SG132504A1 - Lithographic apparatus and device manufacturing method - Google Patents

Lithographic apparatus and device manufacturing method

Info

Publication number
SG132504A1
SG132504A1 SG200306873-1A SG2003068731A SG132504A1 SG 132504 A1 SG132504 A1 SG 132504A1 SG 2003068731 A SG2003068731 A SG 2003068731A SG 132504 A1 SG132504 A1 SG 132504A1
Authority
SG
Singapore
Prior art keywords
device manufacturing
lithographic apparatus
lithographic
manufacturing
Prior art date
Application number
SG200306873-1A
Other languages
English (en)
Inventor
Wouter Onno Pril
Der Pasch Engelbertus Anto Van
Robert F Dillon
Philip Dennis Henshaw
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG132504A1 publication Critical patent/SG132504A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02007—Two or more frequencies or sources used for interferometric measurement
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02012—Interferometers characterised by controlling or generating intrinsic radiation properties using temporal intensity variation
    • G01B9/02014—Interferometers characterised by controlling or generating intrinsic radiation properties using temporal intensity variation by using pulsed light
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02027—Two or more interferometric channels or interferometers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/0207—Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/0207—Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer
    • G01B9/02072—Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer by calibration or testing of interferometer
    • G01B9/02074—Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer by calibration or testing of interferometer of the detector
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/45—Multiple detectors for detecting interferometer signals
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/60—Reference interferometer, i.e. additional interferometer not interacting with object
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/70—Using polarization in the interferometer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
SG200306873-1A 2002-11-27 2003-11-24 Lithographic apparatus and device manufacturing method SG132504A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US42931402P 2002-11-27 2002-11-27

Publications (1)

Publication Number Publication Date
SG132504A1 true SG132504A1 (en) 2007-06-28

Family

ID=32298307

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200306873-1A SG132504A1 (en) 2002-11-27 2003-11-24 Lithographic apparatus and device manufacturing method

Country Status (8)

Country Link
US (1) US6987557B2 (fr)
EP (1) EP1424597B1 (fr)
JP (2) JP3996891B2 (fr)
KR (1) KR100588128B1 (fr)
CN (1) CN1503059B (fr)
DE (1) DE60322171D1 (fr)
SG (1) SG132504A1 (fr)
TW (1) TWI304157B (fr)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7310130B2 (en) * 2004-10-05 2007-12-18 Asml Netherlands B.V. Lithographic apparatus and position measuring method
US7271917B2 (en) * 2005-05-03 2007-09-18 Asml Netherlands B.V. Lithographic apparatus, position quantity detection system and method
KR100734287B1 (ko) * 2005-11-15 2007-07-02 삼성전자주식회사 블랭크 마스크 검사 장치 및 이를 이용한 블랭크 마스크의키 패턴 형성 방법과 이들을 이용한 마스크 패턴 형성 방법
US8233203B2 (en) * 2006-02-15 2012-07-31 Semiconductor Energy Laboratory Co., Ltd. Exposure method and method of manufacturing semiconductor device
US8053145B2 (en) * 2006-05-30 2011-11-08 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing holographic recording medium and method for manufacturing semiconductor device
JP4901784B2 (ja) * 2008-03-05 2012-03-21 株式会社日立ハイテクノロジーズ 荷電粒子線装置
JP5361230B2 (ja) * 2008-03-26 2013-12-04 株式会社ミツトヨ ２波長レーザ干渉計評価校正方法、評価校正装置および評価校正システム
DE102010029905A1 (de) * 2010-06-10 2011-12-15 Carl Zeiss Smt Gmbh Optisches System einer mikrolithographischen Projektionsbelichtungsanlage
CN105467769B (zh) * 2014-05-26 2022-03-11 李文迪 全光纤激光干涉光刻设备和方法
US9261794B1 (en) * 2014-12-09 2016-02-16 Cymer, Llc Compensation for a disturbance in an optical source
NL2017584A (en) 2015-10-27 2017-05-19 Asml Holding Nv Polarization independent metrology system
EP3165876A3 (fr) * 2015-11-03 2017-07-26 Hexagon Technology Center GmbH Appareil de mesure optoélectronique
DE102016215543A1 (de) * 2016-08-18 2018-02-22 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage mit einer Messvorrichtung zur Überwachung einer lateralen Abbildungsstabilität
CN106842830B (zh) * 2017-04-19 2018-05-18 广东工业大学 一种焦点探测侧面式光刻焦面位置的检测装置及方法
CN110553580B (zh) * 2019-06-04 2022-05-20 南京英特飞光电技术有限公司 一种倾斜入射相移干涉仪和直角棱镜大面测量方法
CN110319940B (zh) * 2019-08-08 2024-05-28 中国科学技术大学 高密度等离子体密度测量的激光光纤干涉仪诊断系统
CN115113375B (zh) * 2022-08-23 2022-11-18 立臻精密智造(昆山)有限公司 一种摄像模组及摄像装置

