SG72690G - A method of producing images of enhanced contrast in photoresists - Google Patents
A method of producing images of enhanced contrast in photoresistsInfo
- Publication number
- SG72690G SG72690G SG726/90A SG72690A SG72690G SG 72690 G SG72690 G SG 72690G SG 726/90 A SG726/90 A SG 726/90A SG 72690 A SG72690 A SG 72690A SG 72690 G SG72690 G SG 72690G
- Authority
- SG
- Singapore
- Prior art keywords
- photoresists
- producing images
- enhanced contrast
- enhanced
- contrast
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C255/00—Carboxylic acid nitriles
- C07C255/63—Carboxylic acid nitriles containing cyano groups and nitrogen atoms further bound to other hetero atoms, other than oxygen atoms of nitro or nitroso groups, bound to the same carbon skeleton
- C07C255/64—Carboxylic acid nitriles containing cyano groups and nitrogen atoms further bound to other hetero atoms, other than oxygen atoms of nitro or nitroso groups, bound to the same carbon skeleton with the nitrogen atoms further bound to oxygen atoms
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C291/00—Compounds containing carbon and nitrogen and having functional groups not covered by groups C07C201/00 - C07C281/00
- C07C291/02—Compounds containing carbon and nitrogen and having functional groups not covered by groups C07C201/00 - C07C281/00 containing nitrogen-oxide bonds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D455/00—Heterocyclic compounds containing quinolizine ring systems, e.g. emetine alkaloids, protoberberine; Alkylenedioxy derivatives of dibenzo [a, g] quinolizines, e.g. berberine
- C07D455/03—Heterocyclic compounds containing quinolizine ring systems, e.g. emetine alkaloids, protoberberine; Alkylenedioxy derivatives of dibenzo [a, g] quinolizines, e.g. berberine containing quinolizine ring systems directly condensed with at least one six-membered carbocyclic ring, e.g. protoberberine; Alkylenedioxy derivatives of dibenzo [a, g] quinolizines, e.g. berberine
- C07D455/04—Heterocyclic compounds containing quinolizine ring systems, e.g. emetine alkaloids, protoberberine; Alkylenedioxy derivatives of dibenzo [a, g] quinolizines, e.g. berberine containing quinolizine ring systems directly condensed with at least one six-membered carbocyclic ring, e.g. protoberberine; Alkylenedioxy derivatives of dibenzo [a, g] quinolizines, e.g. berberine containing a quinolizine ring system condensed with only one six-membered carbocyclic ring, e.g. julolidine
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US43819482A | 1982-11-01 | 1982-11-01 | |
US53692383A | 1983-09-28 | 1983-09-28 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG72690G true SG72690G (en) | 1990-11-23 |
Family
ID=27031575
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG726/90A SG72690G (en) | 1982-11-01 | 1990-09-03 | A method of producing images of enhanced contrast in photoresists |
Country Status (9)
Country | Link |
---|---|
EP (3) | EP0110165B1 (fr) |
JP (1) | JPH0619572B2 (fr) |
KR (1) | KR900005418B1 (fr) |
DE (3) | DE3382769T2 (fr) |
GB (3) | GB2131190B (fr) |
HK (3) | HK27791A (fr) |
IE (3) | IE56082B1 (fr) |
MX (1) | MX160833A (fr) |
SG (1) | SG72690G (fr) |
Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4859789A (en) * | 1982-11-01 | 1989-08-22 | General Electric Company | Diarylnitrones |
US4745042A (en) * | 1984-04-19 | 1988-05-17 | Matsushita Electric Industrial Co., Ltd. | Water-soluble photopolymer and method of forming pattern by use of the same |
