SG75170A1 - Photoimageable composition having improved flexibility - Google Patents

Photoimageable composition having improved flexibility

Info

Publication number
SG75170A1
SG75170A1 SG1999001939A SG1999001939A SG75170A1 SG 75170 A1 SG75170 A1 SG 75170A1 SG 1999001939 A SG1999001939 A SG 1999001939A SG 1999001939 A SG1999001939 A SG 1999001939A SG 75170 A1 SG75170 A1 SG 75170A1
Authority
SG
Singapore
Prior art keywords
plus
total weight
photoimageable composition
addition
acid functionality
Prior art date
Application number
SG1999001939A
Other languages
English (en)
Inventor
Robert Barr
Daniel E Lundy
Stephen Wheeler
Original Assignee
Nichigo Morton Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nichigo Morton Co Ltd filed Critical Nichigo Morton Co Ltd
Publication of SG75170A1 publication Critical patent/SG75170A1/en

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Agricultural Chemicals And Associated Chemicals (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Paints Or Removers (AREA)
  • Adhesives Or Adhesive Processes (AREA)
SG1999001939A 1998-05-29 1999-04-23 Photoimageable composition having improved flexibility SG75170A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/086,903 US5952154A (en) 1998-05-29 1998-05-29 Photoimageable composition having improved flexibility

Publications (1)

Publication Number Publication Date
SG75170A1 true SG75170A1 (en) 2000-09-19

Family

ID=22201653

Family Applications (1)

Application Number Title Priority Date Filing Date
SG1999001939A SG75170A1 (en) 1998-05-29 1999-04-23 Photoimageable composition having improved flexibility

Country Status (12)

Country Link
US (1) US5952154A (fr)
EP (1) EP0961170B1 (fr)
JP (1) JP2000003036A (fr)
KR (1) KR100294549B1 (fr)
CN (1) CN1190705C (fr)
AT (1) ATE272852T1 (fr)
CA (1) CA2266159A1 (fr)
DE (1) DE69919076T2 (fr)
ES (1) ES2224556T3 (fr)
HK (1) HK1021660A1 (fr)
SG (1) SG75170A1 (fr)
TW (1) TWI221212B (fr)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11167203A (ja) * 1997-12-01 1999-06-22 Nichigoo Mooton Kk 感光性樹脂組成物及びそれを用いた感光性エレメント
EP1008910A1 (fr) * 1998-12-11 2000-06-14 Shipley Company LLC Compositions photoimageables au décapage et à la résolution améliorés
EP1008911A1 (fr) * 1998-12-11 2000-06-14 Shipley Company LLC Compositions photoimageables ayant des propriétés de flexibilité et de décapage améliorées
JP3948505B2 (ja) * 1999-10-27 2007-07-25 富士フイルム株式会社 平版印刷版用原版
JP4512281B2 (ja) 2001-02-22 2010-07-28 富士フイルム株式会社 ネガ型平版印刷版原版
JP4266077B2 (ja) 2001-03-26 2009-05-20 富士フイルム株式会社 平版印刷版原版及び平版印刷方法
TW200304449A (en) * 2002-02-15 2003-10-01 Shipley Co Llc Functionalized polymer, method of preparing the same, and photoimageable composition
US7338748B2 (en) * 2002-09-30 2008-03-04 Fujifilm Corporation Polymerizable composition and planographic printing plate precursor
JP4137577B2 (ja) * 2002-09-30 2008-08-20 富士フイルム株式会社 感光性組成物
JP2004126050A (ja) * 2002-09-30 2004-04-22 Fuji Photo Film Co Ltd 平版印刷版原版
CN100590525C (zh) * 2002-12-18 2010-02-17 富士胶片株式会社 可聚合组合物和平版印刷版前体
JP4150261B2 (ja) * 2003-01-14 2008-09-17 富士フイルム株式会社 平版印刷版原版の製版方法
JP2004252201A (ja) * 2003-02-20 2004-09-09 Fuji Photo Film Co Ltd 平版印刷版原版
JP2004252285A (ja) * 2003-02-21 2004-09-09 Fuji Photo Film Co Ltd 感光性組成物及びそれを用いた平版印刷版原版
JP4048133B2 (ja) * 2003-02-21 2008-02-13 富士フイルム株式会社 感光性組成物及びそれを用いた平版印刷版原版
JP4048134B2 (ja) * 2003-02-21 2008-02-13 富士フイルム株式会社 平版印刷版原版
JP4299639B2 (ja) * 2003-07-29 2009-07-22 富士フイルム株式会社 重合性組成物及びそれを用いた画像記録材料
JP2005099284A (ja) * 2003-09-24 2005-04-14 Fuji Photo Film Co Ltd 感光性組成物及び平版印刷版原版
JP4815871B2 (ja) * 2004-05-21 2011-11-16 三菱瓦斯化学株式会社 レジスト化合物およびレジスト組成物
US20050271973A1 (en) * 2004-06-04 2005-12-08 Ziegler Michael J Negative acting photoresist with improved blocking resistance
EP1780230A1 (fr) * 2005-10-25 2007-05-02 Cytec Surface Specialties, S.A. Polymères et compositions
CN102650826B (zh) * 2011-02-28 2014-08-13 中山市立顺实业有限公司 一种含有特定粘合剂及增塑剂的干膜光阻剂
CN102650825B (zh) * 2011-02-28 2014-08-27 中山市立顺实业有限公司 一种含有粘着添加剂及增塑剂的干膜光阻剂
TW201400981A (zh) * 2012-06-19 2014-01-01 Chi Mei Corp 感光性樹脂組成物及其應用
EP2950144B1 (fr) 2014-05-31 2016-12-14 Rohm and Haas Electronic Materials LLC Procédé d'imagerie sur des substrats avec compositions de blocage d'uv solubles en milieu alcalin aqueux et films uv transparents solubles en milieu aqueux

