SG91821A1 - High frequency coupler, and plasma processing apparatus and method - Google Patents

High frequency coupler, and plasma processing apparatus and method

Info

Publication number
SG91821A1
SG91821A1 SG9903086A SG1999003086A SG91821A1 SG 91821 A1 SG91821 A1 SG 91821A1 SG 9903086 A SG9903086 A SG 9903086A SG 1999003086 A SG1999003086 A SG 1999003086A SG 91821 A1 SG91821 A1 SG 91821A1
Authority
SG
Singapore
Prior art keywords
processing apparatus
high frequency
plasma processing
frequency coupler
coupler
Prior art date
Application number
SG9903086A
Other languages
English (en)
Inventor
Okumura Tomohiro
Watanabe Shozo
Original Assignee
Matsushita Electric Ind Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Ind Co Ltd filed Critical Matsushita Electric Ind Co Ltd
Publication of SG91821A1 publication Critical patent/SG91821A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H01J37/3211—Antennas, e.g. particular shapes of coils

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
SG9903086A 1998-06-26 1999-06-22 High frequency coupler, and plasma processing apparatus and method SG91821A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18009398A JP3257512B2 (ja) 1998-06-26 1998-06-26 高周波結合器、プラズマ処理装置及び方法

Publications (1)

Publication Number Publication Date
SG91821A1 true SG91821A1 (en) 2002-10-15

Family

ID=16077324

Family Applications (1)

Application Number Title Priority Date Filing Date
SG9903086A SG91821A1 (en) 1998-06-26 1999-06-22 High frequency coupler, and plasma processing apparatus and method

Country Status (5)

Country Link
US (1) US6291937B1 (ja)
JP (1) JP3257512B2 (ja)
KR (1) KR100353375B1 (ja)
SG (1) SG91821A1 (ja)
TW (1) TW418455B (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4286404B2 (ja) * 1999-10-15 2009-07-01 東京エレクトロン株式会社 整合器およびプラズマ処理装置
JP3482949B2 (ja) * 2000-08-04 2004-01-06 松下電器産業株式会社 プラズマ処理方法及び装置
SG143065A1 (en) 2001-02-16 2008-06-27 Sony Corp Data processing method and its apparatus

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US186503A (en) * 1877-01-23 Improvement in lightning-rod-connecting clips
US543960A (en) * 1895-08-06 Electrical conductor
US2417785A (en) * 1943-05-08 1947-03-18 Westinghouse Electric Corp Low-loss conductor for highfrequency currents
US4451830A (en) * 1980-12-17 1984-05-29 The Commonwealth Of Australia VHF Omni-range navigation system antenna
US4508946A (en) * 1982-03-11 1985-04-02 Matsushita Electric Industrial Co., Ltd. Microwave oven with rotary antenna
US4523127A (en) * 1983-02-02 1985-06-11 Ga Technologies Inc. Cyclotron resonance maser amplifier and waveguide window
US5063330A (en) * 1988-05-09 1991-11-05 Centre National De La Recherche Scientifique Plasma reactor
EP0554039A1 (en) * 1992-01-30 1993-08-04 Hitachi, Ltd. Method and apparatus for generating plasma, and semiconductor processing methods
WO1999066533A1 (en) * 1998-06-19 1999-12-23 Lam Research Corporation Semiconductor process chamber electrode and method for making the same

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US90578A (en) * 1869-05-25 Improvement in lightning-rod couplings
US3617617A (en) * 1970-06-12 1971-11-02 Du Pont Insulated electrical conductor

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US186503A (en) * 1877-01-23 Improvement in lightning-rod-connecting clips
US543960A (en) * 1895-08-06 Electrical conductor
US2417785A (en) * 1943-05-08 1947-03-18 Westinghouse Electric Corp Low-loss conductor for highfrequency currents
US4451830A (en) * 1980-12-17 1984-05-29 The Commonwealth Of Australia VHF Omni-range navigation system antenna
US4508946A (en) * 1982-03-11 1985-04-02 Matsushita Electric Industrial Co., Ltd. Microwave oven with rotary antenna
US4523127A (en) * 1983-02-02 1985-06-11 Ga Technologies Inc. Cyclotron resonance maser amplifier and waveguide window
US5063330A (en) * 1988-05-09 1991-11-05 Centre National De La Recherche Scientifique Plasma reactor
EP0554039A1 (en) * 1992-01-30 1993-08-04 Hitachi, Ltd. Method and apparatus for generating plasma, and semiconductor processing methods
WO1999066533A1 (en) * 1998-06-19 1999-12-23 Lam Research Corporation Semiconductor process chamber electrode and method for making the same

Also Published As

Publication number Publication date
KR20000006505A (ko) 2000-01-25
KR100353375B1 (ko) 2002-09-18
US6291937B1 (en) 2001-09-18
JP2000012286A (ja) 2000-01-14
JP3257512B2 (ja) 2002-02-18
TW418455B (en) 2001-01-11

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