US4663275A (en) * | 1984-09-04 | 1987-05-05 | General Electric Company | Photolithographic method and combination including barrier layer |
US4804614A (en) * | 1984-10-01 | 1989-02-14 | The Aerospace Corporation | Photoresist process of fabricating microelectronic circuits using water processable diazonium compound containing contrast enhancement layer |
US4705729A (en) * | 1984-11-19 | 1987-11-10 | Hewlett-Packard Company | Method for photochemically enhancing resolution in photolithography processes |
US4578344A (en) * | 1984-12-20 | 1986-03-25 | General Electric Company | Photolithographic method using a two-layer photoresist and photobleachable film |
US4661433A (en) * | 1984-12-31 | 1987-04-28 | General Electric Company | Storage stable aryl nitrone compositions |
US4623611A (en) * | 1985-01-16 | 1986-11-18 | General Electric Company | Photolithographic stripping method for removing contrast enhancement layer |
US4672021A (en) * | 1985-06-03 | 1987-06-09 | Fairmount Chemical Company | Contrast enhancement layer composition with naphthoquinone diazide, indicator dye and polymeric binder |
US4777111A (en) * | 1985-06-03 | 1988-10-11 | Fairmount Chemical Company, Inc. | Photographic element with diazo contrast enhancement layer and method of producing image in underlying photoresist layer of element |
US4784936A (en) * | 1985-10-24 | 1988-11-15 | General Electric Company | Process of forming a resist structure on substrate having topographical features using positive photoresist layer and poly(vinyl pyrrolidone) overlayer |
US4677043A (en) * | 1985-11-01 | 1987-06-30 | Macdermid, Incorporated | Stepper process for VLSI circuit manufacture utilizing radiation absorbing dyestuff for registration of alignment markers and reticle |
DE3541534A1 (de) * | 1985-11-25 | 1987-05-27 | Hoechst Ag | Positiv arbeitendes strahlungsempfindliches gemisch |
CA1325354C (fr) * | 1985-12-09 | 1993-12-21 | Yasushi Umeda | Materiau d'impression a base de resine photosensible |
GB2190214B (en) * | 1986-03-11 | 1989-11-08 | Fuji Photo Film Co Ltd | Method of forming an image on photosensitive material |
EP0239376A3 (fr) * | 1986-03-27 | 1988-05-11 | Gec-Marconi Limited | Photolithographie avec augmentation du contraste |
EP0246885A3 (fr) * | 1986-05-20 | 1988-06-22 | Japan as represented by Director-General, Agency of Industrial Science and Technology | Agent pour augmenter le contraste pour la photolithographie |
JPS6370245A (ja) * | 1986-09-12 | 1988-03-30 | Tosoh Corp | 感光性樹脂組成物およびそれを用いた微細パタ−ン形成法 |
EP0280197A3 (fr) * | 1987-02-23 | 1990-05-23 | Oki Electric Industry Company, Limited | Procédé de formation d'un patron formant photoréserve |
US4957845A (en) * | 1988-05-18 | 1990-09-18 | Toray Industries, Incorporated | Printing plate |
CA2011927C (fr) * | 1989-06-02 | 1996-12-24 | Alan Lee Sidman | Methode microlithographique de fabrication de masques de resine photosensible epais a parois verticales |
EP0462763A1 (fr) * | 1990-06-18 | 1991-12-27 | Minnesota Mining And Manufacturing Company | Couches thermodéveloppables sensibles à la lumière qui contiennent des sensibilisateurs photoblanchissables |
US5310620A (en) * | 1991-12-06 | 1994-05-10 | Shin-Etsu Chemical Co., Ltd. | Alkali-soluble nitrone compounds and contrast enhanced material comprising the same |
