SG11202000889QA - Apparatus and method for treating silica-containing water - Google Patents
Apparatus and method for treating silica-containing waterInfo
- Publication number
- SG11202000889QA SG11202000889QA SG11202000889QA SG11202000889QA SG11202000889QA SG 11202000889Q A SG11202000889Q A SG 11202000889QA SG 11202000889Q A SG11202000889Q A SG 11202000889QA SG 11202000889Q A SG11202000889Q A SG 11202000889QA SG 11202000889Q A SG11202000889Q A SG 11202000889QA
- Authority
- SG
- Singapore
- Prior art keywords
- containing water
- treating silica
- silica
- treating
- water
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F11/00—Treatment of sludge; Devices therefor
- C02F11/12—Treatment of sludge; Devices therefor by de-watering, drying or thickening
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
- B01D61/02—Reverse osmosis; Hyperfiltration ; Nanofiltration
- B01D61/04—Feed pretreatment
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/44—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/58—Treatment of water, waste water, or sewage by removing specified dissolved compounds
- C02F1/60—Silicon compounds
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F11/00—Treatment of sludge; Devices therefor
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017175163A JP7084704B2 (ja) | 2017-09-12 | 2017-09-12 | シリカ含有水の処理装置および処理方法 |
JP2017195580A JP7108392B2 (ja) | 2017-10-06 | 2017-10-06 | シリカ含有水の処理装置および処理方法 |
JP2018010741A JP7168324B2 (ja) | 2018-01-25 | 2018-01-25 | シリカ含有水の処理装置および処理方法 |
PCT/JP2018/028126 WO2019054062A1 (ja) | 2017-09-12 | 2018-07-26 | シリカ含有水の処理装置および処理方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11202000889QA true SG11202000889QA (en) | 2020-02-27 |
Family
ID=65723637
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11202000889QA SG11202000889QA (en) | 2017-09-12 | 2018-07-26 | Apparatus and method for treating silica-containing water |
Country Status (4)
Country | Link |
---|---|
CN (1) | CN111051253A (ja) |
SG (1) | SG11202000889QA (ja) |
TW (1) | TWI771476B (ja) |
WO (1) | WO2019054062A1 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI744200B (zh) * | 2021-03-03 | 2021-10-21 | 成信實業股份有限公司 | 半導體廢矽泥之二氧化矽再生方法 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4168520B2 (ja) * | 1999-03-12 | 2008-10-22 | 栗田工業株式会社 | Cmp排液の処理方法 |
JP2003300069A (ja) * | 2002-04-09 | 2003-10-21 | Toray Ind Inc | 造水方法及び造水装置 |
JP2004141799A (ja) * | 2002-10-25 | 2004-05-20 | Mitsubishi Heavy Ind Ltd | シリカを含有する排水の処理方法 |
EP2177479A4 (en) * | 2007-08-07 | 2013-05-29 | Kurita Water Ind Ltd | MEMBRANE SEPARATION METHOD AND MEMBRANE SEPARATION DEVICE |
US20180304203A1 (en) * | 2015-06-19 | 2018-10-25 | Nanostone Water Inc. | Ceramic membrane system for silica removal and related methods |
CA2911135A1 (en) * | 2015-11-04 | 2017-05-04 | Fereidoun Khadem | Process for treatment of high contaminated waters |
JP6912192B2 (ja) * | 2016-12-09 | 2021-08-04 | オルガノ株式会社 | シリカ含有水の処理装置および処理方法 |
-
2018
- 2018-07-26 SG SG11202000889QA patent/SG11202000889QA/en unknown
- 2018-07-26 CN CN201880051366.8A patent/CN111051253A/zh active Pending
- 2018-07-26 WO PCT/JP2018/028126 patent/WO2019054062A1/ja active Application Filing
- 2018-08-23 TW TW107129377A patent/TWI771476B/zh active
Also Published As
Publication number | Publication date |
---|---|
TWI771476B (zh) | 2022-07-21 |
TW201920003A (zh) | 2019-06-01 |
WO2019054062A1 (ja) | 2019-03-21 |
CN111051253A (zh) | 2020-04-21 |
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