SG11202012635YA - Resin composition and flow cells incorporating the same - Google Patents

Resin composition and flow cells incorporating the same

Info

Publication number
SG11202012635YA
SG11202012635YA SG11202012635YA SG11202012635YA SG11202012635YA SG 11202012635Y A SG11202012635Y A SG 11202012635YA SG 11202012635Y A SG11202012635Y A SG 11202012635YA SG 11202012635Y A SG11202012635Y A SG 11202012635YA SG 11202012635Y A SG11202012635Y A SG 11202012635YA
Authority
SG
Singapore
Prior art keywords
same
resin composition
flow cells
cells incorporating
incorporating
Prior art date
Application number
SG11202012635YA
Other languages
English (en)
Inventor
Timothy J Merkel
Wayne N George
Andrew A Brown
Audrey Zak
Gianluca Andrea Artioli
Julia Morrison
Nikolai Romanov
Lorenzo Berti
Graham Boud
Original Assignee
Illumina Inc
Illumina Cambridge Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Illumina Inc, Illumina Cambridge Ltd filed Critical Illumina Inc
Publication of SG11202012635YA publication Critical patent/SG11202012635YA/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
    • G01N15/10—Investigating individual particles
    • G01N15/14—Optical investigation techniques, e.g. flow cytometry
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/22—Di-epoxy compounds
    • C08G59/30—Di-epoxy compounds containing atoms other than carbon, hydrogen, oxygen and nitrogen
    • C08G59/306—Di-epoxy compounds containing atoms other than carbon, hydrogen, oxygen and nitrogen containing silicon
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/32—Epoxy compounds containing three or more epoxy groups
    • C08G59/3254—Epoxy compounds containing three or more epoxy groups containing atoms other than carbon, hydrogen, oxygen or nitrogen
    • C08G59/3281—Epoxy compounds containing three or more epoxy groups containing atoms other than carbon, hydrogen, oxygen or nitrogen containing silicon
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/07—Aldehydes; Ketones
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/10—Block- or graft-copolymers containing polysiloxane sequences
    • C08L83/12—Block- or graft-copolymers containing polysiloxane sequences containing polyether sequences
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C09D183/06—Polysiloxanes containing silicon bound to oxygen-containing groups
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
    • G01N15/10—Investigating individual particles
    • G01N15/14—Optical investigation techniques, e.g. flow cytometry
    • G01N15/1404—Handling flow, e.g. hydrodynamic focusing
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
    • G01N15/10—Investigating individual particles
    • G01N15/14—Optical investigation techniques, e.g. flow cytometry
    • G01N15/1434—Optical arrangements
    • G01N15/1436—Optical arrangements the optical arrangement forming an integrated apparatus with the sample container, e.g. a flow cell
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/01—Arrangements or apparatus for facilitating the optical investigation
    • G01N21/03—Cuvette constructions
    • G01N21/05—Flow-through cuvettes
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
    • G01N33/48—Biological material, e.g. blood, urine; Haemocytometers
    • G01N33/483—Physical analysis of biological material
    • G01N33/487—Physical analysis of biological material of liquid biological material
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y5/00—Nanobiotechnology or nanomedicine, e.g. protein engineering or drug delivery

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Organic Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Engineering & Computer Science (AREA)
  • Dispersion Chemistry (AREA)
  • Biomedical Technology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Biophysics (AREA)
  • Hematology (AREA)
  • Molecular Biology (AREA)
  • Urology & Nephrology (AREA)
  • Food Science & Technology (AREA)
  • Epoxy Resins (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
SG11202012635YA 2018-07-20 2019-07-18 Resin composition and flow cells incorporating the same SG11202012635YA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201862701246P 2018-07-20 2018-07-20
PCT/US2019/042418 WO2020018801A1 (en) 2018-07-20 2019-07-18 Resin composition and flow cells incorporating the same

Publications (1)

Publication Number Publication Date
SG11202012635YA true SG11202012635YA (en) 2021-01-28

Family

ID=69161054

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11202012635YA SG11202012635YA (en) 2018-07-20 2019-07-18 Resin composition and flow cells incorporating the same

Country Status (13)

Country Link
US (1) US20200025670A1 (zh)
EP (1) EP3824350A4 (zh)
JP (1) JP2021530574A (zh)
KR (1) KR20210033446A (zh)
CN (1) CN112673315A (zh)
AU (1) AU2019307637A1 (zh)
BR (1) BR112020026301A2 (zh)
CA (1) CA3103287A1 (zh)
IL (1) IL279568B1 (zh)
MX (1) MX2020014054A (zh)
SG (1) SG11202012635YA (zh)
TW (1) TW202020005A (zh)
WO (1) WO2020018801A1 (zh)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114207518A (zh) * 2020-04-24 2022-03-18 伊鲁米纳剑桥有限公司 流通池
EP4291952A1 (en) * 2021-02-09 2023-12-20 Illumina, Inc. Resin composition and flow cells incorporating the same
CN117813118A (zh) * 2021-07-30 2024-04-02 因美纳有限公司 光活化的寡核苷酸与聚合物的偶联
AU2022351372A1 (en) * 2021-09-24 2024-01-18 Illumina, Inc. Curable resin compositions
AU2022353134A1 (en) * 2021-09-24 2024-01-18 Illumina, Inc. Curable resin compositions
US20240018381A1 (en) * 2022-06-30 2024-01-18 Illumina Cambridge Limited Nanoimprint lithography resin composition

