SG133551A1 - Device manufacturing method and computer program product - Google Patents

Device manufacturing method and computer program product

Info

Publication number
SG133551A1
SG133551A1 SG200608857-9A SG2006088579A SG133551A1 SG 133551 A1 SG133551 A1 SG 133551A1 SG 2006088579 A SG2006088579 A SG 2006088579A SG 133551 A1 SG133551 A1 SG 133551A1
Authority
SG
Singapore
Prior art keywords
computer program
program product
device manufacturing
manufacturing
product
Prior art date
Application number
SG200608857-9A
Other languages
English (en)
Inventor
Leonardus Henricus Verstappen
Everhardus Cornelis Mos
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG133551A1 publication Critical patent/SG133551A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70466—Multiple exposures, e.g. combination of fine and coarse exposures, double patterning or multiple exposures for printing a single feature
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70625—Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/706843—Metrology apparatus
    • G03F7/706847—Production of measurement radiation, e.g. synchrotron, free-electron laser, plasma source or higher harmonic generation [HHG]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10—Measuring as part of the manufacturing process
    • H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Materials For Photolithography (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
SG200608857-9A 2005-12-21 2006-12-19 Device manufacturing method and computer program product SG133551A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/312,650 US7547495B2 (en) 2005-12-21 2005-12-21 Device manufacturing method and computer program product

Publications (1)

Publication Number Publication Date
SG133551A1 true SG133551A1 (en) 2007-07-30

Family

ID=37745947

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200608857-9A SG133551A1 (en) 2005-12-21 2006-12-19 Device manufacturing method and computer program product

Country Status (7)

Country Link
US (1) US7547495B2 (zh)
EP (1) EP1801657A1 (zh)
JP (1) JP4567658B2 (zh)
KR (1) KR100832078B1 (zh)
CN (1) CN1987658A (zh)
SG (1) SG133551A1 (zh)
TW (1) TW200728934A (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7917244B2 (en) * 2007-03-14 2011-03-29 Taiwan Semiconductor Manufacturing Company, Ltd. Method and system for reducing critical dimension side-to-side tilting error
US7869022B2 (en) * 2007-07-18 2011-01-11 Asml Netherlands B.V. Inspection method and apparatus lithographic apparatus, lithographic processing cell, device manufacturing method and distance measuring system
JP5192795B2 (ja) * 2007-12-06 2013-05-08 株式会社日立ハイテクノロジーズ 電子ビーム測定装置
NL2003919A (en) * 2008-12-24 2010-06-28 Asml Netherlands Bv An optimization method and a lithographic cell.

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05136033A (ja) * 1991-11-13 1993-06-01 Hitachi Ltd パターン形成方法及びその装置
JPH05243115A (ja) * 1992-01-22 1993-09-21 Nec Corp 半導体装置の製造方法
US5308741A (en) * 1992-07-31 1994-05-03 Motorola, Inc. Lithographic method using double exposure techniques, mask position shifting and light phase shifting
JPH11307449A (ja) * 1998-02-20 1999-11-05 Canon Inc 露光装置及びデバイスの製造方法
JP2001060546A (ja) 1999-08-20 2001-03-06 Nikon Corp 露光方法及び露光装置
US6451508B1 (en) * 2000-04-28 2002-09-17 International Business Machines Corporation Plural interleaved exposure process for increased feature aspect ratio in dense arrays
US6625512B1 (en) 2000-07-25 2003-09-23 Advanced Micro Devices, Inc. Method and apparatus for performing final critical dimension control
US6589713B1 (en) 2001-01-29 2003-07-08 Advanced Micro Devices, Inc. Process for reducing the pitch of contact holes, vias, and trench structures in integrated circuits
US6479200B1 (en) 2001-04-19 2002-11-12 Advanced Micro Devices, Inc. Method of controlling stepper process parameters based upon scatterometric measurements of DICD features
ATE328303T1 (de) * 2002-07-26 2006-06-15 Asml Masktools Bv Richtungsabhängige abschirmung zur benutzung mit dipolbelichtung
US6912438B2 (en) 2002-10-21 2005-06-28 Advanced Micro Devices, Inc. Using scatterometry to obtain measurements of in circuit structures
JP2004153120A (ja) * 2002-10-31 2004-05-27 Canon Inc 転写露光方法
SG137657A1 (en) * 2002-11-12 2007-12-28 Asml Masktools Bv Method and apparatus for performing model-based layout conversion for use with dipole illumination

