SG11201610529QA - Grid, method of manufacturing the same, and ion beam processing apparatus - Google Patents

Grid, method of manufacturing the same, and ion beam processing apparatus

Info

Publication number
SG11201610529QA
SG11201610529QA SG11201610529QA SG11201610529QA SG11201610529QA SG 11201610529Q A SG11201610529Q A SG 11201610529QA SG 11201610529Q A SG11201610529Q A SG 11201610529QA SG 11201610529Q A SG11201610529Q A SG 11201610529QA SG 11201610529Q A SG11201610529Q A SG 11201610529QA
Authority
SG
Singapore
Prior art keywords
grid
manufacturing
processing apparatus
same
ion beam
Prior art date
Application number
SG11201610529QA
Inventor
Masashi Tsujiyama
Yukito Nakagawa
Yasushi Yasumatsu
Original Assignee
Canon Anelva Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Anelva Corp filed Critical Canon Anelva Corp
Publication of SG11201610529QA publication Critical patent/SG11201610529QA/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/022—Details
    • H01J27/024—Extraction optics, e.g. grids
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32357—Generation remote from the workpiece, e.g. down-stream
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32422—Arrangement for selecting ions or species in the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H01J37/32651—Shields, e.g. dark space shields, Faraday shields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/14—Manufacture of electrodes or electrode systems of non-emitting electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/303—Electron or ion optical systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/31701—Ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3174—Etching microareas

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Combustion & Propulsion (AREA)
  • Manufacturing & Machinery (AREA)
  • Power Engineering (AREA)
  • Optics & Photonics (AREA)
  • Plasma Technology (AREA)
  • Carbon And Carbon Compounds (AREA)
SG11201610529QA 2015-03-16 2015-11-25 Grid, method of manufacturing the same, and ion beam processing apparatus SG11201610529QA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015052363 2015-03-16
PCT/JP2015/005851 WO2016147232A1 (en) 2015-03-16 2015-11-25 Grid, production method therefor and ion beam processing device

Publications (1)

Publication Number Publication Date
SG11201610529QA true SG11201610529QA (en) 2017-01-27

Family

ID=56918553

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201610529QA SG11201610529QA (en) 2015-03-16 2015-11-25 Grid, method of manufacturing the same, and ion beam processing apparatus

Country Status (5)

Country Link
US (1) US9721747B2 (en)
KR (1) KR101893810B1 (en)
SG (1) SG11201610529QA (en)
TW (1) TWI588860B (en)
WO (1) WO2016147232A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016147232A1 (en) 2015-03-16 2016-09-22 キヤノンアネルバ株式会社 Grid, production method therefor and ion beam processing device
JP6810391B2 (en) * 2018-05-18 2021-01-06 日新イオン機器株式会社 Ion source
KR102125063B1 (en) * 2019-02-22 2020-06-19 박흥균 Grid apparatus having a beam control function in semiconductor processing system and semiconductor thin film processing method using the same
US20230031722A1 (en) * 2021-07-23 2023-02-02 Taiwan Semiconductor Manufacturing Co., Ltd. Voltage Control for Etching Systems

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR910016054A (en) 1990-02-23 1991-09-30 미다 가쓰시게 Surface Treatment Apparatus and Method for Microelectronic Devices
US5448883A (en) * 1993-02-26 1995-09-12 The Boeing Company Ion thruster with ion optics having carbon-carbon composite elements
US5548953A (en) 1993-02-26 1996-08-27 The Boeing Company Carbon-carbon grid elements for ion thruster ion optics
US5465023A (en) * 1993-07-01 1995-11-07 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Carbon-carbon grid for ion engines
US6885010B1 (en) * 2003-11-12 2005-04-26 Thermo Electron Corporation Carbon nanotube electron ionization sources
US7834530B2 (en) * 2004-05-27 2010-11-16 California Institute Of Technology Carbon nanotube high-current-density field emitters
US7129513B2 (en) * 2004-06-02 2006-10-31 Xintek, Inc. Field emission ion source based on nanostructure-containing material
US7034290B2 (en) * 2004-09-24 2006-04-25 Agilent Technologies, Inc. Target support with pattern recognition sites
US7075067B2 (en) * 2004-10-15 2006-07-11 Agilent Technologies, Inc. Ionization chambers for mass spectrometry
JP4434963B2 (en) * 2005-01-06 2010-03-17 パイオニア株式会社 Magnetic head for magnetic recording device
US7507972B2 (en) * 2005-10-10 2009-03-24 Owlstone Nanotech, Inc. Compact ionization source
US7750297B1 (en) * 2007-03-09 2010-07-06 University Of Central Florida Research Foundation, Inc. Carbon nanotube collimator fabrication and application
CN101276724B (en) * 2007-03-30 2011-06-22 北京富纳特创新科技有限公司 Transmission electron microscope micro grid and preparing method thereof
US8294098B2 (en) * 2007-03-30 2012-10-23 Tsinghua University Transmission electron microscope micro-grid
CN101848564B (en) * 2009-03-27 2012-06-20 清华大学 Heating element
CN101998706B (en) * 2009-08-14 2015-07-01 清华大学 Carbon nanotube fabric and heating body using carbon nanotube fabric
JP2013115012A (en) * 2011-11-30 2013-06-10 Ulvac Japan Ltd Charged particle extraction irradiation mechanism
WO2013099372A1 (en) * 2011-12-27 2013-07-04 キヤノンアネルバ株式会社 Discharge vessel and plasma treatment device
US9230772B2 (en) * 2011-12-28 2016-01-05 Schlumberger Technology Corporation Device and method for ion generation
WO2016147232A1 (en) 2015-03-16 2016-09-22 キヤノンアネルバ株式会社 Grid, production method therefor and ion beam processing device
JP6184441B2 (en) * 2015-06-01 2017-08-23 キヤノンアネルバ株式会社 Ion beam etching apparatus and ion beam generating apparatus

Also Published As

Publication number Publication date
KR101893810B1 (en) 2018-09-04
TW201643926A (en) 2016-12-16
WO2016147232A1 (en) 2016-09-22
US20170084419A1 (en) 2017-03-23
TWI588860B (en) 2017-06-21
KR20170012395A (en) 2017-02-02
US9721747B2 (en) 2017-08-01

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