TR201801333A2 - A HIGH TEMPERATURE CONTROLLED LOW-E COATED GLASS - Google Patents
A HIGH TEMPERATURE CONTROLLED LOW-E COATED GLASS Download PDFInfo
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- TR201801333A2 TR201801333A2 TR2018/01333A TR201801333A TR201801333A2 TR 201801333 A2 TR201801333 A2 TR 201801333A2 TR 2018/01333 A TR2018/01333 A TR 2018/01333A TR 201801333 A TR201801333 A TR 201801333A TR 201801333 A2 TR201801333 A2 TR 201801333A2
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- 239000011521 glass Substances 0.000 title claims abstract description 62
- 238000000576 coating method Methods 0.000 claims abstract description 51
- 239000011248 coating agent Substances 0.000 claims abstract description 46
- 230000004888 barrier function Effects 0.000 claims abstract description 32
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims abstract description 5
- 229910052709 silver Inorganic materials 0.000 claims abstract description 5
- 239000004332 silver Substances 0.000 claims abstract description 5
- HLLICFJUWSZHRJ-UHFFFAOYSA-N tioxidazole Chemical compound CCCOC1=CC=C2N=C(NC(=O)OC)SC2=C1 HLLICFJUWSZHRJ-UHFFFAOYSA-N 0.000 claims description 42
- 229910003087 TiOx Inorganic materials 0.000 claims description 37
- -1 ZnSnOx Inorganic materials 0.000 claims description 12
- 238000002834 transmittance Methods 0.000 claims description 11
- 229910020776 SixNy Inorganic materials 0.000 claims description 9
- 229910001120 nichrome Inorganic materials 0.000 claims description 9
- 229910020286 SiOxNy Inorganic materials 0.000 claims description 8
- 229910007667 ZnOx Inorganic materials 0.000 claims description 5
- 230000007935 neutral effect Effects 0.000 claims description 5
- 229910010421 TiNx Inorganic materials 0.000 claims description 3
- 229910008328 ZrNx Inorganic materials 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 190
- 230000003287 optical effect Effects 0.000 description 14
- 229910052814 silicon oxide Inorganic materials 0.000 description 9
- 230000007423 decrease Effects 0.000 description 8
- 239000007789 gas Substances 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 description 7
- 230000035699 permeability Effects 0.000 description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 5
- 239000001301 oxygen Substances 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 4
- 230000007704 transition Effects 0.000 description 3
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 235000008331 Pinus X rigitaeda Nutrition 0.000 description 1
- 235000011613 Pinus brutia Nutrition 0.000 description 1
- 241000018646 Pinus brutia Species 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- OLFCLHDBKGQITG-UHFFFAOYSA-N chromium(3+) nickel(2+) oxygen(2-) Chemical compound [Ni+2].[O-2].[Cr+3] OLFCLHDBKGQITG-UHFFFAOYSA-N 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000002329 infrared spectrum Methods 0.000 description 1
- 230000009191 jumping Effects 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3626—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer at least containing a nitride, oxynitride, boronitride or carbonitride
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3644—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the metal being silver
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
- C03C17/366—Low-emissivity or solar control coatings
Abstract
Mimari ve otomotiv camlarında kullanılmak üzere bir cam (10) üzerine biriktirilen ve en az bir dielektrik, en az bir çekirdekleştirici, bir kızılötesi yansıtıcı katman (23) ve en az bir bariyer katman (24) içeren tek gümüşlü bir low-e kaplamalı (20) cam (10) ile ilgilidir.A single silver low-e coating (20) deposited on a glass (10) for use in architectural and automotive glass and comprising at least one dielectric, at least one nucleator, an infrared reflective layer (23) and at least one barrier layer (24). ) relates to the glass (10).
Description
TEKNIK ALAN Bulus, gün isigi geçirgen ve isi yalitim cami olarak kullanilan ve görünür isigi etkin bir sekilde geçirirken ayni zamanda yüksek isi kontrolü saglayan bir düsük yayinimli (low-e) kaplamali cam ile ilgilidir. TECHNICAL FIELD The invention is a daylight-permeable and heat-insulating glass that is used as a visible light-enabled a low temperature control that also provides high temperature control. It relates to low-e coated glass.
ONCEKI TEKNIK Camlarin optik özelliklerini farklilastiran etmenlerden biri cam yüzeyine yapilan kaplama uygulamalaridir. Kaplama uygulamalarindan biri de vakum ortaminda manyetik alan destekli siçratma yöntemidir. Ozellikle low-e özelligine sahip mimari kaplamalarin üretiminde sik basvurulan bir yöntemdir. Bahsedilen yöntemle kaplanan camlarin görünür, yakin kizilötesi ve kizilötesi bölgedeki geçirgenlik ve yansitma degerleri hedeflenen seviyelerde elde edilebilmektedir. PRIOR ART One of the factors that differentiate the optical properties of glasses is the coating applications. One of the coating applications is in vacuum environment. It is a magnetic field assisted jumping method. Especially low-e architecture It is a frequently used method in the production of coatings. With the aforementioned method permeability of the coated glass in the visible, near-infrared and infrared region and reflectance values can be obtained at targeted levels.
Geçirgenlik ve yansitma degerleri disinda, kaplamali camlarda seçicilik degeri de önemli bir parametredir. Seçicilik, görünür bölge geçirgenlik degerinin toplam günes enerjisi geçirgenligine orani olarak tanimlanmaktadir. Kaplamalarin seçicilik degerleri de içerdigi Ag katmani sayisi, kullanilan çekirdeklestirici katman türü, katmanlarin parametrik optimizasyonlari ile hedeflenen seviyelerde tutulabilmektedir. 1,5 olan bir low-e kaplamadan bahsedilmektedir. Bahsedilen low-e kaplama kalay oksit, silisyum nitrür, çinko oksit, gümüs, nikel krom oksit ve titanyum oksit içermektedir. Apart from the transmittance and reflectance values, the selectivity value in coated glasses is also is an important parameter. Selectivity is the total solar transmittance value of the visible region. It is defined as the ratio of energy permeability. Selectivity of coatings number of Network layers including values, type of nucleating layer used, at targeted levels with parametric optimizations of layers can be held. A low-e coating of 1.5 is mentioned. Said low-e plating tin oxide, silicon nitride, zinc oxide, silver, nickel chromium oxide and titanium oxide contains.
BULUSUN KISA AÇIKLAMASI Mevcut bulus ilgili teknik alana yeni avantajlar getirmek üzere, low-e kaplamali cam ile ilgilidir. BRIEF DESCRIPTION OF THE INVENTION The present invention is designed to bring new advantages to the related technical field, using low-e coated glass. It is related to.