Also Published As

Publication number Publication date
KR20070067623A (ko) 2007-06-28
JP2007173807A (ja) 2007-07-05
KR100832078B1 (ko) 2008-05-27
US20070141486A1 (en) 2007-06-21
EP1801657A1 (en) 2007-06-27
JP4567658B2 (ja) 2010-10-20
TW200728934A (en) 2007-08-01
CN1987658A (zh) 2007-06-27
US7547495B2 (en) 2009-06-16

Similar Documents

Publication Publication Date Title
EP1934720A4 (en) METHOD AND COMPUTER PROGRAM FOR DEVICE CONFIGURATION
EP1929394A4 (en) ELECTRONIC DEVICE, COMPUTER PROGRAM PRODUCT, AND CONTROL METHOD
EP1843348A4 (en) AV PROCESSING DEVICE, AV PROCESSING METHOD AND PROGRAM
EP1959417A4 (en) DISPLAY AND DISPLAY MANUFACTURING METHOD
EP1968720A4 (en) COMPUTER GAME DEVICE AND METHOD FOR COMPUTER GAMING
EP1835419A4 (en) DEVICE, METHOD AND INFORMATION PROGRAM FOR INFORMATION PROCESSING
EP1947638A4 (en) METHOD AND DEVICE FOR INFORMATION PROCESSING, AND PROGRAM
EP1862847A4 (en) DISPLAY DEVICE AND MANUFACTURING METHOD THEREFOR
EP2000917A4 (en) INFORMATION PROCESSING DEVICE, INFORMATION PROCESSING METHOD, AND COMPUTER PROGRAM
IL199543A0 (en) Electrical measuring device, method and computer program product
EP1860569A4 (en) INFORMATION PROCESSING DEVICE, INFORMATION PROCESSING METHOD, AND COMPUTER PROGRAM
EP1941820A4 (en) PISTON ROTATION PROCESS AND DEVICE THEREFOR
EP2028858A4 (en) INFORMATION PROCESSING DEVICE, INFORMATION PROCESSING METHOD AND COMPUTER PROGRAM
EP1956131A4 (en) SHEET FORMING DEVICE AND SHEET PRODUCTION METHOD
EP1843323A4 (en) INFORMATION PROCESSING DEVICE, INFORMATION PROCESSING PROCESS AND PROGRAM
EP1861770A4 (en) METHOD FOR ELECTRONIC PEN, COMPUTER PROGRAM AND ELECTRONIC PEN
GB0720879D0 (en) Network design processing device and method and program therefor
EP2096579A4 (en) DISPLAY DEVICE, DISPLAY METHOD, AND PROGRAM
EP1868104A4 (en) INFORMATION PROCESSING DEVICE, INFORMATION PROCESSING METHOD AND INFORMATION PROCESSING PROGRAM
GB2447154B (en) Information processing device, information processing method, and program
TWI339965B (en) Wireless terminal and computer program product
EP1901184A4 (en) INFORMATION PROCESSING DEVICE, METHOD, AND PROGRAM
EP1849902A4 (en) DESIGN DEVICE AND METHOD AND PROGRAM FOR MESHED PRODUCTS
EP1903493A4 (en) METHOD AND PROGRAM FOR COMPUTER PROCESSING
EP1967956A4 (en) INFORMATION PROCESSING DEVICE, INFORMATION PROCESSING PROCESS AND PROGRAM