2O Calc. C: 53.41 H: 3.91 Cl: 7.17 N: 14.16 S: 6.48 F〇un.C: 53.33 H: 3.90 Cl: 7.22 N: 14.19 S: 6.68 ^ 23 ^ 21 N5〇4S * 1.2H2〇Calc. C: 56.94 H: 4.86 N: 14.44 3: 6.61 Foun.C: 56.88 H: 4.49 N: 14.31 S: 6.72 ^ 23 ^ 21 · 7Η2〇Calc. C: 54.15 H: 4.82 N: 13.73 S: 6.29 F〇un.C: 54.05 H: 4.35 N: 13.60 S: 6.77 18 ^ 6〇4 ^ · 〇.8Η2〇Calc . C: 56.50 H: 4.04 N: 17 / .9 S: 6.56 Foun.C: 56.52 Η: 4 · 16 N: 17.C0 S: 6.52 [i) IR (v cm-l) (KBr) in CVJ n Inch to Nr-r- y— 1738,1707 1328,1169 1730,1597 1345,1161 1730,1509 1236,1165 CO inch O) CO ΤΓ r- T- r— 0 co &quot; CO inch BU · CO N CO 〇O ) h- f ^ · «Ο CQ vy- &quot; v cJ σΓιη r &gt; o inch h- in o r- r- N- CO &lt; Ji CD &lt; 0 π Qiao CO inch Bu CO 1731,1605 1336,1160 Melting point (decomposition system m.ptCC) 197-199 197-198 190-191 205-207! _ 204-206 226-227 214 -216 190-192 * Pi 04 Pi .L Φ 〇ιΓ 02nhQ ^ n &quot; n3hQ- i F 普 ^ 〇 &quot; H3C〇-〇-^ / ^ ct: Qkch2- 〇 &gt; ~ CH2 · I € ^ -ch2- ο ό 0 ~ CH2- G ^ ch2- o 6 Example No. 〇〇CMCl 0 CI 0 ro CO CM cn 01 CO CO Cl 2 34 in Γ0 C ^ J -94- 200403216 Table 4 2 筲 一) ΗΟΟο ^ ΗΝ &lt; \ ιοω &lt; ησ: cc elemental element C26H27N504S Calc. C: 61.77 H: 5.3BN: 13.85 8: 6.34 Foun.C: 61.59 H: 5.45 N: 13.89 S: 6.27 C28H29N5O4S 0.3.20Calc. 0: 62.62 H: 5.56 N: 13.04 S: 5.97 Foun. C: 62.46 H: 5.52 N: 13,43 S; 6.28 1 I C24H | 9BrN5〇4S * 1.7H2O Calc. C: 48.20 H: 3.78 Br: 13.36 N: 14.05 S: 5.36 Foun.C: 48.27 H: 3.75 Br: 13.16 N: 14.11 S: 5.38 Calc. C: 58.49 Η: 4.56 Ν: 16.37 S: 6.25 F〇un.C: 58.52 Η: 4.69 Ν: 16.71 S: 5.90 Ci9H2iN5〇4S * 0.8H2O Calc. C: 53.09 H: 5; 30 N: 16.29 S: 7.46 F.un.C: 53.20 H: 5.14 N: 16.06 S; 7.70 CiaHt8FN504S * 0.2H2.Calc C: 51.11 H: 4.38 F: 4.49 N: 16.55 S: 7.5S Foun.C: 50.90 H: 4.37 F: 4.89 N: 16.28 S: 7.46 Including Chi: Ji Kun g 1738,1328 1314,1149 I Cvl CO Ί- 卜 ΙΟ t- K- CO CVJ S CO T— r— cocn 0 10 l〇r- ▼ — rCcvT CO inch to 04 [1713,1514; 1341,1159 ί CO T- CVJ, &lt; 2 inch * ' 〇 · 〇 &gt; Inch &lt; 35 ΙΟ n 呀 T-. 1718,1685 1334,1170 1716,1346 1165 (CM CO CO &lt; £ 3l〇0¾ inch r-in bu bu r "ί— melting point (Decomposition si m, pt.CC) 224-226 225-227 182-184 226-228 205-207! 199-201 206-207 208-209 · * P5 &gt; 30 oc ϊίζ ω g Φ § ί Ι, · ζ B · 2 Φ CD .ί $ Γ- 二 2 Φ 2 * 2: Φ LL 0 &quot; called I ............... ............. _ 一 | ό ^ TJ Ο r = χζ ο 丨 tflCH2 · I (CH3) 2CH- ί (CH3) 2CH- S. 〇 «Z &lt; Ώ CO 卜CO 〇〇n CVJ Ο) CO CVJ ο -τ -τ / c ^ j * T 0] n -r 7 &gt; 1

-95- 200403216 4 M XOOO/VX5W.SC 表 ί 元素分析 1 C^gH2tN5〇4S2*1.1 HgO Cala C:48.83 H:5.00 N: 14.99 S:13.72 Foun.C:49.13 H:5.25 N:14.55 S;13.34 C23H21 Ν5〇々2·〇.2Η2〇 Calc. C:55.34 H:4.32 N: 14.03 S: 12.85 Foun.C:55.37 H:4.35 ΝΠ4.00 S:12.86 C25H22N6O4S2· 1.1H2O Calc. C:54.16 H:4.40 N: 15.16 S: 11.57 Foun.C:54.20 H:4.66 N: 15.09 S:11.62 ! Ct8Ht6N6〇4S-0.4H2〇 Calc. C:51.52 H:4.04 N:20.03 S;7.64 1 Foun.C:51.34 H:3.96 N:19.76 S:8.02 I 1 1 1 W IR(v cm-1) 丨(KBr) 1696,1348 1171 CO 5 T— cS to CM CO 卜T-T— t— 1753,1497 1325,1165 ㈡ &lt;D C〇 CO 100 r- 〇&gt; N, 卜寸产 t— r- τ— 0 n co to TT r-t— r- CO N σ&gt; cm &lt;0 co I 1 1 融點(分解ϋ nx.pt· (C) 223-225 194-195 _I 222-224 213-216 i &gt;220 ί I 1 • 1 * P4 Pi Pi 1¾ ¢5 » Di $ 〇 h3cs^X〇- H3〇s^=^- ! H3〇s-〇-n^ N=N /=\ οΗο-Ο-ζ^ (CH3)2CH- (CH3)2CH- &lt;C^cHr o /= X2 Q ο 工2 Ο Q»ch2· Q~ch2. ^ca 〇 0 實施例 No. in •r rj ’JD T 卜 -r 00 吖 σ&gt; CV3 0 to CNJ «-4 ΙΛ tvj-95- 200403216 4 M XOOO / VX5W.SC Table Element Analysis 1 C ^ gH2tN5〇4S2 * 1.1 HgO Cala C: 48.83 H: 5.00 N: 14.99 S: 13.72 Foun.C: 49.13 H: 5.25 N: 14.55 S; 13.34 C23H21 Ν5〇々2 · 〇.2Η2〇Calc. C: 55.34 H: 4.32 N: 14.03 S: 12.85 Foun.C: 55.37 H: 4.35 ΝΠ4.00 S: 12.86 C25H22N6O4S2 · 1.1H2O Calc. C: 54.16 H: 4.40 N: 15.16 S: 11.57 Foun.C: 54.20 H: 4.66 N: 15.09 S: 11.62! Ct8Ht6N6〇4S-0.4H2 Calc. C: 51.52 H: 4.04 N: 20.03 S; 7.64 1 Foun.C: 51.34 H : 3.96 N: 19.76 S: 8.02 I 1 1 1 W IR (v cm-1) (KBr) 1696,1348 1171 CO 5 T— cS to CM CO TT— t— 1753,1497 1325,1165 ㈡ &lt; DC〇CO 100 r- 〇 &gt; N, Bu t t- r- τ- 0 n co to TT rt- r- CO N σ &gt; cm &lt; 0 co I 1 1 Melting point (decomposition ϋ nx.pt · (C) 223-225 194-195 _I 222-224 213-216 i &gt; 220 ί I 1 • 1 * P4 Pi Pi 1¾ ¢ 5 »Di $ 〇h3cs ^ X〇- H3〇s ^ = ^-! H3 〇s-〇-n ^ N = N / = \ οΗο-Ο-ζ ^ (CH3) 2CH- (CH3) 2CH- &lt; C ^ cHr o / = X2 Q ο Worker 2 Ο Q »ch2 · Q ~ ch2 ^ ca 〇0 Example No. in • r rj ’JD T BU -r 00 acryl σ &gt; CV3 0 to CNJ« -4 ΙΛ tvj

-96- 200403216 實施例2 5 2 仿實施例 265 157合成表44〜45之化合物。-96- 200403216 Example 2 5 2 Example 265 157 The compounds of Tables 44 to 45 were synthesized.

-97- 200403216 表44-97- 200403216 Table 44

α〇 ώ 0.96(d.J=6.6H2,3H) 1.01(d,6.aHz.3H) 2.87(s.3H) 4.17{d.J=10.4Hz,1H) 0.71(d.J=6.6Hz,3H) 0.88(d.6.4Hz,3H) 2.88(s,3H) 3.48(d,J=10.8Hz,1H) 0,55(d.J=6.8Hz,3H} 0.82(d,a6Hzt3H) 3.74(s.3H) 0.91(dfJ=5.6Hz.6H) 1.52-1.69^,4^ 3.84(d.J=10.4Hz,1H) 0.95(dJ=6.6Hz,3H) 0.97(d.6.8H2.3H} 2.89(s.3H) 4.20(0 .J=10.6Hz,1H) 0.92:2.J=6.6Hz,3H) 0.97··3,6.6Ηζ,3Η) 2.84iSt3H) 4.73ilJ=7.4Hz.1H) 2·78{ϋ=13.8·7·2Ηζ·1Η} 3.14(d.a..=14.8,7.4Hz,1H) 4.43(d,J^:6.4HztlH) 4.6a(dtJ=:6.4Hz,1H) 0·96(〇υ=6·4Η2:,:3Η) 0.97(d.^6.4Hz,3H) 2.52(s.2H),2.93(st3H) IR(v cra-1) (KBr) 1715,1583 1340,1151 3323,1678 1328,1150 I 寸σ&gt; CO寸 CD T- r— T- 寸·〇· ^ CM CO C〇 C3 -r- 3700-2200br 1681,1319 1212 3300-2400br 1711,1336 1185 3300-2400br 1719,1340 1153 3640_2400br 1736,1717 1694,1346 1162 3284br,1745 1714,1323 1131 融點(分解點) *· m-pt.(*C) 1 110-111 _i 148-150 I 206-207 132-132.5 1 141-144 * (si, Pi Ο Μ Οί -C00H -CONHOH -CONHOH -C00H -COOH -COOH -COOH -COOH σ&gt; Oi 3? 〇 I? o &lt;〇HCHr t •(ch2)4nh2 〇 -ch3 -ch3 90 α QrOr 1 QrO· 爷、.2 6 $ 22 ό H3CS-Q-i&gt; (CH3)2CH- (CH3)2CH- _ _ . __ \ (ch3)2ch- I (CH3)2〇H- (CH3)2CH- (CH3)2CHCHr · {CH3)2CH- 實施例 No. 03 m CO tn or 1 \n o\ tn m \n C\) X? IO cr&gt; »n -98- 200403216 表45α〇ώ 0.96 (dJ = 6.6H2,3H) 1.01 (d, 6.aHz.3H) 2.87 (s.3H) 4.17 (dJ = 10.4Hz, 1H) 0.71 (dJ = 6.6Hz, 3H) 0.88 (d. 6.4Hz, 3H) 2.88 (s, 3H) 3.48 (d, J = 10.8Hz, 1H) 0,55 (dJ = 6.8Hz, 3H) 0.82 (d, a6Hzt3H) 3.74 (s.3H) 0.91 (dfJ = 5.6 Hz.6H) 1.52-1.69 ^, 4 ^ 3.84 (dJ = 10.4Hz, 1H) 0.95 (dJ = 6.6Hz, 3H) 0.97 (d.6.8H2.3H) 2.89 (s.3H) 4.20 (0 .J = 10.6Hz, 1H) 0.92: 2.J = 6.6Hz, 3H) 0.97 ·· 3,6.6Ηζ, 3Η) 2.84iSt3H) 4.73ilJ = 7.4Hz.1H) 2.78 (ϋ = 13.8 · 7 · 2Ηζ · 1Η } 3.14 (da. = 14.8,7.4Hz, 1H) 4.43 (d, J ^: 6.4HztlH) 4.6a (dtJ =: 6.4Hz, 1H) 0 · 96 (〇υ = 6.4 · 4Η2:,: 3Η) 0.97 (d. ^ 6.4Hz, 3H) 2.52 (s.2H), 2.93 (st3H) IR (v cra-1) (KBr) 1715,1583 1340,1151 3323,1678 1328,1150 I inch σ &gt; CO inch CD T -r— T- inch · 〇 · ^ CM CO C〇C3 -r- 3700-2200br 1681,1319 1212 3300-2400br 1711,1336 1185 3300-2400br 1719,1340 1153 3640_2400br 1736,1717 1694,1346 1162 3284br, 1745 1714,1323 1131 Melting point (decomposition point) * · m-pt. (* C) 1 110-111 _i 148-150 I 206-207 132-132.5 1 141-144 * (si, Pi Ο Μ Οί -C00H- CONHOH -CONHOH -C00H -COOH -COOH -COOH -COOH σ &gt; Oi 3? 〇I? O &lt; 〇HCHr t • (ch2) 4nh2 〇-ch3 -ch3 90 α QrOr 1 QrO ·. 2 6 $ 22 ό H3CS-Q-i &gt; (CH3) 2CH- (CH3) 2CH- _ _. __ \ (ch3) 2ch- I (CH3) 2〇H- (CH3) 2CH- (CH3) 2CHCHr · (CH3) 2CH- Example No. 03 m CO tn or 1 \ no \ tn m \ n C \) X? IO cr &gt; »n -98- 200403216 Table 45

-99- 200403216 實施例2 6 7 仿實施例9 2合成表4 6之化合物。-99- 200403216 Example 2 6 7 The compound of Table 4 6 was synthesized as in Example 9 2.

