SG11201901964UA - Axial electron gun - Google Patents
Axial electron gunInfo
- Publication number
- SG11201901964UA SG11201901964UA SG11201901964UA SG11201901964UA SG11201901964UA SG 11201901964U A SG11201901964U A SG 11201901964UA SG 11201901964U A SG11201901964U A SG 11201901964UA SG 11201901964U A SG11201901964U A SG 11201901964UA SG 11201901964U A SG11201901964U A SG 11201901964UA
- Authority
- SG
- Singapore
- Prior art keywords
- electron
- electron gun
- axial
- gun
- cathodes
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
- H01J37/075—Electron guns using thermionic emission from cathodes heated by particle bombardment or by irradiation, e.g. by laser
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
- H01J1/02—Main electrodes
- H01J1/13—Solid thermionic cathodes
- H01J1/15—Cathodes heated directly by an electric current
- H01J1/18—Supports; Vibration-damping arrangements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
- H01J1/02—Main electrodes
- H01J1/13—Solid thermionic cathodes
- H01J1/20—Cathodes heated indirectly by an electric current; Cathodes heated by electron or ion bombardment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
- H01J1/02—Main electrodes
- H01J1/13—Solid thermionic cathodes
- H01J1/20—Cathodes heated indirectly by an electric current; Cathodes heated by electron or ion bombardment
- H01J1/26—Supports for the emissive material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
- H01J37/065—Construction of guns or parts thereof
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Electron Sources, Ion Sources (AREA)
- Physical Vapour Deposition (AREA)
Abstract
AXIAL ELECTRON GUN The invention relates to the field of fabrication of new materials and coatings and may be used in plants designed for electron-beam heating, melting and evaporating 5 of materials in vacuum or reactive gas atmosphere. The disclosed axial electron gun that comprises, in particular, the primary and secondary cathodes and features the figure- shaped holder used for maintaining a stable position of the secondary cathode relative to the electron-beam axis of the axial gun and the pulsing voltage that is applied between the cathodes for electron bombardment of the secondary cathode. The invention ensures 10 an improved stability of process parameters and operation of the electron gun. Fig. 7
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
UAA201609313A UA113827C2 (en) | 2016-09-07 | 2016-09-07 | Axial Electron Cannon |
PCT/UA2017/000064 WO2018048376A1 (en) | 2016-09-07 | 2017-06-09 | Axial electron gun |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201901964UA true SG11201901964UA (en) | 2019-04-29 |
Family
ID=58503834
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201901964UA SG11201901964UA (en) | 2016-09-07 | 2017-06-09 | Axial electron gun |
Country Status (9)
Country | Link |
---|---|
US (1) | US10636617B2 (en) |
EP (1) | EP3474307A4 (en) |
JP (1) | JP6947436B2 (en) |
CN (1) | CN109791865B (en) |
CA (1) | CA3036261C (en) |
RU (1) | RU2699765C1 (en) |
SG (1) | SG11201901964UA (en) |
UA (1) | UA113827C2 (en) |
WO (1) | WO2018048376A1 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6636472B2 (en) | 2017-02-28 | 2020-01-29 | 株式会社日立ハイテクノロジーズ | Electron source and electron beam device using the same |
Family Cites Families (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1572328A (en) * | 1924-06-11 | 1926-02-09 | E & T Fairbanks And Company | Platform scale |
AT233741B (en) * | 1961-04-25 | 1964-05-25 | Schwarzkopf Fa Hans | Closure for vials |
DE1142664B (en) * | 1962-02-17 | 1963-01-24 | Heraeus Gmbh W C | Glow cathode |
US3556600A (en) | 1968-08-30 | 1971-01-19 | Westinghouse Electric Corp | Distribution and cutting of rocks,glass and the like |
FR2315766A1 (en) * | 1975-06-23 | 1977-01-21 | Sciaky Sa | ELECTRON CANNON |
