SG43819A1 - High-purity spherical silica and process for producing same - Google Patents

High-purity spherical silica and process for producing same

Info

Publication number
SG43819A1
SG43819A1 SG1996001390A SG1996001390A SG43819A1 SG 43819 A1 SG43819 A1 SG 43819A1 SG 1996001390 A SG1996001390 A SG 1996001390A SG 1996001390 A SG1996001390 A SG 1996001390A SG 43819 A1 SG43819 A1 SG 43819A1
Authority
SG
Singapore
Prior art keywords
spherical silica
producing same
purity spherical
purity
producing
Prior art date
Application number
SG1996001390A
Inventor
Yasuhiro Unehara
Kouichi Orii
Original Assignee
Nitto Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nitto Chemical Industry Co Ltd filed Critical Nitto Chemical Industry Co Ltd
Publication of SG43819A1 publication Critical patent/SG43819A1/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09CTREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/28Compounds of silicon
    • C09C1/30Silicic acid
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/113Silicon oxides; Hydrates thereof
    • C01B33/12Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/157After-treatment of gels
    • C01B33/159Coating or hydrophobisation
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/113Silicon oxides; Hydrates thereof
    • C01B33/12Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/157After-treatment of gels
    • C01B33/158Purification; Drying; Dehydrating
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/113Silicon oxides; Hydrates thereof
    • C01B33/12Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/16Preparation of silica xerogels
    • C01B33/166Preparation of silica xerogels by acidification of silicate in the presence of an inert organic phase
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H01L23/293Organic, e.g. plastic
    • H01L23/295Organic, e.g. plastic containing a filler
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/30Particle morphology extending in three dimensions
    • C01P2004/32Spheres
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/51Particles with a specific particle size distribution
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/60Particles characterised by their size
    • C01P2004/61Micrometer sized, i.e. from 1-100 micrometer
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/10Solid density
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/12Surface area
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/40Electric properties
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/80Compositional purity
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Silicon Compounds (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
SG1996001390A 1993-06-29 1994-06-29 High-purity spherical silica and process for producing same SG43819A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP18207393 1993-06-29
JP14412494A JP3400548B2 (en) 1993-06-29 1994-06-03 Method for producing high-purity spherical silica

Publications (1)

Publication Number Publication Date
SG43819A1 true SG43819A1 (en) 1997-11-14

Family

ID=26475646

Family Applications (1)

Application Number Title Priority Date Filing Date
SG1996001390A SG43819A1 (en) 1993-06-29 1994-06-29 High-purity spherical silica and process for producing same

Country Status (5)

Country Link
JP (1) JP3400548B2 (en)
KR (1) KR100279083B1 (en)
GB (1) GB2279944B (en)
SG (1) SG43819A1 (en)
TW (1) TW271432B (en)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4199885B2 (en) * 1999-10-14 2008-12-24 東ソー・シリカ株式会社 Amorphous silica for inkjet recording sheet and method for producing the same
JP4822576B2 (en) * 2000-05-30 2011-11-24 京セラ株式会社 Inorganic hollow powder and method for producing the same
WO2002026626A1 (en) * 2000-09-27 2002-04-04 Mitsubishi Rayon Co., Ltd. Non-porous spherical silica and method for production thereof
JP2003137970A (en) * 2001-08-24 2003-05-14 Sanyo Chem Ind Ltd Epoxy resin composition for electric and electronic element
WO2004101139A1 (en) * 2003-05-13 2004-11-25 Asahi Glass Company, Limited Process for producing inorganic sphere
US6847122B1 (en) * 2003-10-16 2005-01-25 Kulicke & Soffa Investments, Inc. System and method for preventing and alleviating short circuiting in a semiconductor device
US6955949B2 (en) 2003-10-16 2005-10-18 Kulicke & Soffa Investments, Inc. System and method for reducing or eliminating semiconductor device wire sweep
US7179688B2 (en) 2003-10-16 2007-02-20 Kulicke And Soffa Industries, Inc. Method for reducing or eliminating semiconductor device wire sweep in a multi-tier bonding device and a device produced by the method
KR100620215B1 (en) 2004-07-29 2006-09-08 한국원자력연구소 Silica-based standard material for analysing a swipe sample
KR100651243B1 (en) 2005-03-04 2006-11-30 (주) 에스오씨 Manufacturing method for spherical silica
JP4707186B2 (en) * 2005-10-03 2011-06-22 株式会社四国総合研究所 Method for producing silica powder and silica powder obtained thereby
JP5042252B2 (en) * 2009-02-20 2012-10-03 学校法人 芝浦工業大学 Glass material recovery method
JP2012520236A (en) * 2009-03-16 2012-09-06 ビーエーエスエフ ソシエタス・ヨーロピア Silica gel catalyst carrier
JP2014105126A (en) * 2012-11-28 2014-06-09 Asahi Glass Co Ltd Silica-containing particle production method
JP6059519B2 (en) * 2012-11-28 2017-01-11 旭硝子株式会社 Method for producing silica-containing particles
JP6482770B2 (en) * 2013-03-29 2019-03-13 株式会社アドマテックス Silica particles, method for producing silica particles, and method for producing surface-modified silica particles
JP6196462B2 (en) * 2013-04-11 2017-09-13 株式会社トクヤマ Porous spherical metal oxide
JP5865466B2 (en) * 2014-11-17 2016-02-17 株式会社アドマテックス Silica particle material and filler-containing resin composition
KR20230150345A (en) * 2021-03-31 2023-10-30 덴카 주식회사 silicon dioxide powder
JPWO2022210102A1 (en) * 2021-03-31 2022-10-06

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2921839A (en) * 1955-12-23 1960-01-19 Columbia Southern Chem Corp Silica precipitation method
JPH01230422A (en) * 1988-03-10 1989-09-13 Nippon Chem Ind Co Ltd High-purity silica and production thereof
CA2087911C (en) * 1992-01-24 1999-06-29 Kiyoshi Abe Spherical granules of porous silica or silicate, process for the production thereof, and applications thereof
JP3410522B2 (en) * 1993-09-09 2003-05-26 水澤化学工業株式会社 Method for producing granular amorphous silica

Also Published As

Publication number Publication date
KR950000563A (en) 1995-01-03
TW271432B (en) 1996-03-01
JP3400548B2 (en) 2003-04-28
GB2279944B (en) 1996-10-02
GB2279944A (en) 1995-01-18
JPH0769617A (en) 1995-03-14
KR100279083B1 (en) 2001-02-01
GB9413100D0 (en) 1994-08-17

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