SU815074A1

SU815074A1 - Method of producing indium coatings

Info

Publication number: SU815074A1
Application number: SU782685857A
Authority: SU
Inventors: Виталий Анатольевич Смирнов; Людмила Георгиевна Дубовицкая; Владимир Сергеевич Дмитриев
Original assignee: Институт физики твердого тела АН СССР
Priority date: 1978-11-15
Filing date: 1978-11-15
Publication date: 1981-03-25

Description

Изобретение относится к способам, покрытия материалов металлами путем · обработки поверхности растворами соединений металлов и может быть использовано для покрытия поверхности изделий металлическим индием.The invention relates to methods for coating materials with metals by · surface treatment with solutions of metal compounds and can be used to coat the surface of products with metallic indium.

Известен способ получения индиевых покрытий на токопроводящих подложках (стали) путем погружения подложки в кислый раствор, содержащий хлористый индий и хлористый аммоний [1 ]. ,A known method of producing indium coatings on conductive substrates (steel) by immersing the substrate in an acidic solution containing indium chloride and ammonium chloride [1]. ,

Однако известным способом получа-* ют индиевые покрытия только на металлических подложках.However, indium coatings are prepared in a known manner only on metal substrates.

Цель изобретения - расширение ассортимента'покрываемых индием материалов .The purpose of the invention is the expansion of the range of materials covered by indium.

Поставленная цель достигается тем, что используют раствор, содержа- 20 щий нитрат одновалентного индия и фторид аммония соответственно в качестве соли индия и галогенида щелочного металла, при pH =? 2,5-3,5.The goal is achieved by using a solution containing 20 monovalent indium nitrate and ammonium fluoride, respectively, as the indium salt and alkali metal halide, at pH =? 2.5-3.5.

Способ осуществляют следующим образом.The method is as follows.

Пример 1. Готовят 1 М раствор нитрат аммония в воде подкисленной до pH 2,5 0,1 н. азотной кислотой. В полученном растворе растворя3 тропроводности^ температуры плавле- крываемых материалов, процесс ведут ния и смачиваемости поверхности. при pH = 2,5-3,5 в растворе, содержащем в качестве соли индия и галогенида щелочного металла соответст-Example 1. Prepare a 1 M solution of ammonium nitrate in acidified water to a pH of 2.5 to 0.1 N. nitric acid. In the resulting solution, dissolving 3 conductivities ^ temperatures of melted materials, the process of leading and wettability of the surface. at pH = 2.5-3.5 in a solution containing, as the indium salt and alkali metal halide,

Claims

The invention relates to methods of coating materials with metals by treating the surface with solutions of metal compounds and can be used to coat the surface of products with indium metal. However, indium coatings are obtained in a known manner only on metallic substrates. The purpose of the invention is to expand the range of materials covered by indium. This goal is achieved by using a solution containing monovalent indium nitrate and ammonium fluoride, respectively, as an salt of indium and an alkali metal halide, at a pH of 2.5-3.5. The method is carried out as follows. Example 1. Prepare a 1 M solution of ammonium nitrate in water, acidified to pH 2.5 with 0.1 n. nitric acid. In the resulting solution, the solution of UT with stirring is powdered indium monochloride in an amount of the corresponding concentration of 1.5. Separately, a 0.5 M ammonium fluoride solution is prepared. A glass plate was immersed in the indium solution and an ammonium fluoride solution was added in a 1: 1 ratio. Keep the plate in solution for 10 minutes. During coating, the solution is not stirred. Then the plate is removed from the solution, washed with distilled water and dried. The surface of the glass is. covered with a mirror indium film, the thickness of which is equal to 70 nm. Example

2. To 250 mm1 M solution of g1mmonium, 4.5 ml 0.1 N are poured. NMO (to pH 3.5) and dissolve 0.55 indium monochloride. To the resulting solution was added 200 ml of a 0.5 M NH4F solution. Immediately immerse the plastic and teflon film. For 15 minutes, the films are coated with a layer of indium metal 40-50 nm thick. Thus, the proposed method allows indium coatings to be applied to water-insoluble materials, irrespective of their electrical conductivity, the melting point and the wettability of the surface. The invention method for producing indium coatings by immersing a substrate in an acidic solution containing an indium salt and an alkali metal halide, characterized in that in order to expand the range of 0744 coated materials, the process is carried out at a pH of 2.5-3.5 in solution containing salt indium and alkali metal halide, respectively, nitrate of single-stage indium and ammonium fluoride. Sources of information taken into account in the "examination 1. Yampolsky A.M. Electrolytic deposition of noble and rare metals. Leningrad, Mashino building, 1977, p. 74.