SG119223A1 - Lithographic apparatus and integrated circuit manufacturing method - Google Patents

Lithographic apparatus and integrated circuit manufacturing method

Info

Publication number
SG119223A1
SG119223A1 SG200403782A SG200403782A SG119223A1 SG 119223 A1 SG119223 A1 SG 119223A1 SG 200403782 A SG200403782 A SG 200403782A SG 200403782 A SG200403782 A SG 200403782A SG 119223 A1 SG119223 A1 SG 119223A1
Authority
SG
Singapore
Prior art keywords
integrated circuit
lithographic apparatus
circuit manufacturing
manufacturing
lithographic
Prior art date
Application number
SG200403782A
Other languages
English (en)
Inventor
Rutgerus Bartray Petrus
Josephus Box Wilhelmus
Jacobus Petrus Adria Dominicus
Antonius Johannes Lu Bernardus
Antonius Fransiscu Engelbertus
Wilhelmus Maria Van Der W Marc
Johannes Martinus Engels Marc
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG119223A1 publication Critical patent/SG119223A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
SG200403782A 2003-06-27 2004-06-23 Lithographic apparatus and integrated circuit manufacturing method SG119223A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP03077013 2003-06-27

Publications (1)

Publication Number Publication Date
SG119223A1 true SG119223A1 (en) 2006-02-28

Family

ID=34089663

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200403782A SG119223A1 (en) 2003-06-27 2004-06-23 Lithographic apparatus and integrated circuit manufacturing method

Country Status (7)

Country Link
US (2) US7471373B2 (de)
EP (1) EP1491961B1 (de)
JP (1) JP4323388B2 (de)
KR (1) KR100757534B1 (de)
CN (2) CN101639632B (de)
SG (1) SG119223A1 (de)
TW (1) TWI251129B (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI251129B (en) * 2003-06-27 2006-03-11 Asml Netherlands Bv Lithographic apparatus and integrated circuit manufacturing method
US7714981B2 (en) 2006-10-30 2010-05-11 Asml Netherlands B.V. Lithographic apparatus and method
CN102445854A (zh) * 2010-10-15 2012-05-09 上海微电子装备有限公司 工件台垂向位置测量系统
EP2492928A3 (de) 2011-02-22 2017-08-30 ASML Netherlands BV Elektromagnetisches Stellglied, Gestellvorrichtung und lithografische Vorrichtung
CN103673892B (zh) * 2013-11-21 2016-03-30 清华大学 一种对称式光栅外差干涉二次衍射测量装置
DE102014006305B4 (de) * 2014-04-30 2017-11-23 Attocube Systems Ag Optisches Längenmesssystem mit einem interferometrischen Wegsensor zur Integration in Werkzeugmaschinen und Halbleiter-Lithografiesystemen
CN105278255A (zh) * 2015-03-05 2016-01-27 杭州汇萃智能科技有限公司 一种磁浮平面电机非接触六自由度定位装置及方法
CN106773553B (zh) * 2017-03-06 2018-11-30 重庆京东方光电科技有限公司 承载装置和曝光设备

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5523193A (en) 1988-05-31 1996-06-04 Texas Instruments Incorporated Method and apparatus for patterning and imaging member
ATE123885T1 (de) 1990-05-02 1995-06-15 Fraunhofer Ges Forschung Belichtungsvorrichtung.
US5229872A (en) 1992-01-21 1993-07-20 Hughes Aircraft Company Exposure device including an electrically aligned electronic mask for micropatterning
US6049792A (en) * 1993-03-19 2000-04-11 Ricoh Company Limited Automatic invocation of computational resources without user intervention across a network
US5835061A (en) * 1995-06-06 1998-11-10 Wayport, Inc. Method and apparatus for geographic-based communications service
JP3689949B2 (ja) * 1995-12-19 2005-08-31 株式会社ニコン 投影露光装置、及び該投影露光装置を用いたパターン形成方法
WO1997033205A1 (en) 1996-03-06 1997-09-12 Philips Electronics N.V. Differential interferometer system and lithographic step-and-scan apparatus provided with such a system
DE69735016T2 (de) 1996-12-24 2006-08-17 Asml Netherlands B.V. Lithographisches Gerät mit zwei Objekthaltern
ATE216091T1 (de) 1997-01-29 2002-04-15 Micronic Laser Systems Ab Verfahren und gerät zur erzeugung eines musters auf einem mit fotoresist beschichteten substrat mittels fokusiertem laserstrahl
SE509062C2 (sv) 1997-02-28 1998-11-30 Micronic Laser Systems Ab Dataomvandlingsmetod för en laserskrivare med flera strålar för mycket komplexa mikrokolitografiska mönster
JP3626504B2 (ja) 1997-03-10 2005-03-09 アーエスエム リソグラフィ ベスローテン フェンノートシャップ ２個の物品ホルダを有する位置決め装置
AU1053199A (en) * 1997-11-14 1999-06-07 Nikon Corporation Exposure apparatus and method of manufacturing the same, and exposure method
JPH11219900A (ja) 1997-11-14 1999-08-10 Nikon Corp 露光装置及び露光方法
US6940582B1 (en) * 1999-09-20 2005-09-06 Nikon Corporation Parallel link mechanism, exposure system and method of manufacturing the same, and method of manufacturing devices
US6768124B2 (en) * 1999-10-19 2004-07-27 Nikon Corporation Reticle-focus detector, and charged-particle-beam microlithography apparatus and methods comprising same
JP3762307B2 (ja) * 2001-02-15 2006-04-05 キヤノン株式会社 レーザ干渉干渉計システムを含む露光装置
TWI251129B (en) 2003-06-27 2006-03-11 Asml Netherlands Bv Lithographic apparatus and integrated circuit manufacturing method

Also Published As

Publication number Publication date
US20050024611A1 (en) 2005-02-03
US7471373B2 (en) 2008-12-30
CN101639632A (zh) 2010-02-03
KR100757534B1 (ko) 2007-09-11
JP4323388B2 (ja) 2009-09-02
US20090061361A1 (en) 2009-03-05
TW200510959A (en) 2005-03-16
CN100538522C (zh) 2009-09-09
KR20050001427A (ko) 2005-01-06
EP1491961B1 (de) 2011-12-14
EP1491961A1 (de) 2004-12-29
JP2005020005A (ja) 2005-01-20
US7804584B2 (en) 2010-09-28
TWI251129B (en) 2006-03-11
CN1577103A (zh) 2005-02-09
CN101639632B (zh) 2012-03-28

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