Bulusun bir amaci, görünür isigi etkin bir sekilde geçirirken ayni zamanda yüksek isi kontrolü saglayan bir low-e kaplamali cam ortaya koymaktir. It is an object of the invention to pass visible light effectively while at the same time high It is to reveal a low-e coated glass that provides heat control.
Yukarida bahsedilen ve asagidaki detayli anlatimdan ortaya çikacak tüm amaçlari gerçeklestirmek üzere mevcut bulus, mimari ve otomotiv camlarinda kullanilmak üzere bir cam üzerine biriktirilen ve en az bir dielektrik, en az bir çekirdeklestirici, bir kizilötesi yansitici katman ve en az bir bariyer katman içeren tek gümüslü low-e kaplamali bir camdir. Buna göre söz konusu bulusun özelligi; cam ile bahsedilen kizilötesi yansitici katman arasinda konumlanan en az bir dielektrik özellikli katman; kizilötesi yansitici katman üzerinde konumlanarak low-e kaplamali cam yansima degerlerinin düsük ve cam tarafi yansima renginin nötral olmasini saglayan 12 nm - 26 nm kalinlik araliginda TiOX içerikli bir ikinci dielektrik katman ve ZnSnOx, ZnAIOX, SiOXNy, SiOX, SiXNy, ZnOx'den en az birini içeren ve birbirleri ile dogrudan temas ederek low-e kaplamanin mekanik dayanimi arttiran bir üçüncü dielektrik katman ve bir üst dielektrik katman içermesidir. All the above-mentioned purposes that will emerge from the detailed description below. to be used in existing invention, architectural and automotive glass to realize at least one dielectric, at least one nucleator, one Single silver low-e containing infrared reflective layer and at least one barrier layer It is a coated glass. Accordingly, the feature of the invention in question is; at least positioned between the glass and said infrared reflective layer. a dielectric layer; low-e coated glass by positioning on the infrared reflective layer The reflection values are low and the reflection color of the glass side is neutral. A second dielectric containing TiOX in the 12 nm - 26 nm thickness range that provides layer and containing at least one of ZnSnOx, ZnAIOX, SiOXNy, SiOX, SiXNy, ZnOx, and mechanical strength of low-e coating in direct contact with each other It contains a third dielectric layer and an upper dielectric layer that increases
Bulusun tercih edilen bir yapilanmasi, camdan disari dogru sirayla; SiXNy, SiOXNy' ZnSnOX, TIOX, TINX, ZrNx'den en az birini içeren bir birinci dielektrik katman; NiCr, NiCrOX, TiOX, ZnAIOX, Znoxlden en az birini içeren 18 nm - 37 nm kalinlik araliginda bir çekirdeklestirici katman; bir kizilötesi yansitici katman; NiCr, NiCrOx, TiOx, ZnAIOx'dan en az birini içeren 0,8 nm - 2,8 nm kalinlik TiOX içerikli bir ikinci dielektrik katman; - ZnSnOx, ZnAIOX, SiOxNy, SiOX, SixNy, ZnOX'den en az birini içeren bir üçüncü dielektrik katman ve bir üst dielektrik katman içermesidir Bulusun tercih edilen bir yapilanmasi, birinci dielektrik katman olarak SIOXNy içermesidir. A preferred embodiment of the invention is in order from the glass outwards; A first containing at least one of SiXNy, SiOXNy' ZnSnOX, TIOX, TINX, ZrNx dielectric layer; 18 nm - 37 nm containing at least one of NiCr, NiCrOX, TiOX, ZnAIOX, Znoxl a nucleating layer in the thickness range; an infrared reflective layer; 0.8 nm - 2.8 nm thickness containing at least one of NiCr, NiCrOx, TiOx, ZnAIOx a second dielectric layer containing TiOX; - a third containing at least one of ZnSnOx, ZnAIOX, SiOxNy, SiOX, SixNy, ZnOX dielectric layer and an upper dielectric layer A preferred embodiment of the invention is SIOXNy as the first dielectric layer. it contains.
Bulusun tercih edilen bir diger yapilanmasi, birinci dielektrik katman olarak SiXNy içermesidir. Another preferred embodiment of the invention is SiXNy as the first dielectric layer. it contains.
Bulusun tercih edilen bir diger yapilanmasi, low-e kaplamali camin nötral rengini korumasini ve mekanik dayanimin artmasini saglamak üzere üçüncü dielektrik katman kalinliginin üst dielektrik katman kalinligina oraninin 2,08 ± 0,5 olmasidir. Another preferred embodiment of the invention is the neutral color of low-e coated glass. third dielectric to provide protection and increase mechanical strength. the ratio of the layer thickness to the upper dielectric layer thickness is 2.08 ± 0.5.
Bulusun tercih edilen bir yapilanmasi, mekanik dayanimin artmasini saglamak üzere üçüncü dielektrik katman kalinliginin üst dielektrik katman kalinligina oraninin 0,9 ± 0,3 olmasidir. A preferred embodiment of the invention is to provide increased mechanical strength. the third dielectric layer thickness to the upper dielectric layer thickness. ratio is 0.9 ± 0.3.
Bulusun tercih edilen bir diger yapilanmasi, CIE L a* b* renk uzayindaki cam tarafi yansima a* degerinin düsük olmasi, hedeflenen geçirgenlik ve mekanik dayanimi saglamak üzere üst dielektrik katman kalinliginin 20 nm - 25 nm arasinda olmasidir. Another preferred embodiment of the invention is the glass side in the CIE L a* b* color space. Low reflectance a* value, targeted permeability and mechanical strength The thickness of the upper dielectric layer is between 20 nm and 25 nm to provide is that.
Bulusun tercih edilen bir diger yapilanmasi, CIE L a* b* renk uzayindaki cam tarafi yansima a* degerinin düsük olmasi, hedeflenen geçirgenlik ve mekanik dayanimi saglamak üzere üst dielektrik katman kalinligi 7 nm - 18 nm arasinda olmasidir. Another preferred embodiment of the invention is the glass side in the CIE L a* b* color space. Low reflectance a* value, targeted permeability and mechanical strength The thickness of the upper dielectric layer is between 7 nm - 18 nm to provide
Bulusun tercih edilen bir yapilanmasi, kizilötesi yansitici katmanin çekirdeklestirici yapiya dogrudan temas ediyor olmasidir. A preferred embodiment of the invention is the nucleating layer of the infrared reflective layer. it is in direct contact with the structure.
