SG11201704918VA - Electrically conductive adhesive film and dicing die bonding film - Google Patents

Electrically conductive adhesive film and dicing die bonding film

Info

Publication number
SG11201704918VA
SG11201704918VA SG11201704918VA SG11201704918VA SG11201704918VA SG 11201704918V A SG11201704918V A SG 11201704918VA SG 11201704918V A SG11201704918V A SG 11201704918VA SG 11201704918V A SG11201704918V A SG 11201704918VA SG 11201704918V A SG11201704918V A SG 11201704918VA
Authority
SG
Singapore
Prior art keywords
electrically conductive
film
conductive adhesive
die bonding
dicing die
Prior art date
Application number
SG11201704918VA
Inventor
Naoaki Mihara
Noriyuki Kirikae
Jirou Sugiyama
Original Assignee
Furukawa Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Furukawa Electric Co Ltd filed Critical Furukawa Electric Co Ltd
Publication of SG11201704918VA publication Critical patent/SG11201704918VA/en

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    • C09J11/00Features of adhesives not provided for in group C09J9/00, e.g. additives
    • C09J11/02Non-macromolecular additives
    • C09J11/04Non-macromolecular additives inorganic
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    • C09J7/00Adhesives in the form of films or foils
    • C09J7/10Adhesives in the form of films or foils without carriers
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    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J163/00Adhesives based on epoxy resins; Adhesives based on derivatives of epoxy resins
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    • C09J179/00Adhesives based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen, or carbon only, not provided for in groups C09J161/00 - C09J177/00
    • C09J179/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
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    • C09J201/00Adhesives based on unspecified macromolecular compounds
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    • C09J7/00Adhesives in the form of films or foils
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    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
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    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • C09J7/22Plastics; Metallised plastics
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    • C09J7/30Adhesives in the form of films or foils characterised by the adhesive composition
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    • C09J9/00Adhesives characterised by their physical nature or the effects produced, e.g. glue sticks
    • C09J9/02Electrically-conducting adhesives
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    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/52Mounting semiconductor bodies in containers
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    • H01L24/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K2201/00Specific properties of additives
    • C08K2201/001Conductive additives
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/02Elements
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    • C09J2203/00Applications of adhesives in processes or use of adhesives in the form of films or foils
    • C09J2203/326Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
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    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/30Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
    • C09J2301/314Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier the adhesive layer and/or the carrier being conductive
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    • H01L2221/68322Auxiliary support including means facilitating the selective separation of some of a plurality of devices from the auxiliary support
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
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    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
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    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
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    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • H01L2224/8319Arrangement of the layer connectors prior to mounting
    • H01L2224/83191Arrangement of the layer connectors prior to mounting wherein the layer connectors are disposed only on the semiconductor or solid-state body
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    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • H01L2224/838Bonding techniques
    • H01L2224/8384Sintering
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    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/91Methods for connecting semiconductor or solid state bodies including different methods provided for in two or more of groups H01L2224/80 - H01L2224/90
    • H01L2224/92Specific sequence of method steps
    • H01L2224/922Connecting different surfaces of the semiconductor or solid-state body with connectors of different types
    • H01L2224/9222Sequential connecting processes
    • H01L2224/92242Sequential connecting processes the first connecting process involving a layer connector
    • H01L2224/92247Sequential connecting processes the first connecting process involving a layer connector the second connecting process involving a wire connector
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    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • H01L23/3107Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
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    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/06Polymers
    • H01L2924/078Adhesive characteristics other than chemical
    • H01L2924/0781Adhesive characteristics other than chemical being an ohmic electrical conductor
    • H01L2924/07811Extrinsic, i.e. with electrical conductive fillers
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    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
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    • H01L2924/20Parameters
    • H01L2924/201Temperature ranges
    • H01L2924/20104Temperature range 100 C=<T<150 C, 373.15 K =< T < 423.15K
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    • H01L2924/20Parameters
    • H01L2924/201Temperature ranges
    • H01L2924/20105Temperature range 150 C=<T<200 C, 423.15 K =< T < 473.15K
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    • H01L2924/20Parameters
    • H01L2924/201Temperature ranges
    • H01L2924/20106Temperature range 200 C=<T<250 C, 473.15 K =<T < 523.15K

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Dicing (AREA)
  • Die Bonding (AREA)
  • Adhesive Tapes (AREA)
  • Conductive Materials (AREA)
SG11201704918VA 2015-04-16 2016-04-12 Electrically conductive adhesive film and dicing die bonding film SG11201704918VA (en)

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Cited By (1)

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Publication number Priority date Publication date Assignee Title
US11447666B2 (en) 2018-03-28 2022-09-20 Zoltek Corporation Electrically conductive adhesive

