TR201718310A2 - A HEAT TREATABLE LOW-E COATING AND PRODUCTION METHOD - Google Patents
A HEAT TREATABLE LOW-E COATING AND PRODUCTION METHOD Download PDFInfo
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- TR201718310A2 TR201718310A2 TR2017/18310A TR201718310A TR201718310A2 TR 201718310 A2 TR201718310 A2 TR 201718310A2 TR 2017/18310 A TR2017/18310 A TR 2017/18310A TR 201718310 A TR201718310 A TR 201718310A TR 201718310 A2 TR201718310 A2 TR 201718310A2
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 8
- 238000000576 coating method Methods 0.000 title claims description 37
- 239000011248 coating agent Substances 0.000 title claims description 36
- 239000011521 glass Substances 0.000 claims abstract description 45
- 230000004888 barrier function Effects 0.000 claims description 55
- HLLICFJUWSZHRJ-UHFFFAOYSA-N tioxidazole Chemical compound CCCOC1=CC=C2N=C(NC(=O)OC)SC2=C1 HLLICFJUWSZHRJ-UHFFFAOYSA-N 0.000 claims description 37
- 229910003087 TiOx Inorganic materials 0.000 claims description 35
- -1 SiOxNy_ ZnSnOx Inorganic materials 0.000 claims description 14
- 229910020776 SixNy Inorganic materials 0.000 claims description 11
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 claims description 11
- 229910001120 nichrome Inorganic materials 0.000 claims description 11
- 229910020286 SiOxNy Inorganic materials 0.000 claims description 9
- 229910010421 TiNx Inorganic materials 0.000 claims description 8
- 229910007667 ZnOx Inorganic materials 0.000 claims description 5
- 229910008328 ZrNx Inorganic materials 0.000 claims description 4
- 229910003134 ZrOx Inorganic materials 0.000 claims description 4
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 2
- 241000282320 Panthera leo Species 0.000 claims 1
- 238000001228 spectrum Methods 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 285
- 238000000034 method Methods 0.000 description 14
- 238000010438 heat treatment Methods 0.000 description 11
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 10
- 229910052709 silver Inorganic materials 0.000 description 10
- 239000004332 silver Substances 0.000 description 10
- 238000002834 transmittance Methods 0.000 description 9
- 238000005054 agglomeration Methods 0.000 description 8
- 230000002776 aggregation Effects 0.000 description 8
- 230000003287 optical effect Effects 0.000 description 8
- 230000008569 process Effects 0.000 description 7
- 238000010521 absorption reaction Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 230000005693 optoelectronics Effects 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 230000035699 permeability Effects 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 238000005496 tempering Methods 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- 235000008331 Pinus X rigitaeda Nutrition 0.000 description 1
- 235000011613 Pinus brutia Nutrition 0.000 description 1
- 241000018646 Pinus brutia Species 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005253 cladding Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 239000012774 insulation material Substances 0.000 description 1
- 230000009191 jumping Effects 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3626—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer at least containing a nitride, oxynitride, boronitride or carbonitride
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3644—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the metal being silver
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
- C03C17/366—Low-emissivity or solar control coatings
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- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
Buluş güneş enerjisi spektrumunun görünür bölgesini etkin bir şekilde geçirirken aynı zamanda yakın kızılötesi ve kızılötesi bölgesini etkin bir şekilde yansıtan bir low-e kaplamalı cam ve üretim yöntemi ilgilidir.The invention relates to a low-e coated glass and production method that effectively reflects the near infrared and infrared region while effectively transmitting the visible region of the solar energy spectrum.
Description
TEKNIK ALAN Bulus, gün isigi geçirgen ve isi yalitim cami olarak kullanilan, içeriginde kizilötesi yansitici katmanlar olan günes kontrol özellikli bir düsük yayinimli (low-e) kaplama ile ilgilidir. TECHNICAL FIELD The invention is a light-permeable and heat-insulating mosque, which contains infrared radiation. a low-emission (low-e) coating with solar control features with reflective layers It is related to.
ONCEKI TEKNIK Camlarin optik özelliklerini farklilastiran etmenlerden biri cam yüzeyine yapilan kaplama uygulamalaridir. Kaplama uygulamalarindan biri de vakum ortaminda manyetik alan destekli siçratma yöntemidir. Ozellikle low-e özelligine sahip mimari ve otomotiv kaplamalarin üretiminde sik basvurulan bir yöntemdir. Bahsedilen yöntemle kaplanan camlarin görünür, yakin kizilötesi ve kizil ötesi bölgedeki geçirgenlik ve yansitma degerleri hedeflenen seviyelerde elde edilebilmektedir. PRIOR ART One of the factors that differentiate the optical properties of glasses is the coating applications. One of the coating applications is in vacuum environment. It is a magnetic field assisted jumping method. Especially low-e architecture and is a frequently used method in the production of automotive coatings. Said glass in the visible, near-infrared and infrared region transmittance and reflectance values can be obtained at targeted levels.
Geçirgenlik ve yansitma degerleri disinda, kaplamali camlarda seçicilik degeri de önemli bir parametredir. Seçicilik, ISO 9050 (2003) standardinda görünür bölge geçirgenlik degerinin solar faktöre orani olarak tanimlanmaktadir. Kaplamalarin seçicilik degerleri de içerdigi Ag katmani sayisi, kullanilan çekirdeklestirici katman türü, katmanlarin parametrik optimizasyonlari ile hedeflenen seviyelerde tutulabilmektedir. Apart from the transmittance and reflectance values, the selectivity value in coated glasses is also is an important parameter. Selectivity, visible region in ISO 9050 (2003) standard It is defined as the ratio of the transmittance value to the solar factor. your skins Number of Network layers including selectivity values, nucleating layer used type, at targeted levels with parametric optimizations of layers. can be held.
US9499899 yayin numarali bulusta bir altlik ve altlik üzerinde olusturulan bir yansitici katmani içerebilen düsük yayinma özelligine sahip panellerin olusturulmasi için sistemler, yöntemler ve aparat ifsa edilmektedir. Düsük yayinma özelligine sahip paneller, ilave olarak, yansitici katman üzerinde olusturulan bir üst dielektrik katmani içerebilmekte ve böylece, üst dielektrik katman ve altlik arasinda yansitici katman olusturulmaktadir. Ust dielektrik katman, çinko kalay alüminyum oksit gibi bir üçlü metal oksidi içerebilmektedir. Ust dielektrik katman ayrica alüminyum da içerebilmektedir. Alüminyumun konsantrasyonu, %1 atomik civari ila olabilmektedir. Ust dielektrik katmandaki çinkonun kalaya atomik orani, 0,67 civari ilâ 1,5 civari arasinda ve 0,9 civari ilâ 1,1 civari arasinda olabilmektedir. In the invention publication number US9499899, a base and a base formed on the base low emissivity panels that may contain a reflective layer Disclosed are the systems, methods, and apparatus for creating it. low broadcast panels with the feature of, in addition, an upper layer formed on the reflective layer. may contain a dielectric layer so that there is a gap between the upper dielectric layer and the substrate. reflective layer is formed. Top dielectric layer, zinc tin aluminum It may contain a ternary metal oxide such as oxide. The upper dielectric layer is also may also contain aluminum. The concentration of aluminum is from about 1% atomic to can happen. Atomic ratio of zinc to tin in the upper dielectric layer, about 0.67 It can be between about 1.5 and about 1.5 and between about 0.9 and around 1.1.
BULUSUN KISA AÇIKLAMASI Mevcut bulus ilgili teknik alana yeni avantajlar getirmek üzere, günes kontrol özellikli bir low-e kaplamali cam ile ilgilidir. BRIEF DESCRIPTION OF THE INVENTION The present invention is designed to bring new advantages to the related technical field. It relates to a featured low-e coated glass.
