SG11202012635YA - Resin composition and flow cells incorporating the same - Google Patents
Resin composition and flow cells incorporating the sameInfo
- Publication number
- SG11202012635YA SG11202012635YA SG11202012635YA SG11202012635YA SG11202012635YA SG 11202012635Y A SG11202012635Y A SG 11202012635YA SG 11202012635Y A SG11202012635Y A SG 11202012635YA SG 11202012635Y A SG11202012635Y A SG 11202012635YA SG 11202012635Y A SG11202012635Y A SG 11202012635YA
- Authority
- SG
- Singapore
- Prior art keywords
- same
- resin composition
- flow cells
- cells incorporating
- incorporating
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume, or surface-area of porous materials
- G01N15/10—Investigating individual particles
- G01N15/14—Electro-optical investigation, e.g. flow cytometers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/22—Di-epoxy compounds
- C08G59/30—Di-epoxy compounds containing atoms other than carbon, hydrogen, oxygen and nitrogen
- C08G59/306—Di-epoxy compounds containing atoms other than carbon, hydrogen, oxygen and nitrogen containing silicon
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/32—Epoxy compounds containing three or more epoxy groups
- C08G59/3254—Epoxy compounds containing three or more epoxy groups containing atoms other than carbon, hydrogen, oxygen or nitrogen
- C08G59/3281—Epoxy compounds containing three or more epoxy groups containing atoms other than carbon, hydrogen, oxygen or nitrogen containing silicon
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/04—Oxygen-containing compounds
- C08K5/07—Aldehydes; Ketones
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/10—Block- or graft-copolymers containing polysiloxane sequences
- C08L83/12—Block- or graft-copolymers containing polysiloxane sequences containing polyether sequences
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
- C09D183/06—Polysiloxanes containing silicon bound to oxygen-containing groups
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume, or surface-area of porous materials
- G01N15/10—Investigating individual particles
- G01N15/14—Electro-optical investigation, e.g. flow cytometers
- G01N15/1404—Fluid conditioning in flow cytometers, e.g. flow cells; Supply; Control of flow
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume, or surface-area of porous materials
- G01N15/10—Investigating individual particles
- G01N15/14—Electro-optical investigation, e.g. flow cytometers
- G01N15/1434—Electro-optical investigation, e.g. flow cytometers using an analyser being characterised by its optical arrangement
- G01N15/1436—Electro-optical investigation, e.g. flow cytometers using an analyser being characterised by its optical arrangement the optical arrangement forming an integrated apparatus with the sample container, e.g. a flow cell
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
- G01N21/03—Cuvette constructions
- G01N21/05—Flow-through cuvettes
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
- G01N33/48—Biological material, e.g. blood, urine; Haemocytometers
- G01N33/483—Physical analysis of biological material
- G01N33/487—Physical analysis of biological material of liquid biological material
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y5/00—Nanobiotechnology or nanomedicine, e.g. protein engineering or drug delivery
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- Organic Chemistry (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Pathology (AREA)
- General Health & Medical Sciences (AREA)
- Analytical Chemistry (AREA)
- Immunology (AREA)
- Biochemistry (AREA)
- Engineering & Computer Science (AREA)
- Dispersion Chemistry (AREA)
- Biomedical Technology (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Biophysics (AREA)
- Urology & Nephrology (AREA)
- Food Science & Technology (AREA)
- Molecular Biology (AREA)
- Hematology (AREA)
- Epoxy Resins (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201862701246P | 2018-07-20 | 2018-07-20 | |
PCT/US2019/042418 WO2020018801A1 (en) | 2018-07-20 | 2019-07-18 | Resin composition and flow cells incorporating the same |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11202012635YA true SG11202012635YA (en) | 2021-01-28 |
Family
ID=69161054
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11202012635YA SG11202012635YA (en) | 2018-07-20 | 2019-07-18 | Resin composition and flow cells incorporating the same |
Country Status (13)
Country | Link |
---|---|
US (1) | US20200025670A1 (en) |
EP (1) | EP3824350A4 (en) |
JP (1) | JP2021530574A (en) |
KR (1) | KR20210033446A (en) |
CN (1) | CN112673315A (en) |
