SG72884A1 - Method for forming noble metal oxides and structures formed thereof - Google Patents

Method for forming noble metal oxides and structures formed thereof

Info

Publication number
SG72884A1
SG72884A1 SG1998004543A SG1998004543A SG72884A1 SG 72884 A1 SG72884 A1 SG 72884A1 SG 1998004543 A SG1998004543 A SG 1998004543A SG 1998004543 A SG1998004543 A SG 1998004543A SG 72884 A1 SG72884 A1 SG 72884A1
Authority
SG
Singapore
Prior art keywords
noble metal
metal oxides
structures formed
forming noble
forming
Prior art date
Application number
SG1998004543A
Inventor
Peter Richard Duncombe
John Patrick Hummel
Robert Benjamin Laibowitz
Deborah Ann Neumayer
Katherine Lynn Saenger
Alejandro Gabriel Schrott
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibm filed Critical Ibm
Publication of SG72884A1 publication Critical patent/SG72884A1/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
    • B05D5/12—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain a coating with specific electrical properties
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/14—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by electrical means
    • B05D3/141—Plasma treatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/14—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to metal, e.g. car bodies
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D2202/00—Metallic substrate

Landscapes

  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Semiconductor Memories (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Non-Volatile Memory (AREA)
SG1998004543A 1997-11-05 1998-11-05 Method for forming noble metal oxides and structures formed thereof SG72884A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US96460797A 1997-11-05 1997-11-05

Publications (1)

Publication Number Publication Date
SG72884A1 true SG72884A1 (en) 2000-05-23

Family

ID=25508764

Family Applications (1)

Application Number Title Priority Date Filing Date
SG1998004543A SG72884A1 (en) 1997-11-05 1998-11-05 Method for forming noble metal oxides and structures formed thereof

Country Status (4)

Country Link
JP (1) JPH11224936A (en)
KR (1) KR100303935B1 (en)
SG (1) SG72884A1 (en)
TW (2) TW483156B (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100600283B1 (en) * 1999-12-14 2006-07-13 주식회사 하이닉스반도체 Alloy electrodes of capacitor and method for forming the same
KR100687433B1 (en) * 2000-07-29 2007-02-26 주식회사 하이닉스반도체 Method for forming a bottom electrode of a capacitor
KR20030025671A (en) * 2001-09-22 2003-03-29 주식회사 하이닉스반도체 Method for fabricating capacitor
KR100735396B1 (en) * 2005-10-19 2007-07-04 삼성전기주식회사 thin flim capacitor and printed circuit board embedded capacitor and method for manufacturing the same
JP2007242847A (en) * 2006-03-08 2007-09-20 Seiko Epson Corp Capacitor, and manufacturing method thereof
KR100878414B1 (en) * 2006-10-27 2009-01-13 삼성전기주식회사 Capacitor embedded printed circuit borad and manufacturing method of the same
JP2014212310A (en) * 2013-04-02 2014-11-13 東京エレクトロン株式会社 Manufacturing method and manufacturing apparatus of semiconductor device

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02101649A (en) * 1988-10-07 1990-04-13 Victor Co Of Japan Ltd Optical disk
JP3239445B2 (en) * 1992-06-09 2001-12-17 セイコーエプソン株式会社 Dielectric element, method of manufacturing the same, and semiconductor memory device
US5585300A (en) * 1994-08-01 1996-12-17 Texas Instruments Incorporated Method of making conductive amorphous-nitride barrier layer for high-dielectric-constant material electrodes
WO1996010845A2 (en) * 1994-10-04 1996-04-11 Philips Electronics N.V. Semiconductor device comprising a ferroelectric memory element with a lower electrode provided with an oxygen barrier
JPH08153707A (en) * 1994-11-29 1996-06-11 Nec Corp Manufacturing method for semiconductor device
JP3188179B2 (en) * 1995-09-26 2001-07-16 シャープ株式会社 Method of manufacturing ferroelectric thin film element and method of manufacturing ferroelectric memory element

Also Published As

Publication number Publication date
KR100303935B1 (en) 2002-04-17
JPH11224936A (en) 1999-08-17
TW483156B (en) 2002-04-11
KR19990044856A (en) 1999-06-25
TW442959B (en) 2001-06-23

Similar Documents

Publication Publication Date Title
EP0697729A3 (en) Contact structure using barrier metal and method of manufacturing the same
GB2326118B (en) Shaped multilayer metal sheet shield structures and method of making
EP0972087A4 (en) High-tensile-strength steel and method of manufacturing the same
EP1044172A4 (en) Burner and method for producing metal oxide soot
IL132563A0 (en) Valve metal compositions and method
EP1018565A4 (en) Steel wire rod and method of manufacturing steel for the same
EP0999288A4 (en) Steel sheet for can and manufacturing method thereof
ZA976711B (en) Metal can and method of making.
EP1070496A4 (en) Tablet manufacturing method and tablet
GB9802317D0 (en) Continuous metal manufacturing method and apparatus therefor
EP0972915A4 (en) Muffler and its manufacturing method
EP0967507A4 (en) Display and its manufacturing method
EP1131565A4 (en) Notching construction and method
EP1063313A4 (en) Steel wire and method of manufacturing the same
SG63828A1 (en) Interconnects using metal spacers and method for forming same
IL124667A0 (en) Igniter assembly and method
SG72884A1 (en) Method for forming noble metal oxides and structures formed thereof
GB9828232D0 (en) Metallic fastening member and fabrication method thereof
HUP0001724A3 (en) Biosorption agents for metal ions and method for the production thereof
EG21185A (en) Metal reduction and melting process
GB9815609D0 (en) Metal strip shearing and coiling
GB9712010D0 (en) Metal strip production
GB9814683D0 (en) Continuous metal manufacturing method and apparatus therefor
GB9700450D0 (en) Metal shears
ZA9810531B (en) Method for producing a metal strip and device for reducing the risk of such a strip breaking