SG11201900141UA - Slurry composition and method of selective silica polishing - Google Patents

Slurry composition and method of selective silica polishing

Info

Publication number
SG11201900141UA
SG11201900141UA SG11201900141UA SG11201900141UA SG11201900141UA SG 11201900141U A SG11201900141U A SG 11201900141UA SG 11201900141U A SG11201900141U A SG 11201900141UA SG 11201900141U A SG11201900141U A SG 11201900141UA SG 11201900141U A SG11201900141U A SG 11201900141UA
Authority
SG
Singapore
Prior art keywords
international
polishing
slurry composition
suite
english
Prior art date
Application number
SG11201900141UA
Inventor
Nathaniel Urban
Original Assignee
Ferro Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ferro Corp filed Critical Ferro Corp
Publication of SG11201900141UA publication Critical patent/SG11201900141UA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
    • B24B37/044—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor characterised by the composition of the lapping agent
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions

Abstract

INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property 11111111111111111111111111111111111111111111111111111111111111111111111111111 Organization 0 International Bureau (10) International Publication Number (43) International Publication Date .....0\"\" WO 2018/038885 Al 01 March 2018 (01.03.2018) W I P0 I P C T (51) International Patent Classification: CO9G 1/02 (2006.01) B24B 1/00 (2006.01) C09K 3/14 (2006.01) (21) International Application Number: PCT/US2017/045066 (22) International Filing Date: 02 August 2017 (02.08.2017) (25) Filing Language: English (26) Publication Language: English (30) Priority Data: 62/379,916 26 August 2016 (26.08.2016) US (71) Applicant: FERRO CORPORATION [US/US]; 6060 Parkland Boulevard, Suite 350, Mayfield Heights, OH 44124 (US). (72) Inventor: URBAN, Nathaniel, D.; 427 North Main Street, Apt. 5, Canandaigua, NY 14424 (US). Agent: KORFF, Christopher, J ; Rankin, Hill & Clark (74) LLP, 23755 Lorain Road, Suite 200, North Olmsted, Ohio — = 44070 (US). Designated States (unless otherwise indicated, for every kind of national protection available): AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, (81) = _ __ _ HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, — KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. = = Designated States (unless otherwise indicated, for every (84) kind of regional protection available): ARIPO (BW, GH, = _ _ GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, = UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, = TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, = EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, = MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, — TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG). = — Published: ,- 1 — kin cc cc cc M © with international search report (Art. 21(3)) CO\" (54) Title: SLURRY COMPOSITION AND METHOD OF SELECTIVE SILICA POLISHING 1-1 0 (57) : An acidic slurry composition for use in chemical-mechanical polishing including an acid pH adjuster and a cationic ei polishing suppressant comprising a quaternized aromatic heterocycle. The quaternized aromatic heterocycle imparts a polishing selec- C: tivity of silica over crystalline silicon of at least 100.
SG11201900141UA 2016-08-26 2017-08-02 Slurry composition and method of selective silica polishing SG11201900141UA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201662379916P 2016-08-26 2016-08-26
PCT/US2017/045066 WO2018038885A1 (en) 2016-08-26 2017-08-02 Slurry composition and method of selective silica polishing

Publications (1)

Publication Number Publication Date
SG11201900141UA true SG11201900141UA (en) 2019-03-28

Family

ID=61246233

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201900141UA SG11201900141UA (en) 2016-08-26 2017-08-02 Slurry composition and method of selective silica polishing

Country Status (7)

Country Link
US (1) US11193044B2 (en)
JP (1) JP6723440B2 (en)
KR (1) KR102226055B1 (en)
CN (1) CN109476954B (en)
SG (1) SG11201900141UA (en)
TW (1) TWI646162B (en)
WO (1) WO2018038885A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023056324A1 (en) * 2021-10-01 2023-04-06 Versum Materials Us, Llc Tri azole- and/or tri azoli um-based polymers and copolymers as additives for chemical mechanical planarization slurries

Family Cites Families (40)

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KR100611064B1 (en) * 2004-07-15 2006-08-10 삼성전자주식회사 Slurry composition used for a chemical mechanical polishing process, Chemical mechanical polishing method using the slurry composition and Method of forming a gate pattern using the method
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CN101463225A (en) * 2007-12-21 2009-06-24 安集微电子（上海）有限公司 Chemico-mechanical polishing solution for barrier layer
JP2009289885A (en) * 2008-05-28 2009-12-10 Fujifilm Corp Polishing liquid and polishing method
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KR20100004181A (en) * 2008-07-03 2010-01-13 삼성전자주식회사 Slurry composition for a chemical mechanical polishing, method of preparing the slurry composition and method of polishing an object using the slurry composition
KR101443063B1 (en) * 2008-07-17 2014-09-24 삼성전자주식회사 Method of forming a ferroelectric layer and method of manufacturing a semiconductor device using the same
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Also Published As

Publication number Publication date
JP2019532133A (en) 2019-11-07
CN109476954B (en) 2021-07-23
KR102226055B1 (en) 2021-03-10
WO2018038885A1 (en) 2018-03-01
US20200079975A1 (en) 2020-03-12
JP6723440B2 (en) 2020-07-15
US11193044B2 (en) 2021-12-07
TWI646162B (en) 2019-01-01
CN109476954A (en) 2019-03-15
TW201811945A (en) 2018-04-01
KR20190019183A (en) 2019-02-26

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