SG128447A1 - Lithographic apparatus and device manufacturing method - Google Patents

Lithographic apparatus and device manufacturing method

Info

Publication number
SG128447A1
SG128447A1 SG200305747A SG200305747A SG128447A1 SG 128447 A1 SG128447 A1 SG 128447A1 SG 200305747 A SG200305747 A SG 200305747A SG 200305747 A SG200305747 A SG 200305747A SG 128447 A1 SG128447 A1 SG 128447A1
Authority
SG
Singapore
Prior art keywords
lithographic apparatus
err
device manufacturing
perhalogenated
alkanes
Prior art date
Application number
SG200305747A
Other languages
English (en)
Inventor
Ralph Kurt
Aleksey Kolesnychenko
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG128447A1 publication Critical patent/SG128447A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning

Landscapes

  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Environmental & Geological Engineering (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Toxicology (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG200305747A 2002-09-30 2003-09-29 Lithographic apparatus and device manufacturing method SG128447A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP02256792 2002-09-30

Publications (1)

Publication Number Publication Date
SG128447A1 true SG128447A1 (en) 2007-01-30

Family

ID=32338168

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200305747A SG128447A1 (en) 2002-09-30 2003-09-29 Lithographic apparatus and device manufacturing method

Country Status (6)

Country Link
US (1) US20040105084A1 (ja)
JP (1) JP3977316B2 (ja)
KR (1) KR100585472B1 (ja)
CN (1) CN100437355C (ja)
SG (1) SG128447A1 (ja)
TW (1) TWI254839B (ja)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB0408543D0 (en) * 2004-04-16 2004-05-19 Boc Group Plc Cleaning of multi-layer mirrors
US20070030466A1 (en) * 2004-08-09 2007-02-08 Nikon Corporation Exposure apparatus control method, exposure method and apparatus using the control method, and device manufacturing method
US7561247B2 (en) * 2005-08-22 2009-07-14 Asml Netherlands B.V. Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic apparatus
JP2007067344A (ja) * 2005-09-02 2007-03-15 Canon Inc 露光装置および方法ならびにデバイス製造方法
US8317929B2 (en) * 2005-09-16 2012-11-27 Asml Netherlands B.V. Lithographic apparatus comprising an electrical discharge generator and method for cleaning an element of a lithographic apparatus
US7462850B2 (en) * 2005-12-08 2008-12-09 Asml Netherlands B.V. Radical cleaning arrangement for a lithographic apparatus
US7253875B1 (en) * 2006-03-03 2007-08-07 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7518128B2 (en) * 2006-06-30 2009-04-14 Asml Netherlands B.V. Lithographic apparatus comprising a cleaning arrangement, cleaning arrangement and method for cleaning a surface to be cleaned
EP1944652A1 (en) * 2007-01-10 2008-07-16 Carl Zeiss SMT AG A method for operating a euv lithography apparatus, and a euv lithography apparatus
JP2008263173A (ja) * 2007-03-16 2008-10-30 Canon Inc 露光装置
US20090025750A1 (en) * 2007-07-24 2009-01-29 Asml Netherlands B.V. Method for removal of a deposition from an optical element, lithographic apparatus, and method for manufacturing a device
US7894037B2 (en) * 2007-07-30 2011-02-22 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP5559562B2 (ja) 2009-02-12 2014-07-23 ギガフォトン株式会社 極端紫外光光源装置
NL2022644A (en) * 2018-03-05 2019-09-10 Asml Netherlands Bv Prolonging optical element lifetime in an euv lithography system

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4987008A (en) * 1985-07-02 1991-01-22 Semiconductor Energy Laboratory Co., Ltd. Thin film formation method
EP0874283A2 (en) * 1997-04-23 1998-10-28 Nikon Corporation Optical exposure apparatus and photo-cleaning method
US6252648B1 (en) * 1998-02-04 2001-06-26 Canon Kabushiki Kaisha Exposure apparatus and method of cleaning optical element of the same
US20020000519A1 (en) * 2000-04-14 2002-01-03 Masami Tsukamoto Contamination prevention in optical system
EP1186957A2 (en) * 2000-09-04 2002-03-13 Asm Lithography B.V. Lithographic projection apparatus
US6407385B1 (en) * 1998-12-18 2002-06-18 Nikon Corporation Methods and apparatus for removing particulate foreign matter from the surface of a sample
WO2002052347A1 (en) * 2000-12-21 2002-07-04 Euv Limited Liability Corporation Mitigation of radiation induced surface contamination
WO2003075098A2 (de) * 2002-03-07 2003-09-12 Carl Zeiss Smt Ag Vermeidung von kontamination auf optischen elementen und reinigung dieser elemente
US20040007246A1 (en) * 2002-07-15 2004-01-15 Michael Chan In-situ cleaning of light source collector optics

