TW200301154A - Metal oxide dispersion - Google Patents

Metal oxide dispersion Download PDF

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TW200301154A
TW200301154A TW091136403A TW91136403A TW200301154A TW 200301154 A TW200301154 A TW 200301154A TW 091136403 A TW091136403 A TW 091136403A TW 91136403 A TW91136403 A TW 91136403A TW 200301154 A TW200301154 A TW 200301154A
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Taiwan
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metal oxide
metal
oxide dispersion
dispersion
copper
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TW091136403A
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Chinese (zh)
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TWI236931B (en
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Mutsuhiro Maruyama
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Asahi Chemical Ind
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Publication of TWI236931B publication Critical patent/TWI236931B/en

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Abstract

This invention provides a metal oxide dispersion which comprises a dispersion medium and dispersed therein a metal oxide having a particle diameter smaller than 200 nm, and which can form a thin metal film on a substrate through low-temperature heating. When the dispersion is applied to a substrate and then heated, a thin metal film is formed.

Description

20U30ii54 A7 B7 五、發明説明(1 ) 技術領域 (請先閲讀背面之注意事項再填寫本頁) 本發明係有關於’可形成金屬薄膜之金屬氧化物分散 體,及利用該分散體於基板上形成金屬薄膜之方法。又, 本發明亦係有關於多孔性金屬薄膜之製造方法。 先行技術 於基板上形成金屬薄膜之方法,向來習知有真空蒸鍍 法、濺鍍法、CVD法、鍍層法、金屬糊法等。其中,真空 蒸鍍法、濺鍍法、CVD法均有須昂貴之真空設備,且成膜 速度慢之問題。 以鍍層法於具導電性之基材上雖相較易於形成金屬薄 膜,但欲形成於絕緣基材上,因須先形成導電層,其程序 變得煩雜。且因鍍層法利用到溶液中之反應,產生大量廢 液,其處理費事,成本亦高。 經濟部智慧財產局員工消費合作社印製 金屬糊法係將金屬粒子分散於溶劑塗布於基材上,加 熱得金屬薄膜之方法,不須真空設備等特殊裝置,程序簡 化係其優點,但金屬粒子之熔化通常須有1000°C以上之高 溫。因此,基材限於陶瓷等具耐熱性之基材,且易有基材 因熱受損,經加熱產生殘留應力致基材損傷等問題。 另一方面,降低金屬粒子之粒徑,以降低金屬糊之煅 燒溫度之技術已爲所知。例如專利第25 6 1 5 37號說明書揭 示,利用粒徑1 00奈米以下之金屬微粒子之分散體形成金 屬薄膜之方法。然而,其所需之100奈米以下的金屬粒子 之製造方法,係將低壓下揮發之金屬蒸氣快速冷卻之方法 本紙張尺度適用中國國家標準(CNS ) A4規格(210X 297公釐) -5- 200301154 A7 B7 五、發明説明(2 ) (請先閲讀背面之注意事項再填寫本頁) ’難以大量生產,並有金屬粒子成本非常之高的問題。金 屬氧化物粒子分散而成的金屬氧化物糊用於形成金屬薄膜 之方法亦係已知。日本專利特開平5-9 8 1 95號公報揭示,加 熱含結晶性高分子,粒徑300奈米以下之金屬氧化物分散 而成的金屬氧化物糊,使結晶性高分子分解,得金屬薄膜 之方法。然而,該方法須先分散300奈米以下之金屬氧化 物於結晶性高分子中,極其費事以外,結晶性高分子之分 解須40(TC至900°C之高溫。因此,可用基材須具該溫度以 上之耐熱性,有可用基材受限之問題。 如上,以金屬粒子或金屬氧化物之分散體塗布於基板 上,經加熱處理得金屬薄膜之方法,製程成本低。但使用 金屬粒子之方法,有粒子極其昂貴之問題。而使用金屬氧 化物粒子之方法,須先將粒子分散於結晶性高分子中,焚 化結晶性高分子所須加熱處理有溫度高之問題,目前尙未 實用化。尤以在消費產品領域所用之樹脂基材上的金屬薄 膜之形成更難以採用。另一方面,以較低溫作加熱處理則 難得多孔性之金屬薄膜。 經濟部智慧財產局員工消費合作社印製 金屬多孔體膜之製造方法,已知有鍍層法、漿體法。 .鍍層法係以碳粉等附著於聚氨酯泡棉等發泡樹脂骨架表面 賦予導電性,於其上鍍出金屬,然後焚化發泡樹脂及碳粉 ,得金屬多孔體之方法。然而該方法製程煩雜。另一方面 ,漿體法係以金屬粉末或金屬纖維浸滲塗布於聚氨酯等發 泡樹脂骨架表面,然後加熱焚化樹脂成分燒結金屬粉末得 金屬多孔體之方法。該方法因浸滲於多孔性樹脂,原料金 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) -6- 20030 A7 B7 五、發明説明(3 ) (請先閲讀背面之注意事項再填寫本頁) 屬粉末或金屬纖維粒徑須小,通常在數十微米至數百微米 。然而,小粒徑金屬粉末之製造,須熔融金屬之噴霧、粉 碎等煩雜製程,故原料昂貴。又,小粒徑之金屬粉末因表 面積大,有引燃、爆炸之危險,故製造設備成本高。又再 ,所得多孔體之孔徑因反映所浸滲之發泡樹脂之孔徑,在 數十微米以上。 不用金屬粉末,以金屬氧化物粉末與樹脂粘結劑混合 ,以模具形成特定形狀,再於氧化性環境氣體中加熱,焚 化樹脂粘結劑得多孔性金屬氧化物燒結體,隨後於還原性 環境氣體中锻燒以得金屬多孔體之方法亦係已知(特開平5-195110號公報)。然而,該方法雖有能以廉價金屬氧化物原 料製作孔徑約1微米之小孔徑金屬多孔體之優點,但因須 加壓過程,有製程煩雜之問題。並且,用作樹脂結合劑之 樹脂係聚乙烯醇樹脂、縮丁醛樹脂、壓克力樹脂等親水性 樹脂,欲完全焚化壓縮狀態下之此等粘結劑須1 〇〇〇°C以上 之高溫,必須要有高溫煅燒設備,係製造設備上之問題。 經濟部智慧財產局員工消費合作社印製 金屬氧化物粉末與有機粘結劑混合’不經加壓成形’ 於還原氣體中煅燒,因有機粘結劑不在壓縮環境下,可於 較低溫,例如使用聚乙烯醇粘結劑時之700°C去除(特表 2 0 0 0 - 5 0 0 8 2 6號公報)。但因金屬氧化物粒子間未經壓縮, 還原得之金屬粒子間不相熔合,僅得造粒之金屬粉末,不 得金屬多孔體。 亦即,使用金屬氧化物’不經加壓過程等煩雜過程’ 且以低溫得1微米以下小孔徑之多孔性金屬薄膜之方法’ 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) C ( ώ^3〇ΐί54 A7 ____B7 五、發明説明(4 ) 尙未存在。 (請先閱讀背面之注意事項再填寫本頁) 因而,本發明之課題即在提供廉價,以低溫加熱處理 ’可於基材上形成密合性高之薄膜的金屬氧化物分散體, 及使用該金屬氧化物分散體,於基材上製造金屬薄膜之方 法。又,亦提供多孔性金屬薄膜之製造方法。 發明之揭不 本發明人爲解決上述課題精心探討,終於完成本發明 〇 亦即,本發明如下。 1. 含粒徑不及200奈米之金屬氧化物及分散媒體之金屬 氧化物分散體,其分散媒體含多元醇及/或聚醚化合物。 2. 上項1之金屬氧化物分散體,其中多元醇之碳原子數 在10以下。 3 ·上項1或2之金屬氧化物分散體,其中多元醇係糖醇 經濟部智慧財產局員工消費合作社印製 4. 上項1至3中任一項之金屬氧化物分散體,其中聚醚 化合物係以碳原子數2至8之直鏈及環狀氧化烯基爲重複 單元之脂族聚醚。 5. 上項1至4中任一項之金屬氧化物分散體,其中聚醚 化合物之分子量在150以上600以下。 6 ·上項5之金屬氧化物分散體,其中聚醚化合物係分子 量250以上1500以下之聚乙二醇及/或聚丙二醇。 7·上項1至6中任一項之金屬氧化物分散體,其中由金 本紙張尺度適用中國國家標準(CNS ) A4規格(2丨〇><297公* ) -8 - C 说 2GU30ii54 A7 __ B7 五、發明説明(5 ) 屬氧化物還原得之金屬,體積電阻値在IX 1〇·4歐姆公分以 下。 8·上項1至7中任一項之金屬氧化物分散體,其中金屬 氧化物係氧化銅或氧化銀。 9·上項8之金屬氧化物分散體,其中金屬氧化物係氧化 亞銅。 10.上項1至9中任一項之金屬氧化物分散體,其中金 屬氧化物之含量’占金屬氧化物分散體爲總重量之5至90 重量%。 11·上項1至10中任一項之金屬氧化物分散體,其中含 金屬粉’並且該金屬粉與金屬氧化物微粒合計占金屬氧化 物分散體總重量的5重量%以上90重量。/〇以下。 12. 上項11之金屬氧化物分散體,其中上述金屬粉含至 少一種選自金、銀、銅、鈀、鉑、鎳、鉻 '鋁、錫、鋅、 駄、鶴、組、鎖、錢、釘、餓、f必、銃、姑、麵、鐵、錯 所成群之金屬。 13. 上項1至12中任一項之金屬氧化物分散體,其中含 熱固性樹脂,其占金屬氧化物分散體總重量之1至20重量 % 〇 14·上項1至13中任一項之金屬氧化物分散體,其中含 除多元醇及聚醚化合物以外,含可還原金屬氧化物之還原 劑,其占金屬氧化物分散體總重量之0· 1至70重量%。 15.上項1至14中任一項之金屬氧化物分散體,其中多 元醇之含量係占金屬氧化物分散體總重量0.1重量%以上95 本紙張尺^^中國國家標準( CNS ) A4規格(210X297公羡1 (請先閲讀背面之注意事項再填寫本頁) C· 訂 經濟部智慧財產局員工消費合作社印製 -9- C200301154 A7 B7 .五、發明説明(6 ) 重量%以下。 (請先閲讀背面之注意事項再填寫本頁) 16·上項1至15中任一項之金屬氧化物分散體,其中聚 醚化合物之含量係占金屬氧化物分散體總重量的〇.1至70 重量%。 17. 上項1至15中任一項之金屬氧化物分散體,其中聚 醚化合物之含量占金屬氧化物分散體總重量不及〇.丨重量% 〇 18. 鍛燒上項16之金屬氧化物分散體所得,多數一次粒 徑不及200奈米之金屬微粒集結,接觸部份熔合形成之金 '屬薄膜。 1 9 ·上項1 7之金屬氧化物分散體锻燒而得,多數一次粒 徑不及2 0 0奈米之金屬微粒集結,接觸部份熔合形成之具 多孔構造的金屬薄膜。 2 〇.包含將上項1至16中任一項之金屬氧化物分散體塗 布於基板後作加熱處理的金屬薄膜製造方法。 2 1.上項2〇之金屬薄膜製造方法,其中包含,於非氧化 性環境氣體中作加熱處理。 經濟部智慧財產局員工消費合作社印製 22. 上項2〇之金屬薄膜製造方法,其中包含,以金屬氧 化物分散體塗布於基板後’於鈍性環境氣體中加熱锻燒, 隨後在還原性環境氣體中加熱锻燒。 23. 上項2〇至22中任一項之金屬薄膜製造方法,其中 加熱處理溫度在50°c以上500°c以下。 發明之最佳實施形態 Γ ί ? , 人 - - 10- 20ϋ301ι54 Α7 Β7 五、發明説明(7 ) 以下詳細說明本發明。 如上述,本發明之金屬氧化物分散體包含粒徑不及200 奈米之金屬氧化物及分散媒體等必要成分。又,本發明金 屬氧化物分散體,其特徵爲··分散媒體包含多元醇及/或 聚醚化合物。以下說明此等成分。 用於本發明之金屬氧化物,其粒徑不及200奈米,不 及100奈米爲較佳,不及30奈米又更佳。在此,粒徑指一 次粒徑,可藉電子顯微鏡等之形態觀察測定。粒徑不及 200奈米時因金屬氧化物還原得之金屬微粒小,其表面能量 變大,熔點下降,金屬粒子間應可藉低溫熔合形成金屬薄 膜。金屬氧化物粒徑愈小,金屬氧化物粒子之還原變容易 ,故由還原難易之觀點,金屬氧化物粒子愈小愈佳。金屬 氧化物之粒徑在200奈米以上時,還原處理所得金屬粒子 間之熔合不足,不得緻密強固之結構體。另一方面,粒徑 不及1 00奈米時因可用作擠出微小液滴形成微細配線之噴 墨法的導電墨料,適用於不經鈾刻處理之微細電路的形成 〇 金屬氧化物若係經加熱處理可還原者均可使用。各金 屬氧化物粒子由單一金屬氧化物構成亦可,由多數之金屬 氧化物構成之複合金屬氧化物亦佳。還原金屬氧化物而得 之金屬,其體積電阻値以lx 1〇_4歐姆公分以下爲佳,lx 1 〇·5歐姆公分以下更佳。使用如此之金屬氧化物因所得金屬 薄膜之導電性高故較佳。此類金屬氧化物有例如氧化銀、 氧化銅、氧化鈀、氧化鎳、氧化鉛、氧化鈷等。其中,因 本紙張尺度適用中國國家標準(CNS ) A4規格(2ωχ297公趁) (請先閲讀背面之注意事項再填寫本頁) 、τ 經濟部智慧財產局員工消費合作社印製 200301154 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明説明(8 ) 容易還原且還原後導電度高,以氧化銅及氧化銀爲特佳。 銀氧化物有氧化第一銀、氧化第二銀及氧化第三銀等,銀 之氧化態無限,基於粒子之安定性,以氧化第一銀爲佳。 銅氧化物有氧化亞銅及氧化銅等,銅之氧化態無限,因易 於還原成金屬銅,以氧化亞銅爲特佳。 此等金屬氧化物可用市售品,亦可利用已知合成方法 合成。市售品有CI化成(股)之平均粒徑約30奈米(標稱)之 氧化銅粒子。又,粒徑不及200奈米之氧化亞銅的合成方, 法,已知有乙醯丙酮根銅錯合物在聚醇溶劑中於約200°C加 熱合成之方法(Angewandt Chemie Internation Edtiion, No.40,V〇l.2,ρ.359·2001),有機銅化合物(銅-N-亞硝基苯 基羥胺錯合物)於十六胺等保護劑存在下,在鈍性環境氣體 中,於約3 00 °C之高溫加熱的方法(J. Am. Che m. So c.,1999 ,vol. 12 1,p. 1 1 595) ° 又,用於本發明之金屬氧化物粒徑在200奈米以下, 僅須加熱處理時無妨於粒子間之熔合,金屬氧化物粒子之 一部份亦能用可還原之金屬氧化物以外之材料取代。可還 原之金屬氧化物以外之材料,有例如金屬,以500°C以下之 加熱不還原之金屬氧化物,或有機化合物,中心部份係金 屬,表面以金屬氧化物覆蓋之芯-殼型金屬-金屬氧化物複合 微粒即係一例。 用於本發明之金屬氧化物微粒,在金屬氧化物分散體 中互相微弱凝集亦無妨,以網印塗布時可於印刷前再分散 使凝集體不堵塞網目者爲較佳。又,在噴墨塗布之用途 (請先聞讀背面之注意事項再填寫本頁) 本纸張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) -12-20U30ii54 A7 B7 V. Description of the invention (1) Technical field (please read the precautions on the back before filling this page) The present invention relates to a metal oxide dispersion capable of forming a metal thin film, and the use of the dispersion on a substrate Method for forming metal thin film. The present invention also relates to a method for producing a porous metal thin film. A prior art method of forming a metal thin film on a substrate has conventionally been known as a vacuum evaporation method, a sputtering method, a CVD method, a plating method, and a metal paste method. Among them, the vacuum evaporation method, the sputtering method, and the CVD method have the problems of requiring expensive vacuum equipment and slow film formation. Although it is relatively easy to form a metal thin film on a conductive substrate by the plating method, if it is to be formed on an insulating substrate, a conductive layer must be formed first, and the procedure becomes complicated. In addition, due to the reaction of the solution in the plating method, a large amount of waste liquid is generated, which is laborious and expensive. The method of printing metal paste by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs is the method of dispersing metal particles in a solvent and coating it on a substrate, and heating to obtain a metal film. Special devices such as vacuum equipment are not required. The simplified procedure is its advantage, but metal particles Melting usually requires a high temperature above 1000 ° C. Therefore, the substrate is limited to substrates with heat resistance such as ceramics, and is prone to problems such as damage to the substrate due to thermal damage and residual stress caused by heating. On the other hand, a technique for reducing the particle diameter of the metal particles to reduce the firing temperature of the metal paste is known. For example, Patent No. 25 6 1 5 37 discloses a method for forming a metal thin film by using a dispersion of metal fine particles having a particle size of 100 nm or less. However, the manufacturing method of the metal particles below 100 nanometers required is a method of rapidly cooling metal vapors volatilized under low pressure. The paper size is applicable to the Chinese National Standard (CNS) A4 specification (210X 297 mm) -5- 200301154 A7 B7 V. Description of the invention (2) (Please read the notes on the back before filling out this page) 'It is difficult to mass produce and the cost of metal particles is very high. A method of forming a metal oxide paste in which metal oxide particles are dispersed for forming a metal thin film is also known. Japanese Patent Laid-Open No. 5-9 8 1 95 discloses that a metal oxide paste obtained by dispersing a metal oxide containing a crystalline polymer and having a particle diameter of 300 nm or less is decomposed to obtain a metal thin film. Method. However, this method must first disperse metal oxides below 300 nanometers in the crystalline polymer, which is extremely troublesome. The decomposition of the crystalline polymer requires a high temperature of 40 (TC to 900 ° C. Therefore, the available substrate must be With heat resistance above this temperature, there is a problem that the available substrate is limited. As mentioned above, the method of coating metal particles or metal oxide dispersions on a substrate and heating to obtain a metal thin film has a low manufacturing cost. However, the use of metal The method of particles has the problem that the particles are extremely expensive. The method of using metal oxide particles must first disperse the particles in the crystalline polymer. The heat treatment required for incineration of the crystalline polymer has a high temperature problem, which is currently not practical. In particular, the formation of metal thin films on resin substrates used in the field of consumer products is more difficult to adopt. On the other hand, porous metal films are difficult to obtain at lower temperatures for heat treatment. The method for producing a porous metal film is known as a plating method or a slurry method. The plating method is a method in which carbon powder or the like is attached to hair such as polyurethane foam. The surface of the resin skeleton is provided with conductivity, and a metal is plated thereon, and then the foamed resin and carbon powder are incinerated to obtain a porous metal body. However, the method has a complicated process. On the other hand, the slurry method uses metal powder or metal fibers. A method of impregnating and coating on the surface of a foamed resin frame such as polyurethane, and then heating and incinerating the resin component to sinter a metal powder to obtain a porous metal body. This method is impregnated with a porous resin, and the paper size of the raw material is in accordance with Chinese National Standard (CNS) A4 Specifications (210X297 mm) -6- 20030 A7 B7 V. Description of the invention (3) (Please read the precautions on the back before filling this page) The diameter of the powder or metal fiber must be small, usually in the range of tens of microns to hundreds Micron. However, the production of small-sized metal powder requires complicated processes such as spraying and smashing of molten metal, so the raw materials are expensive. Also, because of the large surface area of metal powder, there is a danger of ignition and explosion, so manufacturing equipment The cost is high. Furthermore, the pore diameter of the obtained porous body reflects the pore diameter of the foamed resin impregnated, which is more than tens of micrometers. The oxide powder is mixed with the resin binder, formed into a specific shape with a mold, and then heated in an oxidizing ambient gas. The resin binder is incinerated to obtain a porous metal oxide sintered body, and then calcined in a reducing ambient gas to obtain A method of a porous metal body is also known (Japanese Laid-Open Patent Publication No. 5-195110). However, although this method has the advantage of being able to produce a small-pore metal porous body having a pore size of about 1 micron from cheap metal oxide raw materials, The pressing process has the problem of complicated manufacturing process. In addition, resins such as polyvinyl alcohol resins, butyral resins, and acrylic resins, which are used as resin binders, are intended to completely incinerate these adhesives in a compressed state. High temperature above 1000 ° C, high temperature calcining equipment is required, which is a problem in manufacturing equipment. The Ministry of Economic Affairs, Intellectual Property Bureau, Consumer Cooperatives, printed metal oxide powder and organic binder are mixed without pressure. Forming 'Calcined in a reducing gas, because the organic binder is not in a compressed environment, it can be removed at a lower temperature, such as 700 ° C when using a polyvinyl alcohol binder (Special Table 2 0 0 0-5 0 0 8 2 6). However, since the metal oxide particles are not compressed, the reduced metal particles are not fused with each other, and only granulated metal powder is obtained, and no porous metal body is obtained. That is, a method for obtaining a porous metal film with a small pore diameter of less than 1 micron at a low temperature by using a metal oxide 'without a complicated process such as a pressurization process' This paper size is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) ) C (his ^ 3〇ΐί54 A7 ____B7 V. Description of the invention (4) 尙 does not exist. (Please read the precautions on the back before filling this page) Therefore, the problem of the present invention is to provide low-cost, low-temperature heat treatment. A metal oxide dispersion capable of forming a highly adherent thin film on a substrate, and a method for producing a metal thin film on a substrate using the metal oxide dispersion. A method for producing a porous metal thin film is also provided. Disclosure of the invention The inventors have carefully studied to solve the above problems and finally completed the present invention. That is, the present invention is as follows: 1. A metal oxide dispersion containing a metal oxide having a particle size of less than 200 nm and a dispersion medium, which The dispersion medium contains a polyol and / or a polyether compound. 2. The metal oxide dispersion of the above item 1, wherein the number of carbon atoms of the polyol is less than 10. 3 · The metal oxygen of the above item 1 or 2 Polydisperse dispersion, which is printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs of the Sugar Alcohol 4. The metal oxide dispersion of any one of the above items 1 to 3, wherein the polyether compound is based on a carbon number of 2 to 8 Aliphatic polyethers in which the linear and cyclic oxyalkylene groups are repeating units. 5. The metal oxide dispersion of any one of items 1 to 4 above, wherein the molecular weight of the polyether compound is from 150 to 600. 6 · The metal oxide dispersion of the above item 5, wherein the polyether compound is polyethylene glycol and / or polypropylene glycol having a molecular weight of 250 to 1500. 7. The metal oxide dispersion of any one of the above items 1 to 6, wherein The gold paper size is applicable to the Chinese National Standard (CNS) A4 specification (2 丨 〇 < 297 Gong *) -8-C said 2GU30ii54 A7 __ B7 V. Description of the invention (5) It is a metal derived from oxide reduction, The volume resistance is below IX 10.4 ohm centimeters. 8. The metal oxide dispersion of any one of the above items 1 to 7, wherein the metal oxide is copper oxide or silver oxide. 9. The metal oxidation of the above item 8 Dispersion, in which the metal oxide is cuprous oxide. 10. Item 1 to 9 above The metal oxide dispersion according to any one, wherein the content of the metal oxide is 5 to 90% by weight based on the total weight of the metal oxide dispersion. 11. The metal oxide dispersion according to any one of 1 to 10 above. Wherein the metal powder is contained therein and the metal powder and the metal oxide fine particles together account for 5% by weight to 90% by weight of the total weight of the metal oxide dispersion. 12. The metal oxide dispersion of the above item 11, wherein the above The metal powder contains at least one member selected from the group consisting of gold, silver, copper, palladium, platinum, nickel, chromium'aluminum, tin, zinc, osmium, crane, group, lock, money, nail, hungry, f will, urn, noodle, noodle, Iron, wrong metals. 13. The metal oxide dispersion according to any one of the above items 1 to 12, which contains a thermosetting resin, which accounts for 1 to 20% by weight of the total weight of the metal oxide dispersion. 014. Any one of the above items 1 to 13 A metal oxide dispersion containing a reducing agent containing a reducible metal oxide in addition to a polyol and a polyether compound, which accounts for 0.1 to 70% by weight of the total weight of the metal oxide dispersion. 15. The metal oxide dispersion of any one of items 1 to 14 above, wherein the content of the polyhydric alcohol is more than 0.1% by weight of the total weight of the metal oxide dispersion. 95 paper rule ^^ Chinese National Standard (CNS) A4 specification (210X297 Public Envy 1 (Please read the notes on the back before filling this page) C. Order printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs -9- C200301154 A7 B7. V. Description of the invention (6) Weight% or less. Please read the precautions on the back before filling out this page) 16. The metal oxide dispersion of any one of items 1 to 15 above, wherein the content of the polyether compound is 0.1 to 1 of the total weight of the metal oxide dispersion 70% by weight. 17. The metal oxide dispersion according to any one of the above items 1 to 15, wherein the content of the polyether compound accounts for less than the total weight of the metal oxide dispersion by 〇. 丨 wt% 〇18. Calcining the above item 16 Most of the metal oxide dispersions obtained from metal oxide dispersions have a primary particle size of less than 200 nanometers, and the contacting part is fused to form gold. It is a thin film. 1 9 · The above item 17 is obtained by calcining the metal oxide dispersion. Most primary particles are less than 200 nanometers It is a metal thin film with a porous structure formed by agglomeration of fine particles and fusion of contact portions. 2. The method includes a method for manufacturing a metal thin film by applying the metal oxide dispersion of any one of the above items 1 to 16 to a substrate. 2 1. The method of manufacturing a metal thin film according to the above item 20, which includes heat treatment in a non-oxidizing ambient gas. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 22. The method of manufacturing a metal thin film according to the above item 20, wherein Including, after the metal oxide dispersion is coated on the substrate, it is heated and calcined in a passive ambient gas, and then heated and calcined in a reducing ambient gas. 23. Manufacturing of a metal thin film according to any one of the above 20 to 22 Method, wherein the heat treatment temperature is above 50 ° c and below 500 ° c. The best embodiment of the invention Γ ί?, Human-10-20 20301301 54 A7 B7 5. Description of the invention (7) The invention will be described in detail below. The metal oxide dispersion of the present invention contains necessary components such as a metal oxide having a particle size of less than 200 nm, a dispersion medium, and the like. The metal oxide dispersion of the present invention is characterized by ... The bulk medium contains a polyol and / or a polyether compound. These components are described below. The metal oxide used in the present invention has a particle size of less than 200 nm, preferably less than 100 nm, and more preferably less than 30 nm. Here, the particle size refers to the primary particle size, which can be measured by morphological observation with an electron microscope, etc. When the particle size is less than 200 nanometers, the metal particles reduced by metal oxides are small, the surface energy becomes large, the melting point decreases, and the metal particles It should be possible to form a metal thin film by low-temperature fusion. The smaller the particle size of the metal oxide, the easier the reduction of the metal oxide particles, so from the viewpoint of the ease of reduction, the smaller the metal oxide particles, the better. When the particle diameter of the metal oxide is 200 nm or more, the fusion between the metal particles obtained by the reduction treatment is insufficient, and a dense and strong structure cannot be used. On the other hand, when the particle size is less than 100 nanometers, it can be used as a conductive ink for the inkjet method for extruding tiny droplets to form fine wiring. It is suitable for the formation of fine circuits without uranium etching. Anyone that can be reduced by heat treatment can be used. Each metal oxide particle may be composed of a single metal oxide, and a composite metal oxide composed of a plurality of metal oxides is also preferable. The volume resistance 金属 of a metal obtained by reducing a metal oxide is preferably 1 × 10 ohm cm or less, and more preferably 1 × 0.5 ohm cm or less. The use of such a metal oxide is preferable because the obtained metal thin film has high conductivity. Such metal oxides are, for example, silver oxide, copper oxide, palladium oxide, nickel oxide, lead oxide, cobalt oxide, and the like. Among them, because this paper size applies the Chinese National Standard (CNS) A4 specification (2ωχ297), (please read the precautions on the back before filling this page), τ printed by the Intellectual Property Bureau of the Ministry of Economic Affairs and Consumer Cooperatives 200301154 A7 B7 Ministry of Economic Affairs Printed by the Intellectual Property Bureau's Consumer Cooperatives V. Invention Description (8) Easy reduction and high conductivity after reduction, especially copper oxide and silver oxide. Silver oxides include the first silver oxide, the second silver oxide, and the third silver oxide. The oxidation state of silver is infinite. Based on the stability of the particles, the first silver oxide is preferred. Copper oxides include cuprous oxide and cuprous oxide. The oxidation state of copper is unlimited. It is easy to reduce to copper, and cuprous oxide is particularly preferred. These metal oxides may be commercially available, or they may be synthesized by a known synthesis method. Commercially available products have copper oxide particles with an average particle size of about 30 nanometers (nominal) formed by CI. In addition, for a method for synthesizing cuprous oxide having a particle size of less than 200 nm, a method of heating and synthesizing an acetonylacetone copper complex in a polyalcohol at about 200 ° C (Angewandt Chemie Internation Edtiion, No .40, V.l.2, ρ.359 · 2001), organocopper compounds (copper-N-nitrosophenylhydroxylamine complex) in the presence of a protective agent such as hexadecylamine, in an inert ambient gas , Heating method at a high temperature of about 3 00 ° C (J. Am. Che m. So c., 1999, vol. 12 1, p. 1 1 595) ° Also, the particle size of the metal oxide used in the present invention Below 200 nanometers, it is possible to fuse between the particles only when heat treatment is required. Part of the metal oxide particles can also be replaced with materials other than reducible metal oxides. Materials other than reducible metal oxides include, for example, metals, metal oxides that are not reduced by heating below 500 ° C, or organic compounds, the central part of which is metal, and the surface of which is covered with metal oxides. -Metal oxide composite fine particles are an example. The metal oxide fine particles used in the present invention may be weakly agglomerated with each other in the metal oxide dispersion, and when screen-printed and coated, they can be dispersed again before printing so that the aggregates do not block the mesh. In addition, for the application of inkjet coating (please read the precautions on the back before filling out this page) This paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) -12-

