JPS52131032U - - Google Patents
Info
- Publication number
- JPS52131032U JPS52131032U JP3925676U JP3925676U JPS52131032U JP S52131032 U JPS52131032 U JP S52131032U JP 3925676 U JP3925676 U JP 3925676U JP 3925676 U JP3925676 U JP 3925676U JP S52131032 U JPS52131032 U JP S52131032U
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3925676U JPS52131032U (en) | 1976-03-31 | 1976-03-31 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3925676U JPS52131032U (en) | 1976-03-31 | 1976-03-31 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS52131032U true JPS52131032U (en) | 1977-10-05 |
Family
ID=28498424
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3925676U Pending JPS52131032U (en) | 1976-03-31 | 1976-03-31 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS52131032U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20170106352A (en) * | 2014-12-31 | 2017-09-20 | 상하이 마이크로 일렉트로닉스 이큅먼트(그룹) 컴퍼니 리미티드 | Self-damping shutter device for exposure system of photolithography machine |
-
1976
- 1976-03-31 JP JP3925676U patent/JPS52131032U/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20170106352A (en) * | 2014-12-31 | 2017-09-20 | 상하이 마이크로 일렉트로닉스 이큅먼트(그룹) 컴퍼니 리미티드 | Self-damping shutter device for exposure system of photolithography machine |
| JP2018502329A (en) * | 2014-12-31 | 2018-01-25 | シャンハイ マイクロ エレクトロニクス イクイプメント | Self-attenuating shutter for photolithographic apparatus exposure systems. |