100- 200403216 6 4 表 II) 8^ G: Ή-ΝΜΚ(&lt;5 ppm) d^.DMSO 2.62(dd,J=8.4l13.5H2i1H)l2.80{ddl J=6.0l13.5Hz,1H)l3.82{dddlJ=6.0, 8,4,8^2,1 H),8.38(d,J=8.7HzJH) 2.73(ddlJ=59.3,13.6HzJH),2.96(dd, J=5.4,13.5Hz, 1H) ,3.92(dt, J?5.4, 9.3Hz, 1H),8.42 (d,J=9.3Hzf1 H) 1 丨 IR(vcm-l) (KBr) 3700-2400brt3267, 2217,1671,1321,1161 2200-3700brt3430, 3292,1728,1324,1162 融點(分解點1 _i 156-158 176-178 * 〇 一CONHOH -COOH «0 Q-O- Qr^y 實施例1 No. 1 N •Ώ 卜 Ol 200403216 下面列示本發明化合物之實驗例,其中被驗化合物與 表中所用者對應。 實驗例 (l)MMP-9(92kDa,明膠酶B)之單離及精製 參照下列文獻來精製IV型膠原酶(MMP-9)。100- 200403216 6 4 Table II) 8 ^ G: Ή-NMK (&lt; 5 ppm) d ^ .DMSO 2.62 (dd, J = 8.4l13.5H2i1H) l2.80 (ddl J = 6.0l13.5Hz, 1H) l3.82 (dddlJ = 6.0, 8,4,8 ^ 2,1 H), 8.38 (d, J = 8.7HzJH) 2.73 (ddlJ = 59.3,13.6HzJH), 2.96 (dd, J = 5.4,13.5Hz, 1H), 3.92 (dt, J? 5.4, 9.3Hz, 1H), 8.42 (d, J = 9.3Hzf1 H) 1 丨 IR (vcm-l) (KBr) 3700-2400brt3267, 2217,1671,1321,1161 2200 -3700brt3430, 3292,1728,1324,1162 Melting point (decomposition point 1 _i 156-158 176-178 * 〇 one CONHOH -COOH «0 QO- Qr ^ y Example 1 No. 1 N • Ώ Ol 200403216 below Experimental examples of the compounds of the present invention are shown, in which the test compounds correspond to those used in the table. Experimental Example (1) Isolation and purification of MMP-9 (92 kDa, gelatinase B) Refer to the following documents to purify type IV collagenase (MMP -9).

Scott M. Wilhelm et al5 J. Biol. Chem.,264,17213-17221,Scott M. Wilhelm et al5 J. Biol. Chem., 264, 17213-17221,

( 1 9 8 9) SV4 0-transformed Human Lung Fibroblasts Secrete a 92-kDa Type IV Collagenase Which Is Identical to That Secreted by Normal Human Macrophages; Yasunori Okada et al. J. Biol. Chem.5 267, 2 1 7 1 2-2 1 7 1 9, ( 1 992) Matrix Metalloproteinase 9 (92-kDa Gelatinase/TypelV Collagenase) from HT 1 0 8 0 Human(1 9 8 9) SV4 0-transformed Human Lung Fibroblasts Secrete a 92-kDa Type IV Collagenase Which Is Identical to That Secreted by Normal Human Macrophages; Yasunori Okada et al. J. Biol. Chem. 5 267, 2 1 7 1 2-2 1 7 1 9, (1 992) Matrix Metalloproteinase 9 (92-kDa Gelatinase / TypelV Collagenase) from HT 1 0 8 0 Human

Fibrosarcoma Cells; Robin V. Ward et al, Biochem. J.5 ( 1 99 1 ) 278,1 7 9 - 1 8 7 The purification of tissue inhibitor of metalloproteinase-2 from its 7 2 k D a progelatinase complex . MMP-9乃將人纖維織母細胞瘤ATCCHT1080採以12-十四醯?11()1*11七〇1-13-乙酸酯(丁?八)刺激而分泌在培養液 中。此培養液中依明膠-酶譜法(HidekazuTanakaetal., (1993) Biochem. Biophys. Res. Commun” 1 9 0 7 3 2-740, 小白鼠之105-kDa明膠酶cDNA之分子選殖及表現)確認 MMP-9之產生。將此HT1 080株之培養上淸液濃縮,而 以明膠Sephalose 4B,伴刀豆球蛋白A(concanavalinFibrosarcoma Cells; Robin V. Ward et al, Biochem. J.5 (1 99 1) 278, 1 7 9-1 8 7 The purification of tissue inhibitor of metalloproteinase-2 from its 7 2 k D a progelatinase complex. MMP- 9 is to take human fibroblastoma ATCCHT1080 as 12-fourteen? 11 () 1 * 11 hex-1-1-3 acetate (D? 8) was stimulated and secreted in the culture medium. Gelatin-zymogram method (Hidekazu Tanakaetal., (1993) Biochem. Biophys. Res. Commun "1 9 0 7 3 2-740, molecular colonization and expression of 105-kDa gelatinase cDNA in mice) The production of MMP-9 was confirmed. The culture supernatant of this HT1 080 strain was concentrated, and gelatin Sephalose 4B with concanavalin A (concanavalin

102- 200403216 A)Sephalose 及 Sephacryl S-200 精製。此精製之 pr〇-MMP-9(92kDa,膠原酶B)在膠原-酶譜法呈單一活性帶 。次以胰蛋白酶進行活性化,得活性型MMP-9。 (2) IV型膠原酶阻礙劑分析法 膠原酶乃用前述MMP-9,基質及測定組套乃用Yagai 公司之IV型膠原酶活性測定組套,分析法乃依Yagai 公司之處方。阻礙劑之分析乃就1化合物(阻礙劑)進行 如下4分析。 (A) 基質(IV型膠原酶),酵素(MMP-9),阻礙劑, (B) 基質(IV型膠原酶),阻礙劑, (C) 基質(IV型膠原酶),酵素(MMP-9), (D) 基質(IV型膠原酶)。 各依Yagai公司之分析法測定螢光強度,而依下式求 出阻礙(%)。 阻礙(%)={1-(A-B)/(C-D)} X 100 IC5Q乃示阻礙爲50%之濃度。結果如表47〜54。 200403216 表47 實施例No, 化合物No. I C50 (/zM) 化合物No. I Cs〇 (uU) 1 la-1-1 0.2 4 lb-1-1 0. 0 3 0 2 la-1-2 2. 6 lb*l-2 0. 04 3 la-1-3 0.18 lb-1-3 0.005 4 la-1-4 2.2 5 5 la-1-5 0· 8 1 lb-1-5 0.041 6 la· 1-6 0.6 8 lb-1-6 0.034 7 lb-1-7 0.028 8 la· 1-8 .2, 0 lb-1-8 2.0 9 lb«X-9 *0. 4 1 10 lb-MO 2· 1 11 lb-Ml 1. 7 12 lb-1-12 0* 0 8 .5 13 lb-1-13 0. 3 8 14 la-1-14 3. 7 lb-1-14 0. 11 15 lb-1-15 0.027 1 6 la-M6 0.520 lb·1-16 0. 0 10 8 17 la-1-17 0.205 lb-1-17 0· 0203 18 la-1-18 0.500 lb-1-18 0. 0 2 8 2 2 0 lb-1-20 0.134 2 1 la小21 4.6 5 lb-1-21 0. 0 0 4 1 2 3 lb-1-23 0.073 2 4 lb-1-24 0. 2 2 6 lb-1-26 1. 3 2 7 lb-1-27 3. 0 3 0 la-1-30 1.16 lb'1-30 0.213 3 1 lb-1-31 0. 0 12 9102- 200403216 A) Refined by Sephalose and Sephacryl S-200. The purified prO-MMP-9 (92 kDa, collagenase B) showed a single active band in the collagen-zyme method. Activated with trypsin twice to obtain active MMP-9. (2) Analytical method for type IV collagenase inhibitors The collagenase is made of the aforementioned MMP-9, and the matrix and measurement kit are made of Yagai's type IV collagenase activity measurement kit. The analysis method is according to the method of Yagai. The analysis of the inhibitor is based on the analysis of 1 compound (the inhibitor) as follows. (A) Matrix (type IV collagenase), enzyme (MMP-9), inhibitor, (B) Matrix (type IV collagenase), inhibitor, (C) Matrix (type IV collagenase), enzyme (MMP- 9), (D) Matrix (type IV collagenase). The fluorescence intensity was measured according to the analysis method of Yagai Co., and the obstruction (%) was determined by the following formula. Obstruction (%) = {1- (A-B) / (C-D)} X 100 IC5Q indicates that the concentration is 50%. The results are shown in Tables 47 to 54. 200403216 Table 47 Example No. Compound No. I C50 (/ zM) Compound No. I Cs〇 (uU) 1 la-1-1 0.2 4 lb-1-1 0. 0 3 0 2 la-1-2 2 6 lb * l-2 0. 04 3 la-1-3 0.18 lb-1-3 0.005 4 la-1-4 2.2 5 5 la-1-5 0 · 8 1 lb-1-5 0.041 6 la · 1-6 0.6 8 lb-1-6 0.034 7 lb-1-7 0.028 8 la · 1-8 .2, 0 lb-1-8 2.0 9 lb «X-9 * 0. 4 1 10 lb-MO 2 1 11 lb-Ml 1. 7 12 lb-1-12 0 * 0 8 .5 13 lb-1-13 0. 3 8 14 la-1-14 3. 7 lb-1-14 0. 11 15 lb -1-15 0.027 1 6 la-M6 0.520 lb · 1-16 0. 0 10 8 17 la-1-17 0.205 lb-1-17 0 · 0203 18 la-1-18 0.500 lb-1-18 0. 0 2 8 2 2 0 lb-1-20 0.134 2 1 la small 21 4.6 5 lb-1-21 0. 0 0 4 1 2 3 lb-1-23 0.073 2 4 lb-1-24 0. 2 2 6 lb-1-26 1. 3 2 7 lb-1-27 3. 0 3 0 la-1-30 1.16 lb'1-30 0.213 3 1 lb-1-31 0. 0 12 9