20U30I 5 4 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明説明(9 ) 中,凝集體之粒徑以不及1 00奈米爲佳。此等凝集體可係 二次凝集體,其粒徑可藉雷射散射法測出。 金屬氧化物之重量占金屬氧化物分散體總重量之5重 量%以上95重量%以下,1〇重量%以上80重量%以下爲較 佳。不及5重量%時,單次的塗布•锻燒所得金屬薄膜厚度 低,而超過95重量%時,分散體粘度過高,有難以塗布於 基材上之問題。 用於本發明之分散媒體係有機溶劑及/或水,有機分 散媒體之例,有液態之醇系溶劑、酮系溶劑、醯胺系溶劑 、酯系溶劑及醚系溶劑。 在此,醇系溶劑有甲醇、乙醇、正丙醇、異丙醇、正 丁醇、異丁醇、二級丁醇、三級丁醇、正戊醇、異戊醇、 2-甲基丁醇、二級戊醇、三級戊醇、3-甲氧基丁醇、正己醇 、2-甲基戊醇、二級己醇、2-乙基丁醇、二級庚醇、庚醇-3 、正辛醇、2-乙基己醇、二級辛醇、正壬醇、2,6-二甲基 庚醇-4、正癸醇、二級十一醇、三甲基壬醇、二級十四醇 、二級十七醇、酚、環己醇、甲基環己醇、3,3,5-三甲基 環己醇、苯甲醇、二丙酮醇等單醇溶劑,及乙二醇、1,2-丙二醇、1,3-丁二醇、戊二醇-2,4、2-甲基戊二醇-2,4、 己二醇-2,5、庚二醇-2,4、2-乙基己二醇-1,3、二乙二醇 、二丙二醇、己二醇、辛二醇、三乙二醇、三丙二醇、甘 油等多元醇溶劑,及乙二醇單甲醚、乙二醇單乙醚、乙二 醇單丙醚、乙二醇單丁醚、乙二醇單己醚、乙二醇單苯醚 、乙二醇單2-乙基丁醚、二乙二醇單甲醚、二乙二醇單乙 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) (請先閲讀背面之注意事項再填寫本頁)20U30I 5 4 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 5. In the description of invention (9), the particle size of the aggregate is preferably less than 100 nanometers. These aggregates can be secondary aggregates, and their particle size can be measured by laser scattering. The weight of the metal oxide is preferably 5 weight% to 95 weight%, and more preferably 10 weight% to 80 weight%. If it is less than 5% by weight, the thickness of the metal film obtained by a single coating and calcination is low, and when it exceeds 95% by weight, the dispersion viscosity is too high, and it may be difficult to apply it to a substrate. The dispersion medium used in the present invention is an organic solvent and / or water. Examples of the organic dispersion medium include liquid alcohol solvents, ketone solvents, amidine solvents, ester solvents, and ether solvents. Here, the alcohol-based solvents include methanol, ethanol, n-propanol, isopropanol, n-butanol, isobutanol, secondary butanol, tertiary butanol, n-pentanol, isoamyl alcohol, and 2-methylbutanol. Alcohol, secondary pentanol, tertiary pentanol, 3-methoxybutanol, n-hexanol, 2-methylpentanol, secondary hexanol, 2-ethylbutanol, secondary heptanol, heptanol- 3, n-octanol, 2-ethylhexanol, secondary octanol, n-nonanol, 2,6-dimethylheptanol-4, n-decanol, secondary undecanol, trimethylnonanol, Monotetradecanol, secondary heptadecanol, phenol, cyclohexanol, methylcyclohexanol, 3,3,5-trimethylcyclohexanol, benzyl alcohol, diacetone alcohol and other monoalcohol solvents, and ethyl alcohol Diol, 1,2-propanediol, 1,3-butanediol, pentanediol-2,4, 2-methylpentanediol-2,4, hexanediol-2,5, heptanediol-2 Polyol solvents such as 4,2-ethylhexanediol-1,3, diethylene glycol, dipropylene glycol, hexanediol, octanediol, triethylene glycol, tripropylene glycol, glycerol, and ethylene glycol mono Methyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, ethylene glycol monohexyl ether, ethylene glycol monophenyl ether, ethylene glycol mono-2-ethyl ether Butyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl this paper scale applicable Chinese National Standard (CNS) A4 size (210X297 mm) (Please read the back of the precautions to fill out this page)

-13- C200301154 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明説明(10) 醚、二乙二醇單丙醚、二乙二醇單丁醚、二乙二醇單己醚 、丙二醇單甲醚、丙二醇單乙醚、丙二醇單丙醚、丙二醇 單丁醚、二丙二醇單甲醚 '二丙二醇單乙醚、二丙二醇單 丙醚等多元醇部份醚溶劑等。此等醇系溶劑可1種或2種 以上同時使用。 酮系溶劑有丙酮、丁酮、曱基正丙基酮、甲基正丁基 酮、二乙基酮、甲基異丁基酮、甲基正戊基酮、乙基正丁 基酮、甲基正己基酮、二異丁基酮、三甲基壬酮、環己酮 、2-環己酮、甲基環己酮、2,4 -戊二酮、丙酮基丙酮、甲 基苯基酮,以及乙醯丙酮、2,4 -己二醇、2,4 -庚二酮、3 ,5-庚二酮、2,4-辛二酮、3,5-辛二酮、2,4-壬二醇、3 ,5 -壬二酮、5 -甲基-2,4 -己二酮、2,2,6,6 -四甲基-3, 5-庚二酮、1,1,1,5,5,5-六氟-2,4-庚二酮等 /3-二酮 類等。 醯胺系溶劑有甲醯胺、N-甲基甲醯胺、N,N-二甲基甲 醯胺、N-乙基甲醯胺、N,N-二乙基甲醯胺、乙醯胺、N-甲 基乙醯胺、N,N-二甲基乙醯胺、N-乙基乙醯胺、N,N-二 乙基乙醯胺、N-曱基丙醯胺、N-甲基吡咯烷酮、N-甲醯基 嗎啉、N-甲醯基哌啶、N-甲醯基吡咯烷、N-乙醯基嗎啉、 N-乙醯基哌啶、N-乙醯基吡咯烷等。 酯系溶劑有碳酸二乙酯、碳酸乙烯酯、碳酸丙烯酯、 碳酸二乙酯、醋酸甲酯、醋酸乙酯、r -丁內酯、r -戊內酯 、醋酸正丙酯、醋酸異丙酯、醋酸正丁酯、醋酸異丁酯、 醋酸二級丁酯、醋酸正戊酯、醋酸二級戊酯、醋酸3 -甲氧 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) (請先閲讀背面之注意事項再填寫本頁)-13- C200301154 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 V. Description of the invention (10) Ether, diethylene glycol monopropyl ether, diethylene glycol monobutyl ether, diethylene glycol monohexyl ether, propylene glycol Monomethyl ether, propylene glycol monoethyl ether, propylene glycol monopropyl ether, propylene glycol monobutyl ether, dipropylene glycol monomethyl ether 'dipropylene glycol monoethyl ether, dipropylene glycol monopropyl ether and other polyol partial ether solvents. These alcohol solvents can be used singly or in combination of two or more kinds. Ketone solvents include acetone, methyl ethyl ketone, methyl ethyl n-propyl ketone, methyl n-butyl ketone, diethyl ketone, methyl isobutyl ketone, methyl n-pentyl ketone, ethyl n-butyl ketone, and methyl ethyl ketone. N-hexyl ketone, diisobutyl ketone, trimethylnonanone, cyclohexanone, 2-cyclohexanone, methylcyclohexanone, 2,4-pentanedione, acetone acetone, methylphenyl ketone And acetone, 2,4-hexanediol, 2,4-heptanedione, 3,5-heptanedione, 2,4-octanedione, 3,5-octanedione, 2,4- Nonanediol, 3,5-nonanedione, 5-methyl-2,4-hexanedione, 2,2,6,6-tetramethyl-3,5-heptanedione, 1,1,1 , 5,5,5-hexafluoro-2,4-heptanedione, etc./3-diones, etc. Methylamine-based solvents include formamide, N-methylformamide, N, N-dimethylformamide, N-ethylformamide, N, N-diethylformamide, and acetamide. , N-methylacetamide, N, N-dimethylacetamide, N-ethylacetamide, N, N-diethylacetamide, N-methylpropanamide, N-formamidine Pyrrolidone, N-formamylmorpholine, N-formamylpiperidine, N-formamylpyrrolidine, N-acetamylmorpholine, N-acetamylpiperidine, N-acetamylpyrrolidine Wait. Ester solvents include diethyl carbonate, vinyl carbonate, propylene carbonate, diethyl carbonate, methyl acetate, ethyl acetate, r-butyrolactone, r-valerolactone, n-propyl acetate, and isopropyl acetate Ester, n-butyl acetate, isobutyl acetate, secondary butyl acetate, n-amyl acetate, secondary amyl acetate, 3-methoxy acetate This paper is sized for the Chinese National Standard (CNS) A4 (210X297 mm) ) (Please read the notes on the back before filling this page)