Family Cites Families (18)

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Publication number Priority date Publication date Assignee Title
US5523193A (en) * 1988-05-31 1996-06-04 Texas Instruments Incorporated Method and apparatus for patterning and imaging member
JP2528962B2 (ja) * 1989-02-27 1996-08-28 株式会社日立製作所 試料処理方法及び装置
EP0527166B1 (de) * 1990-05-02 1995-06-14 Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V. Belichtungsvorrichtung
JP2524869B2 (ja) * 1990-07-23 1996-08-14 大日本スクリーン製造株式会社 基板の表面処理方法および装置
US5221361A (en) * 1990-08-17 1993-06-22 E. I. Du Pont De Nemours And Company Compositions of 1,1,1,2,2,5,5,5,-octafluoro-4-trifluoromethylpentane and use thereof for cleaning solid surfaces
EP0909989A1 (en) * 1990-09-26 1999-04-21 Canon Kabushiki Kaisha Photolithographic processing method and apparatus
US5229872A (en) * 1992-01-21 1993-07-20 Hughes Aircraft Company Exposure device including an electrically aligned electronic mask for micropatterning
JPH07135150A (ja) * 1993-06-29 1995-05-23 Hitachi Ltd 有機物除去方法及び有機物除去装置
IL115931A0 (en) * 1995-11-09 1996-01-31 Oramir Semiconductor Ltd Laser stripping improvement by modified gas composition
EP0890136B9 (en) * 1996-12-24 2003-12-10 ASML Netherlands B.V. Two-dimensionally balanced positioning device with two object holders, and lithographic device provided with such a positioning device
DE69829614T2 (de) * 1997-03-10 2006-03-09 Asml Netherlands B.V. Lithographiegerät mit einer positioniervorrichtung mit zwei objekthaltern
US6268904B1 (en) * 1997-04-23 2001-07-31 Nikon Corporation Optical exposure apparatus and photo-cleaning method
US6225032B1 (en) * 1997-08-27 2001-05-01 Canon Kabushiki Kaisha Method for manufacturing liquid jet recording heads and a head manufactured by such method of manufacture
JPH11283903A (ja) * 1998-03-30 1999-10-15 Nikon Corp 投影光学系検査装置及び同装置を備えた投影露光装置
AU1175799A (en) * 1997-11-21 1999-06-15 Nikon Corporation Projection aligner and projection exposure method
US6394109B1 (en) * 1999-04-13 2002-05-28 Applied Materials, Inc. Method and apparatus for removing carbon contamination in a sub-atmospheric charged particle beam lithography system
US6571057B2 (en) * 2000-03-27 2003-05-27 Nikon Corporation Optical instrument, gas replacement method and cleaning method of optical instrument, exposure apparatus, exposure method and manufacturing method for devices
US6737358B2 (en) * 2002-02-13 2004-05-18 Intel Corporation Plasma etching uniformity control

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4987008A (en) * 1985-07-02 1991-01-22 Semiconductor Energy Laboratory Co., Ltd. Thin film formation method
EP0874283A2 (en) * 1997-04-23 1998-10-28 Nikon Corporation Optical exposure apparatus and photo-cleaning method
US6252648B1 (en) * 1998-02-04 2001-06-26 Canon Kabushiki Kaisha Exposure apparatus and method of cleaning optical element of the same
US6407385B1 (en) * 1998-12-18 2002-06-18 Nikon Corporation Methods and apparatus for removing particulate foreign matter from the surface of a sample
US20020000519A1 (en) * 2000-04-14 2002-01-03 Masami Tsukamoto Contamination prevention in optical system
EP1186957A2 (en) * 2000-09-04 2002-03-13 Asm Lithography B.V. Lithographic projection apparatus
WO2002052347A1 (en) * 2000-12-21 2002-07-04 Euv Limited Liability Corporation Mitigation of radiation induced surface contamination
WO2003075098A2 (de) * 2002-03-07 2003-09-12 Carl Zeiss Smt Ag Vermeidung von kontamination auf optischen elementen und reinigung dieser elemente
US20040007246A1 (en) * 2002-07-15 2004-01-15 Michael Chan In-situ cleaning of light source collector optics

Also Published As

Publication number Publication date
JP2004289117A (ja) 2004-10-14
KR100585472B1 (ko) 2006-06-07
TWI254839B (en) 2006-05-11
KR20040030323A (ko) 2004-04-09
CN100437355C (zh) 2008-11-26
TW200411338A (en) 2004-07-01
JP3977316B2 (ja) 2007-09-19
US20040105084A1 (en) 2004-06-03
CN1497351A (zh) 2004-05-19

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