SG11201909402XA - Aerosol-free vessel for bubbling chemical precursors in a deposition process - Google Patents
Aerosol-free vessel for bubbling chemical precursors in a deposition processInfo
- Publication number
- SG11201909402XA SG11201909402XA SG11201909402XA SG11201909402XA SG 11201909402X A SG11201909402X A SG 11201909402XA SG 11201909402X A SG11201909402X A SG 11201909402XA SG 11201909402X A SG11201909402X A SG 11201909402XA
- Authority
- SG
- Singapore
- Prior art keywords
- tempe
- international
- parkway
- vessel
- river
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4486—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by producing an aerosol and subsequent evaporation of the droplets or particles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C3/00—Vessels not under pressure
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C2205/00—Vessel construction, in particular mounting arrangements, attachments or identifications means
- F17C2205/03—Fluid connections, filters, valves, closure means or other attachments
- F17C2205/0302—Fittings, valves, filters, or components in connection with the gas storage device
- F17C2205/0311—Closure means
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C2205/00—Vessel construction, in particular mounting arrangements, attachments or identifications means
- F17C2205/03—Fluid connections, filters, valves, closure means or other attachments
- F17C2205/0302—Fittings, valves, filters, or components in connection with the gas storage device
- F17C2205/0352—Pipes
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Dispersion Chemistry (AREA)
- General Engineering & Computer Science (AREA)
- Chemical Vapour Deposition (AREA)
- Nozzles (AREA)
- Filling Or Discharging Of Gas Storage Vessels (AREA)
Abstract
PATHaerosols travel and vessel () INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property Organization International Bureau (43) International Publication Date 18 October 2018 (18.10.2018) W I PO I PCT omit VIII °nolo VIII VIII VIII no oimIE (10) International Publication Number WO 2018/191125 Al Figure 1 o (51) International Patent Classification: C23C 16/448 (2006.01) C23C 16/52 (2006.01) (21) International Application Number: PCT/US2018/026535 (22) International Filing Date: 06 April 2018 (06.04.2018) (25) Filing Language: English (26) Publication Language: English (30) Priority Data: 62/483,784 10 April 2017 (10.04.2017) US (71) Applicant: VERSUM MATERIALS US, LLC [US/US]; 8555 S. River Parkway, Tempe, AZ 85284 (US). (72) Inventors: BIRTCHER, Charles Michael; 8555 S. River Parkway, Tempe, AZ 85284 (US). VIVANCO, Gildardo; 8555 S. River Parkway, Tempe, AZ 85284 (US). IVANOV, Sergei V.; 8555 S. River Parkway, Tempe, AZ 85284 (US). SHEEHY, William; 8555 S. River Parkway, Tempe, AZ 85284 (US). STEIDL, Thomas Andrew; 8555 S. River Parkway, Tempe, AZ 85284 (US). (74) Agent: ROSSI, Joseph D. et al.; Stradley Ronon Stevens & Young, LLP, 30 Valley Stream Parkway, Great Valley Corporate Center, Malvern, PA 19355 (US). (81) Designated States (unless otherwise indicated, for every kind of national protection available): AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (84) Designated States (unless otherwise indicated, for every kind of regional protection available): ARIPO (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, = (54) Title: AEROSOL-FREE VESSEL FOR BUBBLING CHEMICAL PRECURSORS IN A DEPOSITION PROCESS EXIT vapor exits the vessel ENTRANCE aerosols enter the vessel kt) 0 .-- f - 5 (57) : Described herein are aerosol-free vessels, delivery containers, systems and methods using same for providing improve- ments to precursor utilization in the containers for deposition process, as well as the cleaning and refilling of the containers. The clog- ging of valves and piping as some precursors decompose vapor are minimized This invention prevents mist from forming and thus preventing clogging or wafer contamination from aerosols. [Continued on next page] WO 2018/191125 Al MIDEDIMOMONIIME10130MMOEHOHOMOVOIS TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG). Published: — with international search report (Art. 21(3))