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0843152A2 (fr) * 1996-11-14 1998-05-20 Hewlett-Packard Company Amélioration du rapport signal-bruit dans un interféromètre à seconde harmonique
US5991033A (en) * 1996-09-20 1999-11-23 Sparta, Inc. Interferometer with air turbulence compensation
US6020964A (en) * 1997-12-02 2000-02-01 Asm Lithography B.V. Interferometer system and lithograph apparatus including an interferometer system
US6046792A (en) * 1996-03-06 2000-04-04 U.S. Philips Corporation Differential interferometer system and lithographic step-and-scan apparatus provided with such a system
EP1107068A2 (fr) * 1999-11-30 2001-06-13 Asm Lithography B.V. Appareil de projection lithographique avec système de positionnement d'un réflecteur
US20020048026A1 (en) * 2000-03-28 2002-04-25 Fumio Isshiki Laser interferometer displacement measuring system, exposure apparatus, and elecron beam lithography apparatus

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5404222A (en) * 1994-01-14 1995-04-04 Sparta, Inc. Interferametric measuring system with air turbulence compensation
JPH10206109A (ja) * 1997-01-24 1998-08-07 Nikon Corp 光波干渉測定装置
JPH1144503A (ja) * 1997-07-28 1999-02-16 Nikon Corp 光波干渉測定装置
US6573996B1 (en) * 1997-11-12 2003-06-03 Science Research Laboratory, Inc. Method and apparatus for enhanced precision interferometric distance measurement
JPH11166807A (ja) * 1997-12-05 1999-06-22 Nikon Corp 周波数分離装置および該周波数分離装置を備えた光波干渉測定装置
US6327039B1 (en) * 1998-02-23 2001-12-04 Zygo Corporation Interferometer and method for measuring the refractive index and optical path length effects of air
TW403937B (en) * 1998-03-06 2000-09-01 Nikon Corp Exposure device and method of manufacturing semiconductor device
US6014216A (en) * 1999-01-08 2000-01-11 Hewlett-Packard Company Architecture for air-turbulence-compensated dual-wavelength heterodyne interferometer
AU3363199A (en) * 1999-03-26 2000-10-16 Sparta, Inc. Self tracking beam delivery system
US6417927B2 (en) * 1999-04-28 2002-07-09 Zygo Corporation Method and apparatus for accurately compensating both long and short term fluctuations in the refractive index of air in an interferometer
DE60117107T2 (de) * 2000-07-14 2006-10-05 Asml Netherlands B.V. Lithographischer Projektionsapparat, Verfahren zur Herstellung eines Artikel, dabei erzeugter Artikel und Gaszusammensetzung
US6747729B2 (en) * 2000-07-14 2004-06-08 Asml Netherlands B.V. Lithographic projection apparatus, device manufacturing method, device manufactured thereby and gas composition

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6046792A (en) * 1996-03-06 2000-04-04 U.S. Philips Corporation Differential interferometer system and lithographic step-and-scan apparatus provided with such a system
US5991033A (en) * 1996-09-20 1999-11-23 Sparta, Inc. Interferometer with air turbulence compensation
EP0843152A2 (fr) * 1996-11-14 1998-05-20 Hewlett-Packard Company Amélioration du rapport signal-bruit dans un interféromètre à seconde harmonique
US6020964A (en) * 1997-12-02 2000-02-01 Asm Lithography B.V. Interferometer system and lithograph apparatus including an interferometer system
EP1107068A2 (fr) * 1999-11-30 2001-06-13 Asm Lithography B.V. Appareil de projection lithographique avec système de positionnement d'un réflecteur
US20020048026A1 (en) * 2000-03-28 2002-04-25 Fumio Isshiki Laser interferometer displacement measuring system, exposure apparatus, and elecron beam lithography apparatus

Also Published As

Publication number Publication date
US20040169837A1 (en) 2004-09-02
TW200424789A (en) 2004-11-16
EP1424597A3 (fr) 2006-05-17
TWI304157B (en) 2008-12-11
US6987557B2 (en) 2006-01-17
EP1424597B1 (fr) 2008-07-16
JP2007258749A (ja) 2007-10-04
CN1503059A (zh) 2004-06-09
KR100588128B1 (ko) 2006-06-09
JP4668953B2 (ja) 2011-04-13
JP2004179661A (ja) 2004-06-24
EP1424597A2 (fr) 2004-06-02
KR20040047671A (ko) 2004-06-05
CN1503059B (zh) 2011-09-07
DE60322171D1 (de) 2008-08-28
JP3996891B2 (ja) 2007-10-24

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