SU1545845A1 - METHOD OF OBTAINING STRUCTURE "SILICA ON INSULATOR" - Google Patents

METHOD OF OBTAINING STRUCTURE "SILICA ON INSULATOR"

Info

Publication number
SU1545845A1
SU1545845A1 SU4448613/25A SU4448613A SU1545845A1 SU 1545845 A1 SU1545845 A1 SU 1545845A1 SU 4448613/25 A SU4448613/25 A SU 4448613/25A SU 4448613 A SU4448613 A SU 4448613A SU 1545845 A1 SU1545845 A1 SU 1545845A1
Authority
SU
USSR - Soviet Union
Prior art keywords
silicon
implanted
insulator
silica
silicon substrate
Prior art date
Application number
SU4448613/25A
Other languages
Russian (ru)
Inventor
Н.Н. Герасименко
А.М. Мясников
В.Ф. Стась
С.А. Сухих
Original Assignee
Институт Физики Полупроводников Со Ан Ссср
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Институт Физики Полупроводников Со Ан Ссср filed Critical Институт Физики Полупроводников Со Ан Ссср
Priority to SU4448613/25A priority Critical patent/SU1545845A1/en
Application granted granted Critical
Publication of SU1545845A1 publication Critical patent/SU1545845A1/en

Links

Landscapes

  • Formation Of Insulating Films (AREA)

Abstract

Способ получения структуры "кремний на изоляторе", включающий имплантацию в кремниевую подложку ионов кислорода (азота) с дозами и энергиями, достаточными для образования изолирующего слоя двуокиси кремния (нитрида кремния) под слоем кремния, и нагрев, отличающийся тем, что, с целью улучшения качества структуры, имплантацию и нагрев проводят в два этапа: на первом этапе имплантируют часть поверхности кремниевой подложки так, чтобы имплантируемые области чередовались с неимплантированными, и проводят нагрев, а на втором имплантируют только неиплантированную на первом этапе поверхность кремниевой подложки и проводят нагрев.The method of obtaining the structure of "silicon on the insulator", including the implantation into the silicon substrate of oxygen ions (nitrogen) with doses and energies sufficient to form an insulating layer of silicon dioxide (silicon nitride) under a layer of silicon, and heating, characterized in that, in order to improve The quality of the structure, implantation and heating are carried out in two stages: in the first stage, a portion of the surface of the silicon substrate is implanted so that the implantable areas alternate with the non-implanted, and they are heated, and the second is implanted About the surface of the silicon substrate, which is not implanted at the first stage, is heated.

SU4448613/25A 1988-06-27 1988-06-27 METHOD OF OBTAINING STRUCTURE "SILICA ON INSULATOR" SU1545845A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
SU4448613/25A SU1545845A1 (en) 1988-06-27 1988-06-27 METHOD OF OBTAINING STRUCTURE "SILICA ON INSULATOR"

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SU4448613/25A SU1545845A1 (en) 1988-06-27 1988-06-27 METHOD OF OBTAINING STRUCTURE "SILICA ON INSULATOR"

Publications (1)

Publication Number Publication Date
SU1545845A1 true SU1545845A1 (en) 1999-11-10

Family

ID=60529017

Family Applications (1)

Application Number Title Priority Date Filing Date
SU4448613/25A SU1545845A1 (en) 1988-06-27 1988-06-27 METHOD OF OBTAINING STRUCTURE "SILICA ON INSULATOR"

Country Status (1)

Country Link
SU (1) SU1545845A1 (en)

Similar Documents

Publication Publication Date Title
JPS6417444A (en) Manufacture of insulation buried in semiconductor substrate by ion implantation and construction of semiconductor containing the insulation
EP0189486A4 (en) Method of producing bipolar semiconductor devices.
KR920020596A (en) Semiconductor device and manufacturing method thereof
EP0316165A3 (en) A method of trench isolation
SE9501310D0 (en) A method for introducing an impurity dopant into SiC, a semiconductor device formed by the method and using a highly doped amorphous layer as a source for dopant diffusion into SiC
CS274772B2 (en) Method of silicon nitride production with high alpha-phase content
ATE307390T1 (en) METHOD FOR PRODUCING POWER SEMICONDUCTOR COMPONENTS
SU1545845A1 (en) METHOD OF OBTAINING STRUCTURE "SILICA ON INSULATOR"
KR910008107A (en) Phosphor, surface treatment method of phosphor, and method of manufacturing phosphor
JPS5680126A (en) Formation of monocrystalline semiconductor
IT1118264B (en) ADMINODERIVATES OF PIRAZOLE (1,5-A) S TRIAZINE PARTICULARLY USEFUL IN THERAPY AND PROCEDURE FOR THEIR PREPARATION
EP0217616A3 (en) Substrate processing apparatus
JPS57208124A (en) Manufacture of semiconductor device
SU1626996A1 (en) METHOD OF OBTAINING STRUCTURES "SILICA ON THE INSULATOR"
TW370693B (en) Method for forming a contact to a substrate
DK272789D0 (en) METHOD AND PREPARATION FOR TREATING INFERTILITY
JPS6467937A (en) Formation of high breakdown strength buried insulating film
JPS6433970A (en) Field effect semiconductor device
JPS6425434A (en) Manufacture of semiconductor device
JPS5352354A (en) Semiconductor local heating method
EP0314399A3 (en) Buried zener diode and method of forming the same
TW359875B (en) Method for manufacturing semiconductor memory devices
JPS6437029A (en) Manufacture of semiconductor
DE3586570D1 (en) CONTACT MATERIAL.
JPS6441219A (en) Manufacture of semiconductor device