Bulusun tercih edilen bir diger yapilanmasi, bariyer katman olarak NiCrOX içermesidir. Another preferred embodiment of the invention is NiCrOX as the barrier layer. it contains.
Bulusun tercih edilen bir yapilanmasi, üçüncü dielektrik katman ve bir üst dielektrik katmanin SiOXNy veya SiOxlden biri olmasidir. A preferred embodiment of the invention is a third dielectric layer and an upper dielectric. layer is one of SiOXNy or SiOxl.
Yukarida bahsedilen ve asagidaki detayli anlatimdan ortaya çikacak tüm amaçlari gerçeklestirmek üzere mevcut bulus, bulus konusu low-e kaplamali cami elde etmek üzere bir kaplamadir. Buna göre söz konusu bulusun özelligi; TiOX içerikli ikinci dielektrik katmanin, Ag içerikli kizilötesi yansitici katmanin üzerinde konumlanacak sekilde kaplanmasi, Ag içerikli kizilötesi yansitici katmanin kararli yapida olmasini saglamak üzere kizilötesi yansitici katman kaplama gücünün Ag atomlarinin enerjileri, film olusturmak için gereksinim duyulan enerji esigini asacak ve yüzeyle çarpisip yapisal düzeni bozmayacak minimum kinetik enerji ile hizlandirilarak biriktirilecek seviye olmasi, Bariyer katman olan NiCrOX kaplarken kullanilan Ar/Oz gaz oraninin: 4,8 - 5,8 arasinda olmasidir. All the above-mentioned purposes that will emerge from the detailed description below. In order to realize the present invention, the low-e coated glass which is the subject of the invention is obtained. It's a coating to. Accordingly, the feature of the invention in question is; TiOX-containing second dielectric layer, Ag-containing infrared reflective layer coating to be positioned on it, To ensure the stable structure of the infrared reflective layer with the network content The energies of the Ag atoms of the infrared reflective layer covering power, such as will exceed the energy threshold needed to form the film and with minimum kinetic energy that will not collide and disrupt the structural order. to be a level to be accumulated by accelerating, Ar/Oz gas ratio used when coating the barrier layer NiCrOX: 4.8 - 5.8 it is between.
Bulusun tercih edilen bir yapilanmasi, low-e kaplamali cam elde etmek üzere bir kaplama prosesinin; cam üzerine SixNy, SiOxNy_ ZnSnOX, TiOX, TiNx, Zrleden en az birini içeren bir birinci dielektrik katman kaplanmasi, bahsedilen birinci dielektrik katman üzerine NiCr, NiCrOX, TiOx, ZnAIOX, ZnOxlden en az birini içeren 18 nm - 37 nm kalinlik araliginda bir çekirdeklestirici katman kaplanmasi, bahsedilen çekirdeklestirici katman üzerine bir kizilötesi yansitici katman kaplanmasi, bahsedilen kizilötesi yansitici katman üzerine NiCr, NiCrOx, TiOx, ZnAIOX”dan en az birini içeren 0,8 nm - 2,8 nm kalinlik araliginda bir bariyer katman kaplanmasi, bahsedilen bariyer katman üzerine TiOX içerikli ikinci dielektrik katman kaplanmasi, - TiOX içerikli ikinci dielektrik katman (25) üzerine ZnSnOx, ZnAIOX, SiOXNy, SiOX, SiXNy, ZnOx'den en az birini içeren bir üçüncü dielektrik katman ve bir üst dielektrik katman kaplanmasi, basamaklarini içermesidir. A preferred embodiment of the invention is to produce glass with a low-e coating. the coating process; containing at least one of SixNy, SiOxNy_ ZnSnOX, TiOX, TiNx, Zrle on glass coating a first dielectric layer, on the said first dielectric layer, NiCr, NiCrOX, TiOx, ZnAIOX, An 18 nm to 37 nm thickness range containing at least one of ZnOxl. nucleating layer coating, an infrared reflective layer on top of said nucleating layer coating, NiCr, NiCrOx, TiOx, A barrier in the thickness range of 0.8 nm to 2.8 nm containing at least one of ZnAIOX layer coating, a second dielectric layer containing TiOX on the said barrier layer coating, - ZnSnOx, ZnAIOX, SiOXNy on the second dielectric layer (25) containing TiOX, a third dielectric layer containing at least one of SiOX, SiXNy, ZnOx, and a top dielectric layer coating, includes steps.
SEKLIN KISA AÇIKLAMASI Sekil 1' de low-e katman diziliminin genel bir görünümü verilmistir. BRIEF DESCRIPTION OF THE SHAPE A general view of the low-e layer array is given in Figure 1.
SEKILDE VERILEN REFERANS NUMARALARI Cam Low-e kaplama 21 Birinci dielektrik katman 22 Çekirdeklestirici katman 24 Bariyer katman Ikinci dielektrik katman 26 Üçüncü dielektrik katman 27 Ust dielektrik katman BULUSUN DETAYLI AÇIKLAMASI Bu detayli açiklamada bulus konusu low-e kaplamali (20) cam (10) sadece konunun daha iyi anlasilmasina yönelik hiçbir sinirlayici etki olusturmayacak örneklerle açiklanmaktadir. REFERENCE NUMBERS IN THE FOLLOWING Pine Low-e coating 21 First dielectric layer 22 Nucleating layers 24 Barrier layer second dielectric layer 26 Third dielectric layer 27 Upper dielectric layer DETAILED DESCRIPTION OF THE INVENTION In this detailed description, the subject of the invention is the low-e coated (20) glass (10) only shall have no limiting effect on a better understanding of the subject. explained with examples.
Mimari ve otomotive yönelik low-e kaplamali (20) camlarin (10) üretimi “sputtering” (bundan sonra metinde siçratma yöntemi olarak anilacaktir) yöntemi ile gerçeklestirilmektedir. Bu bulus genel olarak; gün isigi geçirgen ve isi yalitim cami (10) olarak kullanilan tek gümüslü low-e kaplamali (20) camlar (10), bahsedilen low-e kaplamanin (20) içerigi ve uygulamasi ile ilgilidir. Production of low-e coated (20) glasses (10) for architectural and automotive “sputtering” (hereinafter referred to as the leap method in the text) is carried out. In general, this invention; daylight permeable and heat insulating mosque The single silver low-e coated (20) glasses (10) used as (10) It relates to the content and application of the low-e coating (20).
