SG11201704338VA - Amplitude monitoring system, focusing and leveling device, and defocusing amount detection method - Google Patents

Amplitude monitoring system, focusing and leveling device, and defocusing amount detection method

Info

Publication number
SG11201704338VA
SG11201704338VA SG11201704338VA SG11201704338VA SG11201704338VA SG 11201704338V A SG11201704338V A SG 11201704338VA SG 11201704338V A SG11201704338V A SG 11201704338VA SG 11201704338V A SG11201704338V A SG 11201704338VA SG 11201704338V A SG11201704338V A SG 11201704338VA
Authority
SG
Singapore
Prior art keywords
focusing
monitoring system
detection method
amount detection
leveling device
Prior art date
Application number
SG11201704338VA
Inventor
Yazheng Zhuang
Original Assignee
Shanghai Micro Electronics Equipment (Group) Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shanghai Micro Electronics Equipment (Group) Co Ltd filed Critical Shanghai Micro Electronics Equipment (Group) Co Ltd
Publication of SG11201704338VA publication Critical patent/SG11201704338VA/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G02B26/106—Scanning systems having diffraction gratings as scanning elements, e.g. holographic scanners
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0075—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means for altering, e.g. increasing, the depth of field or depth of focus
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/28—Systems for automatic generation of focusing signals
    • G02B7/30—Systems for automatic generation of focusing signals using parallactic triangle with a base line
    • G02B7/305—Systems for automatic generation of focusing signals using parallactic triangle with a base line using a scanner
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70625—Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70641—Focus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7034—Leveling
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1861—Reflection gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Recording Or Reproduction (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Automatic Focus Adjustment (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Microscoopes, Condenser (AREA)
SG11201704338VA 2014-11-27 2015-11-26 Amplitude monitoring system, focusing and leveling device, and defocusing amount detection method SG11201704338VA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201410697616.9A CN105700297B (en) 2014-11-27 2014-11-27 Amplitude monitoring system, focusing leveling device and defocusing amount detection method
PCT/CN2015/095627 WO2016082772A1 (en) 2014-11-27 2015-11-26 Amplitude monitoring system, focusing and leveling device, and defocusing amount detection method

Publications (1)

Publication Number Publication Date
SG11201704338VA true SG11201704338VA (en) 2017-06-29

Family

ID=56073626

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201704338VA SG11201704338VA (en) 2014-11-27 2015-11-26 Amplitude monitoring system, focusing and leveling device, and defocusing amount detection method

Country Status (7)

Country Link
US (1) US10274848B2 (en)
JP (1) JP6481034B2 (en)
KR (1) KR101999906B1 (en)
CN (1) CN105700297B (en)
SG (1) SG11201704338VA (en)
TW (1) TWI596451B (en)
WO (1) WO2016082772A1 (en)

Families Citing this family (8)

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Publication number Priority date Publication date Assignee Title
CN106248347B (en) * 2016-07-22 2018-11-16 西北工业大学 A kind of MEMS scanning mirror performance parameter measuring system and method
CN107664922B (en) * 2016-07-29 2019-09-17 上海微电子装备（集团）股份有限公司 Scanning reflection mirror amplitude measuring apparatus and measurement method
CN106252885B (en) * 2016-09-19 2018-07-20 深圳市华讯方舟太赫兹科技有限公司 Electricity applied to millimeter wave imaging system sweeps array antenna device
US10637375B2 (en) * 2017-12-15 2020-04-28 Samsung Electro-Mechanics Co., Ltd. Actuator and position control apparatus using voice coil motor method with temperature compensation function
KR102117462B1 (en) * 2017-12-15 2020-06-02 삼성전기주식회사 Actuator and position control apparatus of voice coil moto with temperature compensation function
CN110596895B (en) * 2019-08-09 2021-10-29 成都理想境界科技有限公司 Near-to-eye display device and projection feedback method
CN111521617B (en) * 2020-04-30 2023-06-16 上海御微半导体技术有限公司 Optical detection device, control method for optical detection device, and storage medium
CN114509923B (en) * 2022-01-28 2023-11-24 复旦大学 Focusing and leveling device in deep ultraviolet objective lens design and application thereof

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HU172499B (en) * 1976-05-31 1978-09-28 Mta Koezponti Fiz Kutato Intez Method and apparatus for checking photomasks by substractive method
JPS58113706A (en) * 1981-12-26 1983-07-06 Nippon Kogaku Kk <Nikon> Detector for horizontal position
US4968122A (en) * 1989-02-21 1990-11-06 Linear Instruments Galvanometer gimbal mount
US4989965A (en) * 1989-06-13 1991-02-05 Spectra-Physics, Inc. Collet mounting for an optical element
JPH04302131A (en) * 1991-03-29 1992-10-26 Nikon Corp Projection exposure system
JPH05203465A (en) * 1992-01-27 1993-08-10 Omron Corp Rotary encoder
JPH08111361A (en) * 1994-10-11 1996-04-30 Nikon Corp Surface position detector
JPH08145645A (en) * 1994-11-28 1996-06-07 Nikon Corp Inclination detector
JPH1038513A (en) * 1996-07-22 1998-02-13 Nikon Corp Surface height measuring instrument, and exposing device using the same
JPH10318718A (en) * 1997-05-14 1998-12-04 Hitachi Ltd Optical height detecting device
FR2839552B1 (en) * 2002-05-07 2004-07-30 Fastlite METHOD AND DEVICE FOR MEASURING THE PHASE AND THE AMPLITUDE OF ULTRA-BRIEF LIGHT PULSES
WO2006064900A1 (en) * 2004-12-17 2006-06-22 Nikon Corporation Exposure method and apparatus, and device manufacturing method
KR101332035B1 (en) * 2004-12-22 2013-11-22 가부시키가이샤 니콘 Method for measuring position of mask surface in height direction, exposure apparatus and exposure method
CN101083423B (en) * 2006-05-29 2010-07-14 深圳市大族精密机电有限公司 Vibration mirror motor
WO2007137459A1 (en) * 2006-05-29 2007-12-06 Shenzhen Han's Precision Mechatronics Co., Limited A vibrating mirror motor
JP5393598B2 (en) * 2010-06-03 2014-01-22 キヤノン株式会社 Galvano device and laser processing device
CN102298278B (en) * 2010-06-25 2013-08-14 上海微电子装备有限公司 Focusing and levelling detection method
CN102768469B (en) * 2011-05-03 2014-11-12 上海微电子装备有限公司 Focusing and bisecting system and adjustment method thereof
NL2009853A (en) * 2011-12-23 2013-06-26 Asml Netherlands Bv Methods and apparatus for measuring a property of a substrate.
JP5819746B2 (en) * 2012-02-16 2015-11-24 ビアメカニクス株式会社 Laser processing equipment

Also Published As

Publication number Publication date
TW201621482A (en) 2016-06-16
JP2017537319A (en) 2017-12-14
CN105700297A (en) 2016-06-22
US20170329242A1 (en) 2017-11-16
WO2016082772A1 (en) 2016-06-02
KR20170091648A (en) 2017-08-09
CN105700297B (en) 2018-01-26
JP6481034B2 (en) 2019-03-13
US10274848B2 (en) 2019-04-30
TWI596451B (en) 2017-08-21
KR101999906B1 (en) 2019-07-12

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