SG11202109821UA - Frequency broadening apparatus and method - Google Patents

Frequency broadening apparatus and method

Info

Publication number
SG11202109821UA
SG11202109821UA SG11202109821UA SG11202109821UA SG 11202109821U A SG11202109821U A SG 11202109821UA SG 11202109821U A SG11202109821U A SG 11202109821UA SG 11202109821U A SG11202109821U A SG 11202109821UA
Authority
SG
Singapore
Prior art keywords
frequency broadening
broadening apparatus
frequency
broadening
Prior art date
Application number
Other languages
English (en)
Inventor
Patrick Uebel
Sebastian Bauerschmidt
- Van Eijk Paul Scholtes
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from EP19164997.9A external-priority patent/EP3715944A1/en
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG11202109821UA publication Critical patent/SG11202109821UA/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/35—Non-linear optics
    • G02F1/365—Non-linear optics in an optical waveguide structure
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/02—Optical fibres with cladding with or without a coating
    • G02B6/02295—Microstructured optical fibre
    • G02B6/02314—Plurality of longitudinal structures extending along optical fibre axis, e.g. holes
    • G02B6/02319—Plurality of longitudinal structures extending along optical fibre axis, e.g. holes characterised by core or core-cladding interface features
    • G02B6/02323—Core having lower refractive index than cladding, e.g. photonic band gap guiding
    • G02B6/02328—Hollow or gas filled core
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/35—Non-linear optics
    • G02F1/3528—Non-linear optics for producing a supercontinuum
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70133—Measurement of illumination distribution, in pupil plane or field plane
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70316—Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70325—Resolution enhancement techniques not otherwise provided for, e.g. darkfield imaging, interfering beams, spatial frequency multiplication, nearfield lenses or solid immersion lenses
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7065—Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Couplings Of Light Guides (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
SG11202109821U 2019-03-25 2020-02-28 Frequency broadening apparatus and method SG11202109821UA (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP19164997.9A EP3715944A1 (en) 2019-03-25 2019-03-25 Frequency broadening apparatus and method
EP19207621 2019-11-07
PCT/EP2020/055288 WO2020193075A1 (en) 2019-03-25 2020-02-28 Frequency broadening apparatus and method

Publications (1)

Publication Number Publication Date
SG11202109821UA true SG11202109821UA (en) 2021-10-28

Family

ID=69631637

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11202109821U SG11202109821UA (en) 2019-03-25 2020-02-28 Frequency broadening apparatus and method

Country Status (9)

Country Link
US (2) US11262665B2 (ko)
EP (1) EP3715945A1 (ko)
JP (1) JP7281553B2 (ko)
KR (1) KR102636261B1 (ko)
CN (2) CN116643348A (ko)
IL (2) IL309967A (ko)
SG (1) SG11202109821UA (ko)
TW (1) TWI769439B (ko)
WO (1) WO2020193075A1 (ko)

Families Citing this family (9)

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WO2020193075A1 (en) 2019-03-25 2020-10-01 Asml Netherlands B.V. Frequency broadening apparatus and method
US20240004319A1 (en) * 2020-12-23 2024-01-04 Asml Netherlands B.V. Methods and apparatus for providing a broadband light source
EP4030230A1 (en) * 2021-01-18 2022-07-20 ASML Netherlands B.V. Methods and apparatus for providing a broadband light source
US20240053532A1 (en) * 2021-01-27 2024-02-15 Asml Netherlands B.V. Hollow-core photonic crystal fiber
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EP4105696A1 (en) * 2021-06-15 2022-12-21 ASML Netherlands B.V. Optical element for generation of broadband radiation
EP4174567A1 (en) * 2021-11-02 2023-05-03 ASML Netherlands B.V. Hollow-core photonic crystal fiber based broadband radiation generator
EP4427093A1 (en) * 2021-11-02 2024-09-11 ASML Netherlands B.V. Hollow-core photonic crystal fiber based broadband radiation generator

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Also Published As

Publication number Publication date
IL286548B2 (en) 2024-06-01
US11733617B2 (en) 2023-08-22
CN116643348A (zh) 2023-08-25
TW202102886A (zh) 2021-01-16
US11262665B2 (en) 2022-03-01
US20220128912A1 (en) 2022-04-28
WO2020193075A1 (en) 2020-10-01
EP3715945A1 (en) 2020-09-30
KR102636261B1 (ko) 2024-02-13
KR20210129141A (ko) 2021-10-27
CN113631999A (zh) 2021-11-09
IL286548B1 (en) 2024-02-01
CN113631999B (zh) 2023-05-16
JP2022524590A (ja) 2022-05-09
IL309967A (en) 2024-03-01
IL286548A (en) 2021-10-31
US20200310251A1 (en) 2020-10-01
JP7281553B2 (ja) 2023-05-25
TWI769439B (zh) 2022-07-01

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