SG97954A1 - Photoimageable composition having photopolymerizeable binder oligomer - Google Patents

Photoimageable composition having photopolymerizeable binder oligomer

Info

Publication number
SG97954A1
SG97954A1 SG200005970A SG200005970A SG97954A1 SG 97954 A1 SG97954 A1 SG 97954A1 SG 200005970 A SG200005970 A SG 200005970A SG 200005970 A SG200005970 A SG 200005970A SG 97954 A1 SG97954 A1 SG 97954A1
Authority
SG
Singapore
Prior art keywords
photopolymerizeable
photoimageable composition
binder oligomer
oligomer
binder
Prior art date
Application number
SG200005970A
Other languages
English (en)
Inventor
Eramo Lincoln Jr
G Male Mitchell
K Barr Robert
E Lundy Daniel
Original Assignee
Rohm & Haas
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm & Haas filed Critical Rohm & Haas
Publication of SG97954A1 publication Critical patent/SG97954A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
    • C08F220/343—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate in the form of urethane links
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/30—Inkjet printing inks
    • C09D11/34—Hot-melt inks
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Wood Science & Technology (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Materials For Photolithography (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Epoxy Resins (AREA)
  • Polymerisation Methods In General (AREA)
  • Adhesives Or Adhesive Processes (AREA)
SG200005970A 1999-10-20 2000-10-17 Photoimageable composition having photopolymerizeable binder oligomer SG97954A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/421,811 US6268111B1 (en) 1999-10-20 1999-10-20 Photoimageable composition having photopolymerizeable binder oligomer

Publications (1)

Publication Number Publication Date
SG97954A1 true SG97954A1 (en) 2003-08-20

Family

ID=23672138

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200005970A SG97954A1 (en) 1999-10-20 2000-10-17 Photoimageable composition having photopolymerizeable binder oligomer

Country Status (7)

Country Link
US (1) US6268111B1 (de)
EP (1) EP1094364A1 (de)
JP (1) JP2001163949A (de)
KR (1) KR20010051093A (de)
CN (1) CN1159626C (de)
SG (1) SG97954A1 (de)
TW (1) TWI249078B (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU2001284499A1 (en) * 2000-09-11 2002-03-26 Showa Denko K K Photosensitive composition, cured article thereof, and printed circuit board using the same
JP2004151691A (ja) * 2002-09-30 2004-05-27 Rohm & Haas Electronic Materials Llc 改良フォトレジスト
JP2004163904A (ja) * 2002-09-30 2004-06-10 Rohm & Haas Electronic Materials Llc 改善された光開始剤
JP4875834B2 (ja) * 2003-12-24 2012-02-15 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． マスク
JP4587865B2 (ja) * 2004-04-22 2010-11-24 昭和電工株式会社 感光性樹脂組成物及びその硬化物並びにそれらを使用するプリント配線基板の製造方法
TW200613903A (en) * 2004-05-26 2006-05-01 Showa Denko Kk Photosensitive resin composition, and cured product and use thereof
US7375144B2 (en) * 2005-06-16 2008-05-20 Eastman Chemical Company Abrasion resistant coatings
CN104730862B (zh) * 2013-12-19 2020-06-19 乐凯华光印刷科技有限公司 阴图感光组合物及用该组合物制成的热敏板

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1996034316A1 (en) * 1995-04-27 1996-10-31 Minnesota Mining And Manufacturing Company Negative-acting no-process printing plates
WO1998045755A1 (en) * 1997-04-09 1998-10-15 Advanced Coatings International Ltd. Waterborne photoresists made from urethane acrylates

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2557408C2 (de) * 1975-12-19 1983-08-25 Bayer Ag, 5090 Leverkusen Verfahren zur Herstellung eines in organischen Lösungsmitteln löslichen, vernetzbaren Acryloyl- und/oder Methacryloylgruppen und Carboxylgruppen enthaltenden Urethanharzes und seine Verwendung
US4092443A (en) 1976-02-19 1978-05-30 Ciba-Geigy Corporation Method for making reinforced composites
US4153778A (en) 1978-03-30 1979-05-08 Union Carbide Corporation Acrylyl capped urethane oligomers
DE3036694A1 (de) * 1980-09-29 1982-06-03 Hoechst Ag, 6000 Frankfurt Gummielastische, ethylenisch ungesaettigte polyurethane und dieselben enthaltendes durch strahlung polymerisierbares gemisch
US4762902A (en) 1985-12-16 1988-08-09 The B. F. Goodrich Company Electron curable polyurethanes
US5364736A (en) 1987-12-07 1994-11-15 Morton International, Inc. Photoimageable compositions
US5229252A (en) 1989-06-09 1993-07-20 Morton International, Inc. Photoimageable compositions
US5290663A (en) 1991-03-01 1994-03-01 W. R. Grace & Co.-Conn. Photocurable polyurethane-acrylate ionomer compositions for aqueous developable printing plates
JPH06136085A (ja) 1992-10-21 1994-05-17 Mitsui Toatsu Chem Inc 内部架橋型水性ウレタン樹脂の製造方法
TW418346B (en) * 1993-03-05 2001-01-11 Ciba Sc Holding Ag Photopolymerisable compositions containing tetraacrylates
AT404733B (de) * 1997-04-09 1999-02-25 Vianova Kunstharz Ag Verfahren zur herstellung von strahlungshärtbaren wasserverdünnbaren urethanharzen und deren verwendung

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1996034316A1 (en) * 1995-04-27 1996-10-31 Minnesota Mining And Manufacturing Company Negative-acting no-process printing plates
WO1998045755A1 (en) * 1997-04-09 1998-10-15 Advanced Coatings International Ltd. Waterborne photoresists made from urethane acrylates

Also Published As

Publication number Publication date
JP2001163949A (ja) 2001-06-19
CN1159626C (zh) 2004-07-28
TWI249078B (en) 2006-02-11
CN1297168A (zh) 2001-05-30
KR20010051093A (ko) 2001-06-25
EP1094364A1 (de) 2001-04-25
US6268111B1 (en) 2001-07-31

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