SG86331A1 - Lapping control sensor for magnetoresistive effect head, lapping control method using the sensor and manufacturing method of the sensor - Google Patents

Lapping control sensor for magnetoresistive effect head, lapping control method using the sensor and manufacturing method of the sensor

Info

Publication number
SG86331A1
SG86331A1 SG9802823A SG1998002823A SG86331A1 SG 86331 A1 SG86331 A1 SG 86331A1 SG 9802823 A SG9802823 A SG 9802823A SG 1998002823 A SG1998002823 A SG 1998002823A SG 86331 A1 SG86331 A1 SG 86331A1
Authority
SG
Singapore
Prior art keywords
sensor
lapping control
manufacturing
magnetoresistive effect
effect head
Prior art date
Application number
SG9802823A
Other languages
English (en)
Inventor
Osamu Fukuroi
Yoshiro Nakagawa
Original Assignee
Tdk Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tdk Corp filed Critical Tdk Corp
Publication of SG86331A1 publication Critical patent/SG86331A1/en

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
    • G11B5/3903—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • B24B49/10—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving electrical means
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B7/00—Measuring arrangements characterised by the use of electric or magnetic techniques
    • G01B7/02—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness
    • G01B7/06—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness
    • G01B7/10—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness using magnetic means, e.g. by measuring change of reluctance
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/187—Structure or manufacture of the surface of the head in physical contact with, or immediately adjacent to the recording medium; Pole pieces; Gap features
    • G11B5/1871—Shaping or contouring of the transducing or guiding surface
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3109—Details
    • G11B5/3116—Shaping of layers, poles or gaps for improving the form of the electrical signal transduced, e.g. for shielding, contour effect, equalizing, side flux fringing, cross talk reduction between heads or between heads and information tracks
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/4902—Electromagnet, transformer or inductor
    • Y10T29/49021—Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/4902—Electromagnet, transformer or inductor
    • Y10T29/49021—Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
    • Y10T29/49032—Fabricating head structure or component thereof
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/4902—Electromagnet, transformer or inductor
    • Y10T29/49021—Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
    • Y10T29/49032—Fabricating head structure or component thereof
    • Y10T29/49036—Fabricating head structure or component thereof including measuring or testing
    • Y10T29/49043—Depositing magnetic layer or coating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/4902—Electromagnet, transformer or inductor
    • Y10T29/49021—Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
    • Y10T29/49032—Fabricating head structure or component thereof
    • Y10T29/49036—Fabricating head structure or component thereof including measuring or testing
    • Y10T29/49043—Depositing magnetic layer or coating
    • Y10T29/49044—Plural magnetic deposition layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Magnetic Heads (AREA)
  • Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
SG9802823A 1997-08-07 1998-07-31 Lapping control sensor for magnetoresistive effect head, lapping control method using the sensor and manufacturing method of the sensor SG86331A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22443697A JP3395590B2 (ja) 1997-08-07 1997-08-07 磁気抵抗効果ヘッドの研磨制御用センサ及び該センサを用いた研磨制御方法

Publications (1)

Publication Number Publication Date
SG86331A1 true SG86331A1 (en) 2002-02-19

Family

ID=16813752

Family Applications (1)

Application Number Title Priority Date Filing Date
SG9802823A SG86331A1 (en) 1997-08-07 1998-07-31 Lapping control sensor for magnetoresistive effect head, lapping control method using the sensor and manufacturing method of the sensor

Country Status (3)