-14- 200301154 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明説明(11) 基丁酯、醋酸甲基戊酯、醋酸2-乙基丁酯、醋酸2-乙基己 酯、醋酸苯甲酯、醋酸環己酯、醋酸甲基環己酯、醋酸正 壬酯、乙醯醋酸甲酯、乙醯醋酸乙酯、醋酸乙二醇單甲醚 酯、醋酸乙二醇單乙醚酯、醋酸二乙二醇單甲醚酯、醋酸 二乙二醇單乙醚酯、醋酸二乙二醇單正丁醚酯、醋酸丙二 醇單甲醚酯、醋酸丙二醇單乙醚酯、醋酸丙二醇單丙醚酯 、醋酸丙二醇單丁醚酯、醋酸二丙二醇單曱醚酯、醋酸二 丙二醇單乙醚酯、乙二酯二醋酸酯、甲氧基三甘醇酯酸酯 、丙酸乙酯、丙酸正丁酯、丙酸異戊酯、單酸二乙酯、草 酸二正丁酯、乳酸甲酯、乳酸乙酯、乳酸正丁酯、乳酸正 戊酯、丙二酸二乙酯、酞酸二曱酯、酞酸二乙酯等。此等 酯系溶劑可以1種或2種以上同時使用。 醚系溶劑有二丙醚、二異丙醚、二腭烷、四氫呋喃、 四氫吡喃、乙二醇二甲醚、乙二醇二乙醚、乙二醇二丙醚 、丙二醇二甲醚、丙二醇二乙醚、丙二醇二丙醚、二乙二 醇二曱醚、二乙二醇二乙醚、二乙二醇二丙醚等。 此等分散媒體可單獨使用,亦可混合2種以上之分散 媒體使用。尤以在噴墨塗布用途,可均勻分散粒徑不及200 奈米之金屬氧化物,且金屬氧化物分散體粘度可降低者爲 佳。 本發明之金屬氧化物分散體,須於分散媒體含多元醇 及/或聚醚化合物。多元醇、聚醚化合物可係固體或液體 。含於金屬氧化物分散體之多元醇、聚酯化合物係固體時 ,可溶解於上述有機溶劑及/或水分散媒體使用。另一方 (請先閲讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) -15- ^ C200301154 A7 B7 •五、發明説明(12) 面,含於金屬氧化物分散體之多元醇、聚醚化合物係液體 時,其本身即具分散媒體之作用。 (請先閲讀背面之注意事項再填寫本頁} 本發明中,多元醇者指具2以上羥基之化合物。又, 聚醚化合物亦指具2以上醚結合之化合物。在此,兼具2 以上之羥基及醚結合之化合物,依以下標準分類爲其一;(i) 羥基數(下稱nl)多於醚結合數(下稱n2)時(nl>n2)之化合物 物歸類爲多元醇,(ii)而nl<n2或nl = n2時,烯類爲聚醚化 合物。例如,麥芽三糖係一種三糖類,分子骨架中有11個 羥基,5個醚結合,依上述標準,歸類爲多元醇。又,三甘 醇因分子骨架中,羥基及醚結合各2,依上述標準歸類爲聚 醚化合物。 經濟部智慧財產局員工消費合作社印製 金屬氧化物分散體中含多元醇時即可提升金屬氧化物 粒子之分散性。多元醇有例如乙二醇、二乙二醇、1,2 -丙 二醇、1,3-丙二醇、1,2-丁 二醇、1,3-丁 二醇、1,4-丁 二醇、2-丁烯-1,4-二醇、2,3-丁二醇、戊二醇、己二醇 、辛二醇、1,1,1-三羥甲基乙烷、2-乙基-2-羥甲基-1,3-丙二醇、1,2,6-己三醇、1,2,3-己三醇、1,2,4-丁三 醇等。又,亦可使用甘油、蘇糖醇、赤蘚醇、季戊四醇、 .戊五醇、己糖醇等糖醇、戊五醇含木糖醇、核糖醇、阿糖 醇。又,己糖醇包含甘露糖醇、山梨糖醇、甜醇等。又, 亦可使用甘油醛、二羥基丙酮、蘇糖、赤蘚酮糖、赤蘚糖 、阿糖、核糖、核酮糖、木糖、木酮糖、來蘇糖、葡萄糖 、果糖、甘露糖、艾杜糖、山梨糖、古羅糖、塔羅糖、塔 格糖、半乳糖、阿洛糖、阿卓糖、乳糖、異麥芽糖、葡庚 本紙張尺度適用中國國家標準(CNS ) A4規格( 210X297公釐)" -16- c200301154 A7 B7 五、發明説明(13) 糖、庚糖、麥芽二糖、萵苣二糖、海藻糖等糖類。此等多 元醇因具還原性,於金屬氧化物還原之際有利。 (請先閲讀背面之注意事項再填寫本頁) 特佳之多元醇係碳原子數1 0以下之多元醇,其中液狀 而粘度低者如上述其本身具分散媒體之作用故爲較佳。如 此之多元醇有例如乙二醇、二乙二醇、1,2 -丙二醇、1,3 -丙二醇、1,2-丁 二醇、1,3-丁 二醇、1,4-丁 二醇、2,3-丁二醇、戊二醇、己二醇、辛二醇等。 多元醇中尤以甘油、蘇糖醇、赤蘚醇、季戊四醇、戊 五醇、己糖醇等糖醇類,因尤有利於提升金屬氧化物分散 體中之金屬氧化物微粒之抗凝集性故係更佳。 多元醇之較佳添加量係占金屬氧化物分散體之總重量 0.1重量%以上95重量%以下,1重量%以上90重量%以 下更佳。不及〇.1重量%時,金屬氧化物粒子分散性提升 效果小,若超過9 5重量%,則分散體中金屬氧化物之量 少,難以形成優質金屬薄膜故不佳。此等多元醇可單獨使 用,亦可混合多數之多元醇使用。 經濟部智慧財產局員工消費合作社印製 金屬氧化物分散體中含聚醚化合物,該分散體煅燒所 得之金屬薄膜緻密性即可提升,且與基材之粘合性提升。 聚醚化合物係骨架中有醚結合之化合物,以均勻分散於分 散媒體爲佳。又,隨金屬氧化物分散體之是否含聚醚化合 物,利用該金屬氧化物分散體所得之金屬薄膜的微觀結構 不同。金屬氧化物分散體中聚醚化合物之含量占金屬氧化 物分散體總重量不及0.1重量%時,所得金屬薄膜係具孔徑 1微米以下之多孔結構的多孔性金屬薄膜。另一方面,金屬 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) -17- c200301154 A7 B7 五、發明説明(14) (請先閲讀背面之注意事項再填寫本頁) 氧化物分散體中聚醚化合物含量占金屬氧化物分散體總重 量在0.1至70重量%以下時,所得金屬薄膜極少有孔,且 其孔徑小,因此,緻密性更加提升。 於金屬氧化物分散體加入聚醚化合物,煅燒而得之金 屬薄膜之緻密性及粘合性提升之理由雖不確實,但應係煅 *燒時可防金屬氧化物微粒間之局部造粒,且極少量之聚醚 化合物,直接或經碳之還原而殘留於作爲粘結劑之金屬薄 膜中,或與基材的界面之故。 聚醚化合物以易受金屬氧化物還原得之金屬分解,尤 以在有氫等還有氣體存在之環境氣體中易起低溫催化分解 ’容易消失者爲佳。聚醚化合物因本身具還原性,於金屬 氧化物還原之際有利。 經濟部智慧財產局員工消費合作社印製 聚醚化合物從金屬氧化物微粒往分散媒體中之分散性 的觀點’係以非晶性聚醚化合物爲佳,尤以重複單元係碳 、原子數2至8之直鏈或環狀氧化烯基之脂族聚醚爲佳。重 複單元係碳原子數2至8之直鏈或環狀烯基之脂族聚醚的 分子結構可係環狀、直鏈、或分枝狀,亦可係2元以上之 聚醚共聚物或2元以上之聚醚嵌段共聚物。具體而言,有 聚乙二醇、聚丙二醇、聚丁二醇等之聚醚單聚物,乙二醇/ 丙一醇、乙二醇/丁二醇之2元共聚物,乙二醇/丙二醇/乙 一醇、丙二醇/乙二醇/丙二醇、乙二醇/丁二醇/乙二醇等直 鍵3元共聚物,但不限於此等。嵌段共聚物有聚乙二醇聚 丙一醇、聚乙二醇聚丁二醇等之2元嵌段共聚物,以及聚 乙一 聚丙二醇聚乙二醇、聚丙二醇聚乙二醇聚丙二醇、 本^^適用標準(CNS ΓΑ4規格(210 X297公釐) - -18 _ 200301154 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明説明(15) 聚乙二醇聚丁二醇聚乙二醇等直鏈3元嵌段共聚物等之聚 醚嵌段共聚物。 用於本發明之聚醚化合物亦可於分子結構中含其它官 能基,例如醇基、酯基、環氧丙基、亞胺基、烷基、醯胺 基、胺基、苯基、醛基、碳酸基、異氰酸酯基、磺醯基等 ,或組合此等基而構成,含烷基酯基、烷基醯胺基及烷基 碳酸酯基等取代基,但不限於此。亦包含可聚合之乙烯基 、偏乙烯基、亞乙烯基、環氧丙基、烯丙基,及含此等基 之丙烯酸酯基、甲基丙烯酸酯基。此等官能基可於分子中 有多數個,例如糖,或於分子中含糖醇等多元醇亦可。 含於糖醇之羥基結合有聚合物鏈之結構,係於甘油、 蘇糖醇、赤蘚醇、季戊四醇、戊五醇、己糖醇等所含之羥 基結合聚合物鏈,其例有甘油聚乙二醇聚丙二醇、赤蘚醇 聚乙二醇聚丙二醇聚乙二醇等。糖鏈之具體例有甘油醛、 二羥基丙酮、蘇糖、赤蘚酮醇、赤蘚糖、阿糖、核糖、核 酮糖、木糖、木酮糖、來蘇糖'葡萄糖、果糖、甘露糖、 艾杜糖、山梨糖、古羅糖、塔羅糖、塔格糖、半乳糖、阿 洛糖、阿卓糖、乳糖、異麥芽糖、葡庚糖、庚糖、麥芽三 糖、萵苣三糖、海藻糖等。 又,用於本發明之脂族聚醚,其末端基無特殊限制。 末端基有經羥基、碳原子數1至8之直鏈、分枝或環狀烷 基醚基,烷基酯基、烷基醯胺基、烷基碳酸酯基、氨酯基 或三烷基矽烷基等改質者等。以下列出脂族聚醚之末端基 改質之具體例。 (請先閲讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) -19- 20030ii54 A7 B7 五、發明説明(16) (請先閲讀背面之注意事項再填寫本頁) 至少一末端烷基醚化之例有以甲醚、乙醚、丙醚、環 氧丙醚等醚化者,具體例有聚乙二醇單甲醚、聚乙二醇二 曱醚、聚丙二醇二甲醚、聚異丁二醇二甲醚、聚乙二醇二 乙醚、聚乙二醇單乙醚、聚乙二醇二丁醚、聚乙二醇單丁 醚、聚乙二醇二環氧丙醚、聚乙烯聚丙二醇二甲醚、甘油 聚乙二醇三甲醚、季戊四醇聚乙二醇四甲醚、戊五醇聚乙 二醇五甲醚、山梨糖醇聚乙二醇六甲醚等。 末端有酯基之脂族聚醚類有,至少一末端成爲例如醋 酸酯、丙酸酯、丙烯酸酯、甲基丙烯酸酯、苯甲酸酯者。 烯二醇類末端羧基甲醚化,該末端化之羧基烷基酯化者亦 適用。較佳具體例有聚乙二醇單醋酸酯、聚乙二醇二醋酸 酯、聚丙二醇單醋酸酯、聚丙二醇二醋酸酯、聚乙二醇二 苯甲酸酯、聚乙二醇二丙烯酸酯、聚乙二醇單甲基丙烯酸 酯、聚乙二醇二甲基丙烯酸酯、聚乙二醇雙羧基甲醚二甲 酯、聚丙二醇雙羧基曱醚二甲酯、甘油聚乙二醇三醋酸酯 、季戊四醇聚乙二醇四醋酸酯、戊五醇聚乙二醇五醋酸酯 、山梨糖醇聚乙二醇六醋酸酯等。 經濟部智慧財產局員工消費合作社印製 末端有醯胺基之脂族聚醚類,係至少一末端羧基甲醚 化,然後醯胺化,或羥基末端之胺基改質後醯胺化者等, 適用者具體有’聚乙二醇雙(羧基甲醚二甲基醯胺)、聚丙二 醇雙(羧基甲醚二甲基醯胺)、聚乙二醇雙(羧基甲醚二乙基 醯胺)、甘油聚乙二醇三羧基甲醚二甲基醯胺、季戊四醇聚 乙二醇四羧基甲醚二甲基醯胺、戊五醇聚乙二醇五羧基甲 醚二甲基醯胺、山梨糖醇聚乙二醇六羧基甲醚二甲基醯胺 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) -20- 200301154 A 7 B7 五、發明説明(17) (請先閲讀背面之注意事項再填寫本頁) 末端有烷基碳酸酯基之脂族聚醚類,有例如上述烯二 醇類之至少一末端附加以甲醯酯基者,具體有雙甲氧基羰 基氧基聚乙二醇、雙乙氧基羰基氧基聚乙二醇、雙乙氧基 羰基氧基聚丙二醇、雙三級丁氧基羰基氧基聚乙二醇等。 亦可使用末端以氨酯基、三院基砂院基改質之脂族聚 醚類。三烷基矽烷基改質係以三甲基矽烷基改質爲尤佳, 此可藉三曱基氯矽烷、三甲基氯矽烷基乙醯醯胺或六甲基 二矽氨烷等改質。 從分散媒體中之溶解度及金屬氧化物的分散性之觀點 ’脂族聚醚之最佳末端基係羥基.聚醚化合物中之低分子量 液態物,其本身可用作分散媒體。 經濟部智慧財產局員工消費合作社印製 爲煅燒含聚醚化合物之金屬氧化物分散體得高導電性 之金屬薄膜,聚醚化合物係以可經低溫锻燒即焚化者爲佳 ,分子量以150至6000爲佳,250至15 00爲更佳。所用聚 醚化合物分子量過大者煅燒時不易焚化,殘存於金屬薄膜 中之聚醚化合物的量大。金屬薄膜中聚醚化合物殘留量大 時,會有金屬薄膜的體積電阻値高之問題。而聚醚化合物 之分子量過大時,於分散媒體之分散性不足而不佳。另一 方面,分子量若過小,則加熱處理之金屬薄膜成膜性及緻 密性低而不佳。 金屬氧化物分散體中聚醚化合物之添加量,係占金屬 氧化物分散體總重量0.1至70重量%,1至50重量%爲更 佳。聚醚化合物之添加量不及〇. 1重量%時,還原自金屬氧 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) -21 - 200301154 A7 B7 五、發明説明(18) 化物之金屬,粒子間緻密性低,並有與基材之密合性下降 之傾向。另一方面,聚醚化合物添加量超過7 0重量%時, 金屬氧化物分散體之粘度有上升之傾向而不佳。 將金屬氧化物分散於分散媒體之方法,可用一般分散 粉體於液體之方法。例如,超音波法、混合機法、三輥法 、二輥法、立式球磨機、斑伯里混合機、漆料振動機、捏 合機、均質機、球磨機、沙磨機等。通常係組合多數之此 等分散手段進行分散。多元醇(及/或聚醚化合物)係液態時 ,可將多元醇(及/或聚醚化合物)及金屬氧化物加入於分散 媒體,同時分散處理。另一方面,多元醇及/或聚醚化合 物)係固態時,以將多元醇(及/或聚醚化合物)溶解於分散 媒體後,加入金屬氧化物於所得溶液,作分散處理爲佳。 此等分散處理可於室溫進行,爲降低溶劑粘度,亦可於加 熱下爲之。於本發明所用之分散媒體中合成粒徑不及200 奈米之金屬氧化物,可省略金屬氧化物之分散處理。 金屬氧化物分散體用之分散媒體,特佳者爲碳原子數 10以下之多元醇,且於分散媒體中含上述聚醚化合物者。 使金屬氧化物分散體中含金屬氧化物粒子以外之金屬 粉,可改善加熱處理所得金屬接合層之特性,同時,減少 金屬氧化物微粒用量故較佳。可用之金屬粉無特殊限制, 有例如金、銀、銅、鈀、鉑、鎳、鉻、鋁、錫、鋅、鈦、 鎢、鉅、鋇、铑、釕、餓、鉍、銥、鈷、銦、鐵、鉛等, 可隨目的選用1種或多種金屬粉。爲求高導電性時,以用 工業上可廉價取得之銀、鎳、銅等特佳。銀因可賦予金屬 本紙張尺度適用中國國家標準(CNS ) Α4規格(210X29*7公釐) (請先閲讀背面之注意事項再填寫本頁)-14- 200301154 A7 B7 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 5. Description of the invention (11) Butyl butyl, methyl amyl acetate, 2-ethyl butyl acetate, 2-ethylhexyl acetate, acetic acid Benzyl methyl ester, cyclohexyl acetate, methyl cyclohexyl acetate, n-nonyl acetate, ethyl acetate, ethyl acetate, ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether ester, Diethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether ether, diethylene glycol mono-n-butyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, Propylene glycol monobutyl ether acetate, dipropylene glycol monoethyl ether acetate, dipropylene glycol monoethyl ether acetate, ethylene glycol diacetate, methoxytriethylene glycol esters, ethyl propionate, n-butyl propionate, Isoamyl propionate, diethyl monoate, di-n-butyl oxalate, methyl lactate, ethyl lactate, n-butyl lactate, n-pentyl lactate, diethyl malonate, dimethyl phthalate, phthalate Diethyl acid and so on. These ester solvents can be used singly or in combination of two or more kinds. The ether solvents are dipropyl ether, diisopropyl ether, dioxane, tetrahydrofuran, tetrahydropyran, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, ethylene glycol dipropyl ether, propylene glycol dimethyl ether, and propylene glycol. Diethyl ether, propylene glycol dipropyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol dipropyl ether, and the like. These dispersing media may be used alone or as a mixture of two or more dispersing media. Especially for inkjet coating applications, metal oxides with a particle size of less than 200 nm can be uniformly dispersed and the viscosity of the metal oxide dispersion can be reduced. The metal oxide dispersion of the present invention must contain a polyol and / or a polyether compound in a dispersion medium. Polyols and polyether compounds can be solid or liquid. When the polyol or polyester compound contained in the metal oxide dispersion is a solid, it can be used by dissolving in the organic solvent and / or water dispersion medium. The other party (please read the notes on the back before filling this page) This paper size is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) -15- ^ C200301154 A7 B7 • V. Description of the invention (12) side, including When the polyol and polyether compound of the metal oxide dispersion are liquids, they have the function of dispersing media. (Please read the precautions on the back before filling out this page} In the present invention, polyol refers to compounds with 2 or more hydroxyl groups. Polyether compounds also refer to compounds with 2 or more ether bonds. Here, it has 2 or more The hydroxyl- and ether-bound compounds are classified as one according to the following criteria; (i) When the number of hydroxyl groups (hereinafter referred to as nl) is greater than the number of ether combinations (hereinafter referred to as n2) (nl > n2), they are classified as polyols (Ii) When nl < n2 or nl = n2, the olefin is a polyether compound. For example, maltotriose is a trisaccharide with 11 hydroxyl groups in the molecular skeleton and 5 ethers combined. It is a polyhydric alcohol. In addition, triethylene glycol is classified as a polyether compound according to the above standards due to the combination of hydroxyl groups and ethers in the molecular skeleton. The metal oxide dispersion printed by the employees' cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs contains polyhydric Alcohol can improve the dispersibility of metal oxide particles. Polyols include, for example, ethylene glycol, diethylene glycol, 1,2-propylene glycol, 1,3-propanediol, 1,2-butanediol, 1,3- Butanediol, 1,4-butanediol, 2-butene-1,4-diol, 2,3-butanediol, pentyl Glycol, hexanediol, octanediol, 1,1,1-trimethylolethane, 2-ethyl-2-hydroxymethyl-1,3-propanediol, 1,2,6-hexanetriol , 1,2,3-hexanetriol, 1,2,4-butanetriol, etc. In addition, sugar alcohols such as glycerol, threitol, erythritol, pentaerythritol, pentaerythritol, and hexitol may also be used. , Pentaerythritol contains xylitol, ribitol, arabinitol. Also, hexitol includes mannitol, sorbitol, sweet alcohol, etc. Also, glyceraldehyde, dihydroxyacetone, threose, red Mosulose, erythrose, arabinose, ribose, ribulose, xylose, xylulose, lyxose, glucose, fructose, mannose, idose, sorbose, gulose, talose, Tagatose, galactose, allose, atroose, lactose, isomaltose, heptane. Paper size is applicable to Chinese National Standard (CNS) A4 specification (210X297 mm) " -16- c200301154 A7 B7 V. Invention Explanation (13) Sugars such as sugar, heptose, maltobiose, lettuce diose, trehalose, etc. These polyols are reducible and advantageous when metal oxides are reduced. (Please read the notes on the back first (Fill in this page again.) The best polyols are those with less than 10 carbon atoms. Among them, those with liquid viscosity and low viscosity have the effect of dispersing media as described above. Such polyols are, for example, ethylene glycol. , Diethylene glycol, 1,2-propanediol, 1,3-propanediol, 1,2-butanediol, 1,3-butanediol, 1,4-butanediol, 2,3-butanediol, Pentylene glycol, hexanediol, octanediol, etc. Among the polyhydric alcohols, sugar alcohols such as glycerol, threitol, erythritol, pentaerythritol, pentaerythritol, and hexitol are particularly beneficial for the promotion of metal oxide The anticoagulant properties of the metal oxide particles in the dispersion are better. The preferred amount of the polyol is 0.1% to 95% by weight, and 1% to 90% of the total weight of the metal oxide dispersion. % Is more preferable. If it is less than 0.1% by weight, the effect of improving the dispersibility of the metal oxide particles is small. If it exceeds 95% by weight, the amount of the metal oxide in the dispersion is small, and it is difficult to form a high-quality metal film, which is not good. These polyols can be used singly or in combination of most polyols. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, the metal oxide dispersion contains polyether compounds, and the denseness of the metal film obtained by calcining the dispersion can improve the adhesion and the adhesion to the substrate. The polyether compound is a compound having an ether bond in the skeleton, and is preferably dispersed uniformly in a dispersion medium. The microstructure of the metal thin film obtained by using the metal oxide dispersion varies depending on whether the metal oxide dispersion contains a polyether compound. When the content of the polyether compound in the metal oxide dispersion accounts for less than 0.1% by weight of the total weight of the metal oxide dispersion, the obtained metal film is a porous metal film having a porous structure with a pore diameter of 1 micrometer or less. On the other hand, the size of the metallic paper is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) -17- c200301154 A7 B7 V. Description of the invention (14) (Please read the precautions on the back before filling this page) Oxide When the content of the polyether compound in the dispersion is 0.1 to 70% by weight or less of the total weight of the metal oxide dispersion, the resulting metal thin film has very few pores and the pore diameter is small, so the density is further improved. The reason for adding the polyether compound to the metal oxide dispersion to improve the compactness and adhesion of the metal film obtained by calcination is not certain, but it should be to prevent local granulation between the metal oxide particles during calcination * And a very small amount of the polyether compound is left in the metal film as a binder or at the interface with the substrate directly or through carbon reduction. Polyether compounds are decomposed by metals susceptible to reduction by metal oxides, especially those that are prone to low-temperature catalytic decomposition in environmental gases where hydrogen and other gases are present, and those that easily disappear. Polyether compounds are advantageous in reducing metal oxides because of their reducing properties. The viewpoint of dispersibility of polyether compounds printed from metal oxide particles to dispersed media by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs is preferably amorphous polyether compounds, especially repeating units of carbon and 2 to 2 atoms. A linear or cyclic oxyalkylene based aliphatic polyether is preferred. The molecular structure of the repeating unit is a linear or cyclic alkenyl aliphatic polyether having 2 to 8 carbon atoms. The molecular structure may be cyclic, linear, or branched, or a polyether copolymer of 2 or more members or Polyether block copolymer of more than 2 yuan. Specifically, there are polyether monopolymers such as polyethylene glycol, polypropylene glycol, and polybutylene glycol, ethylene glycol / propylene glycol, and ethylene glycol / butanediol binary copolymers, and ethylene glycol / Linear bond terpolymers such as propylene glycol / ethylene glycol, propylene glycol / ethylene glycol / propylene glycol, ethylene glycol / butanediol / ethylene glycol, but are not limited thereto. The block copolymers are binary block copolymers such as polyethylene glycol polypropylene glycol, polyethylene glycol polybutylene glycol, and the like, polyethylene glycol polypropylene glycol, polypropylene glycol polyethylene glycol polypropylene glycol, and the like. ^^ Applicable standards (CNS ΓΑ4 specification (210 X297 mm)-_ 200301154 A7 B7 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs V. Description of the invention (15) Polyethylene glycol Polybutylene glycol Polyethylene glycol Polyether block copolymers, such as linear 3-block block copolymers, etc. The polyether compounds used in the present invention may also contain other functional groups in the molecular structure, such as alcohol groups, ester groups, epoxypropyl groups, Amino group, alkyl group, amido group, amine group, phenyl group, aldehyde group, carbonate group, isocyanate group, sulfonyl group, etc., or a combination of these groups, including alkyl ester group, alkyl amine group and Substituents such as alkyl carbonate groups, but are not limited thereto. It also includes polymerizable vinyl, vinylidene, vinylidene, glycidyl, allyl, and acrylates and methyl groups containing these groups. Acrylate group. These functional groups may have a majority in the molecule, such as sugar, or in the molecule Polyols such as sugar alcohols are also possible. The hydroxyl group contained in the sugar alcohol has a polymer chain structure, which is based on the hydroxyl groups contained in glycerol, threitol, erythritol, pentaerythritol, pentaerythritol, and hexitol. Examples of the polymer chain include glycerol polyethylene glycol polypropylene glycol, erythritol polyethylene glycol polypropylene glycol polyethylene glycol, and the like. Specific examples of the sugar chain include glyceraldehyde, dihydroxyacetone, threose, and erythritol. , Erythrose, arabinose, ribose, ribulose, xylose, xylulose, lyxose 'glucose, fructose, mannose, idulose, sorbose, gulose, talose, tagatose , Galactose, allose, atroose, lactose, isomaltose, glucoheptose, heptose, maltotriose, lettuce triose, trehalose, etc. In addition, the aliphatic polyether used in the present invention, which The terminal group is not particularly limited. The terminal group has a hydroxyl group, a linear, branched or cyclic alkyl ether group having 1 to 8 carbon atoms, an alkyl ester group, an alkylamido group, an alkyl carbonate group, ammonia Modifiers such as ester or trialkylsilyl. Specific examples of modification of terminal groups of aliphatic polyethers are listed below. (Please read first Please fill in this page again if you need to pay attention to this page) This paper size is applicable to China National Standard (CNS) A4 specification (210X297mm) -19- 20030ii54 A7 B7 V. Description of invention (16) (Please read the precautions on the back before filling in this Page) Examples of etherification of at least one terminal alkyl group include etherification with methyl ether, diethyl ether, propyl ether, and propylene oxide ether. Specific examples include polyethylene glycol monomethyl ether, polyethylene glycol dimethyl ether, and polyether. Propylene glycol dimethyl ether, polyisobutylene glycol dimethyl ether, polyethylene glycol diethyl ether, polyethylene glycol monoethyl ether, polyethylene glycol dibutyl ether, polyethylene glycol monobutyl ether, polyethylene glycol dicyclic ring Oxypropyl ether, polyethylene polypropylene glycol dimethyl ether, glycerol polyethylene glycol trimethyl ether, pentaerythritol polyethylene glycol tetramethyl ether, pentaerythritol polyethylene glycol pentamethyl ether, sorbitol polyethylene glycol hexamethyl ether, etc. There are aliphatic polyethers having an ester group at the end, and at least one end is made of, for example, acetate, propionate, acrylate, methacrylate, and benzoate. Ethylene glycols are methylated with terminal carboxyl groups, and those with terminal carboxyl alkyl groups are also suitable. Preferred specific examples are polyethylene glycol monoacetate, polyethylene glycol diacetate, polypropylene glycol monoacetate, polypropylene glycol diacetate, polyethylene glycol dibenzoate, and polyethylene glycol diacrylate. , Polyethylene glycol monomethacrylate, polyethylene glycol dimethacrylate, polyethylene glycol dicarboxymethyl ether dimethyl ester, polypropylene glycol dicarboxymethyl ether dimethyl ester, glycerol polyethylene glycol triacetate Esters, pentaerythritol polyethylene glycol tetraacetate, pentaerythritol polyethylene glycol pentaacetate, sorbitol polyethylene glycol hexaacetate, and the like. Employees' Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs printed aliphatic polyethers with amido groups at the end, which are methylated with at least one terminal carboxyl group, and then amidolated, or modified with ammonium groups at the hydroxyl end. The applicable ones include 'polyethylene glycol bis (carboxymethyl ether dimethylamidamine), polypropylene glycol bis (carboxymethyl ether dimethylamidamine), and polyethylene glycol bis (carboxymethyl ether diethylamidamine) ), Glycerol polyethylene glycol tricarboxymethyl ether dimethylamine, pentaerythritol polyethylene glycol tetracarboxymethyl ether dimethylamine, pentaerythritol polyethylene glycol pentacarboxymethyl ether dimethylamine, sorbitol Sugar Alcohol Polyethylene Glycol Hexacarboxymethyl Ether Dimethyl Ammonium Amide This paper is sized to the Chinese National Standard (CNS) A4 (210X297 mm) -20- 200301154 A 7 B7 V. Description of the Invention (17) (Please read first Note on the back, please fill in this page again) Aliphatic polyethers with alkyl carbonate groups at the end, for example, those with at least one end of the above ene glycols added with a methyl ester group, specifically bismethoxycarbonyloxy Polyethylene glycol, diethoxycarbonyloxy polyethylene glycol, diethoxycarbonyloxy Polypropylene glycol, bis three-butoxycarbonyl group, polyethylene glycol, and the like. It is also possible to use aliphatic polyethers modified with urethane group and Sanyuanjishayuan. The modification of trialkylsilyl is preferably modified by trimethylsilyl, which can be modified by trimethylsilylsilane, trimethylchlorosilylacetamide or hexamethyldisilazane. . From the viewpoint of the solubility in the dispersion medium and the dispersibility of the metal oxide, the best terminal group of the aliphatic polyether is the hydroxyl group. The low-molecular-weight liquid substance in the polyether compound can itself be used as a dispersion medium. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs as a metal film with high conductivity for the calcination of metal oxide dispersions containing polyether compounds. Polyether compounds are preferably those that can be incinerated after low temperature calcination, and the molecular weight is 150 to 6000 is preferred, and 250 to 15 00 is more preferred. The polyether compound used has an excessively large molecular weight and is not easily incinerated when calcined, and the amount of the polyether compound remaining in the metal film is large. When the amount of the polyether compound remaining in the metal thin film is large, there is a problem that the volume resistance of the metal thin film becomes high. On the other hand, when the molecular weight of the polyether compound is too large, the dispersibility in the dispersion medium is insufficient and unfavorable. On the other hand, if the molecular weight is too small, the film-forming property and denseness of the heat-treated metal thin film are low and unfavorable. The amount of the polyether compound added to the metal oxide dispersion is 0.1 to 70% by weight, and more preferably 1 to 50% by weight. When the amount of the polyether compound is less than 0.1% by weight, the paper is reduced from metal oxygen. The paper size is applicable to Chinese National Standard (CNS) A4 (210X297 mm) -21-200301154 A7 B7 V. Description of the invention (18) Metals have low interparticle density and tend to decrease the adhesion to the substrate. On the other hand, when the polyether compound is added in an amount exceeding 70% by weight, the viscosity of the metal oxide dispersion tends to increase, which is not preferable. The method of dispersing the metal oxide in the dispersion medium may be a method of generally dispersing powder in a liquid. For example, the ultrasonic method, the mixer method, the three-roller method, the two-roller method, a vertical ball mill, a Berry mixer, a paint shaker, a kneader, a homogenizer, a ball mill, a sand mill, and the like. Dispersion is usually performed by combining a plurality of these dispersing means. When the polyol (and / or polyether compound) is in a liquid state, the polyol (and / or polyether compound) and the metal oxide can be added to the dispersion medium and dispersed at the same time. On the other hand, when the polyol and / or polyether compound) is in a solid state, it is preferable to dissolve the polyol (and / or polyether compound) in a dispersion medium and then add a metal oxide to the resulting solution for dispersion treatment. These dispersing treatments can be performed at room temperature, and in order to reduce the viscosity of the solvent, they can also be heated under heat. In the dispersion medium used in the present invention, a metal oxide having a particle size of less than 200 nm is synthesized, and the dispersion treatment of the metal oxide can be omitted. As a dispersion medium for a metal oxide dispersion, a polyhydric alcohol having 10 or less carbon atoms is particularly preferred, and the above-mentioned polyether compound is contained in the dispersion medium. It is preferable that the metal oxide dispersion contains metal powder other than the metal oxide particles to improve the characteristics of the metal bonding layer obtained by the heat treatment and reduce the amount of metal oxide particles. There are no particular restrictions on the metal powders that can be used, such as gold, silver, copper, palladium, platinum, nickel, chromium, aluminum, tin, zinc, titanium, tungsten, macro, barium, rhodium, ruthenium, star, bismuth, iridium, cobalt, Indium, iron, lead, etc., one or more metal powders can be selected according to the purpose. For high conductivity, silver, nickel, copper, etc., which are commercially available at low cost, are particularly preferred. Silver due to metal can be applied to this paper. The size of the paper applies the Chinese National Standard (CNS) Α4 specification (210X29 * 7mm) (Please read the precautions on the back before filling this page)