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201762483784P | 2017-04-10 | 2017-04-10 | |
PCT/US2018/026535 WO2018191125A1 (en) | 2017-04-10 | 2018-04-06 | Aerosol-free vessel for bubbling chemical precursors in a deposition process |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201909402XA true SG11201909402XA (en) | 2019-11-28 |
Family
ID=63793009
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201909402X SG11201909402XA (en) | 2017-04-10 | 2018-04-06 | Aerosol-free vessel for bubbling chemical precursors in a deposition process |
Country Status (8)
Country | Link |
---|---|
US (1) | US20200131630A1 (en) |
EP (1) | EP3610052A4 (en) |
JP (1) | JP7028955B2 (en) |
KR (1) | KR102415265B1 (en) |
CN (2) | CN208501094U (en) |
SG (1) | SG11201909402XA (en) |
TW (1) | TWI675120B (en) |
WO (1) | WO2018191125A1 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7028955B2 (en) * | 2017-04-10 | 2022-03-02 | バーサム マテリアルズ ユーエス,リミティド ライアビリティ カンパニー | Aerosol-free vessel for bubbling chemical precursors in the deposition process |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3690638A (en) * | 1970-05-15 | 1972-09-12 | Republic Steel Corp | Apparatus and method for vaporizing molten metal |
US5360572A (en) * | 1991-11-29 | 1994-11-01 | The United States Of America As Represented By The Secretary Of The Air Force | Aerogel mesh getter |
US5887117A (en) * | 1997-01-02 | 1999-03-23 | Sharp Kabushiki Kaisha | Flash evaporator |
US6358323B1 (en) * | 1998-07-21 | 2002-03-19 | Applied Materials, Inc. | Method and apparatus for improved control of process and purge material in a substrate processing system |
JP2004524148A (en) * | 2001-02-28 | 2004-08-12 | ポーター・インストゥルメント・カンパニー・インコーポレイテッド | Manifold fluid delivery system |
EP1525337A2 (en) * | 2002-07-30 | 2005-04-27 | ASM America, Inc. | Sublimation system employing carrier gas |
US7464917B2 (en) | 2005-10-07 | 2008-12-16 | Appiled Materials, Inc. | Ampoule splash guard apparatus |
US8986456B2 (en) * | 2006-10-10 | 2015-03-24 | Asm America, Inc. | Precursor delivery system |
AU2014260456A1 (en) * | 2013-05-03 | 2015-12-17 | Kasra Farsad | Vacuum condenser |
US10107490B2 (en) * | 2014-06-30 | 2018-10-23 | Lam Research Corporation | Configurable liquid precursor vaporizer |
US10563305B2 (en) * | 2015-05-13 | 2020-02-18 | Versum Materials Us, Llc | Container for chemical precursors in a deposition process |
JP7028955B2 (en) * | 2017-04-10 | 2022-03-02 | バーサム マテリアルズ ユーエス,リミティド ライアビリティ カンパニー | Aerosol-free vessel for bubbling chemical precursors in the deposition process |
-
2018
- 2018-04-06 JP JP2020504280A patent/JP7028955B2/en active Active
- 2018-04-06 US US16/603,757 patent/US20200131630A1/en not_active Abandoned
- 2018-04-06 WO PCT/US2018/026535 patent/WO2018191125A1/en unknown
- 2018-04-06 KR KR1020197033084A patent/KR102415265B1/en active IP Right Grant
- 2018-04-06 SG SG11201909402X patent/SG11201909402XA/en unknown
- 2018-04-06 EP EP18784890.8A patent/EP3610052A4/en active Pending
- 2018-04-09 CN CN201820494808.3U patent/CN208501094U/en not_active Expired - Fee Related
- 2018-04-09 TW TW107112052A patent/TWI675120B/en active
- 2018-04-09 CN CN201810312046.5A patent/CN108690971B/en active Active
Also Published As
Publication number | Publication date |
---|---|
WO2018191125A1 (en) | 2018-10-18 |
EP3610052A1 (en) | 2020-02-19 |
CN108690971A (en) | 2018-10-23 |
TW201837226A (en) | 2018-10-16 |
JP2020516775A (en) | 2020-06-11 |
CN208501094U (en) | 2019-02-15 |
EP3610052A4 (en) | 2020-12-09 |
JP7028955B2 (en) | 2022-03-02 |
KR102415265B1 (en) | 2022-06-29 |
US20200131630A1 (en) | 2020-04-30 |
KR20190128265A (en) | 2019-11-15 |
CN108690971B (en) | 2020-10-30 |
TWI675120B (en) | 2019-10-21 |
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