Bulusun bir amaci, görünür isigi etkin bir sekilde geçirirken ayni zamanda günes enerjisini etkin bir sekilde yansitan bir low-e kaplamali cam ortaya koymaktir. One object of the invention is to transmit visible light effectively while simultaneously passing the sun. is to create a low-e coated glass that reflects its energy effectively.
Yukarida bahsedilen ve asagidaki detayli anlatimdan ortaya çikacak tüm amaçlari gerçeklestirmek üzere mevcut bulus, bir low-e kaplamali camdir. Buna göre söz konusu bulusun özelligi bahsedilen low-e kaplamanin camdan disari dogru sirasiyla; - SixNy, SiOxNy, ZnSnOx, TiOx, TiNX, ZrNxi den seçilen bir birinci dielektrik - NiCr, NiCrOX, TiOx, ZnAIOx, ZnOX'den seçilen bir birinci çekirdeklestirici - bir birinci kizilötesi yansitici katman; - NiCr, NiCrOx, TIOX, ZnAloxiden seçilen bir birinci bariyer katman; - SiXNy, TiNx, ZrNx, ZnSnOX, ZnAIOX, SiOxNy, TIOX, ZnOX' den seçilen bir üçüncü dielektrik katman; - SiXNy, TiNx, ZrNx, ZnSnOX, ZnAIOX, SiOxNy, TiOX, ZnOx' den seçilen bir dördüncü dielektrik katman; - NiCr, NiCrOX, TiOX, ZnAIOX, Znoxtden seçilen bir ikinci çekirdeklestirici - Bir ikinci kizilötesi yansitici katman; - NiCr, NiCrOx, TiOX, ZnAIOX'den seçilen bir ikinci bariyer katman; - ZnSnOX, ZnAlOX, SiOxNy, ZrOx, SIOX, SixNy, TiOX, ZnOX'den seçilen bir besinci dielektrik katman; - SiOxNy içeren bir üst dielektrik katmani içermesidir. All the above-mentioned purposes that will emerge from the detailed description below. The present invention to implement is a low-e coated glass. Promise accordingly The feature of the subject invention is that said low-e coating is directed out of the glass. respectively; - a first dielectric selected from SixNy, SiOxNy, ZnSnOx, TiOx, TiNX, ZrNxi - a primary nucleator selected from NiCr, NiCrOX, TiOx, ZnAIOx, ZnOX - a first infrared reflective layer; - a first barrier layer selected from NiCr, NiCrOx, TIOX, ZnAloxide; - a selected from SiXNy, TiNx, ZrNx, ZnSnOX, ZnAIOX, SiOxNy, TIOX, ZnOX third dielectric layer; - a selected from SiXNy, TiNx, ZrNx, ZnSnOX, ZnAIOX, SiOxNy, TiOX, ZnOx fourth dielectric layer; - a secondary nucleator selected from NiCr, NiCrOX, TiOX, ZnAIOX, Znoxt - A second infrared reflective layer; - a second barrier layer selected from NiCr, NiCrOx, TiOX, ZnAIOX; - a selected from ZnSnOX, ZnAlOX, SiOxNy, ZrOx, SIOX, SixNy, TiOX, ZnOX the fifth dielectric layer; - It contains an upper dielectric layer containing SiOxNy.
Bulusun tercih edilen bir diger yapilanmasi, bahsedilen low-e kaplamanin camdan disari dogru sirasiyla; SiXNy içeren birinci dielektrik katman ZnAIOX içeren birinci çekirdeklestirici katman Ag içeren birinci kizilötesi yansitici katman NiCrOX içeren birinci bariyer katman ZnAIOX içeren bir üçüncü dielektrik katman SIXNy içeren bir dördüncü dielektrik katman ZnAlOX içeren ikinci çekirdeklestirici katman Ag içeren ikinci kizilötesi yansitici katman NiCrOX içeren ikinci bariyer katman ZnAIOX içeren besinci dielektrik katman SIOXNy içeren üst dielektrik katman içermesidir. Another preferred embodiment of the invention is that said low-e coating is made of glass. outward in order; First dielectric layer containing SiXNy First nucleating layer containing ZnAIOX First infrared reflective layer containing Ag First barrier layer containing NiCrOX A third dielectric layer containing ZnAIOX A fourth dielectric layer containing SIXNy Second nucleating layer containing ZnAlOX Second infrared reflective layer containing Ag Second barrier layer containing NiCrOX Fifth dielectric layer containing ZnAIOX It contains an upper dielectric layer containing SIOXNy.
Bulusun tercih edilen bir yapilanmasi, bahsedilen low-e kaplamanin camdan disari dogru sirasiyla; SiXNy içeren birinci dielektrik katman TiOx içeren ikinci dielektrik katman ZnAIOX içeren birinci çekirdeklestirici katman Ag içeren birinci kizilötesi yansitici katman NiCrOX içeren birinci bariyer katman ZnAIOX içeren bir üçüncü dielektrik katman SiXNy içeren bir dördüncü dielektrik katman ZnAIOX içeren ikinci çekirdeklestirici katman Ag içeren ikinci kizilötesi yansitici katman NiCrOX içeren ikinci bariyer katman ZnAIOX içeren besinci dielektrik katman; SIOXNy içeren üst dielektrik katman içermesidir. A preferred embodiment of the invention is that said low-e coating is out of the glass. in the correct order; First dielectric layer containing SiXNy Second dielectric layer containing TiOx First nucleating layer containing ZnAIOX First infrared reflective layer containing Ag First barrier layer containing NiCrOX A third dielectric layer containing ZnAIOX A fourth dielectric layer containing SiXNy Second nucleating layer containing ZnAIOX Second infrared reflective layer containing Ag Second barrier layer containing NiCrOX Fifth dielectric layer containing ZnAIOX; It contains an upper dielectric layer containing SIOXNy.
Bulusun tercih edilen bir yapilanmasinda, bahsedilen low-e kaplama camdan disari dogru sirasiyla; SIXNy içeren birinci dielektrik katmanin 10 nm - 20 nm kalinlik araliginda; TiOXiçeren ikinci dielektrik katmanin 0 nm - 10 nm kalinlik araliginda; ZnAIOX içeren birinci çekirdeklestirici katmanin 8 nm - 20 nm kalinlik araliginda; Ag içeren birinci kizilötesi yansitici katmanin 8 nm - 20 nm kalinlik araliginda; NiCrOX içeren birinci bariyer katmanin 0,8 nm - 2,0 nm kalinlik araliginda; ZnAIOX içeren bir üçüncü dielektrik katmanin 15 nm - 30 nm kalinlik araliginda; SixNy, içeren bir dördüncü dielektrik katmanin 30 nm - 50 nm kalinlik araliginda; ZnAIOX içeren ikinci çekirdeklestirici katmanin 15 nm - 30 nm kalinlik araliginda; Ag içeren ikinci kizilötesi yansitici katmanin 8 nm - 20 nm kalinlik araliginda; NiCrOX içeren ikinci bariyer katmanin 0,8 nm - 2,0 nm kalinlik araliginda; ZnAIOX içeren besinci dielektrik katmanin 10 nm - 20 nm kalinlik araliginda; SiOxNy içeren üst dielektrik katmanin 20 nm - 35 nm kalinlik araliginda olacak sekilde katmanlar içermesidir. In a preferred embodiment of the invention, said low-e coating is out of the glass. in the correct order; In the 10 nm - 20 nm thickness range of the first dielectric layer containing SIXNy; In the 0 nm - 10 nm thickness range of the second dielectric layer containing TiOX; 8 nm - 20 nm thickness of the first nucleating layer containing ZnAIOX in the range; 8 nm - 20 nm thickness of the first infrared reflective layer containing Ag. in the range; 0.8 nm - 2.0 nm thickness of the first barrier layer containing NiCrOX in the range; 15 nm to 30 nm thickness of a third dielectric layer containing ZnAIOX in the range; 30 nm to 50 nm thickness of a fourth dielectric layer containing SixNy in the range; 15 nm - 30 nm thickness of the second nucleating layer containing ZnAIOX in the range; 8 nm - 20 nm thickness of the second infrared reflective layer containing Ag. in the range; 0.8 nm - 2.0 nm thickness range of the second barrier layer containing NiCrOX; 10 nm - 20 nm thickness of the fifth dielectric layer containing ZnAIOX in the range; In the 20 nm - 35 nm thickness range of the upper dielectric layer containing SiOxNy It should contain layers.