-104- 200403216-104- 200403216

表4 8 實施例No. 化合物No. I C§9 (/λΜ) 化合物No. I C50 (uM) 3 3 la-1-33 0. 2 4 lb-1-33 0. 0 0 5 3 5 la· 1-35 2. 6 lb-1-35 0. 0 2 16 3 8 la· 1-38 0. 0 18 4 0 la· 1-40 0. 0 7 6 4 1 la-1-41 0. 3 1.2 4 2 ’la· 1-42 0, 0 12 3 4 3 la· 1-43 0. 6 2 5 44 la-1-44 1.910 4 5 la-1-45 0. 0 4 0’ 4 6 la-1-46 1. 12 4 7 la-1-47 0. 3 8 9· 4 8 la-1-48 1· 15 、 4 9 la-1-49 0. 2 4 9 5 0 la-1-50 0. 5 5 3 5 1 la-1-51 0, 110 5 2 la-1-52 0. 3&gt;2 9 5 3 la-1-53 1. 8 5 4 la-1-54 0. 0 7 5 5 5 la-1-55 0. 0 3 9 8 6 0 la-1-60 1· 3 1 lb-l-60 0. 0 0 12 6 1 la-1-61 0. 2 4 7 lb-1-61 0.247 6 2 lb-1-62 3.5 0 6 3 ~ la-1-63 1· 0 5 lb-1-63 0. 0 0 0 3 9 6 4 la-1-64 1. 9 0 lb-1-64 0. 0 0 3 7 6 5 la· 1-65 • 0‘ 2 9 1 lb-1-65 0,0 0 3 5 105- 200403216 表4 9 實施例No/ 化合物No. I c50 (uU) 化合物No. I Cs〇 (uU) 6 7 la-1-67 lb-l.Gi 0,0 0 6 1 6 8 la-1-68 0.231 8 0 la* 1-80 1.9 1 8 3 la-1-83 1· 7 7 8 5 la-1-85 1. 2 lb-1-85 0.013 8 6 la-1-86 0.3 5 lb-1-86 0. 0 0 5 3 8 7 lb-1-87 0.940 9 3 la-2-2 0· 2 3 7 9 4 la-2-3 0. 0 10 9 9 5 la-2.4 0. 0 7 5 9 9 6 la-2-5 0.123 9 7 la-2-6 0.088 9 8 la-2-7 0. 0 6 9 9 10 0 la-2-9 0. 0 5 7 7 10 1 la-2-10 0.023 10 2 la-2-11 0. 0 4 7 5 10 3 la-2· 12 0. 0 9 8 1 10 4 la-2-13 3.2 8 10 5 la-2-14 2,9 8 10 6 la-2-15 0. 13 3 10 7 la-2-16 0.325 10 9 la-2-18 . 1.19 110 la-2-19 0.203 111 1e*2*20 3. 4 1 112 la-2-21 3.7 4 114 la-2-23 0.929Table 4 8 Example No. Compound No. IC§9 (/ λM) Compound No. I C50 (uM) 3 3 la-1-33 0. 2 4 lb-1-33 0. 0 0 5 3 5 la · 1-35 2. 6 lb-1-35 0. 0 2 16 3 8 la · 1-38 0. 0 18 4 0 la · 1-40 0. 0 7 6 4 1 la-1-41 0. 3 1.2 4 2 'la · 1-42 0, 0 12 3 4 3 la · 1-43 0. 6 2 5 44 la-1-44 1.910 4 5 la-1-45 0. 0 4 0' 4 6 la-1 -46 1. 12 4 7 la-1-47 0. 3 8 9 · 4 8 la-1-48 1 · 15, 4 9 la-1-49 0. 2 4 9 5 0 la-1-50 0. 5 5 3 5 1 la-1-51 0, 110 5 2 la-1-52 0. 3 &gt; 2 9 5 3 la-1-53 1. 8 5 4 la-1-54 0. 0 7 5 5 5 la-1-55 0. 0 3 9 8 6 0 la-1-60 1 · 3 1 lb-l-60 0. 0 0 12 6 1 la-1-61 0. 2 4 7 lb-1-61 0.247 6 2 lb-1-62 3.5 0 6 3 ~ la-1-63 1 · 0 5 lb-1-63 0. 0 0 0 3 9 6 4 la-1-64 1. 9 0 lb-1-64 0 0 0 3 7 6 5 la · 1-65 • 0 '2 9 1 lb-1-65 0, 0 0 3 5 105- 200403216 Table 4 9 Example No./ Compound No. I c50 (uU) Compound No. I Cs〇 (uU) 6 7 la-1-67 lb-l.Gi 0,0 0 6 1 6 8 la-1-68 0.231 8 0 la * 1-80 1.9 1 8 3 la-1-83 1 · 7 7 8 5 la-1-85 1. 2 lb-1 -85 0.013 8 6 la-1-86 0.3 5 lb-1-86 0. 0 0 5 3 8 7 lb-1-87 0.940 9 3 la-2-2 0 · 2 3 7 9 4 la-2-3 0. 0 10 9 9 5 la-2.4 0. 0 7 5 9 9 6 la-2-5 0.123 9 7 la-2-6 0.088 9 8 la-2-7 0. 0 6 9 9 10 0 la-2 -9 0. 0 5 7 7 10 1 la-2-10 0.023 10 2 la-2-11 0. 0 4 7 5 10 3 la-2 · 12 0. 0 9 8 1 10 4 la-2-13 3.2 8 10 5 la-2-14 2,9 8 10 6 la-2-15 0. 13 3 10 7 la-2-16 0.325 10 9 la-2-18. 1.19 110 la-2-19 0.203 111 1e * 2 * 20 3. 4 1 112 la-2-21 3.7 4 114 la-2-23 0.929

•106- 200403216 表5 Ο 實施例No· 化合物No. I Cso (/zM) 115 la-2-24 0. 16 1 117 13.-2*26 1.19 118 la-2-27 0.088 119 la-2-28 1.11 12 0 La-2-29 1.5 3 12 1 la-2-30 0. 0 7 3 6 12 2 la-2-31 0.224 12 3 la-2-32 0. 0 2 3 4 12 4 la-2-33 ,0 · 0 2 18 12 5 la-2-34 0. 0 144 12 6 σ. 1 5 6 12 7 1 18.-2*36 0.0 2 4 3 12 8 la-2-37 0. 0 9 2 2 12 9 la-2-38 0.222 16 0 la-3-2 0.040 16 1 1sl*3*3 0. 0 10 8 16 2 la-3-4 0. 8 7 3 16 3 la-3-5 0. 0 12 6 16 4 la-3-6 0· 0965 16 5 la-3-7 0.230 16 6 la-3-8 1. 28 16 7 la-3-9 • 0.014 16 8 la-3-10 0. 0 0 8 3 16 9 la-3-11 0.244 1 7 0 la-3-12 2· 0 3 17 1 la-3-13 0. 0 3 9 5 ~·.:4 i; ;ζ- 107- 200403216 表5 1 實施例No. 化合物Ν ο. I Cso (uM) 17 7 la-4-2 0,G 8 4 17 8 . la-4-3 0. 0 2 5 2 17 9 la-4-4 2.3 6 18 0 la-4-5 0.04 5 18 1 la-4-6 0. 0 5 3 9 18 2 la-4-7 0. 0 0 5 9 18 3 la-4-8 0. 0 0 2 7 18 4 la-4-9 0. 0 0 3 2 5 18 5 la-4-10 0,0 4 2 2 18 6 la-4-11 0. 0 9 8 2 18 7 la-4-12 0. 17 7 18 8 la-4-13 0. 8 4 3 18 9 la-4-14 0. 0 3 7 5 19 0 la-4-15 0. 0 5 9 7 19 1 la-4-16 0. 0 0 9 5 19 2 la-4-17 0.324 19 3 la-4-18 0.722 19 5 la-4-20 1. X 19 6 la-4-21 0. 0 5 7 3 19 7 la-4-22 0. 0161 19 8 la-4-23 0.493 19 9 la-4-24 2.0 6 2 0 0 la-4-25 0.173 2 0 1 la-4-26 0,252 2 0 2 la-4-27 0. 0 114 2 0 3 la-4-28 0.173• 106- 200403216 Table 5 〇 Example No. Compound No. I Cso (/ zM) 115 la-2-24 0. 16 1 117 13.-2 * 26 1.19 118 la-2-27 0.088 119 la-2- 28 1.11 12 0 La-2-29 1.5 3 12 1 la-2-30 0. 0 7 3 6 12 2 la-2-31 0.224 12 3 la-2-32 0. 0 2 3 4 12 4 la-2 -33, 0 · 0 2 18 12 5 la-2-34 0. 0 144 12 6 σ. 1 5 6 12 7 1 18.-2 * 36 0.0 2 4 3 12 8 la-2-37 0. 0 9 2 2 12 9 la-2-38 0.222 16 0 la-3-2 0.040 16 1 1sl * 3 * 3 0. 0 10 8 16 2 la-3-4 0. 8 7 3 16 3 la-3-5 0 0 12 6 16 4 la-3-6 0 · 0965 16 5 la-3-7 0.230 16 6 la-3-8 1. 28 16 7 la-3-9 • 0.014 16 8 la-3-10 0. 0 0 8 3 16 9 la-3-11 0.244 1 7 0 la-3-12 2 · 0 3 17 1 la-3-13 0. 0 3 9 5 ~ ·: 4 i;; ζ- 107- 200403216 Table 5 1 Example No. Compound No. I Cso (uM) 17 7 la-4-2 0, G 8 4 17 8. La-4-3 0. 0 2 5 2 17 9 la-4-4 2.3 6 18 0 la-4-5 0.04 5 18 1 la-4-6 0. 0 5 3 9 18 2 la-4-7 0. 0 0 5 9 18 3 la-4-8 0. 0 0 2 7 18 4 la-4-9 0. 0 0 3 2 5 18 5 la-4-10 0, 0 4 2 2 18 6 la-4-11 0. 0 9 8 2 18 7 la-4-12 0. 17 7 18 8 la-4-13 0. 8 4 3 18 9 la-4-14 0. 0 3 7 5 19 0 la-4-15 0. 0 5 9 7 19 1 la-4-16 0. 0 0 9 5 19 2 la-4-17 0.324 19 3 la -4-18 0.722 19 5 la-4-20 1. X 19 6 la-4-21 0. 0 5 7 3 19 7 la-4-22 0. 0161 19 8 la-4-23 0.493 19 9 la- 4-24 2.0 6 2 0 0 la-4-25 0.173 2 0 1 la-4-26 0,252 2 0 2 la-4-27 0. 0 114 2 0 3 la-4-28 0.173

-108- 200403216 表5 2 實施例No. 化合物Ν ο. ic5 0 (βΜ) 化合物No. I C5〇 (μΜ) 2 D 4 la-4-29 3.9 5 2 0 7 la-4-30 4. 44 2 10 lsi-5-2 0. 0 2 4 2 11 la-5-3 0. 2 10 lb-211 0. 0 0 5 6 5 2 12 la-5-4 0· 3 9 3 2 13 la-5-5 0, 12 8 2 14 ls.-5-6 0. 8 3 2 2 15 la-5-7 0. 1 1 0 2 16 0. 1 0 7 2 18 la-5-10 0· 7 4 4 2 19 la-5-11 0. 5 7 4 - 2 2 0 la-5-12 0. 0 16 7 s. 2 2 1 la-5-13 0. 3 1.6 2 2 2 la-5-14 0. 0 7 8 2 2 3 la-5· 15 0. 3 4 9 2 2 4 la· 1-16 0· 0Ί 0 1 2 2 5 la-5-17 0. 0 12 2 2 2 6 la-5-18 0. 16 6 2 2 7 la-5-19 0· 0 19 8 2 2 8 la-5-20 0. 10 6 2 2 9 la-5-21 0· 2 15 2 3 0 la-5-22 0. 2 8 1 2 3 1’ la-5-23 0, 19 7 2 3 2 la-5-24 0· 1 44 2 3 3 la-5-25 0. 0 8 6 4 2 3 4 la-5-26 0. 15 3 200403216 表5 3 實施例No. 化合物N ο. I C50 (μΜ): 化合物No. I C50 (/iM) 2 3 5 la-5-27 0.265 - 2 3 6 la-5-28 0.304 2 3 7 la-5-29 1.3 2 2 3 8 la-5-30 2.8 5 2 3 9 la-5-31 0. 2 4 3 2 4 0 la-5-32 0. 0 0 4 1 2 4 1 la-5-33 0· 0131 2 4 2 la-5-34 0. 0 2 3 9 2 4 3 la-5-35 0. 0 5 2 9 2 4 4 la-5-36 0. 0 16 5 2 4 5 la-5-37 0. 0 0 5 9 2 4 6 la-5-38 0. 0 10 8 2 4 7 la-5-39 0. 0 0 3 5 2 6 7 la-2-66 1. 5 lb-2-66 0.011-108- 200403216 Table 5 2 Example No. Compound N ο. Ic50 (βΜ) Compound No. I C50 (μΜ) 2 D 4 la-4-29 3.9 5 2 0 7 la-4-30 4. 44 2 10 lsi-5-2 0. 0 2 4 2 11 la-5-3 0. 2 10 lb-211 0. 0 0 5 6 5 2 12 la-5-4 0 · 3 9 3 2 13 la-5 -5 0, 12 8 2 14 ls.-5-6 0. 8 3 2 2 15 la-5-7 0. 1 1 0 2 16 0. 1 0 7 2 18 la-5-10 0 · 7 4 4 2 19 la-5-11 0. 5 7 4-2 2 0 la-5-12 0. 0 16 7 s. 2 2 1 la-5-13 0. 3 1.6 2 2 2 la-5-14 0. 0 7 8 2 2 3 la-5 · 15 0. 3 4 9 2 2 4 la · 1-16 0 · 0Ί 0 1 2 2 5 la-5-17 0. 0 12 2 2 2 6 la-5-18 0. 16 6 2 2 7 la-5-19 0 · 0 19 8 2 2 8 la-5-20 0. 10 6 2 2 9 la-5-21 0 · 2 15 2 3 0 la-5-22 0 . 2 8 1 2 3 1 'la-5-23 0, 19 7 2 3 2 la-5-24 0 · 1 44 2 3 3 la-5-25 0. 0 8 6 4 2 3 4 la-5- 26 0. 15 3 200403216 Table 5 3 Example No. Compound No. I C50 (μM): Compound No. I C50 (/ iM) 2 3 5 la-5-27 0.265-2 3 6 la-5-28 0.304 2 3 7 la-5-29 1.3 2 2 3 8 la-5-30 2.8 5 2 3 9 la-5-31 0. 2 4 3 2 4 0 la-5-32 0. 0 0 4 1 2 4 1 la-5-33 0 · 0131 2 4 2 la-5-34 0. 0 2 3 9 2 4 3 la-5-35 0. 0 5 2 9 2 4 4 la-5-36 0. 0 16 5 2 4 5 la-5-37 0. 0 0 5 9 2 4 6 la-5-38 0. 0 10 8 2 4 7 la-5-39 0. 0 0 3 5 2 6 7 la -2-66 1. 5 lb-2-66 0.011

