SG11201705354SA - Self-damping shutter apparatus for exposure system of photolithography machine - Google Patents

Self-damping shutter apparatus for exposure system of photolithography machine

Info

Publication number
SG11201705354SA
SG11201705354SA SG11201705354SA SG11201705354SA SG11201705354SA SG 11201705354S A SG11201705354S A SG 11201705354SA SG 11201705354S A SG11201705354S A SG 11201705354SA SG 11201705354S A SG11201705354S A SG 11201705354SA SG 11201705354S A SG11201705354S A SG 11201705354SA
Authority
SG
Singapore
Prior art keywords
self
exposure system
shutter apparatus
photolithography machine
damping shutter
Prior art date
Application number
SG11201705354SA
Inventor
Shuo Shi
Hanchuan Ji
Original Assignee
Shanghai Micro Electronics Equipment (Group) Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shanghai Micro Electronics Equipment (Group) Co Ltd filed Critical Shanghai Micro Electronics Equipment (Group) Co Ltd
Publication of SG11201705354SA publication Critical patent/SG11201705354SA/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B9/00—Exposure-making shutters; Diaphragms
    • G03B9/08—Shutters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B9/00—Exposure-making shutters; Diaphragms
    • G03B9/08—Shutters
    • G03B9/10—Blade or disc rotating or pivoting about axis normal to its plane
    • G03B9/14—Two separate members moving in opposite directions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
SG11201705354SA 2014-12-31 2015-12-29 Self-damping shutter apparatus for exposure system of photolithography machine SG11201705354SA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201410855707.0A CN105807572B (en) 2014-12-31 2014-12-31 A kind of self-damping shutter device for exposure subsystem of photoetching machine
PCT/CN2015/099386 WO2016107543A1 (en) 2014-12-31 2015-12-29 Self-damping shutter apparatus for exposure system of photolithography machine

Publications (1)

Publication Number Publication Date
SG11201705354SA true SG11201705354SA (en) 2017-08-30

Family

ID=56284282

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201705354SA SG11201705354SA (en) 2014-12-31 2015-12-29 Self-damping shutter apparatus for exposure system of photolithography machine

Country Status (7)

Country Link
US (1) US10133153B2 (en)
JP (1) JP6511143B2 (en)
KR (1) KR101964535B1 (en)
CN (1) CN105807572B (en)
SG (1) SG11201705354SA (en)
TW (1) TWI581073B (en)
WO (1) WO2016107543A1 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105807572B (en) * 2014-12-31 2018-03-30 上海微电子装备（集团）股份有限公司 A kind of self-damping shutter device for exposure subsystem of photoetching machine
CN108345157B (en) * 2017-01-25 2019-07-23 上海微电子装备（集团）股份有限公司 Shutter device and its control method, litho machine and its exposure dose control method
CN110196532B (en) * 2018-02-27 2021-03-16 上海微电子装备（集团）股份有限公司 Safety shutter device of photoetching machine
TWI750521B (en) * 2019-10-23 2021-12-21 聚昌科技股份有限公司 Etching machine structure for controlling the magnetic field of the reaction chamber by using magnetic shielding
WO2023123107A1 (en) * 2021-12-29 2023-07-06 深圳市大疆创新科技有限公司 Electric motor applied to shutter mechanism, shutter mechanism, camera, and electronic device

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52131032U (en) * 1976-03-31 1977-10-05
JPS565526A (en) * 1979-06-27 1981-01-21 Hitachi Ltd Shutter for exposure
JPS59116633A (en) * 1982-12-23 1984-07-05 Copal Co Ltd Electromagnetic shutter for camera
US5053934A (en) * 1990-02-09 1991-10-01 Krebs Juergen Optical arrangement for high-powered diaprojectors
JPH04317315A (en) * 1991-04-16 1992-11-09 Canon Inc Shutter system
JPH1187207A (en) * 1997-09-02 1999-03-30 Nikon Corp Projection aligner
JPH11233423A (en) * 1998-02-06 1999-08-27 Canon Inc Shutter for exposure, aligner, and manufacture of device
JP3575281B2 (en) * 1998-05-27 2004-10-13 ウシオ電機株式会社 Shutter mechanism of light irradiation device
CN2521599Y (en) * 2001-12-13 2002-11-20 中国科学院西安光学精密机械研究所 High-speed shutter for light-flux detector
TWI240852B (en) * 2004-01-08 2005-10-01 Powerchip Semiconductor Corp Photolithograph system with variable shutter and method of using the same
US8120832B2 (en) * 2006-05-23 2012-02-21 Inphase Technologies, Inc. High speed electromechanical shutter
JP2008020844A (en) * 2006-07-14 2008-01-31 Nsk Ltd Proximity exposure apparatus
US20080204683A1 (en) * 2007-02-26 2008-08-28 Asml Netherlands B.V. Lithographic apparatus and method
CN102087476A (en) * 2009-12-08 2011-06-08 上海微电子装备有限公司 Shutter device for exposure subsystem of photoetching machine
US8317417B2 (en) * 2010-02-24 2012-11-27 Va, Inc. Shutter damping assembly
TWI461826B (en) * 2010-06-25 2014-11-21 Hon Hai Prec Ind Co Ltd Shutter structure
CN105807572B (en) 2014-12-31 2018-03-30 上海微电子装备（集团）股份有限公司 A kind of self-damping shutter device for exposure subsystem of photoetching machine

Also Published As

Publication number Publication date
WO2016107543A1 (en) 2016-07-07
TWI581073B (en) 2017-05-01
TW201627779A (en) 2016-08-01
JP6511143B2 (en) 2019-05-15
KR20170106352A (en) 2017-09-20
US10133153B2 (en) 2018-11-20
JP2018502329A (en) 2018-01-25
US20170343883A1 (en) 2017-11-30
KR101964535B1 (en) 2019-08-07
CN105807572A (en) 2016-07-27
CN105807572B (en) 2018-03-30

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