、1T 經濟部智慧財產局員工消費合作社印製 - 22- C攻20U30ii54 A7 B7 五、發明説明( 薄膜高抗氧化性故較佳。又,有抗遷移性之必要時,可於 金屬接合層多加抗遷移性強之銅粉。 此等金屬粉之粒徑無特殊限制,宜隨目的使用較佳粒 徑之金屬粉。以煅燒得金屬薄膜時,金屬粉粒徑以1 00微 米以下爲佳,10微米以下更佳。金屬粉粒徑在100微米以 上時,金屬粉與金屬氧化物微粒尺寸相差過大,金屬接合 層之平滑性下降而不佳。金屬氧化物分散體在用於噴墨用 墨料時,金屬粉粒徑係以200奈米以下爲佳,100奈米以下 更佳。 加於金屬氧化物分散體之金屬粉,其量係以該金屬粉 與金屬氧化物微粒含量合計,占金屬氧化物分散體總重量5 重量%以上95重量%以下爲佳。金屬粉與金屬氧化物微粒 之重量比,以9 : 1至1 : 9爲佳。金屬粉及金屬氧化物微 粒含量不及5重量%時添加效果小,若超過95重量%則金 ,屬氧化物分散體之粘度上升,分散體之塗布、充塡困難而 不佳。金屬粉與金屬氧化物微粒之重量比超出9: 1至1: 9 之範圍時,二種粒子之混合效果變小而不佳。 於上述金屬氧化物分散體中添加熱固性樹脂,經加熱 硬化提升與金屬面之粘合性,並提升強度故較佳。可用之 熱固性樹脂須可溶於所用分散媒體,並無損於金屬氧化物 分散體之分散性,此外無特殊限制。有例如環氧樹脂、酚 樹脂、淸漆樹脂、聚醯亞胺樹脂、聚氨酯、三聚氰胺樹脂 、尿素樹脂等。 環氧樹脂有例如雙酚A型環氧樹脂、雙酚F型環氧樹 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) (請先閲讀背面之注意事項再填寫本頁)Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs of the 1T-22- C attack 20U30ii54 A7 B7 V. Description of the invention (Thin film is better because of its high oxidation resistance. In addition, if migration resistance is necessary, it can be added to the metal bonding layer Copper powder with strong anti-migration. There is no special restriction on the particle size of these metal powders. It is advisable to use metal powders with better particle sizes according to the purpose. When the metal thin film is obtained by calcination, the particle size of the metal powder is preferably less than 100 microns. 10 microns or less is preferred. When the particle size of the metal powder is above 100 microns, the size difference between the metal powder and the metal oxide particles is too large, and the smoothness of the metal bonding layer is not good. The metal oxide dispersion is used in inkjet inks. The particle size of the metal powder is preferably 200 nanometers or less, and more preferably 100 nanometers or less. The amount of metal powder added to the metal oxide dispersion is based on the total content of the metal powder and metal oxide particles. The total weight of the metal oxide dispersion is preferably from 5% by weight to 95% by weight. The weight ratio of metal powder to metal oxide particles is preferably 9: 1 to 1: 9. The content of metal powder and metal oxide particles is less than 5 weight% When the addition effect is small, if it exceeds 95% by weight, gold will increase the viscosity of the oxide dispersion, which will make coating and filling of the dispersion difficult and unsatisfactory. The weight ratio of the metal powder to the metal oxide particles exceeds 9: 1 to 1. : In the range of 9, the mixing effect of the two particles becomes small and unsatisfactory. It is better to add a thermosetting resin to the above metal oxide dispersion, heat-harden to improve the adhesion to the metal surface, and increase the strength. The thermosetting resin must be soluble in the dispersing medium used, without compromising the dispersibility of the metal oxide dispersion, and there are no special restrictions. There are, for example, epoxy resin, phenol resin, lacquer resin, polyimide resin, polyurethane, melamine Resins, urea resins, etc. Epoxy resins such as bisphenol A epoxy resin, bisphenol F epoxy resin, etc. Paper size is applicable to Chinese National Standard (CNS) A4 specification (210X297 mm) (Please read the note on the back first (Fill in this page again)

T 經濟部智慧財產局員工消費合作社印製 -23- 20U30ilb4 A7 B7 五、發明説明(20) 脂、(甲酚)淸漆型環氧樹脂、鹵化雙酚型樹脂、間苯二酣型 、四羥基酚乙烷型、聚醇聚二醇型、甘油三醚型、聚烯烴 型、環氧化大豆油、環戊二烯二氧化物、乙烯環己烯二氧 化物等。 液態環氧樹脂因粘度低而較佳,其例有苯氧基院基單 環氧丙醚、雙酚A二環氧丙醚、丙二醇二環氧丙醚、丙二 醇二環氧丙酸、己二醇二環氧丙醚、加氫雙酣A二環氧丙 •醚、新戊二醇二環氧丙醚、甘油二環氧丙醚、N,N-二環氧 丙基苯胺、N,N -二環氧丙基甲苯胺、三羥甲基丙院三環氧 丙醚、甘油三環氧丙醚及各種液態聚矽氧烷二環氧丙酸等 〇 液態環氧樹脂中,以可良好分散於多元醇分散媒體之 醇型環氧樹脂爲較佳,有例如聚乙二醇二環氧丙醚、聚丙 二醇二環氧丙醚、1,4-丁二醇二環氧丙醚等。 用於本發明之環氧樹脂硬化劑可係一般的環氧硬化劑 。有例如脂族多胺系之三乙四胺、間二甲苯二胺等,芳族 胺系之間苯二胺、二胺基二苯硕等,三級胺系有苯甲基二 甲胺、二甲胺基曱基酚等,酸酐系有酞酸酐、六氫酞酐等 ,二氟硼胺錯合物系有B F 3 -哌U定錯合物等。又,雙 A等 雙酚化合物亦可。二醯胺' 2 -乙基-4-甲基咪唑、參(甲胺基 )矽烷等亦可使用。樹脂系硬化劑有,亞麻酸二聚物與乙二 月女等製成之聚釀fee樹脂’兩端有疏基之聚硫酿樹脂、淸漆 系酚樹脂等。此等可單獨使用,亦可組合2種以上使用。 硬化劑之添加量隨硬化劑之種類而異,例如酸酐系等 i紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) ' -24 - (請先閲讀背面之注意事項再填寫本頁) C· 訂 經濟部智慧財產局員工消費合作社印製 C说200301154 A7 B7 五、發明説明(21) 依化學計量與環氧丙基反應時,係由環氧當量決定最適添 加量。觸媒反應時一般係3至30重量%。此時硬化劑之室 溫反應性高時,可於使用前隨即將含啓始劑之液體混入粘 合劑,或將硬化劑封入1 00微米左右之明膠等的囊胞製成 微囊等。 熱固性樹脂之其它例聚醯亞胺樹脂,係其前驅物聚醯 胺酸溶液經加熱縮合而得,可用於本發明之聚醯胺酸,可 由四羧酸二酐與二胺基化合物製造。四羧酸二酐之例有苯 均四酸二酐、3,3/,4,4>-二苯基酮四羧酸二酐、1,4,5,8-萘 四羧酸二酐、2,3,6,7-萘四羧酸二酐、1,2,5,6,-萘四羧酸二酐 、3,3 /,4,4 / -聯苯四羧酸二酐、2,2 —,3,3 —-聯苯四羧酸二 酐、2,3,3 >,4 —-聯苯四羧酸二酐、2,3,3 >,4 —-二苯基酮四 羧酸二酐、2,2-雙(3,4-二羧基苯基)丙烷二酐、2,2-雙[5-(3, 4-二羧基苯氧基)苯基]丙烷二酐等、二胺基化合物有例如間 苯二胺、對苯二胺、2,4-曱苯二胺、3,3 二胺基二苯醚、3 ,4'二胺基二苯醚、4,4'二胺基二苯醚、3,3> -二胺基 二苯硕、4,4 / -二胺基二苯硕、3,4,-二胺基二苯硕、3, 3>-二胺基二苯甲烷、4,4>-二胺基二苯基甲烷、3, 4>-二 胺基二苯基甲烷、4,4> -二胺基二苯亞硕、3,-二胺基二 苯基酮、4,4> -二胺基二苯基酮、3,4"-二胺基二苯基酮、2 ,2 > -雙(4-胺基苯基)丙烷等。 本發明中,於金屬氧化物分散體之熱固性樹脂的添加 量,以占分散媒體、聚醚化合物及該熱固性樹脂總重量〇. i 至20重量%爲佳,1至10重量%爲更佳。熱固性樹脂量不 本紙張尺度適用中國國家標準(CNS ) Α4規格(210X297公釐) (請先閲讀背面之注意事項再填寫本頁) C·T Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs -23-20U30ilb4 A7 B7 V. Description of the invention (20) Grease, (cresol) lacquer type epoxy resin, halogenated bisphenol type resin, m-phenylene difluoride type, four Hydroxyphenol ethane type, polyol polyglycol type, triglyceride type, polyolefin type, epoxidized soybean oil, cyclopentadiene dioxide, ethylene cyclohexene dioxide, and the like. Liquid epoxy resins are preferred due to their low viscosity. Examples include phenoxy-based monoglycidyl ether, bisphenol A diglycidyl ether, propylene glycol diglycidyl ether, propylene glycol diglycidyl acid, and adipic acid Alcohol diglycidyl ether, hydrogenated bis (A) diglycidyl ether, neopentyl glycol diglycidyl ether, glycerol diglycidyl ether, N, N-diglycidyl aniline, N, N -Diglycidyl toluidine, trimethylolpropane triglycidyl ether, glycerin triglycidyl ether and various liquid polysiloxane diglycidyl acids, etc., can be good in liquid epoxy resins. Alcohol-type epoxy resins dispersed in a polyol dispersion medium are preferred, and examples thereof include polyethylene glycol diglycidyl ether, polypropylene glycol diglycidyl ether, and 1,4-butanediol diglycidyl ether. The epoxy hardener used in the present invention may be a general epoxy hardener. For example, aliphatic polyamine-based triethylenetetramine, m-xylylenediamine, etc., aromatic amine-based phenylenediamine, diaminodiphenyl, etc., and tertiary amines include benzyldimethylamine, Dimethylaminofluorenyl phenol and the like, acid anhydrides include phthalic anhydride, hexahydrophthalic anhydride, and the like, and difluoroboramine complexes include BF 3 -piperidine complex and the like. Also, a bisphenol compound such as bis A may be used. Diamine '2-ethyl-4-methylimidazole, ginsyl (methylamino) silane and the like can also be used. Resin-based hardeners include polysulfide brewed resins made of linolenic acid dimer and ethylene fenuline, etc., and polysulfide brewed resins with sulfo groups at both ends, and lacquer-based phenol resins. These can be used alone or in combination of two or more. The amount of hardener added varies with the type of hardener. For example, the acid anhydride type and other paper sizes apply the Chinese National Standard (CNS) A4 specification (210X297 mm) '-24-(Please read the precautions on the back before filling this page. ) C. Printed by the Consumers' Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, C. 200301154 A7 B7 V. Description of the invention (21) When reacting with stoichiometry and epoxypropyl groups, the optimal addition amount is determined by the epoxy equivalent. The catalyst reaction is generally 3 to 30% by weight. At this time, when the room temperature reactivity of the hardener is high, the liquid containing the initiator may be mixed into the adhesive immediately before use, or the hardener may be encapsulated in vesicles such as gelatin of about 100 microns to make microcapsules. Other examples of thermosetting resins are polyimide resins, which are obtained by heating and condensing a precursor polyamidoacid solution, and can be used in the polyamidoacid of the present invention. They can be produced from a tetracarboxylic dianhydride and a diamine-based compound. Examples of tetracarboxylic dianhydrides include pyromellitic dianhydride, 3,3 /, 4,4> -diphenylketone tetracarboxylic dianhydride, 1,4,5,8-naphthalenetetracarboxylic dianhydride, 2,3,6,7-naphthalenetetracarboxylic dianhydride, 1,2,5,6, -naphthalenetetracarboxylic dianhydride, 3,3 /, 4,4 / -biphenyltetracarboxylic dianhydride, 2 , 2 —, 3,3 —-biphenyltetracarboxylic dianhydride, 2,3,3 >, 4 —-biphenyltetracarboxylic dianhydride, 2,3,3 >, 4 —-diphenyl Ketone tetracarboxylic dianhydride, 2,2-bis (3,4-dicarboxyphenyl) propane dianhydride, 2,2-bis [5- (3,4-dicarboxyphenoxy) phenyl] propanedi Anhydride and the like, diamino compounds include, for example, m-phenylenediamine, p-phenylenediamine, 2,4-fluorenediphenyldiamine, 3,3 diaminodiphenyl ether, 3,4'diaminodiphenyl ether, 4 , 4'diaminodiphenyl ether, 3,3 > -diaminodiphenylsulfone, 4,4 / -diaminodiphenylsulfone, 3,4, -diaminodiphenylsulfone, 3,3 > -Diaminodiphenylmethane, 4,4 > -diaminodiphenylmethane, 3,4 > -diaminodiphenylmethane, 4,4 > -diaminodiphenylaso, 3,- Diaminodiphenyl ketone, 4,4 > -diaminodiphenylketone, 3,4 " -diaminodiphenylketone, 2,2 > -bis (4-aminophenyl) propane Wait. In the present invention, the amount of the thermosetting resin added to the metal oxide dispersion is preferably 0.1 to 20% by weight, and more preferably 1 to 10% by weight based on the total weight of the dispersion medium, the polyether compound, and the thermosetting resin. The amount of thermosetting resin is not applicable. The size of this paper applies to Chinese National Standard (CNS) Α4 size (210X297 mm) (Please read the precautions on the back before filling this page). C ·

