SK277865B6 - Method of sputtering of layers and device for realization of this method - Google Patents

Method of sputtering of layers and device for realization of this method Download PDF

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Publication number
SK277865B6
SK277865B6 SK480489A SK480489A SK277865B6 SK 277865 B6 SK277865 B6 SK 277865B6 SK 480489 A SK480489 A SK 480489A SK 480489 A SK480489 A SK 480489A SK 277865 B6 SK277865 B6 SK 277865B6
Authority
SK
Slovakia
Prior art keywords
cathode
substrates
anode
magnetic field
plasma
Prior art date
Application number
SK480489A
Other languages
English (en)
Slovak (sk)
Other versions
SK480489A3 (en
Inventor
Stanislav Kadlec
Jindrich Musil
Original Assignee
Stanislav Kadlec
Jindrich Musil
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Stanislav Kadlec, Jindrich Musil filed Critical Stanislav Kadlec
Publication of SK480489A3 publication Critical patent/SK480489A3/sk
Publication of SK277865B6 publication Critical patent/SK277865B6/sk

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Preparation Of Compounds By Using Micro-Organisms (AREA)
SK480489A 1989-08-14 1989-08-14 Method of sputtering of layers and device for realization of this method SK277865B6 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CS894804A CZ278295B6 (en) 1989-08-14 1989-08-14 Process of sputtering layers and apparatus for making the same

Publications (2)

Publication Number Publication Date
SK480489A3 SK480489A3 (en) 1994-06-08
SK277865B6 true SK277865B6 (en) 1995-05-10

Family

ID=5391610

Family Applications (1)

Application Number Title Priority Date Filing Date
SK480489A SK277865B6 (en) 1989-08-14 1989-08-14 Method of sputtering of layers and device for realization of this method

Country Status (6)

Country Link
EP (1) EP0413291B1 (de)
JP (1) JP3045752B2 (de)
CA (1) CA2023092A1 (de)
CZ (1) CZ278295B6 (de)
DE (1) DE69017555T2 (de)
SK (1) SK277865B6 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5178739A (en) * 1990-10-31 1993-01-12 International Business Machines Corporation Apparatus for depositing material into high aspect ratio holes
JPH0816266B2 (ja) * 1990-10-31 1996-02-21 インターナショナル・ビジネス・マシーンズ・コーポレーション 高アスペクト比の穴に材料を付着させる装置
WO1995004368A1 (en) * 1993-07-29 1995-02-09 Institute Of Physics Academy Of Sciences Of The Czech Republic Method and device for magnetron sputtering
JP3125907B2 (ja) * 1993-09-27 2001-01-22 株式会社ミツバ 結晶配向薄膜製造装置
GB2306510B (en) * 1995-11-02 1999-06-23 Univ Surrey Modification of metal surfaces
DE10018143C5 (de) † 2000-04-12 2012-09-06 Oerlikon Trading Ag, Trübbach DLC-Schichtsystem sowie Verfahren und Vorrichtung zur Herstellung eines derartigen Schichtsystems
US7166199B2 (en) 2002-12-18 2007-01-23 Cardinal Cg Company Magnetron sputtering systems including anodic gas distribution systems
US7850828B2 (en) 2006-09-15 2010-12-14 Cardinal Cg Company Enhanced virtual anode
WO2016126650A1 (en) 2015-02-03 2016-08-11 Cardinal Cg Company Sputtering apparatus including gas distribution system
CN115461491A (zh) * 2020-07-01 2022-12-09 应用材料公司 用于操作腔室的方法、用于处理基板的装置和基板处理系统
FR3120125B1 (fr) * 2021-02-25 2023-09-08 Saint Gobain Dispositif de mesure de pression vide secondaire et système embarqué pour mesure de pression de vide résiduel

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3458426A (en) * 1966-05-25 1969-07-29 Fabri Tek Inc Symmetrical sputtering apparatus with plasma confinement
US4853102A (en) * 1987-01-07 1989-08-01 Hitachi, Ltd. Sputtering process and an apparatus for carrying out the same

Also Published As

Publication number Publication date
JP3045752B2 (ja) 2000-05-29
CA2023092A1 (en) 1991-02-15
JPH03193871A (ja) 1991-08-23
EP0413291A2 (de) 1991-02-20
DE69017555T2 (de) 1995-07-13
CZ278295B6 (en) 1993-11-17
EP0413291A3 (en) 1992-03-11
EP0413291B1 (de) 1995-03-08
CZ480489A3 (en) 1993-10-13
DE69017555D1 (de) 1995-04-13
SK480489A3 (en) 1994-06-08

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