SG11201810376PA - Production method for fabry-perot interference filter - Google Patents

Production method for fabry-perot interference filter

Info

Publication number
SG11201810376PA
SG11201810376PA SG11201810376PA SG11201810376PA SG11201810376PA SG 11201810376P A SG11201810376P A SG 11201810376PA SG 11201810376P A SG11201810376P A SG 11201810376PA SG 11201810376P A SG11201810376P A SG 11201810376PA SG 11201810376P A SG11201810376P A SG 11201810376PA
Authority
SG
Singapore
Prior art keywords
fabry
production method
expected
interference filter
mirror
Prior art date
Application number
SG11201810376PA
Inventor
Takashi Kasahara
Katsumi Shibayama
Masaki Hirose
Toshimitsu Kawai
Hiroki Oyama
Yumi Kuramoto
Original Assignee
Hamamatsu Photonics Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hamamatsu Photonics Kk filed Critical Hamamatsu Photonics Kk
Publication of SG11201810376PA publication Critical patent/SG11201810376PA/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/12—Generating the spectrum; Monochromators
    • G01J3/26—Generating the spectrum; Monochromators using multiple reflection, e.g. Fabry-Perot interferometer, variable interference filters
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/0006—Working by laser beam, e.g. welding, cutting or boring taking account of the properties of the material involved
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/08—Devices involving relative movement between laser beam and workpiece
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/50—Working by transmitting the laser beam through or within the workpiece
    • B23K26/53—Working by transmitting the laser beam through or within the workpiece for modifying or reforming the material inside the workpiece, e.g. for producing break initiation cracks
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/001—Optical devices or arrangements for the control of light using movable or deformable optical elements based on interference in an adjustable optical cavity
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00—Materials to be soldered, welded or cut
    • B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
    • B23K2103/54—Glass

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Computer Hardware Design (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Optical Filters (AREA)
  • Micromachines (AREA)

Abstract

method manufacturing Fabry-Perot filter includes a forming step of forming a first mirror layer having a plurality of first mirror portions, a sacrificial layer having a plurality of portions expected to be removed, and a second mirror layer having a plurality of 5 second mirror portions on a first main surface of a wafer which includes parts to plurality two-dimensionally substrates and is expected to be cut into the plurality of substrates along each of a plurality of lines; a removing step of simultaneously removing the of arranged expected be 10 removed the layer etching the step; a step cutting wafer the of substrates along each of the plurality of lines after the removing step. 15 FIGURE 7
SG11201810376PA 2016-05-27 2017-05-26 Production method for fabry-perot interference filter SG11201810376PA (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2016106269 2016-05-27
JP2016163916 2016-08-24
JP2016163942 2016-08-24
PCT/JP2017/019680 WO2017204326A1 (en) 2016-05-27 2017-05-26 Production method for fabry-perot interference filter

Publications (1)

Publication Number Publication Date
SG11201810376PA true SG11201810376PA (en) 2018-12-28

Family

ID=60412818

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201810376PA SG11201810376PA (en) 2016-05-27 2017-05-26 Production method for fabry-perot interference filter

Country Status (11)

Country Link
US (1) US11041755B2 (en)
EP (1) EP3467567B1 (en)
JP (1) JP7018873B2 (en)
KR (1) KR102432363B1 (en)
CN (1) CN109196405B (en)
ES (1) ES2972587T3 (en)
FI (1) FI3467567T3 (en)
PH (1) PH12018502444A1 (en)
SG (1) SG11201810376PA (en)
TW (1) TWI717519B (en)
WO (1) WO2017204326A1 (en)

Families Citing this family (6)

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TWI717519B (en) 2016-05-27 2021-02-01 日商濱松赫德尼古斯股份有限公司 Manufacturing method of Fabry-Peru interference filter
JP6341959B2 (en) * 2016-05-27 2018-06-13 浜松ホトニクス株式会社 Manufacturing method of Fabry-Perot interference filter
EP3505987B1 (en) * 2016-08-24 2023-10-11 Hamamatsu Photonics K.K. Fabry-perot interference filter
JP6517309B1 (en) * 2017-11-24 2019-05-22 浜松ホトニクス株式会社 Foreign matter removing method and manufacturing method of light detection device
FI130816B1 (en) * 2018-10-03 2024-04-04 Hamamatsu Photonics Kk Fabry-perot interference filter
US20220037145A1 (en) * 2020-07-31 2022-02-03 Psiquantum, Corp. Silicon nitride films having reduced interfacial strain

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Also Published As

Publication number Publication date
CN109196405B (en) 2021-09-10
WO2017204326A1 (en) 2017-11-30
EP3467567A4 (en) 2020-03-11
US20200141801A1 (en) 2020-05-07
KR102432363B1 (en) 2022-08-16
EP3467567A1 (en) 2019-04-10
JPWO2017204326A1 (en) 2019-03-22
CN109196405A (en) 2019-01-11
KR20190011768A (en) 2019-02-07
FI3467567T3 (en) 2024-04-22
TWI717519B (en) 2021-02-01
TW201805229A (en) 2018-02-16
JP7018873B2 (en) 2022-02-14
EP3467567B1 (en) 2024-02-07
ES2972587T3 (en) 2024-06-13
PH12018502444A1 (en) 2019-09-09
US11041755B2 (en) 2021-06-22

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