、1T 經濟部智慧財產局員工消費合作社印製 -25- 2GU30if5 4 A7 B7 五、發明説明(22) 及0.1重量%時添加效果小,而若超過20重量%則因金屬 接合層之導電性顯著下降,不適作金屬薄膜形成材半斗。 本發明中,多元醇及聚醚化合物具還原性,有胃胃& 屬氧化物之效果,而除多元醇及聚醚化合物以外,H於^ & 屬氧化物分散體中添加可還原金屬氧化物之還原齊彳,冑g ^吏 金屬氧化物更易於還原而爲較佳。此時,僅須能還原金屬 氧化物,可用之還原劑無特殊限制,無機還原劑,有機還 原劑均可。無機還原劑有例如硼氫化鈉、硼氫化鋰等氫化 合物,二氧化硫等硫化合物,亞硫酸鹽等低級氧化物之鹽 ,碘化氫、碳等。 多元醇、聚醚化合物以外之有機還原劑有例如,醛類 、肼、二亞胺類、草酸等。醛類有例如甲醛、乙醛、丙醛 、丁醛、異丁醛、戊醛、異戊醛、三甲基乙醛、己醛、庚 酸、辛醛、壬、十一醛、月桂酵、十三酸、肉豆蔻酸、 十五醛、棕櫚醛、十七醛、硬脂醛等脂族飽和醛、乙二醛 、琥珀醛等脂族二醛、丙烯醛、巴豆醛、丙炔醛等脂族不 飽和醛、苯甲醛、鄰甲苯醛、間甲苯醛、對甲苯醛、水楊 醛、肉桂醛、α -萘醛、Θ -萘醛等芳族醛,糠醛等雜環 醛等。 二亞胺類係例如由偶氮二羧酸鹽、羥胺-0-磺酸、Ν-丙 二烯磺醯肼或Ν-醯基磺醯肼熱分解而得。Ν-丙二烯磺醯肼 或Ν-醯基磺醯肼有例如,對甲苯磺醯肼、苯磺醯肼、2,4,6-參異丙基苯磺醯肼、氯乙醯肼、鄰硝基苯磺醯肼、間硝基 苯擴醯肼、對硝基苯磺醯肼等。 本紙張尺度適用中國國家標準(CNS ) A4規格(21〇X297公羡) --------,_裝-- (請先閱讀背面之注意事項再填寫本頁) 訂 經濟部智慧財產局員工消費合作社印製 -26- C200301 5 4 A7 B7 五、發明説明( 多元醇及聚醚化合物以外的還原劑之含量’係占金屬 氧化物分散體總重量〇·1至70重量%,以〇·1至50重量% 爲佳,0.1至20重量%爲更佳,1至1 〇重量%又更佳。 本發明中,爲提升煅燒得之金屬薄膜的強度及與基材 之粘合性,亦可於金屬氧化物分散體中添加金屬氧化物等 金屬氧化物前驅物。金屬氧化物如一般式M(0Rl)n,其中Μ 係金屬元素。R1係烷基,η係金屬元素之氧化數。Μ有如矽 、鈦、鍩、鋁等,烷基有例如甲基、乙基、異丙基、正丁 基、三級丁基等,代表性金屬氧化物有四甲氧基矽烷、四 乙氧基矽烷、四(正丙氧基)矽烷、四(異丙氧基)矽烷、四( 正丁氧基)矽烷、四(二級丁氧基)矽烷、四(三級丁氧基)矽 烷等之矽化合物,四乙氧基鈦、四(正丙氧基)鈦、四(異丙 氧基)鈦、四(正丁氧基)鈦、四(二級丁氧基)鈦、四(三級丁 氧基)鈦等鈦化合物等,此等化合物係液態,容易分散於金 屬氧化物分散體故而較佳。又,亦可使用 • 在1以上)所表之金屬烷氧化物,其金 屬直接附加以有機基R2。有機基R2有例如甲基、乙基、丙 基、苯基、丁基等。 將金屬粉、熱固性樹脂、還原劑、金屬烷氧化物等材 料分散於金屬氧化物分散體之方法,可係超音波法、混合 機法、三輥法、二輥法、立式球磨機、斑伯里混合機、漆 料振動機、捏合機、均質機、球磨機 '沙磨機法等一般方 法。此等之分散亦可與金屬氧化物與多元醇(及/或聚醚化 合物)之分散於分散媒體同時進行。 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) (請先閱讀背面之注意事項再填寫本頁) 裝· 訂 經濟部智慧財產局員工消費合作社印製 -27- 2003011^4 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明説明( 其次說明,使用本發明之金屬氧化物分散體,於基板 上形成金屬薄膜之方法(形成基板及金屬薄膜所成層合體之 方法)。 基板可用無機或有機基板。無機基板可用玻璃基板, 矽、鍺等半導體基板,鎵-砷、銦-銻等化合物半導體基板等 ,此等之表面亦可先形成其它物質之薄膜後使用。此時之 薄膜可係鋁、鈦、鉻、鎳、銅、銀、鉬、鎢、餓、鉑、金 '等金屬,二氧化矽、氟化玻璃、磷玻璃、硼磷玻璃、硼矽 酸玻璃、多晶矽、氧化鋁、氧化鈦、氧化銷、氮化矽、氮 化鈦、氮化鉅、氮化硼、氫化倍半氧烷、ITO (銦錫氧化物) 等無機化合物,甲基倍半氧烷、非晶碳、氟化非晶碳、聚 醯亞胺等所成之薄膜。 有機基板若在金屬氧化物分散體之加熱處理溫度不受 熱之損傷者即無限制,可用例如聚醯亞胺基板、聚對酞酸 乙二醇酯(PET)基板、芳族聚醯胺基板、環氧基板、含氟樹 脂基板等。 形成金屬薄膜前,爲提升密合性等,可先用電漿處理 、電子束處理等物理手法作處理,亦可用密合促進劑等之 化學手法作處理。密合促進劑可用所謂的矽烷偶合劑、鋁 螯合物等。較佳者有3 -胺基丙基三甲氧基矽烷、3 -胺基丙 基三乙氧基矽烷、N( 2-胺基乙基)-3-胺基丙基三甲氧基矽烷 、N-( 2-胺基乙基)-3-胺基丙基甲基二甲氧基矽烷、乙烯基三 氯矽烷、乙烯基三乙氧基矽烷、3-氯丙基三甲氧基矽烷、3-氯丙基甲基二氯矽烷、3 -氯丙基甲基二甲氧基矽烷、3 -氯丙 (請先閱讀背面之注意事項再填寫本頁) _ι·裝· 、1Τ 本紙張尺度適用中國國家標準(CNS ) Α4規格(210Χ297公釐) -28 - c说200301 5 4 A7 B7 五、發明説明(2》 基甲基二乙氧基矽烷、3-巯丙基三甲氧基矽烷、3-環氧丙氧 基丙基三甲氧基砍院、3 -環氧丙氧基丙基甲基二曱氧基石夕 院、3 -甲基丙傭釀氧基丙基二甲氧基石夕院、3 -甲基丙傭酸氧 基丙基曱基二甲氧基矽烷、六甲基二矽烷氨、乙醯基醋酸 乙酯二異丙氧基鋁、參(乙醯基醋酸乙酯)鋁、雙(乙醯基醋 酸乙酯)單乙醯基醋酸鋁、參(乙醯基醋酸)鋁等。此等密合 促進劑的塗布時,若必要可加入其它添加物,以溶劑稀釋 使用。密合促進劑之處理可用已知方法爲之。 爲提升與有機基板之密合性,亦可採用將有機基板浸 ^泡於鹼水溶液中加熱之手法。例如,聚醯亞胺樹脂可於5M 左右之氫氧化鉀溶液處理約5分鐘,醯亞胺環裂開產生羧 基以賦予釘錨效果。 使用本發明之金屬氧化物分散體,於基板上形成金屬 薄膜時,先將金屬氧化物分散體塗布於基板上。塗布方法 可用將分散體塗布於基板時所用之一般方法,有例如網印 法、浸塗法、噴塗法、旋塗法、噴墨法等。塗布分散體於 基板上之際,塗布厚度以0.1至100微米爲佳,1至30微 米更佳。 塗布分散體於基板上後,該基板於足使金屬氧化物還 原爲金屬之溫度作加熱處理,於基板上形成金屬薄膜。所 得金屬薄膜容易氧化時,以於非氧化性環境氣體中作加熱 處理爲佳。金屬氧化物難以僅藉金屬氧化物分散體中之還 原劑(多元醇、聚醚化合物、追加之多元醇及聚醚化合物以 外之還原劑)還原時,以於還原性環境氣體中煅燒爲佳。於 本紙張尺度適用中國國家標準(CNS ) Α4規格(210X297公釐) (請先閲讀背面之注意事項再填寫本頁) -裝·Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs of the Ministry of Economic Affairs of the People's Republic of China 1-25T 2GU30if5 4 A7 B7 V. Description of the invention (22) and the addition effect is small at 0.1% by weight, and if it exceeds 20% by weight, the conductivity of the metal bonding layer is significant It is not suitable for metal bucket formation. In the present invention, the polyhydric alcohol and polyether compound have reducing properties, and have the effect of gastrointestinal & metal oxides. In addition to the polyhydric alcohol and polyether compounds, H can be added to metal oxide dispersions to reduce metal The reduction of the oxide is uniform, and it is preferable that the metal oxide is more easily reduced. At this time, it is only necessary to be able to reduce the metal oxide, and there are no particular restrictions on the reducing agent that can be used, either inorganic reducing agent or organic reducing agent. Examples of the inorganic reducing agent include hydrides such as sodium borohydride and lithium borohydride; sulfur compounds such as sulfur dioxide; salts of lower oxides such as sulfite; hydrogen iodide and carbon. Examples of organic reducing agents other than polyols and polyether compounds include aldehydes, hydrazines, diimines, and oxalic acid. Aldehydes include, for example, formaldehyde, acetaldehyde, propionaldehyde, butyraldehyde, isobutyraldehyde, valeraldehyde, isovaleraldehyde, trimethylacetaldehyde, hexanal, heptanoic acid, octaldehyde, nonan, undecanal, lauric enzyme, Tridecanoic acid, myristic acid, pentaaldehyde, palmitaldehyde, heptaaldehyde, stearyl aldehyde and other aliphatic saturated aldehydes, glyoxal, succinaldehyde and other aliphatic dialdehydes, acrolein, crotonaldehyde, propargaldehyde, etc. Aliphatic unsaturated aldehydes, benzaldehyde, o-tolualdehyde, m-tolualdehyde, p-tolualdehyde, salicylaldehyde, cinnamaldehyde, α-naphthaldehyde, Θ-naphthaldehyde and other aromatic aldehydes, and heterocyclic aldehydes such as furfural. Diimines are obtained, for example, by thermal decomposition of azodicarboxylate, hydroxylamine-0-sulfonic acid, N-propadienesulfonylhydrazine or N-fluorenylsulfonylhydrazine. Examples of N-propadienesulfonylhydrazine or N-fluorenylsulfonylhydrazine include p-toluenesulfonylhydrazine, benzenesulfonylhydrazine, 2,4,6-p-isopropylbenzenesulfonylhydrazine, chloroethinhydrazine, O-Nitrobenzenesulfonylhydrazine, m-nitrobenzenesulfonylhydrazine, p-nitrobenzenesulfonylhydrazine, etc. This paper size is applicable to Chinese National Standard (CNS) A4 specification (21〇297297). --------, _ installed-(Please read the precautions on the back before filling this page) Order the intellectual property of the Ministry of Economic Affairs Printed by the Bureau ’s Consumer Cooperatives -26- C200301 5 4 A7 B7 V. Description of the Invention (The content of reducing agents other than polyhydric alcohols and polyether compounds' is based on the total weight of the metal oxide dispersion of 0.1 to 70% by weight. 0.1 to 50% by weight, more preferably 0.1 to 20% by weight, and even more preferably 1 to 10% by weight. In the present invention, in order to improve the strength of the fired metal film and its adhesion to the substrate It is also possible to add metal oxide precursors, such as metal oxides, to metal oxide dispersions. Metal oxides such as the general formula M (0Rl) n, where M is a metal element. R1 is an alkyl group, and η is an oxidation of a metal element The number M is such as silicon, titanium, hafnium, aluminum, etc. The alkyl group is, for example, methyl, ethyl, isopropyl, n-butyl, tertiary butyl, etc. The representative metal oxides are tetramethoxysilane, tetra Ethoxysilane, tetra (n-propoxy) silane, tetra (isopropoxy) silane, tetra (n-butoxy Silicon compounds such as silane), tetra (secondary butoxy) silane, tetra (tertiary butoxy) silane, titanium tetraethoxy, tetra (n-propoxy) titanium, tetra (isopropoxy) Titanium compounds such as titanium, tetra (n-butoxy) titanium, tetra (secondary butoxy) titanium, and tetra (tertiary butoxy) titanium, etc. These compounds are liquid and easily dispersed in metal oxide dispersions. It is also preferable to use a metal alkoxide represented by 1 or more), and the metal is directly added with an organic group R2. Examples of the organic group R2 include methyl, ethyl, propyl, phenyl, and butyl. The method for dispersing metal powder, thermosetting resin, reducing agent, metal alkoxide and other materials in the metal oxide dispersion can be ultrasonic method, mixer method, three-roll method, two-roll method, vertical ball mill, bauber General methods such as mixers, paint shakers, kneaders, homogenizers, ball mills, and sand mills. These dispersions can also be performed simultaneously with the dispersion of metal oxides and polyols (and / or polyether compounds) in a dispersion medium. This paper size applies Chinese National Standard (CNS) A4 specification (210X297 mm) (Please read the precautions on the back before filling out this page) Binding and ordering Printed by the Intellectual Property Bureau Staff Consumer Cooperatives of the Ministry of Economics -27- 2003011 ^ 4 A7 B7 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 5. Description of the invention (Secondly, a method for forming a metal thin film on a substrate using the metal oxide dispersion of the present invention (a method for forming a substrate and a laminate formed by the metal thin film). The substrate can be an inorganic or organic substrate. The inorganic substrate can be a glass substrate, a semiconductor substrate such as silicon and germanium, a compound semiconductor substrate such as gallium-arsenic, indium-antimony, etc., and a thin film of other substances can be formed on the surface before use. The thin film can be made of aluminum, titanium, chromium, nickel, copper, silver, molybdenum, tungsten, titanium, platinum, gold and other metals, silicon dioxide, fluorinated glass, phosphorous glass, borophosphoric glass, borosilicate glass, polycrystalline silicon , Inorganic compounds such as aluminum oxide, titanium oxide, oxide pins, silicon nitride, titanium nitride, giant nitride, boron nitride, hydrogenated silsesquioxane, ITO (indium tin oxide), Thin films made of sesquioxane, amorphous carbon, fluorinated amorphous carbon, polyimide, etc. Organic substrates are not limited if the heat treatment temperature of the metal oxide dispersion is not damaged by heat, and can be used, for example Polyimide substrates, polyethylene terephthalate (PET) substrates, aromatic polyimide substrates, epoxy substrates, fluororesin substrates, etc. Before forming a metal thin film, you can first improve adhesion, etc. It can be treated by physical methods such as plasma treatment and electron beam treatment, and can also be treated by chemical methods such as adhesion promoters. The adhesion promoters can be so-called silane coupling agents, aluminum chelates, etc. The preferred ones are 3- Aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, N (2-aminoethyl) -3-aminopropyltrimethoxysilane, N- (2-aminoethyl Group) -3-aminopropylmethyldimethoxysilane, vinyltrichlorosilane, vinyltriethoxysilane, 3-chloropropyltrimethoxysilane, 3-chloropropylmethyldichloro Silane, 3-chloropropylmethyldimethoxysilane, 3-chloropropane (Please read the precautions on the back before filling out this page) _ι · 装 · 1 This paper size applies to China National Standard (CNS) A4 specification (210 × 297 mm) -28-c said 20031 5 4 A7 B7 V. Description of the invention (2 "methyl methyl diethoxysilane, 3-mercaptopropyl trimethoxy Silane, 3-glycidoxypropyltrimethoxy-trioxide, 3-glycidoxypropylmethyldioxolithium, 3-methylpropanyloxypropyldimethoxy Keystone Xiyuan, 3-Methylpropionate oxypropylfluorenyldimethoxysilane, hexamethyldisilammonium, ethyl ethylacetate diisopropoxy aluminum, ginseng (ethyl ethyl acetate (Ester) aluminum, bis (ethyl ethyl acetate) aluminum monoethyl ethyl acetate, ginseng (ethyl ethyl acetate), etc. In the application of these adhesion promoters, other additives can be added if necessary, and the solvent Use diluted. The adhesion promoter can be treated by known methods. In order to improve the adhesion with the organic substrate, a method of immersing the organic substrate in an alkaline aqueous solution and heating can also be adopted. For example, polyimide resin can be treated in a potassium hydroxide solution of about 5M for about 5 minutes, and the imidene ring is cleaved to generate a carboxyl group to give a nail anchor effect. When the metal oxide dispersion of the present invention is used to form a metal thin film on a substrate, the metal oxide dispersion is first coated on the substrate. Application method The general method used for applying the dispersion to a substrate can be used, and examples thereof include a screen printing method, a dip coating method, a spray coating method, a spin coating method, and an inkjet method. When the dispersion is coated on the substrate, the coating thickness is preferably from 0.1 to 100 m, and more preferably from 1 to 30 m. After the dispersion is coated on a substrate, the substrate is heat-treated at a temperature sufficient to reduce the metal oxide to metal to form a metal thin film on the substrate. When the obtained metal film is easily oxidized, it is preferable to perform heat treatment in a non-oxidizing ambient gas. When it is difficult to reduce metal oxides only by reducing agents (polyols, polyether compounds, additional polyols, and reducing agents other than polyether compounds) in metal oxide dispersions, calcination in a reducing ambient gas is preferred. For this paper size, the Chinese National Standard (CNS) Α4 specification (210X297 mm) is applied (Please read the precautions on the back before filling this page)

