SU379110A3 - - Google Patents

Info

Publication number
SU379110A3
SU379110A3 SU1284438A SU1284438A SU379110A3 SU 379110 A3 SU379110 A3 SU 379110A3 SU 1284438 A SU1284438 A SU 1284438A SU 1284438 A SU1284438 A SU 1284438A SU 379110 A3 SU379110 A3 SU 379110A3
Authority
SU
USSR - Soviet Union
Application number
SU1284438A
Other languages
Russian (ru)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Application granted granted Critical
Publication of SU379110A3 publication Critical patent/SU379110A3/ru

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F26/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/30—Introducing nitrogen atoms or nitrogen-containing groups

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
SU1284438A 1967-11-21 1968-11-20 SU379110A3 (xx)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US68463667A 1967-11-21 1967-11-21

Publications (1)

Publication Number Publication Date
SU379110A3 true SU379110A3 (xx) 1973-04-18

Family

ID=24748898

Family Applications (1)

Application Number Title Priority Date Filing Date
SU1284438A SU379110A3 (xx) 1967-11-21 1968-11-20

Country Status (8)

Country Link
JP (1) JPS4934681B1 (xx)
BE (1) BE723556A (xx)
BR (1) BR6804157D0 (xx)
CH (1) CH494415A (xx)
DE (1) DE1807644A1 (xx)
FR (1) FR1592375A (xx)
GB (1) GB1251345A (xx)
SU (1) SU379110A3 (xx)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3837860A (en) * 1969-06-16 1974-09-24 L Roos PHOTOSENSITIVE MATERIALS COMPRISING POLYMERS HAVING RECURRING PENDENT o-QUINONE DIAZIDE GROUPS
JPS51483B2 (xx) * 1972-08-18 1976-01-08
GB1482921A (en) 1973-07-31 1977-08-17 Glaxo Lab Ltd Polymers
US4123279A (en) * 1974-03-25 1978-10-31 Fuji Photo Film Co., Ltd. Light-sensitive o-quinonediazide containing planographic printing plate
JP2623309B2 (ja) * 1988-02-22 1997-06-25 ユーシービー ソシエテ アノニム レジストパターンを得る方法
JP2944296B2 (ja) 1992-04-06 1999-08-30 富士写真フイルム株式会社 感光性平版印刷版の製造方法
JP3290316B2 (ja) 1994-11-18 2002-06-10 富士写真フイルム株式会社 感光性平版印刷版
JP3506295B2 (ja) 1995-12-22 2004-03-15 富士写真フイルム株式会社 ポジ型感光性平版印刷版
US6511790B2 (en) 2000-08-25 2003-01-28 Fuji Photo Film Co., Ltd. Alkaline liquid developer for lithographic printing plate and method for preparing lithographic printing plate
EP1211065B1 (en) 2000-11-30 2009-01-14 FUJIFILM Corporation Planographic printing plate precursor
US20040067435A1 (en) 2002-09-17 2004-04-08 Fuji Photo Film Co., Ltd. Image forming material
JP4404734B2 (ja) 2004-09-27 2010-01-27 富士フイルム株式会社 平版印刷版原版
JP4474296B2 (ja) 2005-02-09 2010-06-02 富士フイルム株式会社 平版印刷版原版
JP4404792B2 (ja) 2005-03-22 2010-01-27 富士フイルム株式会社 平版印刷版原版
JP2009083106A (ja) 2007-09-27 2009-04-23 Fujifilm Corp 平版印刷版用版面保護剤及び平版印刷版の製版方法
JP2009085984A (ja) 2007-09-27 2009-04-23 Fujifilm Corp 平版印刷版原版
JP4890403B2 (ja) 2007-09-27 2012-03-07 富士フイルム株式会社 平版印刷版原版
JP4994175B2 (ja) 2007-09-28 2012-08-08 富士フイルム株式会社 平版印刷版原版、及びそれに用いる共重合体の製造方法
JP4790682B2 (ja) 2007-09-28 2011-10-12 富士フイルム株式会社 平版印刷版原版
CN101855026A (zh) 2007-11-14 2010-10-06 富士胶片株式会社 干燥涂布膜的方法和制造平版印刷版前体的方法
JP2009236355A (ja) 2008-03-26 2009-10-15 Fujifilm Corp 乾燥方法及び装置
JP5164640B2 (ja) 2008-04-02 2013-03-21 富士フイルム株式会社 平版印刷版原版
JP5183380B2 (ja) 2008-09-09 2013-04-17 富士フイルム株式会社 赤外線レーザ用感光性平版印刷版原版
JP2010237435A (ja) 2009-03-31 2010-10-21 Fujifilm Corp 平版印刷版原版
CN105082725B (zh) 2009-09-24 2018-05-04 富士胶片株式会社 平版印刷版原版
JP5490168B2 (ja) 2012-03-23 2014-05-14 富士フイルム株式会社 平版印刷版原版及び平版印刷版の作製方法
JP5512730B2 (ja) 2012-03-30 2014-06-04 富士フイルム株式会社 平版印刷版の作製方法

Also Published As

Publication number Publication date
FR1592375A (xx) 1970-05-11
CH494415A (fr) 1970-07-31
GB1251345A (xx) 1971-10-27
DE1807644A1 (de) 1969-08-28
JPS4934681B1 (xx) 1974-09-17
BR6804157D0 (pt) 1973-01-11
BE723556A (xx) 1969-04-16

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