表54 實施例No, 化合物No. ICS0 UM) 2 5 2 1-252 0. 2 4 2 5 3 1-253 0, 0 0 0 0 3 9 2 5 4 1-254 〇e 0 0 0 6 3 2 5 5 1-255 0.529 2 5 6 1-256 0.601 2 5 7 1-257 0.776 '258 1-258 0.908 2 5 9 1-259 0.130 2 6 0 1-260 0.159 2 6 1 1-260 0-182 γ·&lt;. ί^ν;. -110- 200403216 本發明化合物呈強力ιν型膠原酶阻礙活性。 產業上之利用可能性 本發明化合物具有強力金屬蛋白酶阻礙活性,尤其有 MMP阻礙活性,故可用以防治變形性關節症、關節風 濕、角膜潰瘍、牙周病、腫瘤之轉移或浸潤、病毒感染 症(如HIV感染症)之進行,閉塞性動脈硬化症、動脈硬 化性動脈瘤、粥狀動脈硬化症、再狹窄、敗血症、敗血 症休克、冠狀血栓症、異常血管新生、鞏膜炎、多發性 硬化症、開放角綠內障、視網膜症、增殖性視網膜症、 血管新生綠內障、翼狀皮膚、角膜炎、水泡性表皮剝離 、乾癖、糖尿病、腎炎、神經性疾病、牙齦炎、腫瘤增 殖、腫瘤血管新生、眼腫瘤、血管纖維腫、血管腫、熱 病·、出血、凝固、惡液質、食慾不振、急性感染症、休 克、自身免疫症、瘧疾、克隆病、髓膜炎及胃腸潰瘍。 實施例 實施例1 8Table 54 Example No, Compound No. ICS0 UM) 2 5 2 1-252 0. 2 4 2 5 3 1-253 0, 0 0 0 0 3 9 2 5 4 1-254 0e 0 0 6 3 2 5 5 1-255 0.529 2 5 6 1-256 0.601 2 5 7 1-257 0.776 '258 1-258 0.908 2 5 9 1-259 0.130 2 6 0 1-260 0.159 2 6 1 1-260 0-182 γ · <Ί ^ ν ;. -110- 200403216 The compound of the present invention exhibits a strong Iv-type collagenase inhibitory activity. INDUSTRIAL APPLICABILITY The compounds of the present invention have potent metalloproteinase inhibitory activity, especially MMP inhibitory activity, so they can be used to prevent deformable arthritis, joint rheumatism, corneal ulcer, periodontal disease, tumor metastasis or infiltration, and viral infection (Such as HIV infection), occlusive arteriosclerosis, atherosclerotic aneurysm, atherosclerosis, restenosis, sepsis, septic shock, coronary thrombosis, abnormal angiogenesis, scleritis, multiple sclerosis , Open-angle green cataract, retinopathy, proliferative retinopathy, angiogenic green cataract, pterygium, keratitis, vesicular epidermal peeling, dry addiction, diabetes, nephritis, neurological disease, gingivitis, tumor proliferation, Tumor angiogenesis, eye tumor, angiofibroma, hemangiomas, fever, bleeding, coagulation, cachexia, loss of appetite, acute infection, shock, autoimmune disease, malaria, clonal disease, meningitis, and gastrointestinal ulcer. Example Example 1 8

CONHOH 200403216 第1製程 化合物(XV-1 8)30 Omg之二氯甲烷4.5 ml懸浮液中加 雙(三甲基矽烷基)乙醯胺0.67ml攪拌20分後,加三乙 _ 胺〇.3 8ml攪拌5分後水冷而加聯苯基苯磺醯氯3 7 5 mg 之二氯甲烷1 · 5 m 1溶液,同溫3 0分…室溫4 · 5時間攪 拌後以2N-鹽酸作成酸性,以二氯甲烷萃取,水洗,以 硫酸鎂乾燥,減壓濃縮,從乙酸乙酯再結晶,得融點 208-211 °C 之化合物(Ia-18)339mg。產率 57.3%。 元素分析;C23HisN2F〇4S · 0.2H2O Φ 計算値 C;62.49 Η;4·42 Ν;6·34 F;4.30 S;7.25 実験値 C;62.38 Η;4·62 N;6,35 F;4.13 S;7.31 m NMR (&lt;5 ppm CDaOD): 3.10-3.30(m, 2H), 4.19(t, J=5.26 Hz, 1H), 6.82(m, 1H), 7.08- 7.22(m, 3H), 7.40-7.60(m, 7H), 7.70-7.78(m, 2H). 第2製程 化合物(Ia-18)250mg之四氫呋喃2.5ml溶液中在冰冷 氮大氣下攪拌加草醯氯0.074ml及30 % DMF/四氫呋喃 溶液1滴,在室溫攪拌3 0分來製備醯氯。另於羥胺鹽 酸鹽198ml之水2ml及四氫呋喃溶液2ml在冰冷攪拌 下加碳酸氫鈉28 7mg。攪拌5分後,以5分添加上述醯 氯之四氫呋喃溶液。在同溫攪拌3 0分後,加水1 5 ml, 以乙酸乙酯萃取,水洗,以硫酸鎂乾燥,減壓濃縮,在 矽膠柱層析(二氯甲烷/甲醇=9/1),以苯/甲醇凍乾,得 化合物(Ib-18)164mg。產率 63.3%。CONHOH 200403216 First process compound (XV-1 8) 30 Omg of dichloromethane 4.5 ml suspension was added with bis (trimethylsilyl) acetamidine 0.67 ml and stirred for 20 minutes, then triethylamine 0.3 8ml stirring for 5 minutes, water cooling and adding biphenylbenzenesulfonyl chloride 3 7 5 mg of dichloromethane 1 · 5 m 1 solution, 30 minutes at the same temperature ... room temperature 4 · 5 hours after stirring with 2N-hydrochloric acid It was extracted with dichloromethane, washed with water, dried over magnesium sulfate, concentrated under reduced pressure, and recrystallized from ethyl acetate to obtain 339 mg of the compound (Ia-18) with a melting point of 208-211 ° C. The yield was 57.3%. Elemental analysis; C23HisN2F〇4S · 0.2H2O Φ Calculate 値 C; 62.49 Η; 4.42 Ν; 6.34 F; 4.30 S; 7.25 実 験 値 C; 62.38 Η; 4.62 N; 6,35 F; 4.13 S ; 7.31 m NMR (&lt; 5 ppm CDaOD): 3.10-3.30 (m, 2H), 4.19 (t, J = 5.26 Hz, 1H), 6.82 (m, 1H), 7.08- 7.22 (m, 3H), 7.40 -7.60 (m, 7H), 7.70-7.78 (m, 2H). In a 2.5ml solution of 250 mg tetrahydrofuran of the second process compound (Ia-18), add 0.074ml of grasshopper chlorine and 30% DMF / in a cold nitrogen atmosphere. One drop of a tetrahydrofuran solution was stirred at room temperature for 30 minutes to prepare ammonium chloride. To 2 ml of 198 ml of hydroxylamine hydrochloride in water and 2 ml of tetrahydrofuran solution were added sodium bicarbonate 28 7 mg under ice-cooling stirring. After stirring for 5 minutes, the above tetrachlorofuran tetrahydrofuran solution was added in 5 minutes. After stirring at the same temperature for 30 minutes, 15 ml of water was added, extracted with ethyl acetate, washed with water, dried over magnesium sulfate, concentrated under reduced pressure, and subjected to silica gel column chromatography (dichloromethane / methanol = 9/1), followed by benzene. / Methanol lyophilized to obtain 164 mg of compound (Ib-18). The yield was 63.3%.

-112- 200403216 元素分析;C23H2〇N3F〇4S · 0.5H2〇 計算値 C;59,73 Η;4·58 Ν,·9·09 F;4.11 S;6.93 実験値 C;60.02 Η,·4·46 Ν;8·92 F;4.12 S;6.75 m NMR.((5 ppm deDMSO) :2.72(dd, J=8.5, 14.5 Hz, 1H), 2.90(dd, J=8.5, 14.5 Hz, 1H), 3.82(dd, J=6.4, 8.2 Hz, 1H), 6-75(m, 1H), 7.02-7.18(m, 3H), 7.40-7.60(m, 7H), 7.62-7.72(m, 2H), 9,60(br, 2H), 10.82(brs, 1H). 實施例3 9-112- 200403216 Elemental analysis; C23H2〇N3F〇4S · 0.5H2〇 Calculated 値 C; 59,73 Η; 4.58 Ν, · 09 · 09 F; 4.11 S; 6.93 実 験 値 C; 60.02 Η, · 4 · 46 Ν; 8.92 F; 4.12 S; 6.75 m NMR. ((5 ppm deDMSO): 2.72 (dd, J = 8.5, 14.5 Hz, 1H), 2.90 (dd, J = 8.5, 14.5 Hz, 1H), 3.82 (dd, J = 6.4, 8.2 Hz, 1H), 6-75 (m, 1H), 7.02-7.18 (m, 3H), 7.40-7.60 (m, 7H), 7.62-7.72 (m, 2H), 9,60 (br, 2H), 10.82 (brs, 1H). Example 3 9

Boc-HN^COOBn XV-39-1 I—S02NH^^C00Bn XV-39-2Boc-HN ^ COOBn XV-39-1 I—S02NH ^^ C00Bn XV-39-2

第2製程 第1製程 化合物(XV-39-l)5.0g溶在二氯甲烷10ml,加甲氧苯 1.5 2ml及三氟乙酸l〇ml,在室溫攪拌1小時後,減壓 濃縮,加乙酸乙酯,以重碳酸鈉水鹼化。乙酸乙酯層以 飽和食鹽水洗淨,以碳酸鉀乾燥,減壓濃縮。所得胺體 溶在二氯甲烷40ml,在冰冷下加N-甲基嗎啉1 .82ml及 對碘苯磺醯氯4.0 3克,在室溫攪拌3小時後,先後以1N 鹽酸、5 %重碳酸鈉水及水洗淨,減壓濃縮,在矽膠柱層 析(正己烷/乙酸乙酯=2/1),從丙酮/正己烷再結晶,得融 點 118-119°C 之化合物(XV-3 9-2) 5.5 3 g。產率 78%。 2004032162nd process 5.0g of the compound (XV-39-1) in 1st process was dissolved in 10 ml of dichloromethane, 1.5 2 ml of methoxybenzene and 10 ml of trifluoroacetic acid were added, and the mixture was stirred at room temperature for 1 hour, then concentrated under reduced pressure. Ethyl acetate, basified with sodium bicarbonate water. The ethyl acetate layer was washed with saturated brine, dried over potassium carbonate, and concentrated under reduced pressure. The obtained amine was dissolved in 40 ml of dichloromethane, 1.82 ml of N-methylmorpholine and 4.0 3 g of p-iodobenzenesulfonyl chloride were added under ice-cooling, and the mixture was stirred at room temperature for 3 hours, followed by 1N hydrochloric acid, 5% by weight. Washed with sodium carbonate water and water, concentrated under reduced pressure, and recrystallized from acetone / n-hexane by silica gel column chromatography (n-hexane / ethyl acetate = 2/1) to obtain a compound having a melting point of 118-119 ° C (XV -3 9-2) 5.5 3 g. Yield: 78%. 200403216

元素分析;C24H21N2IO4S 計算値 C;51.44 Η;3.78 Ν;5·00 Ι;22·64 S;5.72 実験値 C;51.54 Η;3.85 Ν;4,95 Ι;22·34 S;5.73 [α)Ό +17.3 (c= 0.5, DMSO 22Χ:) IR (ν cm 1 KBr): 3413, 3284, 1743, 1336, 1162 ΉNMR (δ ppm CDCls): 3-10-3.34(m, 2H), 3.53(s, 3H), 4.25(m, 1H), 5.17(m, 1H), 6.96-7.47(m, 7H), 7.60-7.71(m, 2H), 8.05(br s, 1H). 第2製程 化合物(XV-3 9-2)5 00mg溶在乾THFlOml,加粉末碳 酸鉀370mg、3-甲氧苯硼酸203mg及肆三苯膦鈀52mg ,在Ar大氣下加熱75 °C回流48小時後,以乙酸乙酯 稀釋,先後以1N-鹽酸、5%重碳酸鈉水及水洗淨,以硫 酸鈉乾燥,減壓濃縮,在矽膠柱層析(正己烷/乙酸乙酯 = 2/1),得化合物(XV-3 9-2)327mg。產率 68%。 元素分析;C3lH28N2〇5S.a2H2〇 計算値 C;68.42 Η;5·26 Ν;5·15 S;5.89 実験値 C;68.37H;5.23N;5.04S;5.74 [α]Ό +4.1 (c= 1.0, CHCI3 26^) IR ( v cm·! CHCI3): 3405, 1735, 1337, 1159 Ή NME (δ ppm CDCla): 3.28(d, J ^5.8 Hz, 2H)„3.87(s, 3H), 4,37(dt, J =9*4, 5.8 Hz, 1H), 4.76 and 4.84(AB q, J - 12.0 Hz, 2H), 5.20(d, J -9.4 Hz, 1H), 6.85-7.80 (m, 18H), 7.96(br s, 1H). 第3製程 化合物(XV-3 9-3 )270mg溶在二噚烷4ml及甲醇4ml ,力口 1 Ο % P d C 5 3 m g,在氫大氣攪拌。3小時後,濾除 觸媒,減壓濃縮,得泡狀化合物(Ia-3 9) 1 98mg。產率88%Elemental analysis; C24H21N2IO4S calculation 値 C; 51.44 Η; 3.78 Ν; 5.000 Ι; 22 · 64 S; 5.72 実 験 値 C; 51.54 Η; 3.85 Ν; 4,95 Ι; 22 · 34 S; 5.73 (α) Ό +17.3 (c = 0.5, DMSO 22 × :) IR (ν cm 1 KBr): 3413, 3284, 1743, 1336, 1162 ΉNMR (δ ppm CDCls): 3-10-3.34 (m, 2H), 3.53 (s, 3H), 4.25 (m, 1H), 5.17 (m, 1H), 6.96-7.47 (m, 7H), 7.60-7.71 (m, 2H), 8.05 (br s, 1H). Compound 2 (XV- 3 9-2) 5 00 mg was dissolved in 10 ml of dry THF, 370 mg of powdered potassium carbonate, 203 mg of 3-methoxyphenylboronic acid, and 52 mg of triphenylphosphine palladium were added. The mixture was heated at 75 ° C under Ar atmosphere for 48 hours under reflux, and ethyl acetate Diluted, washed with 1N-hydrochloric acid, 5% sodium bicarbonate water and water, dried over sodium sulfate, concentrated under reduced pressure, and subjected to silica gel column chromatography (n-hexane / ethyl acetate = 2/1) to obtain the compound (XV -3 9-2) 327 mg. Yield 68%. Elemental analysis; C3lH28N205S.a2H2. Calculated 値 C; 68.42 Η; 5.26 Ν; 5.15 S; 5.89 実 験 値 C; 68.37H; 5.23N; 5.04S; 5.74 [α] Ό +4.1 (c = 1.0, CHCI3 26 ^) IR (v cm! CHCI3): 3405, 1735, 1337, 1159 Ή NME (δ ppm CDCla): 3.28 (d, J ^ 5.8 Hz, 2H) „3.87 (s, 3H), 4 , 37 (dt, J = 9 * 4, 5.8 Hz, 1H), 4.76 and 4.84 (AB q, J-12.0 Hz, 2H), 5.20 (d, J -9.4 Hz, 1H), 6.85-7.80 (m, 18H), 7.96 (br s, 1H). 270 mg of compound 3 (XV-3 9-3) was dissolved in 4 ml of dioxane and 4 ml of methanol, with a strength of 10% P d C 5 3 mg, and stirred in a hydrogen atmosphere. After 3 hours, the catalyst was filtered off and concentrated under reduced pressure to obtain 1 98 mg of foamy compound (Ia-3 9). Yield 88%

