SG95611A1 - Tin electroplating process - Google Patents

Tin electroplating process

Info

Publication number
SG95611A1
SG95611A1 SG9906082A SG1999006082A SG95611A1 SG 95611 A1 SG95611 A1 SG 95611A1 SG 9906082 A SG9906082 A SG 9906082A SG 1999006082 A SG1999006082 A SG 1999006082A SG 95611 A1 SG95611 A1 SG 95611A1
Authority
SG
Singapore
Prior art keywords
electroplating process
tin electroplating
tin
electroplating
Prior art date
Application number
SG9906082A
Other languages
English (en)
Inventor
Hong Chiu See
Zhang Yun
Original Assignee
Lucent Technologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lucent Technologies Inc filed Critical Lucent Technologies Inc
Publication of SG95611A1 publication Critical patent/SG95611A1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/60—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of tin
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/30—Electroplating: Baths therefor from solutions of tin
    • C25D3/32—Electroplating: Baths therefor from solutions of tin characterised by the organic bath constituents used

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
SG9906082A 1998-12-03 1999-12-01 Tin electroplating process SG95611A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11072298P 1998-12-03 1998-12-03
US09/296,574 US6342148B1 (en) 1998-12-03 1999-04-22 Tin electroplating bath

Publications (1)

Publication Number Publication Date
SG95611A1 true SG95611A1 (en) 2003-04-23

Family

ID=26808337

Family Applications (1)

Application Number Title Priority Date Filing Date
SG9906082A SG95611A1 (en) 1998-12-03 1999-12-01 Tin electroplating process

Country Status (6)

Country Link
US (1) US6342148B1 (ja)
EP (1) EP1006217B1 (ja)
JP (1) JP3359602B2 (ja)
DE (1) DE69900057T2 (ja)
MY (1) MY130855A (ja)
SG (1) SG95611A1 (ja)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7122108B2 (en) * 2001-10-24 2006-10-17 Shipley Company, L.L.C. Tin-silver electrolyte
US20070037005A1 (en) * 2003-04-11 2007-02-15 Rohm And Haas Electronic Materials Llc Tin-silver electrolyte
US7314543B2 (en) * 2003-10-14 2008-01-01 Intel Corporation Tin deposition
JP4788262B2 (ja) * 2005-09-20 2011-10-05 株式会社村田製作所 めっき皮膜、およびめっき皮膜の形成方法。
WO2007082112A2 (en) * 2006-01-06 2007-07-19 Faraday Technology, Inc. Tin and tin alloy electroplating method with controlled internal stress and grain size of the resulting deposit
CN103882484B (zh) * 2014-04-04 2016-06-29 哈尔滨工业大学 高速电镀锡用镀液
CN103882485B (zh) * 2014-04-04 2016-07-06 哈尔滨工业大学 纯硫酸盐电镀锡添加剂及其镀液
KR101583330B1 (ko) * 2014-12-22 2016-01-07 대륙금속(주) 광택도 검사를 이용한 사틴-니켈 도금방법

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4263106A (en) * 1979-12-31 1981-04-21 Bell Telephone Laboratories, Incorporated Solder plating process
US4310392A (en) 1979-12-31 1982-01-12 Bell Telephone Laboratories, Incorporated Electrolytic plating
US4599149A (en) 1981-09-11 1986-07-08 Learonal, Inc. Process for electroplating tin, lead and tin-lead alloys and baths therefor
US4871429A (en) 1981-09-11 1989-10-03 Learonal, Inc Limiting tin sludge formation in tin or tin/lead electroplating solutions
US5094726B1 (en) 1981-09-11 1993-12-21 I. Nobel Fred Limiting tin sludge formation in tin or tin/lead electroplating solutions
US5066367B1 (en) 1981-09-11 1993-12-21 I. Nobel Fred Limiting tin sludge formation in tin or tin/lead electroplating solutions
US4683036A (en) * 1983-06-10 1987-07-28 Kollmorgen Technologies Corporation Method for electroplating non-metallic surfaces
US4617097A (en) 1983-12-22 1986-10-14 Learonal, Inc. Process and electrolyte for electroplating tin, lead or tin-lead alloys
US4565610A (en) 1983-12-22 1986-01-21 Learonal, Inc. Bath and process for plating lead and lead/tin alloys
US4701244A (en) 1983-12-22 1987-10-20 Learonal, Inc. Bath and process for electroplating tin, lead and tin/alloys
US4565609A (en) 1983-12-22 1986-01-21 Learonal, Inc. Bath and process for plating tin, lead and tin-lead alloys
US4994155A (en) 1988-12-09 1991-02-19 Learonal, Inc. High speed tin, lead or tin/lead alloy electroplating
US5174887A (en) 1987-12-10 1992-12-29 Learonal, Inc. High speed electroplating of tinplate
EP0652306B1 (en) 1987-12-10 2000-09-27 LeaRonal, Inc. Tin, lead or tin/lead alloy electrolytes for high-speed electroplating
US5750017A (en) * 1996-08-21 1998-05-12 Lucent Technologies Inc. Tin electroplating process

Also Published As

Publication number Publication date
US6342148B1 (en) 2002-01-29
EP1006217B1 (en) 2001-03-07
JP2000169994A (ja) 2000-06-20
DE69900057T2 (de) 2001-08-16
MY130855A (en) 2007-07-31
JP3359602B2 (ja) 2002-12-24
DE69900057D1 (de) 2001-04-12
EP1006217A1 (en) 2000-06-07

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