、1T 經濟部智慧財產局員工消費合作社印製 -29- C价20U30ii54 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明説明(g 鈍性環境氣體中煅燒後,隨之於還原性環境氣體中煅燒而 得之金屬薄膜,因緻密性更加提升而更佳。非氧化性環境 氣體乃不含氧等氧化性氣體之環境氣體,有鈍性環境氣體 及還原性環境氣體。鈍性環境氣體乃指充以例如氬、氦、 氖、氮等鈍性氣體之環境氣體。還原性環境氣體指有氫、 一氧化碳等還原性氣體存在之環境氣體。此等氣體可充塡 於煅燒爐中成密閉系統煅燒,亦可使煅燒爐成爲流通系統 •,流通此等氣體。於非氧化性環境氣體中煅燒時,可將煅 燒爐內暫時抽真空去除氧,以非氧化性氣體取代。煅燒可 於加壓環境氣體中進行,亦可於減壓環境氣體中進行。 此等還原處理中,加熱處理溫度以50°C以上500°C以 下爲佳,80°C以上40(TC以下更佳,100°C以上350°C以下又 更佳。本發明之金屬氧化物分散體的必要成分多元醇化合 物及/或聚醚化合物,可於如此之相對低溫焚化(或分解)。 可於不及50°C之溫度還原金屬氧化物等,金屬氧化物分散 體之保存安定性有惡化之傾向。須在高於500°C時,因超過 多數有機基材之耐熱性無法用於有機基材上,故均不佳。 加熱處理所需時間受金屬氧化物種類、加熱環境氣體、加 熱處理溫度以及欲施以加熱處理的分散體之形狀、大小影 響。金屬氧化物用銅之氧化物,而塗膜在微米程度,氫氣 不稀釋直接用作還原氣體,設定加熱處理溫度於20 0°C至 300°C時,1至2分鐘即可。 同一金屬氧化物,粒徑小者比粒徑大者易於還原,故 粒徑大時或須於還原環境氣體中緞燒,粒徑小時或僅於鈍 ---------裝-- (請先閱讀背面之注意事項再填寫本頁) 、11 本紙張尺度適用中國國家標準(CNS ) A4規格(210X 297公釐) -30- 20U30ii54 A7 B7 五、發明説明(2) 性環境氣體中煅燒即可還原。此時於鈍性環境氣體中煅燒 有可能形成實用上無問題之金屬薄膜。 煅燒本發明之金屬氧化物分散體所得之金屬薄膜,因 以粒徑不及200奈米之金屬氧化物微粒爲原料,其微觀結 構係原料金屬氧化物微粒還原而得之一次粒徑不及200奈 米的金屬微粒互相熔合之結構,更詳言之,係一次粒徑不 及200奈米之金屬微粒互相熔合形成顆粒,顆粒間接觸、 熔合形成薄膜之結構,此可用電子顯微鏡觀察煅燒後之金 屬薄膜確認。 金屬氧化物微粒還原而得之金屬微粒互相熔合形成之 金屬顆粒之大小,隨加熱處理之環境氣體、溫度、處理時 •間而異。高溫、長時間之加熱處理則金屬顆粒更大。又, 於還原性環境氣體中加熱,則金屬顆粒有變大之傾向。金 屬顆粒愈大,且金屬顆粒互相緻密堆疊金屬顆粒間之孔結 構愈小、愈少,金屬薄膜之導電性愈接近金屬體之値,故 愈適用作導電薄膜。 如下述,隨金屬氧化物分散體中聚醚化合物含量,該 金屬氧化物分散體锻燒而成之金屬薄膜結構不同。 聚醚化合物含量占金屬氧化物分散體總重量0.1至70 重量%以下之金屬氧化物分散體煅燒成之金屬薄膜,金屬顆 粒互相緻密堆疊,體積電阻値接近金屬體之値,故適用於 例如,構裝領域有低體積電阻値之要求的配線材料、連接 材料。 另一方面,聚醚化合物之含量占金屬氧化物分散體總 本紙張尺度適用中國國家標準(CNS ) Α4規格(210X 297公釐) (請先閱讀背面之注意事項再填寫本頁) 裝·Printed by 1T Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs -29- C Price 20U30ii54 A7 B7 Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 5. Description of the invention (g After calcination in inert ambient gas, followed by reducing environment The metal film obtained by calcination in the gas is better because the density is further improved. Non-oxidizing ambient gas is an ambient gas that does not contain oxidizing gases such as oxygen. There are inert ambient gas and reducing ambient gas. Inert ambient gas Refers to an ambient gas filled with inert gases such as argon, helium, neon, nitrogen, etc. Reducing ambient gas refers to an ambient gas in which reducing gases such as hydrogen and carbon monoxide are present. These gases can be filled in a calciner and sealed. The system calcination can also make the calcining furnace a circulation system •, which circulates these gases. When calcining in non-oxidizing ambient gas, the calcining furnace can be temporarily evacuated to remove oxygen and replaced with non-oxidizing gas. Calcination can be used in Canada. It can be carried out under pressure or in a reduced pressure. In these reduction treatments, the heat treatment temperature is preferably 50 ° C to 500 ° C, and 80 ° C above 40 (more preferably below TC, more preferably above 100 ° C and below 350 ° C. Polyol compounds and / or polyether compounds, essential components of the metal oxide dispersion of the present invention, can be incinerated at such a relatively low temperature ( Or decomposition). Metal oxides can be reduced at temperatures below 50 ° C. The storage stability of metal oxide dispersions tends to deteriorate. Above 500 ° C, the heat resistance of most organic substrates must be exceeded. Can not be used on organic substrates, so they are not good. The time required for heat treatment is affected by the type of metal oxide, the heating ambient gas, the temperature of the heat treatment, and the shape and size of the dispersion to be heat treated. Oxide of copper, while the coating film is at the micron level, hydrogen is used directly as the reducing gas without dilution, and the heat treatment temperature is set at 20 ° C to 300 ° C in 1 to 2 minutes. The same metal oxide, particle size The smaller one is easier to reduce than the larger one. Therefore, when the particle size is large, it is necessary to burn the satin in reducing ambient gas. When the particle size is small or only blunt. Note for this page, please fill in this page), 11 papers The scale is applicable to the Chinese National Standard (CNS) A4 specification (210X 297 mm) -30-20U30ii54 A7 B7 V. Description of the invention (2) Calcination in the ambient environment gas can be reduced. Calcination in the inert environment gas may form at this time Practically non-problematic metal thin film. The metal thin film obtained by calcining the metal oxide dispersion of the present invention is obtained by using metal oxide particles having a particle size of less than 200 nm as a raw material, and the microstructure is obtained by reducing the metal oxide particles of the raw material. The structure of metal particles with a primary particle size of less than 200 nanometers fused to each other. More specifically, it is a structure of metal particles with a primary particle size of less than 200 nanometers fused to each other to form particles. The particles contact and fuse to form a thin film structure. It was confirmed by microscopic observation of the calcined metal thin film. The size of the metal particles formed by the fusion of metal particles obtained by the reduction of metal oxide particles varies with the ambient gas, temperature, and processing time of the heat treatment. High-temperature, long-term heat treatment will make the metal particles larger. In addition, when heated in a reducing ambient gas, the metal particles tend to become larger. The larger the metal particles, and the smaller and less porous structure between the metal particles and the densely stacked metal particles, the closer the metal film's conductivity is to that of the metal body, so it is more suitable as a conductive film. As described below, depending on the content of the polyether compound in the metal oxide dispersion, the metal thin film structure obtained by calcining the metal oxide dispersion is different. A metal film calcined by a metal oxide dispersion with a polyether compound content of 0.1 to 70% by weight of the total weight of the metal oxide dispersion. The metal particles are densely stacked with each other, and the volume resistance is close to that of the metal body. Therefore, it is suitable for, for example, There are wiring materials and connection materials required for low volume resistance in the construction field. On the other hand, the content of polyether compounds accounts for the total metal oxide dispersion. The paper size applies the Chinese National Standard (CNS) A4 specification (210X 297 mm) (please read the precautions on the back before filling this page).

