SG11202110046YA - Controlling exhaust gas pressure of a plasma reactor for plasma stability - Google Patents

Controlling exhaust gas pressure of a plasma reactor for plasma stability

Info

Publication number
SG11202110046YA
SG11202110046YA SG11202110046YA SG11202110046YA SG11202110046YA SG 11202110046Y A SG11202110046Y A SG 11202110046YA SG 11202110046Y A SG11202110046Y A SG 11202110046YA SG 11202110046Y A SG11202110046Y A SG 11202110046YA SG 11202110046Y A SG11202110046Y A SG 11202110046YA
Authority
SG
Singapore
Prior art keywords
plasma
exhaust gas
gas pressure
controlling exhaust
stability
Prior art date
Application number
SG11202110046YA
Inventor
Iii George Stephen Leonard
Stefan Andrew Mcclelland
Fei Xie
Wei Li
Curtis Peter Tom
Jae Mo Koo
Original Assignee
Recarbon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Recarbon Inc filed Critical Recarbon Inc
Publication of SG11202110046YA publication Critical patent/SG11202110046YA/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H01J37/32651—Shields, e.g. dark space shields, Faraday shields
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J19/088—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/04—Optical or mechanical part supplementary adjustable parts
    • G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
    • G01J1/0425—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings using optical fibers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/04—Optical or mechanical part supplementary adjustable parts
    • G01J1/0488—Optical or mechanical part supplementary adjustable parts with spectral filtering
    • G01J1/0492—Optical or mechanical part supplementary adjustable parts with spectral filtering using at least two different filters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
    • G01J1/4228—Photometry, e.g. photographic exposure meter using electric radiation detectors arrangements with two or more detectors, e.g. for sensitivity compensation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
    • G01J1/429—Photometry, e.g. photographic exposure meter using electric radiation detectors applied to measurement of ultraviolet light
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/0014—Radiation pyrometry, e.g. infrared or optical thermometry for sensing the radiation from gases, flames
    • G01J5/0018—Flames, plasma or welding
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/32229—Waveguides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H01J37/32449—Gas control, e.g. control of the gas flow
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32513—Sealing means, e.g. sealing between different parts of the vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32522—Temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32816—Pressure
    • H01J37/32834—Exhausting
    • H01J37/32844—Treating effluent gases
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H01J37/32972—Spectral analysis
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/461—Microwave discharges
    • H05H1/4622—Microwave discharges using waveguides
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F01—MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
    • F01N—GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR MACHINES OR ENGINES IN GENERAL; GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR INTERNAL COMBUSTION ENGINES
    • F01N2240/00—Combination or association of two or more different exhaust treating devices, or of at least one such device with an auxiliary device, not covered by indexing codes F01N2230/00 or F01N2250/00, one of the devices being
    • F01N2240/28—Combination or association of two or more different exhaust treating devices, or of at least one such device with an auxiliary device, not covered by indexing codes F01N2230/00 or F01N2250/00, one of the devices being a plasma reactor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/1502—Mechanical adjustments
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
    • Y02C20/00—Capture or disposal of greenhouse gases
    • Y02C20/30—Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Power Engineering (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Drying Of Semiconductors (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Manufacture And Refinement Of Metals (AREA)
SG11202110046YA 2019-03-25 2020-02-29 Controlling exhaust gas pressure of a plasma reactor for plasma stability SG11202110046YA (en)

Applications Claiming Priority (9)

Application Number Priority Date Filing Date Title
US201962823436P 2019-03-25 2019-03-25
US201962823484P 2019-03-25 2019-03-25
US201962823517P 2019-03-25 2019-03-25
US201962823514P 2019-03-25 2019-03-25
US201962823505P 2019-03-25 2019-03-25
US201962823492P 2019-03-25 2019-03-25
US201962823508P 2019-03-25 2019-03-25
US16/790,644 US20200312629A1 (en) 2019-03-25 2020-02-13 Controlling exhaust gas pressure of a plasma reactor for plasma stability
PCT/US2020/020559 WO2020197702A1 (en) 2019-03-25 2020-02-29 Controlling exhaust gas pressure of a plasma reactor for plasma stability