AU (1) | AU2019307637A1 (en) |
BR (1) | BR112020026301A2 (en) |
CA (1) | CA3103287A1 (en) |
IL (1) | IL279568B1 (en) |
MX (1) | MX2020014054A (en) |
SG (1) | SG11202012635YA (en) |
TW (1) | TW202020005A (en) |
WO (1) | WO2020018801A1 (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20230007915A (en) | 2020-04-24 | 2023-01-13 | 일루미나 케임브리지 리미티드 | flow cell |
JP2024512191A (en) * | 2021-02-09 | 2024-03-19 | イルミナ インコーポレイテッド | Resin composition and flow cell incorporating the same |
US20230102550A1 (en) * | 2021-07-30 | 2023-03-30 | Illumina, Inc. | Light-activated coupling of oligonucleotides to polymers |
US20230102870A1 (en) * | 2021-09-24 | 2023-03-30 | Illumina Cambridge Limited | Curable resin compositions |
CA3223676A1 (en) * | 2021-09-24 | 2023-03-30 | Alexandra SZEMJONOV | Curable resin compositions |
US20240018381A1 (en) * | 2022-06-30 | 2024-01-18 | Illumina Cambridge Limited | Nanoimprint lithography resin composition |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5162390A (en) * | 1990-03-05 | 1992-11-10 | General Electric Company | UV curable coating compositions, abrasion resistant UV stabilized thermoplastic composites and method |
US5247026A (en) * | 1992-06-19 | 1993-09-21 | Shell Oil Company | Randomly epoxidized small star polymers |
US20020035199A1 (en) * | 1997-03-25 | 2002-03-21 | Stefan Breunig | Composition (e.g. ink or varnish) which can undergo cationic and/or radical polymerization and/or crosslinking by irradiation, based on an organic matrix, a silicone diluent and a photoinitiator |
JP2000044857A (en) * | 1998-05-29 | 2000-02-15 | Brother Ind Ltd | Thermally meltable ink and ink jet type recording device |
US6287748B1 (en) * | 1998-07-10 | 2001-09-11 | Dsm N.V. | Solid imaging compositions for preparing polyethylene-like articles |
JP4293535B2 (en) * | 2003-08-29 | 2009-07-08 | ダイセル化学工業株式会社 | Active energy ray-curable epoxy resin composition for optical three-dimensional modeling and optical three-dimensional modeling method |
US20050260522A1 (en) * | 2004-02-13 | 2005-11-24 | William Weber | Permanent resist composition, cured product thereof, and use thereof |
US20100141211A1 (en) * | 2008-11-04 | 2010-06-10 | Rachid Yazami | Hybrid electrochemical generator with a soluble anode |
US20100242790A1 (en) * | 2009-03-24 | 2010-09-30 | Xerox Corporation | Cationically and hybrid curable uv gels |
WO2011063332A2 (en) * | 2009-11-23 | 2011-05-26 | 3M Innovative Properties Company | Microwell array articles and methods of use |
WO2016018918A1 (en) * | 2014-07-29 | 2016-02-04 | Ofs Fitel, Llc | Uv-curable silsesquioxane-containing write-through optical fiber coatings for fabrication of optical fiber bragg gratings, and fibers made therefrom |
EP3085661B1 (en) * | 2015-04-21 | 2017-12-27 | JSR Corporation | Method of producing microfluidic device |
JP2017119340A (en) * | 2015-04-21 | 2017-07-06 | Jsr株式会社 | Method for manufacturing micro fluid device, micro fluid device and photosensitive resin composition |
CN110248725B (en) * | 2016-12-22 | 2022-08-02 | 伊鲁米那股份有限公司 | Array comprising resin film and patterned polymer layer |
-
2019
- 2019-07-18 CA CA3103287A patent/CA3103287A1/en active Pending
- 2019-07-18 KR KR1020207037496A patent/KR20210033446A/en not_active Application Discontinuation
- 2019-07-18 WO PCT/US2019/042418 patent/WO2020018801A1/en active Application Filing
- 2019-07-18 AU AU2019307637A patent/AU2019307637A1/en active Pending
- 2019-07-18 EP EP19837961.2A patent/EP3824350A4/en active Pending
- 2019-07-18 US US16/515,849 patent/US20200025670A1/en active Pending
- 2019-07-18 MX MX2020014054A patent/MX2020014054A/en unknown
- 2019-07-18 JP JP2020572680A patent/JP2021530574A/en active Pending
- 2019-07-18 SG SG11202012635YA patent/SG11202012635YA/en unknown
- 2019-07-18 CN CN201980043021.2A patent/CN112673315A/en active Pending
- 2019-07-18 BR BR112020026301-0A patent/BR112020026301A2/en unknown
- 2019-07-18 IL IL279568A patent/IL279568B1/en unknown
- 2019-07-19 TW TW108125694A patent/TW202020005A/en unknown
Also Published As
Publication number | Publication date |
---|---|
BR112020026301A2 (en) | 2021-03-30 |
WO2020018801A1 (en) | 2020-01-23 |
US20200025670A1 (en) | 2020-01-23 |
TW202020005A (en) | 2020-06-01 |
KR20210033446A (en) | 2021-03-26 |
JP2021530574A (en) | 2021-11-11 |
AU2019307637A1 (en) | 2021-01-07 |
CN112673315A (en) | 2021-04-16 |
IL279568A (en) | 2021-03-01 |
EP3824350A4 (en) | 2022-05-18 |
CA3103287A1 (en) | 2020-01-23 |
EP3824350A1 (en) | 2021-05-26 |
MX2020014054A (en) | 2021-05-27 |
IL279568B1 (en) | 2024-03-01 |
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