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3953309A (en) * 1972-12-14 1976-04-27 Dynachem Corporation Polymerization compositions and processes having polymeric binding agents
US4003877A (en) * 1974-05-24 1977-01-18 Dynachem Corporation Photopolymerizable screen printing inks for permanent coatings prepared from aryloxyalkyl compositions
US4245030A (en) * 1979-05-23 1981-01-13 Hoechst Aktiengesellschaft Photopolymerizable mixture containing improved plasticizer
DE3136818C2 (de) * 1980-09-19 1990-08-02 Hitachi Chemical Co., Ltd., Tokio/Tokyo Verwendung eines lichtempfindlichen Gemisches und eines lichtempfindlichen Aufzeichnungsmaterials zur Bildung einer Lötmaske
US4610951A (en) * 1983-06-06 1986-09-09 Dynachem Corporation Process of using a flexible, fast processing photopolymerizable composition
DE3412992A1 (de) * 1984-04-06 1985-10-24 Hoechst Ag, 6230 Frankfurt Durch strahlung polymerisierbares gemisch und verfahren zum aufbringen von markierungen auf eine loetstopresistschicht
US4837126A (en) * 1985-06-07 1989-06-06 W. R. Grace & Co. Polymer composition for photoresist application
US4877711A (en) * 1986-05-19 1989-10-31 Fuji Photo Film Co., Ltd. Light-sensitive diazo photopolymerizable composition with polyurethane having carbon-carbon unsaturated and a carboxyl group
US5102774A (en) * 1986-12-08 1992-04-07 Armstrong World Industries, Inc. Photoimagable coating compositions which are developable in aqueous alkaline solutions and can be used for solder mask compositions
US5217845A (en) * 1988-12-22 1993-06-08 Hoechst Aktiengesellschaft Photopolymerizable mixture and photopolymerizable copying material containing same
JP2584672B2 (ja) * 1989-04-28 1997-02-26 富士写真フイルム株式会社 感光性組成物
CA2040097A1 (fr) * 1990-04-12 1991-10-13 Wako Yokoyama Polymeres urethannes pour compositions de plaque d'impression
US5290663A (en) * 1991-03-01 1994-03-01 W. R. Grace & Co.-Conn. Photocurable polyurethane-acrylate ionomer compositions for aqueous developable printing plates
DE4129284A1 (de) * 1991-09-03 1993-03-04 Agfa Gevaert Ag Bilderzeugungselement mit einem fotopolymerisierbaren monomer
EP0545081B1 (fr) * 1991-11-01 1998-12-23 MacDermid Imaging Technology Inc. Plastifiants à groupements carboxyle dans des compositions photopolymérisables pour film à sec
US5341799A (en) * 1991-12-23 1994-08-30 Hercules Incorporated Urethane polymers for printing plate compositions
TW424172B (en) * 1995-04-19 2001-03-01 Hitachi Chemical Co Ltd Photosensitive resin composition and photosensitive element using the same