Bulusun tercih edilen bir yapilanmasinda, bahsedilen low-e kaplama, camdan disari dogru sirasiyla; SiXNy içeren birinci dielektrik katmanin 10 nm - 20 nm kalinlik araliginda; TiOX içeren ikinci dielektrik katmanin 2 nm - 8 nm kalinlik araliginda; ZnAIOX içeren birinci çekirdeklestirici katmanin 8 nm - 20 nm kalinlik araliginda; Ag içeren birinci kizilötesi yansitici katmanin 8 nm - 20 nm kalinlik araliginda; NiCrOX içeren birinci bariyer katmanin 0,8 nm - 2,0 nm kalinlik araliginda; ZnAIOX içeren bir üçüncü dielektrik katmanin 15 nm - 30 nm kalinlik araliginda; SixNy, içeren bir dördüncü dielektrik katmanin 30 nm - 50 nm kalinlik araliginda; - ZnAIOX içeren ikinci çekirdeklestirici katmanin 15 nm - 30 nm kalinlik araliginda; - Ag içeren ikinci kizilötesi yansitici katmanin 8 nm - 20 nm kalinlik araliginda; - NiCrOX içeren ikinci bariyer katmanin 0,8 nm - 2,0 nm kalinlik araliginda; - ZnAIOX içeren besinci dielektrik katmanin 10 nm - 20 nm kalinlik araliginda; - SiOxNy içeren üst dielektrik katmanin 20 nm - 35 nm kalinlik araliginda olacak sekilde katmanlar içermesidir. In a preferred embodiment of the invention, said low-e coating is made of glass. outward in order; In the 10 nm - 20 nm thickness range of the first dielectric layer containing SiXNy; In the 2 nm - 8 nm thickness range of the second dielectric layer containing TiOX; 8 nm - 20 nm thickness of the first nucleating layer containing ZnAIOX in the range; 8 nm - 20 nm thickness of the first infrared reflective layer containing Ag. in the range; 0.8 nm - 2.0 nm thickness of the first barrier layer containing NiCrOX in the range; 15 nm to 30 nm thickness of a third dielectric layer containing ZnAIOX in the range; 30 nm to 50 nm thickness of a fourth dielectric layer containing SixNy in the range; - 15 nm - 30 nm thickness of the second nucleating layer containing ZnAIOX in the range; - 8 nm - 20 nm thickness of the second infrared reflective layer containing Ag in the range; - thickness range of 0.8 nm - 2.0 nm of the second barrier layer containing NiCrOX; - 10 nm - 20 nm thickness of the fifth dielectric layer containing ZnAIOX in the range; - In the thickness range of 20 nm - 35 nm of the upper dielectric layer containing SiOxNy It should contain layers.
Yukarida bahsedilen ve asagidaki detayli anlatimdan ortaya çikacak tüm amaçlari gerçeklestirmek üzere mevcut bulus, yukaridaki dizilim alternatifleri ile sinirli kalmamak kosuluyla low-e kaplamali cama ait üretim yöntemidir. Buna göre mevcut bulusun özelligi; birinci bariyer katman ve ikinci bariyer katmaninin kaplanmasi esnasinda 02 akis hizi / güç yogunlugu oraninin 8 sccm/(Watt*cm`2)'den küçük olmasidir. All the above-mentioned purposes that will emerge from the detailed description below. The present invention is limited to the above array alternatives. It is the production method of low-e coated glass provided that it does not remain. available accordingly feature of the invention; coating of the first barrier layer and the second barrier layer 02 flow rate / power density ratio is less than 8 sccm/(Watt*cm`2) during is that.
SEKILIN KISA AÇIKLAMASI Sekil 1' de low-e katman diziliminin genel bir görünümü verilmistir. BRIEF DESCRIPTION OF THE FIGURE A general view of the low-e layer array is given in Figure 1.
SEKILDE VERILEN REFERANS NUMARALARI Cam Low-e kaplama 21 Alt dielektrik yapi 211 Birinci dielektrik katman 212 Ikinci dielektrik katman 213 Birinci çekirdeklestirici katman 22 Birinci kizilötesi yansitici katman 23 Birinci bariyer katman 24 Orta dielektrik yapi 241 Uçüncü dielektrik katman 243 Ikinci çekirdeklestirici katman Ikinci kizilötesi yansitici katman 26 Ikinci bariyer katman 27 Ust dielektrik yapi 271 Besinci dielektrik katman 272 Ust dielektrik katman BULUSUN DETAYLI AÇIKLAMASI Bu detayli açiklamada bulus konusu low-e kaplamali (20) cam (10) sadece konunun daha iyi anlasilmasina yönelik hiçbir sinirlayici etki olusturmayacak örneklerle açiklanmaktadir. REFERENCE NUMBERS IN THE FOLLOWING Pine Low-e coating 21 Lower dielectric structure 211 First dielectric layer 212 Second dielectric layer 213 First nucleating layer 22 First infrared reflective layer 23 First barrier layer 24 Medium dielectric structure 241 Third dielectric layer 243 Second nucleating layer Second infrared reflective layer 26 Second barrier layer 27 Upper dielectric structure 271 Fifth dielectric layer 272 Upper dielectric layer DETAILED DESCRIPTION OF THE INVENTION In this detailed description, the subject of the invention is the low-e coated (20) glass (10) only shall have no limiting effect on a better understanding of the subject. explained with examples.
Mimari ve otomotive yönelik low-e kaplamali (20) camlarin (10) üretimi “sputtering” (bundan sonra metinde siçratma yöntemi olarak anilacaktir) yöntemi ile gerçeklestirilmektedir. Bu bulus genel olarak; gün isigi geçirgen ve isi yalitim cami (10) olarak kullanilan, isil islem dayanimi yüksek olan çift gümüslü low-e kaplamali (20) camlar (10), bahsedilen low-e kaplamanin (20) içerigi ve uygulamasi ile ilgilidir. Production of low-e coated (20) glasses (10) for architectural and automotive “sputtering” (hereinafter referred to as the leap method in the text) is carried out. In general, this invention; daylight permeable and heat insulating mosque (10) used as double silver low-e coating with high heat treatment resistance. (20) glasses (10) are related to the content and application of said low-e coating (20).
Bulus konusu low-e kaplamali (20) cam (10), mimari ve otomotiv sektörleri için isi cam ünitesi ve Iaminasyonlu yapilarda kullanilabilmektedir. The subject of the invention is low-e coated (20) glass (10), thermal insulation material for the architectural and automotive industries. It can be used in glass units and laminated structures.
Bu bulusta, bir camin (10) yüzeyine uygulanmak üzere yüksek seviyede görünür isik geçirgenligine sahip, isil islenebilir bir sekilde tasarlanmis olan ve günes kontrol özelligine de sahip bir low-e kaplamali (20) cam (10) elde edebilmek amaci ile siçratma yöntemi kullanilarak cam (10) yüzeyinde konumlanan çoklu sayida metal, metal oksit ve/veya metal nitrür/oksinitrür katmanlarindan olusan bir low-e kaplama (20) gelistirilmistir. Söz konusu katmanlar sirasi ile birbiri üzerine vakum ortaminda biriktirilmektedir. Isil islem olarak temperleme, kismi temperleme, tavlama, bükme ve Iaminasyon islemlerinden en az biri ve/veya birkaçi birlikte kullanilabilmektedir. Bulus konusu günes kontrol özellikli low-e kaplamali (20) cam (10) mimari ve otomotiv cami (10) olarak kullanilabilmektedir. In this invention, it appears at a high level to be applied to the surface of a glass (10). which has light transmittance, is designed in a heat-treatable way and The aim of obtaining a low-e coated (20) glass (10) with control feature multiple number of positions positioned on the glass (10) surface using the splash method. a low-e layer consisting of metal, metal oxide and/or metal nitride/oxynitride layers. coating (20) has been developed. Vacuum on top of each other with the layers in question. accumulated in the environment. Tempering as heat treatment, partial tempering, at least one and/or a combination of annealing, bending and lamination processes can be used. The subject of the invention is low-e coated (20) glass with sun control (10) can be used as an architectural and automotive mosque (10).
