SG153018A1 - Ceramic heater, method of manufactruing the same and deposition apparatus for forming a thin layer using the ceramic heater - Google Patents
Ceramic heater, method of manufactruing the same and deposition apparatus for forming a thin layer using the ceramic heaterInfo
- Publication number
- SG153018A1 SG153018A1 SG200808729-8A SG2008087298A SG153018A1 SG 153018 A1 SG153018 A1 SG 153018A1 SG 2008087298 A SG2008087298 A SG 2008087298A SG 153018 A1 SG153018 A1 SG 153018A1
- Authority
- SG
- Singapore
- Prior art keywords
- ceramic heater
- same
- manufactruing
- forming
- thin layer
- Prior art date
Links
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Resistance Heating (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020070121643A KR101177749B1 (ko) | 2007-11-27 | 2007-11-27 | 세라믹 히터, 이의 제조 방법 및 이를 갖는 박막 증착 장치 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG153018A1 true SG153018A1 (en) | 2009-06-29 |
Family
ID=40847822
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200808729-8A SG153018A1 (en) | 2007-11-27 | 2008-11-25 | Ceramic heater, method of manufactruing the same and deposition apparatus for forming a thin layer using the ceramic heater |
Country Status (3)
Country | Link |
---|---|
KR (1) | KR101177749B1 (ko) |
SG (1) | SG153018A1 (ko) |
TW (1) | TWI398185B (ko) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101333629B1 (ko) * | 2013-07-03 | 2013-11-27 | (주)보부하이테크 | 낮은 누설전류와 전력효율이 향상된 반도체 제조용 질화알루미늄 세라믹히터의 제조방법 및 이에 의해 제조된 낮은 누설전류와 전력효율이 향상된 반도체 제조용 질화알루미늄 세라믹히터 |
US11330673B2 (en) * | 2017-11-20 | 2022-05-10 | Applied Materials, Inc. | Heated substrate support |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4445595B2 (ja) * | 1995-09-12 | 2010-04-07 | 日本特殊陶業株式会社 | セラミックヒータ、セラミックグロープラグおよびその製造方法 |
JPH11260534A (ja) * | 1998-01-09 | 1999-09-24 | Ngk Insulators Ltd | 加熱装置およびその製造方法 |
JP2000290777A (ja) * | 1999-04-07 | 2000-10-17 | Tokyo Electron Ltd | ガス処理装置、バッフル部材、及びガス処理方法 |
JP2001102157A (ja) * | 1999-10-01 | 2001-04-13 | Ngk Insulators Ltd | セラミックスヒータ |
JP2003212658A (ja) * | 2002-10-30 | 2003-07-30 | Ibiden Co Ltd | 窒化アルミニウム焼結体およびセラミック基板 |
JP4761723B2 (ja) * | 2004-04-12 | 2011-08-31 | 日本碍子株式会社 | 基板加熱装置 |
TW200709296A (en) * | 2005-05-31 | 2007-03-01 | Tokyo Electron Ltd | Plasma treatment apparatus and plasma treatment method |
-
2007
- 2007-11-27 KR KR1020070121643A patent/KR101177749B1/ko active IP Right Grant
-
2008
- 2008-11-25 SG SG200808729-8A patent/SG153018A1/en unknown
- 2008-11-26 TW TW097145834A patent/TWI398185B/zh active
Also Published As
Publication number | Publication date |
---|---|
KR101177749B1 (ko) | 2012-08-29 |
TW200932032A (en) | 2009-07-16 |
TWI398185B (zh) | 2013-06-01 |
KR20090054785A (ko) | 2009-06-01 |
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