SG11201700784QA - Repeater detection - Google Patents

Repeater detection

Info

Publication number
SG11201700784QA
SG11201700784QA SG11201700784QA SG11201700784QA SG11201700784QA SG 11201700784Q A SG11201700784Q A SG 11201700784QA SG 11201700784Q A SG11201700784Q A SG 11201700784QA SG 11201700784Q A SG11201700784Q A SG 11201700784QA SG 11201700784Q A SG11201700784Q A SG 11201700784QA
Authority
SG
Singapore
Prior art keywords
repeater detection
repeater
detection
Prior art date
Application number
SG11201700784QA
Inventor
Hong Chen
Kenong Wu
Eugene Shifrin
Masatoshi Yamaoka
Gangadharan Sivaraman
Raghav Babulnath
Satya Kurada
Alfonso Sun
Original Assignee
Kla Tencor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to US201462042251P priority Critical
Priority to US14/674,856 priority patent/US9766186B2/en
Application filed by Kla Tencor Corp filed Critical Kla Tencor Corp
Priority to PCT/US2015/047139 priority patent/WO2016033300A1/en
Publication of SG11201700784QA publication Critical patent/SG11201700784QA/en

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501Semiconductor wafers
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/94Investigating contamination, e.g. dust
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00Features of devices classified in G01N21/00
    • G01N2201/06Illumination; Optics
    • G01N2201/061Sources
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00Features of devices classified in G01N21/00
    • G01N2201/10Scanning
SG11201700784QA 2014-08-27 2015-08-27 Repeater detection SG11201700784QA (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US201462042251P true 2014-08-27 2014-08-27
US14/674,856 US9766186B2 (en) 2014-08-27 2015-03-31 Array mode repeater detection
PCT/US2015/047139 WO2016033300A1 (en) 2014-08-27 2015-08-27 Repeater detection

Publications (1)

Publication Number Publication Date
SG11201700784QA true SG11201700784QA (en) 2017-03-30

Family

ID=55400561

Family Applications (2)

Application Number Title Priority Date Filing Date
SG11201700784QA SG11201700784QA (en) 2014-08-27 2015-08-27 Repeater detection
SG10201903148WA SG10201903148WA (en) 2014-08-27 2015-08-27 Repeater detection

Family Applications After (1)

Application Number Title Priority Date Filing Date
SG10201903148WA SG10201903148WA (en) 2014-08-27 2015-08-27 Repeater detection

Country Status (6)

Country Link
US (1) US9766186B2 (en)
KR (1) KR20170045272A (en)
CN (1) CN106662538B (en)
SG (2) SG11201700784QA (en)
TW (1) TWI648706B (en)
WO (1) WO2016033300A1 (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9816939B2 (en) 2014-07-22 2017-11-14 Kla-Tencor Corp. Virtual inspection systems with multiple modes
US9984454B2 (en) * 2016-04-22 2018-05-29 Kla-Tencor Corporation System, method and computer program product for correcting a difference image generated from a comparison of target and reference dies
US10395358B2 (en) * 2016-11-10 2019-08-27 Kla-Tencor Corp. High sensitivity repeater defect detection
US10262408B2 (en) * 2017-04-12 2019-04-16 Kla-Tencor Corporation System, method and computer program product for systematic and stochastic characterization of pattern defects identified from a semiconductor wafer
US10648925B2 (en) * 2017-06-05 2020-05-12 Kla-Tencor Corporation Repeater defect detection
US10275872B2 (en) 2017-08-24 2019-04-30 Applied Materials Israel Ltd. Method of detecting repeating defects and system thereof
US20190130551A1 (en) * 2017-10-30 2019-05-02 Taiwan Semiconductor Manufacturing Co., Ltd. Defect detecting method, defect detecting system and computer-readable medium
US10572991B2 (en) * 2017-11-07 2020-02-25 Kla-Tencor Corporation System and method for aligning semiconductor device reference images and test images
CN108459023A (en) * 2018-03-27 2018-08-28 松下电子部品(江门)有限公司 Biradical pseudo-capacitance appearance images detection method
US10557802B2 (en) * 2018-05-09 2020-02-11 Kla-Tencor Corporation Capture of repeater defects on a semiconductor wafer
WO2020105319A1 (en) * 2018-11-19 2020-05-28 株式会社日立ハイテク Defect inspection device and defect inspection method