Gerek üretim kolayligi açisindan, gerekse optik özellikleri açisindan isil islenebilir, günes kontrol özellikli bir low-e kaplama (20) dizilimini gelistirmek üzere deneysel çalismalar neticesinde asagidaki veriler tespit edilmistir. It can be heat treated both in terms of ease of production and optical properties, Experimental to develop a low-e coating (20) array with sun control As a result of the studies, the following data were determined.
Bulus konusu low-e kaplamada (20); günes enerjisi spektrumu görünür bölgeyi (bundan sonra % Tvis olarak adlandirilacaktir) hedeflenen düzeyde geçirmeyi ve kizilötesi bölgede olan isil radyasyonu yansitmayi (daha az geçirerek) saglayan bir birinci kizilötesi yansitici katman (22) ve bir ikinci kizilötesi yansitici katmandir (25). In the low-e coating (20), which is the subject of the invention; solar spectrum visible region (hereinafter referred to as %Tvis) to pass the targeted level, and A device that allows to reflect (less pass) the thermal radiation in the infrared region. a first infrared reflective layer (22) and a second infrared reflective layer (25).
Birinci kizilötesi yansitici katman (22) ve ikinci kizilötesi yansitici katman (25) olarak Ag katmani kullanilmaktadir ve isi yayinimi düsüktür. First infrared reflective layer (22) and second infrared reflective layer (25) The network layer is used as the network and the heat dissipation is low.
Bulus konusu low-e kaplamali (20) camda (10); tüm katmanlarin kirma indisleri alinan tek katman ölçümlerinden elde edilen optik sabitler üzerinden hesaplamali yöntemler kullanilarak belirlenmistir. Söz konusu kirma indisleri 550 nm'deki kirma indisi verileridir. In the low-e coated (20) glass (10), which is the subject of the invention; refractive indices of all layers computational based on optical constants from single layer measurements taken determined using methods. The said refractive indices are at 550 nm. index data.
Bulus konusu low-e kaplamada (20); cama (10) temas edecek sekilde bir alt dielektrik yapi (21) mevcuttur. Bahsedilen alt dielektrik yapida (21) en alt katman olarak bir birinci dielektrik katman (211) kullanilmaktadir. Bahsedilen birinci dielektrik katman (211) SixNy, SiAINX, SiAIOXNy, SiOxNy_ ZnSnOX, TiOx, TiNx, ZrNX malzemelerinden en az birini içermektedir. Tercih edilen uygulamada birinci dielektrik katman (211) SIXNy içermektedir. SiXNy içeren birinci dielektrik katman (211), difüzyon bariyeri olarak davranarak, yüksek sicaklikta kolaylasan alkali iyon göçünü engelleme amacina hizmet etmektedir. Böylece SiXNy içeren birinci dielektrik katman (211), low-e kaplamanin (20) isil islem süreçlerine dayanimina destek vermektedir. SiXNy içeren birinci dielektrik katmaninin (211) kirma indisi için degisim araligi 2,00 ile 2,10 arasindadir. Tercih edilen yapida SiXNy içeren birinci dielektrik katmaninin (211) kirma indisi için degisim araligi 2,02 ile 2,07, dir. In the low-e coating (20), which is the subject of the invention; a bottom plate in contact with the glass (10). dielectric structure (21) is available. In the aforementioned lower dielectric structure (21) the lowest layer as a first dielectric layer (211) is used. the first mentioned dielectric layer (211) SixNy, SiAINX, SiAIOXNy, SiOxNy_ ZnSnOX, TiOx, TiNx, ZrNX contains at least one of the ingredients. In the preferred embodiment, the first dielectric layer (211) contains SIXNy. First dielectric layer containing SiXNy (211), alkali ion facilitating at high temperature, acting as a diffusion barrier. serves the purpose of preventing immigration. Thus, the first containing SiXNy The dielectric layer (211) ensures that the low-e coating (20) is resistant to heat treatment processes. provides support. For the refractive index of the first dielectric layer (211) containing SiXNy the variation range is between 2.00 and 2.10. First containing SiXNy in the preferred structure The variation range for the refractive index of the dielectric layer (211) is 2.02 to 2.07.
SiXNy içeren birinci dielektrik katmani (211) kalinligi 10 nm - 20 nm arasindadir. The thickness of the first dielectric layer (211) containing SiXNy is between 10 nm and 20 nm.
Tercih edilen uygulamada SiXNy içeren birinci dielektrik katmani (211) kalinligi 12 nm - 18 nm arasindadir. Daha da tercih edilen uygulamada SiXNy içeren birinci dielektrik katmani (211) kalinligi 13 nm - 17 nm arasindadir. Thickness of the first dielectric layer (211) containing SiXNy in the preferred embodiment 12 nm to 18 nm. In a more preferred embodiment, the first containing SiXNy The thickness of the dielectric layer (211) is between 13 nm and 17 nm.
SiXNy içeren birinci dielektrik katmani (211) ile birinci kizilötesi yansitici katman (22) olan Ag katmani arasinda en az bir birinci çekirdeklestirici katman (213) konumlanmaktadir. Bulusun bir uygulamasinda birinci çekirdeklestirici katman (213), SIXNy içeren birinci dielektrik katmani (211) ile dogrudan temas etmektedir. First dielectric layer (211) and first infrared reflective layer (22) containing SiXNy at least one first nucleating layer (213) between the network layer is located. First nucleating layer in one embodiment of the invention (213) is in direct contact with the first dielectric layer (211) containing SIXNy.
Birinci çekirdeklestirici katman (213) NiCr, NiCrOX, TiOX, ZnSnOx, ZnAIOX, ZnOx' den en az birini içermektedir. Tercih edilen uygulamada birinci çekirdeklestirici katman ( kalinligi 8 nm - 20 nm arasindadir. Tercih edilen uygulamada birinci çekirdeklestirici katman (213) kalinligi 9 nm - 16 nm arasindadir. Daha da tercih edilen uygulamada birinci çekirdeklestirici katman (213) kalinligi 10 nm - 15 nm arasindadir. First nucleating layer (213) NiCr, NiCrOX, TiOX, ZnSnOx, ZnAIOX, ZnOx' contains at least one of In the preferred embodiment, the first nucleator layer (thickness 8 nm to 20 nm. In the preferred embodiment, the first nucleating layer (213) thickness is between 9 nm - 16 nm. In an even more preferred embodiment, the first The nucleating layer 213 has a thickness of 10 nm to 15 nm.
