SU399576A1 - - Google Patents
Info
- Publication number
- SU399576A1 SU399576A1 SU1617421A SU1617421A SU399576A1 SU 399576 A1 SU399576 A1 SU 399576A1 SU 1617421 A SU1617421 A SU 1617421A SU 1617421 A SU1617421 A SU 1617421A SU 399576 A1 SU399576 A1 SU 399576A1
- Authority
- SU
- USSR - Soviet Union
- Prior art keywords
- copper
- electrolyte
- sulfuric acid
- leveling
- quality
- Prior art date
Links
- 239000003792 electrolyte Substances 0.000 description 10
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 8
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 8
- 229910052802 copper Inorganic materials 0.000 description 8
- 239000010949 copper Substances 0.000 description 8
- 239000000654 additive Substances 0.000 description 7
- 230000000996 additive effect Effects 0.000 description 7
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 7
- 229910000365 copper sulfate Inorganic materials 0.000 description 4
- 238000000576 coating method Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- XTEGARKTQYYJKE-UHFFFAOYSA-M Chlorate Chemical compound [O-]Cl(=O)=O XTEGARKTQYYJKE-UHFFFAOYSA-M 0.000 description 2
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 2
- 239000013256 coordination polymer Substances 0.000 description 2
- 238000004965 Hartree-Fock calculation Methods 0.000 description 1
- AFBPFSWMIHJQDM-UHFFFAOYSA-N N-methylaniline Chemical compound CNC1=CC=CC=C1 AFBPFSWMIHJQDM-UHFFFAOYSA-N 0.000 description 1
- 241001481789 Rupicapra Species 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- IEJJMHVZBYLUCS-UHFFFAOYSA-N copper sulfuric acid Chemical compound [Cu].S(O)(O)(=O)=O.S(O)(O)(=O)=O IEJJMHVZBYLUCS-UHFFFAOYSA-N 0.000 description 1
- UGWKCNDTYUOTQZ-UHFFFAOYSA-N copper;sulfuric acid Chemical compound [Cu].OS(O)(=O)=O UGWKCNDTYUOTQZ-UHFFFAOYSA-N 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000010802 sludge Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
Landscapes
- Electroplating And Plating Baths Therefor (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| SU1617421A SU399576A1 (enrdf_load_stackoverflow) | 1971-01-26 | 1971-01-26 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| SU1617421A SU399576A1 (enrdf_load_stackoverflow) | 1971-01-26 | 1971-01-26 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SU399576A1 true SU399576A1 (enrdf_load_stackoverflow) | 1973-10-03 |
Family
ID=20464923
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SU1617421A SU399576A1 (enrdf_load_stackoverflow) | 1971-01-26 | 1971-01-26 |
Country Status (1)
| Country | Link |
|---|---|
| SU (1) | SU399576A1 (enrdf_load_stackoverflow) |
-
1971
- 1971-01-26 SU SU1617421A patent/SU399576A1/ru active
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