Publications (1)

Publication Number Publication Date
SG11202110046YA true SG11202110046YA (en) 2021-10-28

Family

ID=72604262

Family Applications (4)

Application Number Title Priority Date Filing Date
SG11202110046YA SG11202110046YA (en) 2019-03-25 2020-02-29 Controlling exhaust gas pressure of a plasma reactor for plasma stability
SG11202110054TA SG11202110054TA (en) 2019-03-25 2020-02-29 Plasma reactor for processing gas
SG11202110053QA SG11202110053QA (en) 2019-03-25 2020-03-01 Plasma reactors having recuperators
SG11202110051UA SG11202110051UA (en) 2019-03-25 2020-03-17 Optical system for monitoring plasma reactions and reactors

Family Applications After (3)

Application Number Title Priority Date Filing Date
SG11202110054TA SG11202110054TA (en) 2019-03-25 2020-02-29 Plasma reactor for processing gas
SG11202110053QA SG11202110053QA (en) 2019-03-25 2020-03-01 Plasma reactors having recuperators
SG11202110051UA SG11202110051UA (en) 2019-03-25 2020-03-17 Optical system for monitoring plasma reactions and reactors

Country Status (9)

Country Link
US (6) US20200312629A1 (en)
EP (5) EP3948927A4 (en)
JP (4) JP7514251B2 (en)
KR (5) KR20210127781A (en)
CN (5) CN113767448A (en)
AU (4) AU2020245070B2 (en)
CA (4) CA3134268A1 (en)
SG (4) SG11202110046YA (en)
WO (6) WO2020197701A1 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20200312629A1 (en) 2019-03-25 2020-10-01 Recarbon, Inc. Controlling exhaust gas pressure of a plasma reactor for plasma stability
MX2023014273A (en) * 2021-06-02 2024-06-05 Rimere Llc Systems and methods of plasma generation with microwaves.
WO2024024817A1 (en) * 2022-07-27 2024-02-01 株式会社アビット・テクノロジーズ Microwave plasma generation device, microwave plasma processing device, and microwave plasma processing method
WO2024064319A1 (en) * 2022-09-23 2024-03-28 Lam Research Corporation Gas distribution port insert and apparatus including the same
US20240142419A1 (en) * 2022-10-27 2024-05-02 Recarbon, Inc. Proof of work for carbon reduction/reclamation

