SG11201901964UA - Axial electron gun - Google Patents

Axial electron gun

Info

Publication number
SG11201901964UA
SG11201901964UA SG11201901964UA SG11201901964UA SG11201901964UA SG 11201901964U A SG11201901964U A SG 11201901964UA SG 11201901964U A SG11201901964U A SG 11201901964UA SG 11201901964U A SG11201901964U A SG 11201901964UA SG 11201901964U A SG11201901964U A SG 11201901964UA
Authority
SG
Singapore
Prior art keywords
electron
electron gun
axial
gun
cathodes
Prior art date
Application number
SG11201901964UA
Inventor
Victor Alexandrovich Timashov
Andrey Anatolyevich Tsepkalov
Sergey Ivanovich Ryabenko
Aleksandr Fyodorovich Belyavin
Georgiy Sergeevich Marynskiy
Aleksey Vladislavovich Filippov
Original Assignee
Paton Turbine Tech Llc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Paton Turbine Tech Llc filed Critical Paton Turbine Tech Llc
Publication of SG11201901964UA publication Critical patent/SG11201901964UA/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/06Electron sources; Electron guns
    • H01J37/075Electron guns using thermionic emission from cathodes heated by particle bombardment or by irradiation, e.g. by laser
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02Main electrodes
    • H01J1/13Solid thermionic cathodes
    • H01J1/15Cathodes heated directly by an electric current
    • H01J1/18Supports; Vibration-damping arrangements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02Main electrodes
    • H01J1/13Solid thermionic cathodes
    • H01J1/20Cathodes heated indirectly by an electric current; Cathodes heated by electron or ion bombardment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02Main electrodes
    • H01J1/13Solid thermionic cathodes
    • H01J1/20Cathodes heated indirectly by an electric current; Cathodes heated by electron or ion bombardment
    • H01J1/26Supports for the emissive material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/06Electron sources; Electron guns
    • H01J37/065Construction of guns or parts thereof

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

AXIAL ELECTRON GUN The invention relates to the field of fabrication of new materials and coatings and may be used in plants designed for electron-beam heating, melting and evaporating 5 of materials in vacuum or reactive gas atmosphere. The disclosed axial electron gun that comprises, in particular, the primary and secondary cathodes and features the figure- shaped holder used for maintaining a stable position of the secondary cathode relative to the electron-beam axis of the axial gun and the pulsing voltage that is applied between the cathodes for electron bombardment of the secondary cathode. The invention ensures 10 an improved stability of process parameters and operation of the electron gun. Fig. 7
SG11201901964UA 2016-09-07 2017-06-09 Axial electron gun SG11201901964UA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
UAA201609313A UA113827C2 (en) 2016-09-07 2016-09-07 Axial Electron Cannon
PCT/UA2017/000064 WO2018048376A1 (en) 2016-09-07 2017-06-09 Axial electron gun

Publications (1)

Publication Number Publication Date
SG11201901964UA true SG11201901964UA (en) 2019-04-29

Family

ID=58503834

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201901964UA SG11201901964UA (en) 2016-09-07 2017-06-09 Axial electron gun

Country Status (9)

Country Link
US (1) US10636617B2 (en)
EP (1) EP3474307A4 (en)
JP (1) JP6947436B2 (en)
CN (1) CN109791865B (en)
CA (1) CA3036261C (en)
RU (1) RU2699765C1 (en)
SG (1) SG11201901964UA (en)
UA (1) UA113827C2 (en)
WO (1) WO2018048376A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6636472B2 (en) 2017-02-28 2020-01-29 株式会社日立ハイテクノロジーズ Electron source and electron beam device using the same