-114- 200403216 元素分析:C24H22N2〇5S*0.8H2〇 計算値 c;62.00 Η;5·12 N;6.03 S;6.90 実験値 C;62.03 Η;5·06 Ν;6·03 S;6.82 [οφ +26.0 (c= 1.0, DMSO 23°C) IR (v cm·1 KBr) : 3412, 1724, 1326, 1159 m NMR (&lt;5 ppm dsDMSO): 2.89(dd, J ^7.8,14.2 Hz, 1H), 3.09(dd, J =5.8,14.2 Ηζ,ΙΗ), 3.90(m, 1H), 3.85(s, 3H), 6.85^7.11(m, 4H), 7 J7-7.48(m, 5H), 7.56-7.72(m, 2H), 8.23(br s, 1H), 10.80(s, 1H). 實施例5 7-114- 200403216 Elemental analysis: C24H22N2〇5S * 0.8H2〇Calculate 値 c; 62.00 Η; 5.12 N; 6.03 S; 6.90 実 験 値 C; 62.03 Η; 5.06 Ν; 6.03 S; 6.82 [οφ +26.0 (c = 1.0, DMSO 23 ° C) IR (v cm · 1 KBr): 3412, 1724, 1326, 1159 m NMR (&lt; 5 ppm dsDMSO): 2.89 (dd, J ^ 7.8, 14.2 Hz, 1H ), 3.09 (dd, J = 5.8, 14.2 Ηζ, ΙΗ), 3.90 (m, 1H), 3.85 (s, 3H), 6.85 ^ 7.11 (m, 4H), 7 J7-7.48 (m, 5H), 7.56 -7.72 (m, 2H), 8.23 (br s, 1H), 10.80 (s, 1H). Example 5 7

第1製程 化合物(χ V - 5 7 ) 4 0 8 m g懸浮在二噚烷2 0 m 1及水1 0 m 1 ,在冰冷攪拌,先後加碳酸鈉4 2 4 m g及二甲胺基萘磺 醯氯(Aldrich公司製造)540mg,徐徐昇至室溫而攪拌15 小時後,注入水中,以10%檸檬酸調爲PH = 4,以乙酸 乙酯萃取,水洗,以硫酸鈉乾燥,減壓濃縮,在矽膠柱 層析(氯仿/甲醇=10/1),得融點1 8 7- 1 90°C之化合物(la-57)500mg。產率 57%。 元素分析;C23H23N3〇4S · 1.7H20 c’ 計算値 0;59·01 Η;5.68 Ν;8·98 S;6.85 実験値 C;59.07 Η;5.26 Ν;8·72 S;6.38 [a]D -69·2 土 2.1(c=0.516% DMSO 22Χ:) IR (v cm·1 KBr): 3413br, 1588, 1457, 1411, 1357, 1308, 1141 Ή NMR (δ ppm d6DMSO) : 2.81(s, 6H),3,03(dd, J=5.4, 18.0 Hz, 1H), 3.10(dd, J=5.4, 18.0 Hz, lH),3.57(m, 1H), 6-88(m, 1H), 6.97^7.02(m, 2H), 7.19-7.27(m, 3H), 7.42-7.55(πι, 3H), 8.05(d, J=6.9 Hz, 1H), 8.22(d, J=8.4 Hz, 1H), 8.39(d, J=8.4 Hz, 1H), 10.66(s, 1H). -115- 200403216 實施例74 第1製程 I H2N 八 COOH XV-74The first process compound (χ V-5 7) 4 0 8 mg was suspended in dioxane 20 m 1 and water 10 m 1, and the mixture was stirred under ice-cooling, followed by sodium carbonate 4 2 4 mg and dimethylaminonaphthalenesulfonate. 540mg of Chlorine (manufactured by Aldrich), slowly raised to room temperature and stirred for 15 hours, poured into water, adjusted to pH = 4 with 10% citric acid, extracted with ethyl acetate, washed with water, dried over sodium sulfate, and concentrated under reduced pressure , Column chromatography on silica gel (chloroform / methanol = 10/1), 500 mg of compound (la-57) with a melting point of 1 8 7-1 90 ° C was obtained. The yield is 57%. Elemental analysis; C23H23N3〇4S · 1.7H20 c 'Calculate 値 0; 59 · 01 Η; 5.68 Ν; 8.98 S; 6.85 実 験 値 C; 59.07 Η; 5.26 Ν; 8.72 S; 6.38 [a] D- 69 · 2 2.1 (c = 0.516% DMSO 22 × :) IR (v cm · 1 KBr): 3413br, 1588, 1457, 1411, 1357, 1308, 1141 Ή NMR (δ ppm d6DMSO): 2.81 (s, 6H) , 3,03 (dd, J = 5.4, 18.0 Hz, 1H), 3.10 (dd, J = 5.4, 18.0 Hz, lH), 3.57 (m, 1H), 6-88 (m, 1H), 6.97 ^ 7.02 (m, 2H), 7.19-7.27 (m, 3H), 7.42-7.55 (πι, 3H), 8.05 (d, J = 6.9 Hz, 1H), 8.22 (d, J = 8.4 Hz, 1H), 8.39 ( d, J = 8.4 Hz, 1H), 10.66 (s, 1H). -115- 200403216 Example 74 1st process I H2N Eight COOH XV-74

la-74 第1製程 化合物(XV-74)204mg溶在二噚烷8ml及水4m卜在冰 冷攪拌下,加碳酸鈉212mg及5-氯-3-甲基苯駢[b]噻吩 -2-磺醯氯(Maybridge公司製造)281mg,徐徐昇至室溫 並攪拌3 · 5小時後,注入水中,以1 〇 %檸檬酸調爲p η 3 〜4,以乙酸乙酯萃取,水洗,以硫酸鈉乾燥,減壓濃 縮,在矽膠柱層析 (氯仿/甲醇=10/1),得融點〉2 5 0 Χ:之化合物(Ia-74)260mg 。產率5 8 %。 [a]D -40·8± l,6(c=0.510% DMSO 22C) IR (v cm·! KBr): 3421br,1580,1421, 1333,1153 Ή NMR (6 ppm deDMSO) : 2.41(s, 3H), 3.01(dd, J=6.0, 14,4 Hz, 1H), 3.12(dd, J=4.5, 14.4 Hz, 1H), 3.67(t, J=5.4 Hz, 1H), 6.79(m, 1H), 6,89(m, 1H), 7.03(d, J=2.4 Hz, 1H), 7.12(d, J=8.4 Hz, 1H), 7.41(d, J=8.1 Hz, 1H), 7.51(dd, J=1.8, 8.7 Hz, 1H), 7,86(d, J=1.8 Hz, 1H), 7.96(d, J=8.7 Hz, 1H), 10,50(s, 1H). -116- 200403216 實施例8 6la-74 204 mg of compound (XV-74) in the first process was dissolved in 8 ml of dioxane and 4 m of water. Under ice-cold stirring, 212 mg of sodium carbonate and 5-chloro-3-methylphenylhydrazone [b] thiophene-2- 281 mg of sulfonium chloride (manufactured by Maybridge), slowly raised to room temperature and stirred for 3.5 hours, then poured into water, adjusted to 10% ~ 4 with 10% citric acid, extracted with ethyl acetate, washed with water, and sulfuric acid Sodium was dried, concentrated under reduced pressure, and then subjected to silica gel column chromatography (chloroform / methanol = 10/1) to obtain 260 mg of a compound (Ia-74) having a melting point> 2 50 × :. Yield: 58%. [a] D -40 · 8 ± 1,6 (c = 0.510% DMSO 22C) IR (v cm ·! KBr): 3421br, 1580, 1421, 1333, 1153 Ή NMR (6 ppm deDMSO): 2.41 (s, 3H), 3.01 (dd, J = 6.0, 14,4 Hz, 1H), 3.12 (dd, J = 4.5, 14.4 Hz, 1H), 3.67 (t, J = 5.4 Hz, 1H), 6.79 (m, 1H ), 6,89 (m, 1H), 7.03 (d, J = 2.4 Hz, 1H), 7.12 (d, J = 8.4 Hz, 1H), 7.41 (d, J = 8.1 Hz, 1H), 7.51 (dd , J = 1.8, 8.7 Hz, 1H), 7,86 (d, J = 1.8 Hz, 1H), 7.96 (d, J = 8.7 Hz, 1H), 10,50 (s, 1H). -116- 200403216 Example 8 6

第1製程 XV-86-1 第2製程1st process XV-86-1 2nd process

_ _ P (H3C)2NH^)~N=N-h^)-S〇2NH 八 COOteu XV-86-2_ _ P (H3C) 2NH ^) ~ N = N-h ^)-S〇2NH VIII COOteu XV-86-2

(Η3〇)2Ν·-^^^Ν=Ν—^^-*S〇2NH^COOH la-86(Η3〇) 2N ·-^^^ N = N — ^^-* S〇2NH ^ COOH la-86

H2N 八 CONHC^Bu 第3製程 (H3C)2N-^^-N=N-(^&gt;-S02NH 八 α)ΝΗ(ΛH2N eight CONHC ^ Bu third process (H3C) 2N-^^-N = N-(^ &gt; -S02NH eight α) ΝΗ (Λ

XV-86-3 第4製程 XV-86-4XV-86-3 4th process XV-86-4

{H3C)2N-h^^N=N--^^&gt;-S02NH 二 CONHOH lb-86 第1製程(H3C) 2N-h ^^ N = N-^^ &gt; -S02NH 2 CONHOH lb-86 1st process

