SG11202104920UA - Reflective photomask blank and reflective photomask - Google Patents
Reflective photomask blank and reflective photomaskInfo
- Publication number
- SG11202104920UA SG11202104920UA SG11202104920UA SG11202104920UA SG11202104920UA SG 11202104920U A SG11202104920U A SG 11202104920UA SG 11202104920U A SG11202104920U A SG 11202104920UA SG 11202104920U A SG11202104920U A SG 11202104920UA SG 11202104920U A SG11202104920U A SG 11202104920UA
- Authority
- SG
- Singapore
- Prior art keywords
- reflective photomask
- blank
- reflective
- photomask blank
- photomask
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
- G03F1/24—Reflection masks; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Physical Vapour Deposition (AREA)
- Optics & Photonics (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018214833 | 2018-11-15 | ||
| PCT/JP2019/043070 WO2020100632A1 (en) | 2018-11-15 | 2019-11-01 | Reflective photomask blank and reflective photomask |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG11202104920UA true SG11202104920UA (en) | 2021-06-29 |
Family
ID=70730637
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG11202104920UA SG11202104920UA (en) | 2018-11-15 | 2019-11-01 | Reflective photomask blank and reflective photomask |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US11906896B2 (en) |
| EP (1) | EP3882698A4 (en) |
| JP (1) | JP6879437B2 (en) |
| KR (1) | KR20210088582A (en) |
| CN (1) | CN112997116A (en) |
| SG (1) | SG11202104920UA (en) |
| TW (1) | TWI826587B (en) |
| WO (1) | WO2020100632A1 (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102464780B1 (en) * | 2020-09-02 | 2022-11-09 | 주식회사 에스앤에스텍 | Blankmask with Backside Conductive Layer, and Photomask manufactured with the same |
| JP6966013B1 (en) * | 2020-10-14 | 2021-11-10 | 凸版印刷株式会社 | Manufacturing method of reflective mask and reflective mask |
| US11940725B2 (en) | 2021-01-27 | 2024-03-26 | S&S Tech Co., Ltd. | Phase shift blankmask and photomask for EUV lithography |
| JP2022124344A (en) * | 2021-02-15 | 2022-08-25 | 株式会社トッパンフォトマスク | Reflective photomask blank and reflective photomask |
| JP2022185356A (en) * | 2021-06-02 | 2022-12-14 | 株式会社トッパンフォトマスク | Reflective photomask blank and reflective photomask |
| JP7117445B1 (en) | 2021-12-15 | 2022-08-12 | 株式会社トッパンフォトマスク | Reflective photomask blanks and reflective photomasks |
| TW202347008A (en) * | 2022-03-29 | 2023-12-01 | 日商凸版光掩模有限公司 | Reflective photomask blank and reflective photomask |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4397496B2 (en) | 2000-02-25 | 2010-01-13 | Ｏｋｉセミコンダクタ株式会社 | Reflective exposure mask and EUV exposure apparatus |
| US7678511B2 (en) * | 2006-01-12 | 2010-03-16 | Asahi Glass Company, Limited | Reflective-type mask blank for EUV lithography |
| JP4926523B2 (en) * | 2006-03-31 | 2012-05-09 | Ｈｏｙａ株式会社 | REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE |
| TWI444757B (en) | 2006-04-21 | 2014-07-11 | Asahi Glass Co Ltd | Reflective mask blank for euv lithography |
| CN102016717B (en) * | 2008-04-23 | 2012-10-10 | 旭硝子株式会社 | Reflective mask blank for EUV lithography, and reflective mask for EUV lithography |
| JP5332741B2 (en) * | 2008-09-25 | 2013-11-06 | 凸版印刷株式会社 | Reflective photomask |
| KR20120034074A (en) | 2009-07-08 | 2012-04-09 | 아사히 가라스 가부시키가이샤 | Euv-lithography reflection-type mask blank |
| US9581889B2 (en) | 2014-07-11 | 2017-02-28 | Applied Materials, Inc. | Planarized extreme ultraviolet lithography blank with absorber and manufacturing system therefor |
| US9529250B2 (en) * | 2014-10-31 | 2016-12-27 | Taiwan Semiconductor Manufacturing Company, Ltd. | EUV mask with ITO absorber to suppress out of band radiation |
| KR101579852B1 (en) | 2015-03-25 | 2015-12-23 | 주식회사 에스앤에스텍 | Blankmask for extreme ultra-violet lithography and photomask using the same |
| JP6915280B2 (en) | 2017-01-23 | 2021-08-04 | 凸版印刷株式会社 | Reflective photomask and reflective photomask blank |
| EP3454119B1 (en) | 2017-09-09 | 2023-12-27 | IMEC vzw | Euv absorbing alloys |
-
2019
- 2019-11-01 KR KR1020217014258A patent/KR20210088582A/en active Search and Examination
- 2019-11-01 US US17/292,409 patent/US11906896B2/en active Active
- 2019-11-01 EP EP19885829.2A patent/EP3882698A4/en active Pending
- 2019-11-01 JP JP2020556045A patent/JP6879437B2/en active Active
- 2019-11-01 WO PCT/JP2019/043070 patent/WO2020100632A1/en unknown
- 2019-11-01 SG SG11202104920UA patent/SG11202104920UA/en unknown
- 2019-11-01 CN CN201980073304.1A patent/CN112997116A/en active Pending
- 2019-11-14 TW TW108141321A patent/TWI826587B/en active
Also Published As
| Publication number | Publication date |
|---|---|
| CN112997116A (en) | 2021-06-18 |
| JP6879437B2 (en) | 2021-06-02 |
| EP3882698A4 (en) | 2022-08-17 |
| WO2020100632A1 (en) | 2020-05-22 |
| TWI826587B (en) | 2023-12-21 |
| US11906896B2 (en) | 2024-02-20 |
| US20220011662A1 (en) | 2022-01-13 |
| KR20210088582A (en) | 2021-07-14 |
| EP3882698A1 (en) | 2021-09-22 |
| TW202029279A (en) | 2020-08-01 |
| JPWO2020100632A1 (en) | 2021-05-20 |
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