US4057476A (en) | 1976-05-26 | 1977-11-08 | General Dynamics Corporation | Thin film photovoltaic diodes and method for making same |
US4084077A (en) | 1977-05-10 | 1978-04-11 | Igor Antonovich Porazhinsky | Cathode assembly of electron beam welding gun |
JPS6025857B2 (en) | 1979-05-17 | 1985-06-20 | 電気化学工業株式会社 | electron gun |
JPS57196443A (en) * | 1981-05-29 | 1982-12-02 | Denki Kagaku Kogyo Kk | Manufacture of hot cathode |
DE3534792A1 (en) | 1985-09-30 | 1987-04-02 | Leybold Heraeus Gmbh & Co Kg | ELECTRONIC RADIATOR WITH A DIRECTLY AND INDIRECTLY HEATABLE CATODE |
SU1572328A1 (en) * | 1988-02-19 | 1995-01-09 | Всесоюзный Электротехнический Институт Им.В.И.Ленина | Electron gun |
JPH0417247A (en) * | 1990-05-10 | 1992-01-22 | Fujitsu Ltd | Electric field ionization type ion source |
JPH07335161A (en) * | 1994-06-03 | 1995-12-22 | Hitachi Medical Corp | Electron gun |
JPH08250056A (en) * | 1995-03-07 | 1996-09-27 | Himu Electro Kk | Ion generating device and cleaning device using this ion generating device |
US6548946B1 (en) * | 2000-11-02 | 2003-04-15 | General Electric Company | Electron beam generator |
UA43927C2 (en) | 2000-12-26 | 2002-01-15 | Міжнародний Центр Електронно-Променевих Технологій Інституту Електрозварювання Ім. Е.О. Патона Нан України | ELECTRONIC CANNON WITH LINEAR THERMOCATODE FOR ELECTRONIC RADIATION HEATING |
JP4262002B2 (en) | 2003-06-30 | 2009-05-13 | 株式会社堀場製作所 | Field emission electron gun |
FR2861215B1 (en) * | 2003-10-20 | 2006-05-19 | Calhene | ELECTRON GUN WITH FOCUSING ANODE, FORMING A WINDOW OF THIS CANON, APPLICATION TO IRRADIATION AND STERILIZATION |
JP2006331853A (en) * | 2005-05-26 | 2006-12-07 | Jeol Ltd | Filament assembly and electron gun, and electron beam device |
US8159118B2 (en) * | 2005-11-02 | 2012-04-17 | United Technologies Corporation | Electron gun |
JP4636082B2 (en) * | 2007-12-27 | 2011-02-23 | 日新イオン機器株式会社 | Cathode holding structure and ion source including the same |
DE102010049521B3 (en) * | 2010-10-25 | 2012-04-12 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Device for generating an electron beam |
RU130535U1 (en) | 2013-02-28 | 2013-07-27 | Федеральное государственное унитарное предприятие "Научно-производственный центр газотурбостроения "Салют" (ФГУП "НПЦ газотурбостроения "Салют") | CATHODE ASSEMBLY FOR ELECTRON BEAM (OPTIONS) |
CN108666188B (en) | 2013-12-30 | 2020-06-12 | Asml荷兰有限公司 | Cathode arrangement, electron gun and lithography system comprising such an electron gun |
JP6346034B2 (en) * | 2014-08-29 | 2018-06-20 | 日本電子株式会社 | 3D image construction method, image processing apparatus, and electron microscope |
-
2016
- 2016-09-07 UA UAA201609313A patent/UA113827C2/en unknown
-
2017
- 2017-06-09 JP JP2019534631A patent/JP6947436B2/en active Active
- 2017-06-09 US US16/330,140 patent/US10636617B2/en active Active
- 2017-06-09 RU RU2018142852A patent/RU2699765C1/en active
- 2017-06-09 WO PCT/UA2017/000064 patent/WO2018048376A1/en unknown
- 2017-06-09 CA CA3036261A patent/CA3036261C/en active Active
- 2017-06-09 EP EP17849217.9A patent/EP3474307A4/en active Pending
- 2017-06-09 SG SG11201901964UA patent/SG11201901964UA/en unknown
- 2017-06-09 CN CN201780054490.5A patent/CN109791865B/en active Active
Also Published As
Publication number | Publication date |
---|---|
WO2018048376A1 (en) | 2018-03-15 |
UA113827C2 (en) | 2017-03-10 |
CN109791865B (en) | 2021-02-23 |
US10636617B2 (en) | 2020-04-28 |
JP6947436B2 (en) | 2021-10-13 |
EP3474307A1 (en) | 2019-04-24 |
JP2019526922A (en) | 2019-09-19 |
CA3036261C (en) | 2024-03-26 |
EP3474307A4 (en) | 2020-03-04 |
CA3036261A1 (en) | 2018-03-15 |
RU2699765C1 (en) | 2019-09-10 |
US20190214220A1 (en) | 2019-07-11 |
CN109791865A (en) | 2019-05-21 |
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