SG118285A1 - Lithographic apparatus device manufacturing methodand device manufactured thereby - Google Patents

Lithographic apparatus device manufacturing methodand device manufactured thereby

Info

Publication number
SG118285A1
SG118285A1 SG200404074A SG200404074A SG118285A1 SG 118285 A1 SG118285 A1 SG 118285A1 SG 200404074 A SG200404074 A SG 200404074A SG 200404074 A SG200404074 A SG 200404074A SG 118285 A1 SG118285 A1 SG 118285A1
Authority
SG
Singapore
Prior art keywords
methodand
lithographic apparatus
device manufacturing
manufactured
device manufactured
Prior art date
Application number
SG200404074A
Other languages
English (en)
Inventor
Jeroen Ottens Joost
Adriaan Rudolf Van Empe Tjarko
Jacobus Johannes Maria Za Koen
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG118285A1 publication Critical patent/SG118285A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G03F7/70708—Chucks, e.g. chucking or un-chucking operations or structural details being electrostatic; Electrostatically deformable vacuum chucks
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70783—Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T279/00—Chucks or sockets
    • Y10T279/23—Chucks or sockets with magnetic or electrostatic means

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
SG200404074A 2003-07-15 2004-06-30 Lithographic apparatus device manufacturing methodand device manufactured thereby SG118285A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP03077222A EP1498777A1 (fr) 2003-07-15 2003-07-15 Dispositif de maintien d'un substrat et appareil de projection lithographique

Publications (1)

Publication Number Publication Date
SG118285A1 true SG118285A1 (en) 2006-01-27

Family

ID=33462169

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200404074A SG118285A1 (en) 2003-07-15 2004-06-30 Lithographic apparatus device manufacturing methodand device manufactured thereby

Country Status (7)

Country Link
US (1) US7161662B2 (fr)
EP (1) EP1498777A1 (fr)
JP (1) JP4074267B2 (fr)
KR (1) KR100804178B1 (fr)
CN (1) CN100510966C (fr)
SG (1) SG118285A1 (fr)
TW (1) TWI240804B (fr)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7041989B1 (en) 2004-10-22 2006-05-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20060232753A1 (en) * 2005-04-19 2006-10-19 Asml Holding N.V. Liquid immersion lithography system with tilted liquid flow
NL2007768A (en) 2010-12-14 2012-06-18 Asml Netherlands Bv Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder.
WO2012103967A1 (fr) * 2011-02-01 2012-08-09 Asml Netherlands B.V. Table de substrat, dispositif lithographique et procédé de fabrication de dispositif
EP2490073B1 (fr) * 2011-02-18 2015-09-23 ASML Netherlands BV Porte-substrat, appareil lithographique et procédé de fabrication d'un porte-substrat
NL2008630A (en) 2011-04-27 2012-10-30 Asml Netherlands Bv Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder.
NL2009487A (en) 2011-10-14 2013-04-16 Asml Netherlands Bv Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder.
EP3683627A1 (fr) 2012-02-03 2020-07-22 ASML Netherlands B.V. Porte-substrat et appareil lithographique
CN105934715B (zh) * 2014-01-20 2019-01-01 Asml荷兰有限公司 衬底保持件、用于光刻设备的支撑台、光刻设备和器件制造方法
TWI546464B (zh) * 2014-05-27 2016-08-21 財團法人金屬工業研究發展中心 多孔質氣靜壓軸承之製作方法
JP2023500106A (ja) * 2019-10-29 2023-01-04 エーエスエムエル ホールディング エヌ．ブイ． リソグラフィ装置および静電クランプの設計
WO2021094057A1 (fr) * 2019-11-14 2021-05-20 Asml Netherlands B.V. Support de substrat, appareil de lithographie, procédé pour manipuler la distribution de charge et procédé de préparation d'un substrat
JP2022060859A (ja) * 2020-10-05 2022-04-15 キオクシア株式会社 静電チャック装置及び半導体製造装置
WO2023285139A1 (fr) * 2021-07-13 2023-01-19 Asml Netherlands B.V. Système de lithographie, compensateur d'affaissement de substrat et procédé

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3471827D1 (en) 1983-09-30 1988-07-07 Philips Electronic Associated Electrostatic chuck and loading method
GB2154365A (en) * 1984-02-10 1985-09-04 Philips Electronic Associated Loading semiconductor wafers on an electrostatic chuck
FR2661039B1 (fr) 1990-04-12 1997-04-30 Commissariat Energie Atomique Porte-substrat electrostatique.
US5094536A (en) * 1990-11-05 1992-03-10 Litel Instruments Deformable wafer chuck
JPH07153825A (ja) * 1993-11-29 1995-06-16 Toto Ltd 静電チャック及びこの静電チャックを用いた被吸着体の処理方法
US5646814A (en) * 1994-07-15 1997-07-08 Applied Materials, Inc. Multi-electrode electrostatic chuck
US5532903A (en) * 1995-05-03 1996-07-02 International Business Machines Corporation Membrane electrostatic chuck
US5886863A (en) * 1995-05-09 1999-03-23 Kyocera Corporation Wafer support member
US5838529A (en) * 1995-12-22 1998-11-17 Lam Research Corporation Low voltage electrostatic clamp for substrates such as dielectric substrates
JP3983387B2 (ja) 1998-09-29 2007-09-26 日本碍子株式会社 静電チャック
JP2000311933A (ja) * 1999-04-27 2000-11-07 Canon Inc 基板保持装置、基板搬送システム、露光装置、塗布装置およびデバイス製造方法ならびに基板保持部クリーニング方法
JP3805134B2 (ja) * 1999-05-25 2006-08-02 東陶機器株式会社 絶縁性基板吸着用静電チャック
US6268994B1 (en) * 1999-07-09 2001-07-31 Dorsey Gage, Inc. Electrostatic chuck and method of manufacture
EP1077393A2 (fr) * 1999-08-19 2001-02-21 Canon Kabushiki Kaisha Système d'attraction et de maintien d'un substrat pour utiliser dans un appareil d'exposition
KR20010040072A (ko) 1999-10-14 2001-05-15 하이든 마틴 웨이퍼-접촉 전극을 지닌 정전 척 및 웨이퍼를 처킹하는방법
JP2001332609A (ja) * 2000-03-13 2001-11-30 Nikon Corp 基板保持装置及び露光装置
JP4312394B2 (ja) * 2001-01-29 2009-08-12 日本碍子株式会社 静電チャックおよび基板処理装置
US20030098965A1 (en) * 2001-11-29 2003-05-29 Mike Binnard System and method for supporting a device holder with separate components
US7092231B2 (en) * 2002-08-23 2006-08-15 Asml Netherlands B.V. Chuck, lithographic apparatus and device manufacturing method
EP1391786B1 (fr) * 2002-08-23 2010-10-06 ASML Netherlands B.V. Support, appareil lithographique et méthode de fabrication d'un dispositif

Also Published As

Publication number Publication date
KR20050008514A (ko) 2005-01-21
KR100804178B1 (ko) 2008-02-18
EP1498777A1 (fr) 2005-01-19
TW200510776A (en) 2005-03-16
CN100510966C (zh) 2009-07-08
US7161662B2 (en) 2007-01-09
CN1577109A (zh) 2005-02-09
JP4074267B2 (ja) 2008-04-09
JP2005039274A (ja) 2005-02-10
TWI240804B (en) 2005-10-01
US20050030515A1 (en) 2005-02-10

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