Also Published As

Publication number Publication date
TWI221212B (en) 2004-09-21
EP0961170A1 (fr) 1999-12-01
CN1245908A (zh) 2000-03-01
HK1021660A1 (en) 2000-06-23
EP0961170B1 (fr) 2004-08-04
DE69919076T2 (de) 2004-12-09
DE69919076D1 (de) 2004-09-09
KR19990088587A (ko) 1999-12-27
JP2000003036A (ja) 2000-01-07
US5952154A (en) 1999-09-14
KR100294549B1 (ko) 2001-07-03
CN1190705C (zh) 2005-02-23
ATE272852T1 (de) 2004-08-15
CA2266159A1 (fr) 1999-11-29
ES2224556T3 (es) 2005-03-01

Similar Documents

Publication Publication Date Title
SG75170A1 (en) Photoimageable composition having improved flexibility
DE50110048D1 (en) Härtbare wässrige polyurethandispersionen
DE50206931D1 (de) Thermisch härtbare bindemittel
DE69303912D1 (de) Harzderivate als netzmittel
DE59700622D1 (de) Formaldehydfreie beschichtungsmittel für formkörper
EP0976010A4 (fr) Photoresists aqueux constitues d'urethane acrylates-------------
EP0962827A3 (fr) Composition photosensible ayant un système d'amorçage amélioré
EP0927911A3 (fr) Compositions photosensibles contenant des oligomères d'uréthane
ATE248899T1 (de) Latex-bindemittel für beschichtungszusammensetzung
EP0379200A3 (fr) Composition photopolymérisable
ATE232993T1 (de) Wässrige entwicklungslösungen für die verminderung der entwicklerrückstände
EP0935171A1 (fr) Compositions photosensibles contenant des polymères liants hydrophiles et des monomères hydrophiles
CA2254797C (fr) Compositions photoimageables contenant des oligomeres d'urethane photopolymerisables et des plastifiants a dibenzoates
DE60135030D1 (fr)
IL126888A0 (en) Photoimageable composition having improved flexibility adhesion and stripping characteristics
EP0729945A4 (fr) Composition photopolymerisable contenant un compose au squarylium
TW200506519A (en) Positive photoresist composition and resist pattern forming method
CA2133148A1 (fr) Photoresines a base aqueuse comportant des liants neutralises par des aminoacrylates
BG101887A (en) Mixed herbicidal compositions
BR9814515A (pt) Copolìmero solúvel em álcali associativo, processo para preparar um copolìmero associativo, e, utilização de um copolìmero
DE59009165D1 (de) Wässrige Reinigungsmittel für Aminoharz-Leim verarbeitende Maschinen.
EP0919872A3 (fr) Compositions photosensibles négatives comprenant des trimères de isocyanates insaturés
UA19202A (uk) Склад для очищення від корозії металевої поверхhі