化合物(XV-86-l)221mg溶在二氯甲院8ml,加三乙 胺0.5 6ml及它普醯氯40 5 mg,在室溫攪拌2.5小時後 ,加水及乙酸乙酯而攪拌。濾集結晶依序以乙酸乙酯及 水洗淨而乾燥,得化合物(XV-86-2)414mg。產率82%。 [οφ ·101·5土7.0(c=0.203% DMSO 25T:) IR (v cm-1 KBr): 3425, 3301, 1716, 1370, 1140 Ή NMR (δ ppm deDMSO) : l.ll(s, 9H), 2.79(dd, J=8.4, 13.7 Hz, 1H), 2.88(dd, J=7.4, 13.7 Hz, 1H), 3.09(s, 6H), 3.90(m, 1H), 6.86(d, J=9.0 Hz, 2H), 7.11-7.32(ιιι, 6H), 7.70« 7.92(m, 5H). 第2製程 化合物(XV-86-l)3 8 6mg溶在二氯甲烷10ml,加三氟 乙酸1 0ml,在室溫攪拌2小時。減壓濃縮後,以乙醚/ 200403216 正己烷洗淨,得融點93 -94°C之化合物(Ia-8 6)429mg。 [a]D -14.3土2.2(c=0.251% DMSO 25.5X:) IR(v cm^KBr) : 3700-2200br, 3431, 1735, 1391,1154 m NMR (&lt;5 ppm deDMSO) : 2.74(dd, J=9.1, 13.6 Hz, 1H), 2.96(dd, J=5.7, 13.6 Hz, 1H), 3.09(s, 6H), 3.93(dt, J=5.7, 9.1 Hz, 1H), 6.86(d, J=9.3 Hz, 2H), 7.10^7.38(111, 5H), 7.69(d, J-8.7 Hz, 2H), 7,76(d, J=8.7 Hz, 1H), 7.84(d, J=9.3 Hz, 2H), 8.39(d, J=9,l Hz, 1H). 第3製程 化合物(XV-86-3)260mg溶在二甲基甲醯胺5ml,加卜 羥基苯駢三唑70.7mg、1-乙基-3-(3-二甲胺丙基)碳化 二亞胺鹽酸鹽92.5mg、N-甲基嗎啉〇.3ml。在冰冷下攪 拌1小時後,力□ 〇 -(第三丁基)羥胺鹽酸鹽7 6 · 3 m g。在 室溫攪拌1 8小時後,倒入水中,以乙酸乙酯萃取’水 洗,減壓濃縮,在矽膠柱層析(正己烷/乙酸乙酯=1/1)得 化合物(XV-86-4) 1 42mg。產率 59%。 Ή NMR ( δ ppm CDCla): 1.20(s, 9H), 2.90-3.04(m, 2H), 3.14(s, 6H), 3.90(m, 1H), 4.97(d, J=6,6 Hz, 1H), 6.78(d, J=9.0 Hz, 2H), 6.96-7.02(m, 2H), 7.14-7.25(m, 3H), 7.72(d, J=8.7 Hz, 2H), 7.83(d, J=8.7 Hz, 2H), 7.92(d, J=9.0 Hz, 2H), 8.33(s, 1H). 第4製程 化合物(XV-86-4)15.4mg溶在二氯甲烷〇.5mg,加三 氟乙酸lml,在室溫攪拌7·5小時。加熱60°C 1小時後’ 減壓濃縮,以乙醚/正己烷洗淨,得3.9mg化合物(la-86) 。產率2 3 %。 lR NMR (δ ppm deDMSO): 2.71-2.88(m, 2H), 3.09(s, 6H), 6.86{d, J=9.0 Hz, 2H), 7,83(d, J=9.0 Hz, 2H), 7.71(d, J=8.4 Hz, 4H), 8.36(s, 1H), 10.64(s, 1H). -118- 200403216 實施例248 Η221 mg of the compound (XV-86-1) was dissolved in 8 ml of dichloromethane, 0.5 6 ml of triethylamine and 40 5 mg of puertochlor were added, and after stirring at room temperature for 2.5 hours, water and ethyl acetate were added and stirred. The crystals collected by filtration were sequentially washed with ethyl acetate and water and dried to obtain 414 mg of compound (XV-86-2). The yield was 82%. (οφ · 101 · 5 soil 7.0 (c = 0.203% DMSO 25T :) IR (v cm-1 KBr): 3425, 3301, 1716, 1370, 1140 Ή NMR (δ ppm deDMSO): 1.11 (s, 9H ), 2.79 (dd, J = 8.4, 13.7 Hz, 1H), 2.88 (dd, J = 7.4, 13.7 Hz, 1H), 3.09 (s, 6H), 3.90 (m, 1H), 6.86 (d, J = 9.0 Hz, 2H), 7.11-7.32 (ιιι, 6H), 7.70 «7.92 (m, 5H). Compound 2 (XV-86-1) 3 8 6 mg was dissolved in 10 ml of dichloromethane, and trifluoroacetic acid 1 was added. 0 ml, and stirred at room temperature for 2 hours. After concentration under reduced pressure, it was washed with diethyl ether / 200403216 n-hexane to obtain 429 mg of the compound (Ia-8) with a melting point of 93-94 ° C. [a] D -14.3 ± 2.2 (c = 0.251% DMSO 25.5X :) IR (v cm ^ KBr): 3700-2200br, 3431, 1735, 1391, 1154 m NMR (&lt; 5 ppm deDMSO): 2.74 (dd , J = 9.1, 13.6 Hz, 1H), 2.96 (dd, J = 5.7, 13.6 Hz, 1H), 3.09 (s, 6H), 3.93 (dt, J = 5.7, 9.1 Hz, 1H), 6.86 (d, J = 9.3 Hz, 2H), 7.10 ^ 7.38 (111, 5H), 7.69 (d, J-8.7 Hz, 2H), 7,76 (d, J = 8.7 Hz, 1H), 7.84 (d, J = 9.3 Hz, 2H), 8.39 (d, J = 9, 1 Hz, 1H). Compound 3 (XV-86-3) 260mg is dissolved in 5ml of dimethylformamide and 70.7mg of hydroxybenzitriazole 1-ethyl-3- (3-dimethylaminopropyl) carbodiimide hydrochloride 92.5 mg, N-methylmorpholine 0.3 ml. After stirring under ice-cooling for 1 hour, □-(tert-butyl) hydroxylamine hydrochloride was 76 · 3 mg. After stirring at room temperature for 18 hours, it was poured into water, extracted with ethyl acetate, washed with water, concentrated under reduced pressure, and subjected to silica gel column chromatography (n-hexane / ethyl acetate = 1/1) to obtain the compound (XV-86-4 ) 1 42mg. Yield: 59%. Ή NMR (δ ppm CDCla): 1.20 (s, 9H), 2.90-3.04 (m, 2H), 3.14 (s, 6H), 3.90 (m, 1H), 4.97 (d, J = 6, 6 Hz, 1H ), 6.78 (d, J = 9.0 Hz, 2H), 6.96-7.02 (m, 2H), 7.14-7.25 (m, 3H), 7.72 (d, J = 8.7 Hz, 2H), 7.83 (d, J = 8.7 Hz, 2H), 7.92 (d, J = 9.0 Hz, 2H), 8.33 (s, 1H). 15.4 mg of compound (XV-86-4) in the fourth process was dissolved in 0.5 mg of dichloromethane, and trifluoro was added 1 ml of acetic acid was stirred at room temperature for 7.5 hours. After heating at 60 ° C for 1 hour, it was concentrated under reduced pressure and washed with diethyl ether / n-hexane to obtain 3.9 mg of the compound (la-86). The yield was 23%. lR NMR (δ ppm deDMSO): 2.71-2.88 (m, 2H), 3.09 (s, 6H), 6.86 (d, J = 9.0 Hz, 2H), 7,83 (d, J = 9.0 Hz, 2H), 7.71 (d, J = 8.4 Hz, 4H), 8.36 (s, 1H), 10.64 (s, 1H). -118- 200403216 Example 248 Η

BocHN COOBn XV-248-1BocHN COOBn XV-248-1

NCNC

第2製程· S02NH …COOBn XV-248-22nd process · S02NH… COOBn XV-248-2

N=N /z=\N = N / z = \

第3製程Third process

HN —U^-S02NH 八 COOBn ΧΝΛ248-3HN —U ^ -S02NH Eight COOBn ΧΝΛ248-3

^SOaNH COOH la-248 第1製程 化合物(XV-248-l)1.5g溶在乾THF6ml及二氯甲烷 6ml。在冰冷下加N -甲基嗎啉〇.46ml,及4 -氰苯磺醯 氯8 4 3 m g之二氯甲烷1 5 m 1溶液。在室溫攪拌1小時後 ,加乙酸乙酯,依序以2N -鹽酸、5 %重碳酸鈉水及水洗 淨,以硫酸鈉乾燥,減壓濃縮,在矽膠柱層析(正己烷/ 乙酸乙酯=1 /1 ),從正己烷結晶,得融點1 5 3 - 1 5 5 °C之化 合物(XV-248-2)1.32g。產率 76.7%。 [a]D +22·2 土 0.6(c=1.0%% DMSO 22X:) IR (y cm-1 KBr) : 3392,3330,2236,1748,1347,1159 Ή NMR (δ ppm CDCls) : 3.18(dd, J=7.0, 14.8 Hz, 1H), 3.29(dd, J=5.0, 14.8 Hz, 1H), 4.31(m, 1H), 4.69(s, 2H), 5.33(d, J=9.0 Hz, 1H), 6.85-7.70(m, 14 H), 8.01(s, 1H). 第2製程 化合物(XV-248-2)600mg溶在1-甲基-2-吡咯啶酮 10ml,加疊氮化鈉426mg、三乙胺鹽酸鹽451mg,在75 °C加熱攪拌6小時後,以乙酸乙酯稀釋,以1N-鹽酸及 飽和食鹽水洗淨,減壓濃縮,在矽膠柱層析(氯仿/甲醇 /水=32/9/1),得白色粉末狀化合物(xv-248-3)581 mg。^ SOaNH COOH la-248 Process 1 1.5 g of compound (XV-248-1) was dissolved in 6 ml of dry THF and 6 ml of dichloromethane. Under ice-cooling, 0.46 ml of N-methylmorpholine and a solution of 4-cyanobensulfonium chloride 8 4 3 mg in dichloromethane 15 m 1 were added. After stirring at room temperature for 1 hour, ethyl acetate was added, and the mixture was sequentially washed with 2N-hydrochloric acid, 5% sodium bicarbonate water and water, dried over sodium sulfate, concentrated under reduced pressure, and subjected to silica gel column chromatography (n-hexane / acetic acid). Ethyl ester = 1/1), crystallized from n-hexane to obtain 1.32 g of a compound (XV-248-2) with a melting point of 1 5 3-1 5 5 ° C. The yield was 76.7%. [a] D + 22 · 2 ± 0.6 (c = 1.0 %% DMSO 22X :) IR (y cm-1 KBr): 3392,3330,2236,1748,1347,1159 Ή NMR (δ ppm CDCls): 3.18 ( dd, J = 7.0, 14.8 Hz, 1H), 3.29 (dd, J = 5.0, 14.8 Hz, 1H), 4.31 (m, 1H), 4.69 (s, 2H), 5.33 (d, J = 9.0 Hz, 1H ), 6.85-7.70 (m, 14 H), 8.01 (s, 1H). 600 mg of compound 2 (XV-248-2) was dissolved in 10 ml of 1-methyl-2-pyrrolidone, and sodium azide was added 426 mg, 451 mg of triethylamine hydrochloride, heated and stirred at 75 ° C for 6 hours, diluted with ethyl acetate, washed with 1N-hydrochloric acid and saturated brine, concentrated under reduced pressure, and subjected to silica gel column chromatography (chloroform / methanol / Water = 32/9/1) to obtain 581 mg of a white powdery compound (xv-248-3).

-119- 200403216 產率96%。 [Q〇d -12·4土a5(c=1.009% DMSO 23t:) IR (V cm*1 KBr): 3420br, 1736, 1457, 1421, 1338, 1162 Ή NMR (5 ppm d6DMSO): 2.95(dd, J=7.0r 14.2 Hz, 1H), 3.11(dd, J=8.2, 14.2 Hz, 1H), 4.10(dt, J=7.8S 7.8 Hz, 1H), 4.75(s, 2H), 6.84-7.10(m, 5H), 7.13-7.34(m, 5H), 7.71(d, J=8.6 Hz, 1H), 8.07(d, J=8.6 Hz, 1H), 10.88(^ 1H). 第3製程 化合物(XV- 2 48- 3 )4 8 0mg溶在二噚烷3ml及甲醇3ml ,力卩1 0 % P d - C 2 0 3 m g,在氫大氣攪拌2小時後,濾除觸 媒,減壓濃縮,得泡狀化合物(Ia-24 8)3 3 5mg。產率85% 元素分析;CwHieNeC^S · 0.4H20 計算値 C;51-52 Η;4·04 N;20,03 S;7.64 実験値 C;51.34 Η;3·96 N;19.76 S;8.02 [a]D +23·2±0·6(〇=1·004% DMSO 23*0) IR (v cm-1 KBr): 3405, 3099, 1698, 1430, 1327, 1163 Ή NMR ((5 ppm deDMSO): 2.87(dd, J=8.2, 14.4 Hz, 1H), 3.09(dd, J=5.4, 14.4 Hz, 1H), 3.96(m, 1H), 6.80-6.94(m, 2H), 7.00-7.28(m, 2H), 7.30(m, 1H), 7.65(d, J=8.6 Hz, 2H), 7,95(d, J=8.6 Hz, 2H), 8.46(d, J=8.6 Hz, 21H), 10.75(s, 1H), 12.71(brs, 1H). 實施例267 200403216-119- 200403216 Yield 96%. (Q〇d -12 · 4 土 a5 (c = 1.009% DMSO 23t :) IR (V cm * 1 KBr): 3420br, 1736, 1457, 1421, 1338, 1162 Ή NMR (5 ppm d6DMSO): 2.95 (dd , J = 7.0r 14.2 Hz, 1H), 3.11 (dd, J = 8.2, 14.2 Hz, 1H), 4.10 (dt, J = 7.8S 7.8 Hz, 1H), 4.75 (s, 2H), 6.84-7.10 ( m, 5H), 7.13-7.34 (m, 5H), 7.71 (d, J = 8.6 Hz, 1H), 8.07 (d, J = 8.6 Hz, 1H), 10.88 (^ 1H). 3rd process compound (XV -2 48- 3) 4 0 0 mg is dissolved in 3 ml of dioxane and 3 ml of methanol, and 10% P d-C 2 0 3 mg. After stirring in a hydrogen atmosphere for 2 hours, the catalyst is filtered off and concentrated under reduced pressure. This gave a bubbly compound (Ia-24 8) 3 3 5 mg. 85% yield elemental analysis; CwHieNeC ^ S · 0.4H20 Calculate 値 C; 51-52 Η; 4.04 N; 20,03 S; 7.64 実 験 値 C; 51.34 Η; 3.96 N; 19.76 S; 8.02 [ a) D + 23 · 2 ± 0 · 6 (〇 = 1.004% DMSO 23 * 0) IR (v cm-1 KBr): 3405, 3099, 1698, 1430, 1327, 1163 Ή NMR ((5 ppm deDMSO ): 2.87 (dd, J = 8.2, 14.4 Hz, 1H), 3.09 (dd, J = 5.4, 14.4 Hz, 1H), 3.96 (m, 1H), 6.80-6.94 (m, 2H), 7.00-7.28 ( m, 2H), 7.30 (m, 1H), 7.65 (d, J = 8.6 Hz, 2H), 7,95 (d, J = 8.6 Hz, 2H), 8.46 (d, J = 8.6 Hz, 21H), 10.75 (s, 1H), 12.71 (brs, 1H). Example 267 200403216