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1572328A (en) * 1924-06-11 1926-02-09 E & T Fairbanks And Company Platform scale
AT233741B (en) * 1961-04-25 1964-05-25 Schwarzkopf Fa Hans Closure for vials
DE1142664B (en) * 1962-02-17 1963-01-24 Heraeus Gmbh W C Glow cathode
US3556600A (en) 1968-08-30 1971-01-19 Westinghouse Electric Corp Distribution and cutting of rocks,glass and the like
FR2315766A1 (en) * 1975-06-23 1977-01-21 Sciaky Sa ELECTRON CANNON
US4057476A (en) 1976-05-26 1977-11-08 General Dynamics Corporation Thin film photovoltaic diodes and method for making same
US4084077A (en) 1977-05-10 1978-04-11 Igor Antonovich Porazhinsky Cathode assembly of electron beam welding gun
JPS6025857B2 (en) 1979-05-17 1985-06-20 電気化学工業株式会社 electron gun
JPS57196443A (en) * 1981-05-29 1982-12-02 Denki Kagaku Kogyo Kk Manufacture of hot cathode
DE3534792A1 (en) 1985-09-30 1987-04-02 Leybold Heraeus Gmbh & Co Kg ELECTRONIC RADIATOR WITH A DIRECTLY AND INDIRECTLY HEATABLE CATODE
SU1572328A1 (en) * 1988-02-19 1995-01-09 Всесоюзный Электротехнический Институт Им.В.И.Ленина Electron gun
JPH0417247A (en) * 1990-05-10 1992-01-22 Fujitsu Ltd Electric field ionization type ion source
JPH07335161A (en) * 1994-06-03 1995-12-22 Hitachi Medical Corp Electron gun
JPH08250056A (en) * 1995-03-07 1996-09-27 Himu Electro Kk Ion generating device and cleaning device using this ion generating device
US6548946B1 (en) * 2000-11-02 2003-04-15 General Electric Company Electron beam generator
UA43927C2 (en) 2000-12-26 2002-01-15 Міжнародний Центр Електронно-Променевих Технологій Інституту Електрозварювання Ім. Е.О. Патона Нан України ELECTRONIC CANNON WITH LINEAR THERMOCATODE FOR ELECTRONIC RADIATION HEATING
JP4262002B2 (en) 2003-06-30 2009-05-13 株式会社堀場製作所 Field emission electron gun
FR2861215B1 (en) * 2003-10-20 2006-05-19 Calhene ELECTRON GUN WITH FOCUSING ANODE, FORMING A WINDOW OF THIS CANON, APPLICATION TO IRRADIATION AND STERILIZATION
JP2006331853A (en) * 2005-05-26 2006-12-07 Jeol Ltd Filament assembly and electron gun, and electron beam device
US8159118B2 (en) * 2005-11-02 2012-04-17 United Technologies Corporation Electron gun
JP4636082B2 (en) * 2007-12-27 2011-02-23 日新イオン機器株式会社 Cathode holding structure and ion source including the same
DE102010049521B3 (en) * 2010-10-25 2012-04-12 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Device for generating an electron beam
RU130535U1 (en) 2013-02-28 2013-07-27 Федеральное государственное унитарное предприятие "Научно-производственный центр газотурбостроения "Салют" (ФГУП "НПЦ газотурбостроения "Салют") CATHODE ASSEMBLY FOR ELECTRON BEAM (OPTIONS)
CN108666188B (en) 2013-12-30 2020-06-12 Asml荷兰有限公司 Cathode arrangement, electron gun and lithography system comprising such an electron gun
JP6346034B2 (en) * 2014-08-29 2018-06-20 日本電子株式会社 3D image construction method, image processing apparatus, and electron microscope

Also Published As

Publication number Publication date
WO2018048376A1 (en) 2018-03-15
UA113827C2 (en) 2017-03-10
CN109791865B (en) 2021-02-23
US10636617B2 (en) 2020-04-28
JP6947436B2 (en) 2021-10-13
EP3474307A1 (en) 2019-04-24
JP2019526922A (en) 2019-09-19
CA3036261C (en) 2024-03-26
EP3474307A4 (en) 2020-03-04
CA3036261A1 (en) 2018-03-15
RU2699765C1 (en) 2019-09-10
US20190214220A1 (en) 2019-07-11
CN109791865A (en) 2019-05-21

Similar Documents

Publication Publication Date Title
GB2563349A (en) Fabrication of correlated electron material devices method to control carbon
US8822911B2 (en) Focused ion beam apparatus and method of adjusting ion beam optics
KR102518443B1 (en) Cesium primary source for secondary ion mass spectrometer
US10068743B2 (en) Ion source devices and methods
JP2015525438A5 (en) Method and apparatus for generating an ion beam having gallium ions
US9941087B2 (en) Ion source cathode shield
TWI805549B (en) Conductive component for ion implantation system and ion implantation system comprising the same
WO2015187639A3 (en) Method of improving ion beam quality in a non-mass-analyzed ion implantation system
SG11201901964UA (en) Axial electron gun
RU2012100186A (en) METHOD FOR APPLICATION ON METAL PARTS OF COMPLEX PROTECTIVE COATING AGAINST EXPOSURE TO HYDROGEN
CN204497191U (en) A kind of Kaufman power supply with anti-static coating
WO2016092368A3 (en) Plasma generator with at least one non-metallic component
Golovin et al. Dependence of electron beam generation in an open discharge on the discharge gap configuration and gas pressure
Pagonakis et al. A gun design criterion to limit the effects of the electron beam halo in gyrotrons
Amirov et al. High-voltage discharge in supersonic jet of plumbum vapor
Stockli Radio Frequency-Driven, Pulsed High-Current H− Ion Sources on Advanced Accelerators
LV15213A (en) Gaseous-discharge electron-beam gun
RU2012105581A (en) METHOD FOR COVERING BY ELECTRON BEAM EVAPORATION IN VACUUM
CN204706536U (en) A kind of Kaufman ion source of metallic cathode structure
Zawada et al. Electron beam generated in low pressure noble gas atmosphere–Compact device construction and applications
Bolouki Effect of Cathode Material in Obstructed Discharge Regime
Abbas et al. The axial profile of plasma characteristics of cylindrical magnetron sputtering device
Amirov et al. Experimental study of vacuum arc with low cathode current density as a source of metal plasma
Notte Focused Ion Beams for Imaging, Analysis, and Fabrication-Where Did They Come From and Where Are They Going?
RU2575018C1 (en) Extended cathode magnetron sputtering system