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017069559A (en) * 2015-09-30 2017-04-06 日東電工株式会社 Manufacturing method for power semiconductor device
JP2017069558A (en) * 2015-09-30 2017-04-06 日東電工株式会社 Manufacturing method for power semiconductor device
CN109952356A (en) * 2016-11-10 2019-06-28 京瓷株式会社 Semiconductor bonding resin combination, Semiconductor bonding piece and the semiconductor device using it
WO2018092671A1 (en) * 2016-11-18 2018-05-24 古河電気工業株式会社 Bonding film, tape for wafer processing, method for producing bonded object, and bonded object
US9998109B1 (en) * 2017-05-15 2018-06-12 Cree, Inc. Power module with improved reliability
JP6584543B2 (en) * 2018-01-23 2019-10-02 田中貴金属工業株式会社 Conductive adhesive composition
CN112166653A (en) * 2018-03-15 2021-01-01 以色列商普林特电路板有限公司 Two-component printable conductive composition
CN112088068A (en) * 2018-05-08 2020-12-15 株式会社弘辉 Flux and solder material
JP7370985B2 (en) * 2019-03-15 2023-10-30 古河電気工業株式会社 Metal particle-containing composition and conductive adhesive film
JP7354252B2 (en) * 2019-07-16 2023-10-02 古河電気工業株式会社 Bonding film, wafer processing tape, method for manufacturing bonded bodies, bonded bodies and bonded bodies

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2508390B2 (en) * 1989-09-11 1996-06-19 信越化学工業株式会社 Thermosetting resin composition
JPH05179211A (en) * 1991-12-30 1993-07-20 Nitto Denko Corp Dicing die-bonded film
US5686703A (en) * 1994-12-16 1997-11-11 Minnesota Mining And Manufacturing Company Anisotropic, electrically conductive adhesive film
JP2001303015A (en) * 2000-04-25 2001-10-31 Hitachi Chem Co Ltd Adhesive film, method for producing the same and method for bonding
JP2001332137A (en) * 2000-05-23 2001-11-30 Asahi Kasei Corp Anisotropic conductive film
JP3589422B2 (en) * 2000-11-24 2004-11-17 旭化成エレクトロニクス株式会社 Anisotropic conductive film
US7170062B2 (en) * 2002-03-29 2007-01-30 Oy Ajat Ltd. Conductive adhesive bonded semiconductor substrates for radiation imaging devices
KR20120064711A (en) * 2003-05-05 2012-06-19 어드밴스드 어플라이드 어드히시브즈 Imide-linked maleimide and polymaleimide compounds
WO2005116038A1 (en) * 2004-05-28 2005-12-08 San-Apro Limited Novel fluorinated alkylfluorophosphoric acid salt of onium and transition metal complex
US20070213429A1 (en) * 2006-03-10 2007-09-13 Chih-Min Cheng Anisotropic conductive adhesive
WO2008130894A1 (en) * 2007-04-16 2008-10-30 Designer Molecules, Inc. Low temperature curing acrylate and maleimide based formulations and methods for use thereof
WO2009020089A1 (en) * 2007-08-07 2009-02-12 Adeka Corporation Aromatic sulfonium salt compound
US7851930B1 (en) * 2008-06-04 2010-12-14 Henkel Corporation Conductive adhesive compositions containing an alloy filler material for better dispense and thermal properties
JP5927177B2 (en) * 2011-03-01 2016-06-01 ナミックス株式会社 Die bonding agent
JP2013152867A (en) * 2012-01-25 2013-08-08 Sekisui Chem Co Ltd Conductive particle, anisotropic conductive material, and connection structure
WO2013146604A1 (en) * 2012-03-26 2013-10-03 積水化学工業株式会社 Conductive material and connecting structure
CN104221223B (en) * 2012-06-25 2017-07-04 株式会社村田制作所 Anisotropic conductive sheet and use its method for joining electrode
JP6044261B2 (en) * 2012-10-22 2016-12-14 日立化成株式会社 Anisotropic conductive adhesive composition
JP2014143390A (en) * 2012-12-26 2014-08-07 Carlit Holdings Co Ltd Polyaniline solution for manufacturing solid electrolytic capacitor and solid electrolytic capacitor
KR101952004B1 (en) * 2014-08-29 2019-02-25 후루카와 덴키 고교 가부시키가이샤 Electrically conductive adhesive composition

Cited By (1)

* Cited by examiner, † Cited by third party
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US11447666B2 (en) 2018-03-28 2022-09-20 Zoltek Corporation Electrically conductive adhesive

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US20180294242A1 (en) 2018-10-11
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KR20170080663A (en) 2017-07-10
MY190140A (en) 2022-03-30
US20180026003A1 (en) 2018-01-25
CN107075317A (en) 2017-08-18
EP3216837B1 (en) 2020-07-15
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KR101935705B1 (en) 2019-01-04
EP3216837A4 (en) 2018-05-09
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CN107075317B (en) 2020-10-02
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