Bulusun bir diger uygulamasinda birinci çekirdeklestirici katman (213) ile SIXNy içeren birinci dielektrik katmani (211) arasinda bir ikinci dielektrik katman (212) konumlanmaktadir. Bahsedilen ikinci dielektrik katman (212) TiOX, ZrOx, NbOX katmanlarindan en az birini içermektedir. Tercih edilen uygulamada ikinci dielektrik katman (212) olarak TiOX kullanilmaktadir. TiOx, kirilma indisi yüksek bir malzeme oldugu için, daha az toplam fiziksel kalinlik ile ayni optik performansin elde edilmesini saglamakta, low-e kaplamanin (20) %Tvis degerini artirici rol oynamaktadir. TiOX katmaninin kirilma indisi 2,40 ile 2,60 arasindadir. Tercih edilen uygulamada 2,45 - 2,55 olarak belirlenmistir. Ikinci dielektrik katman (212) olan TiOX katmani kalinligi O nm - 10 nm arasindadir. Tercih edilen uygulamada TiOX katmani kalinligi 2 nm - 8 nm arasindadir. Daha da tercih edilen uygulamada TiOX katmani kalinligi 2 nm - 7 nm arasindadir. In another embodiment of the invention, the SIXNy with the first nucleating layer (213) a second dielectric layer (212) between the first dielectric layer (211) containing is located. Said second dielectric layer (212) TiOX, ZrOx, NbOX contains at least one of its layers. In the preferred embodiment, the second dielectric TiOX is used as layer (212). TiOx is a material with a high refractive index. Because it has less overall physical thickness, the same optical performance can be achieved. It plays a role in increasing the %Tvis value of the low-e coating (20). is playing. The refractive index of the TiOX layer is between 2.40 and 2.60. Choice It has been determined as 2.45 - 2.55 in the application. Second dielectric layer (212) TiOX layer thickness is between 10 nm and 10 nm. In preferred application TiOX layer thickness is between 2 nm - 8 nm. In the more preferred application TiOX layer thickness is between 2 nm - 7 nm.
Camdan sonraki birinci ve ikinci katmanlar olan SIXNy içeren birinci dielektrik katmani (211) ve ikinci dielektrik katman (212) olan TiOX katmani birlikte kullanildiginda, ikinci dielektrik katman (212) olan TiOX katmaninin yüksek kirilma indisi sayesinde, daha ince SIXNy içeren birinci dielektrik katman (211) kullanimi ile optik performansin optimize edilmesi mümkün olmaktadir. Belirtilen kalinlik degerinin altinda her ne kadar low-e kaplamali (20) camin (10) %TviS degerleri degismese de renk ve optik performansinda ciddi degismeler görülmektedir. Üzerinde olmasi durumunda ise low-e kaplamali (20) camin (10) renk degerlerinden CIELAB uzayindaki geçirgenlik renk b* degeri ya da bir diger ifade ile taraf yansima (bundan sonra %Rgvis) artmaktadir. First dielectric containing SIXNy, the first and second layers after glass layer (211) and the second dielectric layer (212), the TiOX layer. When used, the high refraction of the TiOX layer, which is the second dielectric layer (212), with the use of the first dielectric layer (211) containing the thinner SIXNy, thanks to its index It is possible to optimize the optical performance. Specified thickness Although below the value of low-e coated (20) glass (10) %TviS values Although it does not change, there are serious changes in color and optical performance. If it is on it, the low-e coated (20) glass (10) color the transmittance color b* value in the CIELAB space or in other words. side reflection (hereafter %Rgvis) increases.
Görünür bölge isik geçirgenligi ya da bir diger ifade ile %Tvis azalmakta, ve bu da hedeflenen performanstan uzaklasmaya neden olmaktadir. Visible light transmittance or in other words %Tvis decreases, which causes deviation from the targeted performance.
Birinci kizilötesi yansitici katman (22) ve ikinci kizilötesi yansitici katman (25) arasinda konumlanarak birinci kizilötesi yansitici katman (22) ve ikinci kizilötesi yansitici katmani (25) birbirinden ayiran ve low-e katman (20) diziliminin hedeflenen performansa ulasmasini saglayan bir orta dielektrik yapisi (24) mevcuttur. Bahsedilen orta dielektrik yapisi (24) en az bir dielektrik katman içermektedir. Bulusun bir uygulamasinda orta dielektrik yapisi (24) en az bir dielektrik katman ile birlikte dielektrik katman komsulugunda konumlanan en az bir ikinci çekirdeklestirici katman (243) içermektedir. Ikinci çekirdeklestirici katman (243) NiCr, NiCrOX, TiOx, ZnAIOX, ZnOX'den en az birini içermektedir. Tercihen ikinci çekirdeklestirici katman (243) ZnAIOX içermektedir. First infrared reflective layer (22) and second infrared reflective layer (25) positioned between the first infrared reflecting layer 22 and the second infrared that separates the reflective layer (25) from each other and that the low-e layer (20) array a medium dielectric structure (24) that allows it to achieve the targeted performance available. Said middle dielectric structure (24) has at least one dielectric layer. contains. In one embodiment of the invention, the middle dielectric structure (24) has at least one at least one positioned in the neighborhood of the dielectric layer together with the dielectric layer. the second nucleating layer (243). Second nucleating layer (243) Contains at least one of NiCr, NiCrOX, TiOx, ZnAIOX, ZnOX. Preferably The second nucleating layer 243 includes ZnAlOX.
Bulusun tercih edilen uygulamasinda orta dielektrik katman yapisi (24) SixNy, TiNX, ZrNX, ZnSnOX, ZnAIOx, SiAINx, SiAIOXNy, SiOXNy, TiOx, ZnOX' den seçilen en az iki dielektrik katman içermektedir. Seçilen iki dielektrik katman birbirleri ile temas etmektedir. Orta dielektrik yapisi (24) bir üçüncü dielektrik katman (241), bir dördüncü dielektrik katman (242) ve ikinci çekirdeklestirici katmani (243) birlikte içermektedir. Orta dielektrik yapisi (24) ikinci kizilötesi yansitici katmani (25) olan Ag katmanina dogrudan temas edecek sekilde konumlanmaktadir. Bulusun tercih edilen yapilanmasinda üçüncü dielektirik katman (241) olarak ZnAIOX, dördüncü dielektrik katman (242) SiXNy içermektedir. Uçüncü dielektrik katman (241) olan ZnAIOX katmani kalinligi 15 nm - 30 nm arasindadir. Tercih edilen uygulamada üçüncü dielektrik katman (241) olan ZnAIOX katmani kalinligi 17 nm - 27 nm arasindadir. Daha da tercih edilen uygulamada üçüncü dielektrik katman (241) olan ZnAIOX katmani kalinligi 19 nm - 26 nm araligindadir. SiXNy içeren dördüncü dielektrik katman (242) kalinligi 30 nm - 50 nm arasindadir. Tercih edilen uygulamada SIXNy içeren dördüncü dielektrik katman (242) kalinligi 35 nm - 46 nm arasindadir. Daha da tercih edilen uygulamada SIXNy içeren dördüncü dielektrik katman (242) kalinligi 39 nm - 43 nm arasindadir. In the preferred embodiment of the invention, the middle dielectric layer structure (24) is SixNy, TiNX, At least two selected from ZrNX, ZnSnOX, ZnAIOx, SiAINx, SiAIOXNy, SiOXNy, TiOx, ZnOX contains a dielectric layer. The two selected dielectric layers are in contact with each other. is doing. The middle dielectric structure (24) consists of a third dielectric layer (241), a the fourth dielectric layer (242) and the second nucleating layer (243) together. contains. Middle dielectric structure (24) with second infrared reflective layer (25) It is positioned to contact the network layer directly. Find your choice ZnAIOX as the third dielectric layer (241), in the fourth dielectric layer 242 contains SiXNy. The third dielectric layer (241) is The ZnAIOX layer thickness is between 15 nm - 30 nm. In preferred application the third dielectric layer (241), the ZnAIOX layer thickness 17 nm - 27 nm are in between. In an even more preferred embodiment, the third dielectric layer 241 is The ZnAIOX layer thickness ranges from 19 nm to 26 nm. The fourth featuring SiXNy The thickness of the dielectric layer 242 is between 30 nm and 50 nm. Preferred in practice the fourth dielectric layer (242) containing SIXNy thickness 35 nm - 46 nm are in between. In a more preferred embodiment, the fourth dielectric containing SIXNy layer 242 has a thickness of 39 nm to 43 nm.
