SG11202001932UA - Substrate processing apparatus, method of monitoring abnormality of substrate processing apparatus, and program - Google Patents

Substrate processing apparatus, method of monitoring abnormality of substrate processing apparatus, and program

Info

Publication number
SG11202001932UA
SG11202001932UA SG11202001932UA SG11202001932UA SG11202001932UA SG 11202001932U A SG11202001932U A SG 11202001932UA SG 11202001932U A SG11202001932U A SG 11202001932UA SG 11202001932U A SG11202001932U A SG 11202001932UA SG 11202001932U A SG11202001932U A SG 11202001932UA
Authority
SG
Singapore
Prior art keywords
processing apparatus
substrate processing
program
monitoring abnormality
abnormality
Prior art date
Application number
SG11202001932UA
Inventor
Kazuyoshi Yamamoto
Kazuhide Asai
Hidemoto Hayashihara
Mitsuru Fukuda
Kayoko Yashiki
Takayuki Kawagishi
Hiroyuki Iwakura
Original Assignee
Kokusai Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kokusai Electric Corp filed Critical Kokusai Electric Corp
Publication of SG11202001932UA publication Critical patent/SG11202001932UA/en

Links

Classifications

    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B19/00Programme-control systems
    • G05B19/02Programme-control systems electric
    • G05B19/418Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS], computer integrated manufacturing [CIM]
    • G05B19/41875Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS], computer integrated manufacturing [CIM] characterised by quality surveillance of production
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67276Production flow monitoring, e.g. for increasing throughput
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B19/00Programme-control systems
    • G05B19/02Programme-control systems electric
    • G05B19/418Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS], computer integrated manufacturing [CIM]
    • G05B19/4184Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS], computer integrated manufacturing [CIM] characterised by fault tolerance, reliability of production system
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B23/00Testing or monitoring of control systems or parts thereof
    • G05B23/02Electric testing or monitoring
    • G05B23/0205Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults
    • G05B23/0218Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults characterised by the fault detection method dealing with either existing or incipient faults
    • G05B23/0224Process history based detection method, e.g. whereby history implies the availability of large amounts of data
    • G05B23/0227Qualitative history assessment, whereby the type of data acted upon, e.g. waveforms, images or patterns, is not relevant, e.g. rule based assessment; if-then decisions
    • G05B23/0235Qualitative history assessment, whereby the type of data acted upon, e.g. waveforms, images or patterns, is not relevant, e.g. rule based assessment; if-then decisions based on a comparison with predetermined threshold or range, e.g. "classical methods", carried out during normal operation; threshold adaptation or choice; when or how to compare with the threshold
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00Program-control systems
    • G05B2219/30Nc systems
    • G05B2219/31From computer integrated manufacturing till monitoring
    • G05B2219/31443Keep track of nc program, recipe program
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00Program-control systems
    • G05B2219/30Nc systems
    • G05B2219/32Operator till task planning
    • G05B2219/32368Quality control
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00Program-control systems
    • G05B2219/30Nc systems
    • G05B2219/45Nc applications
    • G05B2219/45031Manufacturing semiconductor wafers
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P90/00Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
    • Y02P90/02Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]
SG11202001932UA 2017-09-04 2017-09-04 Substrate processing apparatus, method of monitoring abnormality of substrate processing apparatus, and program SG11202001932UA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2017/031719 WO2019043934A1 (en) 2017-09-04 2017-09-04 Substrate processing device, method for monitoring for anomaly in substrate processing device, and program

Publications (1)

Publication Number Publication Date
SG11202001932UA true SG11202001932UA (en) 2020-04-29

Family

ID=65527238

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11202001932UA SG11202001932UA (en) 2017-09-04 2017-09-04 Substrate processing apparatus, method of monitoring abnormality of substrate processing apparatus, and program

Country Status (5)

Country Link
US (1) US11782425B2 (en)
JP (1) JP6833048B2 (en)
KR (2) KR102389689B1 (en)
SG (1) SG11202001932UA (en)
WO (1) WO2019043934A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7304692B2 (en) * 2018-12-13 2023-07-07 東京エレクトロン株式会社 Substrate processing method and substrate processing apparatus
WO2020194852A1 (en) * 2019-03-27 2020-10-01 株式会社島津製作所 Pump monitoring device, vacuum pump, and product-accumulation diagnosis data processing program
KR102073789B1 (en) * 2019-07-05 2020-02-05 김태화 Pump back stream preventing structure for semiconductor manufacturing device
JP7246576B2 (en) * 2020-07-02 2023-03-27 東京エレクトロン株式会社 Information processing method, model generation method, and information processing device

