SG11202106840TA - Sonic cleaning system and method of sonic cleaning a workpiece - Google Patents

Sonic cleaning system and method of sonic cleaning a workpiece

Info

Publication number
SG11202106840TA
SG11202106840TA SG11202106840TA SG11202106840TA SG11202106840TA SG 11202106840T A SG11202106840T A SG 11202106840TA SG 11202106840T A SG11202106840T A SG 11202106840TA SG 11202106840T A SG11202106840T A SG 11202106840TA SG 11202106840T A SG11202106840T A SG 11202106840TA
Authority
SG
Singapore
Prior art keywords
sonic cleaning
workpiece
sonic
cleaning system
cleaning
Prior art date
Application number
SG11202106840TA
Other languages
English (en)
Inventor
Michael J Coughlin
Jianqi Wang
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of SG11202106840TA publication Critical patent/SG11202106840TA/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/02—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by distortion, beating, or vibration of the surface to be cleaned
    • B08B7/026—Using sound waves
    • B08B7/028—Using ultrasounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/06—Cleaning involving contact with liquid using perforated drums in which the article or material is placed
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
SG11202106840TA 2019-01-20 2020-01-06 Sonic cleaning system and method of sonic cleaning a workpiece SG11202106840TA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201962794689P 2019-01-20 2019-01-20
PCT/US2020/012375 WO2020150029A1 (en) 2019-01-20 2020-01-06 Sonic cleaning system and method of sonic cleaning a workpiece

Publications (1)

Publication Number Publication Date
SG11202106840TA true SG11202106840TA (en) 2021-08-30

Family

ID=71609635

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11202106840TA SG11202106840TA (en) 2019-01-20 2020-01-06 Sonic cleaning system and method of sonic cleaning a workpiece

Country Status (8)

Country Link
US (1) US11602776B2 (zh)
EP (1) EP3911453A4 (zh)
JP (1) JP7326450B2 (zh)
KR (1) KR20210107159A (zh)
CN (1) CN113302004A (zh)
SG (1) SG11202106840TA (zh)
TW (1) TWI811519B (zh)
WO (1) WO2020150029A1 (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11433436B2 (en) 2020-11-19 2022-09-06 Applied Materials, Inc. Carousel for ultrasonic cleaning and method of using thereof

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2702260A (en) * 1949-11-17 1955-02-15 Massa Frank Apparatus and method for the generation and use of sound waves in liquids for the high-speed wetting of substances immersed in the liquid
US2987068A (en) * 1956-05-01 1961-06-06 Branson Instr Apparatus for ultrasonic cleaning
US3520724A (en) * 1967-06-23 1970-07-14 Dynamics Corp America Dual tank sonic processing system and method
US4224110A (en) * 1977-12-05 1980-09-23 Mccord James W Cleaning device
US4618263A (en) * 1982-09-22 1986-10-21 Mccord James W Sound suppressor in a liquid medium
US4525219A (en) * 1983-04-11 1985-06-25 Gard Corporation Ampule cleaning and quality control system
JPH08197022A (ja) * 1995-01-23 1996-08-06 Kiyoutarou Wada せきを具備した超音波洗浄器
KR100231840B1 (ko) * 1997-07-15 1999-12-01 유무성 초음파 세정기
US6102056A (en) * 1998-08-18 2000-08-15 Kotsopey; Omelan Cleaning apparatus
US7111632B2 (en) * 2003-09-22 2006-09-26 Seagate Technology Llc Ultrasonic cleaning device for removing undesirable particles from an object
JP4040037B2 (ja) * 2004-05-11 2008-01-30 ジャパン・フィールド株式会社 被洗浄物の洗浄方法及びその装置
WO2006007639A1 (en) * 2004-07-16 2006-01-26 Soniclean Pty Ltd An improved apparatus and method for cleaning using a combination of electrolysis and ultrasonics
JP4369887B2 (ja) * 2005-03-17 2009-11-25 株式会社みくに工業 超音波洗浄方法および超音波洗浄装置
JP2009240434A (ja) * 2008-03-28 2009-10-22 Fujifilm Corp 内視鏡洗浄消毒装置及び内視鏡洗浄方法
JP5125693B2 (ja) * 2008-03-31 2013-01-23 パナソニック株式会社 食器乾燥機
CN102639752B (zh) * 2009-12-03 2014-01-15 新日铁住金株式会社 钢板的酸洗方法和酸洗装置
TWI559992B (en) * 2012-10-15 2016-12-01 Hon Hai Prec Ind Co Ltd Ultrasonic cleaning apparatus
JP3202764U (ja) 2015-12-10 2016-02-18 アイワ医科工業株式会社 超音波洗浄装置
JP2017202469A (ja) * 2016-05-13 2017-11-16 ジャパン・フィールド株式会社 被洗浄物の洗浄方法及びその装置
WO2017196493A1 (en) * 2016-05-13 2017-11-16 Applied Materials, Inc. Liquid particle counting of semiconductor component parts

Also Published As

Publication number Publication date
JP7326450B2 (ja) 2023-08-15
TW202042925A (zh) 2020-12-01
TWI811519B (zh) 2023-08-11
US20200230661A1 (en) 2020-07-23
JP2022517358A (ja) 2022-03-08
EP3911453A1 (en) 2021-11-24
CN113302004A (zh) 2021-08-24
EP3911453A4 (en) 2022-10-12
US11602776B2 (en) 2023-03-14
KR20210107159A (ko) 2021-08-31
WO2020150029A1 (en) 2020-07-23

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