Bu bulusta, bir camin (10) yüzeyine uygulanmak üzere hedeflenen seviyede görünür isik geçirgenligine sahip bir low-e kaplamali (20) cam (10) elde edebilmek amaci ile siçratma yöntemi kullanilarak cam (10) yüzeyinde konumlanan çoklu sayida metal, metal oksit ve/veya metal nitrür/oksinitrür katmanlarindan olusan bir low-e kaplama (20) gelistirilmistir. Söz konusu katmanlar sirasi ile birbiri üzerine vakum ortaminda biriktirilmektedir. Bulus konusu low-e kaplamali (20) cam (10) mimari ve otomotiv cami (10) olarak kullanilabilmektedir. In this invention, at the targeted level to be applied to the surface of a glass (10). be able to obtain a low-e coated (20) glass (10) with visible light transmittance The multiplex positioned on the glass (10) surface by using the splash method with the aim of composed of several metal, metal oxide and/or metal nitride/oxynitride layers. The low-e coating (20) has been developed. The layers in question are placed on top of each other in order. collected in a vacuum environment. The subject of the invention is low-e coated (20) glass (10) It can be used as an architectural and automotive mosque (10).
Gerek üretim kolayligi açisindan, gerekse optik özellikleri açisindan ideal low-e kaplama (20) dizilimini gelistirmek üzere deneysel çalismalar neticesinde asagidaki veriler tespit edilmistir. Ideal low-e in terms of both ease of production and optical properties As a result of experimental studies to improve the coating (20) sequence, the following data has been identified.
Bulus konusu low-e kaplamali (20) camda (10) tüm katmanlarin kirma indisleri alinan tek katman ölçümlerinden elde edilen optik sabitler üzerinden hesaplamali yöntemler kullanilarak belirlenmistir. Söz konusu kirma indisleri 550 nmldeki kirma indisi verileridir. The refractive indices of all layers in the inventive low-e coated (20) glass (10) computational based on optical constants from single layer measurements taken determined using methods. The said refractive indices are at 550 nml. index data.
Bulus konusu low-e kaplamada (20) görünür bölgeyi hedeflenen düzeyde geçirip, kizilötesi spektrumda isil radyasyonu yansitmayi (daha az geçirerek) saglayan bir kizilötesi yansitici katmandir (23). Kizilötesi yansitici katman (23) Ag içermektedir ve isi yayinimi düsüktür. Hedeflenen performans degerine ulasabilmek için Ag içeren kizilötesi yansitici katman (23) kalinligi oldukça önemlidir. Ag içeren kizilötesi yansitici katman (23) kalinligi tercih edilen uygulamada 12 nm - 26 nm arasindadir. Daha tercih edilen uygulamada Ag içeren kizilötesi yansitici katman (23) kalinligi 14 nm - 24 nm araligindadir. En tercihen Ag içeren kizilötesi yansitici katman (23) kalinligi 16 nm - 22 nm araligindadir. In the low-e coating (20), the subject of the invention passes the visible region at the targeted level, A device that allows to reflect (less pass) thermal radiation in the infrared spectrum. is the infrared reflective layer (23). Infrared reflective layer (23) contains Ag and the heat dissipation is low. In order to reach the targeted performance value, the Network The thickness of the infrared reflective layer (23) containing it is very important. Ag-containing Infrared reflective layer (23) thickness is 12 nm - 26 nm in preferred application are in between. In a more preferred embodiment, an infrared reflective layer containing Ag (23) thickness ranges from 14 nm to 24 nm. Infrared reflector, most preferably Ag containing layer 23 thickness ranges from 16 nm to 22 nm.
Bulus konusu kaplamada cama (10) temas edecek sekilde en alt katman olarak bir birinci dielektrik katman (21) kullanilmaktadir. Bahsedilen birinci dielektrik katman (21) SiXNy, SIOXNy' ZnSnOX, TiOx, TiNx, ZrNX katmanlarindan en az birini içermektedir. Bulusun bir uygulamasinda birinci dielektrik katman (21) SiXNy içermektedir. Bulusun bir diger uygulamasinda birinci dielektrik katman (21) SiOXNy içermektedir. SIXNy içeren birinci dielektrik katmanin (21) kirma indisi için degisim araligi 2,00 ile 2,10 arasindadir. Tercih edilen yapida SIXNy içeren birinci dielektrik katmanin (21) kirma indisi için degisim araligi 2,04 ile 2,07 arasindadir. In the coating subject of the invention, a layer is formed as the bottom layer in contact with the glass (10). first dielectric layer (21) is used. Said first dielectric layer (21) At least one of the SiXNy, SIOXNy' ZnSnOX, TiOx, TiNx, ZrNX layers contains. In one embodiment of the invention, the first dielectric layer (21) SiXNy contains. In another embodiment of the invention, the first dielectric layer (21) is SiOXNy contains. Variation for the refractive index of the first dielectric layer (21) containing SIXNy the range is between 2.00 and 2.10. First dielectric containing SIXNy in the preferred structure The variation range for the refractive index of the layer (21) is between 2.04 and 2.07.
Birinci dielektrik katman (21) olarak SIXNy içeren dielektrik katman kullanildiginda kalinligi 5 nm - 18 nm arasindadir. Tercih edilen uygulamada SIXNy içeren birinci dielektrik katman kalinligi 7 nm - 16 nm arasindadir. Daha da tercih edilen uygulamada SIXNy içeren birinci dielektrik katman kalinligi 8 nm - 14 nm 'dir. Birinci dielektrik katman (21) olarak SiOXNy içeren birinci dielektrik katman kullanildiginda kalinligi 11 nm - 27 nm arasindadir. Tercih edilen uygulamada SIOXN.y içeren birinci dielektrik katman kalinligi 13 nm - 25 nm arasindadir. Daha da tercih edilen uygulamada SIOXNy içeren birinci dielektrik katman kalinligi 15 nm - 23 nm 'dir. When using the dielectric layer containing SIXNy as the first dielectric layer (21) Its thickness is between 5 nm - 18 nm. In the preferred embodiment, the first containing SIXNy The dielectric layer thickness is between 7 nm - 16 nm. Even more preferred In practice, the thickness of the first dielectric layer containing SIXNy is 8 nm - 14 nm. First When using the first dielectric layer containing SiOXNy as the dielectric layer (21) Its thickness is between 11 nm - 27 nm. In the preferred embodiment, the first containing SIOXN.y The dielectric layer thickness is between 13 nm - 25 nm. Even more preferred In practice, the thickness of the first dielectric layer containing SIOXNy is 15 nm - 23 nm.