Ikinci çekirdeklestirici katman (243) olan ZnAIOX katmani kalinligi 15 nm - 30 nm arasindadir. Tercih edilen uygulamada ikinci çekirdeklestirici katman (243) olan ZnAIOX katmani kalinligi 17 nm - 27 nm arasindadir. Daha da tercih edilen uygulamada ikinci çekirdeklestirici katman (243) olan ZnAIOX katmani kalinligi 19 nm - 26 nm arasindadir. ZnAIOX layer thickness 15 nm - 30 nm as the second nucleating layer (243) are in between. In the preferred embodiment, the second nucleating layer (243) The ZnAIOX layer thickness is between 17 nm - 27 nm. Even more preferred ZnAIOX layer thickness 19 which in practice is the second nucleating layer (243) nm to 26 nm.
Bahsedilen orta dielektrik yapisinin (24) içermis oldugu dielektrik katmanlarin kalinliklari ve yapilari ayri ayri optimize edilerek cam (10) tarafi ve kaplama tarafi yansima ve renk degerleri hedeflenen degerlerin elde edilmesi konusunda daha fazla seçenek olusturmaktadir. Orta dielektrik yapinin (24) sandviç formunda olmasi hedeflenen yansima ve renk degerlerinin optimize edilebilmesi saglamasinin yaninda ikinci kizilötesi yansitici katman (25) olan Ag katmaninin optoelektronik özelliklerinin iyilestirilmesi için gereklidir. The dielectric layers contained in the aforementioned middle dielectric structure (24) glass (10) side and cladding side by optimizing their thickness and structure separately reflectance and color values are more effective in obtaining the targeted values. creates more options. Sandwich form of middle dielectric structure (24) Optimizing the reflection and color values aimed to be In addition to providing the network, the second infrared reflective layer (25) is the Ag layer. It is necessary to improve the optoelectronic properties.
Söyle ki; Orta dielektrik yapinin (24) tek ve kalin bir katmandan olusmasi halinde, amorf olmasi hedeflenen orta dielektrik yapinin (24) kismen ve/veya tamamen kristalin bir yapi gösterme olasiligi artmaktadir. Ikinci kizilötesi yansitici katman (25) olan Ag ile dogrudan temasta olan çekirdeklestirici olarak kullanilan katman, kendisinin diger yüzeyine temas eden katman üzerinde büyürken, büyüdügü katmanin kristalizasyonundan olumsuz etkilenmemesi için büyüdügü bu katmanin amorf yapida olmasi tercih edilmektedir. Bulusta ikinci kizilötesi yansitici katman (25) olan Ag katmani ile ikinci çekirdeklestirici katman (243) olan ZnAIOX dogrudan temastadir. Ikinci çekirdeklestirici katman (243) olan ZnAIOx”in diger yüzeyine amorf yapidaki SiXNy içeren dördüncü dielektrik katmani (242) temas etmektedir. Namely; If the middle dielectric structure (24) consists of a single and thick layer, it is amorphous. A partially and/or wholly crystalline form of the middle dielectric structure (24) intended to be the probability of showing structure increases. Ag, the second infrared reflective layer (25) The layer used as the nucleator in direct contact with the while it grows on the layer in contact with its other surface, In order not to be adversely affected by the crystallization, this layer is amorphous. structure is preferred. Second infrared reflective layer (25) in the invention The Ag layer and the second nucleating layer (243), ZnAIOX directly is in contact. to the other surface of the second nucleating layer (243), ZnAIOx. The fourth dielectric layer (242), containing the amorphous SiXNy, is in contact.
Böylece kristalin uyumsuzluk gibi bir problem ve dolayisi ile ikinci çekirdeklestirici katman (243) yapisinin kristalizasyonunun etkilenmesi ve istenmeyen kalinti gerilimin olusmasi ihtimali azaltilmaktadir. Ikinci çekirdeklestirici katman (243) özelindeki hassasiyet, ikinci kizilötesi katmanin (25) olmasi gereken kristalografik oryantasyonda büyümesini saglamaktadir. Orta dielektrik yapi (24) toplamda 75 nm- 105 nm araliginda bir kalinliga sahiptir. Tercih edilen uygulamada orta dielektrik yapi (24) toplamda 80 nm- 100 nm araliginda bir kalinliga sahiptir. Daha da tercihen orta dielektrik yapi (24) toplamda 85 nm - 95 nm araliginda bir kalinliga sahiptir. Thus, a problem such as crystalline incompatibility and thus the second nucleator influencing the crystallization of the layer (243) structure and unwanted residue The potential for tension is reduced. Second nucleating layer (243) The particular sensitivity is that the second infrared layer (25) must be crystallographic It allows it to grow in orientation. Medium dielectric structure (24) 75 in total It has a thickness in the range of nm to 105 nm. Moderate in preferred application The dielectric structure (24) has a total thickness of 80 nm to 100 nm. More Preferably, the medium dielectric structure (24) has a total thickness of 85 nm to 95 nm. has.
Birinci kizilötesi yansitici katmanin (22) 'üzerinde bir birinci bariyer katman (23) ve ikinci kizilötesi yansitici katmanin (25) üzerinde bir ikinci bariyer katman (26) konumlanmaktadir. Birinci bariyer katman (23) ve ikinci bariyer katman (26) NiCr, NiCrOx, TiOX, ZnAIOX malzemelerinden en az birini içermektedir. Tercih edilen uygulamada birinci bariyer katman (23) ve ikinci bariyer katman (26) olarak NiCrOX kullanilmaktadir. Birinci bariyer katman (23) ve ikinci bariyer katman (26) olan NiCrOX katmanlari kalinliklari 0,8 nm - 2,0 nm araligindadir. Tercih edilen uygulamada birinci bariyer katman (23) ve ikinci bariyer katman (26) olan NiCrOX katmanlari kalinliklari 0,9 nm - 1,9 nm araligindadir. Tercih edilen uygulamada birinci bariyer katman (23) ve ikinci bariyer katman (26) olan NiCrOX katmanlari Birinci bariyer katman (23) ve ikinci bariyer katman (26) olarak kullanilan NiCrOX katmanlari; birinci kizilötesi yansitici katman (22) ve ikinci kizilötesi yansitici katman (25) olan Ag katmanlarindan sonra gelen katmanlarin 'üretimi için kullanilan proses gazlarindan Ag katmanlarinin etkilenmemesi için kullanilmaktadir. Ayni zamanda NiCrOX katmanlari, Ag katmanlarindan sonra gelecek dielektrik katmanlar arasindaki metalik ve dielektrik geçisinde yapisal uyumu saglayarak isil islem öncesi olasi yapisma zayifligini bertaraf etmektedir. Ayrica NiCrOX katmanlari, temper, bükme vb. gibi isil islem süreçlerinde kendisi öncelikli oksitlenmekte ve böylece Ag katmanlarinin oksitlenerek yapisal bozulmaya ugramasini engellemektedir. A first barrier layer 23 above the first infrared reflective layer 22 and A second barrier layer (26) above the second infrared reflective layer (25) is located. The first barrier layer (23) and the second barrier layer (26) are NiCr, It contains at least one of the materials NiCrOx, TiOX, ZnAIOX. Preferred NiCrOX as first barrier layer (23) and second barrier layer (26) in application is used. The first barrier layer (23) and the second barrier layer (26). NiCrOX layers have thicknesses in the range of 0.8 nm - 2.0 nm. Preferred NiCrOX, which in the application is the first barrier layer (23) and the second barrier layer (26) The thicknesses of the layers are in the range of 0.9 nm - 1.9 nm. In preferred application NiCrOX layers, the first barrier layer (23) and the second barrier layer (26) NiCrOX used as the first barrier layer (23) and the second barrier layer (26). layers; first infrared reflective layer 22 and second infrared reflective layer used for the 'production' of the layers that come after the Network layers which are layer 25 It is used to prevent the network layers from being affected by the process gases. Same At the same time, the NiCrOX layers are the dielectric layers that will come after the Network layers. heat treatment by providing structural harmony in the metallic and dielectric transition between It eliminates possible adhesion weakness before In addition, NiCrOX layers, temper, bending etc. It is primarily oxidized in heat treatment processes such as Thus, it prevents structural deterioration of the Ag layers by oxidation. hinders.