、1T 經濟部智慧財產局員工消費合作社印製 -31 - 200301154 A7 經濟部智慧財產局員工消費合作社印製 ___ B7五、發明説明(3 重量不及0.1重量%之金屬氧化物分散體緞燒而得之金屬薄 膜因具多孔結構,表面積大,適用於電極等用途。以本發 明之製造方法,可製造孔徑1微米以下之多孔性金屬薄膜 〇 本發明之金屬薄膜製造方法,係還原金屬氧化物微粒 產生金屬微粒,其間熔合而得金屬薄膜之方法,因利用還 原所生粒子間之自發性熔合引力,不必加壓。又,如上述 ,金屬氧化物微粒之一次粒徑不及200奈米,非常之小, 且聚醚化合物及多元醇本身具還原性,金屬粒子間應易有 自發性熔合。多元醇或聚醚化合物於相對低溫煅燒,因本 身氧化、分解、揮發、金屬薄膜中不易有此等絕緣成分殘 .留,故金屬薄膜之體積電阻値低。又,如上述,調整金屬 氧化物分散體中聚醚化合物之含量,即易得多孔性金屬薄 膜。再以控制基板上金屬氧化物分散體之塗布厚度,可任 意控制所得金屬薄膜之膜厚,尤以於形成微細電路所需之 極薄金屬層的容易形成之優點,特別適用於背膠金屬箔等 用途。 金屬氧化物分散體含金屬粉時,經锻燒得金屬粉間金 屬氧化物微粒還原產生之金屬微粒熔合而成之金屬薄膜。 因此’本發明所得金屬薄膜之金屬成分包括金屬氧化物還 原而得之金屬,及所添加金屬粉之金屬。金屬氧化物還原 *得之金屬與金屬粉之金屬可係相同或不同。可構成金屬薄 膜之金屬有例如金、銀、銅、鈀、鉑、鎳、鉻、鋁、錫、 鋅、鈦、鎢、钽、鋇、鍺、釕、餓、鉍、銥、鈷、銦、鐵 本紙張尺度適用中國國家標準(CNS ) A4規格(210X 297公釐) ' -32- (請先閲讀背面之注意事項再填寫本頁) 20U30if5 4 A7 B7 五、發明説明(g 、鉛,金屬薄膜含此等金屬之至少其一。 (請先閲讀背面之注意事項再填寫本頁) 本發明之金屬薄膜製造方法係於相對低溫锻燒當場( insitu)產生金屬微粒,使粒子間熔合製造金屬薄膜之方法, ,所用原料並非昂貴之金屬微粒,而係價廉之金屬氧化物 ,故有能廉價製造金屬薄膜之優點。又,金屬氧化物微粒 不須預先分散於結晶高分子等之特殊媒體(其需高溫分解), 故可於5 00 °C以下之相對低溫以加熱處理形成金屬薄膜,因 此,具有製程成本低之優點。易言之,本發明之金屬薄膜 .的製造方法,係使用低價原料,以低溫锻燒程序即可製造 金屬薄膜之方法。 實施例 經濟部智慧財產局員工消費合作社印製 以下藉實施例具體說明本發明,惟本發明不限於此。 本發明中銅氧化物粒子之一次粒徑,及锻燒所得金屬 薄膜之表面形態,係用日立製作所製之掃瞄式電子顯微鏡( S _47 00)觀察表面而測定。金屬氧化物分散體中之金屬氧化 物的平均二次粒徑,係用堀場製作所製之雷射散射粒度布 計(LA-920)測定。所得金屬薄膜體積電阻率,係用低電阻率 •計(LOWRESTER GP(三菱化學(股)製)以四短針法求出。 (實施例1 :調製氧化銅微粒分散體及製造多孔性銅薄膜之 例) 於二乙二醇5克加入氧化銅奈米粒子(粒徑10至100 奈米,標稱平均粒徑30奈米,CI化成(股)製)5克,用 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) -33- 交.c200301154 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明説明(3d KEYENS(股)製攪拌脫泡機(HM-5 00)以攪拌模式1〇分鐘, 脫泡模式5分鐘之條件作分散處理,得氧化銅微粒分散體 。將所得氧化銅微粒分散體塗布於載玻片上成爲長2公分 、寬1公分、厚2〇微米。將上述載玻片送入煅燒爐內,爐 內以真空泵脫氣後,以1公升/分鐘流量之氫氣流通。煅燒 爐溫度由室溫以1小時升溫至250°C,達250°C後再於該溫 度加熱1小時煅燒。冷卻後取出載玻片加以觀察’所得銅 薄膜係厚4微米、孔徑約0.3微米之多孔性薄膜。該薄膜易 於從載玻片以膠帶剝離,該薄膜之體積電阻値爲5χ 1(Γ5歐 姆公分。 (實施例2 :調製氧化銅微粒分散體,製造多孔性銅薄膜之 例) 分散媒體改用乙二醇,以如同實施例1之分散方法調 製氧化銅微粒分散體。煅燒溫度改爲200°C以外如同實施例 1作氧化銅分散體之氫锻燒。該薄膜易於從載玻片以膠帶剝 .離’該薄膜之體積電阻値爲6 X 1 0 5歐姆公分。冷卻後取出 載玻片作觀察,則形成有厚4微米、孔徑約0.2微米之多孔 結構的多孔性銅薄膜。 (實施例3 :調製氧化銅微粒分散體,製造多孔性銅薄膜之 例) 分散媒體改用二乙二醇與水之1 : 1混合物,以如同實 施例1之分散方法調製氧化銅微粒子分散體。煅燒環境氣 (請先閱讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS ) A4規格(210X 297公釐) -34- p . C β (200301154 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明説明(31) 體改爲氬,锻燒溫度爲3 5 0 °C,煅燒爐爲密閉系統,煅燒爐 之溫度由室溫以1小時升溫至3 5 0 °C,達3 5 0 °C後於該溫度 再加熱1小時煅燒。冷卻後取出載玻片作觀察,得厚5微 米、孔徑約0.5微米之多孔性銅薄膜。又,該薄膜易於以膠 帶自載玻片剝離,該薄膜之體積電阻値爲5X 10_5歐姆公分 〇 (實施例4 :調製氧化銅微粒分散體,製造銅薄膜之例) 混合氧化銅奈米粒子(粒徑10至100奈米,標稱平均粒 徑30奈米,CI化成(股)製)5克,聚乙二醇(平均分子量600 ,和光純藥工業(股)製)1克,及乙二醇)(和光純藥工業(股) 製)4克,以如同實施例1之條件得氧化銅微粒分散體。將 所得氧化銅微粒塗布於載玻片上成爲長5公分、寬1公分 、厚1 0微米。將上述載玻片送入煅燒爐內,爐內以真空泵 脫氣後,以流量1公升/分鐘之氣氣流通。煅燒爐以1小時 由室溫升溫至250°C,達250°C後再於該溫度加熱1小時作 處理。冷卻後確認載玻片上形成有厚8微米之均勻銅薄膜 。該薄膜與載玻片之粘合性高,以膠帶剝離試驗無法剝落 。該薄膜之體積電阻値低如1.5x 1(Τ5歐姆公分。 (實施例5至7 :調製氧化銅微粒分散體,製造銅薄膜之例) 混合氧化銅奈米粒子(粒徑10至100奈米,標稱平均粒 徑3 0奈米,CI化成(股)製)5克,乙二醇(和光純藥工業(股) 製)4.5克,及平均分子量各400、600、1 000之聚乙二醇(和 (請先閱讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) -35- 200301154 A7 經濟部智慧財產局員工消費合作社印製 _______B7五、發明説明(3) 光純藥工業(股)製)0·5克,以如同實施例丨之分散體條件得 氧化銅微粒分散體。如同實施例形成銅薄膜。所得銅薄膜 與載玻片之粘合性皆高,以膠剝離試驗均無法剝離。該等 薄膜之體積電阻値低如2至3x 10·5歐姆公分。 (實施例8 :調製氧化銅微粒分散體,製造銅薄膜之例) 混合氧化銅奈米粒子(粒徑10至100奈米,標稱平均粒 徑30奈米,CI化成(股)製)4克,水2克,及平均分子量 400之聚乙二醇(和光純藥工業(股)製)2克,以如同實施例1 之分散條件得氧化銅微粒分散體。如同實施例形成銅被膜 。所得銅被膜易於以膠帶從載玻片剝離,體積電阻値爲4x 10_5歐姆公分。 (實施例9 :合成氧化亞銅微粒分散體,製造銅薄膜之例) . 於玻璃三口燒瓶內饋入醋酸銅(和光純藥工業(股)製)2.7 克,純水0.9克,及二乙二醇90毫升。於油浴中升溫至 1 90°C,於該溫度持續加熱2小時。反應2小時後冷卻至室 溫,以日立工機(股)製之離心分離機將產物離心沈降。捨棄 上澄液中未反應之醋酸銅等。於離心分離沈澱物加1 00毫 升之二乙二醇,以超音波分散,以離心分離,於20,000G之 重力沈降粒徑大於1 〇〇奈米之氧化亞銅粒子,餘留在上澄 液之100奈米以下之氧化亞銅再以離心分離,於35,000G之 重力沈降,得1 〇〇奈米以下之氧化亞銅粒子沈澱物。所得 粒子一部份於載玻片上以85°C真空乾燥後,用電子顯微鏡 ^紙張尺度適用中國國家標準(CNS ) A4規格(210X 297公"" (請先閱讀背面之注意事項再填寫本頁) -36- c20030 ι5 4 A7 B7 五、發明説明( (請先閱讀背面之注意事項再填寫本頁) 觀測表面形態,係一次粒徑30至100奈米之氧化亞銅’平 均粒徑80奈米。以雷射散射法觀測之平均二次粒徑爲1 20 奈米。 對氧化亞銅粒子0.3克加聚乙二醇(平均分子量400,和 光純藥工業(股)製)0.12克,二乙二醇0.18克,經超音波分 散成氧化亞銅分散體。將所得氧化亞銅分散體塗布於載玻 片上成爲長5公分、寬1公分、厚30微米。將上述載玻片 送入锻燒爐內,爐內以真空泵脫氣後,以流量0.1公升/分 鐘之氫氣流通。锻燒爐由室溫以1小時升溫至300°C,達 300°C後,再於該溫度加熱處理1小時。冷卻後確認於載玻 片上形成有厚8微米之均勻銅薄膜。所得銅薄膜與載玻片 .之粘合性高,以膠帶剝離試驗無法剝離。該薄膜之體積電 阻率低如4χ 1(Τδ歐姆公分。 (實施例1 0 :合成氧化亞銅微粒分散體,製造銅薄膜之例( 使用混合分散媒體之例)) 經濟部智慧財產局員工消費合作社印製 對實施例9所得之氧化亞銅粒子0.3克加聚乙二醇(平 均分子量400,和光純藥工業(股)製)0.12克,乙二醇〇.〇5 克,及乙醇0.13克,以超音波分散成氧化亞銅分散體。如 同實施例9於載玻片上塗布、煅燒,得厚9微米,體積電 阻率6.0x 1CT6歐姆公分之銅薄膜。所得銅薄膜與載玻片之 *粘合性高,以膠帶剝離試驗無法剝落。 (實施例11 ··合成氧化亞銅微粒分散體,製造銅薄膜之例( 本紙張尺度適用中國國家標準(CNS ) Α4規格(210Χ297公釐) -37- 200301154 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明説明(g 作鈍性環境氣體及還原環境氣體之二煅燒之例)) 锻燒實施例9所得之氧化亞銅微粒分散體時,不直接 於30(TC作氫還原處理,而係先置載玻片於熱板上,熱板 全體以氮氣流通,熱板由室溫上升至250°C,於250°C煅燒 .1小時。冷卻後將預锻燒之上述載玻片移入煅燒爐,爐內以 真空泵充分排氣後,爐中以氫氣流通,於300°C正式鍛燒1 小時,得膜厚5微米之銅薄膜。銅薄膜之體積電阻値係極 低之3x 10_6歐姆公分。所得銅薄膜與載玻片之粘合性高, 以膠帶剝離試驗無法剝離。 (實施例1 2 :合成含糖醇之氧化亞銅微粒分散體,製造銅薄 膜之例 於實施例9所得粒徑1 00奈米以下之氧化亞銅粒子0.1 克加聚乙二醇(平均分子量400,和光純藥工業(股)製)0.1克 ‘,山梨糖醇0.1克,及乙二醇0.7克,以超音波分散得含氧 化亞銅10重量%之氧化亞銅分散體。分散後當時的分散體 中氧化亞銅之平均二次粒徑爲1 20奈米。超音波分散後, 該分散體靜置過夜,其中氧化亞銅之平均二次粒徑不變。 所得分散體用線條-間隙30微米之網印版(SONOC〇M( 股)製)網印於聚醯亞胺膜上時印刷性良好。將上述載玻片送 入煅燒爐內,爐內以真空泵脫氣後,以流量1公升/分鐘之 氫氣流通,锻燒爐由室溫以1小時升溫至250°C,達25(TC 後再於該溫度加熱處理1小時。冷卻後取出聚醯亞胺膜, 以顯微鏡觀察其表面,可確認形成有銅配線而無斷線。 (請先閲讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) -38- 2uU30ii54 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明説明(y (實施例1 3 :合成含糖醇之氧化亞銅微粒分散體,製造銅薄 膜之例) 所用糖醇爲赤蘚糖以外,如同實施例1 2調製氧化亞銅 分散體,超音波分散後靜置過夜,分散體中氧化亞銅之平 均二次粒徑不變,仍爲120奈米。該分散體如同實施例12 以線條-間隙30微米之網印版網印於聚醯亞胺上時印刷性良 好。如同實施例1 2作加熱處理,冷卻後取出聚醯亞胺膜, 以顯微鏡觀察其表面,可確認形成有銅配線而無斷線。 (實施例14:合成合金屬粉之氧化銅微粒分散體,製造銅薄 膜之例) 氧化銅微粒(粒徑10至100奈米,標稱平均粒徑30奈 米,CI(股)製5克,乙二醇(和光純藥工業(股)製)4克,聚 乙二醇(平均分子量600),及銀粒子(平均粒徑2·5微米), Sigma Aldrich公司製)0.5克以如同實施例1之方法分散, 得含銀粒子之氧化銅微粒分散體,如同實施例1煅燒。所 得含銀粒子之銅薄膜,其體積電阻値爲7xl(T5歐姆公分。 所得薄膜比不含銀柱子之銅薄膜之銅薄膜抗氧化性強。又 ,所得薄膜與載玻片之粘合物高,以膠帶剝離認驗不剝落 〇 (實施例1 5 :合成含環氧樹脂之氧化銅微粒分散體,製造 .銅薄膜之例) (請先閱讀背面之注意事項再填寫本頁)、 1T Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs-31-200301154 A7 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs ___ B7 V. Description of the invention (3 Metal oxide dispersions weighing less than 0.1% by weight The obtained metal film has a porous structure and a large surface area, and is suitable for applications such as electrodes. With the manufacturing method of the present invention, a porous metal film having a pore diameter of 1 micrometer or less can be manufactured. The manufacturing method of the metal film of the present invention is a reduction of metal oxides The method of producing fine metal particles from fine particles and fusing them to obtain a metal thin film does not require pressure because of the spontaneous fusion attraction between the particles generated by the reduction, and as mentioned above, the primary particle size of the metal oxide fine particles is less than 200 nm, which is very It is small, and the polyether compound and the polyol itself are reducing, and the metal particles should be susceptible to spontaneous fusion. The polyol or the polyether compound is calcined at a relatively low temperature, which is not easy to occur in the metal film due to oxidation, decomposition, volatilization, and the like. And other insulation components remain. Therefore, the volume resistance of the metal thin film is low. Also, as described above, the metal oxide content is adjusted. The content of the polyether compound in the dispersion is easy to obtain a porous metal film. Then, by controlling the coating thickness of the metal oxide dispersion on the substrate, the film thickness of the obtained metal film can be arbitrarily controlled, especially for the formation of extremely fine circuits. The thin metal layer has the advantage of being easy to form, and is particularly suitable for use in backing metal foils, etc. When the metal oxide dispersion contains metal powder, the metal particles produced by the reduction of metal oxide particles between the metal powders after calcination are fused. Therefore, the metal component of the metal thin film obtained in the present invention includes a metal obtained by reduction of a metal oxide and a metal of added metal powder. The metal obtained by metal oxide reduction * and the metal of the metal powder may be the same or different. Metals constituting the metal film include, for example, gold, silver, copper, palladium, platinum, nickel, chromium, aluminum, tin, zinc, titanium, tungsten, tantalum, barium, germanium, ruthenium, bismuth, iridium, cobalt, indium, iron This paper size applies Chinese National Standard (CNS) A4 specification (210X 297mm) '-32- (Please read the precautions on the back before filling this page) 20U30if5 4 A7 B7 V. Description of the invention g. Lead and metal films contain at least one of these metals. (Please read the precautions on the back before filling out this page.) The method for manufacturing the metal film of the present invention is to generate metal particles on the spot at relatively low temperature calcination, so that The method of fusing inter-particles to produce a metal thin film uses raw materials that are not expensive metal particles but inexpensive metal oxides, so it has the advantage of being able to manufacture metal thin films at low cost. In addition, the metal oxide particles do not need to be dispersed in the crystal high The special media such as molecules (which need to be pyrolyzed) can form metal films by heat treatment at a relatively low temperature below 500 ° C, so it has the advantage of low process cost. In other words, the metal films of the present invention. The manufacturing method is a method of manufacturing a metal thin film by using a low-temperature raw material and a low-temperature calcination process. Examples Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs The following examples are used to illustrate the present invention in detail, but the present invention is not limited thereto. The primary particle diameter of the copper oxide particles and the surface morphology of the metal thin film obtained in the present invention are measured by observing the surface with a scanning electron microscope (S_47 00) manufactured by Hitachi. The average secondary particle diameter of the metal oxide in the metal oxide dispersion was measured using a laser scattering particle size cloth (LA-920) manufactured by Horiba. The volume resistivity of the obtained metal thin film was determined using a low-resistance meter (LOWRESTER GP (manufactured by Mitsubishi Chemical Corporation)) by the four-short needle method. (Example 1: Preparation of copper oxide fine particle dispersion and production of porous copper thin film Example) Add 5 grams of copper oxide nano particles (particle size 10 to 100 nanometers, nominal average particle size 30 nanometers, manufactured by CI Chemical Co., Ltd.) to 5 grams of diethylene glycol. This paper is applicable to China. Standard (CNS) A4 specification (210X297 mm) -33- 交 .c200301154 A7 B7 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 5. Description of the invention (3d KEYENS (shares) system stirring defoaming machine (HM-5 00) The dispersion process was performed under the conditions of 10 minutes in the stirring mode and 5 minutes in the defoaming mode to obtain a copper oxide particle dispersion. The obtained copper oxide particle dispersion was coated on a glass slide to become 2 cm in length, 1 cm in width, and 20 μm in thickness. The above glass slide is sent into a calcining furnace, which is degassed by a vacuum pump and then circulated with hydrogen at a flow rate of 1 liter / minute. The temperature of the calcining furnace is increased from room temperature to 250 ° C in 1 hour, and reaches 250 ° C. It is then calcined at this temperature for 1 hour. After cooling Take out the slide glass and observe it. The obtained copper thin film is a porous film with a thickness of 4 micrometers and a pore diameter of about 0.3 micrometers. The film is easily peeled off from the glass slide with an adhesive tape. Example 2: Example of preparing a copper oxide particle dispersion to produce a porous copper film) The dispersion medium was changed to ethylene glycol, and the copper oxide particle dispersion was prepared in the same manner as in Example 1. The calcination temperature was changed to other than 200 ° C. The hydrogen calcination of the copper oxide dispersion was carried out in the same manner as in Example 1. The film was easily peeled from the glass slide with an adhesive tape. The volume resistance of the film was 6 × 10 5 ohm cm. After cooling, the glass slide was taken out for observation. , A porous copper film having a porous structure with a thickness of 4 micrometers and a pore diameter of about 0.2 micrometers is formed. (Example 3: Example of preparing a copper oxide microparticle dispersion to produce a porous copper film) The dispersing medium was changed to diethylene glycol and The 1: 1 mixture of water is prepared by the dispersion method of copper oxide particles in the same manner as in Example 1. Calcination of ambient gas (please read the precautions on the back before filling this page) The paper size applies to Chinese national standards CNS) A4 specification (210X 297 mm) -34- p. C β (200301154 A7 B7 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. 5. Description of the invention (31) The body is changed to argon and the calcination temperature is 3 5 0 ° C, the calcining furnace is a closed system. The temperature of the calcining furnace is increased from room temperature to 350 ° C in 1 hour, and it is heated at this temperature for 1 hour. After cooling, the glass slide is taken out as It was observed that a porous copper film having a thickness of 5 micrometers and a pore diameter of about 0.5 micrometers was obtained. In addition, the film was easily peeled from the glass slide with an adhesive tape, and the volume resistance of the film was 5 × 10-5 ohm cm. (Example 4: Modified copper oxide Microparticle dispersion, example of manufacturing copper thin film) Mixed copper oxide nano particles (particle size 10 to 100 nanometers, nominal average particle size 30 nanometers, CI Chemical Co., Ltd.) 5 g, polyethylene glycol (average With a molecular weight of 600, 1 g of Wako Pure Chemical Industries, Ltd. and 4 g of ethylene glycol) (wako Pure Chemical Industries, Ltd.) 4 g, copper oxide fine particle dispersions were obtained under the same conditions as in Example 1. The obtained copper oxide fine particles were coated on a glass slide to have a length of 5 cm, a width of 1 cm, and a thickness of 10 m. The slide glass was put into a calcining furnace, and the furnace was degassed by a vacuum pump, and then passed through at a flow rate of 1 liter / minute. The calcining furnace was heated from room temperature to 250 ° C in 1 hour, and then heated at this temperature for 1 hour for treatment. After cooling, it was confirmed that a uniform copper film with a thickness of 8 microns was formed on the glass slide. This film has a high adhesion to a glass slide and cannot be peeled off by a tape peel test. The volume resistance of this film is as low as 1.5x 1 (T5 ohm cm.) (Examples 5 to 7: Examples of preparing copper oxide particle dispersions to produce copper films) Mixed copper oxide nano particles (particle size 10 to 100 nanometers) , Nominal average particle size of 30 nanometers, 5 grams of CI Kasei Co., Ltd., 4.5 grams of ethylene glycol (manufactured by Wako Pure Chemical Industries, Ltd.), and polyethylene with average molecular weights of 400, 600, and 1,000 each Diol (and (please read the precautions on the back before filling out this page) This paper size applies to China National Standard (CNS) A4 (210X297 mm) -35- 200301154 A7 Printed by the Employees ’Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs_ ______B7 V. Description of the invention (3) 0.5 g of Guangpure Pharmaceutical Industry Co., Ltd. The copper oxide particle dispersion was obtained under the same dispersion conditions as in Example 丨. A copper thin film was formed as in the example. The obtained copper thin film and glass carrier The adhesiveness of the sheets is high, and they cannot be peeled off by the peel test. The volume resistance of these films is as low as 2 to 3 x 10 · 5 ohm centimeters. (Example 8: Preparation of copper oxide particle dispersions to produce copper films Example) Mixed copper oxide nano particles (particle size 10 to 10 0 nanometers, nominal average particle size 30 nanometers, 4 grams of CI Kasei Co., Ltd., 2 grams of water, and 2 grams of polyethylene glycol (manufactured by Wako Pure Chemical Industries, Ltd.) with an average molecular weight of 400 grams. A copper oxide fine particle dispersion was obtained under the same dispersion conditions as in Example 1. A copper coating was formed as in the example. The obtained copper coating was easily peeled from the glass slide with an adhesive tape, and the volume resistance 値 was 4 x 10-5 ohm cm. (Example 9: Synthetic suboxide Copper particle dispersion, an example of manufacturing a copper film). A glass three-necked flask was charged with 2.7 g of copper acetate (made by Wako Pure Chemical Industries, Ltd.), 0.9 g of purified water, and 90 ml of diethylene glycol. In an oil bath The medium temperature was raised to 1 90 ° C, and the temperature was continuously heated for 2 hours. After 2 hours of reaction, it was cooled to room temperature, and the product was centrifuged by a centrifugal separator made by Hitachi Koki Co., Ltd. The unreacted Copper acetate, etc. Add 100 ml of diethylene glycol to the centrifugal sediment, disperse it with ultrasound, centrifuge it, and settle the cuprous oxide particles with a particle size greater than 1000 nm at a gravity of 20,000 G. Cuprous oxide below 100nm in the upper liquid Separated from the heart, settled by gravity at 35,000G to obtain precipitates of cuprous oxide particles below 1000 nm. Part of the obtained particles were dried on a glass slide at 85 ° C under vacuum, and then used with an electron microscope ^ paper size applicable to China National Standard (CNS) A4 Specification (210X 297 male " " (Please read the precautions on the back before filling this page) -36- c20030 ι5 4 A7 B7 V. Description of the invention ((Please read the precautions on the back before (Fill in this page) Observe the surface morphology. The average particle size of cuprous oxide is 30 nm to 100 nm. The average particle size is 80 nm. The average secondary particle diameter observed by laser scattering method was 120 nm. 0.32 g of cuprous oxide particles were added with polyethylene glycol (average molecular weight 400, manufactured by Wako Pure Chemical Industries, Ltd.) 0.12 g, and diethylene glycol 0.18 g, which were dispersed into a cuprous oxide dispersion by ultrasound. The obtained cuprous oxide dispersion was coated on a glass slide to have a length of 5 cm, a width of 1 cm, and a thickness of 30 m. The above slide was put into a calcining furnace, and the furnace was degassed with a vacuum pump, and then circulated with hydrogen at a flow rate of 0.1 liters / minute. The calcining furnace was heated from room temperature to 300 ° C in 1 hour, and after reaching 300 ° C, it was further heat-treated at this temperature for 1 hour. After cooling, it was confirmed that a uniform copper thin film having a thickness of 8 µm was formed on the glass slide. The obtained copper film had high adhesion to a glass slide, and was not peeled by a tape peeling test. The volume resistivity of the film is as low as 4 × 1 (Tδ ohm centimeters. (Example 10: Synthetic cuprous oxide particle dispersion, example of manufacturing a copper film (example of using a mixed dispersion medium)) Staff of the Intellectual Property Bureau of the Ministry of Economic Affairs Cooperative printed 0.30 g of cuprous oxide particles obtained in Example 9 with polyethylene glycol (average molecular weight 400, manufactured by Wako Pure Chemical Industries, Ltd.) 0.12 g, 0.05 g of ethylene glycol, and 0.13 g of ethanol It was dispersed into a cuprous oxide dispersion by ultrasound. It was coated and calcined on a glass slide as in Example 9 to obtain a copper film with a thickness of 9 micrometers and a volume resistivity of 6.0 x 1CT6 ohm cm. The obtained copper film and the glass slide * High adhesion, which cannot be peeled off by tape peeling test. (Example 11 · Example of Synthesizing Cuprous Oxide Microparticle Dispersion to Manufacture Copper Film (This paper size applies Chinese National Standard (CNS) A4 Specification (210 × 297 mm)- 37- 200301154 A7 B7 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. 5. Description of the invention (g as an example of calcination of inert ambient gas and reducing ambient gas). The cuprous oxide obtained in Example 9 was calcined. When the particle dispersion is not directly treated with hydrogen at 30 ° C, the glass slide is first placed on a hot plate, and the entire hot plate is circulated with nitrogen. The hot plate is raised from room temperature to 250 ° C and at 250 ° C. Calcined. 1 hour. After cooling, the pre-calcined slides were moved into a calcining furnace. After the furnace was fully evacuated by a vacuum pump, hydrogen was circulated in the furnace, and it was officially calcined at 300 ° C for 1 hour to obtain a film thickness of 5 microns. Copper film. The volume resistance of the copper film is very low 3x 10-6 ohm cm. The obtained copper film has high adhesion to the glass slide and cannot be peeled off by a tape peel test. (Example 12 2: Synthesis of sugar alcohol Example of making cuprous oxide particle dispersion and producing copper thin film 0.1 g of cuprous oxide particles having a particle size of less than 100 nm obtained in Example 9 plus polyethylene glycol (average molecular weight 400, manufactured by Wako Pure Chemical Industries, Ltd.) 0.1 g ', sorbitol 0.1 g, and ethylene glycol 0.7 g, were dispersed by ultrasound to obtain a cuprous oxide dispersion containing 10% by weight of cuprous oxide. The average secondary of cuprous oxide in the dispersion at the time after dispersion The particle size is 120 nm. After the ultrasonic dispersion, the dispersion was left standing overnight, The average secondary particle diameter of the cuprous oxide is unchanged. The obtained dispersion is screen-printed on a polyimide film with a screen printing plate (made by SONOCOM (strand)) with a line-gap of 30 microns. The printability is good. The above glass slide is sent into the calcining furnace, which is degassed by a vacuum pump and then circulated with hydrogen at a flow rate of 1 liter / minute. The calcining furnace is heated from room temperature to 250 ° C in 1 hour and reaches 25 (TC and then in Heat treatment at this temperature for 1 hour. After cooling, take out the polyimide film and observe the surface with a microscope. It can be confirmed that copper wiring is formed without disconnection. (Please read the precautions on the back before filling this page.) This paper size applies Chinese National Standard (CNS) A4 specification (210X297 mm) -38- 2uU30ii54 A7 B7 Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 5. Description of the invention (y (Example 13: Synthesis of cuprous oxide particles containing sugar alcohol) Dispersion, example of manufacturing copper film) The sugar alcohol used was other than erythrose, and the cuprous oxide dispersion was prepared as in Example 12. After ultrasonic dispersion, it was allowed to stand overnight. The average secondary particle diameter of the cuprous oxide in the dispersion Unchanged, still 120nm. This dispersion had good printability when screen-printed on a polyimide using a screen printing plate having a line-gap of 30 m as in Example 12. The heat treatment was performed in the same manner as in Example 12. After cooling, the polyimide film was taken out and the surface was observed with a microscope. It was confirmed that copper wiring was formed without disconnection. (Example 14: Example of synthesizing copper oxide fine particle dispersion of synthetic metal powder and manufacturing copper thin film) Copper oxide fine particles (particle size 10 to 100 nm, nominal average particle size 30 nm, CI (strand) 5 g , 4 g of ethylene glycol (manufactured by Wako Pure Chemical Industries, Ltd.), 0.5 g of polyethylene glycol (average molecular weight 600), and 0.5 g of silver particles (average particle size 2.5 μm, manufactured by Sigma Aldrich) are used as if implemented The method of Example 1 was dispersed to obtain a copper oxide microparticle dispersion containing silver particles, which was calcined as in Example 1. The obtained copper film containing silver particles has a volume resistance 値 of 7 × l (T5 ohm cm). The obtained film has higher oxidation resistance than a copper film without a copper film without a silver pillar. In addition, the obtained film has a higher adhesion to a glass slide. , Take off with tape to verify that it does not peel off. (Example 15: Synthetic copper oxide particle dispersion containing epoxy resin, manufacturing. Copper film example) (Please read the precautions on the back before filling in this page)