SixNy içeren birinci dielektrik katman (21) ile Ag içeren kizilötesi yansitici katman (23) arasinda en az bir çekirdeklestirici katman (22) konumlanmaktadir. Bulusun bir uygulamasinda çekirdeklestirici katman (22) SiXNy içeren birinci dielektrik katman (21) ile dogrudan temas etmektedir. Çekirdeklestirici katman (22) NiCr, NiCrOx, TiOx, ZnAIOX, ZnOx'den en az birini içermektedir. Tercih edilen uygulamada çekirdeklestirici katman (22) ZnAIOX içermektedir. Çekirdeklestirici katman (22) kalinligi 18 nm - 37 nm arasindadir. Tercih edilen uygulamada çekirdeklestirici katman (22) kalinligi 20 nm - 35 nm arasindadir. Daha da tercih edilen uygulamada çekirdeklestirici katman (22) kalinligi 22 nm - 33 nm arasindadir. Böyle bir kalinlik kullanimi sayesinde ZnAIOX içeren çekirdeklestirici katman (22), birinci dielektrik katmanin (21) sodyum bariyeri görevine katki saglamaktadir. ZnAIOX içeren çekirdeklestirici katmanin (22) belirtilen kalinlik degerlerinde kullanilmasi ile ayni zamanda katmanin kristallenmesi artirilmakta ve böylece 'üzerindeki kizilötesi yansitici katman (23) için iyi bir alt katman /taban saglanmaktadir. Bununla birlikte hedeflenen renk ve optik degerlerinin elde edilmesine katki saglamaktadir. First dielectric layer (21) containing SixNy and infrared reflective layer containing Ag Between (23) at least one nucleating layer (22) is positioned. find one first dielectric layer containing nucleating layer (22) SiXNy (21) is in direct contact with. Nucleating layer (22) NiCr, NiCrOx, TiOx contains at least one of ZnAIOX, ZnOx. In preferred application The nucleating layer 22 includes ZnAIOX. Nucleating layer (22) Its thickness is between 18 nm - 37 nm. In the preferred embodiment, the nucleator layer 22 has a thickness of 20 nm to 35 nm. In the more preferred application The nucleating layer 22 has a thickness of 22 nm to 33 nm. Such a thickness The nucleating layer (22) containing ZnAIOX is the first dielectric contributes to the sodium barrier function of the layer (21). containing ZnAIOX same as using the nucleating layer (22) at the specified thickness values. At the same time, the crystallization of the layer is increased and thus the 'infrared' on A good substrate/base is provided for the reflective layer (23). With this It contributes to the attainment of the targeted color and optical values.
Ag içeren kizilötesi yansitici katmanin (23) 'üzerinde bir bariyer katman (24) konumlanmaktadir. Bariyer katman (24) olarak NiCr, NiCrOx, TiOX, ZnAIOX katmanlarindan en az biri kullanilmaktadir. Tercih edilen uygulamada bariyer katman (24) NiCrOX içermektedir. NiCrOX içeren bariyer katman (24) kalinligi 0,8 nm - 2,8 nm araligindadir. Tercih edilen uygulamada NiCrOX içeren bariyer katman (24) kalinligi 1,0 nm - 2,6 nm araligindadir. Daha da tercih edilen uygulamada NiCrOX içeren bariyer katman (24) kalinligi 1,2 nm - 2,4 nm arasindadir. A barrier layer (24) 'on top of the infrared reflective layer (23) containing Ag is located. NiCr, NiCrOx, TiOX, ZnAIOX as barrier layer (24) at least one of the layers is used. Barrier in preferred application layer (24) contains NiCrOX. Barrier layer (24) containing NiCrOX thickness 0.8 It ranges from nm to 2.8 nm. Barrier layer containing NiCrOX in preferred embodiment (24) thickness ranges from 1.0 nm to 2.6 nm. In the more preferred application The thickness of the barrier layer (24) containing NiCrOX is between 1.2 nm - 2.4 nm.
NiCrOX içeren bariyer katmani (24); Ag içeren kizilötesi yansitici katmanin (23), sonrasinda yer alan katmanlardan ve bu katmanlarin üretimi için kullanilan proses gazlarindan etkilenmemesi için kullanilmaktadir. Ayni zamanda NiCrOX içeren bariyer katmani (24), Ag içeren kizilötesi yansitici katmanindan (23) sonra gelecek dielektrik katmanlar arasindaki metalik ve dielektrik geçisinde yapisal uyumu saglamaktadir. NiCrOX içeren bariyer katmanin (24) kaplanmasi esnasinda Ag içeren kizilötesi yansitici katmanin (23) ortam gazindan en az seviyede etkilenmesi için reaktif gaz olarak kullanilan 02 miktari optimize edilmistir. Ayrica Ag içeren kizilötesi yansitici katmanin (23) reaktif 02 gazindan en az seviyede etkilenmesini saglamak için target altindan geçis hizi da optimize edilmistir. barrier layer (24) containing NiCrOX; Infrared reflective layer (23) containing Ag, from the layers after and the process used for the production of these layers It is used in order not to be affected by the gases. It also contains NiCrOX the barrier layer (24) will come after the infrared reflective layer (23) containing Ag Structural compatibility in metallic and dielectric transition between dielectric layers it provides. Ag during coating of the barrier layer (24) containing NiCrOX The infrared reflective layer (23) containing the minimum exposure to the ambient gas The amount of 02 used as reactive gas has been optimized for Also contains Ag The infrared reflective layer (23) is minimally affected by the reactive 02 gas. The pass speed under the target has also been optimized to ensure
Metalik bir bariyer katman (24) kullanilmasi kaplamanin geçirgenligini düsürmekte ve buna bagli olarak da toplam günes enerjisi geçirgenligi degeri düsmektedir. Bu nedenle bariyer katman (24) olarak NiCr degil NiCrOX tercih edilmektedir. Ancak NiCrOX içerisindeki oksijen miktari ve NiCrOX kaplarken kullanilan reaktif gaz miktari, Ag içeren kizilötesi yansitici katmanin (23) oksitlenmesine neden olmayacak düzeydedir. NiCrOX içeren bariyer katman (24) kaplanirken 2,5 x1O'3 - 4,5 X1 O'3 mbar basinç rejiminde kullanilan Ar/Oz gaz orani 4,8 - 5,8 arasindadir. Bu sayede geçirgenlik/g'ünes enerjisi geçirgenligi orani optimum bir sekilde ayarlanabilmektedir. The use of a metallic barrier layer (24) reduces the permeability of the coating. and accordingly, the total solar energy permeability value decreases. This Therefore, NiCrOX rather than NiCr is preferred as the barrier layer (24). However The amount of oxygen in NiCrOX and the reactive gas used when coating NiCrOX amount causes oxidation of the infrared reflective layer (23) containing Ag. will not be at a level. While the barrier layer (24) containing NiCrOX is coated, 2.5 x1O'3 - The Ar/Oz gas ratio used in the 4.5 X1 O'3 mbar pressure regime is between 4.8 - 5.8. This In this way, the transmittance/solar energy transmittance ratio is optimum. can be adjusted.
