SG118222A1 - Lithographic apparatus - Google Patents
Lithographic apparatusInfo
- Publication number
- SG118222A1 SG118222A1 SG200307725A SG200307725A SG118222A1 SG 118222 A1 SG118222 A1 SG 118222A1 SG 200307725 A SG200307725 A SG 200307725A SG 200307725 A SG200307725 A SG 200307725A SG 118222 A1 SG118222 A1 SG 118222A1
- Authority
- SG
- Singapore
- Prior art keywords
- lithographic apparatus
- lithographic
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP02258866 | 2002-12-23 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG118222A1 true SG118222A1 (en) | 2006-01-27 |
Family
ID=32798726
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200307725A SG118222A1 (en) | 2002-12-23 | 2003-12-23 | Lithographic apparatus |
Country Status (6)
Country | Link |
---|---|
US (1) | US6956222B2 (zh) |
JP (1) | JP4204964B2 (zh) |
KR (1) | KR100616602B1 (zh) |
CN (1) | CN1311301C (zh) |
SG (1) | SG118222A1 (zh) |
TW (1) | TWI254841B (zh) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8169591B2 (en) | 2004-08-03 | 2012-05-01 | Nikon Corporation | Exposure apparatus, exposure method, and method for producing device |
US7564536B2 (en) * | 2005-11-08 | 2009-07-21 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7649611B2 (en) | 2005-12-30 | 2010-01-19 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
KR20090018916A (ko) * | 2006-05-19 | 2009-02-24 | 가부시키가이샤 니콘 | 레티클 및 다른 평면형 바디용 척 |
US20070268476A1 (en) * | 2006-05-19 | 2007-11-22 | Nikon Corporation | Kinematic chucks for reticles and other planar bodies |
US20070292245A1 (en) * | 2006-05-25 | 2007-12-20 | Nikon Corporation | Stage assembly with secure device holder |
US7675607B2 (en) * | 2006-07-14 | 2010-03-09 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7678458B2 (en) * | 2007-01-24 | 2010-03-16 | Asml Holding N.V. | Bonding silicon silicon carbide to glass ceramics |
US7960708B2 (en) * | 2007-03-13 | 2011-06-14 | University Of Houston | Device and method for manufacturing a particulate filter with regularly spaced micropores |
JP5264112B2 (ja) * | 2007-07-11 | 2013-08-14 | キヤノン株式会社 | 露光装置 |
NL1036735A1 (nl) * | 2008-04-10 | 2009-10-13 | Asml Holding Nv | Shear-layer chuck for lithographic apparatus. |
WO2010020337A1 (en) | 2008-08-21 | 2010-02-25 | Asml Holding Nv | Euv reticle substrates with high thermal conductivity |
US8994923B2 (en) * | 2008-09-22 | 2015-03-31 | Nikon Corporation | Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method |
US8325325B2 (en) * | 2008-09-22 | 2012-12-04 | Nikon Corporation | Movable body apparatus, movable body drive method, exposure apparatus, exposure method, and device manufacturing method |
US8773635B2 (en) * | 2008-12-19 | 2014-07-08 | Nikon Corporation | Exposure apparatus, exposure method, and device manufacturing method |
JP6130703B2 (ja) * | 2013-04-01 | 2017-05-17 | キヤノン株式会社 | ホルダ、ステージ装置、リソグラフィ装置及び物品の製造方法 |
US11187998B2 (en) | 2017-11-20 | 2021-11-30 | Asml Netherlands B.V. | Substrate holder, substrate support and method of clamping a substrate to a clamping system |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5532903A (en) * | 1995-05-03 | 1996-07-02 | International Business Machines Corporation | Membrane electrostatic chuck |
US6399143B1 (en) * | 1996-04-09 | 2002-06-04 | Delsys Pharmaceutical Corporation | Method for clamping and electrostatically coating a substrate |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3974382A (en) | 1975-01-06 | 1976-08-10 | Massachusetts Institute Of Technology | Lithographic mask attraction system |