Country Link
US (2) US6083081A (ja)
JP (1) JP3395590B2 (ja)
SG (1) SG86331A1 (ja)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6347983B1 (en) 1999-06-09 2002-02-19 Seagate Technology Llc ELG for both MRE sensor height and resistance monitoring
WO2001091115A2 (en) 2000-05-25 2001-11-29 Seagate Technology Llc Improved lapping sensor for recording heads
US6930864B2 (en) * 2002-03-22 2005-08-16 International Business Machines Corporation Methods and apparatus for defining the track width of a magnetic head having a flat sensor profile
US6793557B2 (en) * 2002-05-24 2004-09-21 International Business Machines Corporation Removable lapping guide for magnetic recording head and method of use
US6982042B2 (en) * 2003-02-28 2006-01-03 Hitachi Global Storage Technologies Netherlands, B.V. Ion bombardment of electrical lapping guides to decrease noise during lapping process
US7014530B2 (en) * 2003-09-29 2006-03-21 Hitachi Global Storage Technologies Netherlands B.V. Slider fabrication system for sliders with integrated electrical lapping guides
US7206172B2 (en) * 2004-02-20 2007-04-17 Hitachi Global Storage Technologies Netherlands B.V. Electrical lapping guide embedded in a shield of a magnetic head
US7108578B2 (en) * 2004-11-12 2006-09-19 Hitachi Global Storage Technologies Netherlands B.V. System and method for manufacturing magnetic heads
US7574791B2 (en) * 2005-05-10 2009-08-18 Hitachi Global Storage Technologies Netherlands B.V. Method to fabricate side shields for a magnetic sensor
US7551406B1 (en) 2005-07-01 2009-06-23 Western Digital (Fremont), Llc Dual electrical lapping guides with common bonding pad
US7554767B1 (en) * 2005-07-01 2009-06-30 Western Digital (Fremont), Llc Electrical lapping guide disposed laterally relative to a shield pedestal
US11219511B2 (en) 2005-10-24 2022-01-11 Biomet 3I, Llc Methods for placing an implant analog in a physical model of the patient's mouth
US8151441B1 (en) 2008-03-27 2012-04-10 Western Digital (Fremont), Llc Method for providing and utilizing an electronic lapping guide in a magnetic recording transducer
US8066893B2 (en) * 2008-12-23 2011-11-29 Hitachi Global Storage Technologies Netherlands B.V. Method for creating a magnetic write pole having a stepped perpendicular pole via CMP-assisted liftoff
US8165709B1 (en) 2009-02-26 2012-04-24 Western Digital (Fremont), Llc Four pad self-calibrating electronic lapping guide
US8291743B1 (en) 2009-05-27 2012-10-23 Western Digital (Fremont), Llc Method and system for calibrating an electronic lapping guide for a beveled pole in a magnetic recording transducer
US8443510B1 (en) 2009-05-28 2013-05-21 Western Digital (Fremont), Llc Method for utilizing an electronic lapping guide for a beveled pole in a magnetic recording transducer
US8307539B1 (en) 2009-09-30 2012-11-13 Western Digital (Fremont), Llc Method for modeling devices in a wafer
EP3777760B1 (en) 2011-05-16 2024-06-19 Biomet 3I, LLC Temporary abutment cap with informational markers
US10672423B2 (en) * 2018-04-10 2020-06-02 Seagate Technology Llc Electronic test structures for one or more magnetoresistive elements, and related methods

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5463805A (en) * 1994-02-07 1995-11-07 Seagate Technology, Inc. Method of lapping MR. sensors
JPH09198621A (ja) * 1996-01-03 1997-07-31 Internatl Business Mach Corp <Ibm> 直列磁束ガイドを備えた高感度磁気抵抗センサ

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4841625A (en) * 1982-05-07 1989-06-27 Computer And Communications Technology Corporation Automatic throat height control for film head
US4689877A (en) * 1985-08-29 1987-09-01 International Business Machines Corp. Method and apparatus for controlling the throat height of batch fabricated thin film magnetic transducers
JPH0710495B2 (ja) * 1987-01-29 1995-02-08 インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション 研磨案内抵抗器
US5023991A (en) * 1988-08-31 1991-06-18 Digital Equipment Corporation Electrical guide for tight tolerance machining
US5479308A (en) * 1993-11-15 1995-12-26 Voegeli; Otto Magnetoresistive transducer including interdiffusion layer

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5463805A (en) * 1994-02-07 1995-11-07 Seagate Technology, Inc. Method of lapping MR. sensors
US5559429A (en) * 1994-02-07 1996-09-24 Seagate Technology, Inc. MR head lap monitor resistors
JPH09198621A (ja) * 1996-01-03 1997-07-31 Internatl Business Mach Corp <Ibm> 直列磁束ガイドを備えた高感度磁気抵抗センサ

Also Published As

Publication number Publication date
US6083081A (en) 2000-07-04
US6399148B2 (en) 2002-06-04
JP3395590B2 (ja) 2003-04-14
JPH1166520A (ja) 1999-03-09
US20020001671A1 (en) 2002-01-03

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