Family Cites Families (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4644172A (en) * 1984-02-22 1987-02-17 Kla Instruments Corporation Electronic control of an automatic wafer inspection system
US5808735A (en) * 1993-06-17 1998-09-15 Ultrapointe Corporation Method for characterizing defects on semiconductor wafers
US5864394A (en) * 1994-06-20 1999-01-26 Kla-Tencor Corporation Surface inspection system
US5917588A (en) * 1996-11-04 1999-06-29 Kla-Tencor Corporation Automated specimen inspection system for and method of distinguishing features or anomalies under either bright field or dark field illumination
US5859698A (en) * 1997-05-07 1999-01-12 Nikon Corporation Method and apparatus for macro defect detection using scattered light
US6392749B1 (en) * 1997-09-22 2002-05-21 Candela Instruments High speed optical profilometer for measuring surface height variation
JPH11183393A (en) * 1997-10-13 1999-07-09 Mitsubishi Electric Corp Pattern flaw inspecting device and pattern flaw inspecting method
US6891627B1 (en) * 2000-09-20 2005-05-10 Kla-Tencor Technologies Corp. Methods and systems for determining a critical dimension and overlay of a specimen
US6642726B2 (en) * 2001-06-29 2003-11-04 Kla-Tencor Corporation Apparatus and methods for reliable and efficient detection of voltage contrast defects
US7127098B2 (en) * 2001-09-13 2006-10-24 Hitachi, Ltd. Image detection method and its apparatus and defect detection method and its apparatus
CN1685220B (en) * 2002-09-30 2010-04-28 应用材料以色列股份有限公司 Dark field inspection system
US7379175B1 (en) * 2002-10-15 2008-05-27 Kla-Tencor Technologies Corp. Methods and systems for reticle inspection and defect review using aerial imaging
US7103505B2 (en) * 2002-11-12 2006-09-05 Fei Company Defect analyzer
JP2004177139A (en) 2002-11-25 2004-06-24 Renesas Technology Corp Support program for preparation of inspection condition data, inspection device, and method of preparing inspection condition data
US7107158B2 (en) * 2003-02-03 2006-09-12 Qcept Technologies, Inc. Inspection system and apparatus
JP4351522B2 (en) 2003-11-28 2009-10-28 株式会社日立ハイテクノロジーズ Pattern defect inspection apparatus and pattern defect inspection method
JP2005308464A (en) * 2004-04-20 2005-11-04 Dainippon Screen Mfg Co Ltd Flaw detector and flaw detecting method
JP2006098152A (en) * 2004-09-29 2006-04-13 Dainippon Screen Mfg Co Ltd Apparatus and method for detecting defect
US7440607B1 (en) * 2004-11-03 2008-10-21 Kla-Tencor Corporation Outlier substrate inspection
US7729529B2 (en) 2004-12-07 2010-06-01 Kla-Tencor Technologies Corp. Computer-implemented methods for detecting and/or sorting defects in a design pattern of a reticle
US7345754B1 (en) * 2005-09-16 2008-03-18 Kla-Tencor Technologies Corp. Fourier filters and wafer inspection systems
US7570800B2 (en) * 2005-12-14 2009-08-04 Kla-Tencor Technologies Corp. Methods and systems for binning defects detected on a specimen
US8103087B2 (en) * 2006-01-20 2012-01-24 Hitachi High-Technologies Corporation Fault inspection method
JP2008014650A (en) 2006-07-03 2008-01-24 Olympus Corp Surface defect inspection apparatus
US7664608B2 (en) * 2006-07-14 2010-02-16 Hitachi High-Technologies Corporation Defect inspection method and apparatus
US7369236B1 (en) * 2006-10-31 2008-05-06 Negevtech, Ltd. Defect detection through image comparison using relative measures
US7796804B2 (en) 2007-07-20 2010-09-14 Kla-Tencor Corp. Methods for generating a standard reference die for use in a die to standard reference die inspection and methods for inspecting a wafer
US8126255B2 (en) 2007-09-20 2012-02-28 Kla-Tencor Corp. Systems and methods for creating persistent data for a wafer and for using persistent data for inspection-related functions
US8000922B2 (en) 2008-05-29 2011-08-16 Kla-Tencor Corp. Methods and systems for generating information to be used for selecting values for one or more parameters of a detection algorithm
US8041106B2 (en) 2008-12-05 2011-10-18 Kla-Tencor Corp. Methods and systems for detecting defects on a reticle
SG164292A1 (en) * 2009-01-13 2010-09-29 Semiconductor Technologies & Instruments Pte System and method for inspecting a wafer
US8605275B2 (en) 2009-01-26 2013-12-10 Kla-Tencor Corp. Detecting defects on a wafer
US8223327B2 (en) 2009-01-26 2012-07-17 Kla-Tencor Corp. Systems and methods for detecting defects on a wafer
JP5500871B2 (en) 2009-05-29 2014-05-21 株式会社日立ハイテクノロジーズ Template matching template creation method and template creation apparatus
JP5694307B2 (en) 2009-06-19 2015-04-01 ケーエルエー−テンカー・コーポレーションKla−Tencor Corporation Method and apparatus for simultaneously inspecting multiple array regions having different pitches
US8594823B2 (en) 2009-07-17 2013-11-26 KLA—Tencor Corporation Scanner performance comparison and matching using design and defect data

Also Published As

Publication number Publication date
SG10201903148WA (en) 2019-05-30
CN106662538B (en) 2020-03-27
CN106662538A (en) 2017-05-10
TWI648706B (en) 2019-01-21
TW201614586A (en) 2016-04-16
KR20170045272A (en) 2017-04-26
US9766186B2 (en) 2017-09-19
US20160061749A1 (en) 2016-03-03
WO2016033300A1 (en) 2016-03-03

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