Family Cites Families (98)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3911318A (en) * 1972-03-29 1975-10-07 Fusion Systems Corp Method and apparatus for generating electromagnetic radiation
JPS61189440A (en) * 1985-02-19 1986-08-23 Hokkaido Univ Measuring device for physical properties of plasma
US6214119B1 (en) * 1986-04-18 2001-04-10 Applied Materials, Inc. Vacuum substrate processing system having multiple processing chambers and a central load/unload chamber
US4841925A (en) * 1986-12-22 1989-06-27 Combustion Electromagnetics, Inc. Enhanced flame ignition for hydrocarbon fuels
US5125358A (en) * 1988-07-26 1992-06-30 Matsushita Electric Industrial Co., Ltd. Microwave plasma film deposition system
JP2743585B2 (en) * 1990-01-16 1998-04-22 株式会社日立製作所 Microwave plasma processing equipment
JP3211290B2 (en) * 1991-10-21 2001-09-25 ソニー株式会社 Method for forming semiconductor device
DE4230290A1 (en) * 1992-09-10 1994-03-17 Leybold Ag Appts. for producing plasma using cathode sputtering - comprises plasma chamber, target connected to electrode, magnetron, and microwave emitter
US5479254A (en) * 1993-10-22 1995-12-26 Woskov; Paul P. Continuous, real time microwave plasma element sensor
US5671045A (en) * 1993-10-22 1997-09-23 Masachusetts Institute Of Technology Microwave plasma monitoring system for the elemental composition analysis of high temperature process streams
US5985032A (en) * 1995-05-17 1999-11-16 Matsushita Electric Industrial Co., Ltd. Semiconductor manufacturing apparatus
EP0961527A1 (en) * 1998-05-26 1999-12-01 The Lincoln Electric Company Welding torch
JP3364830B2 (en) * 1998-06-09 2003-01-08 株式会社日立製作所 Ion beam processing equipment
JP2000133494A (en) * 1998-10-23 2000-05-12 Mitsubishi Heavy Ind Ltd Microwave plasma generation device and method
JP2965293B1 (en) * 1998-11-10 1999-10-18 川崎重工業株式会社 Electron beam excited plasma generator
JP2001232180A (en) * 2000-02-25 2001-08-28 Toshiba Corp Device for decomposition of compound with high frequency plasma, method for decomposition of compound and system for decomposition of compound
US6401653B1 (en) 2000-04-18 2002-06-11 Daihen Corporation Microwave plasma generator
US6603269B1 (en) * 2000-06-13 2003-08-05 Applied Materials, Inc. Resonant chamber applicator for remote plasma source
JP2001358125A (en) 2000-06-14 2001-12-26 Shibaura Mechatronics Corp Plasma processing apparatus
US6630053B2 (en) * 2000-08-22 2003-10-07 Asm Japan K.K. Semiconductor processing module and apparatus
DE10112494C2 (en) * 2001-03-15 2003-12-11 Mtu Aero Engines Gmbh Method for plasma welding
US6677604B2 (en) * 2001-03-30 2004-01-13 Tokyo Electron Limited Optical system and method for plasma optical emission analysis
US6824748B2 (en) * 2001-06-01 2004-11-30 Applied Materials, Inc. Heated catalytic treatment of an effluent gas from a substrate fabrication process
JP2003161700A (en) 2001-11-29 2003-06-06 Mitsubishi Heavy Ind Ltd Method and apparatus for analyzing component of cement
US7056416B2 (en) * 2002-02-15 2006-06-06 Matsushita Electric Industrial Co., Ltd. Atmospheric pressure plasma processing method and apparatus
JP3723783B2 (en) * 2002-06-06 2005-12-07 東京エレクトロン株式会社 Plasma processing equipment
TW200405770A (en) * 2002-08-30 2004-04-01 Axcelis Tech Inc Gas tube end cap for a microwave plasma generator
TW551782U (en) * 2002-10-09 2003-09-01 Ind Tech Res Inst Microwave plasma processing device
DE10251435B3 (en) * 2002-10-30 2004-05-27 Xtreme Technologies Gmbh Radiation source for extreme UV radiation for photolithographic exposure applications for semiconductor chip manufacture
US6927358B2 (en) 2003-01-31 2005-08-09 Advanced Energy Industries, Inc. Vacuum seal protection in a dielectric break
JP2004288482A (en) 2003-03-24 2004-10-14 Nippon Seiki Co Ltd Organic el panel