Oksijenin bu düzeyden az kullanilmasi durumunda bariyer katman (24) kismen oksitlenmekte ve oksijen miktari azaldikça metalik yapiya dönmektedir. Oksijenin bu düzeyden fazla olmasi durumunda ise bariyer katman (24) oksit yapida elde edilmekte ancak bariyer katmanin (24) altinda konumlanan Ag içeren kizilötesi yansitici katman (23) da oksijenden etkilenmekte ve dolayisi ile safsizlik düzeyinde bile olsa saf metalik katman özelligini yitirdiginden Ag içeren kizilötesi yansitici katmanin (23) elektriksel özellikleri zayiflamaktadir. If the oxygen is used less than this level, the barrier layer (24) is partially It oxidizes and turns into metallic structure as the amount of oxygen decreases. Oxygen If it is more than this level, the barrier layer (24) is obtained in oxide structure. However, the Ag-containing infrared IR located below the barrier layer (24). The reflective layer (23) is also affected by oxygen and therefore at the level of impurity. Infrared reflector containing Ag, since the pure metallic layer loses its properties, even if the electrical properties of the layer (23) weaken.
NiCrOX içeren bariyer katman (24) 'üzerinde bir ikinci dielektrik katman (25) konumlanmaktadir. Bahsedilen ikinci dielektrik katman (25) ZnSnOX, ZnAlOx, SiOxNy, SIOX, SixNy, TiOx, ZnOX'den en az birini içermektedir. Tercih edilen uygulamada ikinci dielektrik katman (25) TiOX içermektedir. TiOX içeren ikinci dielektrik katman (25) kalinligi 12 nm - 26 nm araligindadir. Tercih edilen uygulamada TiOX içeren ikinci dielektrik katman (25) kalinligi 14 nm - 24 nm araligindadir. Daha da tercih edilen uygulamada TiOX içeren ikinci dielektrik katman (25) kalinligi 16 nm - 22 nm arasindadir. Belirtilen kalinlik degerinin altinda her ne kadar low-e kaplamali (20) camin (10) geçirgenlik performans degerleri degismese de renk performansinda ciddi degismeler görülmektedir. Uzerinde olmasi durumunda ise low-e kaplamali (20) camin (10) renk degerlerinden “Tb” degeri pozitif bölgeye yani sari renk bölgesine geçmekte ve yansima artmaktadir. Görünür bölge toplam geçirgenligi (%Tvis) azalmakta ve bu da hedeflenen performanstan uzaklasmaya neden olmaktadir. A second dielectric layer (25) on the barrier layer (24) containing NiCrOX is located. Said second dielectric layer (25) is ZnSnOX, ZnAlOx, Contains at least one of SiOxNy, SIOX, SixNy, TiOx, ZnOX. Preferred in practice, the second dielectric layer (25) comprises TiOX. The second containing TiOX The thickness of the dielectric layer (25) is in the range of 12 nm - 26 nm. Preferred in practice, the thickness of the second dielectric layer (25) containing TiOX is 14 nm - 24 nm is in the range. In a more preferred embodiment, the second dielectric layer containing TiOX (25) thickness is between 16 nm - 22 nm. Anything below the specified thickness value If the transmittance performance values of the low-e coated (20) glass (10) do not change, There are also serious changes in color performance. to be on In the case of low-e coated (20) glass (10), the “Tb” value is one of the color values. it passes to the positive region, that is, the yellow color region, and the reflection increases. Visible the region total permeability (%Tvis) decreases, which results in less than the targeted performance. causes distancing.
TiOX içeren ikinci dielektrik katmaninin (25); cam (10) ve Ag içeren kizilötesi yansitici katmani (23) arasinda yani Ag içeren kizilötesi yansitici katmanin (23) altinda konumlanmasi veya Ag içeren kizilötesi yansitici katmanin (23) 'üzerinde konumlanmasi, optik performans açisindan fark yaratmaktadir. TiOX içeren ikinci dielektrik katmanin (25) Ag içeren kizilötesi yansitici katmaninin (23) 'üzerinde kullanilmasi ile renk degerlerinden cam tarafi yansima a* degeri azaltilmis ve böylece cam tarafi yansimada kirmizi renk baskinligi azaltilmistir. Ayrica bu sayede cam ve kaplama tarafi yansima renk degerlerinde de kirmizi renk bölgesine geçis önlenmektedir. TiOX içeren ikinci dielektrik katmanin (25), Ag içeren kizilötesi yansitici katmaninin (23) 'üzerinde kullanilmasi ile kaplama tarafi ve cam tarafi yansima b* degerleri negatif bölgede kalmaktadir. Böylece low-e kaplama (20) hedeflenen nötral renk degerlerine sahip olmaktadir. the second dielectric layer (25) containing TiOX; infrared with glass (10) and Ag between the reflective layer (23) i.e. the infrared reflective layer (23) containing the Ag. positioned below or 'on' the infrared reflective layer (23) containing Ag. positioning makes a difference in terms of optical performance. The second containing TiOX 'on top of the infrared reflective layer (23) containing Ag of the dielectric layer (25) With the use of glass side reflection a* value from color values has been reduced and Thus, the red color dominance is reduced in the reflection of the glass side. Also this In this way, the reflection color values of the glass and coating side are also in the red color zone. transition is prevented. The second dielectric layer (25) containing TiOX is irradiated with Ag. coating side and glass side by using reflective layer (23) on ' reflectance b* values remain in the negative region. Thus low-e coating (20) It has targeted neutral color values.