第2製程2nd process

S02NH XV-267-2 j〇 第1製程 I *—:---S02NH XV-267-2 j〇 1st process I *-: ---

HgN^COO^u Χν-267·1HgN ^ COO ^ u Χν-267 · 1

八 COCfeu XV-267-3 第3製程 ΟCOCfeu XV-267-3 3rd process Ο

S02NH 八 COOH 第4製程 la-267S02NH Eight COOH process 4 la-267

lb-267 第1製程 化合物(XV-267-l)2.22g溶在二氯甲烷23ml,在冰冷 下加N-甲基嗎啉2.2 ml及對碘苯磺醯氯3.04克,在室 溫攪拌1 6小時後,依序以1 N鹽酸、5 %重碳酸鈉水及 水洗淨,減壓濃縮,從乙酸乙酯/正己烷再結晶,得融 點 1 1 6 - 1 1 7 °C 之化合物(X V - 2 6 7 - 2 ) 3 · 4 4 g。產率 7 1 %。lb-267 2.22 g of compound (XV-267-1) in the first process was dissolved in 23 ml of dichloromethane, 2.2 ml of N-methylmorpholine and 3.04 g of p-iodobenzenesulfonyl chloride were added under ice cooling, and the mixture was stirred at room temperature for 1 After 6 hours, wash sequentially with 1 N hydrochloric acid, 5% sodium bicarbonate water and water, concentrate under reduced pressure, and recrystallize from ethyl acetate / n-hexane to obtain a compound with a melting point of 1 16-1 17 ° C. (XV-2 6 7-2) 3 · 4 4 g. The yield was 71%.

元素分析;Ci9H22NI〇4S 計算値 Q46.83 Η;4·55 N;2.87 I;26,04 S;6.60 実験値 C;46.69 Η;4·58 N;2,92 I;26.02 S;6.55 [a]D ·12·7士(c= 0,503,(^013 221) IR (v cm·1 KBr): 3425, 3279, 1720, 1352, 1171,1153 Ή NME (δ ppm CDCh) : 1.24(s, 9H), 2.99(d, J=6.0 Hz, 2H), 4.06(dt, J=6.2,9.3 Hz, 1H), 5.10(d, J=9.3 Hz, 1H), 7.09-7.15(m, 2H), 7.22-7.28(m, 3H), 7.45(d, J=8.7 Hz, 2H), 7.78(d, J=8.7Hz, 2H). 第2製程Elemental analysis; Ci9H22NI〇4S calculation 値 Q46.83 Η; 4.55 N; 2.87 I; 26,04 S; 6.60 実 験 値 C; 46.69 Η; 4.58 N; 2,92 I; 26.02 S; 6.55 [a ] D · 12 · 7 (c = 0,503, (^ 013 221) IR (v cm · 1 KBr): 3425, 3279, 1720, 1352, 1171, 1153 Ή NME (δ ppm CDCh): 1.24 (s, 9H ), 2.99 (d, J = 6.0 Hz, 2H), 4.06 (dt, J = 6.2, 9.3 Hz, 1H), 5.10 (d, J = 9.3 Hz, 1H), 7.09-7.15 (m, 2H), 7.22 -7.28 (m, 3H), 7.45 (d, J = 8.7 Hz, 2H), 7.78 (d, J = 8.7Hz, 2H). 2nd process

化合物(XV-2 67 -2)5 00mg爲乙炔苯157mg溶在DMF 200403216 5ml,加雙(三苯膦)鈀(II)18mg、碘化銅l〇mg及三乙胺 0 · 2 9 m 1,在Ar氣流下加熱5 0 °C攪拌1 5小時後,倒入 冷水中,以2N -鹽酸酸化後,以乙酸乙酯萃取,以5 % 重碳酸鈉水及水洗淨,以無水硫酸鈉乾燥,減壓濃縮, 在矽膠柱層析(甲苯/乙酸乙酯=1/5),從乙酸乙酯/正己 烷再結晶,得融點1 2 3 - 1 2 4 °C之化合物(X V · 2 6 7 - 3 ) 3 5 0 m g 。產率7 4 %。500 mg of compound (XV-2 67 -2) was 157 mg of acetylenebenzene dissolved in 5 ml of DMF 200403216, and 18 mg of bis (triphenylphosphine) palladium (II), 10 mg of copper iodide and triethylamine 0. 2 9 m 1 , Stir at 50 ° C for 15 hours under Ar flow, pour into cold water, acidify with 2N-hydrochloric acid, extract with ethyl acetate, wash with 5% sodium bicarbonate water and water, and dry with anhydrous sodium sulfate Dried, concentrated under reduced pressure, and recrystallized from ethyl acetate / n-hexane on silica gel column chromatography (toluene / ethyl acetate = 1/5) to obtain a compound having a melting point of 1 2 3-1 2 4 ° C (XV · 2 6 7-3) 3 50 mg. The yield was 74%.

元素分析;C27H27NO4SElemental analysis; C27H27NO4S

計算値 C;70.26 Η;5·90 Ν,·3·03 S;6.95 実験値 C;70.31 Η;5·76 Ν;3·04 S;6.96 IE (v cm·1 KBr): 3440br, 3309, 2218, 1705,1429, 1344, 1296, 1159 Ή NMR ((5 ppm CDCb) : 1.23(s, 9H), 3.03(d, J=5.8 Hz, 2H), 4.10(dt, J=6.2, 9.2 Hz, 1H), 5.13(d, J=9.2Hz, 1H), 7.10-7.17(m, 2H), 7.21^7,28(ιη, 3H), 7.34-7.40(m, 3H), 7.50-7.60(m, 1H), 7.7〇.7.77(m, 2H). 第3製程 化合物(XV-267-3)276mg溶在二氯甲烷2.5 ml,加三 氟乙酸5ml,在室溫攪拌24小時後,減壓濃縮,以乙醚/ 正己烷洗淨,得融點1 76- 1 7 8°C之化合物(Ia-267)22 1 mg。 產率9 1 %。 [a]D -9.9±1.0(c=0.503% DMSO 24.5eC) IR (v cm·1 KBr): 3700-2400br, 3427, 3289, 2213, 1721, 1694, 1347, 1163 Ή NMR (δ ppm d6DMSO): 2.73(dd, J=9.3, 13.5 Hz, 1H), 2.96(dd, J=5.4, 13.5 Hz, 1H), 3.92(dt, J=5.4, 9.3 Hz, 1H), 7.11«7.23(m, 5H), 7.42-7.50(m, 3H), 7.52-7.64(m, 6H), 8.42(d, J = 9.3 H z 5 1H)° 第4製程 化合物(Ia- 2 6 7 ) 20 3 mg溶在DMF 3ml,加1 -羥基苯駢 之唑85.5mg、1-乙基-3-(3-二甲胺丙基)碳化二亞胺鹽Calculate 値 C; 70.26 Η; 5.90 Ν, 3.03 S; 6.95 実 験 値 C; 70.31 Η; 5.76 Ν; 3.04 S; 6.96 IE (v cm · 1 KBr): 3440br, 3309, 2218, 1705, 1429, 1344, 1296, 1159 Ή NMR ((5 ppm CDCb): 1.23 (s, 9H), 3.03 (d, J = 5.8 Hz, 2H), 4.10 (dt, J = 6.2, 9.2 Hz, 1H), 5.13 (d, J = 9.2Hz, 1H), 7.10-7.17 (m, 2H), 7.21 ^ 7, 28 (ιη, 3H), 7.34-7.40 (m, 3H), 7.50-7.60 (m, 1H), 7.7〇.7.77 (m, 2H). 276 mg of compound (XV-267-3) in the third process was dissolved in 2.5 ml of dichloromethane, 5 ml of trifluoroacetic acid was added, and the mixture was stirred at room temperature for 24 hours and then concentrated under reduced pressure. And washed with ether / n-hexane to obtain a compound (Ia-267) 22 1 mg at a melting point of 1 76-178 at 8 ° C. Yield 9 1%. [A] D -9.9 ± 1.0 (c = 0.503%) DMSO 24.5eC) IR (v cm · 1 KBr): 3700-2400br, 3427, 3289, 2213, 1721, 1694, 1347, 1163 Ή NMR (δ ppm d6DMSO): 2.73 (dd, J = 9.3, 13.5 Hz, 1H ), 2.96 (dd, J = 5.4, 13.5 Hz, 1H), 3.92 (dt, J = 5.4, 9.3 Hz, 1H), 7.11 «7.23 (m, 5H), 7.42-7.50 (m, 3H), 7.52- 7.64 (m, 6H), 8.42 (d, J = 9.3 H z 5 1H) ° Compound 4 (Ia- 2 6 7) 20 3 mg was dissolved in 3 ml of DMF, 85.5 mg of 1-hydroxybenzopyrazole was added, 1-ethyl-3 -(3-Dimethylaminopropyl) carbodiimide salt

-122- 200403216 酸鹽U5mg、N-甲基嗎啉〇.3m卜在冰冷下攪拌1小時 。次加羥胺鹽酸鹽5 2 · 3 m g,在同溫攪拌2小時後,倒 入水中,以乙酸乙酯萃取,水洗而減壓濃縮,在矽膠柱 層析(正己烷/乙酸乙酯=1/2),得融點156-1 58t之化合 物(Ib-267)76.8mg。產率 37%。-122- 200403216 acid salt U5mg, N-methylmorpholine 0.3m Bu under stirring under ice-cooling for 1 hour. Add 5 2 · 3 mg of hydroxylamine hydrochloride, stir at the same temperature for 2 hours, pour into water, extract with ethyl acetate, wash with water and concentrate under reduced pressure. Column chromatography on silica gel (n-hexane / ethyl acetate = 1) / 2), to obtain 76.8 mg of compound (Ib-267) with a melting point of 156-1 58t. The yield is 37%.

元素分析;C23H2〇N2〇4S · O.lHsO 計算値 C;65,42 Η;4·82 Ν;6·63 S;7.59 実験値 C;65.31H;5.00N;6.40S;7.62 [a]D -1.6土0.8(c= 0·500, DMSO 25.5t:) IR (v cm*1 KBr) : 3700-2400, 3267, 2217, 1671,1321, 1161 Ή NMR (6 ppm deDMSO): 2.62(dd, J=8,6, 13.5 Hz, 1H), 2.80(dd, J=6.0, 13.5 Hz, 1H), 3.82 (dt, J=6-0, 8.6 Hz, 1H), 7.03-7.22(m, 5H), 7.42-7.50(m, 3H), 7.52.7.63(m, 3H), 8.38(d, J=8.6 Hz, 1H), 8.87(d, J=1.5 Hz, 1H), 10.64(d, J=1.5 Hz, 1H).Elemental analysis; C23H2〇N2〇4S · 0.1HsO calculation 値 C; 65,42 42; 4.82 Ν; 6.63 S; 7.59 実 験 値 C; 65.31H; 5.00N; 6.40S; 7.62 [a] D -1.6 ± 0.8 (c = 0.500, DMSO 25.5t :) IR (v cm * 1 KBr): 3700-2400, 3267, 2217, 1671,1321, 1161 Ή NMR (6 ppm deDMSO): 2.62 (dd, J = 8,6, 13.5 Hz, 1H), 2.80 (dd, J = 6.0, 13.5 Hz, 1H), 3.82 (dt, J = 6-0, 8.6 Hz, 1H), 7.03-7.22 (m, 5H) , 7.42-7.50 (m, 3H), 7.52.7.63 (m, 3H), 8.38 (d, J = 8.6 Hz, 1H), 8.87 (d, J = 1.5 Hz, 1H), 10.64 (d, J = 1.5 Hz, 1H).