Ikinci bariyer katman (26) 'üzerinde bir 'üst dielektrik yapi (27) konumlanmaktadir. An upper dielectric structure 27 is positioned on the second barrier layer 26 '.
Bahsedilen üst dielektrik yapi (27) bir besinci dielektrik katman (271) ve bir üst dielektrik katman (272) içermektedir. Besinci dielektrik katman (271) ZnSnOx, ZnAIOX, SiOXNy, ZrOx, SiOx, SixNy, TiOX, ZnOxlden en az birini içermektedir. Said upper dielectric structure (27) consists of a fifth dielectric layer (271) and an upper dielectric layer (272). Fifth dielectric layer (271) ZnSnOx, ZnAIOX contains at least one of SiOXNy, ZrOx, SiOx, SixNy, TiOX, ZnOxl.
Ust dielektrik katman (272) olarak SIOXNy içeren katmanin tercih edildigi ve bir ikinci bariyer katman (26) olan NiCrOX ile dogrudan temas halinde olacak sekilde kullanildigi durumda, NiCrOX katmani ile SIOXNy içeren katman birbirleriyle uyumsuz davranis göstermekte, zayif mekanik ve isil islem dayanimi sergilemektedir. Bu amaçla patente konu olan low-e kaplamada (20) bulunan ikinci bariyer katman (26) olan NiCrOX katmani ile SIOXNy içeren üst dielektrik katman (272) arasina besinci dielektrik katman (271) eklenerek low-e kaplamanin (20) kararli isil islem davranisi göstermesi saglanmaktadir. Besinci dielektrik katman ZnAlOX katmani kalinligi 10 nm - 20 nm arasindadir. Tercih edilen uygulamada besinci dielektrik katman (271) olan ZnAIOX katmani kalinligi 11 nm - 19 nm arasindadir. Daha da tercih edilen uygulamada besinci dielektrik katman (271) olan ZnAIOX katmani kalinligi 12 nm - 18 nm arasindadir. As the upper dielectric layer (272), the layer containing SIOXNy is preferred and a in direct contact with the second barrier layer (26), NiCrOX. used, the NiCrOX layer and the layer containing SIOXNy are interrelated. shows incompatible behavior, poor mechanical and thermal process resistance exhibits. For this purpose, the second in the low-e coating (20), which is the subject of the patent, the barrier layer (26), the NiCrOX layer, and the upper dielectric layer containing SIOXNy A fifth dielectric layer (271) is added between (272) and the low-e coating (20) It is provided to show stable heat treatment behavior. Fifth dielectric layer The ZnAlOX layer thickness is between 10 nm - 20 nm. In preferred application the fifth dielectric layer (271), the ZnAIOX layer thickness 11 nm - 19 nm are in between. In an even more preferred embodiment, the fifth dielectric layer (271) is The ZnAIOX layer thickness is between 12 nm - 18 nm.
Ust dielektrik katman (272) olarak SIXNy içeren katman yerine, SIOXNy içeren katman kullanildigi durumda, SIOXNy içeren katmanin kirma indisi SIXNy içeren katmandan daha düsük oldugu için ayni optik davranis daha kalin bir SiOXNy içeren katman ile elde edilebilmektedir. Böylece daha kalin bir üst dielektrik katman (272) kullanilarak kaplamanin mekanik dayanimi artirilmaktadir. SiOXNy içeren üst dielektrik katman (272) kalinligi 20 nm - 35 nm arasindadir. Tercih edilen uygulamada SIOXNy içeren üst dielektrik katman (272) kalinligi 20 nm - 32 nm arasindadir. Daha da tercih edilen uygulamada SiOXNy içeren üst dielektrik katman (272) kalinligi 22 nm - 30 nm arasindadir. Instead of the layer containing SIXNy as the upper dielectric layer (272), the layer containing SIOXNy in the case of a layer with SIOXNy, the refractive index of the layer containing SIXNy the same optical behavior as containing a thicker SiOXNy layer can be achieved by layering. Thus, a thicker upper dielectric layer (272) The mechanical strength of the coating is increased by using Top with SiOXNy The thickness of the dielectric layer 272 is between 20 nm - 35 nm. Preferred upper dielectric layer (272) containing SIOXNy in application thickness 20 nm - 32 nm are in between. In a more preferred embodiment, the upper dielectric layer containing SiOXNy (272) thickness is between 22 nm - 30 nm.
Birinci çekirdeklestirici katman (213), üçüncü dielektrik katman (241), ikinci çekirdeklestirici katman (243) ve besinci dielektrik katman (271) olarak kullanilan ZnAIOX için kirma indisi araligi 1,90 - 2,10 'dur. Tercih edilen yapilanmada birinci çekirdeklestirici katman (213), üçüncü dielektrik katman (241), ikinci çekirdeklestirici katman (243) ve besinci dielektrik katman (271) olarak kullanilan ZnAIOX için kirma indisi araligi 1,95- 2,05”dir. First nucleating layer (213), third dielectric layer (241), second used as the nucleating layer (243) and the fifth dielectric layer (271). The refractive index range for ZnAIOX is 1.90 - 2.10. First in the preferred configuration nucleating layer (213), third dielectric layer (241), second used as the nucleating layer (243) and the fifth dielectric layer (271). The refractive index range for ZnAIOX is 1.95-2.05”.
Bulus konusu mimari ve otomotiv kullanima yönelik olan low-e kaplamali (20) ürünler için hedeflenen geçirgenlik ve yansima degerlerini elde edebilmek birinci kizilötesi yansitici katman (22) ve ikinci kizilötesi yansitici katman (25) kalinliklari 8 nm - 20 nm arasindadir. Tercih edilen uygulamada birinci kizilötesi yansitici katman (22) ve ikinci kizilötesi yansitici katman (25) kalinliklari 9 nm - 18 nm arasindadir. Daha spesifik olarak hem hedeflenen performans degerine ulasilmasi hem de istenilen renk özellikleri ve görünür bölgede düsük içe ve disa yansima degerleri elde edilebilmesi için birinci kizilötesi yansitici katman (22) ve ikinci kizilötesi yansitici katman (25) kalinliklari 10 nm - 17 nm arasindadir. Hedeflenen seçicilik ve optik performansin yakalanmasi için ürünün birbirinden bagimsiz gümüs içeren iki ayri kizilötesi yansitici katmana sahip olmasi gerekmektedir. The subject of the invention is low-e coated (20) for architectural and automotive use. Being able to achieve the targeted transmittance and reflectance values for the products is the first priority. Thicknesses of the infrared reflective layer (22) and the second infrared reflective layer (25) 8 nm to 20 nm. In the preferred embodiment, the first infrared reflector layer (22) and second infrared reflective layer (25) thicknesses 9 nm - 18 nm are in between. More specifically, reaching the targeted performance value as well as the desired color properties and low inward and outward reflection in the visible region. The first infrared reflective layer (22) and the second The infrared reflective layer 25 has thicknesses between 10 nm and 17 nm. targeted independent of each other in order to achieve selectivity and optical performance. It should have two separate infrared reflective layers containing silver.