Bulus konusu dizilimde TiOX içeren ikinci dielektrik katmanin (25), Ag içeren kizilötesi yansitici katmani (23) 'üzerinde kullanilmasi ile ayni zamanda low-e kaplamali (20) camdaki (10) optik performanslarda düsük yansimali bir cam (10) elde edilebilmektedir. Low-e kaplama (20) diziliminde TiOX içeren ikinci dielektrik katmanin (25), Ag içeren kizilötesi yansitici katmaninin (23) üzerinde kullanilmasi optik performans açisindan bir zorunluluktur. TiOX içeren ikinci dielektrik katmanin (25) belirtilen konum ve kalinlik araliginda kullanilmamasi, low-e kaplamada (20) hedeflenen görünür bölge geçirgenlik degerinin elde edilememesine sebep olmaktadir. In the inventive array, the second dielectric layer (25) containing TiOX is Low-e at the same time using on the infrared reflective layer (23') a glass (10) with low reflection in optical performances in coated (20) glass (10) can be obtained. Second dielectric containing TiOX in the Low-e coating (20) array using layer (25) above infrared reflective layer (23) containing Ag It is a must for optical performance. The second dielectric layer containing TiOX (25) not used in the specified location and thickness range, in low-e coating (20) cause the target visible region transmittance value to not be achieved. is happening.
Tablo 1'de TiOX içeren ikinci dielektrik katmanin (25) farkli kalinlik ve konumlarda bulunmasi ile degisen optik performans degerleri verilmektedir. In Table 1, the second dielectric layer (25) containing TiOX has different thicknesses and positions. Optical performance values that change with the presence of
Tablo 1: Farkli TiOx kalinlik ve pozisyonlarina g'öre optik performanslar yansima) (içe yansima) (disa yansima) Tiox in cam katmani yansima) arasinda a,, durumunda yansima) (cam tarafi 8,3 7 5,9 5,1 4,5 yansima) yansima) (içe yansima) (disa yansima) katmani yansima) durumunda yansima) yansima) Tablo 1'den de görüldügü üzere yapilan çalismalar sonucunda belirtilen kalinlik araliklarindaki TiOX içeren ikinci dielektrik katmaninin (25), Ag içeren kizilötesi yansitici katmani (23) üzerinde konumlanmasi optik performanslar açisindan önemli etkiye sahip oldugu ölçümlenmistir. Table 1: Optical performances according to different TiOx thicknesses and positions reflection) (reflection) (outside reflection) Tiox in glass layer reflection) between a, in case of reflection) (glass side 8.3 7 5.9 5.1 4.5 reflection) reflection) (reflection) (outside reflection) layer reflection) in case of reflection) reflection) As can be seen from Table 1, the thickness specified as a result of the studies carried out The second dielectric layer (25) containing TiOX in the range of Its positioning on the reflective layer (23) is beneficial in terms of optical performances. has been found to have a significant impact.
TiOX içeren ikinci dielektrik katmani (25) üzerinde bir üçüncü dielektrik katman (26) konumlanmaktadir. Bahsedilen üçüncü dielektrik katman (26) ZnSnOX, ZnAlOX, SiOxNy, SIOX, SixNy, TiOX, ZnOX'den en az birini içermektedir. Tercih edilen uygulamada üçüncü dielektrik katman (26) SiOXNy içermektedir. A third dielectric layer (26) on top of the second dielectric layer (25) containing TiOX is located. The third dielectric layer (26) mentioned is ZnSnOX, ZnAlOX, Contains at least one of SiOxNy, SIOX, SixNy, TiOX, ZnOX. Preferred in practice, the third dielectric layer (26) contains SiOXNy.
SiOXNy içeren üçüncü dielektrik katman (26) üzerinde bir üst dielektrik katman (27) konumlanmaktadir. Ust dielektrik katman (27) ZnSnOx, ZnAIOx, SiOxNy, SIOX, SixNy, TiOX, ZnOX'den en az birini içermektedir. Tercih edilen uygulamada üst dielektrik Son iki katmani olusturan SiOXNy içeren üçüncü dielektrik katman (26) ve SiOX içeren üst dielektrik katman (27) birbirleri ile iyi bir yapisma davranisi göstermektedir. Birinci dielektrik katman (21) olarak SiXNy kullanildigi durumlarda üçüncü dielektrik katman (26) ve üst dielektrik katman (27) toplam kalinligi 28 nm - 50 nm araliginda olacak sekilde hedeflenen performansa ulasmak üzere üçüncü dielektrik katman (26) kalinliginin üst dielektrik katman (27) kalinligina orani 0,9 ± 0,3, dür. Tercih edilen uygulamada birinci dielektrik katman (21) olarak SIXNy kullanildigi durumlarda üçüncü dielektrik katman (26) ve üst dielektrik katman (27) toplam kalinligi 28 nm - 50 nm arasindadir. A top dielectric layer (27) on the third dielectric layer (26) containing SiOXNy is located. Upper dielectric layer (27) ZnSnOx, ZnAIOx, SiOxNy, SIOX, SixNy, TiOX contains at least one of ZnOX. Top dielectric in preferred application The third dielectric layer (26) containing SiOXNy forming the last two layers and SiOX The upper dielectric layer (27) containing shows. In cases where SiXNy is used as the first dielectric layer (21) total thickness of the third dielectric layer (26) and the upper dielectric layer (27) 28 nm - To reach the targeted performance, which will be in the 50 nm range, the third the ratio of the thickness of the dielectric layer (26) to the thickness of the upper dielectric layer (27) is 0.9 ± It is 0.3. In the preferred embodiment, SIXNy is used as the first dielectric layer (21). third dielectric layer (26) and upper dielectric layer (27) when used its total thickness is between 28 nm - 50 nm.
Birinci dielektrik katman (21) olarak SiXNy kullanildigi durumlarda, SiOX içeren üst dielektrik katman (27) kalinligi 15 nm - 28 nm arasindadir. Tercihen birinci dielektrik katman (21) olarak SIXNy kullanildigi durumlarda SiOX içeren üst dielektrik katman (27) kalinligi 17 nm - 26 nm arasindadir. Kalinliklarin bu degerlerden daha düsük olmasi durumunda hedeflenen optik performansa erisim saglanamamakta, low-e kaplamanin (20) mekanik dayanimi azalmakta ve kaplama tarafi yansima a* degeri artmakta yani ürünün uygulama rengi istenmeyen kirmizi renk bölgesine geçmektedir. Yüksek olmasi durumunda ise görünür bölge toplam geçirgenligi (%Tvis) azalmakta ve hedeflenen optik performansa erisilememektedir. In cases where SiXNy is used as the first dielectric layer (21), the SiOX-containing upper The thickness of the dielectric layer 27 is between 15 nm and 28 nm. Preferably first dielectric In cases where SIXNy is used as layer (21) the top dielectric layer containing SiOX (27) thickness is between 17 nm - 26 nm. Thicknesses are lower than these values In case of failure, the targeted optical performance cannot be reached, low-e The mechanical strength of the coating (20) decreases and the reflection a* value of the coating side decreases. increases, that is, the application color of the product increases to the undesirable red color zone. passes. If it is high, the visible region total transmittance (%Tvis) decreases and the targeted optical performance cannot be reached.