CA3082211A1 (fr) * | 2020-06-02 | 2021-12-02 | Techinsights Inc. | Systeme et methode de teinture a rehaussement des contrastes et methodes et systemes d'imagerie connexes |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2426894A (en) * | 1944-05-09 | 1947-09-02 | Du Pont | Light-sensitive layers of n-monoarylhydroxylamines and their nitrones and process of printing thereon |
NL140629B (nl) * | 1963-07-04 | 1973-12-17 | Kalle Ag | Lichtgevoelig materiaal voor de vervaardiging van drukvormen en de daarmede vervaardigde drukvormen. |
US3511653A (en) * | 1966-07-01 | 1970-05-12 | American Cyanamid Co | Contrast enhancement of optical images |
NL6712658A (fr) * | 1966-09-26 | 1968-03-27 | ||
GB1204917A (en) * | 1967-11-14 | 1970-09-09 | Howson Algraphy Ltd | Photographic printing plates |
AT289152B (de) * | 1968-12-09 | 1971-04-13 | Kalle Ag | Lichtempfindliches Kopiermaterial zum Herstellen einer Flachdruckform |
NL7216227A (fr) * | 1972-11-30 | 1974-06-04 | ||
US3925077A (en) * | 1974-03-01 | 1975-12-09 | Horizons Inc | Photoresist for holography and laser recording with bleachout dyes |
JPS52130286A (en) * | 1976-04-26 | 1977-11-01 | Hitachi Ltd | Negative type photo resist |
GB1566802A (en) * | 1976-06-02 | 1980-05-08 | Agfa Gevaert | Photosensitive imaging material |
GB1588417A (en) * | 1977-03-15 | 1981-04-23 | Agfa Gevaert | Photoresist materials |
US4081278A (en) * | 1977-05-23 | 1978-03-28 | Eastman Kodak Company | Heat sensitive dye layers comprising a benzopinacol |
US4111699A (en) * | 1977-06-06 | 1978-09-05 | Eastman Kodak Company | O-nitro-o-azaarylidene photobleachable dyes and photographic elements utilizing them |
JPS6023459B2 (ja) * | 1977-11-02 | 1985-06-07 | 松下電子工業株式会社 | カラ−受像管の光吸収膜形成方法 |
JPS6023460B2 (ja) * | 1977-11-16 | 1985-06-07 | 松下電子工業株式会社 | カラ−受像管の螢光面形成方法 |
EP0161660B1 (fr) * | 1984-05-14 | 1991-10-09 | Kabushiki Kaisha Toshiba | Procédé pour obtenir des images réserves et composition à cet effet |
-
1983
- 1983-10-10 IE IE3527/87A patent/IE56082B1/en not_active IP Right Cessation
- 1983-10-10 IE IE2379/83A patent/IE56081B1/en not_active IP Right Cessation
- 1983-10-10 IE IE3057/88A patent/IE56083B1/en not_active IP Right Cessation
- 1983-10-21 GB GB08328221A patent/GB2131190B/en not_active Expired
- 1983-10-29 DE DE3382769T patent/DE3382769T2/de not_active Expired - Lifetime
- 1983-10-29 EP EP83110847A patent/EP0110165B1/fr not_active Expired - Lifetime
- 1983-10-29 EP EP89202607A patent/EP0361627B1/fr not_active Expired - Lifetime
- 1983-10-29 DE DE83110847T patent/DE3382699T2/de not_active Expired - Lifetime
- 1983-10-29 DE DE3382773T patent/DE3382773T2/de not_active Expired - Lifetime
- 1983-10-29 EP EP89202608A patent/EP0355934B1/fr not_active Expired - Lifetime
- 1983-10-31 MX MX199277A patent/MX160833A/es unknown
- 1983-11-01 KR KR1019830005180A patent/KR900005418B1/ko not_active IP Right Cessation
-
1985
- 1985-09-30 GB GB08519258A patent/GB2168698B/en not_active Expired
- 1985-09-30 GB GB08519259A patent/GB2169090B/en not_active Expired
-
1987
- 1987-01-22 JP JP62011520A patent/JPH0619572B2/ja not_active Expired - Fee Related
-
1990
- 1990-09-03 SG SG726/90A patent/SG72690G/en unknown
-
1991
- 1991-04-11 HK HK277/91A patent/HK27791A/xx not_active IP Right Cessation
- 1991-04-11 HK HK278/91A patent/HK27891A/xx unknown
- 1991-06-06 HK HK436/91A patent/HK43691A/xx not_active IP Right Cessation
Also Published As
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