US8110155B2 (en) * 2003-06-20 2012-02-07 Drexel University Vortex reactor and method of using it
US7867457B2 (en) 2003-06-20 2011-01-11 Drexel University Plasma reactor for the production of hydrogen-rich gas
US7169625B2 (en) * 2003-07-25 2007-01-30 Applied Materials, Inc. Method for automatic determination of semiconductor plasma chamber matching and source of fault by comprehensive plasma monitoring
US7164095B2 (en) * 2004-07-07 2007-01-16 Noritsu Koki Co., Ltd. Microwave plasma nozzle with enhanced plume stability and heating efficiency
US20060021633A1 (en) * 2004-07-27 2006-02-02 Applied Materials, Inc. Closed loop clean gas control
GB2442990A (en) * 2004-10-04 2008-04-23 C Tech Innovation Ltd Microwave plasma apparatus
JP2006114450A (en) * 2004-10-18 2006-04-27 Yutaka Electronics Industry Co Ltd Plasma generating device
US7428915B2 (en) * 2005-04-26 2008-09-30 Applied Materials, Inc. O-ringless tandem throttle valve for a plasma reactor chamber
KR100522167B1 (en) 2005-05-26 2005-10-18 한국기계연구원 Plasma reaction apparatus
JP4878782B2 (en) * 2005-07-05 2012-02-15 シャープ株式会社 Plasma processing apparatus and plasma processing method
US8366829B2 (en) * 2005-08-05 2013-02-05 Advanced Micro-Fabrication Equipment, Inc. Asia Multi-station decoupled reactive ion etch chamber
JP2007088199A (en) * 2005-09-22 2007-04-05 Canon Inc Processing equipment
JP5050369B2 (en) * 2006-03-06 2012-10-17 東京エレクトロン株式会社 Processing equipment
EP2007175A4 (en) * 2006-03-07 2014-05-14 Univ Ryukyus Plasma generator and method of generating plasma using the same
JP5303451B2 (en) * 2006-04-07 2013-10-02 キネテイツク・リミテツド Hydrogen production
KR100885187B1 (en) 2007-05-10 2009-02-23 삼성전자주식회사 Method And System For Monitoring State Of Plasma Chamber
TW200848151A (en) * 2007-05-11 2008-12-16 Plasco Energy Group Inc A gas reformulation system comprising means to optimise the effectiveness of gas conversion
US20080296294A1 (en) * 2007-05-30 2008-12-04 Han Sup Uhm Pure steam torch by microwaves for reforming of hydrocarbon fuels
WO2009060214A1 (en) * 2007-11-06 2009-05-14 Microoncology Limited Hydroxyl radical producing plasma sterilisation apparatus
JP5243089B2 (en) 2008-04-09 2013-07-24 東京エレクトロン株式会社 Seal structure of plasma processing apparatus, sealing method, and plasma processing apparatus
CN101346032A (en) * 2008-04-24 2009-01-14 大连海事大学 Barometric pressure microwave plasma generation device
JP4694596B2 (en) * 2008-06-18 2011-06-08 東京エレクトロン株式会社 Microwave plasma processing apparatus and microwave power feeding method
KR100951631B1 (en) * 2008-07-07 2010-04-09 김익년 Plasma reactor for eliminating waste gases and gas scrubber using the same
US20100074808A1 (en) * 2008-09-23 2010-03-25 Sang Hun Lee Plasma generating system
JP2011077322A (en) * 2009-09-30 2011-04-14 Tokyo Electron Ltd Method for depositing crystalline silicon film and plasma cvd device
JP5479013B2 (en) * 2009-09-30 2014-04-23 東京エレクトロン株式会社 Plasma processing apparatus and slow wave plate used therefor
US8742665B2 (en) * 2009-11-18 2014-06-03 Applied Materials, Inc. Plasma source design
KR20120011481A (en) 2010-07-29 2012-02-08 자동차부품연구원 Heat exchanger for waste heat of exhaust gas
GB201021860D0 (en) 2010-12-23 2011-02-02 Element Six Ltd A microwave plasma reactor for diamond synthesis
US20120186747A1 (en) * 2011-01-26 2012-07-26 Obama Shinji Plasma processing apparatus
GB2490355B (en) * 2011-04-28 2015-10-14 Gasplas As Method for processing a gas and a device for performing the method
US20120326803A1 (en) * 2011-06-24 2012-12-27 Amarante Technologies, Inc. Microwave resonant cavity
US8633648B2 (en) 2011-06-28 2014-01-21 Recarbon, Inc. Gas conversion system
TW201331408A (en) * 2011-10-07 2013-08-01 Tokyo Electron Ltd Plasma processing device