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5855841B2 (en) 1978-06-19 1983-12-12 チエルヤビンスキ− ポリテクニチエスキ− インスチテユ−ト イメニ レニンスコゴ コムソモラ Metal bar rolling method and rolling roll for it
US5719796A (en) * 1995-12-04 1998-02-17 Advanced Micro Devices, Inc. System for monitoring and analyzing manufacturing processes using statistical simulation with single step feedback
JP2000283056A (en) * 1999-03-26 2000-10-10 Hitachi Ltd Vacuum pump abnormality monitoring system
US7477960B2 (en) * 2005-02-16 2009-01-13 Tokyo Electron Limited Fault detection and classification (FDC) using a run-to-run controller
JP4712462B2 (en) * 2005-07-11 2011-06-29 東京エレクトロン株式会社 Substrate processing monitoring device, substrate processing monitoring system, substrate processing monitoring program, and recording medium
WO2007086458A1 (en) * 2006-01-27 2007-08-02 Hitachi Kokusai Electric Inc. Substrate processing apparatus
JP5273697B2 (en) * 2006-08-01 2013-08-28 東京エレクトロン株式会社 Server apparatus and program
CN101359965B (en) * 2008-09-18 2011-04-20 中兴通讯股份有限公司 Method and apparatus optimizing determination level of optical receiver
US8618807B2 (en) * 2009-06-30 2013-12-31 Lam Research Corporation Arrangement for identifying uncontrolled events at the process module level and methods thereof
JP5490462B2 (en) * 2009-08-17 2014-05-14 横河電機株式会社 Film thickness measuring device
JP5774331B2 (en) 2011-03-03 2015-09-09 株式会社日立国際電気 Substrate processing system, management apparatus, data analysis method, and data analysis program
JP5855841B2 (en) 2011-04-01 2016-02-09 株式会社日立国際電気 Management device
US9255578B2 (en) * 2012-07-31 2016-02-09 Fisher-Rosemount Systems, Inc. Systems and methods to monitor pump cavitation
JP6403577B2 (en) * 2013-02-05 2018-10-10 株式会社Kokusai Electric Cleaning method, semiconductor device manufacturing method, substrate processing apparatus and program, and cleaning end determination method
JP2015115540A (en) * 2013-12-13 2015-06-22 株式会社日立国際電気 Management apparatus, management method of substrate processing device, substrate processing system and recording medium
JP2016134585A (en) * 2015-01-22 2016-07-25 ルネサスエレクトロニクス株式会社 Semiconductor manufacturing device, diagnosis system for the same, and method of manufacturing semiconductor device
JP6454611B2 (en) * 2015-06-19 2019-01-16 株式会社ジェイ・イー・ティ Substrate processing system and substrate processing method
US20200333777A1 (en) * 2016-09-27 2020-10-22 Tokyo Electron Limited Abnormality detection method and abnormality detection apparatus

Also Published As

Publication number Publication date
KR102519802B1 (en) 2023-04-10
KR102389689B1 (en) 2022-04-22
JP6833048B2 (en) 2021-02-24
KR20220051437A (en) 2022-04-26
US20200201305A1 (en) 2020-06-25
JPWO2019043934A1 (en) 2020-03-26
WO2019043934A1 (en) 2019-03-07
US11782425B2 (en) 2023-10-10
KR20200029598A (en) 2020-03-18

Similar Documents

Publication Publication Date Title
IL256818B (en) Inspection apparatus, inspection method and manufacturing method
SG10201604456TA (en) Substrate processing apparatus and substrate processing method
SG10201601095UA (en) Substrate cleaning apparatus, substrate cleaning method, and substrate processing apparatus
IL273795A (en) Apparatus, system and method of process monitoring and control in an additive manufacturing environment
GB2553178B (en) Video processing apparatus, video processing method, and program
EP3146518A4 (en) Processing apparatus, processing system, processing program, and processing method
SG10201603136QA (en) Substrate processing apparatus and method for detecting abnormality of substrate
SG11201710080XA (en) Audio processing apparatus and method, and program
HK1245417B (en) Substrate processing method and substrate-processing apparatus
EP3399376A4 (en) Plant-abnormality-monitoring method and computer program for plant abnormality monitoring
HK1246872A1 (en) Substrate processing system and substrate processing method, and device manufacturing method
SG10201707397YA (en) Method of manufacturing semiconductor device, substrate processing apparatus, and program
IL267874A (en) Metrology method, apparatus and computer program
EP3676699C0 (en) Apparatus and method for configuring and monitoring virtual applications
SG11201808206WA (en) Substrate processing apparatus, method of manufacturing semiconductor device, and program
EP3680798A4 (en) Method and device for monitoring process
EP3795975A4 (en) Abnormality sensing apparatus, abnormality sensing method, and abnormality sensing program
SG10202001360UA (en) Method of manufacturing semiconductor device, substrate processing apparatus, and program
ZA201902477B (en) Operation object processing method and apparatus
GB2545986B (en) Image processing apparatus, image processing method, and program
SG11202001932UA (en) Substrate processing apparatus, method of monitoring abnormality of substrate processing apparatus, and program
IL273796A (en) Apparatus, system and method of monitoring an additive manufacturing environment
SG10201700932TA (en) Water discharge system, water discharge method, water discharge control apparatus, water discharge control method, substrate processing apparatus and water discharge control program
SG10202004551XA (en) Method of manufacturing semiconductor device, substrate processing apparatus and program
EP3258644A4 (en) Monitoring processing method and device