SG11201704680VA - Method for controlling the synthesis of a block copolymer containing at least one apolar block and at least one polar block and use of such a block copolymer in applications of nanolithography by direct self-assembly - Google Patents

Method for controlling the synthesis of a block copolymer containing at least one apolar block and at least one polar block and use of such a block copolymer in applications of nanolithography by direct self-assembly

Info

Publication number
SG11201704680VA
SG11201704680VA SG11201704680VA SG11201704680VA SG11201704680VA SG 11201704680V A SG11201704680V A SG 11201704680VA SG 11201704680V A SG11201704680V A SG 11201704680VA SG 11201704680V A SG11201704680V A SG 11201704680VA SG 11201704680V A SG11201704680V A SG 11201704680VA
Authority
SG
Singapore
Prior art keywords
block
block copolymer
nanolithography
synthesis
applications
Prior art date
Application number
SG11201704680VA
Other languages
English (en)
Inventor
Christophe Navarro
Celia Nicolet
Xavier Chevalier
Original Assignee
Arkema France
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Arkema France filed Critical Arkema France
Publication of SG11201704680VA publication Critical patent/SG11201704680VA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F297/00—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
    • C08F297/02—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type
    • C08F297/026—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type polymerising acrylic acid, methacrylic acid or derivatives thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D153/00—Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2201/00—Manufacture or treatment of microstructural devices or systems
    • B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
    • B81C2201/0101—Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
    • B81C2201/0147—Film patterning
    • B81C2201/0149—Forming nanoscale microstructures using auto-arranging or self-assembling material
SG11201704680VA 2014-12-16 2015-12-15 Method for controlling the synthesis of a block copolymer containing at least one apolar block and at least one polar block and use of such a block copolymer in applications of nanolithography by direct self-assembly SG11201704680VA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR1462556A FR3029921B1 (fr) 2014-12-16 2014-12-16 Procede de controle de la synthese d'un copolymere a blocs contenant au moins un bloc apolaire et au moins un bloc polaire et utilisation d'un tel copolymere a blocs dans des applications de nano-lithographie par auto-assemblage direct.
PCT/FR2015/053501 WO2016097574A1 (fr) 2014-12-16 2015-12-15 Procédé de contrôle de la synthèse d'un copolymere a blocs contenant au moins un bloc apolaire et au moins un bloc polaire et utilisation d'un tel copolymere a blocs dans des applications de nano-lithographie par auto-assemblage direct

Publications (1)

Publication Number Publication Date
SG11201704680VA true SG11201704680VA (en) 2017-07-28

Family

ID=52779786

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201704680VA SG11201704680VA (en) 2014-12-16 2015-12-15 Method for controlling the synthesis of a block copolymer containing at least one apolar block and at least one polar block and use of such a block copolymer in applications of nanolithography by direct self-assembly

Country Status (9)

Country Link
US (1) US10023677B2 (zh)
EP (1) EP3034533B1 (zh)
JP (1) JP2016138246A (zh)
KR (1) KR101781700B1 (zh)
CN (1) CN107108824B (zh)
FR (1) FR3029921B1 (zh)
SG (1) SG11201704680VA (zh)
TW (1) TWI629234B (zh)
WO (1) WO2016097574A1 (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB201804010D0 (en) * 2018-03-13 2018-04-25 Univ Kyoto Structured nanoporous materials, manufacture of structured nanoporous materials and applications of structured nanoporous materials
EP3587113B1 (en) * 2018-06-21 2023-01-04 Agfa Offset Bv A lithographic printing plate precursor
FR3096369B1 (fr) * 2019-05-24 2022-01-14 Arkema France Procédé de polymérisation d’une composition en présence de copolymère à blocs