本紙張尺度適用中國國家標準(CNS ) Α4規格(210X 297公釐) -39- 20U30ilb A7 B7 五、發明説明(y (請先閱讀背面之注意事項再填寫本頁) 氧化銅微粒(粒徑10至100奈米,標稱平均粒徑30奈 、米,CI(股)製)5克,乙二醇(和光純藥工業(股)製)4.5克,1 ,4-丁二醇二環氧內醚〇·ι克,及聚乙二醇(分子量600)0.4 克如同實施例1分散。分散後加入環氧硬化劑微表化硬化 劑(NOVACURE HX-3088,旭化成 EPOXY(股)製 〇.〇3 克,以 刮刀攪混後,如同實施例1煅燒,測定體積電阻率,爲7 X 1(Τ5歐姆公分。所得銅薄膜與載玻片間之粘合性遠高於不 含環氧樹脂的分散體。 (實施例1 6 :合成含聚醯亞胺樹脂的氧化銅粒子分散體,製 造銅薄膜之例) 經濟部智慧財產局員工消費合作社印製 雙(4-胺基苯基)醚1〇·〇克及均苯四酸酐丨〇.9克溶解於 N-甲基吡咯烷酮(NMP) 100克,於室溫攪拌1小時,得聚醯 胺酸之NMP溶液。於該聚醯胺酸溶液2克加氧化銅粒子(粒 徑10至100奈米,標稱平均粒徑30奈米,CI化成(股)製)5 克,及乙二醇(和光純藥工業(股)製)3克,如同實施例1分 散。將該分散體塗布於切成3公分X 3公分之聚醯亞胺膜( T0RAY · DuPont公司製KAPTON膜,厚50微米)上,於氬 環境氣體中以3 50 °C還原處理1小時,於聚醯亞胺膜上形成 含聚醯亞胺之銅薄膜。銅薄膜具導電性,體積電阻率爲9x .1 (T5歐姆公分。所得銅薄膜密合性遠高於不含聚醯胺酸而煅 燒於聚醯亞胺膜上之薄膜。 (實施例1 7 :合成含還原劑之氧化銅微粒分散體,製造多孔 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) -40- 2GU30ii54 A7 B7 經濟部智慧財產^員工消費合作社印製 五、發明説明(3) 性銅薄膜之例) 氧化銅奈米粒子(粒徑10至100奈米,標稱平均粒徑 30奈米,CI化成(股)製)5克,二乙二醇(和光純藥工業(股) 製)4.5克,及丙醛(和光純藥工業(股)製)〇·5克,如同實施 例1分散得氧化銅微粒分散體。所得分散體如同實施例塗 布於載玻片上,煅燒爐中,流通以流量0 · 1公升/分鐘之氬 氣由室溫以1小時升溫至350°C,達350°C後再於該溫度加 • 熱處理1小時。所得銅薄膜之體積電阻値低如3x 10_5歐姆 公分。 (實施例8 :於矽晶圓製造銅薄膜之例) 氧化銅奈米粒子(粒徑10至100奈米,標稱平均粒徑 30奈米,CI化成(股)製)5克,乙二醇(和光純藥工業(股)製) 4.5克,及聚乙二醇(和光純藥工業(股)製)0·5克,如同實施 例1分散,得氧化銅微粒分散體。預先用信越化學(股)製表 面處理劑(LS-3 150)作表面處理之5吋矽晶圓,安置於MIKA SA(股)製旋塗機(1H-D7型)將上述分散體滴於矽晶圓上’以 lOOOppm預旋10秒後以300rpm旋塗30秒。塗布後之Ϊ夕晶 圓如同實施例1锻燒。矽晶圓上所得之銅薄膜厚0.6微米, 體積電阻値低如6x 10_6歐姆公分。 (實施例19 :調製氧化亞銅分散體,製造銅薄膜之例) 於純水60毫升加無水醋酸銅(和光純藥工業(股)製)8克 ,於25°C攪拌下加肼單水合物(和光純藥工業(股)製)作還原 (請先閱讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) -41 - 200301154 A7 B7 五、發明説明(y (請先閲讀背面之注意事項再填寫本頁) 反應,得一次粒徑1 0至30奈米之氧化亞銅微粒。於該氧 化亞銅微粒0.5克加二乙二醇0.1克及聚乙二醇(平均分子 量200,和光純藥工業(股)製)〇·4克,以超音波分散調製氧 .化亞銅分散體。將該分散體塗布於載玻片上成爲長5公分 、寬1公分、厚20微米。將上述載玻片送入锻燒,爐內以 真空泵脫氣後,並再以氬氣取代。煅燒爐由室溫以1小時 升溫至350°C,達350°C後再於該溫度加熱處理1小時。冷 卻後得厚7微米、體積電阻率4.0x 1CT6歐姆公分之銅薄膜 。所得薄膜與載玻片之粘合性高,以膠帶剝離試驗無法剝 落。 (比較例1 :金屬氧化物微粒之粒徑) 平均粒徑2.8微米之氧化銅粉末(和光純藥工業(股)製)5 •克及二乙二醇5克,如同實施例1分散處理得氧化銅分散 體,如同實施例1於載玻片上煅燒成分散體膜。載玻片上 之金屬銅表面多有微細龜裂,係不完整之銅薄膜。以SEM 觀察知銅粉末間粒子熔合不足。 經濟部智慧財產局員工消費合作社印製 (比較例2 :金屬氧化物微粒之粒徑) 平均粒徑2.8微米之氧化銅粉末(和光純藥工業(股)製)5 克,二乙二醇4.5克,及聚乙二醇(平均分子量600)0.5克如 同實施例1分散處理調製氧化銅分散體,如同實施例1於 載玻片上煅燒成分散體塗膜。載玻片上之金屬銅表面多有 微細龜裂,係不完整之銅薄膜。以SEM觀察知銅粉末間粒 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) -42- 2〇U3〇rf54 A7 B7 五、發明説明( 子熔合不足。 產業上之利用可能性 依本發明可用廉價金屬氧化物爲原料,以相對低溫處 理,於基板上形成金屬薄膜。控制金屬氧化物分散體在基 板上之塗布厚度,即可任意控制金屬薄膜之膜厚。又,可 用噴墨塗布法直描形成配線,以該法可略去習知配線形成 製程所需之光微影及蝕刻過程,可節省資源、低成本形成 配線。所得金屬薄膜適用於電極、配線、電路等之金屬配 線材料或導電材料之用途。所得具孔徑1微米以下,均句 微細多孔結構之多孔性金屬薄膜適用於例如,觸媒用載體, 、無機濾材、導電材料、導熱材料等用途,以及必須大面 積之電極等用途。 (請先閱讀背面之注意事項再填寫本頁)This paper size applies to China National Standard (CNS) A4 specification (210X 297 mm) -39- 20U30ilb A7 B7 V. Description of the invention (y (Please read the precautions on the back before filling this page) Copper oxide particles (particle size 10 Up to 100 nanometers, nominal average particle size of 30 nanometers, rice, 5 grams of CI (stock), 4.5 grams of ethylene glycol (made by Wako Pure Chemical Industries, Ltd.), 1,4-butanediol diepoxy 0.5 g of lactone and 0.4 g of polyethylene glycol (molecular weight 600) were dispersed as in Example 1. After the dispersion, an epoxy hardener micro-curing hardener (NOVACURE HX-3088, manufactured by Asahi Kasei EPOXY Co., Ltd.) was added. 〇3 grams, after mixing with a spatula, calcined as in Example 1, and measuring the volume resistivity, it was 7 X 1 (T5 ohm cm). The adhesion between the obtained copper film and the glass slide was much higher than that without epoxy resin. Dispersion (Example 16: Example of synthesizing a dispersion of copper oxide particles containing polyimide resin and manufacturing a copper film) Printed bis (4-aminophenyl) ether 1 by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 0.0 g and pyromellitic anhydride 丨 0.9 g dissolved in N-methylpyrrolidone (NMP) 100 g, at room temperature Mix for 1 hour to obtain a polyamic acid NMP solution. Add 2 grams of copper oxide particles (particle size 10 to 100 nanometers, nominal average particle diameter 30 nanometers) to the polyphosphonic acid solution. ) 5 g, and 3 g of ethylene glycol (made by Wako Pure Chemical Industries, Ltd.) were dispersed as in Example 1. The dispersion was coated on a polyimide film (T0RAY · DuPont) cut into 3 cm x 3 cm KAPTON film made by the company (50 micron thick), reduction treatment in argon ambient gas at 3 50 ° C for 1 hour to form a polyimide-containing copper film on the polyimide film. The copper film has conductivity and volume The resistivity is 9x .1 (T5 ohm cm. The adhesion of the obtained copper film is much higher than that of a film calcined on a polyimide film without polyamic acid. (Example 17: Synthesis of oxidation with a reducing agent) Dispersion of copper particles, made porous This paper is sized according to Chinese National Standard (CNS) A4 (210X297 mm) -40- 2GU30ii54 A7 B7 Printed by Intellectual Property of the Ministry of Economic Affairs ^ Printed by the Consumer Cooperatives (3) Sexual copper film Example) Copper oxide nano particles (particle size 10 to 100 nm, nominal average particle size 30 nm , 5 g of CI Kasei Co., Ltd., 4.5 g of diethylene glycol (Wako Pure Chemical Industries, Ltd.), and 0.5 g of propionaldehyde (Wako Pure Chemical Industries, Ltd.), as in Example 1 The copper oxide fine particle dispersion was dispersed. The obtained dispersion was coated on a glass slide as in the example, and an argon gas was flowed at a flow rate of 0.1 liters / minute from room temperature to 350 ° C in 1 hour at 350 ° C, reaching 350. After ° C, heat treatment is performed at this temperature for 1 hour. The volume resistance of the obtained copper film is as low as 3x 10-5 ohm cm. (Example 8: Example of manufacturing a copper thin film on a silicon wafer) Copper oxide nanoparticles (particle size 10 to 100 nm, nominal average particle size 30 nm, CI Chemical Co., Ltd.) 5 g, ethylene oxide 4.5 g of alcohol (made by Wako Pure Chemical Industries, Ltd.) and 0.5 g of polyethylene glycol (made by Wako Pure Chemical Industries, Ltd.) were dispersed as in Example 1 to obtain a copper oxide fine particle dispersion. A 5-inch silicon wafer with a surface treatment agent (LS-3 150) made by Shin-Etsu Chemical Co., Ltd. as a surface treatment was placed in a spin-coater (type 1H-D7) made by MIKA SA. The silicon wafer was pre-spun at 1000 ppm for 10 seconds and then spin-coated at 300 rpm for 30 seconds. After the application, the spheroidal crystal circle was calcined as in Example 1. The thickness of the copper film on the silicon wafer is 0.6 micron, and the volume resistance is as low as 6x 10-6 ohm cm. (Example 19: Example of preparing a cuprous oxide dispersion to produce a copper thin film) 60 ml of pure water was added with 8 g of anhydrous copper acetate (manufactured by Wako Pure Chemical Industries, Ltd.), and hydrazine monohydrate was added under stirring at 25 ° C. (Wako Pure Chemical Industries, Ltd.) for reduction (please read the precautions on the back before filling out this page) This paper size is applicable to China National Standard (CNS) A4 (210X297 mm) -41-200301154 A7 B7 5 2. Description of the invention (y (please read the precautions on the reverse side and then fill out this page) reaction to obtain cuprous oxide particles with a particle size of 10 to 30 nanometers. Add 0.5 g of the cuprous oxide particles to diethylene glycol 0.1 G and polyethylene glycol (average molecular weight 200, manufactured by Wako Pure Chemical Industries, Ltd.) 0.4 g. Ultrasonic dispersion was used to modulate a cuprous oxide dispersion. The dispersion was coated on a glass slide to form a length of 5 The width is 1 cm and the thickness is 20 microns. The above slides are sent to the calcination furnace, and the furnace is degassed with a vacuum pump, and then replaced with argon gas. The calcining furnace is heated from room temperature to 350 ° C in 1 hour to reach After 350 ° C, heat treatment at this temperature for 1 hour. After cooling, it will have a thickness of 7 microns and a volume Copper film with resistivity of 4.0x 1CT6 ohm cm. The obtained film has high adhesion to the glass slide and cannot be peeled off by tape peeling test. (Comparative Example 1: Particle size of metal oxide particles) Oxidation with an average particle size of 2.8 microns Copper powder (made by Wako Pure Chemical Industries, Ltd.) 5 g and 5 g of diethylene glycol were dispersed and treated as in Example 1 to obtain a copper oxide dispersion, and calcined as a dispersion film on a glass slide as in Example 1. The surface of the metal copper on the glass slide has many fine cracks, which are incomplete copper films. The particle fusion between the copper powders is insufficient by SEM observation. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs (Comparative Example 2: Metal Oxide Particles) Particle size) 5 g of copper oxide powder (manufactured by Wako Pure Chemical Industries, Ltd.) with an average particle size of 2.8 μm, 4.5 g of diethylene glycol, and 0.5 g of polyethylene glycol (average molecular weight 600) were dispersed as in Example 1. The copper oxide dispersion was prepared as calcined on a glass slide to form a dispersion coating film as in Example 1. The surface of the metal copper on the glass slide was mostly cracked and was an incomplete copper film. The intergranular nature of the copper powder was observed by SEM observation. Paper size Use Chinese National Standard (CNS) A4 specification (210X297mm) -42- 2〇U3〇rf54 A7 B7 V. Description of the invention (Insufficient sub-fusion. Industrial use possibility According to the invention, cheap metal oxides can be used as raw materials. The metal film is formed on the substrate at a relatively low temperature. The thickness of the metal thin film can be controlled arbitrarily by controlling the coating thickness of the metal oxide dispersion on the substrate. In addition, the wiring can be formed by direct drawing using an inkjet coating method. The light lithography and etching processes required for the conventional wiring formation process can be omitted, which can save resources and form wiring at low cost. The obtained metal thin film is suitable for the use of metal wiring materials or conductive materials such as electrodes, wiring, and circuits. The obtained porous metal thin film having a pore size of 1 micrometer or less and a uniform porous structure is suitable for applications such as catalyst carriers, inorganic filter materials, conductive materials, and thermally conductive materials, as well as applications that require large area electrodes. (Please read the notes on the back before filling this page)

、1T, 1T

經濟部智慧財產局員工消費合作社印製 本紙張尺度適用中國國家標準(CNS ) Α4規格(210Χ297公釐) -43-Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs This paper is sized to the Chinese National Standard (CNS) A4 (210 × 297 mm) -43-

Claims (1)

η ^ ^υϋ3〇χΐ54 Α8 Β8 C8 ^ D8 力、申請專利範圍1 (請先閱讀背面之注意事項再填寫本頁) 1. 一種金屬氧化物分散體,含粒徑不及200奈米之金屬 氧化物及分散媒體,其特徵爲:該分散媒體含多元醇及/ 或聚醚化合物。 2. 如申請專利範圍第1項之金屬氧化物分散體,其中多 元醇之碳原子數在1 0以下。 3 .如申請專利範圍第1或2項之金屬氧化物分散體,其 中多元醇係糖醇。 4. 如申請專利範圍第1至3項中任一項之金屬氧化物分 散體,其中聚醚化合物係以碳原子數2至8之直鏈或·環狀 氧化烯基爲重複單元之脂族聚醚。 5. 如申請專利範圍第1至4項中任一項之金屬氧化物分 散體,其中聚醚化合物之分子量在15〇以上6000以下。 6. 如申請專利範圍第5項之金屬氧化物分散體,其中聚 醚化合物係分子量2 5 0以上,以上1 5 0 0以下之聚乙二醇及 /或聚丙二醇。 經濟部智慧財產局員工消費合作社印製 7. 如申請專利範圍第1至6項中任一項之金屬氧化物分 散體,其中金屬氧化物還原得之金屬,其體積電阻値在1X 1(Τ4歐姆公分以下。 8 ·如申請專利範圍第1至7項中任一項之金屬氧化物分 散體,其中金屬氧化物係銅氧化物或銀氧化物。 9 ·如申請專利範圍第8項之金屬氧化物分散體,其中金 屬氧化物係氧化亞銅。 10·如申請專利範圍第1至9項中任一項之金屬氧化物 分散體,其中金屬氧化物含量占金屬氧化物分散體總重量5 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) -44- 20U30ii54 A8 B8 C8 D8 經濟部智慧財產局員工消費合作社印製 六、申請專利範圍2 至90重量%。 1 1 .如申請專利範圍第1至1 〇項中任一項之金屬氧化物 分散體,其中含金屬粉,該金屬粉及金屬氧化物微粒合計 ,占金屬氧化物分散體總重量5重量%以上95重量%以下 〇 1 2如申請專利範圍第1 1項之金屬氧化物分散體’其中 上述金屬粉含至少一*種選自金、銀、銅、把、銷、錬、絡 、鋁、錫、鋅、鈦、鎢、鉅、鋇、铑、釕、餓、鉍、銥、 鈷、銦、鐵、鉛所成群之金屬。 13. 如申請專利範圍第1至12項中任一項之金屬氧化物 分散體,其中含熱固性樹脂’其占金屬氧化1物分散體總量 0.1至20重量% ° 14. 如申請專利範圍第1至1 3項中任一項之金屬氧化物 分散體,其中含多元醇及聚醚化合物以外之可還原金屬氧 化物之還原劑,其占金屬氧化物分散體總重量〇·1至70重 量 〇/〇。 1 5 .如申請專利範圍第1至14項中任一項之金屬氧化物 分散體,其中多元醇含量占金屬氧化物分散體總重量〇· 1重 量°/。以上95重量%以下。 i 6.如申請專利範圍第1至15項中任項之金屬氧化物分 散體,其中聚醚化合物含量占金屬氧化物分散體總重量〇. 1 至7 0重量%。 17.如申請專利範圍第1至15項中任一項之金屬氧化物 分散體,其中聚醚化合物含量占金屬氧化物分散體總重量 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公董) (請先閱讀背面之注意事項再填寫本頁) 一裝· 訂 -45- C汾 200301154 A8 B8 C8 D8 經濟部智慧財產局員工消費合作社印製 六、申請專利範圍3 不及0 · 1重量%。 1 8. —種金屬薄膜,其特徵:將如申請專利範圍第1 6項 之金屬氧化物分散體煅燒而得,一次粒徑不及200奈米之 金屬微粒多數個集結而接觸部份熔合所形成。 19·一種具多孔結構之金屬薄膜,其特徵爲:將如申請 專利範圍第17項之金屬氧化物分散體煅燒而得,一次粒徑 不及200奈米之金屬微粒多數個集結,接觸部份熔合所形 成。 20. —種金屬薄膜之製造方法,其特徵爲:將如申請專 利範圍第1至1 6項中任一項之金屬氧化物分散體塗布於基 板後,作加熱處理。 21. 如申請專利範圍第20項之金屬薄膜之製造方法,# 中加熱處理係於非氧化性環境氣體中施行。 22. 如申請專利範圍第20項之金屬薄膜之製造方法,_ 中以金屬氧化物分散體塗布於基板後,於鈍性環境氣體中 加熱煅燒,隨後於還原性環境氣體中加熱锻燒。 23·如申請專利範圍第20至22項中任一項之金屬薄膜 之製造方法,其中加熱處理溫度在5(TC以上500°C以下。 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) (請先閱讀背面之注意事項再填寫本頁) -裝_ -46- (:攻 2GU30ii54 (一) 、本案指定代表圖爲:無 (二) 、本代表圖之元件代表符號簡單說明:無η ^ ^ υϋ3〇χΐ54 Α8 Β8 C8 ^ D8 Force, patent application scope 1 (Please read the precautions on the back before filling this page) 1. A metal oxide dispersion containing a metal oxide with a particle size of less than 200 nm And a dispersion medium, characterized in that the dispersion medium contains a polyol and / or a polyether compound. 2. For example, the metal oxide dispersion in item 1 of the patent application scope, wherein the number of carbon atoms of the polyol is less than 10. 3. The metal oxide dispersion according to item 1 or 2 of the patent application scope, wherein the polyhydric alcohol is a sugar alcohol. 4. The metal oxide dispersion according to any one of claims 1 to 3, wherein the polyether compound is an aliphatic having a linear or cyclic oxyalkylene group having 2 to 8 carbon atoms as a repeating unit. Polyether. 5. The metal oxide dispersion according to any one of claims 1 to 4, wherein the molecular weight of the polyether compound is from 15 to 6000. 6. The metal oxide dispersion according to item 5 of the patent application scope, wherein the polyether compound is a polyethylene glycol and / or polypropylene glycol having a molecular weight of 2 500 or more and 1 500 or less. Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 7. If the metal oxide dispersion of any of the items 1 to 6 of the patent application scope, the metal oxide reduced metal has a volume resistance of 1X 1 (Τ4 Ohm centimeter or less. 8 · Metal oxide dispersion according to any one of claims 1 to 7, wherein the metal oxide is a copper oxide or silver oxide. 9 · As the metal of claim 8 An oxide dispersion, wherein the metal oxide is cuprous oxide. 10. The metal oxide dispersion according to any one of claims 1 to 9, wherein the metal oxide content accounts for 5% of the total weight of the metal oxide dispersion. This paper size applies to China National Standard (CNS) A4 specification (210X297 mm) -44- 20U30ii54 A8 B8 C8 D8 Printed by the Consumers' Cooperative of Intellectual Property Bureau of the Ministry of Economic Affairs 6. Application for patents ranging from 2 to 90% by weight. 1 1. Such as The metal oxide dispersion according to any one of the claims 1 to 10 of the patent application scope, which contains metal powder, the metal powder and metal oxide fine particles together, accounting for the total weight of the metal oxide dispersion 5 wt% or more and 95 wt% or less 0 2 The metal oxide dispersion according to item 11 of the scope of the patent application, wherein the above metal powder contains at least one * selected from the group consisting of gold, silver, copper, gold, silver, copper, silver, copper , Aluminum, Tin, Zinc, Titanium, Tungsten, Giant, Barium, Rhodium, Ruthenium, Hungry, Bismuth, Iridium, Cobalt, Indium, Iron and Lead The metal oxide dispersion according to any one, wherein the thermosetting resin contains 0.1 to 20% by weight of the total metal oxide 1 dispersion. 14. The metal oxidation according to any one of claims 1 to 13 A dispersion containing a reducing agent capable of reducing a metal oxide other than a polyol and a polyether compound, which accounts for the total weight of the metal oxide dispersion from 0.1 to 70% by weight. The metal oxide dispersion according to any one of items 1 to 14, wherein the polyol content accounts for the total weight of the metal oxide dispersion of 0.1% by weight to 95% by weight. The metal oxide dispersion of any one of 15 items, wherein the polyether compound contains 0.1 to 70% by weight of the total weight of the metal oxide dispersion. 17. The metal oxide dispersion according to any one of claims 1 to 15 of the scope of the patent application, wherein the content of the polyether compound accounts for the metal oxide dispersion Total weight This paper size applies to Chinese National Standard (CNS) A4 specifications (210X297) (Please read the precautions on the back before filling out this page) One Pack · Order-45- Cfen200301154 A8 B8 C8 D8 Intellectual Property of the Ministry of Economic Affairs Printed by the Bureau's Consumer Cooperatives 6. The scope of patent application 3 is less than 0.1% by weight. 1 8. A metal thin film characterized by calcining the metal oxide dispersion as described in item 16 of the patent application, and forming a plurality of metal particles with a primary particle size of less than 200 nm, and forming the contact parts by fusion . 19. A metal thin film having a porous structure, characterized in that: a plurality of metal particles having a primary particle size of less than 200 nm are obtained by calcining the metal oxide dispersion of item 17 in the scope of the patent application, and the contact portions are fused Formed. 20. A method for manufacturing a metal thin film, characterized in that: a metal oxide dispersion according to any one of claims 1 to 16 of an application for a patent is applied to a substrate and then heat-treated. 21. For the manufacturing method of the metal thin film according to the scope of the patent application, the heat treatment in ## is performed in a non-oxidizing ambient gas. 22. For the method for manufacturing a metal thin film according to item 20 of the application, after the metal oxide dispersion is coated on the substrate, it is calcined in a passive ambient gas, and then heated and calcined in a reducing ambient gas. 23. The manufacturing method of the metal thin film according to any one of claims 20 to 22, wherein the heat treatment temperature is 5 (TC above 500 ° C.) This paper size is applicable to Chinese National Standard (CNS) A4 specification (210X297) (Mm) (Please read the precautions on the back before filling out this page) -Installation_ -46- (: 2GU30ii54 (1), the representative representative of this case is: None (2), the component representative symbols of this representative illustration are simply explained :no
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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI412603B (en) * 2009-10-07 2013-10-21 Ind Tech Res Inst Method for manufacturing porous powder
US9399615B2 (en) 2014-11-27 2016-07-26 Industrial Technology Research Institute Catalyst and method for hydrogenation of 4,4′-methylenedianiline
CN113226600A (en) * 2018-12-27 2021-08-06 花王株式会社 Dispersion of metal particles

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI412603B (en) * 2009-10-07 2013-10-21 Ind Tech Res Inst Method for manufacturing porous powder
US9399615B2 (en) 2014-11-27 2016-07-26 Industrial Technology Research Institute Catalyst and method for hydrogenation of 4,4′-methylenedianiline
CN113226600A (en) * 2018-12-27 2021-08-06 花王株式会社 Dispersion of metal particles

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