Birinci kizilötesi yansitici katman (22) ve ikinci kizilötesi yansitici katman (25) kalinliginin bir birine orani 0,7 ile 1,4 arasindadir. Tercihen birinci kizilötesi yansitici katman (22) ve ikinci kizilötesi yansitici katman (25) kalinliginin bir birine Yukarida anlatilan katman dizilimi ile hedeflenen performans degeri tek cam (10) olarak 6 mm alt cam (10) kullanimi için isil islem öncesi görünür bölge geçirgenlik degeri %63 ile %75 arasinda olmasi tercih edilmektedir. Daha tercih edilen uygulamada, %65 ile %71 arasinda olmalidir. Tek cam (10) olarak 6 mm alt cam (10) kullanimi için isil islem öncesi direkt günes enerjisi geçirgenligi degeri % 30 ile °/o 41 arasinda olmasi tercih edilmektedir. Daha tercih edilen uygulamada, %33 ile de bu performansin elde edilmesi desteklenmelidir. First infrared reflective layer (22) and second infrared reflective layer (25) The ratio of the thickness to each other is between 0.7 and 1.4. Preferably first infrared the thickness of the reflective layer 22 and the second infrared reflective layer 25 to each other. The targeted performance value with the layer arrangement described above is a single glass (10) Visible region transmittance before heat treatment for the use of 6 mm lower glass (10) as It is preferred that the value is between 63% and 75%. more preferred in practice, it should be between 65% and 71%. 6 mm bottom glass as single glass (10) (10) with a direct solar energy transmittance value of 30% before heat treatment for use It is preferred that it be between °/o 41. In the more preferred embodiment, with 33% Achieving this performance should also be supported.
Low-e kaplamanin (20) en üst dielektrik katmaninin (272) özellikleri, kaplamali camin (10) isil islem esnasindaki karakterini belirlemesinden dolayi low-e kaplamali (20) camin (10) depolama ömrü, isil islenebilirligi, dayanimi ve görsel estetigi açisindan oldukça önemlidir. Properties of the top dielectric layer (272) of the low-e coating (20), coated It is low-e coated since it determines the character of the glass (10) during heat treatment. (20) storage life, heat treatability, durability and visual aesthetics of glass (10) aspect is very important.
Birinci bariyer katman (23) ve ikinci bariyer katmanin (26) bir diger rolü; low-e kaplamanin (20) birinci kizilötesi yansitici katman (22) ve ikinci kizilötesi yansitici katmaninin (25) opto-elektronik özelliklerinin ikincil islemler ve kullanim ömrü boyunca kararli sekilde korunmasidir. Low-e kaplamanin (20) birinci bariyer katman (23) ve ikinci bariyer katmaninin (26) kaplama sartlari, kaplamali camin (10) isil islem esnasindaki karakterini belirleyen ve low-e kaplamali (20) camin (10), opto- elektronik özelliklerine etki eden bir diger kritik parametredir. Hedeflenen %Tvis degeri için low-e kaplamadaki (20) birinci bariyer katmanin (23) ve ikinci bariyer katmanin (26) absorblama davranisinin, malzeme özelligi gelistirilerek minimize edilmesi gerekmektedir. %Tvis degerinin yükseltilebilmesi ve seçiciliginin arttirilabilmesi için birinci bariyer katman (23) ve ikinci bariyer katmandan (26) gelen absorbsiyon etkisi optimize edilirken low-e kaplamanin (20) kizilötesi yansitma özelliginden ödün vermeden ve ayni zamanda birinci kizilötesi yansitici katman (22) ve ikinci kizilötesi yansitici katmaninin (25) kalinlik homojenitesinin isil islem esnasinda sabit kalabilmesi için birinci bariyer katman (23) ve ikinci bariyer katmaninin (26) kaplanmasi esnasinda 02 akis hizi / güç yogunlugu oraninin düsürülmesi gerekmektedir. Another role of the first barrier layer (23) and the second barrier layer (26); low-e the first infrared reflective layer (22) and the second infrared reflective layer of the coating (20) secondary processes and lifetime of opto-electronic properties of layer 25 stable protection throughout. First barrier layer of low-e coating (20) The coating conditions of (23) and the second barrier layer (26) depend on the thermal conductivity of the coated glass (10). The low-e coated (20) glass (10), opto- It is another critical parameter that affects the electronic properties. Targeted %Tvis value of the first barrier layer (23) and the second barrier in the low-e coating (20) The absorption behavior of the layer (26) is minimized by improving the material properties. needs to be done. The ability to increase the %tvis value and its selectivity The first barrier layer (23) and the second barrier layer (26) infrared of the low-e coating (20) while optimizing the incoming absorption effect without sacrificing reflectivity and at the same time the first infrared reflector thermal homogeneity of the thickness homogeneity of the layer 22 and the second infrared reflective layer (25). The first barrier layer (23) and the second barrier to keep it stable during the process the flow rate / power density ratio 02 during the coating of layer 26 needs to be lowered.
Birinci bariyer katman (23) ve ikinci bariyer katmanin (26) oksijen miktari arttikça katmanlarin absorbsiyon özellikleri low-e kaplamanin (20) görünür bölge geçirgenligi için gerek yeter seviyelere çekilebilmekte ancak belirli bir degerin üzerinde bir kirinim göstermekte ve isil islem esnasinda gümüs aglomerasyonuna neden olmaktadir. Tablo 1'de farkli örnekler üzerinden gösterildigi gibi 2,5 E'3mbar - 4,5 E'3mbar basinç araliginda 02 akis hizi / güç yogunlugu orani, low-e kaplamanin (20) geçirgenligi, seçiciligi ve görsel estetik dengesi açilarindan 9'dan küçük olmalidir. Tercih edilen uygulamada 02 akis hizi / güç yogunlugu orani 8'den küçük olmalidir. As the oxygen content of the first barrier layer (23) and the second barrier layer (26) increase, absorption properties of the layers visible region of the low-e coating (20) It can be drawn to sufficient levels for its permeability, but if a certain value is It shows a diffraction on it and during the heat treatment, silver agglomeration occurs. causes. 2.5 E'3mbar as shown in Table 1 over different examples - 02 flow rate / power density ratio, low-e in the pressure range of 4.5 E'3mbar out of 9 in terms of permeability, selectivity and visual aesthetic balance of the coating (20). must be small. 02 flow rate / power density ratio in preferred embodiment It must be less than 8.
Tablo 1: Bariyer katmanlarin siçratma ile kaplanmasi esnasindaki parametrelerinin, kizilötesi yansitici katmanlarin isil islemler sirasi ve sonrasindaki kalinlik homojenitelerine etkisi. yogunlugu Hata Tipi sccml(Watt*cm ) Oksijensiz ortam Gümüs aglomerasyonu O 3 Gümüs aglomerasyonu 3 4 Gümüs aglomerasyonu 4 7 Gümüs aglomerasyonu 5 8 Gümüs aglomerasyonu 20 9 Gümüs aglomerasyonu >230 Gümüs aglomerasyonu >230 Bulusun koruma kapsami ekte verilen istemlerde belirtilmis olup kesinlikle bu detayli anlatimda örnekleme amaciyla anlatilanlarla sinirli tutulamaz. Zira teknikte uzman bir kisinin, bulusun ana temasindan ayrilmadan yukarida anlatilanlar isiginda benzer yapilanmalar ortaya koyabilecegi açiktir. Table 1: During splash coating of barrier layers parameters, infrared reflective layers, order of heat treatment and its effect on thickness homogeneities after Density Error Type sccml(Watt*cm ) Oxygen free environment Silver agglomeration O 3 Silver agglomeration 3 4 Silver agglomeration 4 7 Silver agglomeration 5 8 Silver agglomeration 20 9 Silver agglomeration >230 Silver agglomeration >230 The scope of protection of the invention is stated in the appended claims and it is absolutely detailed explanation cannot be limited to what is told for the purpose of illustration. Because in technique what has been described above by a specialist without departing from the main theme of the invention It is clear that similar structuring can occur in the light of this.
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| PCT/TR2018/050661 WO2019098980A2 (en) | 2017-11-20 | 2018-11-06 | A thermally processable low-e coating and production method thereof |
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| TR2022014362A2 (en) * | 2022-09-16 | 2022-10-21 | Tuerkiye Sise Ve Cam Fabrikalari Anonim Sirketi | A LOW-E COATED GLASS WITH ANGLE DISCOLORATION REDUCED |
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