SG143132A1 - Lithographic apparatus and device manufacturing method - Google Patents

Lithographic apparatus and device manufacturing method

Info

Publication number
SG143132A1
SG143132A1 SG200717104-4A SG2007171044A SG143132A1 SG 143132 A1 SG143132 A1 SG 143132A1 SG 2007171044 A SG2007171044 A SG 2007171044A SG 143132 A1 SG143132 A1 SG 143132A1
Authority
SG
Singapore
Prior art keywords
radiation beam
lithographic apparatus
patterning device
substrate
device manufacturing
Prior art date
Application number
SG200717104-4A
Other languages
English (en)
Inventor
Onvlee Johannes
Bijvoet Dirk-Jan
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG143132A1 publication Critical patent/SG143132A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
SG200717104-4A 2006-11-16 2007-10-19 Lithographic apparatus and device manufacturing method SG143132A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/600,325 US7933000B2 (en) 2006-11-16 2006-11-16 Device manufacturing method, method for holding a patterning device and lithographic apparatus including an applicator for applying molecules onto a clamp area of a patterning device

Publications (1)

Publication Number Publication Date
SG143132A1 true SG143132A1 (en) 2008-06-27

Family

ID=39149179

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200717104-4A SG143132A1 (en) 2006-11-16 2007-10-19 Lithographic apparatus and device manufacturing method

Country Status (7)

Country Link
US (1) US7933000B2 (ja)
EP (1) EP1923743A3 (ja)
JP (1) JP4833953B2 (ja)
KR (1) KR100926157B1 (ja)
CN (1) CN101183223B (ja)
SG (1) SG143132A1 (ja)
TW (1) TWI377448B (ja)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI450047B (zh) * 2007-07-13 2014-08-21 Mapper Lithography Ip Bv 微影系統、夾緊方法及晶圓台
US8705010B2 (en) * 2007-07-13 2014-04-22 Mapper Lithography Ip B.V. Lithography system, method of clamping and wafer table
JP2013125791A (ja) * 2011-12-13 2013-06-24 Canon Inc 保持装置、描画装置、および、物品の製造方法
US10459353B2 (en) * 2013-03-15 2019-10-29 Taiwan Semiconductor Manufacturing Company, Ltd. Lithography system with an embedded cleaning module
US10459352B2 (en) 2015-08-31 2019-10-29 Taiwan Semiconductor Manufacturing Company, Ltd. Mask cleaning

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4918870A (en) * 1986-05-16 1990-04-24 Siltec Corporation Floating subcarriers for wafer polishing apparatus
JP3402681B2 (ja) * 1993-06-02 2003-05-06 サンエー技研株式会社 露光における位置合わせ方法
JPH09115800A (ja) * 1995-10-16 1997-05-02 Nikon Corp 露光装置
US20030179354A1 (en) * 1996-03-22 2003-09-25 Nikon Corporation Mask-holding apparatus for a light exposure apparatus and related scanning-exposure method
JP2000012648A (ja) * 1998-06-17 2000-01-14 Ebara Corp 素子製造工程における基材表面保護方法及び装置
KR20020006670A (ko) * 1999-03-12 2002-01-24 시마무라 테루오 노광장치 및 노광방법, 그리고 디바이스 제조방법
US6394109B1 (en) 1999-04-13 2002-05-28 Applied Materials, Inc. Method and apparatus for removing carbon contamination in a sub-atmospheric charged particle beam lithography system
EP1191580A1 (en) * 1999-04-27 2002-03-27 Nikon Corporation Stage device and exposure device
TW504605B (en) * 1999-12-03 2002-10-01 Asm Lithography Bv Lithographic projection apparatus, method of manufacturing a device using the same, the device and mask
KR20010095087A (ko) * 2000-03-30 2001-11-03 시마무라 테루오 노광장치, 노광방법 및 디바이스의 제조방법
JP2001358055A (ja) * 2000-06-15 2001-12-26 Nikon Corp 露光装置及びデバイス製造方法
JP3914386B2 (ja) 2000-12-28 2007-05-16 株式会社ルネサステクノロジ フォトマスク、その製造方法、パターン形成方法および半導体装置の製造方法
US6906783B2 (en) * 2002-02-22 2005-06-14 Asml Holding N.V. System for using a two part cover for protecting a reticle
US6806943B2 (en) * 2002-08-09 2004-10-19 International Business Machines Corporation Mask clamping device
JP2004140271A (ja) * 2002-10-21 2004-05-13 Nikon Corp 露光装置及びデバイス製造方法
US7384149B2 (en) * 2003-07-21 2008-06-10 Asml Netherlands B.V. Lithographic projection apparatus, gas purging method and device manufacturing method and purge gas supply system
US7236233B2 (en) * 2003-10-27 2007-06-26 Asml Netherlands B.V. Assembly of a reticle holder and a reticle
US7161663B2 (en) * 2004-07-22 2007-01-09 Asml Netherlands B.V. Lithographic apparatus
US7196775B2 (en) * 2004-08-23 2007-03-27 Asml Holding N.V. Patterned mask holding device and method using two holding systems
US7459701B2 (en) * 2005-06-08 2008-12-02 Asml Netherlands B.V. Stage apparatus, lithographic apparatus and device manufacturing method
US7633600B2 (en) * 2005-11-01 2009-12-15 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7884919B2 (en) * 2006-02-09 2011-02-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7733463B2 (en) * 2006-05-05 2010-06-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20070268476A1 (en) * 2006-05-19 2007-11-22 Nikon Corporation Kinematic chucks for reticles and other planar bodies
US7714981B2 (en) * 2006-10-30 2010-05-11 Asml Netherlands B.V. Lithographic apparatus and method
US8705010B2 (en) * 2007-07-13 2014-04-22 Mapper Lithography Ip B.V. Lithography system, method of clamping and wafer table
GB2469112A (en) * 2009-04-03 2010-10-06 Mapper Lithography Ip Bv Wafer support using controlled capillary liquid layer to hold and release wafer

Also Published As

Publication number Publication date
JP4833953B2 (ja) 2011-12-07
EP1923743A2 (en) 2008-05-21
TWI377448B (en) 2012-11-21
US20080117391A1 (en) 2008-05-22
JP2008131041A (ja) 2008-06-05
CN101183223B (zh) 2011-05-11
TW200834250A (en) 2008-08-16
KR100926157B1 (ko) 2009-11-10
EP1923743A3 (en) 2009-12-30
KR20080044783A (ko) 2008-05-21
US7933000B2 (en) 2011-04-26
CN101183223A (zh) 2008-05-21

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