Claims (1)

200403216 拾、申請專利範圍: 1 · 一種如下式I化合物,其光學活性體或彼等之製藥容 許鹽 COY R5-R4—R3 - S〇2-N R2 式中R1爲可經選自鹵素、C3〜C8環烷基、羥基、羧基 及苯(^〜c3烷氧基之取代基取代之Ci〜c6烷基、 苯基、 可經選自苯基、硝基、鹵素、羥基及羧基之取代基取 代之苯基Ci〜C6烷基或萘基&lt;^〜(:6烷基、或 可經選自Ci〜C6烷基、Ci〜C6烷氧基、鹵素、Ci〜c6 烷磺醯基、Ci〜C6烷氧羰基、Ci〜c6烷羰基及甲醯基 之取代基取代之吲哚Ci〜C6烷基、噻唑Ci〜c6烷基、 苯駢噻唑C6烷基、吡啶Ci〜C6烷基或苯駢咪唑Ci 〜c6院基; R2爲氫、可經胺基取代之C6烷基、或苯基(^〜C6 烷基; R3爲可經硝基或C6烷氧基取代之伸苯基、或 噻吩二基; R4爲單鍵、 R5爲C3〜C8環烷基、 可經選自鹵素、鹵Ci〜c6烷基、…〜c6烷基、c3〜c8 環院基、C2〜C6稀基、C2〜快基、經基、疏基、C! •124- 200403216 〜C6烷氧基、(^〜C6烷硫基、羧基、Ci〜c6烷氧羧基 、胺甲醯基、硝基、氰基、可經C!〜C6烷基取代之胺 基、苯基、苯氧基、(^〜匕烷羰基、(^〜(:6烷羰氧基 、甲醯基、或Ci〜c6烷磺醯基之取代基取代之苯基或 萘基、 可經選自鹵素及(^〜(:6烷基之取代基取代之噻吩基、 苯駢噚唑基、苯駢噻唑基、二苯駢呋喃基、吡啶基、 四唑基、苯駢噻吩基、吡阱基或異噚唑基、或 嗎琳基; Y 爲 NHOH 或 0H ; 惟當Y爲ΝΗ0Η時,R2爲氫, 當R3爲可經硝基或(^〜〇6院氧基取代之伸苯基,r5爲 可經1〜(:6院基、Cl〜c6院氧基、Ci〜C6烷硫基、鹵 素、鹵(^〜(^6院基或苯基取代之苯基、或經 基取代之曝吩基、苯駢噚D坐基、苯餅瞎嗤基、二苯I幷 呋喃基、吡啶基、四唑基、苯駢嗔吩基、吡阱基或異 噚唑基。 2 ·如申請專利範圍第1項之化合物,其光學活性體或彼 等之製藥容許鹽,其係下式IV所示200403216 Patent application scope: 1 · A compound of formula I, its optically active substance or their pharmaceutically acceptable salt COY R5-R4-R3-S〇2-N R2 where R1 can be selected from halogen, C3 ~ C8 cycloalkyl, hydroxyl, carboxyl, and benzene (^ ~ c3 alkoxy substituted Ci ~ c6 alkyl, phenyl, may be substituted by a substituent selected from phenyl, nitro, halogen, hydroxyl, and carboxyl Substituted phenyl Ci ~ C6 alkyl or naphthyl &lt; ^ ~ (: 6 alkyl, or may be selected from Ci ~ C6 alkyl, Ci ~ C6 alkoxy, halogen, Ci ~ c6 alkylsulfonyl, Ci ~ C6 alkoxycarbonyl, Ci ~ c6 alkylcarbonyl, and indole substituted by indole Ci ~ C6 alkyl, thiazole Ci ~ c6 alkyl, benzothiazole C6 alkyl, pyridine Ci ~ C6 alkyl, or Benzimidazole Ci ~ c6; R2 is hydrogen, C6 alkyl which may be substituted by amine, or phenyl (^ ~ C6 alkyl); R3 is phenyl which may be substituted by nitro or C6 alkoxy, Or thiophene diyl; R4 is a single bond, R5 is a C3 ~ C8 cycloalkyl, can be selected from halogen, halogen Ci ~ c6 alkyl, ... ~ c6 alkyl, c3 ~ c8 ring courtyard, C2 ~ C6 dilute , C2 ~ Quick base, Jing base, Alkyl, C! • 124- 200403216 ~ C6 alkoxy, (^ ~ C6 alkylthio, carboxyl, Ci ~ c6 alkoxycarboxyl, carbamoyl, nitro, cyano, can pass C! ~ C6 alkyl A substituted amine group, a phenyl group, a phenoxy group, a phenyl group, a phenyl group, a phenyl group, a phenyl group, a phenyl group, a phenyl group, a phenyl group, a phenyl group, a phenyl group, a phenyl group, a phenyl group, a substituted group, Or naphthyl, thienyl, benzoxazolyl, benzoxazolyl, diphenylsulfanylfuranyl, pyridyl, tetrazolyl, substituted with a substituent selected from halogen and (^ ~ (: 6 alkyl), Phenylthiophene, pyrazolyl or isoxazolyl, or morphinyl; Y is NHOH or 0H; but when Y is NΗ0Η, R2 is hydrogen, and when R3 is nitro or (^ ~ 〇6 院) Oxygen-substituted phenyl, r5 can be substituted by 1 ~ (: 6 phenyl, Cl ~ c6 oxy, Ci ~ C6 alkylthio, halogen, halogen (^ ~ (^ 6 phenyl or phenyl substituted Phenyl, or phenyl substituted by phenyl, phenylhydrazone, phenylbenzoyl, diphenylfuranyl, pyridyl, tetrazolyl, phenylphenanyl, pyrazolyl, or isopropyl Oxazolyl. 2 · If the compound in the scope of patent application No. 1, Or the like of the optically active substance and pharmaceutically acceptable salt thereof, the system shown in formula IV 200403216 式中R 11爲單鍵, R7爲可經選自鹵素、鹵Cl〜C6烷基、。〜C6烷基、c3 〜C8環烷基、C2〜C6烯基、C2〜c6炔基、羥基、巯基 、Ci〜C6烷氧基、Ci〜C6烷硫基、羧基、Cl〜c6烷氧 羧基、胺甲醯基、硝基、氰基、可經Ci〜C6烷基取代 之fee基、本基、苯氧基、(^〜(^院鑛基、(^〜(]6院幾 氧基、甲醯基、或Cl〜C6烷磺醯基之取代基取代之苯 基或萘基、或可經選自鹵素及(^〜C6烷基之取代基取 代之噻吩基、苯駢噚唑基、苯駢噻唑基、二苯駢呋喃 基、吡啶基、四唑基、苯駢噻吩基、吡畊基或異噚唑 基; X爲硫原子; R1、R2及Y同申請專利範圍第1項之定義。 3 .如申請專利範圍第1項之化合物,其光學活性體或彼 等之製藥容許鹽,其係下式I ”所示 R1&quot; r5&quot;〇3&quot;_s0 1 人 C0Y Γ Br s 式中R1”爲4-噻唑甲基,(吲哚-3-基)甲基,(5-甲 氧基吲哚-3 -基)甲基,1 -萘甲基,2 -萘甲基,4 -聯苯 甲基,2,2, 2-三氟乙基,2-苯乙基,苄基,異丙基,4-硝苄基,仁氟苄基,環己基甲基,(卜甲基吲卩朵·3 -基 )甲基,(5 -甲基吲哚-3 -基)甲基,(5 ·氟吲哚-3 -基)甲基,(吡啶-4-基)甲基,(苯駢噻唑-2-基) -126- 200403216 甲基’(本基)(趁基)甲基,苯基,羧甲基,2_羧乙基 ,輕甲基,本甲氧甲基,4 -殘;基,(苯駢咪唑_ 2 _基 )甲基,(1-甲磺醯基吲哚_ 3 _基)甲基,或(卜乙氧 羰基吲哚-3 -基)甲基,R2 ”爲H ; R3 ”爲丨,仁伸苯基; R4”爲單鍵;R5,,爲3_甲氧苯基,4_甲氧苯基,仁甲苯 基’ 4-第三丁苯基,4·三氟甲苯基,4•氟苯基,4•甲 硫本基,4 -聯苯基,4 -噻吩基,苯駢噚唑_ 2 _基,苯駢 噻唑-2-基或四唑-2-基;γ爲NHOH或〇H。 4 ·如申請專利範圍第1項之化合物,其光學活性體或彼 等之製藥容許鹽,其係下式VIII所示200403216 In the formula, R 11 is a single bond, and R 7 is an alkyl group selected from halogen, halogen Cl ~ C6, and halogen. ~ C6 alkyl, c3 ~ C8 cycloalkyl, C2 ~ C6 alkenyl, C2 ~ c6 alkynyl, hydroxyl, mercapto, Ci ~ C6 alkoxy, Ci ~ C6 alkylthio, carboxyl, Cl ~ c6 alkoxycarboxy Carbamoyl group, nitro group, cyano group, fee group which can be substituted by Ci ~ C6 alkyl group, this group, phenoxy group, (^ ~ (^ 院 矿 基基, (^ ~ () 6 Phenyl, or naphthyl, substituted with a substituent of Cl ~ C6 alkylsulfonyl, or thienyl, benzoxazolyl, which may be substituted with a substituent selected from halogen and C ^ alkyl , Benzoxazolidyl, diphenylsulfanyl furanyl, pyridyl, tetrazolyl, benzoxanthienyl, pyryl, or isoxazolyl; X is a sulfur atom; R1, R2, and Y are the same as those in the scope of the patent application 3. The compound of item 1 of the scope of patent application, its optically active substance or their pharmaceutically acceptable salt, which is represented by the following formula I "R1 &quot; r5 &quot; 〇3 &quot; _s0 1 Human C0Y Γ Br s formula Where R1 ”is 4-thiazolylmethyl, (indol-3-yl) methyl, (5-methoxyindol-3-yl) methyl, 1-naphthylmethyl, 2-naphthylmethyl, 4 -Biphenylmethyl, 2,2, 2-trifluoroethyl, 2-phenethyl Benzyl, Isopropyl, 4-Nitrobenzyl, Enfluorobenzyl, Cyclohexylmethyl, (Methylindole · 3-yl) methyl, (5-methylindole-3 -yl) methyl , (5-fluoroindole-3 -yl) methyl, (pyridin-4-yl) methyl, (benzimidazol-2-yl) -126- 200403216 methyl '(benzyl) (anhydrobenzyl) methyl Methyl, phenyl, carboxymethyl, 2-carboxyethyl, light methyl, methoxymethyl, 4-residue; methyl, (benzimidazol-2-yl) methyl, (1-methylsulfonyl) Indole_3_yl) methyl, or (buethoxycarbonylindol-3-yl) methyl, R2 "is H; R3" is 丨, phenylene; R4 "is a single bond; R5 ,, It is 3-methoxyphenyl, 4-methoxyphenyl, i-tolyl '4-tert-butylphenyl, 4-trifluorotolyl, 4 • fluorophenyl, 4 • methylthiobenzyl, 4-biphenyl Phenyl, 4-thienyl, benzoxazol-2-yl, benzoxazol-2-yl or tetrazol-2-yl; γ is NHOH or 0H. 4 · Compounds as described in item 1 of the scope of patent application , Its optically active substance or their pharmaceutically acceptable salt, which is shown by the following formula VIII VIII 式中R1及R2同申請專利範圍第1項所定義,R7及RU 同申請專利範圍第2項所定義。 5 ·如申請專利範圍第1項之化合物,其光學活性體或彼 等之製藥容許鹽,其係下式XIII所示VIII In the formula, R1 and R2 are the same as those defined in item 1 of the scope of patent application, and R7 and RU are the same as those defined in item 2 of the scope of patent application. 5. If the compound in the scope of patent application item 1, its optically active substance or their pharmaceutically acceptable salt, is represented by the following formula XIII XIII 式中R1同申請專利範圍第1項所定義’ R7及R11同申 請專利範圍第2項所定義。 6 ·如申請專利範圍第1至5項中任一項之化合物,其光 學活性體或彼等之製藥容許鹽,其中R1及R1’’爲異芮 基,苄基或(吲哚-3 -基)甲基。In XIII, R1 is the same as defined in item 1 of the scope of patent application 'R7 and R11 are the same as defined in item 2 of the scope of patent application. 6. The compound as claimed in any one of claims 1 to 5, its optically active substance or their pharmaceutically acceptable salt, wherein R1 and R1 '' are isoryl, benzyl or (indole-3- Methyl). -127- 200403216 7 .如申請專利範圍第1至5項中任一項之化合物,其光 學活性體或彼等之製藥容許鹽,其中R5及R7爲烷氧 基,烷硫基或可有1或2個以上取代基之苯基。 8 .如申請專利範圍第1至5項中任一項之化合物,其光 學活性體或彼等之製藥容許鹽,其中R1及R1’’所鍵結 之不對稱碳之組態爲R組態。 9 . 一種用於金屬蛋白酶阻礙劑之醫藥組成物,內含如申 請專利範圍第1至5項中任一項之化合物。 1 0 . —種用於IV型膠原酶阻礙劑之醫藥組成物,內含如申 請專利範圍第1至5項中任一項之化合物。 -128- 200403216 柒、指定代表圖: (一) 本案指定代表圖為:第( )圖。 (二) 本代表圖之元件代表符號簡單說明: 捌、本案若有化學式時,請揭示最能顯示發明特徵的化學 式·· r5-r4-r3-s〇2-n coy I R2-127- 200403216 7. If the compound according to any one of claims 1 to 5, its optically active substance or their pharmaceutically acceptable salt, wherein R5 and R7 are alkoxy, alkylthio or may have 1 Or a phenyl group having two or more substituents. 8. If the compound of any one of claims 1 to 5 of the patent application scope, its optically active substance or their pharmaceutically acceptable salt, wherein the configuration of the asymmetric carbon bonded by R1 and R1 '' is R configuration . 9. A pharmaceutical composition for a metalloproteinase inhibitor, which contains a compound according to any one of claims 1 to 5 of the patent application scope. 10. A pharmaceutical composition for a type IV collagenase inhibitor, containing a compound such as any one of claims 1 to 5 of the patent application scope. -128- 200403216 (1) Designated representative map: (1) The designated representative map in this case is: (). (II) A brief description of the element representative symbols in this representative figure: 捌 If there is a chemical formula in this case, please disclose the chemical formula that can best show the characteristics of the invention ... r5-r4-r3-s〇2-n coy I R2
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