US20130104996A1 (en) * 2011-10-26 2013-05-02 Applied Materials, Inc. Method for balancing gas flow supplying multiple cvd reactors
US9322571B2 (en) 2011-11-11 2016-04-26 Lv Dynamics Llc Heating system having plasma heat exchanger
US9144858B2 (en) * 2011-11-18 2015-09-29 Recarbon Inc. Plasma generating system having movable electrodes
US9150949B2 (en) * 2012-03-08 2015-10-06 Vladmir E. BELASHCHENKO Plasma systems and methods including high enthalpy and high stability plasmas
JP5474120B2 (en) * 2012-04-09 2014-04-16 三菱電機株式会社 Ignition device and ignition method for internal combustion engine
WO2014007472A1 (en) * 2012-07-03 2014-01-09 Plasmart Inc. Plasma generation apparatus and plasma generation method
US9949356B2 (en) * 2012-07-11 2018-04-17 Lincoln Global, Inc. Electrode for a plasma arc cutting torch
KR101277123B1 (en) * 2012-09-07 2013-06-20 한국기초과학지원연구원 Plasma dry reforming apparatus
KR101277122B1 (en) * 2012-09-28 2013-06-20 한국기초과학지원연구원 Microwave plasma dry reformer
US20150097485A1 (en) 2013-10-08 2015-04-09 XEI Scientific Inc. Method and apparatus for plasma ignition in high vacuum chambers
US9200950B2 (en) 2014-02-25 2015-12-01 Applied Materials, Inc. Pulsed plasma monitoring using optical sensor and a signal analyzer forming a mean waveform
GB2531233A (en) * 2014-02-27 2016-04-20 C Tech Innovation Ltd Plasma enhanced catalytic conversion method and apparatus
GB201410639D0 (en) 2014-06-13 2014-07-30 Fgv Cambridge Nanosystems Ltd Apparatus and method for plasma synthesis of graphitic products including graphene
JP6386287B2 (en) 2014-08-06 2018-09-05 東京エレクトロン株式会社 Plasma stability determination method and plasma processing apparatus
JP6442242B2 (en) * 2014-11-17 2018-12-19 株式会社日立ハイテクノロジーズ Plasma processing equipment
KR101600520B1 (en) 2015-01-28 2016-03-08 연세대학교 산학협력단 Apparatus for optical emission spectroscopy
US10276355B2 (en) * 2015-03-12 2019-04-30 Asm Ip Holding B.V. Multi-zone reactor, system including the reactor, and method of using the same
KR101732048B1 (en) * 2015-07-07 2017-05-02 (주)클린팩터스 Facility for purifying exhaust gas which is generated in processing plasma reactor
US9793097B2 (en) * 2015-07-27 2017-10-17 Lam Research Corporation Time varying segmented pressure control
KR102543349B1 (en) 2016-07-11 2023-06-30 삼성전자주식회사 Plasma monitoring apparatus
GB2554384A (en) * 2016-09-23 2018-04-04 Hieta Tech Limited Combustion chamber and heat exchanger
JP2018078515A (en) * 2016-11-11 2018-05-17 東京エレクトロン株式会社 Filter device and plasma processing apparatus
US9812295B1 (en) 2016-11-15 2017-11-07 Lyten, Inc. Microwave chemical processing
US10091929B2 (en) * 2016-12-12 2018-10-09 Cnh Industrial Canada, Ltd. Calibration method for adjustable orifice valve
EP3606659A4 (en) * 2017-04-07 2020-12-16 Nuionic Technologies LP Microwave enhancement of chemical reactions
KR101936595B1 (en) 2017-04-11 2019-01-09 주식회사 에어브릿지 Atmospheric pressure microwave plasma generating device with self-ignition function
CN108104808A (en) * 2018-01-05 2018-06-01 中国海洋石油集团有限公司 Downhole fluid viscosity measurement pipe nipple
CN108834296B (en) * 2018-06-27 2020-07-10 安徽航天环境工程有限公司 Microwave plasma device
US20200058469A1 (en) * 2018-08-14 2020-02-20 Tokyo Electron Limited Systems and methods of control for plasma processing
CN109104808B (en) * 2018-08-16 2024-02-06 清华大学 Novel microwave plasma excitation device with long service life
US20200312629A1 (en) 2019-03-25 2020-10-01 Recarbon, Inc. Controlling exhaust gas pressure of a plasma reactor for plasma stability
US11388809B2 (en) 2019-03-25 2022-07-12 Recarbon, Inc. Systems for controlling plasma reactors
US10832893B2 (en) 2019-03-25 2020-11-10 Recarbon, Inc. Plasma reactor for processing gas

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