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5629393A (en) * 1989-06-05 1997-05-13 Elf Atochem S.A. Initiating process and system for the anionic polymerization of acrylic monomers
JP2926607B2 (ja) * 1989-06-05 1999-07-28 エルク アトケム ソシエテ アノニム アクリルモノマーのイオン重合方法および重合開始系
FR2679237B1 (fr) 1991-07-19 1994-07-22 Atochem Systeme d'amorcage pour la polymerisation anionique de monomeres (meth) acryliques.
FR2698630B1 (fr) * 1992-11-27 1995-01-06 Atochem Elf Sa Procédé de préparation de copolymères séquences élastomères thermoplastiques dérivés de diènes conjugués et de méthacrylate de méthyle, à tenue à la chaleur améliorée et produits obtenus.
US5514753A (en) * 1993-06-30 1996-05-07 Bridgestone Corporation Process for preparing a block copolymer
FR2735480B1 (fr) 1995-06-15 1997-07-18 Atochem Elf Sa Procede de polymerisation anionique en continu d'au moins un monomere (meth)acrylique pour l'obtention de polymeres a haut taux de solide
JP4077312B2 (ja) * 2001-12-28 2008-04-16 株式会社東芝 発光素子の製造方法および発光素子
US7279527B2 (en) 2005-04-22 2007-10-09 Bridgestone Corporation Method of converting anionic living end to protected free radical living end and applications thereof
US8394483B2 (en) * 2007-01-24 2013-03-12 Micron Technology, Inc. Two-dimensional arrays of holes with sub-lithographic diameters formed by block copolymer self-assembly
CN101070367B (zh) * 2007-05-25 2012-03-07 北京化工大学 一种非极性溶剂中制备含聚乙烯基吡啶的嵌段共聚物方法
JP2010180353A (ja) * 2009-02-06 2010-08-19 Kyoto Univ ブロック共重合体の製造方法
CN103087279B (zh) * 2013-01-24 2014-07-23 大连理工大学 一种含有极性苯乙烯嵌段的热塑弹性体及其制备方法
FR3008986B1 (fr) * 2013-07-25 2016-12-30 Arkema France Procede de controle de la periode caracterisant la morphologie obtenue a partir d'un melange de copolymere a blocs et de (co) polymeres de l'un des blocs
EP2829567B1 (en) * 2013-07-25 2017-03-15 Arkema France Process for controlling the period characterizing the morphology obtained from a blend of block copolymers and of (co) polymers of one of the blocks
FR3014877B1 (fr) * 2013-12-17 2017-03-31 Arkema France Procede de nanostructuration d'un film de copolymere a blocs a partir d'un copolymere a blocs non structure a base de styrene et de methacrylate de methyle, et film de copolymere a blocs nanostructure
JP6390427B2 (ja) 2014-01-07 2018-09-19 Jsr株式会社 パターン形成方法
FR3022249B1 (fr) * 2014-06-11 2018-01-19 Arkema France Procede de controle de la periode d'un film de copolymere a blocs nanostructue a base de styrene et de methacrylate de methyle, et film de copolymere a blocs nanostructure

Also Published As

Publication number Publication date
FR3029921A1 (fr) 2016-06-17
FR3029921B1 (fr) 2018-06-29
KR101781700B1 (ko) 2017-09-25
CN107108824A (zh) 2017-08-29
EP3034533B1 (en) 2019-10-16
US10023677B2 (en) 2018-07-17
TWI629234B (zh) 2018-07-11
CN107108824B (zh) 2020-05-12
US20160168305A1 (en) 2016-06-16
JP2016138246A (ja) 2016-08-04
EP3034533A1 (en) 2016-06-22
TW201634380A (zh) 2016-10-01
WO2016097574A1 (fr) 2016-06-23
KR20160073339A (ko) 2016-06-24

Similar Documents

Publication Publication Date Title
EP3363075A4 (en) Electronic device and method for controlling the electronic device thereof
EP3183151A4 (en) Wearable device and method of controlling the same
EP3095127A4 (en) High-chi block copolymers for directed self-assembly
IL249446A0 (en) Preparations and methods for production packaging
EP2926464A4 (en) ELECTRONIC DEVICE AND METHOD FOR CONTROLLING THEREOF
EP3213170A4 (en) Method for controlling operation of electronic device and electronic device using the same
EP3231250A4 (en) Method for controlling and electronic device thereof
TWI562334B (en) Semiconductor device and methods for forming the same
ZA201607572B (en) Resin composition suitable for printing and printing method utilizing the same
SG10201506399TA (en) Earset and control method for the same
SG10201501819SA (en) Semiconductor device and control method of the same
EP3228046A4 (en) Attachment device and method for controlling electronic device thereof
EP3198390A4 (en) Device and method of controlling the device
EP3146405A4 (en) Wearable device and method of controlling the same
ZA201606325B (en) Sports field structure and method for forming the same
IL250995A0 (en) Block copolymers containing silicon for direct self-assembly applications
EP3142965A4 (en) Methods and systems for the synthesis of nanoparticles including strained nanoparticles
SG11201606495QA (en) Printing device and method for controlling the printing device
EP3316471A4 (en) CONVERSION DEVICE AND ITS CONTROL METHOD
SG11201706048SA (en) Magnetoresistive device and method of forming the same
SG11201704680VA (en) Method for controlling the synthesis of a block copolymer containing at least one apolar block and at least one polar block and use of such a block copolymer in applications of nanolithography by direct self-assembly
EP3145456A4 (en) Device & method for deterring back-lying snoring posture
EP3202522A4 (en) Method for the alumino-thermite welding of rails and device for carrying out said method
PL3113774T3 (pl) Kompozycje grapiprantu i sposoby ich zastosowania
EP3168973A4 (en) Cross regulation circuit for multiple outputs and cross regulation method thereof