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5162390A (en) * 1990-03-05 1992-11-10 General Electric Company UV curable coating compositions, abrasion resistant UV stabilized thermoplastic composites and method
US5247026A (en) * 1992-06-19 1993-09-21 Shell Oil Company Randomly epoxidized small star polymers
US20020035199A1 (en) * 1997-03-25 2002-03-21 Stefan Breunig Composition (e.g. ink or varnish) which can undergo cationic and/or radical polymerization and/or crosslinking by irradiation, based on an organic matrix, a silicone diluent and a photoinitiator
JP2000044857A (ja) * 1998-05-29 2000-02-15 Brother Ind Ltd 熱溶融性インクおよびインクジェット式記録装置
US6287748B1 (en) * 1998-07-10 2001-09-11 Dsm N.V. Solid imaging compositions for preparing polyethylene-like articles
JP4293535B2 (ja) * 2003-08-29 2009-07-08 ダイセル化学工業株式会社 活性エネルギー線硬化性光学的立体造形用エポキシ樹脂組成物及び光学的立体造形方法
US20050260522A1 (en) * 2004-02-13 2005-11-24 William Weber Permanent resist composition, cured product thereof, and use thereof
WO2010053962A1 (en) * 2008-11-04 2010-05-14 California Institute Of Technology Hybrid electrochemical generator with a soluble anode
US20100242790A1 (en) * 2009-03-24 2010-09-30 Xerox Corporation Cationically and hybrid curable uv gels
EP2504103A2 (en) * 2009-11-23 2012-10-03 3M Innovative Properties Company Microwell array articles and methods of use
WO2016018918A1 (en) * 2014-07-29 2016-02-04 Ofs Fitel, Llc Uv-curable silsesquioxane-containing write-through optical fiber coatings for fabrication of optical fiber bragg gratings, and fibers made therefrom
US10272426B2 (en) * 2015-04-21 2019-04-30 Jsr Corporation Method of producing microfluidic device, microfluidic device, and photosensitive resin composition
JP2017119340A (ja) * 2015-04-21 2017-07-06 Jsr株式会社 マイクロ流体装置の製造方法、マイクロ流体装置及び感光性樹脂組成物
EP3558511A4 (en) * 2016-12-22 2020-11-25 Illumina, Inc. ARRAYS WITH A RESIN FILM AND A STRUCTURED POLYMER LAYER

Also Published As

Publication number Publication date
TW202020005A (zh) 2020-06-01
EP3824350A1 (en) 2021-05-26
WO2020018801A1 (en) 2020-01-23
AU2019307637A1 (en) 2021-01-07
JP2021530574A (ja) 2021-11-11
KR20210033446A (ko) 2021-03-26
US20200025670A1 (en) 2020-01-23
IL279568B1 (en) 2024-03-01
CA3103287A1 (en) 2020-01-23
BR112020026301A2 (pt) 2021-03-30
IL279568A (en) 2021-03-01
MX2020014054A (es) 2021-05-27
EP3824350A4 (en) 2022-05-18
CN112673315A (zh) 2021-04-16

Similar Documents

Publication Publication Date Title
IL279568A (en) Resin and flow cells containing it
IL279472A (en) Resin and flow cells containing it
ZA202003788B (en) Composition based on probiotics and uses thereof
SG11201912113XA (en) Flow cells
KR102090294B9 (ko) 가소제 조성물 및 이를 포함하는 수지 조성물
ZA201901601B (en) Multimodal polyethylene composition and a film comprising the same
PL3414787T3 (pl) Wstępnie litowane materiały elektrod i ogniwa wykorzystujące te materiały
ZA201700966B (en) An elastic hot melt adhesive composition and an elastic composite made with the same
IL289319A (en) Resin composition and flow cells that combine the resin
EP3813856A4 (en) CELL COMPOSITIONS AND USES THEREOF
GB2569614B (en) A curative composition and a resin composition containing the curative composition
EP3492526A4 (en) RESIN COMPOSITION AND USE THEREOF
EP3904453A4 (en) RESIN COMPOSITION AND USE THEREOF
IL279358A (en) flow cells
EP3587490A4 (en) METHACRYLIC RESIN COMPOSITION AND ITS USE
EP3584286A4 (en) RESIN COMPOSITION AND BIOLOGICAL MODEL
EP3524640A4 (en) RESIN COMPOSITION AND MEMBRANE STRUCTURE USING THE SAME
EP3247746A4 (en) Acrylic elastomeric resin composition and file prepared using the same
EP3358378A4 (en) LIGHT-SPREADING FORM BODY OF RESIN COMPOSITION AND USE THEREOF
PL3293208T3 (pl) Dwumodalna kompozycja polietylenowa i zawierająca ją rura
SG11202009629YA (en) Erenumab compositions and uses thereof
SG11202004225UA (en) Polysiloxane, composition comprising the same and cured film using the same
EP3660105A4 (en) GAS BARRIER RESIN COMPOSITION AND ITS USE
GB201807576D0 (en) Compositions and uses thereof
EP3473678A4 (en) RESIN COMPOSITION AND USE THEREOF