SG121823A1 - Lithographic projection apparatus with multiple suppression meshes - Google Patents

Lithographic projection apparatus with multiple suppression meshes

Info

Publication number
SG121823A1
SG121823A1 SG200306862A SG200306862A SG121823A1 SG 121823 A1 SG121823 A1 SG 121823A1 SG 200306862 A SG200306862 A SG 200306862A SG 200306862 A SG200306862 A SG 200306862A SG 121823 A1 SG121823 A1 SG 121823A1
Authority
SG
Singapore
Prior art keywords
meshes
projection apparatus
lithographic projection
multiple suppression
suppression
Prior art date
Application number
SG200306862A
Other languages
English (en)
Inventor
Levinus Pieter Bakker
Frank Jeroen Pieter Schuurmans
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG121823A1 publication Critical patent/SG121823A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70941—Stray fields and charges, e.g. stray light, scattered light, flare, transmission loss
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
SG200306862A 2002-11-22 2003-11-21 Lithographic projection apparatus with multiple suppression meshes SG121823A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP02079864 2002-11-22

Publications (1)

Publication Number Publication Date
SG121823A1 true SG121823A1 (en) 2006-05-26

Family

ID=32695561

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200306862A SG121823A1 (en) 2002-11-22 2003-11-21 Lithographic projection apparatus with multiple suppression meshes

Country Status (6)

Country Link
US (1) US6906788B2 (zh)
JP (1) JP3813959B2 (zh)
KR (1) KR100588122B1 (zh)
CN (1) CN100487572C (zh)
SG (1) SG121823A1 (zh)
TW (1) TWI241465B (zh)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI275325B (en) * 2003-03-08 2007-03-01 Cymer Inc Discharge produced plasma EUV light source
US7217941B2 (en) * 2003-04-08 2007-05-15 Cymer, Inc. Systems and methods for deflecting plasma-generated ions to prevent the ions from reaching an internal component of an EUV light source
TWI237733B (en) * 2003-06-27 2005-08-11 Asml Netherlands Bv Laser produced plasma radiation system with foil trap
US7372623B2 (en) * 2005-03-29 2008-05-13 Asml Netherlands B.V. Multi-layer spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby
US7279690B2 (en) * 2005-03-31 2007-10-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
DE102005044141B4 (de) * 2005-09-15 2008-08-14 Qimonda Ag Belichtungsgerät und Verfahren zum Betrieb eines Belichtungsgeräts
US7714306B2 (en) * 2006-08-30 2010-05-11 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7889312B2 (en) * 2006-09-22 2011-02-15 Asml Netherlands B.V. Apparatus comprising a rotating contaminant trap
US7825390B2 (en) * 2007-02-14 2010-11-02 Asml Netherlands B.V. Apparatus with plasma radiation source and method of forming a beam of radiation and lithographic apparatus
JP2009070982A (ja) * 2007-09-12 2009-04-02 Nikon Corp 飛散粒子除去装置、飛散粒子の低減方法、光源装置、照明光学装置、露光装置及び電子デバイスの製造方法
US9052615B2 (en) * 2008-08-29 2015-06-09 Gigaphoton Inc. Extreme ultraviolet light source apparatus
JP5474522B2 (ja) * 2009-01-14 2014-04-16 ギガフォトン株式会社 極端紫外光源システム
JP5921879B2 (ja) * 2011-03-23 2016-05-24 ギガフォトン株式会社 ターゲット供給装置及び極端紫外光生成装置
DE102015215223A1 (de) * 2015-08-10 2017-02-16 Carl Zeiss Smt Gmbh EUV-Lithographiesystem

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1990005990A1 (en) * 1988-11-14 1990-05-31 Electron Vision Corporation Large-area uniform electron source
EP1182510A1 (en) * 2000-08-25 2002-02-27 Asm Lithography B.V. Lithographic projection apparatus and mask handling device
EP1223468A1 (en) * 2001-01-10 2002-07-17 ASML Netherlands BV Lithographic projection Apparatus and device manufacturing method

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3947374B2 (ja) * 2000-08-25 2007-07-18 エーエスエムエル ネザーランズ ビー．ブイ． 平板投影装置および素子製造方法
US6614505B2 (en) * 2001-01-10 2003-09-02 Asml Netherlands B.V. Lithographic projection apparatus, device manufacturing method, and device manufactured thereby

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1990005990A1 (en) * 1988-11-14 1990-05-31 Electron Vision Corporation Large-area uniform electron source
EP1182510A1 (en) * 2000-08-25 2002-02-27 Asm Lithography B.V. Lithographic projection apparatus and mask handling device
EP1223468A1 (en) * 2001-01-10 2002-07-17 ASML Netherlands BV Lithographic projection Apparatus and device manufacturing method

Also Published As

Publication number Publication date
US6906788B2 (en) 2005-06-14
KR100588122B1 (ko) 2006-06-09
KR20040045356A (ko) 2004-06-01
TWI241465B (en) 2005-10-11
US20040135985A1 (en) 2004-07-15
CN1506763A (zh) 2004-06-23
JP3813959B2 (ja) 2006-08-23
TW200421044A (en) 2004-10-16
JP2005005666A (ja) 2005-01-06
CN100487572C (zh) 2009-05-13

Similar Documents

Publication Publication Date Title
GB2385533B (en) Mask apparatus
HK1152117A1 (en) Exposure apparatus
GB2391173B (en) Intumescent firestopping apparatus
EP1484638A4 (en) PROJECTION SCREEN
AU308723S (en) Mask frame
GB0221268D0 (en) Image procssing
EP1570149A4 (en) SUPPORT DEVICE FOR ROLLER CURTAIN
SG115701A1 (en) Lithographic apparatus
EP1595490A4 (en) CLEANING SHEET
EP1550909A4 (en) PROJECTION DISPLAY DEVICE
EP1591053A4 (en) CLEANING SHEET
GB0211963D0 (en) An exposure device
SG121823A1 (en) Lithographic projection apparatus with multiple suppression meshes
SG118222A1 (en) Lithographic apparatus
IL157373A0 (en) Projecting reticle image
EP1480075A4 (en) PROJECTOR
GB2392040B (en) Image projecting apparatus
TWI350950B (en) Projection exposure device
GB2391481B (en) Laryngeal masks
GB2389977B (en) Projection system
GB0325557D0 (en) Screens
GB0218227D0 (en) Projection apparatus
EP1495363A4 (en) PROJECTION SCREEN DEVICE
GB2396268B (en) Projection system
GB0212792D0 (en) Screen printing