TR201817920U4 - Görüntü yakalama si̇stemi̇ ve görüntü yakalam si̇stemi̇ne sahi̇p kali̇te i̇nceleme si̇stemi̇ - Google Patents
Görüntü yakalama si̇stemi̇ ve görüntü yakalam si̇stemi̇ne sahi̇p kali̇te i̇nceleme si̇stemi̇ Download PDFInfo
- Publication number
- TR201817920U4 TR201817920U4 TR2018/17920U TR201817920U TR201817920U4 TR 201817920 U4 TR201817920 U4 TR 201817920U4 TR 2018/17920 U TR2018/17920 U TR 2018/17920U TR 201817920 U TR201817920 U TR 201817920U TR 201817920 U4 TR201817920 U4 TR 201817920U4
- Authority
- TR
- Turkey
- Prior art keywords
- image capture
- capture system
- field
- angle
- reference plane
- Prior art date
Links
- 230000003287 optical effect Effects 0.000 abstract 3
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/002—Measuring arrangements characterised by the use of optical techniques for measuring two or more coordinates
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/89—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
- G01N21/8901—Optical details; Scanning details
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
- G01N2021/8822—Dark field detection
- G01N2021/8825—Separate detection of dark field and bright field
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/89—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
- G01N21/8914—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the material examined
- G01N2021/8917—Paper, also ondulated
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/89—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
- G01N21/892—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the flaw, defect or object feature examined
- G01N21/896—Optical defects in or on transparent materials, e.g. distortion, surface flaws in conveyed flat sheet or rod
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Engineering & Computer Science (AREA)
- Textile Engineering (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Abstract
Bir lineer görüş alanını (20) yakalanması için uyarlanan bir hat kamerası (12), bir karanlık alan aydınlatıcı (14) ve görüş alanını (20) aydınlatan bir parlak alan aydınlatıcıyı (16) içeren bir görüntü yakalama sistemi olup, burada bileşenler, görüntülerin yakalandığı görüş alanı (20) üzerinden geçen tabaka elemanlarının (4) yüzeyine dikey olan bir referans düzlemine (M) göre, hat kamerasının (12) optik düzleminin, referans düzlemine (M) göre yaklaşık 10° ila 30°, tercihen 20° bir açı (?) ile düzenlendiği, karanlık alan aydınlatmanın (14) optik düzleminin, referans düzlemine (M) göre yaklaşık olarak 30° ila 60°, tercihen 45° bir açıda (ß) düzenlendiği ve parlak alan aydınlatıcının (16) optik düzleminin, referans düzlemine (M) göre yaklaşık olarak 20° ila 40°, tercihen 30° bir açıda (?) düzenlendiği, parlak alan aydınlatıcının (16), 50° ve 110°, tercihen 80° ve 90° arasında bir açılma açısına sahip olduğu şekilde düzenlenmektedir.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE202016102851.5U DE202016102851U1 (de) | 2016-05-30 | 2016-05-30 | Bildaufnahmesystem und Qualitätskontrollstation mit Bildaufnahmesystem |
Publications (1)
Publication Number | Publication Date |
---|---|
TR201817920U4 true TR201817920U4 (tr) | 2021-05-21 |
Family
ID=56852912
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TR2018/17920U TR201817920U4 (tr) | 2016-05-30 | 2017-05-17 | Görüntü yakalama si̇stemi̇ ve görüntü yakalam si̇stemi̇ne sahi̇p kali̇te i̇nceleme si̇stemi̇ |
Country Status (9)
Country | Link |
---|---|
CN (1) | CN209589870U (tr) |
AT (1) | AT16584U1 (tr) |
CZ (1) | CZ32481U1 (tr) |
DE (1) | DE202016102851U1 (tr) |
ES (1) | ES1224499Y (tr) |
PL (1) | PL127953U1 (tr) |
SK (1) | SK9053Y1 (tr) |
TR (1) | TR201817920U4 (tr) |
WO (1) | WO2017207114A1 (tr) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102022113313A1 (de) | 2022-05-25 | 2023-11-30 | Mb Automation Gmbh & Co. Kg | Vorrichtung und verfahren zum sensorbasierten inspizieren eines objekts |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6327374B1 (en) * | 1999-02-18 | 2001-12-04 | Thermo Radiometrie Oy | Arrangement and method for inspection of surface quality |
JP3686329B2 (ja) * | 2000-08-22 | 2005-08-24 | シーシーエス株式会社 | 表面検査用照明装置及び表面検査装置 |
US20050122509A1 (en) * | 2002-07-18 | 2005-06-09 | Leica Microsystems Semiconductor Gmbh | Apparatus for wafer inspection |
DE102004004761A1 (de) * | 2004-01-30 | 2005-09-08 | Leica Microsystems Semiconductor Gmbh | Vorrichtung und Verfahren zur Inspektion eines Wafers |
DE102007007828B4 (de) * | 2007-02-16 | 2011-02-24 | Bst International Gmbh | Verfahren und Vorrichtung zum Beleuchten eines Druckbildes auf einer Materialbahn |
JP5806808B2 (ja) * | 2010-08-18 | 2015-11-10 | 倉敷紡績株式会社 | 撮像光学検査装置 |
DE102011113670A1 (de) * | 2011-09-20 | 2013-03-21 | Schott Ag | Beleuchtungsvorrichtung, Inspektionsvorrichtung und Inspektionsverfahren für die optische Prüfung eines Objekts |
-
2016
- 2016-05-30 DE DE202016102851.5U patent/DE202016102851U1/de active Active
-
2017
- 2017-05-17 SK SK501342018U patent/SK9053Y1/sk unknown
- 2017-05-17 CN CN201790000885.2U patent/CN209589870U/zh active Active
- 2017-05-17 CZ CZ2018-35741U patent/CZ32481U1/cs active Protection Beyond IP Right Term
- 2017-05-17 PL PL127953U patent/PL127953U1/pl unknown
- 2017-05-17 ES ES201890024U patent/ES1224499Y/es active Active
- 2017-05-17 TR TR2018/17920U patent/TR201817920U4/tr unknown
- 2017-05-17 AT ATGM9007/2017U patent/AT16584U1/de unknown
- 2017-05-17 WO PCT/EP2017/025133 patent/WO2017207114A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
CZ32481U1 (cs) | 2019-01-22 |
DE202016102851U1 (de) | 2016-08-11 |
ES1224499Y (es) | 2019-04-26 |
WO2017207114A1 (en) | 2017-12-07 |
ES1224499U (es) | 2019-02-06 |
CN209589870U (zh) | 2019-11-05 |
SK501342018U1 (sk) | 2020-11-03 |
AT16584U1 (de) | 2020-02-15 |
PL127953U1 (pl) | 2019-07-29 |
SK9053Y1 (sk) | 2021-02-24 |
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TR201817920U4 (tr) | Görüntü yakalama si̇stemi̇ ve görüntü yakalam si̇stemi̇ne sahi̇p kali̇te i̇nceleme si̇stemi̇ | |
DE602007003990D1 (de) | Optische profilabtastung |