SG11201706614XA - Method for producing a tridimensional structure using two pre-supporting materials - Google Patents

Method for producing a tridimensional structure using two pre-supporting materials

Info

Publication number
SG11201706614XA
SG11201706614XA SG11201706614XA SG11201706614XA SG11201706614XA SG 11201706614X A SG11201706614X A SG 11201706614XA SG 11201706614X A SG11201706614X A SG 11201706614XA SG 11201706614X A SG11201706614X A SG 11201706614XA SG 11201706614X A SG11201706614X A SG 11201706614XA
Authority
SG
Singapore
Prior art keywords
producing
supporting materials
tridimensional structure
tridimensional
supporting
Prior art date
Application number
SG11201706614XA
Other languages
English (en)
Inventor
Friederike Fleischhaker
Valeria Bem
Andre Fuchs
Original Assignee
Basf Se
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Basf Se filed Critical Basf Se
Publication of SG11201706614XA publication Critical patent/SG11201706614XA/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10—Processes of additive manufacturing
    • B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
    • B29C64/112—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using individual droplets, e.g. from jetting heads
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/40—Structures for supporting 3D objects during manufacture and intended to be sacrificed after completion thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y10/00—Processes of additive manufacturing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y70/00—Materials specially adapted for additive manufacturing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/20—Apparatus for additive manufacturing; Details thereof or accessories therefor
    • B29C64/264—Arrangements for irradiation
    • B29C64/291—Arrangements for irradiation for operating globally, e.g. together with selectively applied activators or inhibitors
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2033/00—Use of polymers of unsaturated acids or derivatives thereof as moulding material
    • B29K2033/04—Polymers of esters
    • B29K2033/12—Polymers of methacrylic acid esters, e.g. PMMA, i.e. polymethylmethacrylate
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2063/00—Use of EP, i.e. epoxy resins or derivatives thereof, as moulding material

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mechanical Engineering (AREA)
  • Optics & Photonics (AREA)
  • Inorganic Chemistry (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
SG11201706614XA 2015-03-03 2016-03-03 Method for producing a tridimensional structure using two pre-supporting materials SG11201706614XA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP15157414 2015-03-03
PCT/EP2016/054498 WO2016139287A1 (de) 2015-03-03 2016-03-03 Verfahren zur herstellung einer dreidimensionalen struktur unter verwendung zweier prä-stützmaterialien

Publications (1)

Publication Number Publication Date
SG11201706614XA true SG11201706614XA (en) 2017-09-28

Family

ID=52596832

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201706614XA SG11201706614XA (en) 2015-03-03 2016-03-03 Method for producing a tridimensional structure using two pre-supporting materials

Country Status (11)

Country Link
US (1) US20180036954A1 (zh)
EP (1) EP3265878B1 (zh)
JP (1) JP2018515356A (zh)
KR (1) KR20170121275A (zh)
CN (1) CN107405838A (zh)
AU (1) AU2016227634A1 (zh)
CA (1) CA2977867A1 (zh)
IL (1) IL253993A0 (zh)
MX (1) MX2017011245A (zh)
SG (1) SG11201706614XA (zh)
WO (1) WO2016139287A1 (zh)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10829588B2 (en) 2015-07-09 2020-11-10 Basf Se Curable compositions
WO2017048710A1 (en) * 2015-09-14 2017-03-23 Carbon, Inc. Light-curable article of manufacture with portions of differing solubility
US10800108B2 (en) 2016-12-02 2020-10-13 Markforged, Inc. Sinterable separation material in additive manufacturing
US10000011B1 (en) 2016-12-02 2018-06-19 Markforged, Inc. Supports for sintering additively manufactured parts
IL266909B2 (en) 2016-12-06 2024-01-01 Markforged Inc Additive manufacturing with heat flexible material feed
CN110198925B (zh) 2017-01-27 2022-08-30 巴斯夫欧洲公司 制备(甲基)丙烯酸降冰片基酯的方法
CN111278627B (zh) * 2017-10-25 2023-02-03 惠普发展公司，有限责任合伙企业 用于由颗粒形成的3d特征的热支撑物
CN107984755B (zh) * 2017-11-30 2019-09-10 南京师范大学 一种高精度双成型方式的3d打印机及其成型方法
CN111542570B (zh) * 2017-12-29 2023-02-17 巴斯夫欧洲公司 用于产生用于3d光聚合物喷射的载体子结构的组合物
JP2021522086A (ja) * 2018-05-03 2021-08-30 ディーエスエム アイピー アセッツ ビー．ブイ．Ｄｓｍ Ｉｐ Ａｓｓｅｔｓ Ｂ．Ｖ． 積層造形によって作られる光造形物品の後加工方法
CN111409266A (zh) * 2019-01-06 2020-07-14 严铜 易剥离的支撑材料及应用该材料的3d打印机

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6569373B2 (en) * 2000-03-13 2003-05-27 Object Geometries Ltd. Compositions and methods for use in three dimensional model printing
US8481241B2 (en) * 2000-03-13 2013-07-09 Stratasys Ltd. Compositions and methods for use in three dimensional model printing
AT411741B (de) * 2002-07-22 2004-05-25 Colop Stempelerzeugung Skopek Verfahren und einrichtung zur herstellung eines stempels
EP2429802B1 (en) * 2009-05-12 2013-10-02 3D Systems, Inc. Compositions for selective deposition modeling
JP5890990B2 (ja) * 2010-11-01 2016-03-22 株式会社キーエンス インクジェット光造形法における、光造形品形成用モデル材、光造形品の光造形時の形状支持用サポート材および光造形品の製造方法
JP2012096429A (ja) * 2010-11-01 2012-05-24 Keyence Corp 三次元造形装置及び三次元造形方法

Also Published As

Publication number Publication date
CN107405838A (zh) 2017-11-28
AU2016227634A1 (en) 2017-08-31
EP3265878B1 (de) 2019-04-10
CA2977867A1 (en) 2016-09-09
IL253993A0 (en) 2017-10-31
EP3265878A1 (de) 2018-01-10
WO2016139287A1 (de) 2016-09-09
KR20170121275A (ko) 2017-11-01
MX2017011245A (es) 2017-11-01
JP2018515356A (ja) 2018-06-14
US20180036954A1 (en) 2018-02-08

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