US4384918A (en) | 1980-09-30 | 1983-05-24 | Fujitsu Limited | Method and apparatus for dry etching and electrostatic chucking device used therein |
JPS5779848U (zh) | 1980-10-31 | 1982-05-17 | ||
GB2106325A (en) | 1981-09-14 | 1983-04-07 | Philips Electronic Associated | Electrostatic chuck |
US4551192A (en) | 1983-06-30 | 1985-11-05 | International Business Machines Corporation | Electrostatic or vacuum pinchuck formed with microcircuit lithography |
GB2268447B (en) | 1992-07-02 | 1996-07-10 | Secr Defence | Packaging materials |
JP3254467B2 (ja) * | 1992-10-21 | 2002-02-04 | 日本電信電話株式会社 | ウエハ保持機構 |
US5350479A (en) | 1992-12-02 | 1994-09-27 | Applied Materials, Inc. | Electrostatic chuck for high power plasma processing |
JPH07153825A (ja) | 1993-11-29 | 1995-06-16 | Toto Ltd | 静電チャック及びこの静電チャックを用いた被吸着体の処理方法 |
US5885469B1 (en) | 1996-11-05 | 2000-08-08 | Applied Materials Inc | Topographical structure of an electrostatic chuck and method of fabricating same |
JP4075966B2 (ja) * | 1996-03-06 | 2008-04-16 | エーエスエムエル ネザーランズ ビー.ブイ. | 差分干渉計システム及びこのシステムを具えたリソグラフステップアンドスキャン装置 |
US5656093A (en) * | 1996-03-08 | 1997-08-12 | Applied Materials, Inc. | Wafer spacing mask for a substrate support chuck and method of fabricating same |
US5745332A (en) | 1996-05-08 | 1998-04-28 | Applied Materials, Inc. | Monopolar electrostatic chuck having an electrode in contact with a workpiece |
JPH10116760A (ja) * | 1996-10-08 | 1998-05-06 | Nikon Corp | 露光装置及び基板保持装置 |
US6217655B1 (en) | 1997-01-31 | 2001-04-17 | Applied Materials, Inc. | Stand-off pad for supporting a wafer on a substrate support chuck |
JP2001023886A (ja) * | 1999-07-08 | 2001-01-26 | Nikon Corp | 試料保持装置及び露光装置 |
TW504605B (en) | 1999-12-03 | 2002-10-01 | Asm Lithography Bv | Lithographic projection apparatus, method of manufacturing a device using the same, the device and mask |
JP4700819B2 (ja) * | 2000-03-10 | 2011-06-15 | キヤノン株式会社 | 基板保持装置、半導体製造装置および半導体デバイス製造方法 |
JP2002217276A (ja) * | 2001-01-17 | 2002-08-02 | Ushio Inc | ステージ装置 |
-
2003
- 2003-12-22 CN CNB2003101220725A patent/CN1311301C/zh not_active Expired - Fee Related
- 2003-12-22 JP JP2003424900A patent/JP4204964B2/ja not_active Expired - Fee Related
- 2003-12-22 KR KR1020030094519A patent/KR100616602B1/ko not_active IP Right Cessation
- 2003-12-22 TW TW092136408A patent/TWI254841B/zh not_active IP Right Cessation
- 2003-12-23 US US10/743,276 patent/US6956222B2/en not_active Expired - Fee Related
- 2003-12-23 SG SG200307725A patent/SG118222A1/en unknown
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5532903A (en) * | 1995-05-03 | 1996-07-02 | International Business Machines Corporation | Membrane electrostatic chuck |
US6399143B1 (en) * | 1996-04-09 | 2002-06-04 | Delsys Pharmaceutical Corporation | Method for clamping and electrostatically coating a substrate |
Also Published As
Publication number | Publication date |
---|---|
CN1311301C (zh) | 2007-04-18 |
TW200421048A (en) | 2004-10-16 |
US6956222B2 (en) | 2005-10-18 |
CN1514307A (zh) | 2004-07-21 |
TWI254841B (en) | 2006-05-11 |
KR20040056376A (ko) | 2004-06-30 |
KR100616602B1 (ko) | 2006-08-25 |
JP2004207734A (ja) | 2004-07-22 |
JP4204964B2 (ja) | 2009-01-07 |
US20040178362A1 (en) | 2004-09-16 |
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