Birinci dielektrik katman (21) olarak SIOXNy kullanildigi durumlarda, hedeflenen performansa ulasmak üzere, cam tarafi yansima a* degerinin artarak low-e kaplama (20) renginin kirmizi renk bölgesine geçisini önlemek amaci ile üçüncü dielektrik katman (26) ve üst dielektrik katman (27) toplam kalinligi 35 nm - 50 nm araliginda olacak sekilde, üçüncü dielektrik katman (26) kalinliginin üst dielektrik katman (27) kalinligina orani 2,09 ± O,5”dir. Tercih edilen uygulamada birinci dielektrik katman (21) olarak SiOXNy kullanildigi durumlarda üçüncü dielektrik katman (26) ve üst dielektrik katman (27) toplam kalinligi 35 nm - 50 nm arasindadir. Ayrica üçüncü dielektrik katman (26) ve üst dielektrik katmanlarinin (27) birlikte kullanilmasi ve oksit yapida olmasi low-e kaplamanin (20) mekanik dayanimi arttirmaktadir. In cases where SIOXNy is used as the first dielectric layer (21), the targeted to reach low-e performance, the glass side reflection a* value is increased by increasing in order to prevent the transition of the coating (20) color to the red color region, the third dielectric layer (26) and upper dielectric layer (27) total thickness 35 nm - 50 nm the upper dielectric layer (26) thickness of the third dielectric layer (26) the ratio of layer (27) to thickness is 2.09 ± 0.5”. In the preferred embodiment, the first In cases where SiOXNy is used as the dielectric layer (21), the third dielectric layer (26) and top dielectric layer (27) total thickness 35 nm - 50 nm are in between. In addition, the third dielectric layer (26) and the upper dielectric layers (27) being used together and having an oxide structure make low-e coating (20) mechanical increases endurance.
Birinci dielektrik katman (21) olarak SiOXNy kullanildigi durumlarda SiOX içeren üst dielektrik katman (27) kalinligi 7 nm - 18 nm arasindadir. Tercihen birinci dielektrik katman (21) olarak SiOxNy kullanildigi durumlarda SiOX içeren üst dielektrik katman (27) kalinligi 9 nm - 16 nm arasindadir. SiOX içeren üst dielektrik katman (27) kalinliginin bu degerlerden daha düsük olmasi durumunda hedeflenen optik performansa erisim saglanamamakta, mekanik dayanimi azalmakta ve kaplama tarafi yansima a* degeri artmakta yani low-e kaplamanin (20) rengi istenmeyen kirmizi renk bölgesine geçmektedir. Yüksek olmasi durumunda ise görünür bölge toplam geçirgenligi (%Tvis) azalmakta ve hedeflenen optik performansa erisilememektedir. In cases where SiOXNy is used as the first dielectric layer (21), the top layer containing SiOX The thickness of the dielectric layer 27 is between 7 nm and 18 nm. Preferably first dielectric In cases where SiOxNy is used as layer (21) the upper dielectric layer containing SiOX (27) thickness is between 9 nm - 16 nm. Top dielectric layer (27) containing SiOX If the thickness is lower than these values, the targeted optical performance cannot be achieved, its mechanical strength decreases and the coating side reflection a* value increases, so the color of the low-e coating (20) is undesirable. passes into the red color region. If it is high, the visible region The overall transmittance (%Tvis) decreases and the targeted optical performance is not reached. not accessible.
Low-e kaplamada (20) yukarida anlatilanlar isiginda Ag içeren kizilötesi yansitici katmaninin (23) reaktif 02 gazindan etkilenmemesi için NiCrOX içeren bariyer katmanin (24) kaplama sartlarinin optimize edilmesi ve Ag içeren kizilötesi yansitici katmaninin (23) ZnAIOX içeren çekirdeklestirici katmanin (22) üzerinde kaplanmasi gerekmektedir. Infrared reflector containing Ag in the light of the above-described in low-e coating (20) barrier containing NiCrOX so that the layer (23) is not affected by the reactive 02 gas optimizing the coating conditions of the layer (24) and infrared reflector containing Ag. layer (23) on top of the nucleating layer (22) containing ZnAIOX required.
Bulusun koruma kapsami ekte verilen istemlerde belirtilmis olup kesinlikle bu detayli anlatimda örnekleme amaciyla anlatilanlarla sinirli tutulamaz. Zira teknikte uzman bir kisinin, bulusun ana temasindan ayrilmadan yukarida anlatilanlar isiginda benzer yapilanmalar ortaya koyabilecegi açiktir. The scope of protection of the invention is stated in the appended claims and it is absolutely detailed explanation cannot be limited to what is told for the purpose of illustration. Because in technique what has been described above by a specialist without departing from the main theme of the invention It is clear that similar structuring can occur in the light of this.
Claims (1)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TR2018/01333A TR201801333A2 (en) | 2018-01-31 | 2018-01-31 | A HIGH TEMPERATURE CONTROLLED LOW-E COATED GLASS |
| PCT/TR2018/050677 WO2019190420A2 (en) | 2018-01-31 | 2018-11-10 | Low-e coated glass with high temperature control |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TR2018/01333A TR201801333A2 (en) | 2018-01-31 | 2018-01-31 | A HIGH TEMPERATURE CONTROLLED LOW-E COATED GLASS |
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| TR201801333A2 true TR201801333A2 (en) | 2018-02-21 |
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| TR2018/01333A TR201801333A2 (en) | 2018-01-31 | 2018-01-31 | A HIGH TEMPERATURE CONTROLLED LOW-E COATED GLASS |
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| WO (1) | WO2019190420A2 (en) |
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| CN115259689B (en) * | 2022-06-24 | 2023-09-26 | 信义节能玻璃（芜湖）有限公司 | High-transmittance, high-efficiency, energy-saving and low-radiation three-silver coated glass |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| US6586102B1 (en) * | 2001-11-30 | 2003-07-01 | Guardian Industries Corp. | Coated article with anti-reflective layer(s) system |
| US7390572B2 (en) * | 2004-11-05 | 2008-06-24 | Centre Luxembourgeois De Recherches Pour Le Verre Et La Ceramique S.A. (C.R.V.C.) | Coated article with IR reflecting layer(s) and method of making same |
| US8815420B2 (en) * | 2010-09-17 | 2014-08-26 | Guardian Industries Corp. | Coated article having zinc oxide seed layer with reduced stress under functional layer and method of making the same |
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| WO2019190420A2 (en) | 2019-10-03 |
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