TH8123EX - Methods for deposition of polysilane vapor - Google Patents

Abstract

Revealed a process for forming films containing polysilane mixtures on substrate. The film is formed by directly deposition of the vapor on the substrate, thus avoiding the difficult process commonly faced in the preparation and application of polysilicon by conventional spinning techniques. This film is used in the lithography process for rendering images on the substrate.

Claims (2)

1. a process for inducing a film on a support material, consisting of exposing the substrate to the vapor Silane monomers that can be polymerized under such conditions To accumulate films containing polysilane mixtures on such supports 2. Process of claim 1 in which silane monomer It can be polymerized as follows: There is a formula (chemical formula) where R is H, C1-C4 alkyl, calkyline, alkyline, alkyl or alkyl. Cilil; Ariel; Or amino; R 'is H, C1-C4 alkyl, alkyl, alkyl, alkyl, alkyl, alkyl, or alkylcylcyl; Ariel;